JP2023031670A5 - - Google Patents

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Publication number
JP2023031670A5
JP2023031670A5 JP2021137299A JP2021137299A JP2023031670A5 JP 2023031670 A5 JP2023031670 A5 JP 2023031670A5 JP 2021137299 A JP2021137299 A JP 2021137299A JP 2021137299 A JP2021137299 A JP 2021137299A JP 2023031670 A5 JP2023031670 A5 JP 2023031670A5
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JP
Japan
Prior art keywords
mold
displacement
actuator
adjustment unit
displacement member
Prior art date
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Application number
JP2021137299A
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English (en)
Japanese (ja)
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JP7703397B2 (ja
JP2023031670A (ja
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Priority to JP2021137299A priority Critical patent/JP7703397B2/ja
Priority claimed from JP2021137299A external-priority patent/JP7703397B2/ja
Priority to US17/877,283 priority patent/US12449727B2/en
Priority to KR1020220104836A priority patent/KR20230030537A/ko
Publication of JP2023031670A publication Critical patent/JP2023031670A/ja
Publication of JP2023031670A5 publication Critical patent/JP2023031670A5/ja
Application granted granted Critical
Publication of JP7703397B2 publication Critical patent/JP7703397B2/ja
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JP2021137299A 2021-08-25 2021-08-25 インプリント装置、物品の製造方法、及びコンピュータプログラム Active JP7703397B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2021137299A JP7703397B2 (ja) 2021-08-25 2021-08-25 インプリント装置、物品の製造方法、及びコンピュータプログラム
US17/877,283 US12449727B2 (en) 2021-08-25 2022-07-29 Imprint apparatus, manufacturing method for article, and computer program
KR1020220104836A KR20230030537A (ko) 2021-08-25 2022-08-22 임프린트 장치, 물품의 제조 방법, 및 컴퓨터 프로그램

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021137299A JP7703397B2 (ja) 2021-08-25 2021-08-25 インプリント装置、物品の製造方法、及びコンピュータプログラム

Publications (3)

Publication Number Publication Date
JP2023031670A JP2023031670A (ja) 2023-03-09
JP2023031670A5 true JP2023031670A5 (enExample) 2024-09-02
JP7703397B2 JP7703397B2 (ja) 2025-07-07

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ID=85288511

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Application Number Title Priority Date Filing Date
JP2021137299A Active JP7703397B2 (ja) 2021-08-25 2021-08-25 インプリント装置、物品の製造方法、及びコンピュータプログラム

Country Status (3)

Country Link
US (1) US12449727B2 (enExample)
JP (1) JP7703397B2 (enExample)
KR (1) KR20230030537A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7712832B2 (ja) * 2021-09-21 2025-07-24 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08332646A (ja) * 1995-06-06 1996-12-17 Meiki Co Ltd 真空積層装置および真空積層方法
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
US8025829B2 (en) * 2006-11-28 2011-09-27 Nanonex Corporation Die imprint by double side force-balanced press for step-and-repeat imprint lithography
US8043085B2 (en) * 2008-08-19 2011-10-25 Asml Netherlands B.V. Imprint lithography
JP6304934B2 (ja) * 2012-05-08 2018-04-04 キヤノン株式会社 インプリント装置および物品の製造方法
WO2014127309A1 (en) * 2013-02-15 2014-08-21 Tufts University Silk-based nanoimprinting
JP2019079875A (ja) * 2017-10-23 2019-05-23 キヤノン株式会社 リソグラフィ装置、および物品の製造方法
JP7254564B2 (ja) * 2019-03-05 2023-04-10 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法

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