JP2022188035A - 半連続的に多段階で化合物を製造するための装置および処理 - Google Patents
半連続的に多段階で化合物を製造するための装置および処理 Download PDFInfo
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- DNAPJAGHXMPFLD-UHFFFAOYSA-N triiodosilane Chemical compound I[SiH](I)I DNAPJAGHXMPFLD-UHFFFAOYSA-N 0.000 description 2
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/4417—Methods specially adapted for coating powder
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/442—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using fluidised bed process
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
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- H01M4/583—Carbonaceous material, e.g. graphite-intercalation compounds or CFx
- H01M4/587—Carbonaceous material, e.g. graphite-intercalation compounds or CFx for inserting or intercalating light metals
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Abstract
Description
本出願は、2015年4月12日に出願された米国仮特許出願第62/146,304号「半連続的に化合物を製造するための装置および処理」に基づく利益を主張する。該出願の開示内容は、参照により本明細書に組み込まれる。
Claims (23)
- 化合物を製造する方法であって、
反応装置内の第1のカーボン基板上に、制御された仕方でシリコン導入を行うステップと、
前記カーボン基板を、前記反応装置から貯蔵器に移動するステップと、
前記第1のカーボン基板が前記貯蔵器内で冷却されている間に、前記反応装置内の第2のカーボン基板上に、制御された仕方でシリコン導入を行うステップと、
を備える方法。 - 前記反応装置は、流動層反応装置である、
請求項1に記載の方法。 - 前記カーボン基板から、シリコン-グラフェン化合物を製造するステップをさらに備える、
請求項1に記載の方法。 - 前記シリコン-グラフェン化合物は、化学蒸着を用いて製造される、
請求項3に記載の方法。 - 前記シリコン-グラフェン化合物は、熱蒸着を用いて製造される、
請求項3に記載の方法。 - 前記カーボン基板は、シリコン-カーボン化合物またはスズ-カーボン化合物である、
請求項1に記載の方法。 - ガス状材料プリカーサーが、化学蒸着または熱蒸着により分解する、
請求項1に記載の方法。 - 化合物を製造する装置であって、
反応装置と、
貯蔵器と、
を備え、
前記反応装置は、第1のカーボン基板を生成するために、シリコン蒸着処理を行い、
前記貯蔵器は、
前記第1のカーボン基板を受け入れ、
前記第1のカーボン基板が前記貯蔵器内で冷却されている間に、前記反応装置が、第2のカーボン基板を生成するための第2のシリコン蒸着処理を行えるようにする、
装置。 - 前記蒸着処理はガスを使用し、
該ガスは、
少なくとも1つの、実質的に反応性のプリカーサー蒸気ガスであって、分解し、前記カーボン基板の上または内部で固体状に変化するガスと、
少なくとも1つの、分解せずに、反応中に固体に変化しないガスと、
を含む、
請求項8に記載の装置。 - 前記少なくとも1つの実質的に反応性のプリカーサー蒸気ガスは、シリコンを備えるガスを含む、
請求項8に記載の装置。 - 前記少なくとも1つの分解しないガスは、アルゴンまたは窒素ガスを含む、
請求項8に記載の装置。 - 前記固体は、粉末を備え、
該粉末は、異なるカーボン材料などの、前記形成された固体を分解および固定するために、反応性の化学ガスのための表面を与える、
請求項8に記載の装置。 - 形成された化合物は、開始固体材料と同様の密度および形状を持ち、
ポリシリコン製造で使われる方法で、該化合物を前記開始固体材料から分離することが困難である、
請求項8に記載の装置。 - 複数のグラフェン層と、
複数のシリコン粒子と、
を含み、
前記複数のグラフェン層は、2つ以上のギャップを形成し、
前記ギャップの各々は、前記複数のグラフェン層の、それぞれの上部グラフェン層と、それぞれの下部グラフェン層とにより形成され、
前記複数のシリコン粒子は、前記複数のグラフェン層によって形成されたギャップの各々の内部に埋め込まれている、
化合物構造。 - ナノ化合物を含む、
請求項14に記載の化合物構造。 - 前記複数のシリコン粒子は、前記複数のグラフェン層内に均一に分散される、
請求項14に記載の化合物構造。 - 前記複数のグラフェン層および前記複数のシリコン粒子は、埋め込まれた導電性マトリックスを形成する、
請求項14に記載の化合物構造。 - 前記シリコン粒子は、幅が約2ナノメートルから約2ミクロンである、
請求項14に記載の化合物構造。 - 埋め込まれたシリコン粒子を備える複数のグラフェン層は、結合され導電性を持つ材料の1つ以上の小塊を形成する、
請求項14に記載の化合物構造。 - 流動層反応装置によって形成される、
請求項14に記載の化合物構造。 - 電気化学的装置に使用される、
請求項14に記載の化合物構造。 - 前記シリコン粒子は、幅が約10ナノメートルから約1ミクロンである、
請求項14に記載の化合物構造。 - 集塊化されたシリコン-グラフェン化合物粒子を形成する、
請求項14に記載の化合物構造。
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