JP2022116133A - パルスレーザ光を用いた基板の加工、特に分離のための方法 - Google Patents
パルスレーザ光を用いた基板の加工、特に分離のための方法 Download PDFInfo
- Publication number
- JP2022116133A JP2022116133A JP2022084208A JP2022084208A JP2022116133A JP 2022116133 A JP2022116133 A JP 2022116133A JP 2022084208 A JP2022084208 A JP 2022084208A JP 2022084208 A JP2022084208 A JP 2022084208A JP 2022116133 A JP2022116133 A JP 2022116133A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- substrate
- duration
- ratio
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 27
- 239000000758 substrate Substances 0.000 title claims abstract description 21
- 238000000926 separation method Methods 0.000 title claims description 4
- 238000005530 etching Methods 0.000 claims abstract description 35
- 239000000463 material Substances 0.000 claims abstract description 17
- 239000011521 glass Substances 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 238000005520 cutting process Methods 0.000 claims description 2
- 230000006698 induction Effects 0.000 abstract 1
- 238000003631 wet chemical etching Methods 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/361—Removing material for deburring or mechanical trimming
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
- B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/0222—Scoring using a focussed radiation beam, e.g. laser
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/54—Glass
Landscapes
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Laser Beam Processing (AREA)
- Surface Treatment Of Glass (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Abstract
Description
1>d/(R*t)>10-5、
好ましくは状況に応じて:
1>d/(R*t)>10-3、
d=レーザパルス間隔、R=エッチング速度、及びt=エッチング期間、によって決定される場合に、この方法が企図されている。
Claims (9)
- レーザ誘導ディープエッチングを用いた、特に平坦な基板の加工のための、特に分離のための方法であって、レーザ光が加工ラインに沿って移動され、個別パルスが、空間レーザパルス間隔(d)で前記基板上に向けられ、次いで異方性の材料除去が、エッチングによって或るエッチング速度(R)と或るエッチング期間(t)で実行される当該方法において、
加工パラメータが、条件:
1>d/(R*t)>10-5
にしたがって調節されることを特徴とする方法。 - 前記加工パラメータは、条件:
1>d/(R*t)>10-3
にしたがって調節されることを特徴とする請求項1に記載の方法 - 前記加工ラインに対して直角な切断間隙幅(b)に対する前記基板の層厚(D)のアスペクト比が、条件:
12>D/b>1
にしたがって調節されることを特徴とする請求項1又は2に記載の方法。 - 前記基板の初期厚さ(D)と、エッチング速度(R)とエッチング期間(t)とから成る積との比は、3よりも大きく:
D/(R*t)>3
であることを特徴とする請求項1~3の少なくとも1項に記載の方法。 - 前記基板の初期厚さ(D)と、エッチング速度(R)とエッチング期間(t)とから成る積との比は、5よりも大きく:
D/(R*t)>5
であることを特徴とする請求項1~4の少なくとも1項に記載の方法。 - 前記基板の初期厚さ(D)と、エッチング速度(R)とエッチング期間(t)とから成る積との比は、8よりも大きく:
D/(R*t)>8
であることを特徴とする請求項1~5の少なくとも1項に記載の方法。 - 前記基板の初期厚さ(D)と、エッチング速度(R)とエッチング期間(t)とから成る積との比は、10よりも大きく:
D/(R*t)>10
であることを特徴とする請求項1~6の少なくとも1項に記載の方法。 - 前記基板の初期厚さ(D)と、エッチング速度(R)とエッチング期間(t)とから成る積との比は、12よりも大きく:
D/(R*t)>12
であることを特徴とする請求項1~7の少なくとも1項に記載の方法。 - 前記基板は、ガラス、特に石英ガラスから成ることを特徴とする請求項1~8の少なくとも1項に記載の方法。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102017110542.5 | 2017-05-15 | ||
DE102017110542 | 2017-05-15 | ||
JP2019558349A JP7396899B2 (ja) | 2017-05-15 | 2018-04-06 | パルスレーザ光を用いた基板の加工、特に分離のための方法 |
PCT/EP2018/058882 WO2018210484A1 (de) | 2017-05-15 | 2018-04-06 | Verfahren zur bearbeitung, insbesondere zum trennen eines substrates mittels laserinduziertem tiefenätzen |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019558349A Division JP7396899B2 (ja) | 2017-05-15 | 2018-04-06 | パルスレーザ光を用いた基板の加工、特に分離のための方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2022116133A true JP2022116133A (ja) | 2022-08-09 |
Family
ID=61972103
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019558349A Active JP7396899B2 (ja) | 2017-05-15 | 2018-04-06 | パルスレーザ光を用いた基板の加工、特に分離のための方法 |
JP2022084208A Pending JP2022116133A (ja) | 2017-05-15 | 2022-05-24 | パルスレーザ光を用いた基板の加工、特に分離のための方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019558349A Active JP7396899B2 (ja) | 2017-05-15 | 2018-04-06 | パルスレーザ光を用いた基板の加工、特に分離のための方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US11065716B2 (ja) |
EP (1) | EP3624982A1 (ja) |
JP (2) | JP7396899B2 (ja) |
KR (1) | KR102260931B1 (ja) |
CN (1) | CN110545948B (ja) |
WO (1) | WO2018210484A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2756175C1 (ru) * | 2020-03-30 | 2021-09-28 | Акционерное Общество "Государственный Научный Центр Российской Федерации Троицкий Институт Инновационных И Термоядерных Исследований" | Роботизированный лазерный комплекс и способ демонтажа металлоконструкций аэс |
DE102020114195A1 (de) * | 2020-05-27 | 2021-12-02 | Lpkf Laser & Electronics Aktiengesellschaft | Verfahren zum Einbringen einer Ausnehmung in ein Substrat |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016010954A2 (en) * | 2014-07-14 | 2016-01-21 | Corning Incorporated | Systems and methods for processing transparent materials using adjustable laser beam focal lines |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05185270A (ja) * | 1992-01-16 | 1993-07-27 | Kosaka Kenkyusho:Kk | ガラスパネルの割断方法 |
JP3691221B2 (ja) * | 1997-09-24 | 2005-09-07 | 三菱電機株式会社 | レーザ加工方法 |
US6709881B2 (en) * | 2000-11-28 | 2004-03-23 | Matsushita Electric Industrial Co., Ltd. | Method for manufacturing semiconductor and method for manufacturing semiconductor device |
GB0315947D0 (en) * | 2003-07-08 | 2003-08-13 | Spectrum Technologies Plc | Laser removal of layer or coating from a substrate |
JP4672689B2 (ja) | 2006-02-22 | 2011-04-20 | 日本板硝子株式会社 | レーザを用いたガラスの加工方法および加工装置 |
US8703517B2 (en) * | 2010-10-29 | 2014-04-22 | Denso Corporation | Method of Manufacturing a Semiconductor Device Including Removing a Reformed Layer |
JP5977830B2 (ja) * | 2011-09-27 | 2016-08-24 | チップワークス, インコーポレイテッドChipworks Incorporated | 異なるエッチングレートに基づくpチャネル又はnチャネルデバイスの区別についての方法 |
JP6186016B2 (ja) * | 2013-04-04 | 2017-08-23 | エル・ピー・ケー・エフ・レーザー・ウント・エレクトロニクス・アクチエンゲゼルシヤフト | 基板に貫通穴を開ける方法及び装置 |
CN103264227B (zh) * | 2013-04-11 | 2015-05-13 | 温州大学 | 一种激光直接刻蚀聚合物基体表面覆盖金属膜的方法 |
CN103252262A (zh) * | 2013-04-15 | 2013-08-21 | 中国人民解放军军事医学科学院卫生学环境医学研究所 | 一种聚甲基丙烯酸甲酯材料微流控芯片加工技术方法 |
JP2016534008A (ja) * | 2013-08-07 | 2016-11-04 | トルンプフ レーザー− ウント ジュステームテヒニク ゲゼルシャフト ミット ベシュレンクテル ハフツングTRUMPF Laser− und Systemtechnik GmbH | 透明の、ガラス状の、ガラス質の、セラミックのかつ/又は結晶質の層を有する板状のワークピースを加工する方法、並びにこのようなワークピース用の分離装置、並びにこのようなワークピースから成る製品 |
US10293436B2 (en) * | 2013-12-17 | 2019-05-21 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
US20150243559A1 (en) * | 2014-02-27 | 2015-08-27 | Jungrae Park | Hybrid wafer dicing approach using temporally-controlled laser scribing process and plasma etch |
JP6383977B2 (ja) * | 2014-06-27 | 2018-09-05 | Agc株式会社 | ガラス基板の切断方法 |
US10082333B2 (en) | 2014-07-02 | 2018-09-25 | Praxair Technology, Inc. | Argon condensation system and method |
EP3169635B1 (en) | 2014-07-14 | 2022-11-23 | Corning Incorporated | Method and system for forming perforations |
WO2017038075A1 (ja) | 2015-08-31 | 2017-03-09 | 日本板硝子株式会社 | 微細構造付きガラスの製造方法 |
TW201831414A (zh) * | 2016-12-13 | 2018-09-01 | 美商康寧公司 | 藉由形成劃痕線來雷射處理透明工件的方法 |
-
2018
- 2018-04-06 JP JP2019558349A patent/JP7396899B2/ja active Active
- 2018-04-06 KR KR1020197031695A patent/KR102260931B1/ko active IP Right Grant
- 2018-04-06 WO PCT/EP2018/058882 patent/WO2018210484A1/de unknown
- 2018-04-06 EP EP18717553.4A patent/EP3624982A1/de active Pending
- 2018-04-06 CN CN201880025435.8A patent/CN110545948B/zh active Active
- 2018-04-06 US US16/613,444 patent/US11065716B2/en active Active
-
2022
- 2022-05-24 JP JP2022084208A patent/JP2022116133A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016010954A2 (en) * | 2014-07-14 | 2016-01-21 | Corning Incorporated | Systems and methods for processing transparent materials using adjustable laser beam focal lines |
Also Published As
Publication number | Publication date |
---|---|
JP7396899B2 (ja) | 2023-12-12 |
CN110545948A (zh) | 2019-12-06 |
KR102260931B1 (ko) | 2021-06-04 |
US11065716B2 (en) | 2021-07-20 |
CN110545948B (zh) | 2022-02-25 |
US20200180068A1 (en) | 2020-06-11 |
KR20190132461A (ko) | 2019-11-27 |
JP2020517570A (ja) | 2020-06-18 |
WO2018210484A1 (de) | 2018-11-22 |
EP3624982A1 (de) | 2020-03-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI692457B (zh) | 藉由電磁輻射及後續蝕刻製程將至少一個凹槽導入材料的方法 | |
JP2022116133A (ja) | パルスレーザ光を用いた基板の加工、特に分離のための方法 | |
JP6899653B2 (ja) | レーザー処理及び温度誘導ストレスを用いた複合ウェハー製造方法 | |
CN105189024B (zh) | 用于分离基板的方法和装置 | |
JP6782692B2 (ja) | 板状の加工物に少なくとも一つの窪み又は穴を配設する方法 | |
MY181614A (en) | Sic wafer producing method | |
JP2005074663A (ja) | 単結晶基板の加工方法 | |
US20110163398A1 (en) | Method for manufacturing separated micromechanical components situated on a silicon substrate and components manufactured therefrom | |
CN103026497B (zh) | 光吸收基板的制造方法以及用于制造其的成形模的制造方法 | |
US20150309474A1 (en) | Process for manufacturing a strengthened timepiece component and corresponding timepiece component and timepiece | |
KR102109034B1 (ko) | 마스크 제조 방법 | |
TW201043373A (en) | Improved method and apparatus for laser machining | |
US10300557B2 (en) | Hybrid substrate processing | |
JP2020517570A5 (ja) | ||
RU2686119C1 (ru) | Способ разделения пластин на чипы и получения сквозных отверстий большой площади для изделий микроэлектроники | |
KR101294642B1 (ko) | 패턴 형성방법, 기판 제조방법, 및 몰드 제조방법 | |
KR102481312B1 (ko) | 기술적 마스크를 제조하기 위한 방법 | |
JP7316639B2 (ja) | 基板分離方法 | |
JP2008056544A (ja) | 微細な直線溝を有するガラス板の製造方法及びガラス板 | |
US6398943B1 (en) | Process for producing a porous layer by an electrochemical etching process | |
CN112105984B (zh) | 液晶面板制造方法 | |
KR102056791B1 (ko) | 실리카 기판을 이용한 실리콘 패턴 제조 방법 및 그 방법으로 제조된 디바이스 | |
JP2015204441A (ja) | 基板加工方法及び基板 | |
JPS57130414A (en) | Manufacture of semiconductor device | |
JP2005077785A (ja) | 成膜部品の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220610 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220610 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230621 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20230915 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231115 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20240214 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240509 |