JP2023085255A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2023085255A5 JP2023085255A5 JP2023030851A JP2023030851A JP2023085255A5 JP 2023085255 A5 JP2023085255 A5 JP 2023085255A5 JP 2023030851 A JP2023030851 A JP 2023030851A JP 2023030851 A JP2023030851 A JP 2023030851A JP 2023085255 A5 JP2023085255 A5 JP 2023085255A5
- Authority
- JP
- Japan
- Prior art keywords
- window
- failure
- components
- sensor data
- index value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 13
- 238000004519 manufacturing process Methods 0.000 claims 11
- 238000010801 machine learning Methods 0.000 claims 8
- 230000004044 response Effects 0.000 claims 2
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/264,034 | 2019-01-31 | ||
| US16/264,034 US11348813B2 (en) | 2019-01-31 | 2019-01-31 | Correcting component failures in ion implant semiconductor manufacturing tool |
| PCT/US2020/014197 WO2020159730A1 (en) | 2019-01-31 | 2020-01-17 | Correcting component failures in ion implant semiconductor manufacturing tool |
| JP2021544540A JP7238146B2 (ja) | 2019-01-31 | 2020-01-17 | イオン注入半導体製造ツールにおける構成要素の故障の是正 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021544540A Division JP7238146B2 (ja) | 2019-01-31 | 2020-01-17 | イオン注入半導体製造ツールにおける構成要素の故障の是正 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023085255A JP2023085255A (ja) | 2023-06-20 |
| JP2023085255A5 true JP2023085255A5 (enExample) | 2023-10-19 |
| JP7472344B2 JP7472344B2 (ja) | 2024-04-22 |
Family
ID=71836669
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021544540A Active JP7238146B2 (ja) | 2019-01-31 | 2020-01-17 | イオン注入半導体製造ツールにおける構成要素の故障の是正 |
| JP2023030851A Active JP7472344B2 (ja) | 2019-01-31 | 2023-03-01 | イオン注入半導体製造ツールにおける構成要素の故障の是正 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021544540A Active JP7238146B2 (ja) | 2019-01-31 | 2020-01-17 | イオン注入半導体製造ツールにおける構成要素の故障の是正 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US11348813B2 (enExample) |
| JP (2) | JP7238146B2 (enExample) |
| KR (2) | KR102731064B1 (enExample) |
| CN (1) | CN113383282B (enExample) |
| TW (2) | TWI851071B (enExample) |
| WO (1) | WO2020159730A1 (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20210133213A1 (en) * | 2019-10-31 | 2021-05-06 | Vettd, Inc. | Method and system for performing hierarchical classification of data |
| WO2020210227A1 (en) * | 2019-04-11 | 2020-10-15 | Presenso, Ltd. | Detection and prediction of machine failures using online machine learning |
| US11226805B2 (en) * | 2019-07-31 | 2022-01-18 | Dell Products L.P. | Method and system for predicting upgrade completion times in hyper-converged infrastructure environments |
| JP7414589B2 (ja) * | 2020-03-04 | 2024-01-16 | 住友重機械イオンテクノロジー株式会社 | イオン注入装置およびモデル生成方法 |
| CN116457802A (zh) * | 2020-10-30 | 2023-07-18 | 日立数据管理有限公司 | 利用未被标记的传感器数据对工业系统中的罕见故障的自动实时检测、预测和阻止 |
| CN112560327B (zh) * | 2020-11-13 | 2024-03-12 | 盐城工学院 | 一种基于深度梯度下降森林的轴承剩余寿命预测方法 |
| CN116762045A (zh) * | 2020-12-02 | 2023-09-15 | 日立能源瑞士股份公司 | 高压设备的预断 |
| JPWO2022224693A1 (enExample) * | 2021-04-19 | 2022-10-27 | ||
| EP4242904A3 (en) * | 2021-07-02 | 2023-11-01 | Comet AG | Method for machine learning a detection of at least one irregularity in a plasma system |
| US20230008072A1 (en) * | 2021-07-08 | 2023-01-12 | Applied Materials, Inc. | Method and mechanism for contact-free process chamber characterization |
| US12247283B2 (en) * | 2021-07-09 | 2025-03-11 | Applied Materials, Inc. | Method and apparatus for controlled ion implantation |
| KR20240063109A (ko) * | 2021-09-02 | 2024-05-09 | 에이에스엠엘 네델란즈 비.브이. | 선택된 패턴 세트를 평가하는 방법 |
| US20230113095A1 (en) * | 2021-10-13 | 2023-04-13 | Applied Materials, Inc. | Verification for improving quality of maintenance of manufacturing equipment |
| CN114492184A (zh) * | 2022-01-21 | 2022-05-13 | 北京科技大学 | 一种时频域分析航空发动机剩余使用寿命预测方法及装置 |
| US11892821B2 (en) * | 2022-03-15 | 2024-02-06 | Applied Materials, Inc. | Communication node to interface between evaluation systems and a manufacturing system |
| WO2023181265A1 (ja) * | 2022-03-24 | 2023-09-28 | 株式会社日立ハイテク | 装置診断システム、装置診断装置、半導体装置製造システムおよび装置診断方法 |
| US12259719B2 (en) * | 2022-05-25 | 2025-03-25 | Applied Materials, Inc. | Methods and mechanisms for preventing fluctuation in machine-learning model performance |
| CN116046078A (zh) * | 2023-03-31 | 2023-05-02 | 东莞市楷德精密机械有限公司 | 一种半导体清洗设备的故障监测预警方法及系统 |
| US20240355592A1 (en) * | 2023-04-24 | 2024-10-24 | Applied Materials, Inc. | Uniform plasma processing with a linear plasma source |
| US11995401B1 (en) | 2023-04-30 | 2024-05-28 | The Strategic Coach Inc. | Systems and methods for identifying a name |
| WO2025064622A1 (en) * | 2023-09-19 | 2025-03-27 | Eli Lilly And Company | Downtime prediction for management of machines in manufacturing network |
| CN117421679B (zh) * | 2023-10-08 | 2024-06-18 | 宁波创基机械股份有限公司 | 一种注塑机周期管控方法、装置、电子设备及存储介质 |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0613015A (ja) * | 1992-06-25 | 1994-01-21 | Nissin Electric Co Ltd | イオン注入装置 |
| JPH08153486A (ja) * | 1994-11-29 | 1996-06-11 | Nec Yamagata Ltd | イオン注入装置 |
| JP3265969B2 (ja) * | 1995-07-07 | 2002-03-18 | 日新電機株式会社 | イオン注入制御装置 |
| JPH1012180A (ja) * | 1996-06-17 | 1998-01-16 | Nissin Electric Co Ltd | イオン注入装置のファラディ |
| US6055460A (en) * | 1997-08-06 | 2000-04-25 | Advanced Micro Devices, Inc. | Semiconductor process compensation utilizing non-uniform ion implantation methodology |
| US6895293B2 (en) | 2000-09-14 | 2005-05-17 | Applied Materials, Inc. | Fault detection and virtual sensor methods for tool fault monitoring |
| JP2003077907A (ja) | 2001-08-31 | 2003-03-14 | Toshiba Corp | 生産装置の異常停止回避方法及び異常停止回避システム |
| US6960774B2 (en) | 2003-11-03 | 2005-11-01 | Advanced Micro Devices, Inc. | Fault detection and control methodologies for ion implantation processes, and system for performing same |
| CA2882796A1 (en) * | 2007-05-16 | 2009-02-12 | Power Analytics Corporation | Real-time predictive systems for intelligent energy monitoring and management of electrical power networks |
| US8078552B2 (en) * | 2008-03-08 | 2011-12-13 | Tokyo Electron Limited | Autonomous adaptive system and method for improving semiconductor manufacturing quality |
| US7755066B2 (en) * | 2008-03-28 | 2010-07-13 | Varian Semiconductor Equipment Associates, Inc. | Techniques for improved uniformity tuning in an ion implanter system |
| US8501631B2 (en) * | 2009-11-19 | 2013-08-06 | Lam Research Corporation | Plasma processing system control based on RF voltage |
| CN109283800B (zh) * | 2014-02-12 | 2021-01-01 | Asml荷兰有限公司 | 过程窗口的优化方法 |
| JP6151227B2 (ja) | 2014-08-25 | 2017-06-21 | 株式会社東芝 | 異常検知システム及び半導体デバイスの製造方法 |
| US9508529B2 (en) * | 2014-10-23 | 2016-11-29 | Lam Research Corporation | System, method and apparatus for RF power compensation in a plasma processing system |
| US10430719B2 (en) | 2014-11-25 | 2019-10-01 | Stream Mosaic, Inc. | Process control techniques for semiconductor manufacturing processes |
| US10984338B2 (en) * | 2015-05-28 | 2021-04-20 | Raytheon Technologies Corporation | Dynamically updated predictive modeling to predict operational outcomes of interest |
| CN105353702B (zh) * | 2015-11-17 | 2020-12-04 | 国家电网公司 | 高压设备智能监控系统 |
| FR3046265B1 (fr) * | 2015-12-29 | 2018-08-10 | Thales | Systeme de surveillance d'une installation industrielle ; procedes de configuration et de surveillance associes |
| US20170364818A1 (en) * | 2016-06-17 | 2017-12-21 | Business Objects Software Ltd. | Automatic condition monitoring and anomaly detection for predictive maintenance |
| US10490116B2 (en) * | 2016-07-06 | 2019-11-26 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, memory device, and display system |
| KR101744194B1 (ko) | 2016-08-19 | 2017-06-09 | 인하대학교 산학협력단 | 반도체 fab 제조공정에서 유클리드 거리를 활용한 웨이퍼 자동 불량 검사 분류 예측 장치 및 방법 |
| CN109791511A (zh) | 2016-09-29 | 2019-05-21 | 惠普发展公司,有限责任合伙企业 | 部件故障预测 |
| CN106354123A (zh) * | 2016-11-01 | 2017-01-25 | 武汉理工大学 | 基于物联网的大型机械设备故障自动检测系统 |
| TWI632441B (zh) | 2017-01-20 | 2018-08-11 | 財團法人工業技術研究院 | 機台的預診斷方法及預診斷裝置 |
| JP6860406B2 (ja) | 2017-04-05 | 2021-04-14 | 株式会社荏原製作所 | 半導体製造装置、半導体製造装置の故障予知方法、および半導体製造装置の故障予知プログラム |
| CN107024267A (zh) * | 2017-04-12 | 2017-08-08 | 无锡研测技术有限公司 | 基于径向基神经网络的称重设备传感器故障检测方法 |
| CN107238507B (zh) * | 2017-06-20 | 2019-12-31 | 佛山市南海区广工大数控装备协同创新研究院 | 一种基于深度学习的工业设备故障预测方法 |
| CN108304941A (zh) * | 2017-12-18 | 2018-07-20 | 中国软件与技术服务股份有限公司 | 一种基于机器学习的故障预测方法 |
| CN109102189B (zh) * | 2018-08-10 | 2022-02-11 | 杨璇 | 一种电气设备健康管理系统和方法 |
| JP7233201B2 (ja) | 2018-11-20 | 2023-03-06 | 東京エレクトロン株式会社 | 搬送ユニットの監視方法及び監視装置並びに監視用モデル |
-
2019
- 2019-01-31 US US16/264,034 patent/US11348813B2/en active Active
-
2020
- 2020-01-17 KR KR1020237018033A patent/KR102731064B1/ko active Active
- 2020-01-17 JP JP2021544540A patent/JP7238146B2/ja active Active
- 2020-01-17 WO PCT/US2020/014197 patent/WO2020159730A1/en not_active Ceased
- 2020-01-17 CN CN202080012043.5A patent/CN113383282B/zh active Active
- 2020-01-17 KR KR1020217027568A patent/KR102539586B1/ko active Active
- 2020-01-31 TW TW112108684A patent/TWI851071B/zh active
- 2020-01-31 TW TW109102990A patent/TWI797418B/zh active
-
2022
- 2022-05-27 US US17/827,408 patent/US11862493B2/en active Active
-
2023
- 2023-03-01 JP JP2023030851A patent/JP7472344B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2023085255A5 (enExample) | ||
| CN114529247B (zh) | 一种流程工业生产过程中的实时报警溯源装置及其方法 | |
| WO2018131219A1 (ja) | 異常検知装置、異常検知方法、および記憶媒体 | |
| JPWO2020159730A5 (enExample) | ||
| JP7368189B2 (ja) | 分析装置 | |
| EP4156115A1 (en) | Method and apparatus for identifying product that has missed inspection, electronic device, and storage medium | |
| CN108491519A (zh) | 人机交互方法及装置、存储介质、终端 | |
| JP2022118239A5 (enExample) | ||
| JPWO2022250031A5 (enExample) | ||
| JPWO2021245819A5 (ja) | 学習装置、学習済みモデル生成方法、及び、プログラム | |
| JP2020201871A (ja) | 診断装置 | |
| JPWO2022044210A5 (enExample) | ||
| JP6462847B2 (ja) | 動作評価装置、動作評価方法、及びプログラム | |
| CN113989222A (zh) | 用于处理牙齿数据的方法、装置、设备、介质和产品 | |
| CN115026817B (zh) | 机器人交互方法、装置、电子设备以及存储介质 | |
| CN111737067A (zh) | 一种硬盘故障预测模型解释方法及装置 | |
| EP4270277A1 (en) | Work behavior recognition system and work behavior recognition method | |
| JP7085140B2 (ja) | 制御装置、制御方法及び制御プログラム | |
| JP2021092868A (ja) | 作業工程判別装置及び作業工程判別システム | |
| ZA202106805B (en) | Monitoring device, display device, monitoring method and monitoring program | |
| JP2019184512A (ja) | 波形表示装置 | |
| JPWO2022254626A5 (enExample) | ||
| JP6615424B1 (ja) | 作業員支援装置、作業員支援システム、作業員支援方法、及び作業員支援プログラム | |
| JPWO2021106028A5 (ja) | 機械学習装置、機械学習方法、及び、機械学習プログラム | |
| CN116842155B (zh) | 文本生成方法、文本生成模型的训练方法及装置 |