JP2023115374A - Styrene-based resin composition and molded article - Google Patents
Styrene-based resin composition and molded article Download PDFInfo
- Publication number
- JP2023115374A JP2023115374A JP2023109087A JP2023109087A JP2023115374A JP 2023115374 A JP2023115374 A JP 2023115374A JP 2023109087 A JP2023109087 A JP 2023109087A JP 2023109087 A JP2023109087 A JP 2023109087A JP 2023115374 A JP2023115374 A JP 2023115374A
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- styrenic resin
- styrene
- composition according
- mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 title claims abstract description 80
- 239000011342 resin composition Substances 0.000 title claims abstract description 56
- -1 ether compound Chemical class 0.000 claims abstract description 56
- 239000000178 monomer Substances 0.000 claims abstract description 35
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229920005989 resin Polymers 0.000 claims abstract description 18
- 239000011347 resin Substances 0.000 claims abstract description 18
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000000203 mixture Substances 0.000 claims abstract description 10
- 229920001890 Novodur Polymers 0.000 claims description 40
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 125000001424 substituent group Chemical group 0.000 claims description 11
- 150000002430 hydrocarbons Chemical group 0.000 claims description 8
- 125000002947 alkylene group Chemical group 0.000 claims description 6
- 125000005842 heteroatom Chemical group 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 125000004343 1-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C([H])([H])[H] 0.000 claims description 2
- 125000002723 alicyclic group Chemical group 0.000 claims description 2
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 2
- 239000000126 substance Substances 0.000 abstract description 12
- 238000006116 polymerization reaction Methods 0.000 description 20
- 238000000034 method Methods 0.000 description 14
- 239000000243 solution Substances 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 12
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 11
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical class C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 150000005215 alkyl ethers Chemical class 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000011259 mixed solution Substances 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 238000005469 granulation Methods 0.000 description 3
- 230000003179 granulation Effects 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- HSLFISVKRDQEBY-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)cyclohexane Chemical compound CC(C)(C)OOC1(OOC(C)(C)C)CCCCC1 HSLFISVKRDQEBY-UHFFFAOYSA-N 0.000 description 2
- OEVVKKAVYQFQNV-UHFFFAOYSA-N 1-ethenyl-2,4-dimethylbenzene Chemical compound CC1=CC=C(C=C)C(C)=C1 OEVVKKAVYQFQNV-UHFFFAOYSA-N 0.000 description 2
- VTPNYMSKBPZSTF-UHFFFAOYSA-N 1-ethenyl-2-ethylbenzene Chemical compound CCC1=CC=CC=C1C=C VTPNYMSKBPZSTF-UHFFFAOYSA-N 0.000 description 2
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 2
- XKMDZVINHIFHLY-UHFFFAOYSA-N 1-ethenyl-3,5-dimethylbenzene Chemical compound CC1=CC(C)=CC(C=C)=C1 XKMDZVINHIFHLY-UHFFFAOYSA-N 0.000 description 2
- XHUZSRRCICJJCN-UHFFFAOYSA-N 1-ethenyl-3-ethylbenzene Chemical compound CCC1=CC=CC(C=C)=C1 XHUZSRRCICJJCN-UHFFFAOYSA-N 0.000 description 2
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 2
- WHFHDVDXYKOSKI-UHFFFAOYSA-N 1-ethenyl-4-ethylbenzene Chemical compound CCC1=CC=C(C=C)C=C1 WHFHDVDXYKOSKI-UHFFFAOYSA-N 0.000 description 2
- QEDJMOONZLUIMC-UHFFFAOYSA-N 1-tert-butyl-4-ethenylbenzene Chemical compound CC(C)(C)C1=CC=C(C=C)C=C1 QEDJMOONZLUIMC-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- DBWWINQJTZYDFK-UHFFFAOYSA-N 2-ethenyl-1,4-dimethylbenzene Chemical compound CC1=CC=C(C)C(C=C)=C1 DBWWINQJTZYDFK-UHFFFAOYSA-N 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 2
- PMZXJPLGCUVUDN-UHFFFAOYSA-N 4-ethenyl-1,2-dimethylbenzene Chemical compound CC1=CC=C(C=C)C=C1C PMZXJPLGCUVUDN-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- MOYAFQVGZZPNRA-UHFFFAOYSA-N Terpinolene Chemical compound CC(C)=C1CCC(C)=CC1 MOYAFQVGZZPNRA-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 238000012662 bulk polymerization Methods 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 229920006026 co-polymeric resin Polymers 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- 238000004128 high performance liquid chromatography Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- FZYCEURIEDTWNS-UHFFFAOYSA-N prop-1-en-2-ylbenzene Chemical compound CC(=C)C1=CC=CC=C1.CC(=C)C1=CC=CC=C1 FZYCEURIEDTWNS-UHFFFAOYSA-N 0.000 description 2
- SWAXTRYEYUTSAP-UHFFFAOYSA-N tert-butyl ethaneperoxoate Chemical compound CC(=O)OOC(C)(C)C SWAXTRYEYUTSAP-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- QEQBMZQFDDDTPN-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy benzenecarboperoxoate Chemical compound CC(C)(C)OOOC(=O)C1=CC=CC=C1 QEQBMZQFDDDTPN-UHFFFAOYSA-N 0.000 description 1
- KDGNCLDCOVTOCS-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy propan-2-yl carbonate Chemical compound CC(C)OC(=O)OOC(C)(C)C KDGNCLDCOVTOCS-UHFFFAOYSA-N 0.000 description 1
- ZUDLIFVTNPYZJH-UHFFFAOYSA-N 1,1,2,2-tetraphenylethylbenzene Chemical compound C1=CC=CC=C1C(C(C=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 ZUDLIFVTNPYZJH-UHFFFAOYSA-N 0.000 description 1
- IMYCVFRTNVMHAD-UHFFFAOYSA-N 1,1-bis(2-methylbutan-2-ylperoxy)cyclohexane Chemical compound CCC(C)(C)OOC1(OOC(C)(C)CC)CCCCC1 IMYCVFRTNVMHAD-UHFFFAOYSA-N 0.000 description 1
- MGEJLLSWJCYSHK-UHFFFAOYSA-N 1-butyl-2-prop-1-en-2-ylbenzene Chemical compound CCCCC1=CC=CC=C1C(C)=C MGEJLLSWJCYSHK-UHFFFAOYSA-N 0.000 description 1
- IXTPWSUCILMATH-UHFFFAOYSA-N 1-ethyl-2-prop-1-en-2-ylbenzene Chemical compound CCC1=CC=CC=C1C(C)=C IXTPWSUCILMATH-UHFFFAOYSA-N 0.000 description 1
- XKOIESNQSHAQIW-UHFFFAOYSA-N 1-hexyl-2-prop-1-en-2-ylbenzene Chemical compound CCCCCCC1=CC=CC=C1C(C)=C XKOIESNQSHAQIW-UHFFFAOYSA-N 0.000 description 1
- ZHKBLALOBMBJLL-UHFFFAOYSA-N 1-hexylperoxyhexane Chemical compound CCCCCCOOCCCCCC ZHKBLALOBMBJLL-UHFFFAOYSA-N 0.000 description 1
- OGMSGZZPTQNTIK-UHFFFAOYSA-N 1-methyl-2-prop-1-en-2-ylbenzene Chemical compound CC(=C)C1=CC=CC=C1C OGMSGZZPTQNTIK-UHFFFAOYSA-N 0.000 description 1
- ICNSPHUQRZZYDE-UHFFFAOYSA-N 1-octyl-2-prop-1-en-2-ylbenzene Chemical compound CCCCCCCCC1=CC=CC=C1C(C)=C ICNSPHUQRZZYDE-UHFFFAOYSA-N 0.000 description 1
- OFALFBSBJGMFDF-UHFFFAOYSA-N 1-pentyl-2-prop-1-en-2-ylbenzene Chemical compound CCCCCC1=CC=CC=C1C(C)=C OFALFBSBJGMFDF-UHFFFAOYSA-N 0.000 description 1
- ZMYIIHDQURVDRB-UHFFFAOYSA-N 1-phenylethenylbenzene Chemical group C=1C=CC=CC=1C(=C)C1=CC=CC=C1 ZMYIIHDQURVDRB-UHFFFAOYSA-N 0.000 description 1
- ABCFMLHXPWKTLP-UHFFFAOYSA-N 1-prop-1-en-2-yl-2-propylbenzene Chemical compound CCCC1=CC=CC=C1C(C)=C ABCFMLHXPWKTLP-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- HQOVXPHOJANJBR-UHFFFAOYSA-N 2,2-bis(tert-butylperoxy)butane Chemical compound CC(C)(C)OOC(C)(CC)OOC(C)(C)C HQOVXPHOJANJBR-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- RCEJCSULJQNRQQ-UHFFFAOYSA-N 2-methylbutanenitrile Chemical compound CCC(C)C#N RCEJCSULJQNRQQ-UHFFFAOYSA-N 0.000 description 1
- DZRLNYVDCIYXPG-UHFFFAOYSA-N 2-naphthalen-2-yloxynaphthalene Chemical compound C1=CC=CC2=CC(OC=3C=C4C=CC=CC4=CC=3)=CC=C21 DZRLNYVDCIYXPG-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- BIISIZOQPWZPPS-UHFFFAOYSA-N 2-tert-butylperoxypropan-2-ylbenzene Chemical compound CC(C)(C)OOC(C)(C)C1=CC=CC=C1 BIISIZOQPWZPPS-UHFFFAOYSA-N 0.000 description 1
- KXYAVSFOJVUIHT-UHFFFAOYSA-N 2-vinylnaphthalene Chemical compound C1=CC=CC2=CC(C=C)=CC=C21 KXYAVSFOJVUIHT-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- UJTRCPVECIHPBG-UHFFFAOYSA-N 3-cyclohexylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C2CCCCC2)=C1 UJTRCPVECIHPBG-UHFFFAOYSA-N 0.000 description 1
- IYMZEPRSPLASMS-UHFFFAOYSA-N 3-phenylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C=2C=CC=CC=2)=C1 IYMZEPRSPLASMS-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- 239000006057 Non-nutritive feed additive Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000000071 blow moulding Methods 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 208000012839 conversion disease Diseases 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- VBWIZSYFQSOUFQ-UHFFFAOYSA-N cyclohexanecarbonitrile Chemical compound N#CC1CCCCC1 VBWIZSYFQSOUFQ-UHFFFAOYSA-N 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000005003 food packaging material Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 150000002432 hydroperoxides Chemical class 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229920002114 octoxynol-9 Polymers 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000004978 peroxycarbonates Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- YLLIGHVCTUPGEH-UHFFFAOYSA-M potassium;ethanol;hydroxide Chemical compound [OH-].[K+].CCO YLLIGHVCTUPGEH-UHFFFAOYSA-M 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- YOEYNURYLFDCEV-UHFFFAOYSA-N tert-butyl hydroxy carbonate Chemical compound CC(C)(C)OC(=O)OO YOEYNURYLFDCEV-UHFFFAOYSA-N 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polyethers (AREA)
Abstract
Description
本発明は、スチレン系樹脂組成物及び成形品に関するものである。 The present invention relates to a styrenic resin composition and molded articles.
スチレン-(メタ)アクリル酸系共重合体樹脂は、一般のポリスチレンに比較して、耐熱性に優れており、主に電子レンジ加熱用の食品包装材料の素材として使用されている。具体的には、押出発泡シートや二軸延伸シートに成形された後、食品容器や蓋に賦形されて利用されている。また、透明性と耐熱性のバランスに優れるため、照明カバーや透過型ディスプレイ用光拡散板のような、光拡散剤を含有する光拡散性樹脂板にも適している。 Styrene-(meth)acrylic acid copolymer resins are superior in heat resistance to general polystyrene, and are mainly used as raw materials for food packaging materials for microwave heating. Specifically, after being formed into an extruded foam sheet or a biaxially oriented sheet, it is used as a food container or lid. In addition, since it has an excellent balance of transparency and heat resistance, it is also suitable for a light diffusing resin plate containing a light diffusing agent, such as a lighting cover or a light diffusing plate for a transmissive display.
スチレン-(メタ)アクリル酸系共重合体樹脂の欠点として、シート等に加工する際の熱履歴によって、ポリマー中のカルボキシル基がポリマー分子間で縮合反応を起こして、ゲル状物質を生成する場合があることや、共重合体樹脂の製造工程においても同様の反応でゲル状物質を生成する場合があることが指摘されている。 A drawback of styrene-(meth)acrylic acid copolymer resin is that the carboxyl groups in the polymer may cause a condensation reaction between polymer molecules due to the heat history during processing into sheets, etc., resulting in the formation of a gel-like substance. It has been pointed out that a gel-like substance may be generated by a similar reaction in the production process of a copolymer resin.
特許文献1には、ポリオキシエチレンアルキルエーテルを添加することによってゲル状物質の生成を抑制する技術が開示されている。 Patent Literature 1 discloses a technique for suppressing the formation of gel-like substances by adding polyoxyethylene alkyl ether.
しかし、特許文献1の技術を採用しても、ゲル状物質の生成を完全に抑制することはできず、ゲル状物質の生成をさらに抑制することが望まれている。 However, even if the technique disclosed in Patent Document 1 is employed, it is not possible to completely suppress the formation of the gel-like substance, and it is desired to further suppress the formation of the gel-like substance.
本発明はこのような事情に鑑みてなされたものであり、ゲル状物質の生成を効果的に抑制可能なスチレン系樹脂組成物を提供するものである。 The present invention has been made in view of such circumstances, and provides a styrenic resin composition capable of effectively suppressing the formation of gel-like substances.
本発明によれば、スチレン系樹脂とエーテル化合物を含むスチレン系樹脂組成物であって、前記スチレン系樹脂は、スチレン系単量体と(メタ)アクリル酸系単量体を含む単量体混合物を共重合させて得られ、前記エーテル化合物は、一般式(1)で表される、スチレン系樹脂組成物が提供される。 According to the present invention, there is provided a styrenic resin composition containing a styrenic resin and an ether compound, wherein the styrenic resin is a monomer mixture containing a styrenic monomer and a (meth)acrylic acid-based monomer. is obtained by copolymerizing, and the ether compound is represented by the general formula (1) to provide a styrene resin composition.
本発明者が鋭意検討を行ったところ、一般式(1)で表されるエーテル化合物を添加することによって、ゲル状物質の生成を効果的に抑制可能であることを見出し、本発明の完成に到った。 As a result of intensive studies by the present inventors, it was found that the addition of the ether compound represented by the general formula (1) can effectively suppress the formation of a gel-like substance, and the present invention has been completed. arrived.
1.スチレン系樹脂組成物
本発明のスチレン系樹脂組成物は、スチレン系樹脂Aとエーテル化合物Bを含む。以下、各成分について詳述する。
1. Styrene-Based Resin Composition The styrene-based resin composition of the present invention contains a styrene-based resin A and an ether compound B. Each component will be described in detail below.
<<スチレン系樹脂A>>
スチレン系樹脂Aは、スチレン系単量体と(メタ)アクリル酸系単量体を含む単量体混合物を共重合させて得られる。
<<Styrene-based resin A>>
The styrene-based resin A is obtained by copolymerizing a monomer mixture containing a styrene-based monomer and a (meth)acrylic acid-based monomer.
スチレン系単量体は、単環又は多環の芳香族ビニル系モノマーであり、例えば、スチレン、o-メチルスチレン、m-メチルスチレン、p-メチルスチレン、2,4-ジメチルスチレン、2,5-ジメチルスチレン、3,4-ジメチルスチレン、3,5-ジメチルスチレン、p-エチルスチレン、m-エチルスチレン、о-エチルスチレン、p-tert-ブチルスチレン、1-ビニルナフタレン、2-ビニルナフタレン、1,1-ジフェニルエチレン、イソプロペニルベンセン(α-メチルスチレン)、イソプロペニルトルエン、イソプロペニルエチルベンゼン、イソプロペニルプロピルベンゼン、イソプロペニルブチルベンゼン、イソプロペニルペンチルベンゼン、イソプロペニルヘキシルベンゼン、イソプロペニルオクチルベンゼン等の単独または2種以上の混合物であり、好ましくは、スチレン、o-メチルスチレン、m-メチルスチレン、p-メチルスチレン、2,4-ジメチルスチレン、2,5-ジメチルスチレン、3,4-ジメチルスチレン、3,5-ジメチルスチレン、p-エチルスチレン、m-エチルスチレン、о-エチルスチレン、p-tert-ブチルスチレンの単独または2種以上の混合物であり、より好ましくは、スチレンである。 Styrenic monomers are monocyclic or polycyclic aromatic vinyl monomers such as styrene, o-methylstyrene, m-methylstyrene, p-methylstyrene, 2,4-dimethylstyrene, 2,5 -dimethylstyrene, 3,4-dimethylstyrene, 3,5-dimethylstyrene, p-ethylstyrene, m-ethylstyrene, o-ethylstyrene, p-tert-butylstyrene, 1-vinylnaphthalene, 2-vinylnaphthalene, 1,1-diphenylethylene, isopropenylbenzene (α-methylstyrene), isopropenyltoluene, isopropenylethylbenzene, isopropenylpropylbenzene, isopropenylbutylbenzene, isopropenylpentylbenzene, isopropenylhexylbenzene, isopropenyloctylbenzene, etc. alone or in a mixture of two or more, preferably styrene, o-methylstyrene, m-methylstyrene, p-methylstyrene, 2,4-dimethylstyrene, 2,5-dimethylstyrene, 3,4-dimethyl Styrene, 3,5-dimethylstyrene, p-ethylstyrene, m-ethylstyrene, o-ethylstyrene and p-tert-butylstyrene may be used singly or as a mixture of two or more, and styrene is more preferred.
(メタ)アクリル酸系単量体は、アクリル酸、メタクリル酸等のアクリル酸モノマーの一方又は両方であり、好ましくはメタクリル酸である。 The (meth)acrylic acid-based monomer is one or both of acrylic acid monomers such as acrylic acid and methacrylic acid, preferably methacrylic acid.
単量体混合物は、スチレン系単量体と(メタ)アクリル酸系単量体のみを含んでもよく、本発明の効果を損なわない範囲で、これらと共重合可能なその他の単量体を含んでよい。その他の単量体としては、アクリロニトリル、メタクリロニトリル等のシアン化ビニルモノマー、アクリル酸ブチル、アクリル酸エチル、アクリル酸メチル、メタクリル酸メチル等のアクリル系モノマーや無水マレイン酸、フマル酸等のα,β-エチレン不飽和カルボン酸類、フェニルマレイミド、シクロヘキシルマレイミド等のイミド系モノマー類が挙げられる。 The monomer mixture may contain only the styrene-based monomer and the (meth)acrylic acid-based monomer, and may contain other monomers copolymerizable therewith within a range that does not impair the effects of the present invention. OK. Other monomers include vinyl cyanide monomers such as acrylonitrile and methacrylonitrile, acrylic monomers such as butyl acrylate, ethyl acrylate, methyl acrylate and methyl methacrylate, and α-monomers such as maleic anhydride and fumaric acid. , β-ethylenically unsaturated carboxylic acids, phenylmaleimide, cyclohexylmaleimide and other imide monomers.
単量体混合物は、スチレン系単量体と(メタ)アクリル酸系単量体が主成分であることが好ましく、単量体混合物中のスチレン系単量体と(メタ)アクリル酸系単量体の合計の割合は、50質量%以上が好ましく、例えば50~100質量%であり、具体的には例えば、50、55、60、65、70、75、80、85、90、95、100質量%であり、ここで例示した数値の何れか2つの間の範囲内であってもよい。 The monomer mixture preferably contains styrene-based monomers and (meth)acrylic monomers as main components. The total proportion of the body is preferably 50% by mass or more, for example 50 to 100% by mass, specifically for example 50, 55, 60, 65, 70, 75, 80, 85, 90, 95, 100 % by weight and may be in a range between any two of the values exemplified herein.
スチレン系樹脂組成物100質量%に対し、(メタ)アクリル酸系単量体に由来する構造単位の含有量が0.1~30質量%であることが好ましい。(メタ)アクリル酸系単量体に由来する構造単位は、例えば(メタ)アクリル酸系単量体単位である。この値が小さすぎると耐熱性が不十分である場合があり、この値が大きすぎると、溶融時の流動性が低下して成形加工性が悪化する場合があるからである。この割合は、具体的には例えば、0.1、1、2、3、4、5、6、7、8、9、10、11、12、13、14、15、16、17、18、19、20、25、30質量%であり、ここで例示した数値の何れか2つの間の範囲内であってもよい。 The content of the structural unit derived from the (meth)acrylic acid-based monomer is preferably 0.1 to 30% by mass with respect to 100% by mass of the styrene resin composition. A structural unit derived from a (meth)acrylic acid-based monomer is, for example, a (meth)acrylic acid-based monomer unit. This is because if this value is too small, the heat resistance may be insufficient, and if this value is too large, the fluidity during melting may decrease and the moldability may deteriorate. Specifically, this ratio is, for example, 0.1, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 25, 30% by mass, and may be within a range between any two of the numerical values exemplified here.
スチレン系樹脂Aの重量平均分子量(Mw)は、好ましくは、15万~70万であり、15万~40万であることが好ましい。具体的には例えば、5、10、15、20、25、30、35、40、45、50、55、60、65、70万であり、ここで例示した数値の何れか2つの間の範囲内であってもよい。Mwが小さすぎると成形品の強度が不十分となり、Mwが大きすぎると成形性が低下する。スチレン系樹脂Aの重量平均分子量は、重合工程の反応温度、滞留時間、重合開始剤の種類及び添加量、連鎖移動剤の種類及び添加量、重合時に使用する溶媒の種類及び量等によって制御することができる。 The weight average molecular weight (Mw) of the styrene resin A is preferably 150,000 to 700,000, more preferably 150,000 to 400,000. Specifically, for example, 5, 10, 15, 20, 25, 30, 35, 40, 45, 50, 55, 60, 65, 700,000, a range between any two of the numerical values exemplified here may be within If the Mw is too small, the strength of the molded product will be insufficient, and if the Mw is too large, the moldability will deteriorate. The weight average molecular weight of the styrene resin A is controlled by the reaction temperature and residence time in the polymerization process, the type and amount of polymerization initiator added, the type and amount of chain transfer agent used, and the type and amount of solvent used during polymerization. be able to.
重量平均分子量(Mw)は、ゲルパーミエイションクロマトグラフィー(GPC)を用いて、次の条件で測定可能である。
GPC機種:昭和電工株式会社製Shodex GPC-101
カラム:ポリマーラボラトリーズ社製 PLgel 10μm MIXED-B
移動相:テトラヒドロフラン
試料濃度:0.2質量%
温度:オーブン40℃、注入口35℃、検出器35℃
検出器:示差屈折計
分子量は単分散ポリスチレンの溶出曲線より各溶出時間における分子量を算出し、ポリスチレン換算の分子量として算出したものである。
The weight average molecular weight (Mw) can be measured using gel permeation chromatography (GPC) under the following conditions.
GPC model: Shodex GPC-101 manufactured by Showa Denko K.K.
Column: PLgel 10 μm MIXED-B manufactured by Polymer Laboratories
Mobile phase: Tetrahydrofuran Sample concentration: 0.2% by mass
Temperature: oven 40°C, inlet 35°C, detector 35°C
Detector: Differential refractometer The molecular weight was obtained by calculating the molecular weight at each elution time from the elution curve of monodisperse polystyrene and calculating the molecular weight in terms of polystyrene.
<<エーテル化合物B>>
エーテル化合物Bは、一般式(1)で表される。
<<ether compound B>>
Ether compound B is represented by general formula (1).
一般式(1)中のZ1~Z5は、同一又は異なっており、水素原子であるか、又はヘテロ原子を有してもよい炭化水素基である。Z1~Z5のうちの3つ又は4つが水素原子であり、残りがヘテロ原子を有してもよい炭化水素基であることが好ましい。 Z1 to Z5 in general formula (1) are the same or different, and are hydrogen atoms or hydrocarbon groups which may have a heteroatom. Three or four of Z1 to Z5 are preferably hydrogen atoms, and the rest are preferably hydrocarbon groups which may have heteroatoms.
上記ヘテロ原子としては、酸素、窒素、硫黄、フッ素などが挙げられる。炭化水素基は、炭素数が1~30であることが好ましく、2~20であることがさらに好ましい。この炭素数は、具体的には例えば、1、2、3、4、5、6、7、8、9、10、11、12、13、14、15、16、17、18、19、20、21、22、23、24、25、26、27、28、29、30であり、ここで例示した数値の何れか2つの間の範囲内であってもよい。 Examples of the heteroatoms include oxygen, nitrogen, sulfur, and fluorine. The hydrocarbon group preferably has 1 to 30 carbon atoms, more preferably 2 to 20 carbon atoms. Specifically, the number of carbon atoms is, for example, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20 , 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, and may be in the range between any two of the numerical values exemplified herein.
上記炭化水素基は、置換基を有してもよい脂肪族炭化水素基であることが好ましい。脂肪族炭化水素基としては、炭素数が1~20のアルキル基、アリル基、ビニル基などが挙げられる。脂肪族炭化水素基の炭素数は、具体的には例えば、1、2、3、4、5、6、7、8、9、10、11、12、13、14、15、16、17、18、19、20であり、ここで例示した数値の何れか2つの間の範囲内であってもよい。脂肪族炭化水素基の置換基としては、フェニル基などの芳香族炭化水素基が挙げられる。芳香族炭化水素基は、水酸基などの置換基で置換されていてもよい。脂肪族炭化水素基の1位の炭素に置換基が結合していることが好ましい。 The hydrocarbon group is preferably an aliphatic hydrocarbon group which may have a substituent. Examples of aliphatic hydrocarbon groups include alkyl groups having 1 to 20 carbon atoms, allyl groups, and vinyl groups. Specifically, the number of carbon atoms in the aliphatic hydrocarbon group is, for example, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, and may be in the range between any two of the numbers exemplified here. A substituent of the aliphatic hydrocarbon group includes an aromatic hydrocarbon group such as a phenyl group. The aromatic hydrocarbon group may be substituted with a substituent such as a hydroxyl group. A substituent is preferably bonded to the 1-position carbon of the aliphatic hydrocarbon group.
上記炭化水素基は、置換基を有してもよい芳香族炭化水素基であってもよい。芳香族炭化水素基としては、フェニル基、トリル基などが挙げられる。置換基としては、アルキルなどの脂肪族炭化水素基や水酸基などが挙げられる。 The hydrocarbon group may be an aromatic hydrocarbon group optionally having a substituent. A phenyl group, a tolyl group, etc. are mentioned as an aromatic-hydrocarbon group. Substituents include aliphatic hydrocarbon groups such as alkyl and hydroxyl groups.
Z1~Z5のうちの少なくとも2つが架橋されて脂環又は芳香環を形成していてもよい。 At least two of Z1 to Z5 may be crosslinked to form an alicyclic or aromatic ring.
Z1~Z5の少なくとも1つは、好ましくは、置換基を有してもよい炭素数1~20のアルキル基である。この置換基は、好ましくは、ヘテロ原子を有してもよい炭素数1~20の炭化水素基であり、さらに好ましくは、芳香環を含み、さらに好ましくは、前記アルキル基に結合されているフェニル基であり、さらに好ましくは、1-フェニルエチル基である。 At least one of Z1 to Z5 is preferably an optionally substituted alkyl group having 1 to 20 carbon atoms. This substituent is preferably a hydrocarbon group having 1 to 20 carbon atoms which may have a heteroatom, more preferably containing an aromatic ring, further preferably a phenyl group, more preferably a 1-phenylethyl group.
一般式(1)中のnは、アルキレンオキサイド構造の炭素数を表し、1~10(好ましくは2~4)の整数である。nは、具体的には例えば、1、2、3、4、5、6、7、8、9、10であり、ここで例示した数値の何れか2つの間の範囲内であってもよい。 n in the general formula (1) represents the number of carbon atoms in the alkylene oxide structure and is an integer of 1-10 (preferably 2-4). Specifically, n is, for example, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, and may be within a range between any two of the numerical values exemplified here. .
一般式(1)中のXは、Xはアルキレンオキサイド単位の平均付加数を表し、1~100(好ましくは5~50)の整数である。Xは、具体的には例えば、1、5、10、15、20、25、30、35、40、45、50、55、60、65、70、75、80、85、90、95、100であり、ここで例示した数値の何れか2つの間の範囲内であってもよい。 X in the general formula (1) represents the average number of alkylene oxide units added and is an integer of 1 to 100 (preferably 5 to 50). Specifically, X is, for example, 1, 5, 10, 15, 20, 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90, 95, 100 and may be in the range between any two of the numerical values exemplified here.
エーテル化合物Bとしては、例えば、ポリオキシエチレンジスチレン化フェニルエーテル、ポリオキシエチレンスチレン化フェニルエーテル、ポリオキシエチレンオクチルフェニルエーテル、ポリオキシエチレンノニルフェニルエーテル、ポリオキシエチレンドデシルフェニルエーテル、ポリオキシエチレンフェニルエーテル、ポリオキシエチレンβナフチルエーテル、ポリオキシエチレンビスフェノールAエーテル、ポリオキシエチレンビスフェノールFエーテルなどが挙げられる。 Examples of the ether compound B include polyoxyethylene distyrenated phenyl ether, polyoxyethylene styrenated phenyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyoxyethylene dodecylphenyl ether, polyoxyethylene phenyl ether, polyoxyethylene β-naphthyl ether, polyoxyethylene bisphenol A ether, polyoxyethylene bisphenol F ether and the like.
スチレン系樹脂組成物100質量%に対し、エーテル化合物Bの含有量は、0.001~10質量%であることが好ましい。この値が小さすぎると、ゲル状物質の生成が十分に抑制されない場合があり、この値が大きすぎると、耐熱性が低下する場合がある。上記含有量は、具体的には例えば、0.001、0.01、0.05、0.1、0.2、0.3、0.4、0.5、0.6、0.7、0.8、0.9、1、2、3、4、5、6、7、8、9、10質量%であり、ここで例示した数値の何れか2つの間の範囲内であってもよい。 The content of the ether compound B is preferably 0.001 to 10% by mass with respect to 100% by mass of the styrene resin composition. If this value is too small, the formation of a gel-like substance may not be sufficiently suppressed, and if this value is too large, the heat resistance may decrease. Specifically, the above content is, for example, 0.001, 0.01, 0.05, 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7 , 0.8, 0.9, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10% by mass, and within the range between any two of the numerical values exemplified here good too.
<<その他の添加剤>>
スチレン系樹脂組成物には、本発明の特性を損なわない範囲で、必要に応じて種々の添加剤を配合することができる。添加剤の種類はプラスチックに一般的に用いられるものであれば特に制限はないが、酸化防止剤、難燃剤、滑剤、加工助剤、ブロッキング防止剤、帯電防止剤、防曇剤、耐光性向上剤、軟化剤、可塑剤、無機補強剤、架橋剤、顔料、染料、その他或いはこれらの混合物が挙げられる。また、スチレン系樹脂組成物には、エーテル化合物として、エーテル化合物Bのみを含有させてもよく、エーテル化合物B以外のエーテル化合物(例:ポリオキシエチレンアルキルエーテル)を含有させてもよい。
<<Other Additives>>
Various additives can be blended into the styrene-based resin composition as necessary within a range that does not impair the characteristics of the present invention. The types of additives are not particularly limited as long as they are commonly used in plastics, but antioxidants, flame retardants, lubricants, processing aids, antiblocking agents, antistatic agents, antifogging agents, and improving light resistance. agents, softeners, plasticizers, inorganic reinforcing agents, cross-linking agents, pigments, dyes, etc. or mixtures thereof. The styrenic resin composition may contain only the ether compound B as an ether compound, or may contain an ether compound other than the ether compound B (eg, polyoxyethylene alkyl ether).
2.スチレン系樹脂組成物の製造方法
本発明のスチレン系樹脂組成物は、スチレン系樹脂Aにエーテル化合物Bを添加することによって製造可能である。スチレン系樹脂の重合方法としては、塊状重合法、溶液重合法、懸濁重合法、乳化重合法等公知のスチレン重合方法が挙げられる。品質面や生産性の面では、塊状重合法、溶液重合法が好ましく、連続重合であることが好ましい。溶媒として例えばベンゼン、トルエン、エチルベンゼン及びキシレン等のアルキルベンゼン類やアセトンやメチルエチルケトン等のケトン類、ヘキサンやシクロヘキサン等の脂肪族炭化水素等が使用できる。
2. Method for Producing Styrenic Resin Composition The styrenic resin composition of the present invention can be produced by adding the ether compound B to the styrenic resin A. Polymerization methods for styrene resins include known styrene polymerization methods such as bulk polymerization, solution polymerization, suspension polymerization, and emulsion polymerization. In terms of quality and productivity, bulk polymerization and solution polymerization are preferred, and continuous polymerization is preferred. Examples of solvents that can be used include alkylbenzenes such as benzene, toluene, ethylbenzene and xylene, ketones such as acetone and methyl ethyl ketone, and aliphatic hydrocarbons such as hexane and cyclohexane.
スチレン-(メタ)アクリル酸共重合樹脂の重合時に、必要に応じて重合開始剤、連鎖移動剤、架橋剤などの重合助剤、その他の重合助剤を使用することができる。重合開始剤としては、ラジカル重合開始剤が好ましく、公知慣用の例えば、1,1-ジ(t-ブチルパーオキシ)シクロヘキサン、2,2-ジ(t-ブチルパーオキシ)ブタン、2,2-ジ(4,4-ジ-t-ブチルパーオキシシクロヘキシル)プロパン、1,1-ジ(t-アミルパーオキシ)シクロヘキサン等のパーオキシケタール類、クメンハイドロパーオキサイド、t-ブチルハイドロパーオキサイド等のハイドロパーオキサイド類、t-ブチルパーオキシアセテート、t-アミルパーオキシイソノナノエート等のアルキルパーオキサイド類、t-ブチルクミルパーオキサイド、ジ-t-ブチルパーオキサイド、ジクミルパーオキサイド、ジ-t-ヘキシルパーオキサイド等のジアルキルパーオキサイド類、t-ブチルパーオキシアセテート、t-ブチルパーオキシベンゾエート、t-ブチルパーオキシイソプロピルモノカーボネート等のパーオキシエステル類、t-ブチルパーオキシイソプロピルカーボネート、ポリエーテルテトラキス(t-ブチルパーオキシカーボネート)等のパーオキシカーボネート類、N,N'-アゾビス(シクロヘキサン-1-カルボニトリル)、N,N'-アゾビス(2-メチルブチロニトリル)、N,N'-アゾビス(2,4-ジメチルバレロニトリル)、N,N'-アゾビス[2-(ヒドロキシメチル)プロピオニトリル]等が挙げられ、これらの1種あるいは2種以上を組み合わせて使用することができる。連鎖移動剤としては、脂肪族メルカプタン、芳香族メルカプタン、ペンタフェニルエタン、α-メチルスチレンダイマー及びテルピノーレン等が挙げられる。 During the polymerization of the styrene-(meth)acrylic acid copolymer resin, polymerization aids such as polymerization initiators, chain transfer agents, cross-linking agents, and other polymerization aids can be used as necessary. As the polymerization initiator, radical polymerization initiators are preferred, and known and commonly used ones include, for example, 1,1-di(t-butylperoxy)cyclohexane, 2,2-di(t-butylperoxy)butane, 2,2- Peroxyketals such as di(4,4-di-t-butylperoxycyclohexyl)propane, 1,1-di(t-amylperoxy)cyclohexane, cumene hydroperoxide, t-butyl hydroperoxide and the like Hydroperoxides, alkyl peroxides such as t-butyl peroxyacetate, t-amyl peroxy isononanoate, t-butyl cumyl peroxide, di-t-butyl peroxide, dicumyl peroxide, di-t - dialkyl peroxides such as hexyl peroxide, peroxyesters such as t-butyl peroxyacetate, t-butyl peroxybenzoate, t-butyl peroxyisopropyl monocarbonate, t-butyl peroxyisopropyl carbonate, polyethers Peroxycarbonates such as tetrakis(t-butylperoxycarbonate), N,N'-azobis(cyclohexane-1-carbonitrile), N,N'-azobis(2-methylbutyronitrile), N,N' -azobis(2,4-dimethylvaleronitrile), N,N'-azobis[2-(hydroxymethyl)propionitrile] and the like, and these can be used alone or in combination of two or more. . Chain transfer agents include aliphatic mercaptans, aromatic mercaptans, pentaphenylethane, α-methylstyrene dimer, terpinolene, and the like.
連続重合の場合、スチレン系樹脂組成物は、重合工程と、脱揮工程、造粒工程を備える方法によって製造可能である。 In the case of continuous polymerization, the styrenic resin composition can be produced by a method comprising a polymerization step, a devolatilization step, and a granulation step.
まず重合工程にて公知の完全混合槽型攪拌槽や塔型反応器等を用い、目標の分子量、分子量分布、反応転化率となるよう、重合温度調整等により重合反応が制御される。 First, in the polymerization step, the polymerization reaction is controlled by adjusting the polymerization temperature or the like, using a well-known complete mixing tank type stirring tank, tower type reactor, or the like, so as to achieve the target molecular weight, molecular weight distribution, and reaction conversion rate.
重合工程を出た重合体を含む重合溶液は、脱揮工程に移送され、未反応の単量体及び重合溶媒が除去される。脱揮工程は加熱器付きの真空脱揮槽やベント付き脱揮押出機などで構成される。脱揮工程を出た溶融状態の重合体は造粒工程へ移送される。造粒工程では、多孔ダイよりストランド状に溶融樹脂を押出し、コールドカット方式や空中ホットカット方式、水中ホットカット方式にてペレット形状に加工される。 The polymerization solution containing the polymer exiting the polymerization step is transferred to the devolatilization step to remove unreacted monomers and polymerization solvent. The devolatilization process consists of a vacuum devolatilization tank with a heater and a devolatilization extruder with a vent. The molten polymer that has exited the devolatilization step is transferred to the granulation step. In the granulation step, the molten resin is extruded in strands from a multi-hole die and processed into pellets by a cold cut method, an air hot cut method, or an underwater hot cut method.
エーテル化合物Bは、脱揮工程前、又は脱揮工程において、添加することが好ましい。具体的には、エーテル化合物Bは、以下の(1)~(4)の何れかの方法で添加することが好ましい。
(1)原料の単量体混合物に添加する。
(2)重合工程中に添加する。
(3)重合工程終了後の重合溶液に添加する。
(4)脱揮工程が2段で構成され、1段目の樹脂温度が200℃未満の場合は、1段目と2段目の間に添加する。
The ether compound B is preferably added before the devolatilization step or during the devolatilization step. Specifically, the ether compound B is preferably added by any one of the following methods (1) to (4).
(1) Add to the raw material monomer mixture.
(2) added during the polymerization process;
(3) Add to the polymerization solution after completion of the polymerization process.
(4) When the devolatilization process is composed of two stages and the resin temperature in the first stage is less than 200°C, it is added between the first stage and the second stage.
3.スチレン系樹脂組成物の用途
本発明のスチレン系樹脂組成物は、射出成形、押出成形、圧縮成形、ブロー成形等、目的に応じた成形方法で成形品にすることができ、その形状は制限されるものではない。例えば板状成形品であれば、導光板等に加工することができる。
3. Use of Styrene-Based Resin Composition The styrene-based resin composition of the present invention can be formed into a molded product by a molding method according to the purpose, such as injection molding, extrusion molding, compression molding, blow molding, etc., and the shape thereof is not limited. not something. For example, if it is a plate-shaped molded article, it can be processed into a light guide plate or the like.
以下、実施例を挙げて本発明を具体的に説明するが、本発明はこれら実施例に限定されるものではない。 EXAMPLES The present invention will be specifically described below with reference to Examples, but the present invention is not limited to these Examples.
1.測定方法
(1)メタクリル酸単位含有量の測定
スチレン系樹脂組成物0.5gを秤量し、トルエン/エタノール=8/2(体積比)の混合溶液に溶解後、水酸化カリウム0.1mol/Lエタノール溶液にて中和滴定を行い、終点を検出し、水酸化カリウムエタノール溶液の使用量より、メタクリル酸単位の質量基準の含有量を算出した。
1. Measurement method (1) Measurement of methacrylic acid unit content 0.5 g of a styrenic resin composition was weighed and dissolved in a mixed solution of toluene/ethanol = 8/2 (volume ratio), and then potassium hydroxide was added to 0.1 mol/L. Neutralization titration was performed with an ethanol solution, the end point was detected, and the mass-based content of methacrylic acid units was calculated from the amount of potassium hydroxide ethanol solution used.
(2)エーテル化合物の含有量の測定
スチレン系樹脂組成物5gを秤量し、THFに溶解する。溶解後、メタノール及び少量の塩酸でポリマー分を再沈処理し、ろ過により再沈物を除去。ろ液を濃縮し、最終的に10mlメタノール溶液の濃縮液とし、高速液体クロマトグラフィー(HPLC)により、エーテル化合物の定量を行った。なお、定量はエーテル化合物濃度既知のメタノール溶液を3点作成し、検量線を作成することにより行った。
HPLC機種:日本ウォーターズ社製 allianceシステム2695セパレーションモジュール
検出器:示差屈折計(RI)
カラム:東ソー社製 TSKgel ODS-120T 4.6mm(ID)×15cm(L)
移動相:メタノール/水=80/20(体積比)にリン酸0.2質量%添加
流量:1.0ml/分
カラムオーブン温度:40℃
検出器温度:30℃
(2) Measurement of Content of Ether Compound 5 g of the styrene-based resin composition is weighed and dissolved in THF. After dissolution, reprecipitate the polymer with methanol and a small amount of hydrochloric acid, and remove the reprecipitate by filtration. The filtrate was concentrated to finally obtain a concentrate of 10 ml methanol solution, and the ether compound was quantified by high performance liquid chromatography (HPLC). Quantification was carried out by preparing three points of methanol solutions with known ether compound concentrations and preparing a calibration curve.
HPLC model: Japan Waters alliance system 2695 separation module Detector: Differential refractometer (RI)
Column: TSKgel ODS-120T manufactured by Tosoh Corporation 4.6 mm (ID) × 15 cm (L)
Mobile phase: 0.2% by mass of phosphoric acid added to methanol/water = 80/20 (volume ratio) Flow rate: 1.0 ml/min Column oven temperature: 40°C
Detector temperature: 30°C
(3)ビカット軟化温度の測定
JIS K-7206により、昇温速度50℃/hr、試験荷重50Nで求めた。
(3) Measurement of Vicat softening temperature It was obtained according to JIS K-7206 with a heating rate of 50°C/hr and a test load of 50N.
(4)MEK不溶分の測定
<加熱前>
スチレン系樹脂組成物1gを秤量し、メチルエチルケトン35ミリリットルを加え溶解し、その溶液を遠心分離機(コクサン社製H-2000B(ローター:H))にて、10000rpmで30分間遠心分離して不溶分を沈降せしめ、デカンテーションにより上澄み液を除去して不溶分を得、セーフティーオーブンにて90℃で2時間予備乾燥し、更に真空乾燥機にて120℃で1時間減圧乾燥し、20分間デシケータ中で冷却した後、乾燥した不溶分の質量Gを測定して、不溶分の質量%を算出した。
(4) Measurement of MEK insoluble content <before heating>
1 g of a styrenic resin composition is weighed, 35 ml of methyl ethyl ketone is added and dissolved, and the solution is centrifuged at 10,000 rpm for 30 minutes in a centrifuge (Kokusan H-2000B (rotor: H)) to remove insoluble matter. is allowed to settle, and the supernatant is removed by decantation to obtain an insoluble matter, which is pre-dried in a safety oven at 90°C for 2 hours, further dried in a vacuum dryer at 120°C for 1 hour under reduced pressure, and placed in a desiccator for 20 minutes. After cooling at , the mass G of the dried insoluble matter was measured to calculate the mass % of the insoluble matter.
<加熱後>
スチレン系樹脂組成物1gを秤量し、真空下、230℃のオーブンで3時間の熱処理を行った。その後、上記の加熱前と同様の方法によって不溶分を測定して、不溶分の質量%を算出した。
ゲル状物質は、スチレン系樹脂中のカルボキシル基がポリマー分子間で縮合反応を起こして生成するものと考えられ、メチルエチルケトンには不溶な成分である。
<After heating>
1 g of the styrene-based resin composition was weighed and heat-treated in an oven at 230° C. for 3 hours under vacuum. After that, the insoluble matter was measured by the same method as before heating, and the mass % of the insoluble matter was calculated.
The gel-like substance is considered to be produced by a condensation reaction between polymer molecules of carboxyl groups in the styrene resin, and is an insoluble component in methyl ethyl ketone.
(5)HAZEの測定
スチレン系樹脂組成物のペレットを、東芝機械社製射出成形機(IS130FII-3A)を用いて、シリンダー温度250℃、金型温度50℃にて射出成形した。得られた試験片(厚さ2mm、寸法40mm×40mm)を用い、JIS K-7105に準拠し、ヘーズメーター(日本電色工業社製NDH5000)を用いてHAZE(単位:%)測定を行った。
(5) Measurement of HAZE Pellets of a styrene resin composition were injection molded at a cylinder temperature of 250°C and a mold temperature of 50°C using an injection molding machine (IS130FII-3A) manufactured by Toshiba Machine Co., Ltd. Using the obtained test piece (thickness 2 mm, dimensions 40 mm × 40 mm), HAZE (unit: %) was measured using a haze meter (NDH5000 manufactured by Nippon Denshoku Industries Co., Ltd.) in accordance with JIS K-7105. .
2.実施例・比較例
以下に示す方法で、実施例・比較例を実施した。
2. Examples/Comparative Examples Examples/Comparative Examples were carried out by the methods described below.
<実施例1>
内容積39リットルの完全混合型撹拌槽である第1反応器と内容積39リットルの完全混合型撹拌槽である第2反応器を直列に接続して重合工程を構成した。スチレン71質量%、メタクリル酸12質量%、エチルベンゼン17質量%の混合溶液からなる原料溶液を作成した。
<Example 1>
A polymerization process was constituted by connecting in series a first reactor that was a complete mixing type stirring tank with an internal volume of 39 liters and a second reactor that was a complete mixing type stirring tank with an internal volume of 39 liters. A raw material solution was prepared from a mixed solution of 71% by mass of styrene, 12% by mass of methacrylic acid, and 17% by mass of ethylbenzene.
この原料溶液を毎時12.6kgの割合で第1反応器へ連続的に供給し、各反応器を満液状態で流通した。なお、第1反応器入口で、原料溶液中のスチレンとメタクリル酸の合計量に対して、1,1-ビス(t-ブチルパーオキシ)シクロヘキサン(日本油脂社製パーヘキサC)を質量基準で250ppm混合した。また、第1反応器入口で、エーテル化合物[B-1]を連続的に添加した。各反応器の反応温度は、第1反応器で130℃、第2反応器で140℃となるよう調整した。 This raw material solution was continuously supplied to the first reactor at a rate of 12.6 kg per hour, and flowed through each reactor in a fully liquid state. At the inlet of the first reactor, 250 ppm by mass of 1,1-bis(t-butylperoxy)cyclohexane (Perhexa C manufactured by NOF Corporation) with respect to the total amount of styrene and methacrylic acid in the raw material solution. Mixed. Also, the ether compound [B-1] was continuously added at the inlet of the first reactor. The reaction temperature of each reactor was adjusted to 130°C in the first reactor and 140°C in the second reactor.
続いて、第2反応器より連続的に取り出した共重合体樹脂を含む溶液を直列に2段設置した予熱器付き真空脱揮槽に導入し、未反応モノマー及びエチルベンゼンを分離した後、ストランド状に押し出しして冷却した後、切断してペレットとすることによってスチレン系樹脂組成物を得た。なお、1段目の予熱器付き真空脱揮槽について、予熱器の温度を175℃、真空脱揮槽の圧力を500mmHg、真空脱揮槽のジャケット温度を185℃に設定した。2段目の予熱器付き真空脱揮槽について、予熱器の温度を240℃、真空脱揮槽の圧力を8mmHg、真空脱揮槽のジャケット温度を240℃に設定した。1段目の真空脱揮槽内の樹脂温度は168℃、2段目の真空脱揮槽内の樹脂温度は231℃であった。 Subsequently, the solution containing the copolymer resin continuously taken out from the second reactor is introduced into a vacuum devolatilization tank equipped with a preheater installed in two stages in series, and after separating unreacted monomers and ethylbenzene, a strand is obtained. A styrenic resin composition was obtained by extruding and cooling, and then cutting into pellets. For the first-stage vacuum devolatilization tank with a preheater, the temperature of the preheater was set at 175°C, the pressure of the vacuum devolatilization tank was set at 500 mmHg, and the jacket temperature of the vacuum devolatilization tank was set at 185°C. For the second-stage vacuum devolatilization tank with a preheater, the temperature of the preheater was set at 240°C, the pressure of the vacuum devolatilization tank was set at 8 mmHg, and the jacket temperature of the vacuum devolatilization tank was set at 240°C. The resin temperature in the first-stage vacuum devolatilization tank was 168°C, and the resin temperature in the second-stage vacuum devolatilization tank was 231°C.
得られたスチレン系樹脂組成物について、各種物性を測定した。その結果を表1に示す。 Various physical properties were measured for the obtained styrenic resin composition. Table 1 shows the results.
表1中の構成成分の詳細は、以下の通りである。
エーテル化合物B
B-1:ポリオキシエチレンジスチレン化フェニルエーテル(花王社製、エマルゲンA-90、エチレンオキサイド単位の平均付加数18)
B-2:ポリオキシエチレンジスチレン化フェニルエーテル(花王社製、エマルゲンA-60、エチレンオキサイド単位の平均付加数12)
B-3:ポリオキシエチレンジスチレン化フェニルエーテル(花王社製、エマルゲンA-500、エチレンオキサイド単位の平均付加数50)
B-4:ポリオキシエチレンスチレン化フェニルエーテル(青木油脂工業社製、KTSP-16、エチレンオキサイド単位の平均付加数16)
B-5:ポリオキシエチレンノニルフェニルエーテル(青木油脂工業社製、ブラウノンN-513、エチレンオキサイド単位の平均付加数13)
ポリオキシエチレンアルキルエーテル(ポリオキシエチレンラウリルエーテル)(花王社製、エマルゲン109P、エチレンオキサイド単位の平均付加数9)
Details of the components in Table 1 are as follows.
Ether compound B
B-1: Polyoxyethylene distyrenated phenyl ether (manufactured by Kao Corporation, Emulgen A-90, average number of ethylene oxide units added: 18)
B-2: Polyoxyethylene distyrenated phenyl ether (manufactured by Kao Corporation, Emulgen A-60, average addition number of ethylene oxide units: 12)
B-3: Polyoxyethylene distyrenated phenyl ether (manufactured by Kao Corporation, Emulgen A-500, average addition number of ethylene oxide units: 50)
B-4: Polyoxyethylene styrenated phenyl ether (KTSP-16, manufactured by Aoki Yushi Kogyo Co., Ltd., average addition number of ethylene oxide units: 16)
B-5: Polyoxyethylene nonylphenyl ether (manufactured by Aoki Yushi Kogyo Co., Ltd., Braunon N-513, average addition number of ethylene oxide units: 13)
Polyoxyethylene alkyl ether (polyoxyethylene lauryl ether) (manufactured by Kao Corporation, Emulgen 109P, average number of ethylene oxide units added: 9)
<実施例2~9>
エーテル化合物Bの種類及び/又は添加量を表1に示すように変更した以外は、実施例1と同様の方法でスチレン系樹脂組成物を製造し、各種物性の測定を行った。
<Examples 2 to 9>
A styrenic resin composition was produced in the same manner as in Example 1, except that the type and/or amount of ether compound B was changed as shown in Table 1, and various physical properties were measured.
<実施例10>
原料溶液をスチレン77.1質量%、メタクリル酸5.9質量%、エチルベンゼン17質量%の混合溶液に変更した以外は、実施例1と同様の方法でスチレン系樹脂組成物を製造し、各種物性の測定を行った。
<Example 10>
A styrenic resin composition was produced in the same manner as in Example 1, except that the raw material solution was changed to a mixed solution of 77.1% by mass of styrene, 5.9% by mass of methacrylic acid, and 17% by mass of ethylbenzene. was measured.
<実施例11>
原料溶液をスチレン63.5質量%、メタクリル酸19.5質量%、エチルベンゼン17質量%の混合溶液に変更した以外は、実施例3と同様の方法でスチレン系樹脂組成物を製造し、各種物性の測定を行った。
<Example 11>
A styrenic resin composition was produced in the same manner as in Example 3, except that the raw material solution was changed to a mixed solution of 63.5% by mass of styrene, 19.5% by mass of methacrylic acid, and 17% by mass of ethylbenzene. was measured.
<比較例1~3>
エーテル化合物を添加しない以外は、実施例1,10,11と同様の方法でスチレン系樹脂組成物を製造し、各種物性の測定を行った。
<Comparative Examples 1 to 3>
Styrene-based resin compositions were produced in the same manner as in Examples 1, 10 and 11 except that no ether compound was added, and various physical properties were measured.
<比較例4~6>
エーテル化合物Bの代わりに、ポリオキシエチレンアルキルエーテルを添加した以外は、実施例1,4,10と同様の方法でスチレン系樹脂組成物を製造し、各種物性の測定を行った。
<Comparative Examples 4 to 6>
Styrenic resin compositions were produced in the same manner as in Examples 1, 4 and 10, except that polyoxyethylene alkyl ether was added instead of ether compound B, and various physical properties were measured.
3.考察
全ての実施例は、加熱によるMEK不溶分の増大が非常に小さかった。MEK不溶分は、主にゲル状物質であるので、ゲル状物質の生成が抑制されたことが実証された。
また、実施例1,4,10と比較例4~6を比較すると、エーテル化合物Bの代わりに、ポリオキシエチレンアルキルエーテルを添加した場合には、ビカット軟化温度の低下が著しかった。
3. Discussion All examples showed a very small increase in MEK insoluble content upon heating. Since the MEK-insoluble matter is mainly a gel-like substance, it was demonstrated that the formation of the gel-like substance was suppressed.
Further, when comparing Examples 1, 4 and 10 with Comparative Examples 4 to 6, when polyoxyethylene alkyl ether was added in place of ether compound B, the Vicat softening temperature decreased significantly.
本発明のスチレン系樹脂組成物を用いることで、ゲルが極めて少ない樹脂組成物および成形品を製造することが出来、外観に優れた成形品を得ることが出来る。また、製造工程におけるゲル発生を従来よりも抑えることが出来、生産効率を上げることが出来る。 By using the styrenic resin composition of the present invention, it is possible to produce a resin composition and a molded article with very little gel, and to obtain a molded article excellent in appearance. In addition, it is possible to suppress the generation of gel in the manufacturing process more than before, and to increase the production efficiency.
Claims (11)
前記スチレン系樹脂は、スチレン系単量体と(メタ)アクリル酸系単量体を含む単量体混合物を共重合させて得られ、
前記エーテル化合物は、一般式(1)で表される、スチレン系樹脂組成物。
(式中のZ1~Z5は、同一又は異なっており、水素原子であるか、又はヘテロ原子を有してもよい炭化水素基である。Z1~Z5のうちの少なくとも2つが架橋されて脂環又は芳香環を形成していてもよい。nは、アルキレンオキサイド構造の炭素数を表し、1~10の整数である。Xはアルキレンオキサイド単位の平均付加数を表し、1~100の整数である。) A styrenic resin composition containing a styrenic resin and an ether compound,
The styrene-based resin is obtained by copolymerizing a monomer mixture containing a styrene-based monomer and a (meth)acrylic acid-based monomer,
The styrenic resin composition, wherein the ether compound is represented by the general formula (1).
(Z1 to Z5 in the formula are the same or different and are hydrogen atoms or hydrocarbon groups which may have a heteroatom. At least two of Z1 to Z5 are bridged to form an alicyclic or may form an aromatic ring.n represents the number of carbon atoms in the alkylene oxide structure and is an integer of 1 to 10.X represents the average number of alkylene oxide units added and is an integer of 1 to 100 .)
前記スチレン系樹脂組成物100質量%に対し、前記(メタ)アクリル酸系単量体に由来する構造単位の含有量が0.1~30質量である、スチレン系樹脂組成物。 The styrenic resin composition according to claim 1,
A styrenic resin composition, wherein the content of the structural unit derived from the (meth)acrylic acid-based monomer is 0.1 to 30% by mass with respect to 100% by mass of the styrenic resin composition.
前記スチレン系樹脂組成物100質量%に対し、前記エーテル化合物の含有量が0.001~10質量%である、スチレン系樹脂組成物。 The styrenic resin composition according to claim 1 or 2,
A styrenic resin composition, wherein the content of the ether compound is 0.001 to 10% by mass with respect to 100% by mass of the styrenic resin composition.
Z1~Z5の少なくとも1つが、置換基を有してもよい炭素数1~20のアルキル基である、スチレン系樹脂組成物。 The styrene resin composition according to any one of claims 1 to 3,
A styrenic resin composition wherein at least one of Z1 to Z5 is an optionally substituted alkyl group having 1 to 20 carbon atoms.
前記置換基は、ヘテロ原子を有してもよい炭素数1~20の炭化水素基である、スチレン系樹脂組成物。 The styrenic resin composition according to claim 4,
The styrenic resin composition, wherein the substituent is a hydrocarbon group having 1 to 20 carbon atoms which may have a heteroatom.
前記置換基は、芳香環を含む、請求項5に記載のスチレン系樹脂組成物。 The styrenic resin composition according to claim 5,
6. The styrenic resin composition according to claim 5, wherein said substituent contains an aromatic ring.
前記置換基の芳香環は、前記アルキル基に結合されているフェニル基である、スチレン系樹脂組成物。 The styrenic resin composition according to claim 6,
The styrenic resin composition, wherein the aromatic ring of the substituent is a phenyl group bonded to the alkyl group.
前記置換基は、1-フェニルエチル基である、スチレン系樹脂組成物。 The styrenic resin composition according to claim 7,
The styrenic resin composition, wherein the substituent is a 1-phenylethyl group.
前記アルキレンオキサイド構造の炭素数nが2~4である、スチレン系樹脂組成物。 The styrenic resin composition according to any one of claims 1 to 8,
A styrenic resin composition, wherein the number of carbon atoms n in the alkylene oxide structure is 2 to 4.
前記アルキレンオキサイド単位の平均付加数が5~50である、スチレン系樹脂組成物。 The styrene resin composition according to any one of claims 1 to 9,
The styrenic resin composition, wherein the average number of alkylene oxide units to be added is 5 to 50.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2023109087A JP2023115374A (en) | 2018-08-08 | 2023-07-03 | Styrene-based resin composition and molded article |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018149743A JP2020023650A (en) | 2018-08-08 | 2018-08-08 | Styrene-based resin composition and molded article |
JP2023109087A JP2023115374A (en) | 2018-08-08 | 2023-07-03 | Styrene-based resin composition and molded article |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018149743A Division JP2020023650A (en) | 2018-08-08 | 2018-08-08 | Styrene-based resin composition and molded article |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2023115374A true JP2023115374A (en) | 2023-08-18 |
Family
ID=69618294
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018149743A Pending JP2020023650A (en) | 2018-08-08 | 2018-08-08 | Styrene-based resin composition and molded article |
JP2023109087A Pending JP2023115374A (en) | 2018-08-08 | 2023-07-03 | Styrene-based resin composition and molded article |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018149743A Pending JP2020023650A (en) | 2018-08-08 | 2018-08-08 | Styrene-based resin composition and molded article |
Country Status (1)
Country | Link |
---|---|
JP (2) | JP2020023650A (en) |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3203488A1 (en) * | 1982-02-03 | 1983-08-11 | Basf Ag, 6700 Ludwigshafen | Thermoplastic moulding composition |
JPH07119344B2 (en) * | 1989-06-23 | 1995-12-20 | 旭化成工業株式会社 | Styrene resin composition |
JP3169085B2 (en) * | 1991-06-17 | 2001-05-21 | 大日本インキ化学工業株式会社 | Emulsion paint for building interior and exterior |
JPH0812920A (en) * | 1994-06-28 | 1996-01-16 | Mitsui Toatsu Chem Inc | Resin composition for treating lubricated surface |
JPH09176436A (en) * | 1995-12-22 | 1997-07-08 | Japan Synthetic Rubber Co Ltd | Thermoplastic resin composition |
JP2003073516A (en) * | 2001-08-31 | 2003-03-12 | Kanegafuchi Chem Ind Co Ltd | Aromatic vinyl resin compound |
WO2005097904A1 (en) * | 2004-04-07 | 2005-10-20 | Kaneka Corporation | Thermoplastic resin composition amd moldings thereof |
JP5237640B2 (en) * | 2005-09-20 | 2013-07-17 | 東洋スチレン株式会社 | Aromatic vinyl compound- (meth) acrylic acid copolymer resin-containing composition and method for producing the same |
JP4944581B2 (en) * | 2006-11-17 | 2012-06-06 | ヘンケルジャパン株式会社 | Aqueous resin dispersion |
JP5394158B2 (en) * | 2009-07-29 | 2014-01-22 | 高圧ガス工業株式会社 | Water-based vibration-damping coating composition |
JP5871183B2 (en) * | 2011-10-28 | 2016-03-01 | Dic株式会社 | Lithium ion secondary battery electrode resin composition and lithium ion secondary battery |
-
2018
- 2018-08-08 JP JP2018149743A patent/JP2020023650A/en active Pending
-
2023
- 2023-07-03 JP JP2023109087A patent/JP2023115374A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2020023650A (en) | 2020-02-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7021319B2 (en) | Heat-resistant resin composition and its manufacturing method | |
JP5237640B2 (en) | Aromatic vinyl compound- (meth) acrylic acid copolymer resin-containing composition and method for producing the same | |
JP2017165944A (en) | Method for producing methacrylic resin | |
WO2014065129A1 (en) | Copolymer for improving heat resistance of aromatic vinyl-vinyl cyanide resin | |
WO2013069077A1 (en) | Method for producing styrene-based resin composition comprising highly branched ultra-high-molecular-weight polymer, and composition | |
JP7245334B2 (en) | Maleimide-based copolymer, method for producing the same, and resin composition using the same | |
JP2011225866A (en) | Method for manufacturing styrene-based resin composition containing multibranched polymer of super-high molecular weight, and the composition | |
TW201823340A (en) | Rubber modified styrene-based resin composition and molding product made therefrom | |
JP2023115374A (en) | Styrene-based resin composition and molded article | |
JP7492952B2 (en) | Thermoplastic resin composition and molded article thereof | |
CN116133821A (en) | Maleimide copolymer, maleimide copolymer composition, resin composition, and injection molded article | |
CN107960084B (en) | Resin composition, resin composition for transparent parts of automobile, transparent cover for instrument panel, and hemispherical lens | |
CN106867128B (en) | Thermoplastic resin composition and molded article formed therefrom | |
JP7145271B1 (en) | Transparent rubber-modified styrenic resin composition | |
JP7535857B2 (en) | Styrene copolymer resin | |
WO2022176756A1 (en) | Manufacturing method for heat-resistant resin composition | |
CN109320890B (en) | Rubber-modified styrene resin composition, process for producing the same, and molded article | |
JP5858705B2 (en) | Method for producing styrenic resin composition containing hyperbranched ultrahigh molecular weight substance and composition thereof | |
TW202208541A (en) | Styrene-based resin composition and molded article thereof | |
CN106867127B (en) | Thermoplastic resin composition suitable for vacuum forming and formed product thereof | |
JP2022134223A (en) | Styrene-based resin composition and its compact | |
TW202227549A (en) | Heat-resistant resin composition | |
JP2006306901A (en) | Styrenic resin composition excellent in heat resistance | |
TW202222923A (en) | Production method for heat-resistant resin composition | |
JP2006306902A (en) | Heat-resistant styrenic resin composition |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230703 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230703 |