JP2023043501A - Flowmeter calibration system, substrate processing device and flowmeter calibration method - Google Patents

Abstract

To provide a technology capable of saving calibration work of a flowmeter.SOLUTION: A flowmeter calibration system comprises: a treatment liquid supply line that supplies treatment liquid to a substrate; a flowmeter that detects a flow rate value of the treatment liquid; a treatment liquid discharge line that is provided downstream of the flowmeter, and discharges the treatment liquid; and a control unit that controls the treatment liquid discharge line. The treatment liquid discharge line has a weighing tank that stores the treatment liquid, and a valve that opens and closes a flow path for the treatment liquid that is discharged downward from the bottom part of the weighing tank. The control unit closes the flow path for the treatment liquid with the valve, and calibrates the flow rate value of the flowmeter based on an amount of treatment liquid stored in the weighing tank.SELECTED DRAWING: Figure 2

Description

The present disclosure relates to a flowmeter calibration system, a substrate processing apparatus, and a flowmeter calibration method.

Japanese Unexamined Patent Application Publication No. 2002-200001 discloses a substrate processing apparatus (liquid processing apparatus) that processes a substrate using a processing liquid. This substrate processing apparatus has a flow meter in the supply path of the processing liquid, and controls the flow rate of the processing liquid using the flow rate value detected by the flow meter.

JP-A-2008-98426

The present disclosure provides a technology capable of saving labor in calibration work of flowmeters.

According to one aspect of the present disclosure, a processing liquid supply line for supplying a processing liquid to a substrate, a flow meter provided in the processing liquid supply line for detecting a flow rate value of the processing liquid, and a flow meter downstream of the flow meter a processing liquid discharge line for discharging the processing liquid that has flowed through the processing liquid supply line; and a control section for controlling the processing liquid discharge line, wherein the processing liquid discharge line is provided on the and a valve for opening and closing a flow path of the processing liquid discharged downward from the bottom of the weighing tank, wherein the control unit closes the flow path of the processing liquid by the valve. Accordingly, a flowmeter calibration system is provided that calibrates the flow rate value of the flowmeter based on the amount of the processing liquid stored in the weighing tank.

According to one aspect, it is possible to save labor in calibration work of the flowmeter.

1 is a schematic explanatory diagram showing the overall configuration of a substrate processing apparatus having a flowmeter calibration system according to one embodiment; FIG. FIG. 2 is a schematic explanatory diagram showing a supply mechanism, a discharge mechanism, and a control section that constitute a flowmeter calibration system; 5 is a flow chart showing a flowmeter calibration method; 4 is a timing chart showing operation timings of the flowmeter calibration method; It is explanatory drawing which shows calculation of the correction coefficient in the flowmeter calibration method, (a) is a conceptual diagram of a flow integral value, (b) is a graph which shows the relationship between temperature and the volatilization amount per unit time. FIG. 11 is a schematic explanatory diagram showing a supply mechanism, a discharge mechanism, and a control section that constitute a flowmeter calibration system according to a modification;

Hereinafter, embodiments for carrying out the present disclosure will be described with reference to the drawings. In each drawing, the same components are denoted by the same reference numerals, and redundant description may be omitted.

A substrate processing apparatus 1 according to one embodiment will be described with reference to FIG. The substrate processing apparatus 1 is a liquid processing apparatus that processes a substrate W with a processing liquid L (liquid processing). The substrate W may, for example, be intended for a semiconductor substrate such as a silicon wafer or a compound semiconductor wafer. The substrate W is formed in a disk shape during liquid processing. The substrate W may be a glass substrate, or may be formed in a different shape such as a square plate shape.

The substrate processing apparatus 1 includes a liquid processing unit 2 that actually performs liquid processing on the substrate W, and a controller 9 that controls the liquid processing unit 2 . The liquid processing unit 2 includes a processing container 100 that processes the substrate W, a supply mechanism 50 that supplies the processing liquid L, and a discharge mechanism 70 that discharges the processing liquid L. As shown in FIG. The processing container 100 also includes a cup 20 that collects the processing liquid supplied to the substrate W, a chuck 30 that holds the substrate W in the cup 20 , and a rotation mechanism 40 that rotates the chuck 30 .

The cup 20 has a horizontally wide cylindrical shape with a bottom to accommodate the substrate W, and collects the processing liquid L supplied to the substrate W. As shown in FIG.

The chuck 30 is formed in a disk shape according to the shape of the substrate W. As shown in FIG. The chuck 30 holds the substrate W horizontally. The chuck 30 holds the substrate W so that the center (rotation center) of the chuck 30 and the center of the substrate W are aligned. Although the chuck 30 in FIG. 1 is a mechanical chuck, the chuck 30 may be a vacuum chuck, an electrostatic chuck, or the like.

The rotation mechanism 40 has a rotation shaft 41 that supports the chuck 30 at its upper end, and a rotation drive section 42 connected to the lower end of the rotation shaft 41 . The rotating shaft 41 has an axial center coinciding with the center of the chuck 30 and extends linearly along the vertical direction. The rotation drive unit 42 is connected to the control unit 9 and rotates the substrate W held by the chuck 30 via the rotation shaft 41 when the substrate W is processed with the liquid.

The supply mechanism 50 discharges the processing liquid L onto the substrate W accommodated in the cup 20 . Although the supply mechanism 50 according to the present embodiment supplies one type of processing liquid L to the substrate W, the supply mechanism 50 supplies a plurality of types of processing liquid L to the substrate W in a predetermined order. good too. For example, the substrate processing apparatus 1 can be configured to sequentially supply a chemical liquid, a rinse liquid, and a drying liquid as the processing liquids L of a plurality of types. As a result, the chemical liquid film is first formed on the surface of the substrate W, then the chemical liquid film is replaced with the rinse liquid film, and then the rinse liquid film is replaced with the dry liquid film. be.

The chemical solution is not particularly limited, but for example, DHF (dilute hydrofluoric acid), SC-1 (aqueous solution containing ammonium hydroxide and hydrogen peroxide), SC-2 (aqueous solution containing hydrogen chloride and hydrogen peroxide), etc. mentioned. The chemical solution may be alkaline or acidic. A plurality of types of chemical liquids may be supplied in order. In this case, it is preferable to form the liquid film of the rinse liquid between the formation of the liquid film of the first chemical liquid and the formation of the liquid film of the second chemical liquid.

The rinse liquid is supplied to the surface of the substrate W to wash away the chemical liquid on the surface and form a liquid film of the rinse liquid. Pure water such as DIW (deionized water) is used as the rinse liquid.

The drying liquid is supplied to the surface of the substrate W to wash away the rinsing liquid and form a liquid film of the drying liquid. As the drying liquid, it is preferable to use one having a lower surface tension than the rinsing liquid, thereby suppressing collapse of the uneven pattern due to the surface tension. Examples of the drying liquid include organic solvents such as IPA (isopropyl alcohol).

The supply mechanism 50 is arranged above the chuck 30 and has a nozzle 51 for supplying the processing liquid L from above to the center of the substrate W held by the chuck 30 . The processing liquid L is supplied to the center of the surface of the substrate W being rotated by the rotating mechanism 40, spreads over the entire surface of the substrate W in the radial direction by centrifugal force, and forms a liquid film over the entire surface. The supply mechanism 50 may have a configuration in which a nozzle 51 is prepared for each of the plurality of types of processing liquids L, and each of the processing liquids L is discharged from each nozzle 51 when a plurality of types of processing liquids L are to be discharged. may be discharged.

Further, the supply mechanism 50 is provided outside the cup 20 and includes a nozzle bus 60 in which the nozzles 51 stand by and a moving mechanism 61 that moves the nozzles 51 . The nozzle bath 60 is a concave container with an open top, which accommodates the nozzles 51 and has a receiving space 60 a for temporarily receiving the treatment liquid L discharged from the nozzles 51 . The volume of the receiving space 60a of the nozzle bath 60 is smaller than the volume of the cup 20 and a weighing tank 86 (see FIG. 2) which will be described later.

The moving mechanism 61 has a processing position (for example, the position indicated by the solid line in FIG. 1) at which the processing liquid L is discharged onto the substrate W, and a waiting position (for example, indicated by the dashed line in FIG. 1) at which the processing liquid L is discharged to the nozzle bath 60. position) and the nozzle 51 is moved. The moving mechanism 61 has, for example, a swivel arm 62 that holds the nozzle 51 and a swivel mechanism (not shown) that swivels the swivel arm 62 . The turning mechanism may also serve as a mechanism for raising and lowering the turning arm 62 . The swivel arm 62 is arranged horizontally, holds the nozzle 51 at one end in the longitudinal direction, and is swiveled about a swivel axis extending downward from the other end in the longitudinal direction. In addition, the moving mechanism 61 may be configured to have a guide rail and a linear motion mechanism instead of the turning arm 62 and the turning mechanism. The guide rails are arranged horizontally, and a direct-acting mechanism moves the nozzle 51 along the guide rails.

As shown in FIGS. 1 and 2 , the supply mechanism 50 has a processing liquid supply line 52 that supplies the processing liquid L to the nozzles 51 . The processing liquid supply line 52 forms a continuous path of the processing liquid L by connecting a plurality of pipes having flow paths inside. The inner diameter of the flow path of the processing liquid supply line 52 is set to a moderately small dimension (thin diameter) in order to prevent the processing liquid L from breaking (intermittent flow).

An upstream end of the processing liquid supply line 52 is connected to a processing liquid supply source (not shown). A downstream end of the processing liquid supply line 52 is connected to the nozzle 51 . The supply mechanism 50 also has a flow meter 54 , a flow control valve 55 , and a supply-side valve 56 in order from the upstream (processing liquid supply source) side of the processing liquid supply line 52 toward the downstream (nozzle 51 ) side.

The supply mechanism 50 supplies the processing liquid L from the processing liquid supply source to the nozzle 51 via the processing liquid supply line 52 based on the control of the flow control valve 55 and the supply side valve 56 by the control unit 9 . The processing liquid supply source preferably has a mechanism for sending out the processing liquid L in a pressurized state (for example, a mechanism for pumping the processing liquid L based on supply of an inert gas). The treatment liquid L may be pressure-fed by a pump (not shown). Further, the supply mechanism 50 may have a dilution structure for diluting the treatment liquid L with pure water such as DIW, upstream of the treatment liquid supply source or at the treatment liquid supply source itself.

The flow meter 54 measures the flow rate of the processing liquid L passing through the flow path of the processing liquid supply line 52 and transmits the measured flow rate value (measurement result) to the controller 9 . An appropriate flowmeter 54 may be used according to the type of the treatment liquid L to be measured, and an electromagnetic flowmeter, an ultrasonic flowmeter, or the like can be used. In the illustrated example, the flowmeter 54 is provided on the upstream side of the flow rate adjustment valve 55 , but the flowmeter 54 may be provided between the supply side valve 56 and the flow rate adjustment valve 55 and may It may be provided downstream.

The flow rate adjustment valve 55 adjusts the supply amount of the processing liquid L discharged from the nozzle 51 onto the substrate W by controlling the flow rate of the processing liquid L in the processing liquid supply line 52 . Although the flow control valve 55 is not particularly limited, it is preferable to apply a constant pressure valve connected to an electropneumatic regulator (not shown). In this case, the control unit 9 calculates the deviation between the flow rate value of the flow meter 54 and its target value, and performs an operation to achieve the secondary side pressure of the constant pressure valve according to the target value based on the calculated deviation. Seek pressure. Then, the control unit 9 controls the electropneumatic regulator to supply the obtained operating pressure to the pilot port, thereby adjusting the flow rate of the processing liquid L so that the flow rate value of the flow meter 54 is constant at the target value. do. The controller 9 controls the processing liquid L to flow at a flow rate in the range of 75 mL/min to 300 mL/min, for example.

The supply-side valve 56 allows the flow of the processing liquid L by opening the flow path of the processing liquid supply line 52, and blocks the flow of the processing liquid L by closing the flow path of the processing liquid supply line 52. . That is, the processing liquid supply line 52 discharges the processing liquid from the nozzle 51 based on the opening of the supply side valve 56 . Note that the supply side valve 56 and the flow control valve 55 may be integrated.

The substrate processing apparatus 1 having the supply mechanism 50 described above controls the flow rate adjustment valve 55 according to the flow rate value detected by the flow meter 54 by the controller 9 when liquid processing the substrate W, and the flow rate of the processing liquid L is to adjust. The flowmeter 54 is calibrated using the actual processing liquid L when the substrate processing apparatus 1 is installed or maintained. Thereby, the substrate processing apparatus 1 can adjust the flow rate of the processing liquid L with high accuracy. In calibrating the flow rate value of the flow meter 54 , the supply mechanism 50 circulates the processing liquid L from the processing liquid supply source to the nozzle 51 via the processing liquid supply line 52 . Therefore, the supply mechanism 50 can be said to be part of the flowmeter calibration system 10 that calibrates the flow rate value of the flowmeter 54 .

Returning to FIG. 1, the discharge mechanism 70 of the substrate processing apparatus 1 discharges the processing liquid L discharged from the nozzle 51 from the substrate processing apparatus 1 and discards or collects it. The discharge mechanism 70 includes a processing vessel side discharge portion 71 connected to the cup 20 and a bus side discharge portion 75 connected to the nozzle bus 60 .

The processing container-side discharge portion 71 has a liquid discharge port 72 and an exhaust port 73 projecting vertically downward from the bottom portion 21 of the cup 20 . The liquid discharge port 72 is connected to a processing liquid discharge line 77 provided outside the cup 20 , and discharges the processing liquid L in the processing space 20 a that has been shaken off the substrate W to the outside of the cup 20 . The treatment liquid discharge line 77 constitutes a continuous path of the treatment liquid L by connecting a plurality of pipes having flow paths inside. On the other hand, the exhaust port 73 is connected to an exhaust line 74 provided outside the cup 20 and exhausts the gas in the processing space 20 a to the outside of the cup 20 .

The bath-side discharge portion 75 has a drain port 76 projecting vertically downward from the bottom of the nozzle bath 60 . The drain port 76 is also connected to the processing liquid drain line 77 . That is, the processing liquid discharge line 77 includes a container side discharge line 77A connected to the liquid discharge port 76 of the processing container side discharge section 71 and a bath side liquid discharge line 77A connected to the liquid discharge port 76 of the bus side discharge section 75. and lines 77B. The container-side drain line 77A and the bus-side drain line 77B may merge.

The bus-side drainage line 77B is installed below the installation position of the nozzle bath 60 in the vertical direction. As shown in FIG. 2, the bus-side drainage line 77B according to the present embodiment is a structural part that measures the processing liquid L discharged from the nozzle 51 to the nozzle bath 60 in calibrating the flow rate value of the flow meter 54. have. That is, the bus-side discharge unit 75 can be said to be part of the flowmeter calibration system 10 that calibrates the flow rate value of the flowmeter 54 .

The inner diameter of the flow path of the bus-side drain line 77B is preferably set to a moderately small dimension (thin diameter) in order to prevent the treatment liquid L from being torn off (intermittent flow). The internal diameter of the flow path of the bus-side drainage line 77B is preferably set within a range of 5 mm to 20 mm, for example.

The bus-side drainage line 77B is connected to the nozzle bus 60 and has a drainage upstream valve 78, a weighing unit 80, and a drainage downstream valve 79 in order from the upstream side through which the processing liquid L flows to the downstream side. Prepare.

The drainage upstream valve 78 is installed at a position above the bus-side drainage line 77B (for example, the lower end of the drainage port 76). The drainage upstream valve 78 closes the channel in a normal state, and blocks the discharge of the processing liquid L from the nozzle bath 60 to the bus-side drainage line 77B. Then, the drainage upstream valve 78 opens the flow path based on the open command from the control unit 9, thereby discharging the treatment liquid L from the nozzle bus 60 to the bus-side drainage line 77B. Further, it is preferable that the drainage upstream valve 78 is internally provided with an orifice having an inner diameter through which air can easily flow. As a result, when the processing liquid L is discharged from the nozzle bath 60 to the bath-side drainage line 77B, air can be discharged from the bath-side drainage line 77B (the weighing unit 80, etc.) to the nozzle bath 60, and the processing liquid L can be discharged. It can stably flow downstream.

The weighing unit 80 is a portion that weighs the processing liquid L flowing through the bus-side drain line 77B when the flow meter 54 is calibrated. The weighing unit 80 branches the bus-side drain line 77B into two paths between the drain upstream valve 78 and the drain downstream valve 79 . Specifically, the weighing unit 80 includes a branch portion 81, a first line 82 and a second line 83 branched from the branch portion 81, a connection portion 84 where the first line 82 and the second line 83 join, and a connection and a confluence line 85 extending from the portion 84 . Further, the first line 82 has a weighing tank 86 in which the processing liquid L can be temporarily stored at an intermediate position. The second line 83 has two liquid level sensors 87 for detecting the liquid level of the treatment liquid L at intermediate positions.

The branch portion 81 connects the bus-side drainage line 77B on the upstream side (primary side) of the branch portion 81, the first line 82, and the second line 83. As shown in FIG. The flow path of the bus-side drainage line 77B on the primary side, the flow path of the first line 82, and the flow path of the second line 83 communicate with each other within the branch portion 81. As shown in FIG.

The primary-side bus-side drainage line 77B extends horizontally, and the upper ends of the first line 82 and the upper end of the second line 83 branch from substantially the same height and extend vertically. placed at the same height. As a result, the flowmeter calibration system 10 can equalize the pressure of the processing liquid L flowing into the first line 82 and the second line 83, and the processing liquid in the first line 82 and the second line 83 can be adjusted. It is possible to suppress the misalignment of the surface.

A step 81 a is formed inside the branch portion 81 so that the connection space of the second line 83 is higher than the connection space of the first line 82 . Therefore, the treatment liquid L is restricted from flowing from the bus-side drainage line 77B on the primary side to the second line 83 via the branch 81, and only the treatment liquid L that has flowed through the weighing tank 86 flows from the lower side. It starts to flow in. A vent portion (not shown) that can discharge gas to the outside by being open to the atmosphere may be provided in the upper portion of the branch portion 81 or the second line 83 .

A weighing tank 86 provided in the first line 82 is formed in a tubular shape (cylindrical or rectangular tubular shape) with a bottom portion 861 and a ceiling portion 862 closed, and has a storage space 86a inside. The weighing tank 86 is fixed to an appropriate structure of the substrate processing apparatus 1 so that its axis extends in the vertical direction. The inner peripheral surface of the weighing tank 86 surrounding the storage space 86a is set to have a constant inner diameter (cross-sectional area) along the vertical direction. Therefore, the weighing tank 86 is formed such that the volume of the storage space 86a changes at a constant rate along the vertical direction.

This weighing tank 86 is preferably made of a metal material (for example, stainless steel) or quartz, which has high molding accuracy and can suppress deformation due to temperature change. This minimizes measurement errors caused by machining errors of the weighing tank 86 and environmental errors. Alternatively, the weighing tank 86 may be made of a resin material. In this case, when calibrating the flow rate value of the flow meter 54, the control unit 9 may correct the storage volume by accumulating the temperature correction coefficient for the expansion of the resin tank according to the temperature.

The ceiling portion 862 of the weighing tank 86 is connected to the inflow pipe 821 of the first line 82 for inflowing the processing liquid L into the storage space 86a. An outflow pipe 822 of the first line 82 for outflowing the liquid L is connected. The inflow pipe 821 and the outflow pipe 822 are arranged in the axial center of the weighing tank 86 .

The inflow pipe 821 extends from the ceiling portion 862 through the storage space 86a to a position near the bottom portion 861, and has a discharge port 821a for discharging the processing liquid L at its extending end (lower end). The processing liquid L discharged from the discharge port 821a of the inflow pipe 821 into the storage space 86a can be prevented from splashing during supply. Also, the inflow pipe 821 extending to the vicinity of the bottom portion 861 functions as a partition that prevents the liquid surface of the processing liquid L from shaking.

The outflow pipe 822 communicates with the storage space 86 a of the weighing tank 86 , extends from the bottom portion 861 of the weighing tank 86 and is connected to the connection portion 84 . The connection part 84 can apply a 3-port connector that connects the first line 82 , the second line 83 and the junction line 85 .

On the other hand, the second line 83 of the weighing section 80 extends continuously from the branching section 81 to the connecting section 84 and is composed of a transparent tube having an inner diameter smaller than the inner diameter of the weighing tank 86 . It is preferable that the second line 83 have a rigidity capable of suppressing deformation of the shape. For example, the second line 83 may be made of quartz.

The second line 83 is fixed to an appropriate structure of the substrate processing apparatus 1 so as to be horizontally adjacent to the weighing tank 86 . At least the same height position as the weighing tank 86 in the second line 83 (hereinafter referred to as a weighing area 83X) extends linearly along the vertical direction. The liquid level of the second line 83 increases from the lower (downstream) side as the processing liquid L is dammed up by the blockage of the drainage downstream valve 79 . That is, the flowmeter calibration system 10 accumulates the processing liquid L in both the weighing tank 86 of the first line 82 and the second line 83 in calibrating the flow rate value of the flowmeter 54 .

A range from the weighing region 83X to the connecting portion 84 (hereinafter referred to as a downstream region 83Y) in the second line 83 has as little pressure loss as possible. For example, the weighing unit 80 adjusts the inner diameter (cross-sectional area of flow path) and extension length of the outflow pipe 822 and the inner diameter (cross-sectional area of flow path) and extension length of the downstream region 83Y. It is possible to reduce the pressure loss as much as possible. As the pressure loss of the treatment liquid L is smaller, the deviation between the liquid level of the first line 82 and the liquid level of the second line 83 is suppressed.

The second line 83 has two liquid level sensors 87 at different positions in the vertical direction of the weighing area 83X. Hereinafter, of the two liquid level sensors 87, the one positioned vertically below is referred to as a first liquid level sensor 871, and the one positioned vertically above the first liquid level sensor 871 is referred to as a second liquid level sensor 872. .

The first liquid level sensor 871 is located above the bottom 861 of the weighing tank 86 and detects the liquid level of the processing liquid L accumulated in the second line 83 . The second liquid level sensor 872 is positioned above the first liquid level sensor 871 by a predetermined distance and below the ceiling portion 862 of the weighing tank 86 to detect the liquid level of the processing liquid L accumulated in the second line 83. to detect For the first liquid level sensor 871 and the second liquid level sensor 872, for example, an optical sensor capable of optically detecting the presence or absence of the processing liquid L can be applied.

Note that the first liquid level sensor 871 and the second liquid level sensor 872 are not limited to optical sensors, and various sensors can be applied. Other liquid level sensors 87 include, for example, an ultrasonic sensor, a microwave sensor, a pressure level sensor that monitors bubbling and pressure of the processing liquid L, and a detector such as an electrode or a float that contacts the processing liquid L. A wetted type sensor that

The drain downstream valve 79 is installed near the connecting portion 84 in the confluence line 85 of the bus-side drain line 77B. The drainage downstream valve 79 opens the flow path in a normal state, and discharges the processing liquid L toward the downstream side of the bus-side drainage line 77B. Then, the drainage downstream valve 79 closes the flow path based on the closing command from the control unit 9, thereby blocking the discharge of the treatment liquid L to the downstream side of the bus-side drainage line 77B. When the processing liquid L is stored in the weighing tank 86 to calibrate the flow meter 54, the control unit 9 closes the drainage downstream valve 79, so that both the first line 82 and the second line 83 are closed. The processing liquid L is stored in .

The flowmeter calibration system 10 may also include a temperature adjustment mechanism 88 capable of adjusting the temperatures of the second line 83 and the weighing tank 86 . The temperature adjustment mechanism 88 is not particularly limited, and can be configured by, for example, appropriately combining a heater that heats the processing liquid, a cooler that cools the processing liquid, and the like. The temperature adjustment mechanism 88 adjusts the temperature under the control of the control unit 9, and sets the temperature of the processing liquid L in the weighing tank 86 to the same temperature as the substrate W during the liquid processing. This makes it possible to reduce the temperature error of the treatment liquid as much as possible in calibrating the flow rate value of the flow meter 54 . For example, when a heater is used as the temperature adjustment mechanism 88, a ribbon heater wrapped around the outside of the weighing tank 86 can be used.

In addition, the flowmeter calibration system 10 causes the nozzle 51 to directly contact the drain port 76 and seals the contact portion when calibrating the flow rate value of the flowmeter 54 , so that the processing liquid L is supplied to the receiving space 60 a of the nozzle bath 60 . The processing liquid L may flow through the bus-side drainage line 77B without being stored. As a result, it is possible to prevent the treatment liquid L from being torn off from the nozzle bath 60 toward the bath-side drainage line 77B.

In this case, it is preferable that the bus-side discharge section 75 has a vent structure 65 capable of discharging the air accumulated in the weighing tank 86 or the like from the bus-side drain line 77B. For example, the vent structure 65 branches from the upper end of the second line 83 (above the weighing region 83X) and is a confluence line 85 downstream of the drainage downstream valve 79 (downstream of the bus side drainage line 77B). ) is provided with a vent line 65a connected to . In addition, a vent valve 65b for opening and closing the vent line 65a is provided in the middle of the vent line 65a.

The flowmeter calibration system 10 closes the drainage downstream valve 79 and opens the drainage upstream valve 78 and the vent valve 65b when weighing in the weighing unit 80 . As a result, it becomes possible to stably remove the air accumulated in the second line 83 and the weighing tank 86 . Of course, the vent structure 65 may be provided in a configuration in which the nozzle 51 does not come into direct contact with the liquid discharge port 76 .

Returning to FIG. 1 , the control unit 9 has a controller main body 91 that controls the entire substrate processing apparatus 1 and a user interface 94 connected to the controller main body 91 . A computer having one or more processors 92 , memory 93 , input/output interfaces and electronic circuits (not shown) can be applied to the controller body 91 . The processor 92 is a combination of one or more of a CPU, an ASIC, an FPGA, circuits made up of multiple discrete semiconductors, and the like. The memory 93 includes volatile memory and nonvolatile memory (for example, compact disc, DVD, hard disk, flash memory, etc.), and stores recipes such as programs for operating the substrate processing apparatus 1 and process conditions.

The controller main body 91 causes the processor 92 to execute a program stored in the memory 93, thereby controlling each component such as the rotation mechanism 40, the supply mechanism 50, the movement mechanism 61, and the discharge mechanism 70 when the substrate W is subjected to liquid processing. control behavior. Further, the controller body 91 implements a flowmeter calibration method for calibrating the flow rate value of the flowmeter 54 based on the execution of the program. That is, the controller 9 can be said to be part of the flowmeter calibration system 10 .

The user interface 94 includes a keyboard for a user to input commands for managing the substrate processing apparatus 1, a display for visualizing and displaying the operating status of the substrate processing apparatus 1, or a touch panel having both display and input functions. etc. can be applied.

The substrate processing apparatus 1 according to this embodiment is basically configured as described above, and its operation (flowmeter calibration method) will be described below.

In calibrating the flow rate value of the flow meter 54, the control unit 9 of the substrate processing apparatus 1 performs different processes during installation or maintenance of the substrate processing apparatus 1 and during daily operation of the substrate processing apparatus 1. implement. Hereinafter, the processing performed during installation or maintenance of the substrate processing apparatus 1 will be referred to as reference calibration mode, and the processing performed during daily operation of the substrate processing apparatus 1 will be referred to as soundness check mode.

The control unit 9 selects the reference calibration mode and the soundness check mode by, for example, identifying a status register (not shown) for the flowmeter calibration method provided in the memory 93 . The status register raises a flag for the reference calibration mode by an operator's (user's) execution operation via the user interface 94 in the initial setting and maintenance of the substrate processing apparatus 1 . When the control unit 9 recognizes the rise of this flag, it starts the reference calibration mode at an appropriate timing. In addition, the status register automatically raises the flag for the soundness check mode after starting up during normal operation of the substrate processing apparatus 1 . When the control unit 9 recognizes that the flag has risen, it starts the soundness check mode at an appropriate timing. Note that the soundness check mode may also be executed based on the user's operation.

As shown in FIG. 3, when the flowmeter 54 calibration method is started, the control unit 9 first determines whether or not to implement the reference calibration mode (implementation of the reference calibration mode or the soundness check mode) (step S1 ). If the reference calibration mode is to be performed (step S1: YES), the controller 9 proceeds to step S2.

In step S2, the control unit 9 puts the nozzle 51 on standby in the nozzle bus 60, and guides the processing liquid L to the weighing unit 80 through the processing liquid supply line 52, the nozzle 51, the nozzle bus 60, and the bus-side drainage line 77B. , storage of the treatment liquid L in the weighing unit 80 is started. At this time, for example, the controller 9 fully opens the flow control valve 55 of the supply mechanism 50 to guide the processing liquid in the processing liquid supply line 52 to the bus-side drainage line 77B.

At this time, the control unit 9 first switches the drain upstream valve 78 from the closed state to the open state as shown at time t1 in FIG. By allowing the treatment liquid L to pass through, the residue (gas, liquid) remaining in the weighing unit 80 is discharged. Then, at time t2 in FIG. 4 after a predetermined time has elapsed from time t1, the drain downstream valve 79 is switched from the open state to the closed state. As a result, the processing liquid L begins to be stored in the confluence line 85 on the upstream side of the drainage downstream valve 79, and when the processing liquid L further exceeds the connection portion 84, the outflow pipe 822 of the first line 82 and the second line 83 The processing liquid L is stored in the downstream region 83Y of the .

As a result, the processing liquid L gradually accumulates from below the weighing tank 86 and the second line 83 in the vertical direction. As described above, in the weighing unit 80, the pressure loss of the processing liquid L in the outflow pipe 822 and the downstream region 83Y of the second line 83 is minimized, and the pressure applied to the processing liquid L is substantially the same. ing. Therefore, the liquid level of the treatment liquid L in the weighing tank 86 and the liquid level of the weighing area 83X of the second line 83 rise at the same height. Furthermore, since the inside of the branching portion 81 has a step 81a, the processing liquid L is prevented from flowing into the second line 83 from the branching portion 81, and erroneous detection by the liquid level sensor 87 can be prevented.

After the drainage downstream valve 79 is closed, when the processing liquid L accumulates in the weighing tank 86 and the weighing region 83X of the second line 83, at time t3 in FIG. The liquid level of the processing liquid L is detected. The control unit 9 starts measuring the flow rate value by the flow meter 54 of the supply mechanism 50 based on the detection of the liquid level of the treatment liquid L by the first liquid level sensor 871 (see also step S3 in FIG. 3). .

After that, the processing liquid L continues to accumulate in the weighing tank 86 and the weighing region 83X of the second line 83, so that the liquid level of the processing liquid L rises. In this process as well, the controller 9 continues to accumulate the flow rate value of the treatment liquid L by the flow meter 54 . At time t4 in FIG. 4, the second liquid level sensor 872 of the second line 83 detects the liquid level of the treatment liquid L. As shown in FIG. The control unit 9 stops measuring the flow rate value of the flow meter 54 by receiving detection of the liquid level of the treatment liquid L by the second liquid level sensor 872 (see also step S4 in FIG. 3). At this time, the control unit 9 also closes the supply side valve 56 and the drainage upstream valve 78 to prohibit the processing liquid L from flowing into the weighing unit 80 . After the second liquid level sensor 872 detects the liquid level, the control unit 9 continues to store the processing liquid L in the weighing unit 80 by keeping the drainage upstream valve 78 open for a predetermined period of time, and drains the processing liquid L after the predetermined period of time. The liquid upstream valve 78 may be closed.

Then, in step S5 of FIG. 3, the control unit 9 calculates the flow integral value for calibration of the flow meter 54 from time t3 to time t4 (the period during which the storage volume set in the weighing tank 86 is reached), A correction coefficient is calculated based on the integrated value. That is, as shown in FIG. 5, the flow rate value accumulated over the integration period of the first detection timing by the first liquid level sensor 871 and the second detection timing by the second liquid level sensor 872 is corresponds to the storage volume (storage amount) of the processing liquid L that has increased at . Further, the accumulation of the flow rate values from time t3 to time t4 corresponds to the flow rate integral value obtained by integrating the integration period and the flow rate value of the flow meter 54. FIG. The storage volume of the treatment liquid L in the weighing tank 86 and the second line 83 (weighing area 83X) between the first liquid level sensor 871 and the second liquid level sensor 872 is the volume of the weighing tank 86 and the volume of the second line 83. is predefined according to Therefore, when the calibration flow rate integrated value is A and the storage volume is B, the correction coefficient C for the flow rate value of the flow meter 54 can be obtained by the following equation (1).
C=B/A (1)

In this embodiment, the storage volume B of the weighing unit 80 is defined by adding the volume of the weighing tank 86 and the volume of the second line 83 . However, when the volume of the second line 83 between the first liquid level sensor 871 and the second liquid level sensor 872 is sufficiently smaller than the volume of the weighing tank 86, the storage volume B of the weighing unit 80 is set to the capacity of the weighing tank 86. Only volume may be used.

Further, volatilization may occur in the weighing tank 86 depending on the type of the treatment liquid L. In FIG. 5A, the volatilization amount D is indicated by a dotted line. The control unit 9 preferably obtains the correction coefficient C based on the volatilization amount D, the calibration flow integral value A, and the storage volume B. For example, the correction coefficient C can be obtained by the following equation (2).
C=(B+D)/A (2)

In order to obtain the volatilization amount D, the control unit 9 prestores map information MI of the volatilization amount D corresponding to the type of the treatment liquid L. FIG. For example, the map information MI of the volatilization amount D may be a table or function indicating the relationship between the temperature of the treatment liquid L and the volatilization amount per unit time. FIG. 5B illustrates a graph showing the relationship between the temperature and the volatilization amount per unit time.

The controller 9 measures the temperature at the time of calibration and the period from the first detection timing by the first liquid level sensor 871 to the second detection timing by the second liquid level sensor 872 . Then, the control unit 9 extracts the amount of volatilization per unit time based on the temperature at the time of calibration from the map information MI, and integrates the extracted amount of volatilization per unit time with the period to obtain the amount of volatilization generated at the time of calibration. can be calculated with high accuracy.

Returning to FIG. 3, after calculating the correction coefficient C of the flowmeter 54, the control unit 9 stores the correction coefficient C in the memory 93 and terminates the reference calibration mode. The correction coefficient C stored in the memory 93 is used when the flow meter 54 measures the flow rate value of the processing liquid L in liquid processing of the substrate W. FIG. That is, the control unit 9 obtains an accurate flow rate value of the treatment liquid L by correcting the flow rate value by integrating the correction coefficient C with the received flow rate value. Then, the control unit 9 can accurately adjust the supply amount of the processing liquid L to the substrate W by controlling the flow rate adjustment valve 55 based on this flow rate value.

If the control unit 9 executes the soundness check mode (step S1 in FIG. 3: NO), the process proceeds to step S6. Steps S6 to S8 perform the same processing as the processing flow of steps S2 to S4 described above. Therefore, detailed description is omitted. When the weighing by the weighing unit 80 (detection of the treatment liquid L by the second liquid level sensor 872) is completed in step S8, the process proceeds to step S9.

In step S<b>9 , the controller 9 calculates the reproducibility of the flow meter 54 . The reproducibility of the flowmeter 54 is calculated as an indicator of whether or not the same flow rate integral value is obtained when the same evaluation is performed during operation for the calibration flow rate integral value A obtained in the reference calibration mode. It is something to do. For example, when the reproducibility of the flow meter 54 is E, and the check flow integral value in the soundness check mode is F, the reproducibility E is obtained by using the calibration flow integral value A, using the following equation (3 ) can be calculated.
E = (FA) / A × 100 [%] (3)

After calculating the reproducibility E, the control unit 9 determines whether or not the reproducibility E is within a predetermined tolerance (for example, within ±5%) (step S10). If the reproducibility E is within the tolerance (step S10: YES), the controller 9 determines that the flowmeter calibration system 10 is normal. As a result, the control unit 9 terminates the soundness check mode and shifts to liquid processing of the substrate W by the substrate processing apparatus 1 .

On the other hand, if the reproducibility E exceeds the allowable range (step S10: NO), the controller 9 determines that the flowmeter calibration system 10 is abnormal. At this time, the control unit 9 notifies the user of an alert via the user interface 94 (step S11). Thereby, the user can take appropriate measures according to the abnormality of the flowmeter calibration system 10 .

The flowmeter calibration system 10, the substrate processing apparatus 1, and the flowmeter calibration method according to the present embodiment are not limited to the above-described embodiments, and various modifications can be made. For example, the drain downstream valve 79 is not limited to being provided downstream of the weighing tank 86 via the outflow pipe 822 , and may be provided at the bottom 861 of the weighing tank 86 . In this case, the second line 83 may be configured to communicate with the bottom portion 861 and store the processing liquid.

Further, for example, instead of the liquid level sensor 87, the weighing unit 80 may employ a camera or sensor (not shown) capable of analog (linear) measurement of the liquid level of the treatment liquid L in the weighing tank 86. FIG. As an example, in the flow meter calibration method, after the processing liquid L is stored in the weighing tank 86 to the measurement start position under camera monitoring, the processing liquid L is discharged from the measurement start position for a predetermined integration period, and the processing liquid L is discharged from the measurement start position by the camera. Measure the measurement end position of the liquid level of L. Then, the control unit 9 calculates the flow rate based on the flow rate integral value A for calibration or the flow rate integral value F for checking during the integration period of the flow meter 54 and the measured amount of increase (the amount from the measurement start position to the measurement end position). Calibration of the meter 54 flow rate value can be performed.

Alternatively, the weighing unit 80 may measure the weight of the treatment liquid L stored in the weighing tank 86 and use this weight to calibrate the flow rate value of the flowmeter 54 . For example, the weighing unit 80 suspends the weighing tank 86 from a horizontal bar via a strain gauge 89 (weight measuring unit: see two-dot chain line in FIG. 2). Weight can be easily measured. Since the measured weight of the treatment liquid L is proportional to the flow rate of the treatment liquid L that has passed through the flowmeter 54, the controller 9 can calibrate the flow rate value of the flowmeter 54 based on the weight change during a predetermined period. can.

For example, in the flow meter calibration method, the weight of the weighing tank 86 before discharge is measured, and the calibration flow rate integral value A or the check flow rate integral value F of the flow meter 54 when the treatment liquid L is discharged over the integration period is calculated. Along with the calculation, the weight of the weighing tank 86 after the completion of the discharge is measured. The controller 9 calculates the actual weight of the treatment liquid L discharged into the weighing tank 86 based on the weight of the weighing tank 86 before discharge and the weight of the weighing tank 86 after discharge. Then, the control unit 9 can calibrate the flow rate value of the flow meter 54 based on the flow rate integral value for calibration A and the weight, and check the soundness based on the flow rate integral value for check F and the weight. be able to.

Furthermore, the substrate processing apparatus 1 may combine another flowmeter calibration system with the flowmeter calibration method by the flowmeter calibration system 10 described above. For example, another flowmeter calibration system 10 includes a sampling unit (not shown) having the same piping layout as the processing liquid supply line 52 and the bus-side drain line 77B. The control unit 9 can further improve the accuracy of calibration by calculating the correction coefficient C by combining the flow rate integral value or the storage volume measured by this sampling unit.

In addition, the flowmeter calibration system 10 accommodates a dummy wafer in the chuck 30 in the cup 20, detects the movement of the processing liquid L discharged onto the dummy wafer from the nozzle 51 through the flowmeter 54 with an infrared sensor, and determines the flow rate value. may be used for calibration. That is, the control unit 9 can calculate the flow rate of the treatment liquid L from the movement of the treatment liquid L over time based on the detection result of the infrared sensor.

Further, the flowmeter calibration system 10 installs a thermometer such as a K-type thermocouple in the nozzle bath 60, detects the temperature change of the thermometer when a certain amount of the treatment liquid L is supplied, and detects the detection result may be used to calibrate flow values.

Further, the flowmeter calibration system 10 may be provided with a plurality of liquid detection sensors (fiber sensors) for optical measurement in the treatment liquid supply line 52, and the detection results thereof may be used to calibrate the flow rate value. For example, based on the liquid detection timing of the first liquid detection sensor, the liquid detection timing of the second liquid detection sensor, the interval between the first liquid detection sensor and the second liquid detection sensor, and the channel cross-sectional area, The flow rate of the processing liquid L flowing through the processing liquid supply line 52 can be calculated.

In addition, the flowmeter calibration system 10 can be configured by installing a plurality of flowmeters 54 in the treatment liquid supply line 52, and using the flowrate value of one flowmeter 54 as a reference to correct the flowrate values of the other flowmeters 54. good. In this case, the plurality of flowmeters 54 may employ the same detection method flowmeters 54, or may have a configuration in which different detection methods (for example, an electromagnetic method, an ultrasonic method, or a Coriolis method) are combined.

A flow meter calibration system 10A according to the modification shown in FIG. 57 is connected to a processing liquid discharge line 77 . The separate line 57 may be connected to a waste section that discharges the processing liquid L from the substrate processing apparatus 1, or may be configured to collect the processing liquid L by being connected to a processing liquid supply source. The separate line 57 has a separate line side valve 58 that opens and closes the channel of the separate line 57 at an intermediate position. The separate line side valve 58 is normally closed to direct the processing liquid L to the nozzle 51 , and is opened as necessary to circulate the processing liquid L in the processing liquid supply line 52 .

The processing liquid discharge line 77 is connected to, for example, a separate line 57 upstream of the separate line side valve 58 , and allows the processing liquid L to flow in from the separate line 57 . That is, when calibrating the flow meter 54 , the supply side valve 56 of the processing liquid supply line 52 and the separate line side valve 58 of the separate line 57 are closed, while the drainage upstream valve 78 is opened to allow the weighing unit 80 to process Liquid L can be introduced. Therefore, the flowmeter calibration system 10A according to the modification can also perform the same flowmeter calibration method as the above-described embodiment, and the flow rate value of the flowmeter 54 can be calibrated with high accuracy. The processing liquid discharge line 77 may be directly connected to the processing liquid supply line 52 on the downstream side of the flow meter 54 without being connected to the separate line 57 . Also, the flowmeter calibration system 10A may of course be provided with the vent structure 65 shown in FIG.

The technical ideas and effects of the present disclosure described in the above embodiments will be described below.

The flowmeter calibration system 10, 10A according to the first aspect of the present disclosure includes a processing liquid supply line 52 that supplies the processing liquid L to the substrate W, and the processing liquid supply line 52 is provided with a flow rate value of the processing liquid L. a flowmeter 54 for detection, a processing liquid discharge line 77 provided downstream of the flowmeter 54 for discharging the processing liquid L flowing through the processing liquid supply line 52, and a control unit 9 for controlling the processing liquid discharge line 77. The processing liquid discharge line 77 includes a weighing tank 86 that stores the processing liquid L, and a valve (drainage downstream valve 79), the controller 9 closes the flow path of the processing liquid L with a valve, and calibrates the flow rate value of the flow meter 54 based on the processing liquid L stored in the weighing tank 86 .

According to the above, the flowmeter calibration systems 10 and 10A eliminate manual calibration work by calibrating the flow rate value of the flowmeter 54 using the weighing tank 86 and the valve (drainage downstream valve 79) of the processing liquid discharge line 77. Therefore, the calibration work of the flowmeter 54 can be saved. In particular, the flowmeter calibration systems 10 and 10A introduce the processing liquid L at a position closer to the substrate into the weighing tank 86, so that it can be weighed under conditions closer to the process processing conditions, further increasing the accuracy of calibration of the flowmeter 54. be able to. Also, the flow meter calibration system 10, 10A having the weighing tank 86 outside the processing vessel 100 can use the weighing tank 86 of desired volume without increasing the size of the processing vessel 100. FIG. If weighing is performed in a container (nozzle bath) in which the ejection nozzle is retracted, as in the substrate processing apparatus disclosed in Patent Document 1, the size of the container becomes large, and the size of the chamber (size of the processing container) becomes large. turn into. On the other hand, the flowmeter calibration systems 10 and 10A have the weighing tank 86 in the processing liquid discharge line 77 downstream of the nozzle bath 60, so that a sufficient volume of the weighing tank 86 can be secured. It becomes possible to weigh the total amount of the processing liquid L applied.

The treatment liquid discharge line 77 includes a first line 82 having a weighing tank 86 and a second line 82 into which the treatment liquid discharged from the weighing tank flows up to the same height as the liquid surface of the treatment liquid stored in the weighing tank 86 . , and the second line 83 has a liquid level sensor 87 that detects the liquid level of the processing liquid L that has flowed into the second line 83 . As a result, the flowmeter calibration systems 10 and 10A can reduce measurement errors caused by the weighing tank 86 and accurately detect the liquid level of the processing liquid L stored in the weighing tank 86 .

The first line 82 and the second line 83 communicate with each other vertically above the weighing tank 86 . As a result, the flow meter calibration systems 10 and 10A can make the air pressure applied to the processing liquid L in the weighing tank 86 substantially the same as the air pressure applied to the processing liquid L in the second line 83, thereby reducing the liquid level deviation. can be suppressed.

In addition, the first line 82 includes an inflow pipe 821 for inflowing the processing liquid L into the weighing tank 86 , and the inflow pipe 821 has a discharge port 821 a for discharging the processing liquid at a position near the bottom 861 of the weighing tank 86 . have. As a result, the flowmeter calibration systems 10 and 10A can suppress splashing of the processing liquid L and fluctuation of the liquid surface when the processing liquid L is stored in the weighing tank 86 .

It also has a temperature adjustment mechanism 88 that adjusts the temperature of the weighing tank 86 . As a result, the flowmeter calibration systems 10 and 10A can calibrate the flow rate value when the processing liquid L is circulated under the same conditions as the temperature of the processing liquid L when the processing liquid L is supplied to the substrate W. Calibration accuracy can be further improved. For example, when IPA is used as the treatment liquid L, since the concentration and viscosity of the treatment liquid L differ depending on the temperature, calibration can be performed more effectively according to the temperature of the treatment liquid L.

The processing liquid supply line 52 has a container (nozzle bus 60) that accommodates the nozzle 51 provided at the tip of the processing liquid supply line 52. The processing liquid discharge line 77 is connected to the container. Circulate in the order of the valves (drainage downstream valve 79). As a result, the flowmeter calibration system 10 can satisfactorily weigh the processing liquid L in the processing liquid discharge line 77 downstream of the bath.

Further, the treatment liquid discharge line 77 branches from the treatment liquid supply line 52 between the nozzle 51 provided at the tip of the treatment liquid supply line 52 and the flow meter 54, and discharge of the treatment liquid L by the nozzle 51 is stopped. In this state, the processing liquid L is circulated through the weighing tank 86 and the valve (drainage downstream valve 79) in this order. Even in this case, the flowmeter calibration systems 10 and 10A can satisfactorily weigh the processing liquid L introduced from the processing liquid supply line 52 downstream of the flowmeter 54 into the processing liquid discharge line 77 .

In addition, in calibrating the flow rate value of the flow meter 54, the control unit 9 stores the treatment liquid L in the weighing tank 86 and stores the processing liquid L from the start of measurement by the flow meter 54 to the set storage volume B (integration Period) is measured, and the calibration flow rate integral value A is calculated by integrating the flow rate value of the flow meter 54 in the period, and the flow rate value of the flow meter 54 is corrected based on the storage volume B and the calibration flow rate integral value A. A correction coefficient C is obtained. Thereby, the controller 9 can appropriately calibrate the flow rate value of the flow meter 54 .

In addition, the control unit 9 estimates the volatilization amount D of the processing liquid L stored in the weighing tank 86, and based on the volatilization amount D, the storage volume B, and the flow rate integration value A for calibration, the flow rate value of the flow meter 54 is calculated. A correction coefficient C to be corrected is obtained. By taking into consideration the volatilization amount of the treatment liquid L in this way, the control unit 9 can calibrate the flow rate value of the flow meter 54 with higher accuracy.

Further, after the calibration of the flow rate value of the flowmeter 54, the control unit 9 performs a soundness check mode for confirming whether the flowmeter 54 is normal or abnormal. The flow rate integrated value F is calculated, and based on the flow rate integral value A for calibration and the flow rate integral value F for check, it is determined whether the flow meter 54 is normal or abnormal. As a result, the control unit 9 can stably supply the processing liquid L whose flow rate has been adjusted to the substrate W during the liquid processing, and can detect an abnormality of the flow meter 54 at an early stage.

A weight measuring unit (strain gauge 89) for measuring the weight of the weighing tank 86 is provided, and the control unit 9 calculates the weight of the processing liquid L based on the weight change when the processing liquid L is stored in the weighing tank 86. Then, the weight of the processing liquid L is used to calibrate the flow rate value of the processing liquid L detected by the flowmeter 54 . Even in this case, the flowmeter calibration systems 10 and 10A can accurately calibrate the flow rate value of the flowmeter 54 .

A second aspect of the present disclosure is a substrate processing apparatus 1 that processes a substrate W with a processing liquid L, and includes a processing liquid supply line 52 that supplies the processing liquid L to the substrate W, and a a flow meter 54 provided to detect the flow rate of the treatment liquid L; a treatment liquid discharge line 77 provided downstream of the flow meter 54 for discharging the treatment liquid L flowing through the treatment liquid supply line 52; and a controller 9 for controlling the liquid discharge line 77 , the processing liquid discharge line 77 includes a weighing tank 86 capable of storing the processing liquid L and a flow of the processing liquid L discharged downward from the bottom of the weighing tank 86 . Control for calibrating the flow rate value of the flow meter 54 based on the amount of the processing liquid L stored in the weighing tank by closing the flow path of the processing liquid L with the valve (drainage downstream valve 79) that opens and closes the path. a part 9; As a result, the substrate processing apparatus 1 can save labor in calibrating the flow meter 54 .

A third aspect of the present disclosure is a flowmeter calibration method for calibrating the flow rate value of a flowmeter 54 provided in a processing liquid supply line 52 that supplies a processing liquid L to a substrate W. A processing liquid discharge line 77 is provided on the downstream side and discharges the processing liquid that has flowed through the processing liquid supply line 52 . and a valve (drainage downstream valve 79) for opening and closing the flow path of the processing liquid discharged downward from the flowmeter calibration method. a step of closing the flow path of the processing liquid L with a valve to store the processing liquid L in the weighing tank 86; and calibrating the flow rate value of . Thus, in the third mode as well, the calibration work of the flowmeter 54 can be labor-saving.

In addition, in the step of storing the processing liquid, the processing liquid is stored in the weighing tank 86 and stored up to a set storage volume after the measurement of the flow meter 54 is started, and the flow rate of the flow meter 54 during the period. In the step of measuring the value and calibrating the flow rate value of the flow meter 54, the calibration flow rate integral value A is calculated by integrating the flow rate value of the flow meter 54 in the period, and the storage volume B and the calibration flow rate integral value A Based on this, a correction coefficient C for correcting the flow rate value of the flow meter 54 is obtained. Thereby, the flow meter calibration method can appropriately calibrate the flow rate value of the flow meter 54 .

Further, in the step of calibrating the flow rate value of the flow meter 54, the volatilization amount D of the processing liquid L stored in the weighing tank 86 is estimated, and based on the volatilization amount D, the storage volume B, and the flow rate integral value A for calibration, A correction coefficient C for correcting the flow rate value of the flow meter 54 is obtained. Thereby, the flowmeter calibration method can calibrate the flow rate value of the flowmeter 54 with higher accuracy.

Further, after the calibration of the flow rate value of the flow meter 54, there is a step of confirming whether the flow meter 54 is normal or abnormal. In addition to measuring the period of storage from the start of measurement of the flow meter 54 to the set storage volume, the flow rate integral value F for checking is integrated by integrating the flow rate value of the flow meter 54 in the period, and calibration Based on the flow rate integrated value A for use and the flow rate integrated value F for check, it is determined whether the flow meter 54 is normal or abnormal. As a result, the flowmeter calibration method can quickly detect an abnormality in the flowmeter 54 .

The flowmeter calibration systems 10 and 10A, the substrate processing apparatus 1, and the flowmeter calibration method according to the embodiments disclosed this time are illustrative in all respects and are not restrictive. Embodiments are capable of variations and modifications in various forms without departing from the scope and spirit of the appended claims. The items described in the above multiple embodiments can take other configurations within a consistent range, and can be combined within a consistent range.

1 Substrate processing apparatus 10, 10A Flow meter calibration system 52 Processing liquid supply line 54 Flow meter 77 Processing liquid discharge line 79 Waste liquid downstream valve 86 Weighing tank 9 Controller L Processing liquid W Substrate

Claims (16)

a processing liquid supply line for supplying the processing liquid to the substrate;
a flow meter provided in the processing liquid supply line for detecting the flow rate of the processing liquid;
a processing liquid discharge line provided downstream of the flow meter for discharging the processing liquid that has flowed through the processing liquid supply line;
a control unit that controls the treatment liquid discharge line,
The treatment liquid discharge line has a weighing tank that stores the treatment liquid, and a valve that opens and closes a flow path of the treatment liquid discharged downward from the bottom of the weighing tank,
The control unit closes the flow path of the processing liquid by the valve, and calibrate the flow rate value of the flow meter based on the amount of the processing liquid stored in the weighing tank.
Flow meter calibration system. The treatment liquid discharge line is
a first line comprising said weighing tank;
a second line into which the processing liquid discharged from the weighing tank flows up to the same height as the liquid level of the processing liquid stored in the weighing tank;
The second line has a liquid level sensor that detects the liquid level of the treatment liquid that has flowed into the second line.
The flow meter calibration system of claim 1. The first line and the second line communicate with each other vertically above the weighing tank.
A flow meter calibration system according to claim 2. the first line includes an inflow pipe for inflowing the treatment liquid into the weighing tank;
The inflow pipe has a discharge port for discharging the treatment liquid at a position near the bottom of the weighing tank,
The flowmeter calibration system according to claim 2 or 3. A temperature adjustment mechanism that adjusts the temperature of the weighing tank,
A flowmeter calibration system according to any one of claims 1 to 4. a container containing a nozzle provided at the tip of the processing liquid supply line;
The treatment liquid discharge line is connected to the container, and circulates the treatment liquid received in the container in the order of the weighing tank and the valve.
The flowmeter calibration system according to any one of claims 1-5. The treatment liquid discharge line branches from the treatment liquid supply line between the nozzle provided at the tip of the treatment liquid supply line and the flow meter,
Discharging the treatment liquid through the weighing tank and the valve in this order while stopping the ejection of the treatment liquid from the nozzle;
The flowmeter calibration system according to any one of claims 1-5. In calibrating the flow rate value of the flow meter, the control unit stores the processing liquid in the weighing tank and measures a period of storage up to a set storage volume after starting measurement of the flow meter, calculating a calibration flow rate integral value by integrating the flow rate value of the flow meter during the period, and obtaining a correction coefficient for correcting the flow rate value of the flow meter based on the storage volume and the calibration flow rate integral value;
The flowmeter calibration system according to any one of claims 1-7. The control unit estimates a volatilization amount of the treatment liquid stored in the weighing tank, and corrects the flow rate value of the flow meter based on the volatilization amount, the storage volume, and the flow rate integral value for calibration. get the coefficients,
A flow meter calibration system according to claim 8. The control unit performs a soundness check mode for confirming normality or abnormality of the flowmeter after calibration of the flow rate value of the flowmeter,
In the soundness check mode, the processing liquid is stored in the weighing tank, and the period during which the processing liquid is stored from the start of measurement by the flow meter to a set storage volume is measured, and the flow rate of the flow meter during the period is measured. calculating a flow rate integral value for checking by integrating the value, and determining whether the flow meter is normal or abnormal based on the flow rate integral value for calibration and the flow rate integral value for checking;
A flow meter calibration system according to claim 8 or 9. A weight measuring unit for measuring the weight of the weighing tank,
The control unit calculates the weight of the treatment liquid based on the weight change when the treatment liquid is stored in the weighing tank, and the flow rate of the treatment liquid detected by the flow meter using the weight of the treatment liquid. calibrate the value,
A flow meter calibration system according to any one of claims 1-10. A substrate processing apparatus for processing a substrate with a processing liquid,
a processing liquid supply line for supplying the processing liquid to the substrate;
a flow meter provided in the processing liquid supply line for detecting the flow rate of the processing liquid;
a processing liquid discharge line provided downstream of the flow meter for discharging the processing liquid that has flowed through the processing liquid supply line;
a control unit that controls the treatment liquid discharge line,
The treatment liquid discharge line includes a weighing tank that stores the treatment liquid,
a valve for opening and closing a flow path of the processing liquid discharged downward from the bottom of the weighing tank;
The control unit closes the flow path of the processing liquid by the valve, and calibrate the flow rate value of the flow meter based on the amount of the processing liquid stored in the weighing tank.
Substrate processing equipment. A flowmeter calibration method for calibrating a flow rate value of a flowmeter provided in a processing liquid supply line for supplying a processing liquid to a substrate,
a processing liquid discharge line provided downstream of the flow meter for discharging the processing liquid that has flowed through the processing liquid supply line;
The treatment liquid discharge line has a weighing tank that stores the treatment liquid, and a valve that opens and closes a flow path of the treatment liquid discharged downward from the bottom of the weighing tank,
In the flowmeter calibration method,
a step of discharging the processing liquid flowing through the processing liquid supply line to the processing liquid discharge line;
a step of closing the flow path of the treatment liquid by the valve and storing the treatment liquid in the weighing tank;
calibrating the flow rate value of the flow meter based on the amount of the processing liquid stored in the weighing tank;
Flowmeter calibration method. In the step of storing the processing liquid, the processing liquid is stored in the weighing tank and stored up to a set storage volume after the measurement of the flow meter is started, and the flow rate value of the flow meter during the period. and
In the step of calibrating the flow rate value of the flow meter, a calibration flow rate integral value is calculated by integrating the flow rate value of the flow meter during the period, and based on the storage volume and the calibration flow rate integral value, the flow meter obtain a correction factor that corrects the flow rate value of
The flowmeter calibration method according to claim 13. In the step of calibrating the flow rate value of the flow meter, the volatilization amount of the treatment liquid stored in the weighing tank is estimated, and based on the volatilization amount, the storage volume, and the flow rate integral value for calibration, the flow meter obtain a correction factor that corrects the flow rate value of
The flowmeter calibration method according to claim 14. A step of confirming whether the flowmeter is normal or abnormal after performing calibration of the flow rate value of the flowmeter,
In the step of confirming whether the flowmeter is normal or abnormal, the processing liquid is stored in the weighing tank, and the period of storage up to a set storage volume after the start of measurement by the flowmeter is measured, and the period of time is measured. calculating a flow rate integral value for checking by integrating the flow rate value of the flow meter in, and determining whether the flow meter is normal or abnormal based on the flow rate integral value for calibration and the flow rate integral value for checking;
The flowmeter calibration method according to claim 14 or 15.

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