JP2022061729A - Resin composition, metal foil with resin, prepreg, laminated plate, multilayer printed circuit board and semiconductor package - Google Patents

Abstract

To provide a resin composition that develops excellent dielectric characteristics in a high frequency wavelength band of 10 GHz band or larger, suppresses powder drop at an end part during cutting of a metal foil with a resin, and is excellent in copper foil releasing strength, a metal foil with a resin using the resin composition, a prepreg, a laminated plate, a multilayer printed circuit board and a semiconductor package.SOLUTION: A resin composition containing a polyphenylene ether derivative (A), a fluororesin filler (B), and a titanate coupling agent (X), a metal foil with resin using the resin composition, a prepreg, a laminated plate, a multilayer printed wiring board and a semiconductor package.SELECTED DRAWING: None

Description

The present invention relates to a resin composition, a metal leaf with a resin, a prepreg, a laminated board, a multilayer printed wiring board, and a semiconductor package.

In mobile communication devices such as mobile phones, their base station devices, servers, network infrastructure devices such as routers, and large computers, the speed and capacity of signals used are increasing year by year. Along with this, printed wiring boards mounted on these electronic devices need to be compatible with high frequencies, and there is a demand for substrate materials having excellent dielectric properties in the high frequency band, which can reduce transmission loss. In recent years, as applications that handle such high-frequency signals, in addition to the above-mentioned electronic devices, implementation plans and commercialization of new systems that handle high-frequency wireless signals in the ITS field (automobiles, transportation system-related) and indoor short-range communication fields. Is progressing. Therefore, it is expected that low transmission loss substrate materials will be required for printed wiring boards mounted on these devices in the future.

Conventionally, a polyphenylene ether (PPE) -based resin has been used as a thermoplastic polymer having excellent high-frequency characteristics. For example, a resin composition containing a polyphenylene ether and an epoxy resin (see, for example, Patent Document 1), a resin composition containing a polyphenylene ether and a cyanate resin (see, for example, Patent Document 2) and the like are known.

Japanese Unexamined Patent Publication No. 58-069046 Special Publication No. 61-018937

In recent years, dielectrics in the 10 GHz band and above, which can also be used for fifth-generation mobile communication system (5G) antennas that use radio waves in the frequency band above 6 GHz and millimeter-wave radars that use radio waves in the frequency band of 30 to 300 GHz. The development of a resin composition having further improved characteristics (low dielectric constant and low dielectric loss tangent; hereinafter may be referred to as high frequency characteristics) is eagerly desired. That is, it is desired that the resin composition has even better high frequency characteristics than the conventional ones.
Further, a metal leaf with a resin having a layer of the resin composition on the metal foil may be used for manufacturing a metal-clad laminate, and the metal leaf with the resin is usually cut by a cutting machine to adjust the size. And use it. At this time, the resin powder may adhere to the blade of the cutting machine (hereinafter, also referred to as a slit blade) due to the powder falling off at the end of the metal leaf with resin. When the slit blade is contaminated in this way, there are problems that waviness and resin cracking occur on the cut surface, and that the resin adhering to the slit blade falls onto the metal leaf with resin, contaminating the product. be.
In order to solve the above problems, the present inventors have studied the blending of components having excellent high frequency characteristics, and found that the high frequency characteristics of the resin composition are improved, but the copper foil peeling strength is lowered. It turned out to occur.

In view of this situation, the present invention exhibits excellent dielectric properties in the high frequency band of 10 GHz or higher, suppresses powder falling off at the edges when cutting a metal leaf with a resin, and has a copper foil peeling strength. It is an object of the present invention to provide an excellent resin composition, a metal leaf with a resin using the resin composition, a prepreg, a laminated board, a multilayer printed wiring board, and a semiconductor package.

As a result of diligent research to achieve the above object, the present inventors have found that a resin composition containing a polyphenylene ether derivative, a fluororesin filler and a titanate coupling agent exhibits excellent high-frequency properties and a resin. It has been found that the powder falling off at the end is suppressed when the metal foil with a metal leaf is cut and the copper foil is excellent in peeling strength, and the present invention has been completed.

（式中、Ｘ^ｃ１及びＸ^ｃ２は、各々独立に、２価の有機基である。）
［１４］前記（Ａ）成分と前記（Ｃ）成分との含有割合［（Ａ）／（Ｃ）］が、質量比で、５／９５～８０／２０である、上記［１１］～［１３］のいずれかに記載の樹脂組成物。
［１５］さらに、熱可塑性エラストマー（Ｄ）、硬化促進剤（Ｅ）及び無機充填材（Ｆ）からなる群から選択される１種以上を含有する、上記［１］～［１４］のいずれかに記載の樹脂組成物。
［１６］上記［１］～［１５］のいずれかに記載の樹脂組成物の層を金属箔上に有する、樹脂付き金属箔。
［１７］上記［１］～［１５］のいずれかに記載の樹脂組成物とシート状繊維補強基材とを含有してなるプリプレグ。
［１８］（ｉ）上記［１６］に記載の樹脂付き金属箔又は（ii）上記［１７］に記載のプリプレグ及び金属箔、を含有してなる積層板。
［１９］（ｉ）上記［１６］に記載の樹脂付き金属箔、（ii）上記［１７］に記載のプリプレグ又は（iii）上記［１８］に記載の積層板、を含有してなる多層プリント配線板。
［２０］上記［１９］に記載の多層プリント配線板に半導体素子を搭載してなる半導体パッケージ。 That is, one embodiment of the present invention relates to the following [1] to [20].
[1] A resin composition containing a polyphenylene ether derivative (A), a fluororesin filler (B), and a titanate coupling agent (X).
[2] The resin composition according to the above [1], wherein the component (A) has an ethylenically unsaturated bond-containing group at the molecular terminal.
[3] The resin composition according to the above [1] or [2], wherein the ethylenically unsaturated bond-containing group contained in the component (A) is a (meth) acrylic group.
[4] The resin composition according to any one of the above [1] to [3], wherein the weight average molecular weight (Mw) of the component (A) is 500 to 7,000.
[5] The component (B) is a polytetrafluoroethylene (PTFE) filler, a tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer (PFA) filler, a tetrafluoroethylene-hexafluoropropylene copolymer (FEP) filler, and the like. The resin according to any one of the above [1] to [4], which is at least one selected from the group consisting of a tetrafluoroethylene-ethylene copolymer (ETFE) filler and a polychlorotrifluoroethylene (PCTFE) filler. Composition.
[6] The resin composition according to any one of the above [1] to [5], wherein the average particle size of the component (B) is 0.1 to 10 μm.
[7] The resin composition according to any one of [1] to [6] above, wherein the content of the component (B) is 1% by mass or more and less than 50% by mass with respect to the solid content of the resin composition. ..
[8] The resin composition according to any one of the above [1] to [7], wherein the content of the component (B) is 1 to 40% by mass with respect to the solid content of the resin composition.
[9] The resin composition according to any one of [1] to [8] above, wherein the component (X) has a hydroxy group and a hydrocarbon group.
[10] The resin composition according to the above [9], wherein the hydrocarbon group contains a hydrocarbon group having 1 to 4 carbon atoms and a hydrocarbon group having 5 to 30 carbon atoms.
[11] The resin according to any one of the above [1] to [10], further containing one or more thermosetting resins (C) selected from the group consisting of epoxy resins, cyanate resins and maleimide compounds. Composition.
[12] The structural unit and the primary amino group derived from the maleimide compound (c1) containing the maleimide compound as the component (C) and having at least two N-substituted maleimide groups. The resin composition according to the above [11], which is a modified maleimide compound having a structural unit derived from the amine compound (c2) having.
[13] The resin composition according to the above [12], wherein the modified maleimide compound is a compound represented by the following general formula (C-1).

(In the formula, X ^c1 and X ^c2 are each independently divalent organic group.)
[14] The content ratio [(A) / (C)] of the component (A) to the component (C) is 5/95 to 80/20 by mass ratio, the above [11] to [13]. ] The resin composition according to any one of.
[15] Further, any one of the above [1] to [14], which contains at least one selected from the group consisting of the thermoplastic elastomer (D), the curing accelerator (E) and the inorganic filler (F). The resin composition according to.
[16] A metal foil with a resin having a layer of the resin composition according to any one of the above [1] to [15] on the metal foil.
[17] A prepreg containing the resin composition according to any one of the above [1] to [15] and a sheet-shaped fiber reinforced base material.
[18] (i) A laminated board containing the resin-attached metal foil according to the above [16] or (ii) the prepreg and the metal leaf according to the above [17].
[19] A multilayer print comprising (i) the metal leaf with resin according to the above [16], (ii) the prepreg according to the above [17], or (iii) the laminated board according to the above [18]. Wiring board.
[20] A semiconductor package in which a semiconductor element is mounted on the multilayer printed wiring board according to the above [19].

INDUSTRIAL APPLICABILITY According to the present invention, a resin composition that exhibits excellent dielectric properties in a high frequency band of 10 GHz or higher, suppresses powder falling off at the edges when cutting a metal foil with a resin, and has excellent peeling strength of the copper foil. It is possible to provide a metal leaf with a resin, a prepreg, a laminated board, a multilayer printed wiring board, and a semiconductor package using the resin composition.

It is a photograph of the slit blade of the cutting machine used at the time of evaluation of the end powder drop at the time of cutting the copper foil with resin in an Example and a comparative example. It is a schematic diagram which shows the state of the slit blade in the case of the evaluation of the edge powder drop at the time of cutting a copper foil with resin in an Example and a comparative example is "A". It is a schematic diagram which shows the state of the slit blade when the evaluation of the edge powder drop at the time of cutting a copper foil with a resin is "C" in an Example and a comparative example.

In the numerical range described in the present specification, the upper limit value or the lower limit value of the numerical range may be replaced with the value shown in the examples. Further, the lower limit value and the upper limit value of the numerical range are arbitrarily combined with the lower limit value or the upper limit value of another numerical range. In the notation of the numerical range "AA to BB", the numerical values AA and BB at both ends are included in the numerical range as the lower limit value and the upper limit value, respectively.
Further, as for each component and material exemplified in this specification, one kind may be used alone or two or more kinds may be used in combination unless otherwise specified. In the present specification, the content of each component in the composition is the total amount of the plurality of substances present in the composition when a plurality of substances corresponding to each component are present in the composition, unless otherwise specified. Means.
Aspects in which the items described in the present specification are arbitrarily combined are also included in the present invention and the present embodiment.
In the present embodiment, the "resin component" is defined as all components other than the inorganic compounds such as the inorganic filler described later and the flame retardant and the flame retardant aid among the solid contents constituting the resin composition. do.
Further, the solid content in the present embodiment means a component in the resin composition other than a volatile substance such as water and a solvent described later. That is, the solid content includes liquid, starch syrup-like or wax-like substances at room temperature around 25 ° C., and does not necessarily mean that the solid content is solid.

[Resin composition]
The resin composition of the present embodiment is abbreviated as a polyphenylene ether derivative (A) [hereinafter, may be abbreviated as "(A) component"] and a fluororesin filler (B) [hereinafter, "(B) component". A resin composition containing a titanate coupling agent (X) [hereinafter, may be abbreviated as “(X) component”]. The resin composition of the present embodiment is preferably a thermosetting resin composition.
In the resin composition of the present embodiment, the total content of the component (A), the component (B) and the component (X) is preferably 15% by mass or more with respect to the solid content of the resin composition. It is preferably 20% by mass or more, more preferably 30% by mass. The upper limit of the total content of the component (A), the component (B) and the component (X) is not particularly limited, and may be 100% by mass or 80% by mass with respect to the solid content of the resin composition. It may be 0% by mass or less, 60% by mass or less, 50% by mass or less, or 45% by mass or less.
Hereinafter, each component contained in the resin composition of the present embodiment will be described.

<Polyphenylene ether derivative (A)>
The polyphenylene ether derivative (A) is not particularly limited, and a known polyphenylene ether derivative, for example, one having a structural unit represented by the general formula (A-2) described later can be used. In particular, the polyphenylene ether derivative (A) is unsaturated at the molecular end from the viewpoint of high frequency characteristics and compatibility with the thermosetting resin (C) and the thermoplastic elastomer (D) used as needed. A polyphenylene ether derivative having a saturated bond-containing group is preferable, and a polyphenylene ether derivative having an ethylenically unsaturated bond-containing group at both ends of the molecule is more preferable.
In the present specification, the "ethylenically unsaturated bond-containing group" means a substituent containing a carbon-carbon double bond capable of an addition reaction, and does not include a double bond of an aromatic ring. do.
As the polyphenylene ether derivative (A), one type may be used alone, or two or more types may be used in combination.

Examples of the ethylenically unsaturated bond-containing group include unsaturated aliphatic hydrocarbon groups such as vinyl group, allyl group, 1-methylallyl group, isopropenyl group, 2-butenyl group, 3-butenyl group and styryl group; Examples thereof include a maleimide group, a group containing a heteroatom such as a group represented by the following general formula (A-1) and an ethylenically unsaturated bond. Among these, the group represented by the following general formula (A-1) is preferable from the viewpoint of high frequency characteristics and adhesiveness to the conductor.

（式中、Ｒ^ａ１は、水素原子又は炭素数１～２０のアルキル基を示す。＊は結合位置を示す。）

(In the formula, ^Ra1 indicates a hydrogen atom or an alkyl group having 1 to 20 carbon atoms. * Indicates a bond position.)

The alkyl group having 1 to 20 carbon atoms indicated by ^Ra1 may be any of a linear alkyl group, a branched chain alkyl group or a cyclic alkyl group, and is preferably a linear alkyl group.
The number of carbon atoms of the alkyl group is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 1.
Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a decyl group, a pentadecyl group, a hexadecyl group, a heptadecyl group and the like. , Methyl group is preferred.
The group represented by the general formula (A-1) is a (meth) acrylic group [that is, R ^a1 in the general formula (A-1) is a hydrogen atom from the viewpoint of high frequency characteristics and adhesion to a conductor. Or a group that is a methyl group], and more preferably a methacrylic group. In the present embodiment, the "(meth) acrylic group" means an acrylic group or a methacrylic group.

In the present specification, a maleimide group, a group represented by the above general formula (A-1), and the like have a partially unsaturated aliphatic hydrocarbon group, but the group as a whole is viewed. A group that cannot be said to be an unsaturated aliphatic hydrocarbon group at the time is not included in the above-mentioned "unsaturated aliphatic hydrocarbon group".

The number of ethylenically unsaturated bond-containing groups contained in one molecule of the polyphenylene ether derivative (A) is not particularly limited, but is preferably 2 to 5, more preferably 2 to 3, and even more preferably 2. When the number of ethylenically unsaturated bond-containing groups is equal to or higher than the above lower limit, excellent high-frequency characteristics and good compatibility with the thermosetting resin (C) and the thermoplastic elastomer (D) described later tend to be obtained. It is in. On the other hand, when the number of ethylenically unsaturated bond-containing groups is not more than the above upper limit, excellent fluidity and moldability tend to be obtained.
As described above, the polyphenylene ether derivative (A) preferably has an ethylenically unsaturated bond-containing group at the molecular end, and further has an ethylenically unsaturated bond-containing group other than the molecular end. However, it is more preferable to have an ethylenically unsaturated bond-containing group only at the end of the molecule. The polyphenylene ether derivative (A) is preferably a polyphenylene ether having a methacrylic group at the molecular terminal, and more preferably a polyphenylene ether having a methacrylic group at both ends of the molecule. The methacrylic group may be bonded to an oxygen atom, that is, it may be a methacrylic acid group.

The polyphenylene ether derivative (A) has a phenylene ether bond, and preferably has a structural unit represented by the following general formula (A-2).

（式中、Ｒ^ａ２は、炭素数１～５の脂肪族炭化水素基又はハロゲン原子を示す。ｎ^ａ１は、０～４の整数を示す。）

(In the formula, R ^a2 represents an aliphatic hydrocarbon group or a halogen atom having 1 to 5 carbon atoms. N ^a1 represents an integer of 0 to 4).

Examples of the aliphatic hydrocarbon group having 1 to 5 carbon atoms represented by ^Ra2 in the general formula (A-2) include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group and an isobutyl group. Examples include a group, a t-butyl group, an n-pentyl group and the like. As the aliphatic hydrocarbon group, an aliphatic hydrocarbon group having 1 to 3 carbon atoms is preferable, an alkyl group having 1 to 3 carbon atoms is more preferable, and a methyl group is further preferable.
n ^a1 represents an integer of 0 to 4, preferably 1 or 2, more preferably 2. When n ^a1 is 1 or 2, it is preferable that Ra ² is substituted at the ortho position on the benzene ring (however, based on the substitution position of the oxygen atom). Further, when n ^a1 is an integer of 2 or more, the plurality of ^Ra2 may be the same or different from each other.
The structural unit represented by the general formula (A-2) is preferably a structural unit represented by the following general formula (A-2').

The polyphenylene ether derivative (A) is preferably a compound represented by the following general formula (A-3) from the viewpoint of high frequency characteristics and adhesiveness to a conductor.

（式中、Ｒ^ａ２及びｎ^ａ１は、上記一般式（Ａ－２）における説明の通りである。Ｒ^ａ３及びＲ^ａ４は、各々独立に、炭素数１～５の脂肪族炭化水素基又はハロゲン原子を示す。ｎ^ａ２及びｎ^ａ３は、各々独立に、０～４の整数を示す。ｎ^ａ４及びｎ^ａ５は、各々独立に、０～２０の整数を示し、ｎ^ａ４及びｎ^ａ５の合計は、１～３０の整数である。Ｘ^ａ１は、炭素数１～５のアルキレン基、炭素数２～５のアルキリデン基、エーテル基、スルフィド基、スルホニル基、カルボニルオキシ基、ケト基又は単結合を示す。Ｙ^ａ１及びＹ^ａ２は、各々独立に、上記エチレン性不飽和結合含有基を示す。）

(In the formula, R ^a2 and n ^a1 are as described in the above general formula (A-2). R ^a3 and R ^a4 are independently aliphatic hydrocarbon groups or halogens having 1 to 5 carbon atoms. Atoms are indicated. N ^a2 and n ^a3 each independently indicate an integer of 0 to 4. n ^a4 and n ^a5 each independently indicate an integer of 0 to 20, and the sum of n ^a4 and n ^a5 is. It is an integer of 1 to 30. X ^a1 has an alkylene group having 1 to 5 carbon atoms, an alkylidene group having 2 to 5 carbon atoms, an ether group, a sulfide group, a sulfonyl group, a carbonyloxy group, a keto group or a single bond. Y ^a1 and Y ^a2 each independently indicate the above ethylenically unsaturated bond-containing group.)

The description of the aliphatic hydrocarbon group having 1 to 5 carbon atoms represented by R ^a3 and Ra 4 in the general formula (A-3) is described by the carbon number 1 represented by R ^a2 in the general formula (A- ² ). It is the same as the explanation about the aliphatic hydrocarbon group of ~ 5.
n ^a2 and n ^a3 indicate an integer of 0 to 4, preferably an integer of 0 to 3, preferably 2 or 3. When n ^a2 is an integer of 2 or more, the plurality of ^Ra3s may be the same or different from each other. When n ^a3 is an integer of 2 or more, the plurality of ^Ra4s may be the same or different from each other.
n ^a4 and n ^a5 indicate an integer of 0 to 20, preferably an integer of 1 to 20, more preferably an integer of 2 to 15, and even more preferably an integer of 3 to 10. When n ^a4 or ^na 5 is an integer of 2 or more, the plurality of ^{na 1s} may be the same or different.
The sum of n ^a4 and n ^a5 is an integer of 1 to 30, preferably an integer of 2 to 25, more preferably an integer of 5 to 20, and even more preferably an integer of 7 to 15.

Examples of the alkylene group having 1 to 5 carbon atoms represented by ^Xa1 in the general formula (A-3) include a methylene group, a 1,2-dimethylene group, a 1,3-trimethylene group and a 1,4-tetramethylene group. Groups, 1,5-pentamethylene groups and the like can be mentioned.
Examples of the alkylidene group having 2 to 5 carbon atoms indicated by ^Xa1 include an ethylidene group, a propyridene group, an isopropylidene group, a butylidene group, an isobutylidene group, a pentylidene group, and an isopentylidene group.
Among the groups indicated by X ^a1 , an isopropylidene group is preferable from the viewpoint of high frequency characteristics and adhesiveness to a conductor.
The preferred embodiments of the ethylenically unsaturated bond-containing group shown by Y ^a1 and Y ^a2 are as described above.
The compound represented by the general formula (A-3) is preferably a compound represented by the following general formula (A-4) from the viewpoint of high frequency characteristics and adhesiveness to a conductor.

（式中、ｎ^ａ４及びｎ^ａ５は、上記一般式（Ａ－３）における説明の通りである。Ｒ^ａ５及びＲ^ａ６は、各々独立に、水素原子又はメチル基を示す。Ｘ^ａ２は、メチレン基又はイソプロピリデン基を示す。）

(In the formula, n ^a4 and n ^a5 are as described in the above general formula (A-3). R ^a5 and R ^a6 each independently represent a hydrogen atom or a methyl group. X ^a2 is methylene. Indicates a group or an isopropylidene group.)

[Weight average molecular weight (Mw) of polyphenylene ether derivative (A)]
The weight average molecular weight (Mw) of the polyphenylene ether derivative (A) is not particularly limited, but is preferably 500 to 7,000, more preferably 800 to 5,000, still more preferably 1,000 to 3,000, and 1, 200-2500 is particularly preferable. When the weight average molecular weight (Mw) of the component (A) is at least the above lower limit value, a cured product having excellent dielectric properties of polyphenylene ether and excellent heat resistance tends to be obtained. When the weight average molecular weight (Mw) of the component (A) is not more than the above upper limit value, excellent moldability tends to be obtained.
In the present specification, the weight average molecular weight is a value converted from a calibration curve using standard polystyrene by gel permeation chromatography (GPC), and is more specifically obtained by the measurement method described in Examples. The value.

As the method for synthesizing the polyphenylene ether derivative (A), known methods for synthesizing and modifying polyphenylene ether can be applied, and the method is not particularly limited.

(Contents of (A) component)
The content of the polyphenylene ether derivative (A) in the resin composition of the present embodiment is not particularly limited, but is preferably 1 to 80 parts by mass and 1 to 45 parts by mass with respect to 100 parts by mass of the total resin components. More preferably, 1 to 20 parts by mass is further preferable, and 2 to 10 parts by mass is particularly preferable. When the content of the component (A) is at least the above lower limit value, more excellent high frequency characteristics and low hygroscopicity tend to be obtained. When the content of the component (A) is not more than the above upper limit value, more excellent heat resistance, moldability and processability tend to be obtained.

<Fluororesin filler (B)>
By containing the fluororesin filler (B), the resin composition of the present embodiment can obtain excellent high-frequency characteristics and effectively suppress powder falling off at the edges when the metal leaf with resin is cut. The effect is remarkably exhibited by combining the component (A) and the component (B). By containing the fluororesin filler (B) in the resin composition, the effect of improving the high frequency characteristics and the effect of suppressing powder falling off at the end when cutting the metal leaf with resin are greater than when the fluororesin itself is contained in the resin composition.
Examples of the shape of the fluororesin filler (B) include particles, powders, needles, columns, plates, and flakes. Among these, particulate matter is preferable.
As the fluororesin filler (B), a slurry mixed with an organic solvent may be used. Examples of the organic solvent include ketone compounds such as acetone, methyl ethyl ketone, methyl isobutyl ketone (MIBK), and cyclohexanone.
One type of the fluororesin filler (B) may be used alone, or two or more types may be used in combination.

Examples of the fluororesin filler (B) include polytetrafluoroethylene (PTFE) filler, tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer (PFA) filler, and tetrafluoroethylene-hexafluoropropylene copolymer (FEP) filler. , Tetrafluoroethylene-ethylene copolymer (ETFE) filler, polychlorotrifluoroethylene (PCTFE) filler and the like. Among these, the PTFE filler is preferable as the fluororesin filler (B) from the viewpoint of high frequency characteristics and suppression of powder falling off at the edges when cutting the metal leaf with resin. Further, the surface of the fluororesin filler (B) may be coated with an inorganic filler.
The average particle size of the fluororesin filler (B) is preferably 0.1 to 10 μm, more preferably 0.2 to 5 μm, still more preferably 0.5 to 4.0 μm, and particularly preferably 1.5 to 4.0 μm. Is. Here, the average particle size can be calculated, for example, by measuring the laser diffraction particle size distribution, and the same applies hereinafter.

(Contents of (B) component)
The content of the fluororesin filler (B) is preferably 1% by mass or more and less than 50% by mass, more preferably 1 to 45% by mass, still more preferably 1 to 40% by mass, based on the solid content of the resin composition. Particularly preferably, it is 5 to 40% by mass, may be 15 to 40% by mass, or may be 25 to 40% by mass. When the content of the fluororesin filler (B) is at least the above lower limit value, sufficient high frequency characteristics tend to be obtained. On the other hand, when the content of the fluororesin filler (B) is less than 50% by mass with respect to the solid content of the resin composition, it is possible to suppress a decrease in adhesion to the metal foil and the organic component in the resin composition, and the heat resistance is high. There is a tendency to avoid a decrease in the property and the peeling strength of the copper foil.

<Titanate Coupling Agent (X)>
The resin composition of the present embodiment contains a titanate coupling agent (X) in addition to the polyphenylene ether derivative (A) and the fluororesin filler (B). As a result, the resin composition of the present embodiment exhibits excellent high-frequency characteristics, suppresses powder falling off at the edges when cutting the resin-attached metal foil, and is also excellent in copper foil peeling strength.
As the titanate coupling agent (X), one kind may be used alone, or two or more kinds may be used in combination. It may also be used in combination with a silane coupling agent.

The titanate coupling agent (X) preferably has a hydroxy group and a hydrocarbon group from the viewpoint of copper foil peeling strength. Since the hydroxy group is considered to have an affinity with the fluororesin filler (B), the titanate coupling agent (X) has a hydroxy group, so that the hydroxy group is oriented toward the fluororesin filler (B). .. Therefore, it is considered that the hydrocarbon group tends to be oriented in the direction opposite to the fluororesin filler (B) side. Since the hydrocarbon group has a high affinity with the hydrocarbon group of the polyphenylene ether derivative (A) and the thermosetting resin (C) and the thermoplastic elastomer (D) to be blended as necessary, it is titanated. The coupling agent (X) serves as a binder between the polyphenylene ether derivative (A), the thermosetting resin (C) and the thermoplastic elastomer (D) to be blended as necessary, and the fluororesin filler (B). I guess. As a result, it is presumed that the portion of the resin composition having a high affinity with the copper foil is oriented to the outside of the resin composition, and the copper foil peeling strength tends to increase.
Since the titanate coupling agent (X) has a hydroxy group and a hydrocarbon group, the effect of suppressing aggregation of the fluororesin filler (B) in the resin composition tends to be enhanced.

The titanate coupling agent (X) may have a phosphorus atom or a phosphoric acid group. The hydroxy group contained in the titanate coupling agent (X) may be a hydroxy group derived from a phosphoric acid group.
The hydrocarbon group contained in the titanate coupling agent (X) may include a hydrocarbon group having 1 to 4 carbon atoms and a hydrocarbon group having 5 to 30 carbon atoms. In particular, since the hydrocarbon group of the titanate coupling agent (X) contains a hydrocarbon group having 5 to 30 carbon atoms, the copper foil peeling strength tends to increase, and the resin of the fluororesin filler (B) tends to increase. The effect of suppressing aggregation in the composition also tends to increase.
The hydrocarbon group having 1 to 4 carbon atoms may have 2 to 4 carbon atoms or 3 carbon atoms. The hydrocarbon group having 5 to 30 carbon atoms may have 5 to 20 carbon atoms, 6 to 18 carbon atoms, 6 to 15 carbon atoms, or 6 to 12 carbon atoms. It may be 6 to 10 or 6 to 10.

（式中、Ｒ^ｘ１は、有機基を示す。Ｒ^ｘ２は、ヒドロキシ基と炭化水素基とを有する有機基を示す。３つのＲ^ｘ２は、それぞれ同一であってもよいし、異なっていてもよい。）

（式中、Ｒ^ｘ３は、有機基を示す。２つのＲ^ｘ３は互いに結合していてもよい。Ｒ^ｘ４は、ヒドロキシ基と炭化水素基とを有する有機基を示す。２つのＲ^ｘ３は、それぞれ同一であってもよいし、異なっていてもよい。２つのＲ^ｘ４は、それぞれ同一であってもよいし、異なっていてもよい。） The titanate coupling agent (X) is preferably a titanate coupling agent represented by the following general formula (X-1) or the following general formula (X-2) from the viewpoint of copper foil peeling strength, and is described below. It is more preferable that it is a titanate coupling agent represented by the general formula (X-1).

(In the formula, R ^x1 indicates an organic group. R ^x2 indicates an organic group having a hydroxy group and a hydrocarbon group. The three R ^x2s may be the same or different from each other. good.)

(In the formula, R ^x3 indicates an organic group. Two R ^x3s may be bonded to each other. R ^x4 indicates an organic group having a hydroxy group and a hydrocarbon group. Two R ^x3s are. They may be the same or different. The two ^Rx4s may be the same or different.)

(Explanation of each group in the general formula (X-1))
The organic group indicated by R ^x1 is not particularly limited, but an organic group having an alkyl group having 1 to 10 carbon atoms is preferable, an alkyl group having 1 to 10 carbon atoms is more preferable, and an alkyl group having 1 to 5 carbon atoms is preferable. It may be an alkyl group having 2 to 4 carbon atoms, or it may be an alkyl group having 3 carbon atoms. R ^x1 may be an isopropyl group.
The organic group indicated by R ^x1 may or may not have a keto group, an ether group, or the like.
In the "organic group having a hydroxy group and a hydrocarbon group" shown by R ^x2 , the number of carbon atoms of the hydrocarbon group is not particularly limited, but is preferably 5 to 30, preferably 5 to 20. It may be 6 to 18, it may be 6 to 15, it may be 6 to 12, or it may be 6 to 10. The hydrocarbon group may be an octyl group.
The three R ^x2s may be the same or different, but are preferably the same.
The "organic group having a hydroxy group and a hydrocarbon group" represented by R ^x2 is not particularly limited, but may have a phosphoric acid group, for example, in the following general formula (X-3). It may be an organic group represented.

（式中、Ｒ^ｘ５及びＲ^ｘ６は、それぞれ独立に、炭化水素基を示す。＊は結合位置を示す。）

(In the formula, R ^x5 and R ^x6 each independently indicate a hydrocarbon group. * Indicates a bond position.)

In the general formula (X-3), the number of carbon atoms of the hydrocarbon group represented by R ^x5 and R ^x6 is not particularly limited, but is preferably 5 to 30, even if it is 5 to 20. It may be 6 to 18, 6 to 15, 6 to 12, or 6 to 10. The hydrocarbon group may be an octyl group.
R ^x5 and R ^x6 may be the same or different, but are preferably the same.

(Explanation of each group in the general formula (X-2))
The organic group indicated by R ^x3 is not particularly limited, but an organic group having an alkyl group having 1 to 10 carbon atoms is preferable, an alkyl group having 1 to 10 carbon atoms is more preferable, and an alkyl group having 1 to 5 carbon atoms is more preferable. It may be a group, an alkyl group having 2 to 4 carbon atoms, or an alkyl group having 3 carbon atoms.
The two ^Rx3s may be coupled to each other. Specifically, the two ^Rx3s may be bonded to each other to form, for example, a substituted or unsubstituted alkylene group. The alkylene group may have 1 to 5 carbon atoms, 1 to 3 carbon atoms, or 2 carbon atoms. Examples of the substituent that the alkylene group may have include an oxy group (= O) and the like.
In the "organic group having a hydroxy group and a hydrocarbon group" shown by R ^x4 , the number of carbon atoms of the hydrocarbon group is not particularly limited, but is preferably 5 to 30, preferably 5 to 20. It may be 6 to 18, 6 to 15, 6 to 12, or 6 to 10. The hydrocarbon group may be an octyl group.
The two R ^x3s may be the same or different. The two R ^x4s may be the same or different, but are preferably the same.

(Method of adding titanate coupling agent (X))
The method of adding the titanate coupling agent (X) to the resin composition is a so-called integral blend treatment method in which the titanate coupling agent (X) is added to the resin composition containing the fluororesin filler (B). May be good. Further, after adding the titanate coupling agent (X) to the slurry in which the fluororesin filler (B) is dispersed in the organic solvent in advance, the mixture is preferably stirred, and the obtained slurry is used as the component (A) and, if necessary, other components. A method of adding to a resin composition containing the above components may be adopted. By adopting a method of adding the titanate coupling agent (X) to the slurry in which the fluororesin filler (B) is dispersed in an organic solvent in advance, the effect of suppressing the precipitation of the fluororesin filler (B) in the slurry can be obtained. Can be done.

(Contents of component (X))
The content of the titanate coupling agent (X) is not particularly limited, but is preferably 0.1 to 10% by mass, more preferably 0.1 to 5% by mass, based on the fluororesin filler (B). %, More preferably 0.3 to 2.5% by mass, and particularly preferably 0.5 to 2.0% by mass. When the content of the titanate coupling agent (X) is at least the above lower limit value, the copper foil peeling strength tends to be high. When the content of the titanate coupling agent (X) is not more than the above upper limit value, the decrease in heat resistance due to the decomposition of the group of the titanate coupling agent (X) such as a phosphoric acid group can be suppressed. It is in.

<Thermosetting resin (C)>
The resin composition of the present embodiment further preferably contains one or more thermosetting resins (C) selected from the group consisting of epoxy resins, cyanate resins and maleimide compounds. Among these, the thermosetting resin (C) preferably contains a maleimide compound from the viewpoints of high frequency characteristics, insulation reliability, adhesiveness to a conductor, and flame retardancy.
As the thermosetting resin (C), one type may be used alone, or two or more types may be used in combination.

(Epoxy resin)
The epoxy resin is preferably an epoxy resin having two or more epoxy groups in one molecule. Here, the epoxy resin is classified into a glycidyl ether type epoxy resin, a glycidyl amine type epoxy resin, a glycidyl ester type epoxy resin, and the like. Among these, glycidyl ether type epoxy resin is preferable.
Epoxy resins are classified into various epoxy resins according to the difference in the main skeleton, and in each of the above types of epoxy resins, bisphenol type epoxy resins such as bisphenol A type epoxy resin, bisphenol F type epoxy resin, and bisphenol S type epoxy resin are further classified. Epoxy resin; alicyclic epoxy resin such as dicyclopentadiene type epoxy resin; aliphatic chain epoxy resin; phenol novolac type epoxy resin, cresol novolac type epoxy resin, bisphenol A novolak type epoxy resin, bisphenol F novolak type epoxy resin, Novolak type epoxy resin such as phenol aralkylnovolak type epoxy resin, biphenyl aralkylnovolak type epoxy resin; stillben type epoxy resin; naftol novolak type epoxy resin, naphthalene skeleton-containing epoxy resin such as naphthol aralkyl type epoxy resin; biphenyl type epoxy resin; Xylylene type epoxy resin; classified into dihydroanthracene type epoxy resin and the like.
When an epoxy resin is used, a curing agent, a curing aid, or the like of the epoxy resin may be used in combination, if necessary.

(Cyanate resin)
Examples of the cyanate resin include 2,2-bis (4-cyanatophenyl) propane, bis (4-cyanatophenyl) ethane, bis (3,5-dimethyl-4-cyanatophenyl) methane, and 2,2. -Bis (4-cyanatophenyl) -1,1,1,3,3,3-hexafluoropropane, α, α'-bis (4-cyanatophenyl) -m-diisopropylbenzene, phenol-added dicyclopentadiene Examples thereof include a cyanate ester compound of a polymer, a phenol novolac type cyanate ester compound, and a cresol novolak type cyanate ester compound.
When a cyanate resin is used, a curing agent, a curing aid, or the like of the cyanate resin may be used in combination, if necessary.

(Maleimide compound)
The maleimide compound may be abbreviated as a maleimide compound (c1) having two or more N-substituted maleimide groups [hereinafter, simply "maleimide compound (c1)" or "component (c1)". ] And one or more selected from the group consisting of derivatives thereof.
Examples of the above-mentioned "derivative" include an addition reaction product of a maleimide compound having two or more N-substituted maleimide groups and an amine compound such as a diamine compound described later.

The maleimide compound (c1) is not particularly limited as long as it is a maleimide compound having two or more N-substituted maleimide groups. Specific examples of the maleimide compound (c1) include, for example, bis (4-maleimidephenyl) methane, polyphenylmethane maleimide, bis (4-maleimidephenyl) ether, bis (4-maleimidephenyl) sulfone, 3,3'-. Dimethyl-5,5'-diethyl-4,4'-diphenylmethanebismaleimide, 4-methyl-1,3-phenylenebismaleimide, m-phenylenebismaleimide, 2,2-bis [4- (4-maleimidephenoxy) Aromatic maleimide compounds such as phenyl] propane; aliphatic maleimide compounds such as 1,6-bismaleimide- (2,2,4-trimethyl) hexane and pyrrolylonic acid binder-type long-chain alkylbismaleimide can be mentioned. Among these, from the viewpoint of adhesiveness to the conductor and mechanical properties, the maleimide compound (c1) is preferably an aromatic maleimide compound, more preferably an aromatic bismaleimide compound, and 2,2-bis [4- (4). -Maleimide phenoxy) phenyl] propane, 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethanebismaleimide is more preferred.

As the maleimide compound (c1), a compound represented by the following general formula (C1-1) is preferable.

（式中、Ｘ^ｃ１は２価の有機基を示す。）

(In the formula, X ^c1 represents a divalent organic group.)

The divalent organic group represented by X ^c1 in the general formula (C1-1) is represented by the following general formulas (C1-2), (C1-3), (C1-4) or (C1-5). The groups to be given are mentioned.

（式中、Ｒ^ｃ１は、炭素数１～５の脂肪族炭化水素基又はハロゲン原子を示す。ｎ^ｃ１は、０～４の整数を示す。＊は結合位置を示す。）

(In the formula, R ^c1 indicates an aliphatic hydrocarbon group or a halogen atom having 1 to 5 carbon atoms. n ^c1 indicates an integer of 0 to 4. * Indicates a bond position.)

Examples of the aliphatic hydrocarbon group having 1 to 5 carbon atoms indicated by R ^c1 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a t-butyl group and an n-pentyl group. Group etc. can be mentioned. As the aliphatic hydrocarbon group, an aliphatic hydrocarbon group having 1 to 3 carbon atoms is preferable, and a methyl group is more preferable.
n ^c1 represents an integer of 0 to 4, and from the viewpoint of availability, an integer of 0 to 2 is preferable, and 0 is more preferable. When n ^c1 is an integer of 2 or more, the plurality of R ^c1s may be the same or different.

（式中、Ｒ^ｃ２及びＲ^ｃ３は、各々独立に、炭素数１～５の脂肪族炭化水素基又はハロゲン原子を示す。Ｘ^ｃ２は炭素数１～５のアルキレン基、炭素数２～５のアルキリデン基、エーテル基、スルフィド基、スルホニル基、カルボニルオキシ基、ケト基、単結合、又は下記一般式（Ｃ１－３－１）で表される２価の基を示す。ｎ^ｃ２及びｎ^ｃ３は、各々独立に、０～４の整数を示す。＊は結合位置を示す。）

(In the formula, R ^c2 and R ^c3 independently represent an aliphatic hydrocarbon group or a halogen atom having 1 to 5 carbon atoms. X ^c2 is an alkylene group having 1 to 5 carbon atoms and 2 to 5 carbon atoms. An alkylidene group, an ether group, a sulfide group, a sulfonyl group, a carbonyloxy group, a keto group, a single bond, or a divalent group represented by the following general formula (C1-3-1) is shown. n ^c2 and n ^c3 are shown. , Each independently indicates an integer from 0 to 4. * Indicates the connection position.)

The description of the aliphatic hydrocarbon group having 1 to 5 carbon atoms represented by R ^c2 and R ^c3 is about the aliphatic hydrocarbon group having 1 to 5 carbon atoms represented by R ^c1 in the above general formula (C1-2). Same as the description.
Examples of the alkylene group having 1 to 5 carbon atoms indicated by X ^c2 include a methylene group, a 1,2-dimethylene group, a 1,3-trimethylene group, a 1,4-tetramethylene group, a 1,5-pentamethylene group and the like. Can be mentioned. As the alkylene group, an alkylene group having 1 to 3 carbon atoms is preferable, and a methylene group is more preferable.
Examples of the alkylidene group having 2 to 5 carbon atoms indicated by X ^c2 include an ethylidene group, a propyridene group, an isopropylidene group, a butylidene group, an isobutylidene group, a pentylidene group, and an isopentylidene group. As the alkylidene group, an isopropylidene group is preferable.
n ^c2 and n ^c3 represent an integer of 0 to 4, and from the viewpoint of availability, an integer of 0 to 2 is preferable, and 0 or 2 is more preferable. When n ^c2 is an integer of 2 or more, the plurality of R ^c2s may be the same or different from each other. When n ^c3 is an integer of 2 or more, the plurality of R ^c3s may be the same or different from each other.
The divalent group represented by the general formula (C1-3-1) represented by X ^c2 is as follows.

（式中、Ｒ^ｃ４及びＲ^ｃ５は、各々独立に、炭素数１～５の脂肪族炭化水素基又はハロゲン原子を示す。Ｘ^ｃ３は、炭素数１～５のアルキレン基、炭素数２～５のアルキリデン基、エーテル基、スルフィド基、スルホニル基、カルボニルオキシ基、ケト基又は単結合を示す。ｎ^ｃ４及びｎ^ｃ５は、各々独立に、０～４の整数を示す。＊は結合位置を示す。）

(In the formula, R ^c4 and R ^c5 each independently represent an aliphatic hydrocarbon group or a halogen atom having 1 to 5 carbon atoms. X ^c3 is an alkylene group having 1 to 5 carbon atoms and 2 to 5 carbon atoms. Indicates an alkylidene group, an ether group, a sulfide group, a sulfonyl group, a carbonyloxy group, a keto group or a single bond. N ^c4 and n ^c5 each independently indicate an integer of 0 to 4. * Indicates a bond position. .)

The description of the aliphatic hydrocarbon group having 1 to 5 carbon atoms represented by R ^c4 and R ^c5 is about the aliphatic hydrocarbon group having 1 to 5 carbon atoms represented by R ^c1 in the above general formula (C1-2). Same as the description.
As the alkylene group having 1 to 5 carbon atoms and the alkylidene group having 2 to 5 carbon atoms represented by X ^c3 , the alkylene group having 1 to 5 carbon atoms and 2 carbon atoms represented by X ^c2 in the above general formula (C1-3). The same as the alkylidene group of ~ 5 can be mentioned. Among these, an isopropylidene group is preferable from the viewpoints of high frequency characteristics, adhesion to a conductor, heat resistance, glass transition temperature and coefficient of thermal expansion.
Among the groups indicated by X ^c3 , an alkylidene group having 2 to 5 carbon atoms is preferable, and an isopropylidene group is more preferable.
n ^c4 and n ^c5 represent an integer of 0 to 4, and from the viewpoint of availability, an integer of 0 to 2 is preferable, and 0 is more preferable. When n ^c4 is an integer of 2 or more, the plurality of R ^c4s may be the same or different from each other. When n ^c5 is an integer of 2 or more, the plurality of R ^c5s may be the same or different from each other.

（式中、ｎ^ｃ６は、１～１０の整数を示す。＊は結合位置を示す。）

(In the formula, n ^c6 indicates an integer from 1 to 10. * Indicates a coupling position.)

For n ^c6 , an integer of 1 to 5 is preferable, and an integer of 1 to 3 is more preferable, from the viewpoint of availability.

（式中、Ｒ^ｃ６及びＲ^ｃ７は、各々独立に、水素原子又は炭素数１～５の脂肪族炭化水素基を示す。ｎ^ｃ７は、１～８の整数を示す。＊は結合位置を示す。）

(In the formula, R ^c6 and R ^c7 each independently represent a hydrogen atom or an aliphatic hydrocarbon group having 1 to 5 carbon atoms. n ^c7 represents an integer of 1 to 8; * indicates a bond position. .)

The description of the aliphatic hydrocarbon group having 1 to 5 carbon atoms represented by R ^c6 and R ^c7 is about the aliphatic hydrocarbon group having 1 to 5 carbon atoms represented by R ^c1 in the above general formula (C1-2). Same as the description.
n ^c7 indicates an integer of 1 to 8, preferably an integer of 1 to 3, and more preferably 1.
When n ^c7 is an integer of 2 or more, the plurality of R ^c6s may be the same or different from each other, and the plurality of R ^c7s may be the same or different from each other. May be.

X ^c1 in the above general formula (C1-1) is a divalent group represented by any of the following formulas (X ^{c1-1) to (X c1 -3} ) from the viewpoint of high frequency characteristics. Is preferable, and it is more preferable that it is a divalent group represented by the following formula (X ^c1 -3).

（式中、＊は、マレイミド基中の窒素原子との結合位置を示す。）

(In the formula, * indicates the bond position with the nitrogen atom in the maleimide group.)

As the maleimide compound, a derivative of the maleimide compound (c1) is preferable from the viewpoints of solubility in an organic solvent, compatibility, adhesion to a conductor, and high frequency characteristics.
The derivative of the maleimide compound (c1) includes a structural unit derived from the maleimide compound (c1) and an amine compound (c2) having a primary amino group [hereinafter, "amine compound (c2)" or "(c2) component". May be abbreviated as. ] Derived structural unit and modified maleimide compound (Z) [hereinafter, may be abbreviated as "modified maleimide compound (Z)" or "(Z) component". ] Is preferable.
That is, the resin composition of the present embodiment contains the maleimide compound as the component (C), and the maleimide compound has at least two N-substituted maleimide groups, and is a structural unit derived from the maleimide compound (c1). A modified maleimide compound having a primary amino group and a structural unit derived from the amine compound (c2) is preferable.
The structural unit derived from the component (c1) and the structural unit derived from the component (c2) contained in the modified maleimide compound (Z) may be one kind or a combination of two or more kinds. good.

（＊は他の構造への結合位置を示す。） The modified maleimide compound (Z) contains a structure represented by the following formula (C-1), which is formed by an addition reaction between a maleimide group contained in the component (c1) and a primary amino group contained in the component (c2). It is preferably a compound.

(* Indicates the position of connection to other structures.)

As the structural unit derived from the component (c1), for example, one or more selected from the group consisting of a group represented by the following general formula (C1-6) and a group represented by the following general formula (C1-7). Can be mentioned.

（式中、Ｘ^ｃ１は上記一般式（Ｃ１－１）中のＸ^ｃ１と同じであり、＊は他の構造への結合位置を示す。）

(In the formula, X ^c1 is the same as X ^c1 in the above general formula (C1-1), and * indicates the bonding position to another structure.)

The content of the structural unit derived from the component (c1) in the modified maleimide compound (Z) is not particularly limited, but is preferably 50 to 95% by mass, more preferably 70 to 92% by mass, and further preferably 85 to 90% by mass. preferable. When the content of the structural unit derived from the component (c1) is within the above range, the high frequency characteristics tend to be better and good film handling properties tend to be obtained.

The amine compound (c2) is preferably a compound having two or more amino groups, and more preferably a diamine compound having two amino groups.
Examples of the amine compound (c2) include 4,4'-diaminodiphenylmethane, 4,4'-diamino-3,3'-dimethyldiphenylmethane, 3,3'-diethyl-4,4'-diaminodiphenylmethane, 4, 4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, 4,4'-diaminodiphenylketone, 4,4'-diaminobiphenyl, 3,3'-dimethyl-4, 4'-Diaminobiphenyl, 2,2'-dimethyl-4,4'-diaminobiphenyl, 3,3'-dihydroxybenzidine, 2,2-bis (3-amino-4-hydroxyphenyl) propane, 3,3'-Dimethyl-5,5'-diethyl-4,4'-diaminodiphenylmethane, 2,2-bis (4-aminophenyl) propane, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 1 , 3-bis (3-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 1,4-bis (4-aminophenoxy) benzene, 4,4'-bis (4-aminophenoxy) Biphenyl, 1,3-bis [1- [4- (4-aminophenoxy) phenyl] -1-methylethyl] benzene, 1,4-bis [1- [4- (4-aminophenoxy) phenyl] -1 -Methylethyl] benzene, 4,4'-[1,3-phenylenebis (1-methylethylidene)] bisaniline, 4,4'-[1,4-phenylenebis (1-methylethylidene)] bisaniline, 3, 3'-[1,3-Phenylenebis (1-methylethylidene)] bisaniline, bis [4- (4-aminophenoxy) phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] sulfone, 9,9 -Aromatic diamine compounds such as bis (4-aminophenyl) fluorene; amine-modified siloxane compounds having a primary amino group and the like can be mentioned.

Among these, the component (c2) includes 4,4'-diaminodiphenylmethane and 4,4'-diamino from the viewpoint of excellent solubility in an organic solvent, reactivity with the component (c1), and heat resistance. -3,3'-dimethyldiphenylmethane, 3,3'-diethyl-4,4'-diaminodiphenylmethane, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 4,4'-[1, 3-Phenylenebis (1-methylethylidene)] bisaniline and 4,4'-[1,4-phenylenebis (1-methylethylidene)] bisaniline are preferred. Further, from the viewpoint of excellent high frequency characteristics and low water absorption, 3,3'-dimethyl-5,5'-diethyl-4,4'-diaminodiphenylmethane is preferable as the component (c2). Further, from the viewpoint of excellent mechanical properties such as adhesiveness to a conductor, elongation, and breaking strength, 2,2-bis [4- (4-aminophenoxy) phenyl] propane is preferable as the component (c2). Further, from the viewpoint of excellent high-frequency characteristics and low hygroscopicity in addition to excellent solubility in an organic solvent, reactivity at the time of synthesis, heat resistance, and adhesiveness to a conductor, the component (c2) is selected as a component. 4,4'-[1,3-phenylenebis (1-methylethylidene)] bisaniline and 4,4'-[1,4-phenylenebis (1-methylethylidene)] bisaniline are preferable.

As the amine compound (c2), a compound represented by the following general formula (C2-1) is preferable.

（式中、Ｘ^ｃ４は２価の有機基を示す。）

(In the formula, X ^c4 represents a divalent organic group.)

The component (c2) is an aromatic diamine compound in which X ^c4 in the general formula (C2-1) is a divalent group represented by the following general formula (C2-2) [hereinafter, “aromatic diamine compound”. (C2-2) ”may be abbreviated. ] Is preferably contained.

（式中、Ｒ^ｃ１１及びＲ^ｃ１２は、各々独立に、炭素数１～５の脂肪族炭化水素基、炭素数１～５のアルコキシ基、水酸基又はハロゲン原子を示す。Ｘ^ｃ５は、炭素数１～５のアルキレン基、炭素数２～５のアルキリデン基、エーテル基、スルフィド基、スルホニル基、カルボニルオキシ基、ケト基、フルオレニレン基、単結合、又は下記一般式（Ｃ２－２－１）若しくは（Ｃ２－２－２）で表される２価の基を示す。ｎ^ｃ８及びｎ^ｃ９は、各々独立に、０～４の整数を示す。＊は結合位置を示す。）

(In the formula, R ^c11 and R ^c12 each independently represent an aliphatic hydrocarbon group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, a hydroxyl group or a halogen atom. X ^c5 has 1 carbon atom. An alkylene group of ~ 5, an alkylidene group having 2 to 5 carbon atoms, an ether group, a sulfide group, a sulfonyl group, a carbonyloxy group, a keto group, a fluorenylene group, a single bond, or the following general formula (C2-2-1) or ( C2-2-2) indicates a divalent group. n ^c8 and n ^c9 each independently indicate an integer of 0 to 4. * Indicates a binding position.)

Examples of the aliphatic hydrocarbon group having 1 to 5 carbon atoms represented by R ^c11 and R ^c12 in the above general formula (C2-2) include a methyl group, an ethyl group, an n-propyl group, an isopropyl group and n-butyl. Examples thereof include a group, an isobutyl group, a t-butyl group, an n-pentyl group and the like.
Examples of the alkylene group having 1 to 5 carbon atoms indicated by X ^c5 include a methylene group, a 1,2-dimethylene group, a 1,3-trimethylene group, a 1,4-tetramethylene group, a 1,5-pentamethylene group and the like. Can be mentioned.
Examples of the alkylidene group having 2 to 5 carbon atoms indicated by X ^c5 include an ethylidene group, a propyridene group, an isopropylidene group, a butylidene group, an isobutylidene group, a pentylidene group and an isopentylidene group.
n ^c8 and n ^c9 represent an integer of 0 to 4, and 0 or 1 is preferable from the viewpoint of availability. When n ^c8 or n ^c9 is an integer of 2 or more, the plurality of R ^c11s or the plurality of R ^c12s may be the same or different from each other.
The divalent group represented by the general formula (C2-2-1) represented by X ^c5 in the general formula (C2-2) is as follows.

（式中、Ｒ^ｃ１３及びＲ^ｃ１４は、各々独立に、炭素数１～５の脂肪族炭化水素基又はハロゲン原子を示す。Ｘ^ｃ６は炭素数１～５のアルキレン基、炭素数２～５のアルキリデン基、ｍ－フェニレンジイソプロピリデン基、ｐ－フェニレンジイソプロピリデン基、エーテル基、スルフィド基、スルホニル基、カルボニルオキシ基、ケト基又は単結合を示す。ｎ^ｃ１０及びｎ^ｃ１１は、各々独立に、０～４の整数を示す。＊は結合位置を示す。）

(In the formula, R ^c13 and R ^c14 each independently represent an aliphatic hydrocarbon group or a halogen atom having 1 to 5 carbon atoms. X ^c6 is an alkylene group having 1 to 5 carbon atoms and 2 to 5 carbon atoms. Alkylidene group, m-phenylenediisopropylidene group, p-phenylenediisopropyridene group, ether group, sulfide group, sulfonyl group, carbonyloxy group, keto group or single bond. n ^c10 and n ^c11 are independent of each other. , Indicates an integer from 0 to 4. * Indicates the connection position.)

The description of the aliphatic hydrocarbon group having 1 to 5 carbon atoms represented by R ^c13 and R ^c14 in the general formula (C2-2-1) is described in R ^c11 and R ^c12 in the general formula (C2-2). Is the same as the description of the aliphatic hydrocarbon group having 1 to 5 carbon atoms shown in.
The description of the alkylene group having 1 to 5 carbon atoms and the alkylidene group having 2 to 5 carbon atoms represented by X ^c6 describes the alkylene group having 1 to 5 carbon atoms represented by X ^c5 in the above general formula (C2-2) and carbon. It is the same as the description about the alkylidene group of the number 2-5.
n ^c10 and n ^c11 represent an integer of 0 to 4, and from the viewpoint of availability, an integer of 0 to 2 is preferable, and 0 is more preferable. When n ^c10 is an integer of 2 or more, the plurality of R ^c13s may be the same or different from each other. When n ^c11 is an integer of 2 or more, the plurality of R ^c14s may be the same or different from each other.
The divalent group represented by the general formula (C2-2-2) represented by X ^c5 in the general formula (C2-2) is as follows.

（式中、Ｒ^ｃ１５は、炭素数１～５の脂肪族炭化水素基又はハロゲン原子を示す。Ｘ^ｃ７及びＸ^ｃ８は、各々独立に、炭素数１～５のアルキレン基、炭素数２～５のアルキリデン基、エーテル基、スルフィド基、スルホニル基、カルボニルオキシ基、ケト基又は単結合を示す。ｎ^ｃ１２は、０～４の整数を示す。＊は結合位置を示す。）

(In the formula, R ^c15 represents an aliphatic hydrocarbon group or a halogen atom having 1 to 5 carbon atoms. X ^c7 and X ^c8 are independently alkylene groups having 1 to 5 carbon atoms and 2 to 5 carbon atoms, respectively. Indicates an alkylidene group, an ether group, a sulfide group, a sulfonyl group, a carbonyloxy group, a keto group or a single bond. N ^c12 indicates an integer of 0 to 4. * Indicates a bond position.)

The description of the aliphatic hydrocarbon group having 1 to 5 carbon atoms represented by R ^c15 in the general formula (C2-2-2) is the carbon represented by R ^c11 and R ^c12 in the general formula (C2-2). It is the same as the description about the aliphatic hydrocarbon group of the number 1-5.
Examples of the alkylene group having 1 to 5 carbon atoms represented by X ^c7 and X ^c8 and the alkylidene group having 2 to 5 carbon atoms include the alkylene group having 1 to 5 carbon atoms represented by X ^c5 in the above general formula (C2-2). The same as the alkylidene group having 2 to 5 carbon atoms is exemplified. Among these, X ^c7 and X ^c8 are preferably an alkylidene group having 2 to 5 carbon atoms, and more preferably an iropropylidene group.
n ^c12 represents an integer of 0 to 4, and from the viewpoint of availability, an integer of 0 to 2 is preferable, and 0 is more preferable. When n ^c12 is an integer of 2 or more, the plurality of R ^c15s may be the same or different.

The component (c2) is an amine-modified siloxane compound in which X ^c4 in the general formula (C2-1) is a divalent group containing a structural unit represented by the following general formula (C2-3). It may be contained, and X ^c4 in the above general formula (C2-1) is a divalent group represented by the following general formula (C2-4), which is a terminal amine-modified siloxane compound [hereinafter, "terminal amine". It may be abbreviated as "modified siloxane compound (C2-4)". ] May be contained.

（式中、Ｒ^ｃ１６及びＲ^ｃ１７は、各々独立に、炭素数１～５のアルキル基、フェニル基又は置換フェニル基を表す。＊は結合位置を示す。）

(In the formula, R ^c16 and R ^c17 each independently represent an alkyl group, a phenyl group or a substituted phenyl group having 1 to 5 carbon atoms. * Indicates a bond position.)

（式中、Ｒ^ｃ１６及びＲ^ｃ１７は、上記一般式（Ｃ２－３）中のものと同じであり、Ｒ^ｃ１８及びＲ^ｃ１９は、各々独立に、炭素数１～５のアルキル基、フェニル基又は置換フェニル基を示す。Ｘ^ｃ９及びＸ^ｃ１０は、各々独立に、２価の有機基を示し、ｎ^ｃ１３は、２～１００の整数を示す。＊は結合位置を示す。）

(In the formula, R ^c16 and R ^c17 are the same as those in the above general formula (C2-3), and R ^c18 and R ^c19 are each independently an alkyl group having 1 to 5 carbon atoms, a phenyl group or a group. Substituent phenyl groups are indicated. X ^c9 and X ^c10 each independently indicate a divalent organic group, n ^c13 indicates an integer of 2 to 100, and * indicates a bond position.)

Examples of the alkyl group having 1 to 5 carbon atoms represented by R ^c16 to R ^c19 in the above general formulas (C2-3) and (C2-4) include a methyl group, an ethyl group, an n-propyl group and an isopropyl group. Examples thereof include an n-butyl group, an isobutyl group, a t-butyl group and an n-pentyl group. As the alkyl group, an alkyl group having 1 to 3 carbon atoms is preferable, and a methyl group is more preferable.
Examples of the substituent having the phenyl group in the substituted phenyl group indicated by R ^c16 to R ^c19 include an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, and an alkynyl group having 2 to 5 carbon atoms. Can be mentioned. Examples of the alkyl group having 1 to 5 carbon atoms include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a t-butyl group, an n-pentyl group and the like. Examples of the alkenyl group having 2 to 5 carbon atoms include a vinyl group and an allyl group. Examples of the alkynyl group having 2 to 5 carbon atoms include an ethynyl group and a propargyl group.
Examples of the divalent organic group indicated by X ^c9 and X ^c10 include an alkylene group, an alkenylene group, an alkynylene group, an arylene group, —O— or a divalent linking group in which these are combined. Examples of the alkylene group include an alkylene group having 1 to 10 carbon atoms such as a methylene group, an ethylene group and a propylene group. Examples of the alkenylene group include an alkenylene group having 2 to 10 carbon atoms. Examples of the alkynylene group include an alkynylene group having 2 to 10 carbon atoms. Examples of the arylene group include an arylene group having 6 to 20 carbon atoms such as a phenylene group and a naphthylene group.
Among these, as X ^c9 and X ^c10 , an alkylene group and an arylene group are preferable, and an alkylene group is more preferable.
n ^c13 indicates an integer of 2 to 100, preferably an integer of 2 to 50, more preferably an integer of 3 to 40, and even more preferably an integer of 5 to 30. When n ^c13 is an integer of 2 or more, the plurality of R ^c16s or the plurality of R ^c17s may be the same or different from each other.

（式中、Ｘ^ｃ４は上記一般式（Ｃ２－１）中のＸ^ｃ４と同じであり、＊は他の構造への結合位置を示す。） As the structural unit derived from the component (c2), for example, one or more selected from the group consisting of a group represented by the following general formula (C2-5) and a group represented by the following general formula (C2-6). Can be mentioned.

(In the formula, X ^c4 is the same as X ^c4 in the above general formula (C2-1), and * indicates the bonding position to other structures.)

The content of the structural unit derived from the component (c2) in the modified maleimide compound (Z) is not particularly limited, but is preferably 5 to 50% by mass, more preferably 8 to 30% by mass, and further preferably 10 to 15% by mass. preferable. (C2) When the content of the structural unit derived from the component is within the above range, there is a tendency that excellent high frequency characteristics and better heat resistance, flame retardancy and glass transition temperature can be obtained.

The total content of the structural unit derived from the component (c1) and the structural unit derived from the component (c2) in the modified maleimide compound (Z) is not particularly limited, but is preferably 80% by mass or more, more preferably 90% by mass or more. It is more preferably 95% by mass or more, and particularly preferably 100% by mass (that is, one consisting only of the structural unit derived from the (c1) component and the structural unit derived from the (c2) component).

The content ratio of the structural unit derived from the component (c1) and the structural unit derived from the component (c2) in the modified maleimide compound (Z) is not particularly limited, but the group derived from the -NH ₂ group of the component (c2) ( The equivalent ratio (Ta1 / Ta2) of the total equivalent (Ta1) of the maleimide group-derived group (including the maleimide group) derived from the component (c1) to the total equivalent (Ta2) of (including _NH2 ) is preferable. The content ratio is 0.05 to 10, more preferably 1 to 5. When the equivalent ratio (Ta1 / Ta2) is within the above range, there is a tendency that excellent high frequency characteristics and better heat resistance, flame retardancy and glass transition temperature can be obtained.

The maleimide compound preferably contains a compound represented by the following general formula (C-2) from the viewpoints of high frequency characteristics, insulation reliability, solubility in an organic solvent, adhesion to a conductor, moldability, and the like. ..

（式中、Ｘ^ｃ１及びＸ^ｃ４は、上記一般式（ｃ１－１）及び（ｃ２－１）における説明の通りである。）

(In the formula, X ^c1 and X ^c4 are as described in the above general formulas (c1-1) and (c2-1).)

(Method for producing modified maleimide compound (Z))
The component (Z) can be produced, for example, by reacting the component (c1) and the component (c2) in an organic solvent.
Specifically, a predetermined amount of the (c1) component, the (c2) component, and other components if necessary are charged into the reactor, and the (c1) component and the (c2) component are subjected to a Michael addition reaction [hereinafter referred to as "pre-reaction". May be referred to. ], A modified maleimide compound (Z) can be obtained.
The reaction conditions are not particularly limited, but the reaction temperature is preferably 50 to 160 ° C. and the reaction time is preferably 1 to 10 hours from the viewpoint of obtaining good reactivity and workability while suppressing gelation.

In the pre-reaction, a reaction catalyst may be used if necessary. Examples of the reaction catalyst include acidic catalysts such as p-toluenesulfonic acid; amines such as triethylamine, pyridine and tributylamine; imidazoles such as methylimidazole and phenylimidazole; and phosphorus catalysts such as triphenylphosphine. .. One of these may be used alone, or two or more thereof may be used in combination. The amount of the reaction catalyst to be blended is not particularly limited, but is, for example, 0.01 to 5 parts by mass with respect to 100 parts by mass of the total amount of the component (c1) and the component (c2).

Further, in the pre-reaction, an organic solvent may be added or concentrated as necessary to adjust the solid content concentration of the reaction raw material and the viscosity of the reaction solution. The solid content concentration of the reaction raw material is not particularly limited, but is preferably 10 to 90% by mass, more preferably 20 to 80% by mass. When the solid content concentration of the reaction raw material is at least the above lower limit value, a sufficient reaction rate can be obtained, which tends to be advantageous in terms of production cost, and when it is at least the above upper limit value, better solubility can be obtained. Therefore, the stirring efficiency is improved and gelation tends to be difficult.

The weight average molecular weight (Mw) of the modified maleimide compound (Z) is not particularly limited, but is preferably 400 to 10,000, more preferably 1,000 to 5,000, still more preferably 1,500 to 4,000. 2,000 to 3,000 are particularly preferable.

(Contents of component (C))
When the resin composition of the present embodiment contains the thermosetting resin (C), the content thereof is not particularly limited, but from the viewpoint of high frequency characteristics, heat resistance and moldability, the total amount of the resin components is 100 parts by mass. On the other hand, 5 to 80 parts by mass is preferable, 5 to 60 parts by mass is more preferable, 10 to 50 parts by mass is further preferable, and 25 to 45 parts by mass is particularly preferable.

When the resin composition of the present embodiment contains the thermosetting resin (C), the content ratio [(A) / (C)] of the polyphenylene ether derivative (A) and the thermosetting resin (C) is particularly high. Although not limited, the mass ratio is preferably 5/95 to 80/20, more preferably 6/94 to 60/40, still more preferably 8/92 to 40/60, and particularly preferably 10/90 to 20/80. .. When the content ratio [(A) / (C)] is 5/95 or more, more excellent high frequency characteristics and low hygroscopicity tend to be obtained. When the content ratio [(A) / (C)] is 80/20 or less, more excellent heat resistance, moldability and processability tend to be obtained.

The resin composition of the present embodiment further preferably contains at least one selected from the group consisting of the thermoplastic elastomer (D), the curing accelerator (E) and the inorganic filler (F). Next, each of these components will be described.

<Thermoplastic elastomer (D)>
By containing the thermoplastic elastomer (D), the resin composition of the present embodiment tends to have a good balance between high frequency characteristics, moldability, adhesiveness to conductors, solder heat resistance, glass transition temperature and coefficient of thermal expansion. It is in.
As the thermoplastic elastomer (D), one type may be used alone, or two or more types may be used in combination.

Examples of the thermoplastic elastomer (D) include thermoplastic elastomers having a structural unit represented by the following general formula (D-1), and the structural unit derived from styrene (that is, R in the following general formula (D-1)). It is preferable that the thermoplastic elastomer has a (structural unit in which ^d1 is a hydrogen atom and n ^d1 is 0) (hereinafter, may be referred to as a styrene-based thermoplastic elastomer).

（式中、Ｒ^ｄ１は、水素原子又は炭素数１～５のアルキル基を示し、Ｒ^ｄ２は、炭素数１～５のアルキル基を示す。ｎ^ｄ１は、０～５の整数を示す。）

(In the formula, R ^d1 indicates a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R ^d2 indicates an alkyl group having 1 to 5 carbon atoms, and n ^d1 indicates an integer of 0 to 5).

Examples of the alkyl group having 1 to 5 carbon atoms indicated by R ^d1 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a t-butyl group, an n-pentyl group and the like. Can be mentioned.
Among the groups indicated by R ^d1 , a hydrogen atom is preferable.
Examples of the alkyl group having 1 to 5 carbon atoms indicated by R ^d2 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a t-butyl group, an n-pentyl group and the like. Can be mentioned. The alkyl group is preferably an alkyl group having 1 to 3 carbon atoms, and more preferably a methyl group.
n ^d1 indicates an integer of 0 to 5, preferably an integer of 0 to 2, and more preferably 0.
When n ^d1 is an integer of 2 or more, the plurality of R ^d1s may be the same or different.

Examples of the structural unit other than the structural unit derived from the compound of the thermoplastic elastomer (D) include a structural unit derived from butadiene, a structural unit derived from isoprene, a structural unit derived from maleic acid, a structural unit derived from maleic anhydride, and the like. ..
The structural unit derived from butadiene and the structural unit derived from isoprene are preferably hydrogenated. When hydrogenated, the structural unit derived from butadiene is a structural unit in which ethylene units and butylene units are mixed, and the structural unit derived from isoprene is a structural unit in which ethylene units and propylene units are mixed.

Examples of the thermoplastic elastomer (D) include hydrogenated styrene-based additives such as a hydrogenated additive of a styrene-butadiene-styrene block copolymer (SBS) and a hydrogenated additive of a styrene-isoprene-styrene block copolymer (SIS). Examples include thermoplastic elastomers. Among these, styrene-butadiene-styrene block copolymer (SBS) hydrogenated additives are preferable from the viewpoints of high frequency characteristics, adhesion to conductors, heat resistance, glass transition temperature and coefficient of thermal expansion.

Examples of the hydrogenated styrene-butadiene-styrene block copolymer (SBS) include a styrene-ethylene-butylene-styrene copolymer (SEBS) obtained by completely hydrogenating a carbon-carbon double bond in a butadiene block. ) And styrene-butadiene-butylene-styrene (SBBS) formed by partially hydrogenating the carbon-carbon double bond at the 1,2-bonding site in the butadiene block. The complete hydrogenation in SEBS is usually 90% or more, 95% or more, 99% or more, and substantially the total carbon-carbon double bond. It may be 100%. The partial hydrogenation rate in SBBS is, for example, 60 to 85% with respect to the total carbon-carbon double bond.

In SEBS, the content of structural units derived from styrene [hereinafter, may be abbreviated as "styrene content". ] Is not particularly limited, but is preferably 5 to 80% by mass, more preferably 10 to 70% by mass, and 15 to 15 to 70% by mass, from the viewpoints of high frequency characteristics, adhesion to conductors, heat resistance, glass transition temperature and coefficient of thermal expansion. 60% by mass is more preferable, and 20 to 50% by mass is particularly preferable.
The melt flow rate (MFR) of SEBS is not particularly limited, but is preferably 0.1 to 20 g / 10 min, more preferably 1 to 15 g / 10 min under the measurement conditions of 230 ° C. and a load of 2.16 kgf (21.2 N). 2 to 10 g / 10 min is more preferable, and 3 to 7 g / 10 min is particularly preferable.

In SBBS, the styrene content is not particularly limited, but is preferably 40 to 80% by mass, preferably 50 to 75% by mass, from the viewpoints of high frequency characteristics, adhesion to conductors, heat resistance, glass transition temperature and thermal expansion coefficient. More preferably, 55 to 75% by mass is further preferable.
The MFR of SBBS is not particularly limited, but is preferably 0.1 to 10 g / 10 min, more preferably 0.5 to 8 g / 10 min, and 1 to 1 to 10 min under the measurement conditions of 190 ° C. and a load of 2.16 kgf (21.2 N). 6 g / 10 min is more preferable.

The thermoplastic elastomer (D) may be acid-modified with maleic anhydride or the like. The acid value of the acid-modified thermoplastic elastomer (D) is not particularly limited, but is preferably 2 to 20 mgCH ₃ ONa / g, more preferably 5 to 15 mgCH ₃ ONa / g, and further preferably 7 to 13 mgCH ₃ ONa / g. preferable.

(Contents of (D) component)
When the resin composition of the present embodiment contains the thermoplastic elastomer (D), the content thereof is not particularly limited, but is preferably 2 to 40 parts by mass with respect to 100 parts by mass of the total resin components, and 5 to 5 to 40 parts by mass. 30 parts by mass is more preferable, 8 to 25 parts by mass is further preferable, and 10 to 20 parts by mass is particularly preferable. When the content of the thermoplastic elastomer (D) is at least the above lower limit value, more excellent high frequency characteristics and moisture absorption resistance tend to be obtained. When the content of the thermoplastic elastomer (D) is not more than the above upper limit value, good heat resistance, moldability and processability tend to be obtained.

<Curing accelerator (E)>
By containing the curing accelerator (E), the resin composition of the present embodiment has improved curability, and more excellent high frequency characteristics, heat resistance, adhesion to a conductor, elastic modulus and glass transition temperature can be obtained. Tend to be.
When the resin composition of the present embodiment contains the curing accelerator (E), a suitable curing accelerator (E) may be appropriately selected according to the type of the thermosetting resin (C) component to be used.
As the curing accelerator (E), one type may be used alone, or two or more types may be used in combination.

Examples of the component (E) include an amine-based curing accelerator, an imidazole-based curing accelerator, a phosphorus-based curing accelerator, an organic metal salt, an acidic catalyst, and an organic peroxide. In this embodiment, the imidazole-based curing accelerator is not classified as an amine-based curing accelerator.
Examples of the amine-based curing accelerator include amine compounds having primary to tertiary amines such as triethylamine, pyridine, tributylamine, and dicyandiamide; and quaternary ammonium compounds.
Examples of the imidazole-based curing accelerator include imidazoles such as methylimidazole, phenylimidazole, 2-undecylimidazole, and isocyanate masked imidazole (for example, an addition reaction product of hexamethylene diisocyanate resin and 2-ethyl-4-methylimidazole). Examples include compounds.
Examples of the phosphorus-based curing accelerator include tertiary phosphine such as triphenylphosphine; and quaternary phosphonium compounds such as tri-n-butylphosphine addition reaction product of p-benzoquinone.
Examples of the organic metal salt include carboxylates such as manganese, cobalt and zinc.
Examples of the acidic catalyst include p-toluenesulfonic acid and the like.
Examples of the organic peroxide include dicumyl peroxide, 2,5-dimethyl-2,5-bis (t-butylperoxy) hexine-3,2,5-dimethyl-2,5-bis (t-). Examples thereof include butylperoxy) hexane, t-butylperoxyisopropyl monocarbonate, α, α'-di (t-butylperoxy) diisopropylbenzene and the like.
Among these, amine-based curing accelerators, imidazole-based curing accelerators, and phosphorus-based curing accelerators are selected from the viewpoints of obtaining better high-frequency characteristics, heat resistance, adhesiveness to conductors, elastic modulus, and glass transition temperature. Preferably, dicyandiamide, an imidazole-based curing accelerator, and a quaternary phosphonium compound are more preferable, and it is further preferable to use these in combination. At this time, an organic peroxide may be used in combination, but it is preferable that the organic peroxide is not contained from the viewpoint of the physical properties of the cured product.

(Contents of (E) component)
When the resin composition of the present embodiment contains the curing accelerator (E), the content thereof is not particularly limited, but is 0.01 to 10 parts by mass with respect to 100 parts by mass of the thermosetting resin (C). Is preferable, 0.05 to 5 parts by mass is more preferable, 0.1 to 5 parts by mass is further preferable, and 0.5 to 4 parts by mass is particularly preferable. When the content of the curing accelerator (E) is within the above range, better high frequency characteristics, heat resistance, storage stability and moldability tend to be obtained.

<Inorganic filler (F)>
By containing the inorganic filler (F), the resin composition of the present embodiment tends to obtain more excellent low thermal expansion property, high elastic modulus, heat resistance and flame retardancy.
As the inorganic filler (F), one type may be used alone, or two or more types may be used in combination.

Examples of the inorganic filler (F) include silica, alumina, titanium oxide, mica, verilia, barium titanate, potassium titanate, strontium titanate, calcium titanate, aluminum carbonate, magnesium hydroxide, aluminum hydroxide, and silicate. Examples thereof include aluminum oxide, calcium carbonate, calcium silicate, magnesium silicate, silicon nitride, boron nitride, clay (baked clay and the like), talc, aluminum borate, silicon carbide and the like. Among these, silica, alumina, mica, and talc are preferable, silica and alumina are more preferable, and silica is further preferable as the inorganic filler (F) from the viewpoints of coefficient of thermal expansion, elastic modulus, heat resistance, and flame retardancy. preferable. Examples of silica include precipitated silica manufactured by a wet method and having a high water content, and dry silica manufactured by a dry method and containing almost no bound water or the like. Examples of the dry silica include crushed silica, fumed silica, fused silica (molten spherical silica), and the like, depending on the manufacturing method. Among these, molten spherical silica is preferable as the inorganic filler (F).

The average particle size of the inorganic filler (F) is not particularly limited, but is preferably 0.01 to 20 μm, more preferably 0.1 to 10 μm, further preferably 0.2 to 1 μm, and even more preferably 0.3 to 0.8 μm. Is particularly preferable.

When the resin composition of the present embodiment contains the inorganic filler (F), the content thereof is not particularly limited, but from the viewpoint of the coefficient of thermal expansion, elastic modulus, heat resistance and flame retardancy, the content thereof is relative to the solid content. Therefore, 1 to 40% by mass is preferable, 5 to 35% by mass is more preferable, 10 to 35% by mass is further preferable, and 15 to 35% by mass is further preferable.

When the inorganic filler (F) is used, a cup is used, if necessary, for the purpose of improving the dispersibility of the inorganic filler (F) and the adhesion between the inorganic filler (F) and the organic component in the resin composition. A ring agent may be used in combination. The coupling agent may be the titanate coupling agent (X) or another coupling agent, for example, a silane coupling agent or the like. When a titanate coupling agent (X) is used as the coupling agent, it is preferably within the range of the content of the titanate coupling agent (X).
One type of coupling agent may be used alone, or two or more types may be used in combination.
When a coupling agent is used, the treatment method may be a so-called integral blend treatment method in which the inorganic filler (F) is mixed in the resin composition and then the coupling agent is added, but it is a dry method in advance. Alternatively, a method using a wet inorganic filler surface-treated with a coupling agent is preferable. By adopting this method, the features of the inorganic filler (F) can be more effectively expressed.
Further, the inorganic filler (F) may be used as a slurry previously dispersed in an organic solvent, if necessary.

<Flame retardant, flame retardant aid, adhesion improver>
The resin composition of the present embodiment contains at least one selected from the group consisting of a flame retardant, a flame retardant aid, and an adhesion improver, if necessary, as long as the effects of the present embodiment are not impaired. May be. For each of these components, one type may be used alone, or two or more types may be used in combination. Moreover, the resin composition of this embodiment may not contain these components.

(Flame retardants)
Examples of the flame retardant include an inorganic phosphorus-based flame retardant; an organic phosphorus-based flame retardant; a hydrate of aluminum hydroxide, a metal hydrate such as a hydrate of magnesium hydroxide, and the like. The metal hydroxide may also correspond to an inorganic filler, but if it is a material that can impart flame retardancy, it is classified as a flame retardant.
Examples of the inorganic phosphorus-based flame retardant include red phosphorus; ammonium phosphate such as monoammonium phosphate, diammonium phosphate, triammonium phosphate, and ammonium polyphosphate; and inorganic nitrogen-containing phosphorus compounds such as phosphate amide. Phosphoric acid; phosphine oxide and the like.
Examples of the organic phosphorus-based flame retardant include aromatic phosphoric acid esters, phosphonic acid diesters and phosphinic acid esters; metal salts of phosphinic acid, organic nitrogen-containing phosphorus compounds, cyclic organic phosphorus compounds and the like. Here, examples of the "metal salt" include lithium salt, sodium salt, potassium salt, calcium salt, magnesium salt, aluminum salt, titanium salt, zinc salt and the like.

(Content of flame retardant)
When the resin composition of the present embodiment contains a flame retardant, the content thereof is not particularly limited, but is, for example, 0.1 part by mass or more and 1 part by mass with respect to 100 parts by mass of the total resin components. It may be more than or equal to 5 parts by mass, may be 10 parts by mass or more, may be 40 parts by mass or less, may be 30 parts by mass or less, and may be 25. It may be 20 parts by mass or less, or may be 20 parts by mass or less. Further, the resin composition of the present embodiment does not have to contain a flame retardant.

(Flame retardant aid)
Examples of the flame-retardant aid include inorganic flame-retardant aids such as antimony trioxide and zinc molybdate.
When the resin composition of the present embodiment contains a flame retardant aid, the content thereof is not particularly limited, but is preferably 0.1 to 20 parts by mass with respect to 100 parts by mass of the total resin components, and 0. More preferably, 1 to 10 parts by mass. When the content of the flame retardant aid is within the above range, better chemical resistance tends to be obtained. Further, the resin composition of the present embodiment does not have to contain a flame retardant aid.

(Adhesion improver)
Examples of the adhesion improver include triazine derivatives, nitrogen-containing compounds such as carbodiimide, and the like.
When the resin composition of the present embodiment contains an adhesion improver, the content thereof is not particularly limited, but is preferably 0.1 to 20 parts by mass with respect to 100 parts by mass of the total resin components, and 0. More preferably, 1 to 10 parts by mass. When the content of the adhesion improver is within the above range, better copper foil peeling strength tends to be obtained. Further, the resin composition of the present embodiment does not have to contain an adhesion improver.

<Organic solvent>
The resin composition of the present embodiment may be a varnish-like resin composition containing an organic solvent from the viewpoint of facilitating handling and the prepreg described later.
Examples of the organic solvent include alcohol solvents such as ethanol, propanol, butanol, methyl cellosolve, butyl cellosolve, and propylene glycol monomethyl ether; ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; and ether solvents such as tetrahydrofuran; Aromatic solvents such as toluene, xylene and mesitylen; nitrogen atom-containing solvents such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone; sulfur atom-containing solvents such as dimethylsulfoxide; ester solvents such as γ-butyrolactone and the like can be mentioned. .. One type of these organic solvents may be used alone, or two or more types may be used in combination.

When the resin composition of the present embodiment contains an organic solvent, the content thereof is not particularly limited, but the solid content concentration of the resin composition of the present embodiment is preferably 30 to 90% by mass, preferably 40. An amount of about 80% by mass is more preferable, and an amount of 40 to 60% by mass is further preferable. When the content of the organic solvent is within the above range, the handleability of the resin composition becomes easy, the impregnation property into the base material and the appearance of the produced prepreg become good. Further, the solid content concentration of the resin in the prepreg, which will be described later, tends to be easily adjusted, and the production of the prepreg having a desired thickness tends to be easier.

<Other ingredients>
Further, the resin composition of the present embodiment is a resin material other than the above-mentioned components, a coupling agent, an antioxidant, a heat stabilizer, and an antistatic agent, if necessary, as long as the effects of the present embodiment are not impaired. , One or more selected from the group consisting of UV absorbers, pigments, colorants and lubricants [hereinafter, may be abbreviated as "other components". ] May be contained. For each of these components, one type may be used alone, or two or more types may be used in combination. Moreover, the resin composition of this embodiment may not contain these components.
When the resin composition of the present embodiment contains the above other components, the content thereof is not particularly limited, but is, for example, 0.01 part by mass or more with respect to 100 parts by mass of the total resin components. Further, it may be 10 parts by mass or less, 5 parts by mass or less, or 1 part by mass or less.
Further, the total content of the component (A), the component (B), the component (C), the component (D) and the component (E) in the resin component contained in the resin composition of the present embodiment is not particularly limited. With respect to 100 parts by mass of the total resin components, 80 parts by mass or more is preferable, 90 parts by mass or more is more preferable, and 95 parts by mass or more is further preferable (however, all include 100 parts by mass).

<Dielectric characteristic (high frequency characteristic)>
The dielectric constant (Dk) at 10 GHz when the resin composition of the present embodiment is used as a test piece by the method described in Examples described later is not particularly limited, but is preferably 3.0 or less, preferably 2.7 or less. More preferably, 2.5 or less is further preferable. The smaller the dielectric constant (Dk) is, the more preferable it is, and the lower limit thereof is not particularly limited. However, in consideration of the balance with other physical properties, for example, it may be 2.0 or more, or 2.3 or more. May be.
The dielectric loss tangent (Df) at 10 GHz when the resin composition of the present embodiment is used as a test piece by the method described in Examples described later is not particularly limited, but is preferably 0.0045 or less, preferably 0.0040 or less. More preferably, 0.0035 or less is further preferable. The smaller the dielectric loss tangent (Df) is, the more preferable it is, and the lower limit thereof is not particularly limited. However, in consideration of the balance with other physical properties, for example, it may be 0.0020 or more, and 0.0025 or more. May be.
The dielectric constant (Dk) and the dielectric loss tangent (Df) are values based on the cavity resonator perturbation method, and more specifically, they are values measured by the method described in Examples. Further, in the present specification, the term "dielectric constant" simply means the relative permittivity.

The resin composition of the present embodiment can be produced by mixing the component (A), the component (B) and, if necessary, an optional component used in combination by a known method. At this time, each component may be dissolved or dispersed while stirring in the above organic solvent. Conditions such as mixing order, temperature, and time are not particularly limited and can be arbitrarily set.

[Metal leaf with resin]
The resin-attached metal foil of the present embodiment has a layer of the resin composition of the present embodiment on the metal foil.
Specifically, the metal leaf with resin can be produced by applying the resin composition of the present embodiment on the metal leaf and semi-curing (B-stage) the resin composition in a drying oven. .. The drying conditions are not particularly limited, but the drying temperature is preferably 80 to 180 ° C, more preferably 110 to 160 ° C. The coating method is not particularly limited, and for example, a known coating machine such as a die coater, a comma coater, a bar coater, a kiss coater, or a roll coater can be used.
Examples of the metal foil of the metal foil with resin include copper foil, aluminum foil, and the like, but other metal foils can also be used. Among these, copper foil is preferable.

[Prepreg]
The prepreg of the present embodiment contains the resin composition of the present embodiment and a sheet-shaped fiber reinforced base material.
The prepreg can be formed by using the resin composition of the present embodiment and the sheet-shaped fiber reinforced base material. For example, the resin composition of the present embodiment is impregnated or coated on the sheet-shaped fiber reinforced base material. The resin composition can be produced by heating and drying the resin composition at a temperature of 80 to 200 ° C. for 1 to 30 minutes in a drying furnace to semi-cure the resin composition (B-stage).
The solid content derived from the resin composition in the prepreg of the present embodiment is not particularly limited, but is preferably 30 to 90% by mass, more preferably 35 to 80% by mass, still more preferably 40 to 70% by mass, and 45. ~ 60% by mass is particularly preferable. When the solid content derived from the resin composition in the prepreg is within the above range, better moldability tends to be obtained when the laminated plate is formed.

As the sheet-shaped fiber reinforced base material of the prepreg, known ones used for laminated boards for various electric insulating materials are used. Examples of the material of the sheet-shaped fiber reinforcing base material include inorganic fibers such as E glass, D glass, S glass, and Q glass; organic fibers such as polyimide, polyester, and tetrafluoroethylene; and a mixture thereof. These sheet-shaped fiber reinforced base materials have shapes such as woven fabrics, non-woven fabrics, robinks, chopped strand mats, and surfaced mats. Further, the thickness of the sheet-shaped fiber reinforced base material is not particularly limited, and for example, one having a thickness of 0.02 to 0.5 mm can be used. Further, from the viewpoints of impregnation property of the resin composition, heat resistance when made into a laminated board, hygroscopicity and processability, those surface-treated with a coupling agent or the like, those subjected to mechanically opening treatment, etc. are used. Can be used.

The following hot melt method or solvent method can be adopted as a method for impregnating or coating the sheet-shaped fiber reinforced base material with the resin composition.
The hot melt method is a method in which the resin composition does not contain an organic solvent, and (1) the resin composition is once coated on coated paper having good peelability and laminated on a sheet-shaped fiber reinforced base material. Or (2) a method of directly coating the sheet-shaped fiber reinforced base material with a die coater.
On the other hand, in the solvent method, the resin composition contains an organic solvent, the sheet-shaped fiber reinforced base material is immersed in the obtained resin composition, the resin composition is impregnated into the sheet-shaped fiber reinforced base material, and then the sheet-shaped fiber reinforced base material is impregnated. It is a method of drying.

[Laminate board]
The laminated board of the present embodiment is a laminated board containing (i) the metal leaf with resin of the present embodiment or (ii) the prepreg and the metal leaf of the present embodiment.
The laminated plate of the present embodiment is formed by heat-press molding one sheet of the resin-attached metal foil of the present embodiment, or by arranging two resin-attached metal foils so that the metal leaf is the outer layer and then heat-pressing molding. By doing so, a laminated board can be obtained. Further, the metal foil is arranged on one side or both sides of one prepreg of the present embodiment, or the metal foil is placed on one side or both sides of two or more prepregs of the present embodiment, and then heat and pressure molding is performed. This also makes it possible to obtain a laminated board. A laminated board having a metal foil is sometimes referred to as a metal-clad laminated board.
The metal of the metal foil is not particularly limited as long as it is used for electrical insulating materials, but from the viewpoint of conductivity, copper, gold, silver, nickel, platinum, molybdenum, ruthenium, aluminum, tungsten, iron and titanium. , Chromium, or an alloy containing one or more of these metal elements, preferably copper and aluminum, and more preferably copper.

[Multilayer printed wiring board]
The multilayer printed wiring board of the present embodiment contains (i) the metal leaf with resin of the present embodiment, (ii) the prepreg of the present embodiment, or (iii) the laminated board of the present embodiment. The multilayer printed wiring board of the present embodiment uses the metal foil with resin, the prepreg, or the laminated board of the present embodiment by a known method, such as drilling, metal plating, and circuit forming by etching the metal foil. It can be manufactured by performing a multi-layered bonding process.

[Semiconductor package]
The semiconductor package of the present embodiment is formed by mounting a semiconductor element on the multilayer printed wiring board of the present embodiment.
In the semiconductor package of the present embodiment, for example, a semiconductor element such as a semiconductor chip or a memory is mounted at a predetermined position on the multilayer printed wiring board of the present embodiment by a known method, and the semiconductor element is sealed with a sealing resin or the like. Can be manufactured by

Although the preferred embodiments of the present invention have been described above, these are examples for explaining the present invention, and the scope of the present invention is not limited to these embodiments. The present invention can be carried out in various embodiments different from the above embodiments without departing from the gist thereof.

Hereinafter, the present embodiment will be specifically described with reference to examples. However, this embodiment is not limited to the following examples.

In each example, the weight average molecular weight (Mw) was measured by the following method.
It was converted from the calibration curve using standard polystyrene by gel permeation chromatography (GPC). The calibration curve is standard polystyrene: TSK standard POLYSTYRENE (Type; A-2500, A-5000, F-1, F-2, F-4, F-10, F-20, F-40) [manufactured by Tosoh Corporation, Product name] was used for approximation by a cubic equation. The measurement conditions of GPC are shown below.
Device:
Pump: L-6200 type [manufactured by Hitachi High-Technologies Corporation]
Detector: L-3300 type RI [manufactured by Hitachi High-Technologies Corporation]
Column oven: L-655A-52 [manufactured by Hitachi High-Technologies Corporation]
Column: Guard column; "TSK Guardcolum HHR-L" + column; "TSKgel G4000HHR" + "TSKgel G2000HHR" (all manufactured by Tosoh Corporation, product name)
Column size: 6.0 x 40 mm (guard column), 7.8 x 300 mm (column)
Eluent: Tetrahydrofuran Sample concentration: 30 mg / 5 mL
Injection volume: 20 μL
Flow rate: 1.00 mL / min Measurement temperature: 40 ° C

[Production Example 1: Production of Modified Maleimide Compound (Z1)]
In a reaction vessel with a volume of 5 liters that can be heated and cooled with a thermometer, a stirrer, and a water meter with a reflux condenser, 100 parts by mass of 2,2-bis [4- (4-maleimidephenoxy) phenyl] propane , 3,3'-diethyl-4,4'-diaminodiphenylmethane (manufactured by Nippon Kayaku Co., Ltd., trade name: KAYAHARD (registered trademark) AA) 13.5 parts by mass and 171 parts by mass of propylene glycol monomethyl ether. , And reacted for 2 hours while refluxing. This was concentrated at a reflux temperature over 3 hours to produce a modified maleimide compound (Z1) -containing liquid having a solid content concentration of 65% by mass. The weight average molecular weight (Mw) of the obtained modified maleimide resin (Z1) was about 2,700.

[Examples 1 and 2, Comparative Examples 1 and 3]
(Preparation of resin composition)
Each component shown in Table 1 is stirred and mixed at room temperature together with 58 parts by mass of toluene and 10 parts by mass of methyl isobutyl ketone according to the compounding composition shown in Table 1, and a resin composition having a solid content concentration of 45 to 55% by mass is obtained. Was prepared. However, X-1 and Y-1 were previously mixed and stirred with B-1 in methyl isobutyl ketone (MIBK) at 25 ° C.
In addition, in order to unify the filler contents in each Example and Comparative Example, the total content of the fluororesin filler (B) and the inorganic filler (F) is adjusted to be equal.
(Making copper foil with resin)
The resin composition obtained in each example is applied to a copper foil (MT18FL1.5, manufactured by Mitsui Mining & Smelting Co., Ltd.) having a thickness of 0.0195 mm by a coating machine, heated and dried at 120 ° C. for 3 minutes, and then applied. A copper foil with a resin having a thickness of 25 μm was produced.
(Manufacturing of laminated board and resin plate)
Further, the resin composition was applied to a PET film having a thickness of 0.050 mm by a coating machine and dried by heating at 120 ° C. for 3 minutes to prepare a PET film with a resin having a coating thickness of 25 μm. The resin surfaces of the PET film with resin were laminated by vacuum pressure laminating (temperature 110 ° C., pressure 0.5 MPa). Further, the PET film on one side was peeled off, the peeled surfaces were stuck together, and laminated until the resin thickness became 325 μm. The double-sided PET of this PET film with resin having a resin thickness of 325 μm is peeled off, and a low profile copper foil (BF-ANP18, M surface Rz: 1.5 μm, manufactured by CIRCUIT FOIL) having a thickness of 18 μm is placed above and below the resin. , The M surface was laminated so as to be in contact with the resin, and this laminated body was placed in a mold having a thickness of 300 μm. Next, a double-sided copper-clad laminate was produced by heat-press molding under the conditions of a temperature of 230 ° C., a pressure of 3.0 MPa, and a time of 90 minutes. The outer layer copper foil of this double-sided copper-clad laminate was removed by immersing it in a copper etching solution (10% by mass solution of ammonium persulfate, manufactured by Mitsubishi Gas Chemical Company, Inc.) to prepare a resin plate having a thickness of 300 μm.

[Evaluation methods]
Each measurement and evaluation was performed according to the following method. The results are shown in Table 1.

(1. Measurement of dielectric characteristics (high frequency characteristics))
The resin plate produced in each example was cut into pieces having a length of 60 mm and a width of 2 mm, and the dielectric constant and the dielectric loss tangent were measured by the cavity resonator perturbation method. Vector network analyzer "N5227A" manufactured by Agilent Technologies, "CP129" (10GHz band resonator) manufactured by Kanto Denshi Applied Development Co., Ltd. for the cavity resonator, and "CPMA-V2" for the measurement program. I used each. The measurement was performed under the conditions of a frequency of 10 GHz and a measurement temperature of 25 ° C.

(2. Evaluation of powder falling off at the edges when cutting copper foil with resin)
When the copper foil with resin produced in each example was cut with a cutting machine "Refine Slitter W-650" (slit blade size; 98 mm x 66 mm, thickness; 2 mm, see Fig. 1, manufactured by Soltec Industry Co., Ltd.) The amount of resin powder adhering to the slit blade was visually observed. The case where the amount of resin powder adhered to the slit blade was almost nonexistent (see FIG. 2) was judged as "A", and the case where the amount of resin powder adhered to the slit blade was large (see FIG. 3) was judged as "C".

(3. Measurement of copper foil peeling strength)
The copper foil of the double-sided copper-clad laminate produced in each example was partially etched to form a copper foil line having a width of 3 mm. Next, using a constant temperature bath installation type peeling tester (manufactured by Shimadzu Corporation), set the temperature in an environment of 25 ° C, and set the copper foil line in the 90 ° direction with respect to the adhesive surface at a speed of 50 mm / min. The load when peeled off was measured.

［（Ｘ）成分以外のカップリング剤：シランカップリング剤］
・Ｙ－１：ＫＢＭ－９０３；３－アミノプロピルトリメトキシシラン、信越化学工業株式会社製
［（Ｃ）成分：熱硬化性樹脂］
・Ｃ－１：製造例１で調製した変性マレイミド化合物（Ｚ１）
［（Ｄ）成分：熱可塑性エラストマー］
・Ｄ－１：タフテック（登録商標）Ｍ１９１３；旭化成株式会社製、無水マレイン酸変性水添スチレン系熱可塑性エラストマー（ＳＥＢＳ）、酸価１０ｍｇＣＨ_３ＯＮａ／ｇ、スチレン含有率３０％、ＭＦＲ５．０ｇ／１０ｍｉｎ（ＭＦＲの測定条件：ＩＳＯ１１３３に準拠して、２３０℃、荷重２．１６ｋｇにて測定した。）
［（Ｅ）成分：硬化促進剤］
・Ｅ－１：ｐ－ベンゾキノンのトリ－ｎ－ブチルホスフィン付加反応物
・Ｅ－２：２－ウンデシルイミダゾール
・Ｅ－３：ジシアンジアミド
［（Ｆ）成分：無機充填材］
・Ｆ－１：球状溶融シリカ：平均粒子径０．５μｍ、メチルイソブチルケトン７０質量％スラリー The abbreviations and the like of each material in Table 1 are as follows.
[Component (A): Polyphenylene ether derivative]
A-1: Polyphenylene ether having a methacrylic group at the molecular ends (both ends) (weight average molecular weight (Mw); 1,700). It corresponds to the compound represented by the general formula (A-4).
[Component (B): Fluororesin filler]
B-1: PTFE filler; manufactured by Admatex Co., Ltd., particulate, average particle size: 3 μm
[(X) component: titanate coupling agent]
-X-1: Plenact (registered trademark) 38S; manufactured by Ajinomoto Fine-Techno Co., Ltd., refer to the following structural formula.

[Coupling agents other than component (X): Silane coupling agents]
Y-1: KBM-903; 3-aminopropyltrimethoxysilane, manufactured by Shin-Etsu Chemical Co., Ltd. [(C) component: thermosetting resin]
C-1: Modified maleimide compound (Z1) prepared in Production Example 1
[Component (D): Thermoplastic Elastomer]
D-1: Tough Tech (registered trademark) M1913; Maleic anhydride-modified hydrogenated styrene-based thermoplastic elastomer (SEBS), acid value 10 mgCH ₃ ONa / g, styrene content 30%, MFR 5.0 g / 10 min (MFR measurement conditions: measured at 230 ° C. and a load of 2.16 kg in accordance with ISO1133).
[(E) component: curing accelerator]
-E-1: Tri-n-butylphosphine addition reaction product of p-benzoquinone-E-2: 2-undecylimidazole-E-3: dicyandiamide [(F) component: inorganic filler]
F-1: Spherical molten silica: Average particle diameter 0.5 μm, methyl isobutyl ketone 70% by mass slurry

As is clear from the results shown in Table 1, the resin-containing copper foils and laminated plates of Examples 1 and 2 produced using the resin composition of the present embodiment are the resin-containing copper foils and laminated plates of Comparative Examples 1 to 3. It can be seen that it is superior in high frequency characteristics to the laminated plate, the powder falling off at the end is suppressed when the metal foil with resin is cut, and the copper foil peeling strength is excellent.
In particular, in Comparative Example 3 in which the silane coupling agent was used as opposed to Comparative Example 2 in which the titanate coupling agent (X) was not used, there was no change in the copper foil peeling strength.

The resin composition of the present embodiment exhibits excellent dielectric properties in a high frequency band of 10 GHz or higher, suppresses powder falling off at the edges when cutting a metal leaf with resin, and has excellent peeling strength of copper foil. Therefore, the metal leaf with resin, the prepreg, the laminated board, the multilayer printed wiring board, the semiconductor package and the like obtained by using the resin composition are suitable for electronic component applications dealing with high frequency signals.

Claims (20)

A resin composition containing a polyphenylene ether derivative (A), a fluororesin filler (B), and a titanate coupling agent (X). The resin composition according to claim 1, wherein the component (A) has an ethylenically unsaturated bond-containing group at the molecular terminal. The resin composition according to claim 1 or 2, wherein the ethylenically unsaturated bond-containing group contained in the component (A) is a (meth) acrylic group. The resin composition according to any one of claims 1 to 3, wherein the component (A) has a weight average molecular weight (Mw) of 500 to 7,000. The component (B) is a polytetrafluoroethylene (PTFE) filler, a tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer (PFA) filler, a tetrafluoroethylene-hexafluoropropylene copolymer (FEP) filler, or a tetrafluoroethylene. -The resin composition according to any one of claims 1 to 4, which is at least one selected from the group consisting of an ethylene copolymer (ETFE) filler and a polychlorotrifluoroethylene (PCTFE) filler. The resin composition according to any one of claims 1 to 5, wherein the average particle size of the component (B) is 0.1 to 10 μm. The resin composition according to any one of claims 1 to 6, wherein the content of the component (B) is 1% by mass or more and less than 50% by mass with respect to the solid content of the resin composition. The resin composition according to any one of claims 1 to 7, wherein the content of the component (B) is 1 to 40% by mass with respect to the solid content of the resin composition. The resin composition according to any one of claims 1 to 8, wherein the component (X) has a hydroxy group and a hydrocarbon group. The resin composition according to claim 9, wherein the hydrocarbon group contains a hydrocarbon group having 1 to 4 carbon atoms and a hydrocarbon group having 5 to 30 carbon atoms. The resin composition according to any one of claims 1 to 10, further comprising one or more thermosetting resins (C) selected from the group consisting of epoxy resins, cyanate resins and maleimide compounds. An amine compound containing the maleimide compound as the component (C) and having a structural unit derived from the maleimide compound (c1) having at least two N-substituted maleimide groups and a primary amino group. The resin composition according to claim 11, which is a modified maleimide compound having a structural unit derived from (c2). The resin composition according to claim 12, wherein the modified maleimide compound is a compound represented by the following general formula (C-1).

(In the formula, X ^c1 and X ^c2 are each independently divalent organic group.) One of claims 11 to 13, wherein the content ratio [(A) / (C)] of the component (A) to the component (C) is 5/95 to 80/20 in terms of mass ratio. The resin composition according to. The resin according to any one of claims 1 to 14, further comprising one or more selected from the group consisting of the thermoplastic elastomer (D), the curing accelerator (E) and the inorganic filler (F). Composition. A metal leaf with a resin, which has a layer of the resin composition according to any one of claims 1 to 15 on the metal foil. A prepreg containing the resin composition according to any one of claims 1 to 15 and a sheet-shaped fiber reinforced base material. A laminated board containing (i) the metal leaf with resin according to claim 16 or (ii) the prepreg and metal leaf according to claim 17. A multilayer printed wiring board comprising (i) the metal leaf with resin according to claim 16, (ii) the prepreg according to claim 17, or (iii) the laminated board according to claim 18. A semiconductor package in which a semiconductor element is mounted on the multilayer printed wiring board according to claim 19.

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