JP2023085255A5 - - Google Patents

Download PDF

Info

Publication number
JP2023085255A5
JP2023085255A5 JP2023030851A JP2023030851A JP2023085255A5 JP 2023085255 A5 JP2023085255 A5 JP 2023085255A5 JP 2023030851 A JP2023030851 A JP 2023030851A JP 2023030851 A JP2023030851 A JP 2023030851A JP 2023085255 A5 JP2023085255 A5 JP 2023085255A5
Authority
JP
Japan
Prior art keywords
window
failure
components
sensor data
index value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023030851A
Other languages
English (en)
Japanese (ja)
Other versions
JP2023085255A (ja
JP7472344B2 (ja
Filing date
Publication date
Priority claimed from US16/264,034 external-priority patent/US11348813B2/en
Application filed filed Critical
Publication of JP2023085255A publication Critical patent/JP2023085255A/ja
Publication of JP2023085255A5 publication Critical patent/JP2023085255A5/ja
Application granted granted Critical
Publication of JP7472344B2 publication Critical patent/JP7472344B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2023030851A 2019-01-31 2023-03-01 イオン注入半導体製造ツールにおける構成要素の故障の是正 Active JP7472344B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US16/264,034 US11348813B2 (en) 2019-01-31 2019-01-31 Correcting component failures in ion implant semiconductor manufacturing tool
US16/264,034 2019-01-31
PCT/US2020/014197 WO2020159730A1 (en) 2019-01-31 2020-01-17 Correcting component failures in ion implant semiconductor manufacturing tool
JP2021544540A JP7238146B2 (ja) 2019-01-31 2020-01-17 イオン注入半導体製造ツールにおける構成要素の故障の是正

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2021544540A Division JP7238146B2 (ja) 2019-01-31 2020-01-17 イオン注入半導体製造ツールにおける構成要素の故障の是正

Publications (3)

Publication Number Publication Date
JP2023085255A JP2023085255A (ja) 2023-06-20
JP2023085255A5 true JP2023085255A5 (https=) 2023-10-19
JP7472344B2 JP7472344B2 (ja) 2024-04-22

Family

ID=71836669

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2021544540A Active JP7238146B2 (ja) 2019-01-31 2020-01-17 イオン注入半導体製造ツールにおける構成要素の故障の是正
JP2023030851A Active JP7472344B2 (ja) 2019-01-31 2023-03-01 イオン注入半導体製造ツールにおける構成要素の故障の是正

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2021544540A Active JP7238146B2 (ja) 2019-01-31 2020-01-17 イオン注入半導体製造ツールにおける構成要素の故障の是正

Country Status (6)

Country Link
US (2) US11348813B2 (https=)
JP (2) JP7238146B2 (https=)
KR (2) KR102539586B1 (https=)
CN (2) CN113383282B (https=)
TW (2) TWI797418B (https=)
WO (1) WO2020159730A1 (https=)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210133213A1 (en) * 2019-10-31 2021-05-06 Vettd, Inc. Method and system for performing hierarchical classification of data
DE112020001944T5 (de) * 2019-04-11 2022-01-13 Aktiebolaget Skf System und Verfahren zur automatischen Erkennung und Vorhersage von Maschinenausfällen mittels Online-Machine-Learning
US11226805B2 (en) * 2019-07-31 2022-01-18 Dell Products L.P. Method and system for predicting upgrade completion times in hyper-converged infrastructure environments
JP7414589B2 (ja) * 2020-03-04 2024-01-16 住友重機械イオンテクノロジー株式会社 イオン注入装置およびモデル生成方法
WO2022093271A1 (en) * 2020-10-30 2022-05-05 Hitachi Vantara Llc Automated real-time detection, prediction and prevention of rare failures in industrial system with unlabeled sensor data
CN112560327B (zh) * 2020-11-13 2024-03-12 盐城工学院 一种基于深度梯度下降森林的轴承剩余寿命预测方法
WO2022117218A1 (en) * 2020-12-02 2022-06-09 Hitachi Energy Switzerland Ag Prognosis of high voltage equipment
WO2022224693A1 (ja) * 2021-04-19 2022-10-27 パナソニック インテレクチュアル プロパティ コーポレーション オブ アメリカ 製造方法、生成装置、推定装置、識別情報付与方法、及び付与装置
EP4242904B1 (en) * 2021-07-02 2026-04-01 Comet AG Method for machine learning a detection of at least one irregularity in a plasma system
US12506024B2 (en) * 2021-07-08 2025-12-23 Applied Materials, Inc. Method and mechanism for contact-free process chamber characterization
US12247283B2 (en) * 2021-07-09 2025-03-11 Applied Materials, Inc. Method and apparatus for controlled ion implantation
WO2023030807A1 (en) * 2021-09-02 2023-03-09 Asml Netherlands B.V. Method of evaluating selected set of patterns
US20230113095A1 (en) * 2021-10-13 2023-04-13 Applied Materials, Inc. Verification for improving quality of maintenance of manufacturing equipment
US12517479B2 (en) * 2021-12-21 2026-01-06 Applied Materials, Inc. Manufacturing equipment parts quality management system
CN114492184A (zh) * 2022-01-21 2022-05-13 北京科技大学 一种时频域分析航空发动机剩余使用寿命预测方法及装置
US11892821B2 (en) * 2022-03-15 2024-02-06 Applied Materials, Inc. Communication node to interface between evaluation systems and a manufacturing system
JP7564334B2 (ja) * 2022-03-24 2024-10-08 株式会社日立ハイテク 装置診断システム、装置診断装置、半導体装置製造システムおよび装置診断方法
US12259719B2 (en) * 2022-05-25 2025-03-25 Applied Materials, Inc. Methods and mechanisms for preventing fluctuation in machine-learning model performance
JP7759298B2 (ja) * 2022-06-10 2025-10-23 株式会社日立製作所 施設運用支援装置、方法およびプログラム
US20240086597A1 (en) * 2022-09-14 2024-03-14 Applied Materials, Inc. Generation and utilization of virtual features for process modeling
CN116046078A (zh) * 2023-03-31 2023-05-02 东莞市楷德精密机械有限公司 一种半导体清洗设备的故障监测预警方法及系统
US20240355592A1 (en) * 2023-04-24 2024-10-24 Applied Materials, Inc. Uniform plasma processing with a linear plasma source
US11995401B1 (en) 2023-04-30 2024-05-28 The Strategic Coach Inc. Systems and methods for identifying a name
WO2025064622A1 (en) * 2023-09-19 2025-03-27 Eli Lilly And Company Downtime prediction for management of machines in manufacturing network
CN117421679B (zh) * 2023-10-08 2024-06-18 宁波创基机械股份有限公司 一种注塑机周期管控方法、装置、电子设备及存储介质

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0613015A (ja) * 1992-06-25 1994-01-21 Nissin Electric Co Ltd イオン注入装置
JPH08153486A (ja) * 1994-11-29 1996-06-11 Nec Yamagata Ltd イオン注入装置
JP3265969B2 (ja) * 1995-07-07 2002-03-18 日新電機株式会社 イオン注入制御装置
JPH1012180A (ja) * 1996-06-17 1998-01-16 Nissin Electric Co Ltd イオン注入装置のファラディ
US6055460A (en) * 1997-08-06 2000-04-25 Advanced Micro Devices, Inc. Semiconductor process compensation utilizing non-uniform ion implantation methodology
US6895293B2 (en) * 2000-09-14 2005-05-17 Applied Materials, Inc. Fault detection and virtual sensor methods for tool fault monitoring
JP2003077907A (ja) * 2001-08-31 2003-03-14 Toshiba Corp 生産装置の異常停止回避方法及び異常停止回避システム
US6960774B2 (en) * 2003-11-03 2005-11-01 Advanced Micro Devices, Inc. Fault detection and control methodologies for ion implantation processes, and system for performing same
CA2882796A1 (en) * 2007-05-16 2009-02-12 Power Analytics Corporation Real-time predictive systems for intelligent energy monitoring and management of electrical power networks
US8078552B2 (en) * 2008-03-08 2011-12-13 Tokyo Electron Limited Autonomous adaptive system and method for improving semiconductor manufacturing quality
US7755066B2 (en) * 2008-03-28 2010-07-13 Varian Semiconductor Equipment Associates, Inc. Techniques for improved uniformity tuning in an ion implanter system
US8501631B2 (en) * 2009-11-19 2013-08-06 Lam Research Corporation Plasma processing system control based on RF voltage
KR101939288B1 (ko) * 2014-02-12 2019-01-16 에이에스엠엘 네델란즈 비.브이. 프로세스 윈도우를 최적화하는 방법
JP6151227B2 (ja) * 2014-08-25 2017-06-21 株式会社東芝 異常検知システム及び半導体デバイスの製造方法
US9508529B2 (en) * 2014-10-23 2016-11-29 Lam Research Corporation System, method and apparatus for RF power compensation in a plasma processing system
US10430719B2 (en) 2014-11-25 2019-10-01 Stream Mosaic, Inc. Process control techniques for semiconductor manufacturing processes
US10984338B2 (en) * 2015-05-28 2021-04-20 Raytheon Technologies Corporation Dynamically updated predictive modeling to predict operational outcomes of interest
CN105353702B (zh) * 2015-11-17 2020-12-04 国家电网公司 高压设备智能监控系统
FR3046265B1 (fr) * 2015-12-29 2018-08-10 Thales Systeme de surveillance d'une installation industrielle ; procedes de configuration et de surveillance associes
US20170364818A1 (en) * 2016-06-17 2017-12-21 Business Objects Software Ltd. Automatic condition monitoring and anomaly detection for predictive maintenance
US10490116B2 (en) * 2016-07-06 2019-11-26 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, memory device, and display system
KR101744194B1 (ko) 2016-08-19 2017-06-09 인하대학교 산학협력단 반도체 fab 제조공정에서 유클리드 거리를 활용한 웨이퍼 자동 불량 검사 분류 예측 장치 및 방법
US11003518B2 (en) * 2016-09-29 2021-05-11 Hewlett-Packard Development Company, L.P. Component failure prediction
CN106354123A (zh) * 2016-11-01 2017-01-25 武汉理工大学 基于物联网的大型机械设备故障自动检测系统
JP6896432B2 (ja) * 2017-01-11 2021-06-30 株式会社Ｙｅ Ｄｉｇｉｔａｌ 故障予知方法、故障予知装置および故障予知プログラム
TWI632441B (zh) 2017-01-20 2018-08-11 財團法人工業技術研究院 機台的預診斷方法及預診斷裝置
JP6860406B2 (ja) * 2017-04-05 2021-04-14 株式会社荏原製作所 半導体製造装置、半導体製造装置の故障予知方法、および半導体製造装置の故障予知プログラム
CN107024267A (zh) * 2017-04-12 2017-08-08 无锡研测技术有限公司 基于径向基神经网络的称重设备传感器故障检测方法
CN107238507B (zh) * 2017-06-20 2019-12-31 佛山市南海区广工大数控装备协同创新研究院 一种基于深度学习的工业设备故障预测方法
CN108304941A (zh) * 2017-12-18 2018-07-20 中国软件与技术服务股份有限公司 一种基于机器学习的故障预测方法
CN108829933B (zh) * 2018-05-22 2023-04-07 北京天泽智云科技有限公司 一种半导体制造设备的预测性维护与健康管理的方法
CN109102189B (zh) * 2018-08-10 2022-02-11 杨璇 一种电气设备健康管理系统和方法
JP7233201B2 (ja) 2018-11-20 2023-03-06 東京エレクトロン株式会社 搬送ユニットの監視方法及び監視装置並びに監視用モデル

Similar Documents

Publication Publication Date Title
JP2023085255A5 (https=)
JP2022523101A5 (https=)
CN114529247B (zh) 一种流程工业生产过程中的实时报警溯源装置及其方法
JP2021106902A5 (https=)
EP4156115A1 (en) Method and apparatus for identifying product that has missed inspection, electronic device, and storage medium
JPWO2020159730A5 (https=)
WO2018131219A1 (ja) 異常検知装置、異常検知方法、および記憶媒体
JPWO2022250031A5 (https=)
JP2021099582A5 (https=)
CN108491519A (zh) 人机交互方法及装置、存储介质、终端
JPWO2022044210A5 (https=)
JP2022118239A5 (https=)
CN113918430A (zh) 服务器硬件运行状态确定方法、相关装置及程序产品
EP4270277A1 (en) Work behavior recognition system and work behavior recognition method
CN111737067A (zh) 一种硬盘故障预测模型解释方法及装置
CN110347323A (zh) 基于手部姿势来转录增强现实键盘输入
JPWO2016140129A1 (ja) 動作評価装置、動作評価方法、及びプログラム
CN108305688A (zh) 病症评估方法、终端设备及计算机可读介质
JP7085140B2 (ja) 制御装置、制御方法及び制御プログラム
ZA202106805B (en) Monitoring device, display device, monitoring method and monitoring program
CN110389560A (zh) 波形显示装置
JPWO2022254626A5 (https=)
JPWO2021106028A5 (ja) 機械学習装置、機械学習方法、及び、機械学習プログラム
US11176496B2 (en) Future prediction simulation apparatus, method, and computer program
CN113553886A (zh) 用于监视洗手过程的装置、方法以及存储介质