JP2023032759A - Drawing system, drawing method and program - Google Patents

Abstract

To reduce a workload for a designer required for generation of a template.SOLUTION: A matching position determination part sets a temporary template region 951a which has the same size as a template corresponding to a temporary matching position 95a, and sets a check region 952a which is larger than an imaging visual field of an imaging part with the temporary template region 951a as a center. The matching position determination part confirms presence/absence of an overlapping region which indicates the same pattern as the temporary template region 951a in the check region 952a. If the overlapping region exists in the check region 952a, the matching position determination part repeats moving the temporary matching position 95a in a prescribed direction, resetting the temporary template region 951a and the check region 952a and confirming presence/absence of the overlapping region. On the other hand, if there is no overlapping region in the check region 952a, the matching position determination part determines the temporary matching position 95a as a matching position.SELECTED DRAWING: Figure 16

Description

The present invention relates to a technique of drawing a pattern by irradiating a substrate with light.

Conventionally, a pattern can be drawn by irradiating light onto a photosensitive material formed on a semiconductor substrate, a printed circuit board, or a glass substrate for an organic EL display device or a liquid crystal display device (hereinafter referred to as "substrate"). It is done. A drawing apparatus that performs such drawing performs an alignment process that automatically adjusts the drawing position of a pattern by detecting the position of an alignment mark provided on a substrate.

In recent years, in drawing on a printed circuit board, there is a demand for reducing the space for arranging alignment marks in order to increase the number of pieces that can be taken from one board. Therefore, a part of the pattern on the substrate is used as an alignment mark without providing a mark dedicated to alignment on the substrate.

For example, in the exposure apparatus of Patent Document 1, in an image obtained by imaging a pattern on a substrate, part of the pattern is set as a reference mark model (that is, a template) used for alignment processing. Registered in advance. Then, when the substrate to be exposed is carried into the exposure apparatus, a part of the pattern on the substrate is imaged, pattern matching is performed between the obtained image and the reference mark model, and alignment processing of the substrate is performed. done.

JP 2013-171988 A

By the way, in the exposure apparatus of Patent Document 1, in order to obtain a template for pattern matching, a substrate is placed at a predetermined position of the exposure apparatus, an image of the pattern on the substrate is captured, and a partial pattern serving as a template is determined from the obtained image. need to extract. Therefore, the amount of work required to generate the template increases, and the work time also increases.

Moreover, when using a part of the pattern on the substrate as a template, the designer needs to select the part to be the template from the pattern. The part that becomes the template must be a part that does not have the same or similar pattern as the template in the surrounding area. Therefore, the workload of the designer when selecting a portion to be a template also increases.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object of the present invention is to reduce the workload of a designer required to generate a template.

According to a first aspect of the present invention, there is provided a drawing system, comprising: a drawing device that draws a pattern by irradiating a substrate with light; and a data processing device that creates template generation information and sends it to the drawing device, The lithography apparatus includes a stage that holds the substrate on which a first pattern is provided in advance, a lithography head that irradiates the top surface of the substrate with modulated light, and a a scanning mechanism for moving the stage relative to the drawing head in a scanning direction; an imaging unit for imaging a part of the first pattern; and a template for the captured image obtained by the imaging unit. a position detection unit for detecting the position of the substrate by performing pattern matching using the pattern matching; a storage unit for storing second CAD data which is CAD data for a second pattern drawn on the first pattern; and the second CAD a data generation unit for rasterizing data to generate second raster data; and controlling the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection unit. and a drawing control unit that executes drawing of the second pattern on the substrate that relatively moves in the scanning direction with respect to the drawing head, wherein the storage unit controls the position detection unit on the first pattern. The template generation information including the coordinates indicating the matching position where pattern matching is performed is further stored, and the data generation unit rasterizes the CAD data of the first pattern to create intermediate data, and from the intermediate data, the image data of a region of a predetermined size corresponding to a matching position is generated as the template, and the data processing device includes an initial setting unit for setting a temporary matching position on the first pattern; setting a temporary template area having the same size as the template, setting a check area centered on the temporary template area and larger than an imaging field of view of the imaging unit, and setting the same pattern as the temporary template area in the check area If the overlapping area exists, the temporary matching position is moved in a predetermined direction, the temporary template area and the check area are reset, and the existence of the overlapping area is confirmed. and determining the temporary matching position as the matching position if the overlapping area does not exist. and an information creation section that creates the template generation information including the coordinates indicating the matching position determined by the matching position determination section.

The invention according to claim 2 is the drawing system according to claim 1, wherein the direction in which the temporary matching position is moved by the matching position determining unit when the overlapping area exists is the scanning direction.

The invention according to claim 3 is the drawing system according to claim 1 or 2, wherein a plurality of temporary matching position sequences each being a set of temporary matching positions arranged in the scanning direction are generated by the initial setting unit. and a group of temporary matching positions arranged at regular intervals in a width direction perpendicular to the scanning direction, and the pitch of the plurality of temporary matching position rows in the width direction is set to a predetermined value or less.

The invention according to claim 4 is the drawing system according to claim 1 or 2, wherein a plurality of temporary matching position sequences each being a set of temporary matching positions arranged in the scanning direction are generated by the initial setting unit. , a group of temporary matching positions arranged at regular intervals in the width direction perpendicular to the scanning direction, and the number of the plurality of temporary matching position rows is set to a predetermined number.

The invention according to claim 5 is the drawing system according to any one of claims 1 to 4, wherein a matrix is formed on the upper surface of the substrate in the scanning direction and in the width direction perpendicular to the scanning direction. A plurality of partial drawing areas are set in which the same pattern is drawn in each of which are arranged in a pattern, and the initial setting unit sets a temporary matching position in one partial drawing area among the plurality of partial drawing areas. The matching position determination unit determines a matching position in the one partial drawing area based on the temporary matching position, and determines the other part in the other partial drawing area among the plurality of partial drawing areas. A matching position is determined such that the relative position with respect to the drawing area is the same as the relative position of the matching position with respect to the one partial drawing area.

The invention according to claim 6 is the drawing system according to any one of claims 1 to 4, wherein a matrix is formed on the upper surface of the substrate in the scanning direction and in a width direction perpendicular to the scanning direction. A plurality of partial drawing areas arranged in a shape are set, and the temporary matching position is set to , arranged adjacent to a corner portion on the one side in the scanning direction and the one side in the width direction, and among the plurality of partial drawing areas, the one side most in the scanning direction and the most other side in the width direction. , the temporary matching position is arranged adjacent to a corner portion on the one side in the scanning direction and the other side in the width direction, and is the most in the scanning direction among the plurality of partial drawing areas. In the partial drawing area on the other side and closest to the one side in the width direction, the temporary matching position is arranged adjacent to a corner portion on the other side in the scanning direction and on the one side in the width direction, and the plurality of in the partial drawing area on the other side in the scanning direction and the other side in the width direction, the temporary matching position is on the other side in the scanning direction and on the other side in the width direction located adjacent to the corners of the

The invention according to claim 7 is the drawing system according to any one of claims 1 to 6, wherein the data processing device corresponds to a predetermined area including the matching position in the first pattern. The partial data, which is the CAD data, is clipped and sent to the drawing device, and the data generation unit of the drawing device rasterizes only the partial data to create the intermediate data.

The invention according to claim 8 is the drawing system according to claim 7, wherein the top surface of the substrate is provided with a plurality of scanning lines arranged in a matrix in the scanning direction and in the width direction perpendicular to the scanning direction. A partial drawing area is set, and the partial data corresponds to the partial drawing area including the matching position.

The invention according to claim 9 is the drawing system according to any one of claims 1 to 8, wherein the template generation information further includes coordinates indicating other matching positions determined by the designer. .

According to a tenth aspect of the invention, there is provided a drawing method for drawing a pattern by irradiating a substrate with light, comprising: a) holding a substrate on which a first pattern is previously provided; c) capturing an image of a portion of the first pattern; and d) using the template for the captured image obtained in the c) step. a step of detecting the position of the substrate by performing pattern matching; and e) a step of rasterizing second CAD data, which is CAD data of a second pattern drawn on the first pattern, to generate second raster data. f) a drawing head for irradiating the upper surface of the substrate with modulated light based on the second raster data and the position of the substrate detected in the step d); and a scanning mechanism that moves the substrate relatively to the drawing head in a parallel scanning direction, thereby forming the second pattern on the substrate that relatively moves in the scanning direction with respect to the drawing head. b) step of b1) preparing template generation information including coordinates indicating a matching position where the pattern matching is performed on the first pattern; b2) the first creating intermediate data by rasterizing CAD data of one pattern, and generating image data of a region of a predetermined size corresponding to the matching position from the intermediate data as the template; b3) setting a provisional matching position on the first pattern; b4) setting a provisional template region having the same size as the template corresponding to the provisional matching position; c) setting a check area that is larger than the imaging field of view in the step, confirming the presence or absence of an overlap area showing the same pattern as the temporary template area in the check area, and if the overlap area exists, the temporary matching position; is moved in a predetermined direction to reset the temporary template area and the check area to confirm the presence or absence of the overlapping area, and if the overlapping area does not exist, the temporary matching position is set as the matching position b5) creating the template generation information including the coordinates indicating the matching position determined in the b4) step.

According to an eleventh aspect of the invention, there is provided a program that is executed in a drawing system that draws a pattern by irradiating a substrate with light, wherein the drawing system draws a pattern by irradiating the substrate with light. and a data processing device that creates template generation information and sends it to the lithography device. a writing head that irradiates an upper surface with modulated light; a scanning mechanism that moves the stage relative to the writing head in a scanning direction parallel to the upper surface of the substrate; and a portion of the first pattern. a position detection unit for detecting the position of the substrate by performing pattern matching using a template on the captured image acquired by the imaging unit; and a position of the substrate drawn on the first pattern. Detected by a storage unit that stores second CAD data that is CAD data of a second pattern, a data generation unit that rasterizes the second CAD data to generate second raster data, and the second raster data and the position detection unit drawing control for executing drawing of the second pattern on the substrate moving in the scanning direction relative to the drawing head by controlling the drawing head and the scanning mechanism based on the determined position of the substrate; g) setting a temporary matching position on the first pattern; A template region is set, a check region larger than the imaging field of the imaging unit is set around the temporary template region, and the presence or absence of an overlapping region showing the same pattern as the temporary template region is confirmed in the check region. , if the overlapping area exists, moving the temporary matching position in a predetermined direction, resetting the temporary template area and the checking area, and repeatedly confirming whether or not the overlapping area exists; If the data j) rasterizing the CAD data of the first pattern to create intermediate data; The step of generating image data of a region of a predetermined size corresponding to the etching position as the template is executed by the data generation unit of the rendering device.

According to the present invention, it is possible to reduce the workload of the worker required for template generation.

1 is a perspective view showing a drawing system according to one embodiment; FIG. It is a top view which shows a board|substrate. It is a figure which shows the structure of the computer with which the control part of a drawing apparatus is provided. 3 is a block diagram showing functions of a control unit of the drawing apparatus; FIG. FIG. 10 is a diagram showing the flow of drawing a pattern on a substrate; FIG. 10 is a diagram showing the flow of drawing a pattern on a substrate; FIG. 10 is a diagram showing matching positions and extraction regions; FIG. 4 is a diagram showing an example of a template; FIG. 10 is a diagram showing an example of arrangement of a plurality of matching positions; FIG. 10 is a diagram showing another example of arrangement of a plurality of matching positions; It is a figure which shows the structure of a data processor. 3 is a block diagram showing functions of the data processing device; FIG. FIG. 10 is a diagram showing the flow of creation of template generation information; FIG. 10 is a diagram showing an example of arrangement of a plurality of temporary matching positions; FIG. 10 is a diagram showing another example of arrangement of a plurality of temporary matching positions; FIG. 10 is a diagram showing temporary matching positions, temporary template areas, and check areas; FIG. 10 is a diagram showing temporary matching positions, temporary template areas, and check areas; FIG. 10 is a diagram showing another example of arrangement of a plurality of matching positions; It is a top view which shows a board|substrate.

FIG. 1 is a perspective view showing a drawing system 5 according to one embodiment of the invention. A drawing system 5 includes a drawing device 1 and a data processing device 6 . The drawing apparatus 1 is a direct drawing apparatus that draws a pattern by irradiating a photosensitive material on a substrate 9 with spatially modulated substantially beam-like light and scanning the irradiation area of the light on the substrate 9. . The data processing device 6 is a device that performs preprocessing and the like of data used for drawing in the drawing device 1 . The data processing device 6 is, for example, a normal computer, which is conceptually drawn as a substantially rectangular parallelepiped in FIG. In FIG. 1, three directions orthogonal to each other are indicated by arrows as the X direction, the Y direction, and the Z direction. In the example shown in FIG. 1, the X and Y directions are horizontal directions perpendicular to each other, and the Z direction is the vertical direction. The same applies to other drawings.

FIG. 2 is a plan view showing the main surface of the substrate 9 on the (+Z) side (hereinafter also referred to as "upper surface 90"). The substrate 9 is, for example, a substantially rectangular plate member in a plan view. The board 9 is, for example, a multilayer printed wiring board (hereinafter simply referred to as "printed board"). In this embodiment, a circuit pattern made of copper (Cu) or the like is formed in advance on the upper surface 90 of the substrate 9, and a resist film made of a photosensitive material is provided on the circuit pattern. . Then, a solder pattern is drawn (that is, formed) on the resist film of the substrate 9 in the drawing device 1 . The solder pattern is drawn on the circuit pattern described above so as to match the circuit pattern.

In the following description, a pattern (that is, a circuit pattern) formed in advance on the upper surface 90 of the substrate 9 is also called a "first pattern", and a pattern to be drawn on the upper surface 90 of the substrate 9 by the drawing apparatus 1. (that is, solder pattern) is also called a "second pattern". Note that the type and shape of the substrate 9 may be changed variously. Also, the pattern drawn on the substrate 9 by the drawing device 1 is not limited to the solder pattern, and may be variously changed.

On the upper surface 90 of the substrate 9 illustrated in FIG. 2, a plurality of partial drawing areas 94 each of which is partitioned into a substantially rectangular shape by grid-like dividing lines 93 are set. The same pattern is drawn in each of the plurality of partial drawing regions 94 . Each partial drawing area 94 corresponds to a piece finally obtained from the substrate 9 . In the example shown in FIG. 2, each partial drawing area 94 has a substantially square shape. A plurality of partial drawing areas 94 are arranged in a matrix in the X direction and the Y direction. In FIG. 2, each partial drawing area 94 is drawn larger than it actually is, and the number of partial drawing areas 94 is drawn smaller than it actually is. The substrate 9 is not provided with alignment marks dedicated to position detection processing (that is, alignment processing), which will be described later.

As shown in FIG. 1 , the drawing apparatus 1 includes a stage 21 , a stage moving mechanism 22 , an imaging section 3 , a drawing section 4 and a control section 10 . The control unit 10 controls the stage moving mechanism 22, the imaging unit 3, the drawing unit 4, and the like. The stage 21 is a substantially flat substrate holding portion that holds the substrate 9 in a horizontal state from below below the imaging portion 3 and the drawing portion 4 (that is, on the (-Z) side). The stage 21 is, for example, a vacuum chuck that holds the lower surface of the substrate 9 by suction. The stage 21 may have a structure other than the vacuum chuck. A top surface 90 of the substrate 9 placed on the stage 21 is substantially perpendicular to the Z direction and substantially parallel to the X and Y directions.

The stage moving mechanism 22 is a moving mechanism that moves the stage 21 relative to the imaging unit 3 and the drawing unit 4 in the horizontal direction (that is, the direction substantially parallel to the upper surface 90 of the substrate 9). The stage moving mechanism 22 has a first moving mechanism 23 and a second moving mechanism 24 . The second moving mechanism 24 linearly moves the stage 21 along the guide rails in the X direction. The first moving mechanism 23 linearly moves the stage 21 together with the second moving mechanism 24 along the guide rails in the Y direction. The driving source of the first moving mechanism 23 and the second moving mechanism 24 is, for example, a linear servomotor or a motor attached to a ball screw. The structures of the first moving mechanism 23 and the second moving mechanism 24 may be changed variously.

The drawing apparatus 1 may be provided with a stage rotation mechanism that rotates the stage 21 around a rotation axis extending in the Z direction. Also, the drawing apparatus 1 may be provided with a stage lifting mechanism that moves the stage 21 in the Z direction. A servomotor, for example, can be used as the stage rotation mechanism. A linear servo motor, for example, can be used as the stage lifting mechanism. The structures of the stage rotation mechanism and the stage elevating mechanism may be modified in various ways.

The imaging unit 3 includes a plurality of (two in the example shown in FIG. 1) imaging heads 31 arranged in the X direction. Each imaging head 31 is supported above the stage 21 and the stage moving mechanism 22 by a head support section 30 provided straddling the stage 21 and the stage moving mechanism 22 . Of the two imaging heads 31, one imaging head 31 is fixed to the head supporting portion 30, and the other imaging head 31 is movable on the head supporting portion 30 in the X direction. Thereby, the distance in the X direction between the two imaging heads 31 can be changed. Note that the number of imaging heads 31 of the imaging unit 3 may be one, or may be three or more.

Each imaging head 31 is a camera including an imaging sensor and an optical system (not shown). Each imaging head 31 is, for example, an area camera that acquires a two-dimensional image. An imaging sensor includes, for example, elements such as a plurality of CCDs (Charge Coupled Devices) arranged in a matrix. In each imaging head 31, reflected light of illumination light guided from a light source (not shown) to the upper surface 90 of the substrate 9 is guided to an imaging sensor via an optical system. The imaging sensor receives reflected light from the upper surface 90 of the substrate 9 and acquires an image of a substantially rectangular imaging area. Various light sources such as LEDs (Light Emitting Diodes) can be used as the light source. Note that each imaging head 31 may be another type of camera such as a line camera.

The drawing unit 4 includes a plurality of (five in the example shown in FIG. 1) drawing heads 41 arranged in the X direction and the Y direction. Each drawing head 41 is supported above the stage 21 and the stage moving mechanism 22 by a head supporting portion 40 provided straddling the stage 21 and the stage moving mechanism 22 . The head support section 40 is arranged on the (+Y) side of the head support section 30 of the imaging section 3 . The number of drawing heads 41 of the drawing unit 4 may be one or plural.

Each drawing head 41 includes a light source, an optical system, and a spatial light modulator (not shown). Various elements such as DMD (Digital Micro Mirror Device) and GLV (Grating Light Valve) (registered trademark of Silicon Light Machines (Sunnyvale, Calif.)) are used as spatial light modulation elements. It is possible. Various light sources such as LD (Laser Diode) can be used as the light source. The multiple drawing heads 41 have substantially the same structure.

In the drawing apparatus 1 , while the upper surface 90 of the substrate 9 is irradiated with modulated (that is, spatially modulated) light from the plurality of drawing heads 41 of the drawing unit 4 , the substrate 9 is moved in the Y direction by the stage moving mechanism 22 . move to As a result, the area irradiated with light from the plurality of drawing heads 41 is scanned on the substrate 9 in the Y direction, and a pattern is drawn on the substrate 9 . In the following description, the Y direction is also called "scanning direction", and the X direction is also called "width direction". The stage moving mechanism 22 is a scanning mechanism that moves the irradiation area of the light from each drawing head 41 on the substrate 9 in the scanning direction.

In the drawing apparatus 1, drawing on the substrate 9 is performed by a so-called single-pass (one-pass) method. Specifically, the stage 21 is relatively moved in the Y direction with respect to the plurality of drawing heads 41 by the stage moving mechanism 22, and the irradiation area of the light from the plurality of drawing heads 41 is shifted on the upper surface 90 of the substrate 9. It is scanned only once in the Y direction (ie, scan direction). This completes drawing on the substrate 9 . Note that the drawing apparatus 1 may perform drawing on the substrate 9 by a multi-pass method in which the stage 21 is repeatedly moved in the Y direction and stepped in the X direction. When multi-pass drawing is performed in the drawing apparatus 1, the Y direction is the main scanning direction, and the X direction is the sub scanning direction. The first moving mechanism 23 of the stage moving mechanism 22 is a main scanning mechanism that moves the stage 21 in the main scanning direction, and the second moving mechanism 24 is a sub-scanning mechanism that moves the stage 21 in the sub-scanning direction. .

FIG. 3 is a diagram showing the configuration of the computer 100 included in the control unit 10. As shown in FIG. Computer 100 is a normal computer comprising processor 101 , memory 102 , input/output unit 103 and bus 104 . A bus 104 is a signal circuit that connects the processor 101 , memory 102 and input/output unit 103 . The memory 102 stores various information. The memory 102 reads and stores a program 109 pre-stored in the storage medium 81, for example. The storage medium 81 is, for example, a USB memory or a CD-ROM.

The processor 101 executes various processes (for example, numerical calculation and image processing) while using the memory 102 and the like according to the program 109 and the like stored in the memory 102 . The input/output unit 103 includes a keyboard 105 and a mouse 106 for receiving inputs from an operator, and a display 107 for displaying outputs from the processor 101 and the like. The control unit 10 may be a programmable logic controller (PLC: Programmable Logic Controller), a circuit board, or the like, or may be a combination of these and one or more computers.

FIG. 4 is a block diagram showing functions of the control unit 10 realized by executing the program 109 by the computer 100. As shown in FIG. In FIG. 4, configurations other than the control unit 10 are also shown. The control unit 10 includes a storage unit 111 , an imaging control unit 112 , a position detection unit 113 , a drawing control unit 114 and a data generation unit 115 .

The storage unit 111 is mainly implemented by the memory 102 and stores in advance various information related to pattern drawing in the drawing apparatus 1 . Information stored in the storage unit 111 includes, for example, information sent from the data processing device 6 to the drawing device 1 . From the data processing device 6, for example, CAD data of a second pattern to be drawn on the substrate 9 (hereinafter also referred to as "second CAD data"), and a template which is information used to generate a template to be described later. Generation information and the like are sent to the drawing apparatus 1 .

The imaging control unit 112 , the position detection unit 113 , the drawing control unit 114 and the data generation unit 115 are mainly realized by the processor 101 . The image capturing control unit 112 controls the image capturing unit 3 and the stage moving mechanism 22 to cause the image capturing unit 3 to capture a portion of the upper surface 90 (see FIG. 2) of the substrate 9, thereby obtaining a partial image of the first pattern. (hereinafter also referred to as “captured image”). The captured image is sent to and stored in the storage unit 111 . The data generation unit 115 rasterizes the second CAD data stored in the storage unit 111, and generates raster data (hereinafter also referred to as “second raster data”) used for drawing the second pattern in the drawing apparatus 1. to generate The second raster data is run length data, for example. The data generator 115 also generates a template (that is, a reference image) used for position detection of the substrate 9 .

The position detection unit 113 performs pattern matching using the template on the captured image of the first pattern described above to determine the position of the substrate 9 on the stage 21 (see FIG. 1) (that is, the substrate relative to the drawing unit 4). 9 relative position). The drawing control unit 114 controls the drawing unit 4 and the stage moving mechanism 22 based on the above-described second raster data and the position of the substrate 9 detected by the position detection unit 113, thereby While adjusting the drawing position, the drawing unit 4 is caused to draw the second pattern on the substrate 9 .

Next, the flow of pattern drawing on the substrate 9 by the drawing apparatus 1 will be described with reference to FIGS. 5A and 5B. When performing drawing on the substrate 9, the substrate 9 is first carried into the drawing apparatus 1 shown in FIG. 1 and held by the stage 21 (step S11). The stage 21 is located on the (−Y) side of the imaging unit 3 and the drawing unit 4 . A first pattern is provided in advance on the upper surface 90 of the substrate 9 held on the stage 21 . A top surface 90 of the substrate 9 is substantially parallel to the X and Y directions.

Subsequently, a template used for pattern matching is generated by the data generator 115 (see FIG. 4) of the controller 10 (step S12). In step S12, template generation information is created in the data processing device 6 first. Creation of template generation information in the data processing device 6 will be described later. Subsequently, the second CAD data and the template generation information are sent from the data processing device 6 to the drawing device 1 and stored in the storage unit 111 . As a result, the drawing apparatus 1 prepares the second CAD data and the template generation information (step S121). The template generation information includes the first CAD data, which is the CAD data of the first pattern, and the coordinates indicating the position where pattern matching is performed by the position detection unit 113 on the first pattern (hereinafter also referred to as "matching position"). is included. The template generation information also includes template size information indicating the size of the template used for the pattern matching.

In the control unit 10 , the template generation information stored in the storage unit 111 is read out by the data generation unit 115 . The data generator 115 rasterizes the first CAD data included in the template generation information to generate first raster data (hereinafter also referred to as “intermediate data”). The first raster data is run length data, for example.

Further, based on the coordinates indicating the matching position and the template size information included in the template generation information, the data generation unit 115 extracts a predetermined size corresponding to the matching position from the first raster data (that is, the template size information is (size shown) is extracted. As shown in FIG. 6, the area extracted from the first raster data (hereinafter also referred to as "extraction area 96") is, for example, a substantially square of 2 mm square centered on matching position 95 indicated by a cross. It is a shaped area. In FIG. 6, of the plurality of partial drawing regions 94 of the substrate 9 on which the first pattern is drawn, the vicinity of the upper left vertex of the upper left (that is, the vertex on the (-X) side and the (+Y) side) partial drawing region 94 The part of is enlarged and drawn. Note that the extraction area 96 does not necessarily have to be extracted with the matching position 95 as the center, and may be, for example, a substantially square area with the matching position 95 as the upper left vertex. Also, the shape and size of the extraction region 96 may be varied.

The data generation unit 115 generates a template by converting the data of the extraction region 96 extracted from the first raster data into image data in a format that can be used for pattern matching (step S122). FIG. 7 is a diagram showing an example of the template 97 generated by the data generator 115. As shown in FIG. Template 97 includes a portion of the first pattern, as described above. Note that the shape of the pattern included in the template 97 is not limited to that shown in FIG. 7, and may be changed in various ways. In this embodiment, the template is bitmap data. Note that the template data format may be other than the bitmap format.

The template generation information typically includes the coordinates of multiple (eg, four or more) matching locations 95 . The plurality of matching positions 95 are preset in the data processing device 6 and included in the template generation information. In step S<b>12 described above, a plurality of templates 97 corresponding to the plurality of matching positions 95 are generated by the data generation unit 115 and stored in the storage unit 111 .

FIG. 8 is a diagram showing an example of arrangement of a plurality of matching positions 95 on the substrate 9. As shown in FIG. In the example shown in FIG. 8, four matching positions 95 are respectively arranged in four partial drawing regions 94 positioned at four corners among a plurality of partial drawing regions 94 arranged in a matrix on the substrate 9. . In addition, in each partial drawing area 94 in which the matching position 95 is arranged, the matching position 95 is arranged near one of the four corners of the partial drawing area 94 that is farthest from the center of the substrate 9. be.

Specifically, in the partial drawing area 94 located at the corner on the (−X) side and the (+Y) side (that is, the partial drawing area 94 on the most one side in the width direction and the most on the one side in the scanning direction), the matching The position 95 is arranged adjacent to the (−X) side and (+Y) side corner of the partial drawing area 94 . An extraction area 96 corresponding to the matching position 95 is also arranged adjacent to the corner of the partial drawing area 94 . The extraction area 96 is wholly located within the partial drawing area 94 (that is, on the outer peripheral edge of the partial drawing area 94 and inside the outer peripheral edge). Preferably, the (-X) side and (+Y) side corner of the extraction region 96 overlaps the (-X) side and (+Y) side corner of the partial drawing region 94, and the (-X) side corner of the extraction region 96 ) side and (+Y) side overlap with the (−X) side and (+Y) side of the partial drawing area 94 .

Note that the extraction area 96 may be spaced inward from the outer peripheral edge of the partial drawing area 94 . In this case, the distance between the (−X) side of the extraction region 96 and the (−X) side of the partial drawing region 94 is, for example, 2 mm or less (that is, 100 mm of the length of one side of the extraction region 96). % or less), preferably 1 mm or less (that is, 50% or less of the length of one side of the extraction region 96). The same applies to the distance between the (+Y) side of the extraction area 96 and the (+Y) side of the partial drawing area 94 .

In the partial drawing area 94 positioned at the corner on the (+X) side and the (+Y) side (that is, the partial drawing area 94 on the othermost side in the width direction and the most side in the scanning direction), the matching position 95 and the extraction area 96 is arranged adjacent to the (+X) side and (+Y) side corner of the partial drawing area 94 . The extraction area 96 is entirely located within the partial drawing area 94 . Preferably, the (+X) side and (+Y) side corner of the extraction region 96 overlaps the (+X) side and (+Y) side corner of the partial drawing region 94 , and the (+X) side corner of the extraction region 96 The side and the (+Y) side overlap the (+X) side and the (+Y) side of the partial drawing area 94, respectively. Note that the extraction area 96 may be spaced inward from the outer peripheral edge of the partial drawing area 94 in the same manner as described above. In this case, the distance between the extraction area 96 and the partial drawing area 94 is substantially the same as the extraction area 96 arranged in the partial drawing area 94 on the most (−X) side and the most (+Y) side described above. .

In the partial drawing area 94 positioned at the corner on the (+X) side and the (−Y) side (that is, the partial drawing area 94 on the othermost side in the width direction and on the othermost side in the scanning direction), the matching position 95 and the extraction area 96 is arranged adjacent to the (+X) side and (−Y) side corner of the partial drawing area 94 . The extraction area 96 is entirely located within the partial drawing area 94 . Preferably, the (+X) side and (−Y) side corners of the extraction region 96 overlap the (+X) side and (−Y) side corners of the partial drawing region 94, and the (+X) side corners of the extraction region 96 overlap each other. side and (-Y) side overlap with the (+X) side and (-Y) side of the partial drawing area 94, respectively. Note that the extraction area 96 may be spaced inward from the outer peripheral edge of the partial drawing area 94 in the same manner as described above. In this case, the distance between the extraction area 96 and the partial drawing area 94 is substantially the same as the extraction area 96 arranged in the partial drawing area 94 on the most (−X) side and the most (+Y) side described above. .

In the partial drawing area 94 located at the corner on the (-X) side and the (-Y) side (that is, the partial drawing area 94 on the farthest side in the width direction and the farthest side in the scanning direction), the matching position 95 and the extraction The area 96 is arranged adjacent to the (−X) side and (−Y) side corner of the partial drawing area 94 . The extraction area 96 is entirely located within the partial drawing area 94 . Preferably, the (-X) side and (-Y) side corner of the extraction area 96 overlaps the (-X) side and (-Y) side corner of the partial drawing area 94, and the (-X) side and (-Y) side corner of the extraction area 96 The -X) side and the (-Y) side overlap the (-X) side and the (-Y) side of the partial drawing area 94, respectively. Note that the extraction area 96 may be spaced inward from the outer peripheral edge of the partial drawing area 94 in the same manner as described above. In this case, the distance between the extraction area 96 and the partial drawing area 94 is substantially the same as the extraction area 96 arranged in the partial drawing area 94 on the most (−X) side and the most (+Y) side described above. .

The number and arrangement of matching positions 95 on substrate 9 are not limited to those shown in FIG. 8, and may be variously changed. For example, the matching positions 95 may be arranged in the partial drawing areas 94 other than the partial drawing areas 94 located at the four corners among the plurality of partial drawing areas 94 . For example, as shown in FIG. 9, two matching positions 95 may be arranged in each partial drawing area 94 of a plurality of partial drawing areas 94 arranged in a matrix. In the example shown in FIG. 9, in each partial drawing area 94 located on the most (-Y) side of the plurality of partial drawing areas 94, the matching position 95 is arranged adjacent to the (-Y) side, and the most ( In each partial drawing area 94 positioned on the +Y) side, the matching position 95 is arranged adjacent to the side on the (+Y) side. In addition, in each partial drawing area 94 positioned closest to the (−X) side, the matching position 95 is arranged adjacent to the side on the (−X) side, and in each partial drawing area 94 positioned closest to the (+X) side , the matching position 95 is located adjacent to the (+X) side.

In step S12, when a plurality of templates 97 respectively corresponding to a plurality of matching positions 95 are generated, the substrate 9 is moved in the (+Y) direction together with the stage 21 by the stage moving mechanism 22 shown in FIG. Move down to 3. Note that step S12 may be performed before carrying in and holding the substrate 9 in step S11, or may be performed in parallel with step S11.

Subsequently, the image capturing unit 3 and the stage moving mechanism 22 are controlled by the image capturing control unit 112 (see FIG. 4), so that an image capturing area having a predetermined size corresponding to each matching position 95 on the substrate 9 is captured. A captured image including part of the first pattern is obtained (step S13). The imaging area is a substantially rectangular area centered on the matching position 95 when the substrate 9 is accurately held at the designed position on the stage 21 . The imaging area has a pair of sides parallel to the X direction and the Y direction, respectively, and is larger than the extraction area 96 described above in both the X direction and the Y direction.

For example, the imaging area has a substantially rectangular shape obtained by enlarging the extraction area 96 by a predetermined size on each of the (+X) side, (−X) side, (+Y) side and (−Y) side. For example, the X-direction and Y-direction lengths of the imaging area (that is, the X-direction and Y-direction lengths of the imaging field of view of the imaging head 31) are 14 mm and 7 mm, respectively. Therefore, even if the position of the substrate 9 on the stage 21 is slightly deviated from the designed position, the pattern corresponding to the template 97 is included in the captured image. In step S<b>13 , a plurality of picked-up images respectively corresponding to a plurality of matching positions 95 are obtained and stored in the storage section 111 . Note that step S13 may be performed before step S12 or may be performed in parallel with step S12. Also, the size of the imaging area may be changed in various ways.

Next, the position detection unit 113 of the control unit 10 performs pattern matching on the captured image corresponding to each matching position 95 using the template 97 corresponding to the matching position 95 . The pattern matching is performed by a known pattern matching method (eg, geometric shape pattern matching, normalized correlation search, etc.). Then, the position of the substrate 9 on the stage 21 is detected based on the position of the same pattern as the template 97 in each captured image and the relative position between the substrate 9 and the imaging unit 3 when each captured image is acquired. It is detected by the unit 113 (see FIG. 4) (step S14).

The position of the substrate 9 detected by the position detection unit 113 in step S14 includes information indicating the coordinates of the substrate 9 in the X and Y directions on the stage 21, the orientation of the substrate 9, and deformation due to distortion or the like of the substrate 9. including. The information indicating the deformation of the substrate 9 is information such as the shape of the deformed substrate 9 and the positions of the plurality of partial drawing areas 94 on the substrate 9 .

In the control unit 10, the data generation unit 115 (see FIG. 4) reads the second CAD data from the storage unit 111 and rasterizes the second CAD data to generate the second raster data (step S15). ). The second raster data is run length data, for example. Step S15 may be performed after step S14, may be performed in parallel with step S14, or may be performed before step S14. When step S15 is performed before step S14, for example, step S15 may be performed in parallel with any one of steps S11 to S13, or may be performed between any two of steps S11 to S14. Alternatively, it may be performed before step S11.

When the second raster data is generated, the drawing unit 4 and the stage moving mechanism 22 are controlled by the drawing control unit 114 (see FIG. 4) based on the second raster data and the position of the substrate 9 detected in step S14. be done. As a result, the substrate 9 moved in the Y direction relative to the drawing head 41 of the drawing unit 4 is irradiated with the above-described modulated light, and the second pattern is drawn on the upper surface 90 of the substrate 9. (Step S16). In step S16, based on the position of the substrate 9 detected in step S14, the modulation interval and modulation timing of the light beam irradiated from the drawing unit 4 to the substrate 9, and the scanning position of the light beam on the substrate 9 are determined. etc. are mechanically and automatically corrected by a known correction method in the drawing unit 4 and the stage moving mechanism 22 . Thereby, the second pattern can be drawn on the first pattern with good positional accuracy.

In the above description, in step S12, the first raster data obtained by rasterizing the entire first CAD data (that is, the entire first pattern) is used as intermediate data, and the extraction corresponding to the matching position 95 is performed from the intermediate data. Although the template 97 is generated by extracting the region 96, it is not limited to this. For example, in step S12, only the partial data that is part of the first CAD data may be rasterized by the data generator 115 to create the intermediate data. In this case, the partial data is CAD data corresponding to an area of a predetermined size (hereinafter also referred to as a "clipping area") containing each matching position 95 in the first pattern. As described above, when a plurality of matching positions 95 are set, the partial data is CAD data corresponding to a set of clipping areas respectively corresponding to the plurality of matching positions 95 .

The positions and sizes of the plurality of clipping regions are preset in the data processing device 6 and included in the template generation information. In other words, the data processing device 6 clips the partial data corresponding to the clipping area in the first CAD data and sends it to the drawing device 1 .

Each clipping region includes one matching position 95 as described above and includes the entire extraction region 96 corresponding to that matching position 95 . The clipping area is, for example, a substantially rectangular area having a pair of sides parallel to the X direction and the Y direction and having a size equal to or larger than the extraction area 96 in both the X direction and the Y direction. For example, the clipping area has a predetermined size (for example, the X direction and the It has a shape enlarged by the maximum amount of positional deviation in the Y direction). Alternatively, as shown in FIG. 8, when the matching positions 95 are arranged only in some of the partial drawing regions 94 among the plurality of partial drawing regions 94, the clipping region is one partial drawing region 94 including the matching positions 95. may be in the same region as In this case, the partial data is CAD data corresponding to a plurality of partial drawing areas 94 each including a plurality of matching positions 95 (that is, a set of partial drawing areas 94 including matching positions 95). By rasterizing only a part of the first CAD data in the data generator 115 in this way, the time required for rasterization can be shortened.

Next, the data processing device 6 and creation of template generation information will be described. The data processing device 6 is a device that creates the template generation information described above and sends it to the drawing device 1 . As shown in FIG. 10, data processing device 6 is a normal computer comprising processor 601 , memory 602 , input/output unit 603 and bus 604 . A bus 604 is a signal circuit that connects the processor 601 , memory 602 and input/output unit 603 . The memory 602 stores various information. The memory 602 reads and stores a program 609 pre-stored in the storage medium 82, for example. The storage medium 82 is, for example, a USB memory or a CD-ROM.

The processor 601 executes various processes (for example, numerical calculation and image processing) while using the memory 602 and the like according to the program 609 and the like stored in the memory 602 . The input/output unit 603 includes a keyboard 605 and a mouse 606 that receive inputs from the operator, a display 607 that displays output from the processor 601, and a transmission unit 608 that transmits information to the drawing apparatus 1 and the like.

FIG. 11 is a block diagram showing functions realized by executing the program 609 in the data processor 6. As shown in FIG. The data processing device 6 includes a storage section 611 , an initial setting section 612 , a matching position determining section 613 and an information creating section 614 . A storage unit 611 is mainly realized by the memory 602 and stores in advance various kinds of information regarding creation of template generation information. The information stored in the storage unit 611 includes, for example, first CAD data and second CAD data. Initialization unit 612 , matching position determination unit 613 and information creation unit 614 are mainly implemented by processor 601 . The initial setting unit 612 sets temporary matching positions on the first pattern. The provisional matching position is an initial position provisionally set on the first pattern to determine the matching position 95 described above. A matching position determination unit 613 determines a matching position 95 based on the temporary matching position. The information creation unit 614 creates template generation information including coordinates indicating the matching position 95 determined by the matching position determination unit 613 .

Next, the flow of creation of template generation information in the data processing device 6 will be described with reference to FIG. Steps S21 to S29 shown in FIG. 12 describe step S121 shown in FIG. 5B in detail. Steps S21 to S28 are performed in the data processing device 6, and step S29 is performed in the drawing device 1. FIG.

When the template generation information is created, first, the temporary matching position is set on the first pattern by the initial setting unit 612 (see FIG. 11) (step S21). 13 and 14 are diagrams showing examples of arrangement of the temporary matching positions 95a on the substrate 9, respectively. 13 and 14, the temporary matching position 95a is indicated by an X-shaped mark.

In the data processing device 6, a plurality of placement modes for the temporary matching positions 95a are prepared, and one of the plurality of placement modes is selected by the designer. The initial setting unit 612 sets the coordinates of the plurality of temporary matching positions 95a according to the layout mode selected by the designer. FIG. 13 shows an arrangement in which provisional matching positions 95a are arranged only at four corners of the drawing area of the substrate 9 (that is, four corners of the minimum rectangle circumscribing a plurality of partial drawing areas 94 arranged in a matrix). mode (hereinafter also referred to as "first arrangement mode"). The first placement mode is a placement mode for determining matching positions 95 shown in FIG.

In the example shown in FIG. 13, four temporary matching positions 95a are arranged in four partial drawing regions 94 positioned at four corners among a plurality of partial drawing regions 94 arranged in a matrix on the substrate 9. be. Further, in each partial drawing area 94 in which the temporary matching position 95a is arranged, the temporary matching position 95a is located near one of the four corners of the partial drawing area 94 that is farthest from the center of the substrate 9. placed.

Specifically, in the partial drawing area 94 positioned at the (−X) side and (+Y) side corner, the temporary matching position 95a is positioned at the (−X) side and (+Y) side corner of the partial drawing area 94. located adjacent to the department. In addition, in the partial drawing area 94 positioned at the (+X) side and (+Y) side corner, the temporary matching position 95a is adjacent to the (+X) side and (+Y) side corner of the partial drawing area 94. placed. In the partial drawing area 94 located at the (+X) side and (−Y) side corner, the temporary matching position 95a is adjacent to the (+X) side and (−Y) side corner of the partial drawing area 94. placed. In the partial drawing area 94 located at the (-X) side and (-Y) side corner, the temporary matching position 95a is adjacent to the (-X) side and (-Y) side corner of the partial drawing area 94. are placed as follows.

FIG. 14 corresponds to an arrangement mode (hereinafter also referred to as “second arrangement mode”) in which a plurality of temporary matching positions 95a are arranged in a matrix in the X and Y directions in the drawing area of the substrate 9. FIG. The second placement mode is for determining matching positions 95 shown in FIG. In the second arrangement mode, a group of temporary matching positions in which a plurality of temporary matching position rows 950a are arranged at approximately equal intervals in the X direction is set, and the pitch of the plurality of temporary matching position rows 950a in the X direction is a predetermined upper limit value (for example, , 200 mm) or less. Each provisional matching position row 950a is a set of a plurality of provisional matching positions 95a arranged substantially parallel to the Y direction, and is surrounded by a chain double-dashed line in FIG.

In the second arrangement mode, temporary matching position rows 950a are arranged on the most (+X) side and the most (−X) side of the drawing area on the substrate 9, and another temporary matching position row 950a is placed between the two temporary matching position rows 950a. Matching position rows 950a are arranged at regular intervals. In the example shown in FIG. 14, three temporary matching position rows 950a are set on the substrate 9, but the number of temporary matching position rows 950a increases as the length of the substrate 9 in the X direction increases. Further, when the length of the substrate 9 in the X direction is shortened, the number of temporary matching position rows 950a is reduced. Note that the upper limit value of the pitch in the X direction of the plurality of temporary matching position rows 950a may be changed as appropriate, and is determined as appropriate within a range of 50 mm to 300 mm, for example.

In each provisional matching position row 950a, a plurality of provisional matching positions 95a arranged in the Y direction are arranged at approximately equal intervals. The pitch in the Y direction of the plurality of provisional matching positions 95a in each provisional matching position row 950a may be a preset fixed value (for example, 50 mm). Alternatively, it may be determined as appropriate by the designer. Further, in each temporary matching position row 950a, the temporary matching positions 95a are arranged on the most (+Y) side and the most (−Y) side of the drawing area on the substrate 9, and between the two temporary matching positions 95a, a predetermined A number of temporary matching positions 95a may be evenly spaced.

In the data processing device 6, an arrangement mode other than the above-described first arrangement mode and second arrangement mode may be selectable. For example, a plurality of temporary matching position rows 950a are arranged at approximately equal intervals in the X direction in substantially the same manner as in FIG. A placement mode (hereinafter also referred to as a “third placement mode”) may be selectable. In the third arrangement mode, as in the second arrangement mode, the provisional matching position columns 950a are arranged on the most (+X) side and the most (−X) side of the drawing area on the substrate 9, and the two provisional matching position columns Between 950a, other provisional matching position rows 950a are arranged at regular intervals. In the third arrangement mode, even if the length of the substrate 9 in the X direction changes, the number of temporary matching position rows 950a arranged in the X direction does not change. Note that the number of the plurality of temporary matching position rows 950a arranged in the X direction may be changed as appropriate, and is determined as appropriate between 2 and 6, for example.

Subsequently, as shown in FIG. 15, the matching position determining unit 613 (see FIG. 11) sets a temporary template area 951a corresponding to each temporary matching position 95a (step S22). In FIG. 15, the portion near the provisional matching position 95a arranged near the (−X) side and (+Y) side corner of the partial drawing area 94 positioned at the upper left corner in FIGS. 8 and 9 is enlarged. shown as The temporary template area 951a has the same size as the template 97 described above. The relative position of the temporary template region 951a to the temporary matching position 95a is the same as the relative position of the extraction region 96 to the matching position 95 described above. The temporary template area 951a is, for example, a substantially square area of 2 mm square centered on the temporary matching position 95a.

Further, in the matching position determining unit 613, a check area 952a larger than the imaging field of view of the imaging head 31 of the imaging unit 3 (in the above example, a substantially rectangular area of 14 mm×7 mm) is set around the temporary template area 951a ( step S23). The check area 952a has a substantially rectangular shape having a pair of sides parallel to the X direction and the Y direction, respectively, and is larger than the imaging field of view described above in both the X direction and the Y direction. For example, the check area 952a has a predetermined size on each of the (+X) side, the (−X) side, the (+Y) side and the (−Y) side of the imaging field of view (for example, the X direction of the assumed substrate 9). and the maximum positional deviation amount in the Y direction). If the maximum positional deviation amount is, for example, 3 mm, the check area 952a is a substantially rectangular area of 20 mm×13 mm. Note that the size of the check area 952a may be changed in various ways.

When step S23 is completed, the matching position determination unit 613 confirms the existence of an overlapping area showing the same pattern as the temporary template area 951a in the check area 952a (step S24). The overlapping region is a region having the same shape as the temporary template region 951a located at a different position from the temporary template region 951a.

Specifically, the matching position determining unit 613 extracts a region having the same shape as the temporary template region 951a (hereinafter also referred to as a “comparison region”) from the check region 952a, and extracts the pattern indicated by the comparison region and the temporary template. The pattern indicated by the area 951a is compared by a known method based on the first CAD data. If both patterns are the same, the comparison area is identified as an overlapping area, and if the two patterns are different, the comparison area is identified as not being an overlapping area. The matching position determination unit 613 extracts the comparison area and performs pattern comparison with the temporary template area 951a over the entire check area 952a. It is determined that there is no overlapping area. On the other hand, when a comparison region recognized as an overlapping region appears during the extraction of the comparison region in the check region 952a and the pattern comparison with the temporary template region 951a, the matching position determination unit 613 determines that the overlap region in the check region 952a. exists, and the extraction of the comparison region is stopped.

If there is an overlapping area in step S24, the matching position determining unit 613 moves the temporary matching position 95a by a predetermined distance in a predetermined direction (step S25). The predetermined direction is, for example, the X direction or the Y direction. In the example shown in FIG. 15, since there is almost no drawing area on the (+Y) side and (-X) side of the temporary matching position 95a, the moving direction of the temporary matching position 95a is substantially the (-Y) direction or (+X) direction. Also, the predetermined distance is, for example, 0.5 to 1 times the length of the temporary template region 951a in the X direction or the Y direction. In the case of the provisional matching position 95a positioned near the central portion of the substrate 9, the movement directions of the provisional matching position 95a are the (−Y) direction, the (+Y) direction, the (−X) direction, and the (+X) direction. Both can be set.

In this embodiment, as shown in FIG. 16, the temporary matching position 95a is located in the (-Y) direction (that is, the direction parallel to the scanning direction) from the position shown in FIG. Moves a distance equal to 0.5 times its length. In FIG. 15, the temporary matching position 95a after movement is indicated by a solid line, and the temporary matching position 95a during movement is indicated by a chain double-dashed line. Then, returning to step S22, the matching position determining unit 613 sets a temporary template area 951a and a check area 952a corresponding to the new temporary matching position 95a (steps S22 and S23). In other words, the matching position determination unit 613 moves the temporary matching position 95a to reset the temporary template area 951a and the check area 952a. In FIG. 15, the reset temporary template area 951a and check area 952a are indicated by solid lines, and the temporary template area 951a and check area 952a before reset are indicated by two-dot chain lines. Then, whether or not there is an overlapping area in the check area 952a is checked again (step S24).

The data processing device 6 repeats steps S22 to S25 until it is confirmed that there is no overlapping area in the check area 952a. Then, in step S24, if there is no overlapping area in the check area 952a, the matching position determining unit 613 determines the temporary matching position 95a at that time as the matching position 95 (step S26). In the data processing device 6, steps S22 to S26 are performed for each of the plurality of temporary matching positions 95a, and a plurality of matching positions 95 respectively corresponding to the plurality of temporary matching positions 95a are determined.

After that, template generation information including the coordinates of the plurality of matching positions 95 determined in step S26 is created by the information creation unit 614 (see FIG. 11) (step S27). The template generation information also includes the first CAD data, the second CAD data and the template size information as described above. The template generation information also includes, for example, clipping information regarding the clipping region described above. The template generation information created in step S27 is sent from the transmission unit 608 (see FIG. 10) of the data processing device 6 to the drawing device 1 (step S28), and stored in the storage unit 111 of the drawing device 1 (step S28). step S29).

As explained above, the drawing system 5 includes the drawing device 1 and the data processing device 6 . The drawing apparatus 1 draws a pattern by irradiating the substrate 9 with light. The data processing device 6 creates template generation information and sends it to the drawing device 1 . The drawing apparatus 1 includes a stage 21, a drawing head 41, a scanning mechanism (stage moving mechanism 22 in the above example), an imaging unit 3, a position detection unit 113, a storage unit 111, a data generation unit 115, and a drawing control unit 114 . The stage 21 holds the substrate 9 on which the first pattern is previously provided on the upper surface 90 . The drawing head 41 irradiates the upper surface 90 of the substrate 9 with modulated light. The scanning mechanism relatively moves the stage 21 with respect to the drawing head 41 in the scanning direction parallel to the upper surface 90 of the substrate 9 (the Y direction in the above example). The imaging unit 3 images part of the first pattern.

The position detection unit 113 detects the position of the substrate 9 by performing pattern matching using the template 97 on the captured image acquired by the imaging unit 3 . The storage unit 111 stores second CAD data, which is CAD data of a second pattern drawn on the first pattern. The data generator 115 rasterizes the second CAD data to generate second raster data. The drawing control unit 114 controls the drawing head 41 and the scanning mechanism based on the second raster data and the position of the substrate 9 detected by the position detection unit 113, thereby moving relative to the drawing head 41 in the scanning direction. The drawing of the second pattern on the substrate 9 is executed.

The storage unit 111 further stores template generation information including coordinates indicating a matching position 95 where pattern matching is performed by the position detection unit 113 on the first pattern. The data generation unit 115 rasterizes the CAD data of the first pattern to create intermediate data, and from the intermediate data, extracts image data of an area of a predetermined size (that is, an extraction area 96) corresponding to the matching position 95. It is generated as a template 97.

The data processing device 6 includes an initial setting section 612 , a matching position determining section 613 and an information creating section 614 . The initial setting unit 612 sets the temporary matching position 95a on the first pattern. The matching position determining unit 613 sets a temporary template area 951a having the same size as the template 97 corresponding to the temporary matching position 95a, and sets a check area 952a centered on the temporary template area 951a and larger than the imaging field of view of the imaging unit 3. do. The matching position determining unit 613 also confirms whether or not there is an overlapping area showing the same pattern as the temporary template area 951a in the check area 952a. If there is an overlapping area in the check area 952a, the matching position determining unit 613 moves the temporary matching position 95a in a predetermined direction, resets the temporary template area 951a and the check area 952a, and determines whether there is an overlapping area. Repeat to confirm. On the other hand, if there is no overlapping area in the check area 952a, the matching position determining unit 613 determines the temporary matching position 95a as the matching position 95. FIG. The information creation unit 614 creates template generation information including coordinates indicating the matching position 95 determined by the matching position determination unit 613 .

As described above, in the drawing system 5 , when generating the template 97 used in pattern matching when detecting the position of the substrate 9 , the drawing apparatus 1 does not capture an image of the first pattern on the substrate 9 . A template 97 can be generated from CAD data. Therefore, when generating the template 97, it is not necessary to accurately place the substrate 9 at the design position on the stage 21 or to image the first pattern on the substrate 9 by the imaging unit 3. FIG. Therefore, the template 97 can be generated easily and quickly. In addition, since the position where pattern matching is performed (ie, the matching position 95) can be automatically determined in the data processing device 6, the work of determining the matching position 95 by the designer can be omitted. As a result, it is also possible to reduce the designer's workload required for template generation.

As described above, in the data processing device 6, the moving direction of the provisional matching position 95a by the matching position determining unit 613 when there is an overlapping area in the check area 952a is the scanning direction (the Y direction in the above example). is preferred. As a result, the positions of the plurality of matching positions 95 in the width direction (the X direction in the above example) are the same. relative movement becomes unnecessary. As a result, the time required for detecting the position of the substrate 9 in the drawing apparatus 1 can be shortened.

As described above, preferably, the initial setting unit 612 sets a temporary matching position group in which a plurality of temporary matching position rows 950a are arranged at regular intervals in the width direction perpendicular to the scanning direction. Each of the plurality of temporary matching position columns 950a is a set of temporary matching positions 95a arranged in the scanning direction. In addition, it is preferable that the pitch in the width direction of the plurality of temporary matching position rows 950a be equal to or less than a predetermined value. Thereby, an appropriate number of matching positions 95 can be set at appropriate positions on the substrate 9 . As a result, the accuracy of position detection of the substrate 9 can be improved.

Alternatively, as described above, it is also preferable that the number of the plurality of temporary matching position columns 950a is a predetermined number. In this case as well, an appropriate number of matching positions 95 can be set at appropriate positions on the substrate 9 in substantially the same manner as described above, so the accuracy of position detection of the substrate 9 can be improved. Further, by fixing the number of temporary matching position rows 950a regardless of the size of the substrate 9, the work of setting the temporary matching positions 95a can be simplified.

As shown in FIG. 13, when a plurality of partial drawing areas 94 arranged in a matrix in the scanning direction and the width direction perpendicular to the scanning direction are set on the upper surface 90 of the substrate 9, the plurality of partial drawing areas 94, in the partial drawing area 94 on the most one side in the scanning direction and the most on the one side in the width direction (the most (+Y) side and the most (−X) side in the above example), the temporary matching position 95a It is preferably arranged adjacent to the corner on the one side and the one side in the width direction (in the above example, the (+Y) side and the (−X) side). Further, in the partial drawing area 94 on the most one side in the scanning direction and the most on the other side in the width direction (the most (+Y) side and the most (+X) side in the above example) of the plurality of partial drawing areas 94, provisional matching The position 95a is preferably arranged adjacent to the corner on the one side in the scanning direction and the other side in the width direction (the (+Y) side and the (+X) side in the above example). Furthermore, in the partial drawing area 94 on the othermost side in the scanning direction and the othermost side in the width direction (in the above example, the most (-Y) side and the most (+X) side in the above example) of the plurality of partial drawing areas 94, The matching position 95a is preferably arranged adjacent to the corner on the other side in the scanning direction and the other side in the width direction (in the above example, the (-Y) side and the (+X) side). Then, in the partial drawing area 94 on the othermost side in the scanning direction and the most one side in the width direction (in the above example, the most (−Y) side and the most (−X) side in the above example) of the plurality of partial drawing areas 94 , the temporary matching position 95a is preferably arranged adjacent to the corner on the other side in the scanning direction and the one side in the width direction (in the above example, the (-Y) side and the (-X) side). .

In this way, by arranging the four temporary matching positions 95a at the four corners of the minimum rectangle circumscribing the plurality of partial drawing areas 94 arranged in a matrix on the substrate 9, the four corners Four matching positions 95 are arranged in the region near the part. As a result, substantially the entire region in which the second pattern is drawn can be surrounded by the four matching positions 95 . As a result, substantially the entire area in which the second pattern is to be drawn can be aligned with high accuracy, and the drawing accuracy of the second pattern can be improved.

The number and arrangement of matching positions 95 on substrate 9 are not limited to those shown in FIGS. 8 and 9, and may be variously changed. For example, as shown in FIG. 17, in partial drawing regions 94 located at four corners of a plurality of partial drawing regions 94 arranged in a matrix, each partial drawing region at a matching position 95 in each partial drawing region 94 94 (for example, relative coordinates with the corners of the (−X) side and (+Y) side of the partial drawing area 94 as the origin) may be the same. In the example shown in FIG. 17 , in each of the four partial drawing areas 94 , the matching position 95 is arranged adjacent to the (−X) side and (+Y) side corner of the partial drawing area 94 .

In this case, the data generation unit 115 of the drawing apparatus 1 does not generate four templates 97 by extracting four extraction regions 96 respectively corresponding to the four matching positions 95, but rather draws partial drawing regions located at four corners. One template 97 corresponding to the matching position 95 of one partial drawing area 94 out of 94 is generated. The one template 97 is shared for pattern matching at the matching positions 95 of the four partial drawing areas 94 by the position detection unit 113 . As a result, the time required to generate the template 97 can be shortened.

Further, the initial setting unit 612 of the data processing device 6 sets the temporary matching position 95a in only one partial drawing area 94 out of the four partial drawing areas 94, and the matching position determining unit 613 sets the temporary matching position 95a. A matching position 95 in the one partial drawing area 94 is determined based on. Then, for the remaining three partial drawing areas 94, the matching position determination unit 613 determines matching positions 95 having the same relative positions as the relative positions of the matching positions 95 with respect to the one partial drawing area 94 described above. That is, for the remaining three partial drawing areas 94, setting of the temporary matching positions 95a is not performed, and determination of the matching positions 95 based on the temporary matching positions 95a is also omitted. As a result, it is possible to shorten the time required to generate the template generation information including the coordinates of the matching position 95 .

In the example shown in FIG. 17, the case where the matching positions 95 are arranged at the same position in each partial drawing area 94 located at four corners of the plurality of partial drawing areas 94 has been described. However, in two or more partial drawing areas 94 regardless of the position in the plurality of partial drawing areas 94, even if the matching position 95 is arranged at the same position in each partial drawing area 94, substantially the same effect is obtained. play.

That is, in two or more partial drawing areas 94 among the plurality of partial drawing areas 94, when the relative position of the matching position 95 in each partial drawing area 94 with respect to each partial drawing area 94 is the same, the data generation unit 115 , one template 97 corresponding to the matching position 95 of one partial drawing area 94 among the two or more partial drawing areas 94 is generated, and the position detection unit 113 detects each of the two or more partial drawing areas 94. The one template 97 is preferably shared for pattern matching at matching positions 95 of . As a result, the time required to generate the template 97 can be shortened.

In addition, the matching position determination unit 613 sets a temporary matching position 95a in one partial drawing area 94 of the two or more partial drawing areas 94, and the matching position determination unit 613 sets the temporary matching position 95a based on the temporary matching position 95a. A matching position 95 within the one partial drawing area 94 is determined. Then, in the other partial drawing area 94 among the two or more partial drawing areas 94, the relative position with respect to the other partial drawing area 94 is the same as the relative position of the matching position 95 with respect to the one partial drawing area 94. Preferably, the matching positions 95 are determined such that As a result, the time required to create the template generation information can be shortened.

In the above description, in determining the matching position 95 in the data processing device 6, steps S22 to S25 are repeated until it is confirmed that there is no overlapping area in the check area 952a. The number of times may be limited to a predetermined upper limit or less. In this case, if the matching position 95 is not determined even after steps S22 to S25 have reached the upper limit number of times, for example, the display 607 (see FIG. 10) indicates to that effect to notify the designer. The designer confirms the missing position of the matching position 95 on the substrate 9 (that is, the position where the matching position 95 has not been determined), and determines that the impact of the missing position on the alignment process is small. is missing, the data processing device 6 continues to create the template generation information. In this case, the drawing apparatus 1 does not perform pattern matching at the missing position.

On the other hand, when the designer determines that the missing position has a large influence on the alignment process, an appropriate position is determined as the matching position 95 in an area near the missing position (for example, a 5 mm square range from the missing position). and the coordinates of the matching position 95 are included in the template generation information. The appropriate position is a position in which there is no overlap region showing the same pattern as the provisional template region 951a in the check region 952a when the position is the provisional matching position 95a. The presence or absence of the overlapping area is determined visually by the designer. In this way, the template generation information further includes coordinates indicating other matching positions 95 determined by the designer, so that the lack of the template 97 at a position of high importance such as the corner of the drawing area on the substrate 9 can be prevented. can be prevented. As a result, it is possible to suppress deterioration in the accuracy of position detection of the substrate 9 .

As described above, the drawing method for drawing a pattern by irradiating the substrate with light includes the step of holding the substrate 9 having the first pattern provided in advance on the upper surface 90 (step S11), and the step of holding the substrate 9 in position. a step of generating a template 97 used for detection (step S12); a step of capturing an image of a part of the first pattern (step S13); and a step of rasterizing the second CAD data, which is the CAD data of the second pattern drawn on the first pattern, to generate the second raster data (step S14). Step S15) and the drawing head 41 for irradiating the upper surface 90 of the substrate 9 with modulated light based on the second raster data and the position of the substrate 9 detected in step S14, and By controlling the scanning mechanism (the stage moving mechanism 22 in the above example) that relatively moves the substrate 9 with respect to the drawing head 41 in the scanning direction (the Y direction in the above example), the drawing head 41 and a step of drawing the second pattern on the substrate 9 that relatively moves in the scanning direction (step S16).

Step S12 is a step of preparing coordinates indicating a matching position 95 where pattern matching is performed on the first pattern (step S121), creating intermediate data by rasterizing the CAD data of the first pattern, , and a step of generating image data of a region of a predetermined size corresponding to the matching position 95 as a template 97 (step S122).

Step S121 is a step of setting a temporary matching position 95a on the first pattern (step S21), setting a temporary template area 951a having the same size as the template 97 corresponding to the temporary matching position 95a, and setting the temporary template area 951a. A check area 952a larger than the imaging field of view in step S13 is set as the center, and the presence or absence of an overlapping area showing the same pattern as the temporary template area 951a is confirmed in the check area 952a. If the overlapping area exists, temporary matching is performed. The position 95a is moved in a predetermined direction, the temporary template area 951a and the check area 952a are reset, and the presence or absence of overlapping areas is repeatedly confirmed. (Steps S22 to S26), and a step (Step S27) of creating template generation information including the coordinates indicating the matching position 95 determined in Steps S22 to S26. As a result, the template 97 can be generated easily and quickly, and the workload of the designer required for generating the template can be reduced, as in the above case.

In the above example, the drawing apparatus 1 pre-stores the program 609 for generating template generation information, and the computer 100 of the drawing apparatus 1 pre-stores the program 109 for generating the template 97. is not limited. For example, the program 109, 609 may be retrofitted (that is, retrofitted) into a drawing system 5 already in use. In this case, the program 609 is executed by the data processing device 6 to perform the step of setting the temporary matching position 95a on the first pattern (step S21) and the template 97 corresponding to the temporary matching position 95a. A temporary template area 951a is set, a check area 952a larger than the imaging field of the imaging unit 31 is set around the temporary template area 951a, and an overlap area showing the same pattern as the temporary template area 951a in the check area 952a is set. If the overlapping area exists, the temporary matching position 95a is moved in a predetermined direction, the temporary template area 951a and the check area 952a are reset, and the existence of the overlapping area is repeatedly confirmed. If the region does not exist, a step of determining the temporary matching position 95a as the matching position 95 (steps S22 to S26), and a step of creating template generation information including the coordinates indicating the matching position 95 determined in steps S22 to S26. (Step S27) and are executed.

As a result, it is possible to reduce the designer's workload required for template generation, as described above. Further, the program 109 is executed by the computer 100 so that the data generator 115 rasterizes the CAD data of the first pattern to create intermediate data. Image data of the size region (ie, the extraction region 96) is generated as a template 97. FIG. As a result, the template 97 can be easily and quickly generated in the same manner as described above.

Various modifications can be made to the drawing system 5, the drawing method, and the programs 109 and 609 described above.

For example, in the above example, a case has been described in which a plurality of partial drawing areas 94 each of which is partitioned into a substantially rectangular shape by grid-like dividing lines 93 are set on the upper surface 90 of the substrate 9, but FIG. 2, a plurality of partitioned areas 92 partitioned into substantially rectangular shapes by partitioning lines 91 are set on the upper surface 90 of the substrate 9, and a plurality of partial drawing areas arranged in a matrix are set in each partitioned area 92. The areas 94 may be set with the same arrangement. In this case, after the matching position is determined for one of the partitioned regions 92 by the same operations as in S21 to S26 described above, in the other partitioned region 92, the same relative position as the matching position for the one partitioned region 92 is determined. The template generation information may be created by determining the matching position so as to be the position. This makes it possible to shorten the time required to create the template generation information compared to the case where the matching positions are calculated for all the partitioned areas 92 .

Further, for example, in the above example, drawing on one main surface of the substrate 9 has been described, but the drawing apparatus 1 may draw patterns on both main surfaces of the substrate 9 . In this case, when drawing on the other main surface of the substrate 9, the template used for pattern matching is obtained by the data processing device from the CAD data of the pattern formed in advance on the other main surface in the same manner as described above. 6 automatically created.

In the above-described step S24, if there is an overlapping area overlapping the temporary template area 951a in the check area 952a, the movement direction of the temporary matching position 95a in step S25 is not limited to the X direction or the Y direction, and can be changed in various ways. may be For example, the temporary matching position 95a may be moved in the X direction and the Y direction (ie diagonally). Alternatively, the temporary matching position 95a may be moved spirally around the initially set temporary matching position 95a.

It is not always necessary to set a plurality of partial drawing areas 94 on the substrate 9 described above. Also, the board 9 is not necessarily limited to a printed board. In the drawing apparatus 1, for example, even if drawing is performed on a semiconductor substrate, a glass substrate for a flat panel display device such as a liquid crystal display device or an organic EL display device, a glass substrate for a photomask, a substrate for a solar cell panel, or the like. good.

The configurations in the above embodiment and each modified example may be combined as appropriate as long as they do not contradict each other.

1 drawing device 3 imaging unit 5 drawing system 6 data processing device 9 substrate 21 stage 22 stage movement mechanism 41 drawing head 90 upper surface (of substrate) 94 partial drawing region 95 matching position 95a temporary matching position 96 extraction region 97 template 109, 609 concerned Program 111 storage unit 113 position detection unit 114 drawing control unit 115 data generation unit 612 initial setting unit 613 matching position determination unit 614 information creation unit 950a temporary matching position sequence 951a temporary template area 952a check area S11 to S16, S21 to S29, S121 ~ S122 step

Claims (11)

A drawing system,
a drawing device that draws a pattern by irradiating a substrate with light;
a data processing device that creates template generation information and sends it to the rendering device;
with
The drawing device
a stage for holding the substrate having a first pattern provided in advance on the upper surface;
a drawing head for irradiating the upper surface of the substrate with modulated light;
a scanning mechanism that moves the stage relative to the drawing head in a scanning direction parallel to the upper surface of the substrate;
an imaging unit that images a part of the first pattern;
a position detection unit that detects the position of the substrate by performing pattern matching using a template on the captured image acquired by the imaging unit;
a storage unit that stores second CAD data that is CAD data of a second pattern to be drawn on the first pattern;
a data generation unit that rasterizes the second CAD data to generate second raster data;
By controlling the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection unit, the substrate moves relative to the drawing head in the scanning direction. a drawing control unit that executes drawing of the second pattern of
with
The storage unit further stores the template generation information including coordinates indicating a matching position on the first pattern where pattern matching is performed by the position detection unit,
The data generation unit rasterizes the CAD data of the first pattern to create intermediate data, generates image data of a region of a predetermined size corresponding to the matching position from the intermediate data as the template,
The data processing device is
an initial setting unit that sets a temporary matching position on the first pattern;
setting a temporary template area having the same size as the template corresponding to the temporary matching position; setting a check area centered on the temporary template area and larger than an imaging field of view of the imaging unit; Existence of an overlapping area showing the same pattern as that of the template area is checked, and if the overlapping area exists, the temporary matching position is moved in a predetermined direction to reset the temporary template area and the check area. a matching position determination unit that repeatedly confirms the presence or absence of an overlapping area and determines the temporary matching position as the matching position when the overlapping area does not exist;
an information creation unit that creates the template generation information including the coordinates indicating the matching position determined by the matching position determination unit;
A drawing system comprising: The drawing system according to claim 1,
The drawing system, wherein the moving direction of the temporary matching position by the matching position determining unit when the overlapping area exists is the scanning direction. 3. The drawing system according to claim 1 or 2,
The initial setting unit sets a temporary matching position group in which a plurality of temporary matching position rows, each of which is a set of temporary matching positions aligned in the scanning direction, are arranged at regular intervals in a width direction perpendicular to the scanning direction, A drawing system, wherein a pitch in the width direction of the plurality of temporary matching position sequences is set to a predetermined value or less. 3. The drawing system according to claim 1 or 2,
The initial setting unit sets a temporary matching position group in which a plurality of temporary matching position rows, each of which is a set of temporary matching positions aligned in the scanning direction, are arranged at regular intervals in a width direction perpendicular to the scanning direction, A drawing system, wherein the number of the plurality of temporary matching position sequences is a predetermined number. The drawing system according to any one of claims 1 to 4,
a plurality of partial drawing areas are set on the upper surface of the substrate, and are arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction, and each of which has the same pattern drawn thereon;
The initial setting unit sets a temporary matching position in one partial drawing area among the plurality of partial drawing areas,
The matching position determination unit determines a matching position in the one partial drawing area based on the temporary matching position, and determines a matching position in another partial drawing area among the plurality of partial drawing areas with respect to the other partial drawing area. A drawing system, wherein the matching position is determined such that the relative position is the same as the relative position of the matching position with respect to the one partial drawing area. The drawing system according to any one of claims 1 to 4,
a plurality of partial drawing areas arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction are set on the upper surface of the substrate;
In the partial drawing area on the one side in the scanning direction and the one side in the width direction among the plurality of partial drawing areas, the temporary matching position is the one side in the scanning direction and the one side in the width direction. located adjacent to the corner of the
In the partial drawing area on the one side in the scanning direction and the other side in the width direction among the plurality of partial drawing areas, the temporary matching position is the one side in the scanning direction and the other side in the width direction. located adjacent to the side corners,
In the partial drawing area on the othermost side in the scanning direction and on the one side in the width direction among the plurality of partial drawing areas, the temporary matching position is the one on the other side in the scanning direction and the one side in the width direction. located adjacent to the side corners,
In the partial drawing area on the other side in the scanning direction and on the other side in the width direction among the plurality of partial drawing areas, the temporary matching position is the one on the other side in the scanning direction and in the width direction. A drawing system positioned adjacent to the corner on the other side. The drawing system according to any one of claims 1 to 6,
The data processing device clips partial data, which is CAD data corresponding to a predetermined region including the matching position in the first pattern, and sends the clipped data to the drawing device;
The drawing system, wherein the data generation unit of the drawing device rasterizes only the partial data to create the intermediate data. 8. The drawing system according to claim 7,
a plurality of partial drawing areas arranged in a matrix in the scanning direction and in a width direction perpendicular to the scanning direction are set on the upper surface of the substrate;
The drawing system, wherein the partial data corresponds to a partial drawing area including the matching position. The drawing system according to any one of claims 1 to 8,
The drawing system, wherein the template generation information further includes coordinates indicating other matching positions determined by a designer. A drawing method for drawing a pattern by irradiating a substrate with light,
a) holding a substrate having a first pattern already provided on its top surface;
b) generating a template to be used for position detection of said substrate;
c) imaging a portion of the first pattern;
d) a step of detecting the position of the substrate by performing pattern matching using the template on the captured image obtained in the step c);
e) a step of rasterizing second CAD data, which is CAD data of a second pattern drawn on the first pattern, to generate second raster data;
f) a drawing head for irradiating the upper surface of the substrate with modulated light based on the second raster data and the position of the substrate detected in the step d); and a scanning mechanism that moves the substrate relative to the drawing head in the scanning direction, thereby drawing the second pattern on the substrate that moves relative to the drawing head in the scanning direction. and
with
The step b) is
b1) preparing template generation information including coordinates indicating a matching position where the pattern matching is performed on the first pattern;
b2) creating intermediate data by rasterizing the CAD data of the first pattern, and generating image data of a region of a predetermined size corresponding to the matching position from the intermediate data as the template;
with
The step b1) is
b3) setting a temporary matching position on the first pattern;
b4) setting a temporary template region having the same size as the template corresponding to the temporary matching position; confirms whether or not there is an overlapping area showing the same pattern as the temporary template area, and if the overlapping area exists, the temporary matching position is moved in a predetermined direction to reset the temporary template area and the check area. a step of repeatedly confirming the presence or absence of the overlapping area by repeating the step of confirming the presence or absence of the overlapping area, and determining the temporary matching position as the matching position when the overlapping area does not exist;
b5) creating the template generation information including the coordinates indicating the matching position determined in the b4) step;
A drawing method comprising: A program to be executed in a drawing system that draws a pattern by irradiating a substrate with light,
The drawing system comprises:
a drawing device that draws a pattern by irradiating a substrate with light;
a data processing device that creates template generation information and sends it to the rendering device;
with
The drawing device
a stage for holding a substrate on which a first pattern is provided in advance;
a drawing head for irradiating the upper surface of the substrate with modulated light;
a scanning mechanism that moves the stage relative to the drawing head in a scanning direction parallel to the upper surface of the substrate;
an imaging unit that images a part of the first pattern;
a position detection unit that detects the position of the substrate by performing pattern matching using a template on the captured image acquired by the imaging unit;
a storage unit that stores second CAD data that is CAD data of a second pattern to be drawn on the first pattern;
a data generation unit that rasterizes the second CAD data to generate second raster data;
By controlling the drawing head and the scanning mechanism based on the second raster data and the position of the substrate detected by the position detection unit, the substrate moves relative to the drawing head in the scanning direction. a drawing control unit that executes drawing of the second pattern of
with
By executing the program by a computer,
g) setting temporary matching positions on the first pattern;
h) setting a temporary template area having the same size as the template corresponding to the temporary matching position; setting a check area centered on the temporary template area and larger than the imaging field of view of the imaging unit; The presence or absence of an overlapping area showing the same pattern as the temporary template area is confirmed, and if the overlapping area exists, the temporary matching position is moved in a predetermined direction to reset the temporary template area and the check area. a step of repeatedly confirming the presence or absence of the overlapping area with a step of determining the temporary matching position as the matching position when the overlapping area does not exist;
i) creating the template generation information including coordinates indicating the matching position determined in step h);
is executed in the data processing device,
j) creating intermediate data by rasterizing the CAD data of the first pattern, and generating image data of a region of a predetermined size corresponding to the matching position from the intermediate data as the template, A program that is executed by the data generator of the device.

Images