JP2022052522A - Thermosetting resin and cured product thereof - Google Patents
Thermosetting resin and cured product thereof Download PDFInfo
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- JP2022052522A JP2022052522A JP2020158959A JP2020158959A JP2022052522A JP 2022052522 A JP2022052522 A JP 2022052522A JP 2020158959 A JP2020158959 A JP 2020158959A JP 2020158959 A JP2020158959 A JP 2020158959A JP 2022052522 A JP2022052522 A JP 2022052522A
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- thermosetting resin
- aromatic compound
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- 229920001187 thermosetting polymer Polymers 0.000 title claims abstract description 64
- 229920005989 resin Polymers 0.000 title claims abstract description 44
- 239000011347 resin Substances 0.000 title claims abstract description 44
- -1 divinyl aromatic compound Chemical class 0.000 claims abstract description 43
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims abstract description 27
- 150000001491 aromatic compounds Chemical class 0.000 claims abstract description 25
- 229920001577 copolymer Polymers 0.000 claims description 23
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 11
- 229920006163 vinyl copolymer Polymers 0.000 claims description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 39
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 34
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 28
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 27
- 239000000047 product Substances 0.000 description 25
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 24
- 230000000052 comparative effect Effects 0.000 description 21
- 239000000243 solution Substances 0.000 description 20
- 230000015572 biosynthetic process Effects 0.000 description 18
- 238000003786 synthesis reaction Methods 0.000 description 18
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 16
- 239000007787 solid Substances 0.000 description 16
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000001914 filtration Methods 0.000 description 10
- 229920001955 polyphenylene ether Polymers 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 8
- 125000001424 substituent group Chemical group 0.000 description 8
- 229920002554 vinyl polymer Polymers 0.000 description 8
- 238000012360 testing method Methods 0.000 description 7
- 229940125904 compound 1 Drugs 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 238000005227 gel permeation chromatography Methods 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 239000012044 organic layer Substances 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 239000003505 polymerization initiator Substances 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- 238000012644 addition polymerization Methods 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 125000005496 phosphonium group Chemical group 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 150000007824 aliphatic compounds Chemical class 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000000748 compression moulding Methods 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 239000006228 supernatant Substances 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- CHRJZRDFSQHIFI-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;styrene Chemical compound C=CC1=CC=CC=C1.C=CC1=CC=CC=C1C=C CHRJZRDFSQHIFI-UHFFFAOYSA-N 0.000 description 1
- QLLUAUADIMPKIH-UHFFFAOYSA-N 1,2-bis(ethenyl)naphthalene Chemical compound C1=CC=CC2=C(C=C)C(C=C)=CC=C21 QLLUAUADIMPKIH-UHFFFAOYSA-N 0.000 description 1
- HPUCAWBFVXHLDN-UHFFFAOYSA-N 1-but-1-enyl-2-phenylbenzene Chemical group CCC=CC1=CC=CC=C1C1=CC=CC=C1 HPUCAWBFVXHLDN-UHFFFAOYSA-N 0.000 description 1
- SLBOQBILGNEPEB-UHFFFAOYSA-N 1-chloroprop-2-enylbenzene Chemical compound C=CC(Cl)C1=CC=CC=C1 SLBOQBILGNEPEB-UHFFFAOYSA-N 0.000 description 1
- VTPNYMSKBPZSTF-UHFFFAOYSA-N 1-ethenyl-2-ethylbenzene Chemical compound CCC1=CC=CC=C1C=C VTPNYMSKBPZSTF-UHFFFAOYSA-N 0.000 description 1
- GLCCHGVDZXCRGD-UHFFFAOYSA-N 1-ethenyl-2-ethylnaphthalene Chemical compound C1=CC=CC2=C(C=C)C(CC)=CC=C21 GLCCHGVDZXCRGD-UHFFFAOYSA-N 0.000 description 1
- XIRPMPKSZHNMST-UHFFFAOYSA-N 1-ethenyl-2-phenylbenzene Chemical group C=CC1=CC=CC=C1C1=CC=CC=C1 XIRPMPKSZHNMST-UHFFFAOYSA-N 0.000 description 1
- XKMDZVINHIFHLY-UHFFFAOYSA-N 1-ethenyl-3,5-dimethylbenzene Chemical compound CC1=CC(C)=CC(C=C)=C1 XKMDZVINHIFHLY-UHFFFAOYSA-N 0.000 description 1
- XHUZSRRCICJJCN-UHFFFAOYSA-N 1-ethenyl-3-ethylbenzene Chemical compound CCC1=CC=CC(C=C)=C1 XHUZSRRCICJJCN-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- IYSVFZBXZVPIFA-UHFFFAOYSA-N 1-ethenyl-4-(4-ethenylphenyl)benzene Chemical group C1=CC(C=C)=CC=C1C1=CC=C(C=C)C=C1 IYSVFZBXZVPIFA-UHFFFAOYSA-N 0.000 description 1
- WHFHDVDXYKOSKI-UHFFFAOYSA-N 1-ethenyl-4-ethylbenzene Chemical compound CCC1=CC=C(C=C)C=C1 WHFHDVDXYKOSKI-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- DBWWINQJTZYDFK-UHFFFAOYSA-N 2-ethenyl-1,4-dimethylbenzene Chemical compound CC1=CC=C(C)C(C=C)=C1 DBWWINQJTZYDFK-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 239000004727 Noryl Substances 0.000 description 1
- 229920001207 Noryl Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 238000007239 Wittig reaction Methods 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
- C08F212/36—Divinylbenzene
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
本発明の実施形態は、熱硬化性樹脂、およびその硬化物に関し、また該熱硬化性樹脂を含む熱硬化性組成物に関する。 Embodiments of the present invention relate to a thermosetting resin and a cured product thereof, and also to a thermosetting composition containing the thermosetting resin.
近年、電子機器の小型化、高性能化が進んでおり、これに伴って使用される各種材料の要求性能が向上している。例えば、高周波通信に対応できる低誘電正接のプリント基板材料が求められている。 In recent years, the miniaturization and high performance of electronic devices have been progressing, and along with this, the required performance of various materials used has been improved. For example, there is a demand for a printed circuit board material having a low dielectric loss tangent that can be used for high-frequency communication.
特許文献1には、耐熱性、電気特性に優れた熱硬化性樹脂材料として、2官能PPE(ポリフェニレンエーテル)系オリゴマーの末端をビニル基に変換したビニル化合物が開示されている。 Patent Document 1 discloses a vinyl compound in which the end of a bifunctional PPE (polyphenylene ether) oligomer is converted into a vinyl group as a thermosetting resin material having excellent heat resistance and electrical properties.
特許文献2には、誘電特性、長期環境信頼性、耐熱性、密着性を改善する硬化性樹脂組成物として、ジビニル芳香族化合物に由来する繰り返し単位2~95モル%とモノビニル芳香族化合物に由来する繰り返し単位5~98モル%含有する多官能ビニル芳香族共重合体と、熱可塑性樹脂と、熱硬化性架橋剤とを含む硬化性樹脂組成物が開示されている。 Patent Document 2 describes a curable resin composition for improving dielectric properties, long-term environmental reliability, heat resistance, and adhesion, which is derived from a repeating unit of 2 to 95 mol% derived from a divinyl aromatic compound and a monovinyl aromatic compound. A curable resin composition containing a polyfunctional vinyl aromatic copolymer containing 5 to 98 mol% of repeating units, a thermoplastic resin, and a thermosetting cross-linking agent is disclosed.
特許文献1では、比較的低誘電正接であり、反応性良好なPPE系樹脂を用いているが、誘電正接は十分であるとはいえない。特許文献2では、スチレン系の熱硬化性樹脂を開示しているが、具体的に開示された熱硬化性樹脂は数平均分子量Mnが低く、またジビニル芳香族化合物由来の繰り返し単位の含有量が高いため、誘電正接が十分であるとはいえず、また硬化収縮による割れが発生して成形性が悪化することが判明した。 In Patent Document 1, a PPE-based resin having a relatively low dielectric loss tangent and good reactivity is used, but the dielectric loss tangent cannot be said to be sufficient. Patent Document 2 discloses a styrene-based thermosetting resin, but the specifically disclosed thermosetting resin has a low number average molecular weight Mn and a content of repeating units derived from a divinyl aromatic compound. Since it is high, it cannot be said that the dielectric loss tangent is sufficient, and it has been found that cracking due to curing shrinkage occurs and the moldability deteriorates.
本発明の実施形態は、以上の点に鑑み、成形性の悪化を抑えることができるとともに優れた誘電特性を持つ硬化物が得られる熱硬化性樹脂を提供することを目的とする。 In view of the above points, it is an object of the present invention to provide a thermosetting resin capable of suppressing deterioration of moldability and obtaining a cured product having excellent dielectric properties.
本発明は以下に示される実施形態を含む。
[1] モノビニル芳香族化合物に対応する繰り返し単位およびジビニル芳香族化合物に対応する繰り返し単位を有し、数平均分子量Mnおよび重量平均分子量Mwがそれぞれ1万以上10万以下であり、前記ジビニル芳香族化合物に対応する繰り返し単位の含有量が5~20モル%である、熱硬化性樹脂。
[2] 直鎖状のビニル共重合体である、[1]に記載の熱硬化性樹脂。
[3] ビニルベンジルホスホニウムハライドをモノビニル芳香族化合物と共重合させてなる共重合体をホルムアルデヒドと反応させて得られる、[1]又は[2]に記載の熱硬化性樹脂。
[4] [1]~[3]のいずれか1項に記載の熱硬化性樹脂を硬化してなる硬化物。
[5] [1]~[3]のいずれか1項に記載の熱硬化性樹脂を含む熱硬化性組成物。
[6] プリント基板材料である[5]に記載の熱硬化性組成物。
The present invention includes embodiments shown below.
[1] It has a repeating unit corresponding to a monovinyl aromatic compound and a repeating unit corresponding to a divinyl aromatic compound, and has a number average molecular weight Mn and a weight average molecular weight Mw of 10,000 or more and 100,000 or less, respectively, and the divinyl aromatic compound. A thermosetting resin having a repeating unit content of 5 to 20 mol% corresponding to the compound.
[2] The thermosetting resin according to [1], which is a linear vinyl copolymer.
[3] The thermosetting resin according to [1] or [2], which is obtained by reacting a copolymer obtained by copolymerizing vinylbenzylphosphonium halide with a monovinyl aromatic compound with formaldehyde.
[4] A cured product obtained by curing the thermosetting resin according to any one of [1] to [3].
[5] A thermosetting composition containing the thermosetting resin according to any one of [1] to [3].
[6] The thermosetting composition according to [5], which is a printed circuit board material.
本発明の実施形態に係る熱硬化性樹脂であると、成形性の悪化を抑えることができるとともに、優れた誘電特性を持つ硬化物が得られる。 With the thermosetting resin according to the embodiment of the present invention, deterioration of moldability can be suppressed and a cured product having excellent dielectric properties can be obtained.
本実施形態に係る熱硬化性樹脂は、モノビニル芳香族化合物に対応する繰り返し単位およびジビニル芳香族化合物に対応する繰り返し単位を有するビニル共重合体であって、数平均分子量Mnおよび重量平均分子量Mwがそれぞれ1万以上10万以下であり、前記ジビニル芳香族化合物に対応する繰り返し単位の含有量が5~20モル%である。かかる本実施形態によれば、硬化物の誘電正接を低くすることができる。また、架橋密度の上昇を抑えて、硬化収縮による割れの発生を抑制することができるため、成形性の悪化を抑えることができる。 The thermosetting resin according to the present embodiment is a vinyl copolymer having a repeating unit corresponding to a monovinyl aromatic compound and a repeating unit corresponding to a divinyl aromatic compound, and has a number average molecular weight Mn and a weight average molecular weight Mw. Each is 10,000 or more and 100,000 or less, and the content of the repeating unit corresponding to the divinyl aromatic compound is 5 to 20 mol%. According to this embodiment, the dielectric loss tangent of the cured product can be lowered. In addition, it is possible to suppress an increase in the crosslink density and suppress the occurrence of cracks due to curing shrinkage, so that deterioration of moldability can be suppressed.
モノビニル芳香族化合物に対応する繰り返し単位とは、ビニル共重合体の構成単位であって、モノビニル芳香族化合物をモノマーとして付加重合させることで形成される構造を持つ構成単位であり、当該モノビニル芳香族化合物に対応する構造を持つものであれば、必ずしも当該モノビニル芳香族化合物を用いて重合してなるものには限定されず、重合後に更に反応させることでモノビニル芳香族化合物に対応する構造としたものでもよい。 The repeating unit corresponding to the monovinyl aromatic compound is a structural unit of the vinyl copolymer and has a structure formed by addition polymerization of the monovinyl aromatic compound as a monomer. As long as it has a structure corresponding to the compound, it is not necessarily limited to the one obtained by polymerization using the monovinyl aromatic compound, and the structure corresponding to the monovinyl aromatic compound is obtained by further reacting after the polymerization. But it may be.
モノビニル芳香族化合物に対応する繰り返し単位としては、下記一般式(1)で表されるようにモノビニル芳香族化合物のビニル基が付加重合により単結合となった構造を持つ繰り返し単位が挙げられる。
式(1)中、R1は、炭素数6~30の一価の芳香族炭化水素基を表し、より詳細には、置換基を有してもよいフェニル基、置換基を有していてもよいビフェニル基、置換基を有していてもよいナフチル基、及び置換基を有していてもよいターフェニル基からなる群から選ばれる炭素数6~30の一価の芳香族炭化水素基が挙げられる。 In the formula (1), R 1 represents a monovalent aromatic hydrocarbon group having 6 to 30 carbon atoms, and more specifically, it has a phenyl group and a substituent which may have a substituent. A monovalent aromatic hydrocarbon group having 6 to 30 carbon atoms selected from the group consisting of a good biphenyl group, a naphthyl group which may have a substituent, and a turphenyl group which may have a substituent. Can be mentioned.
このような繰り返し単位を形成するモノビニル芳香族化合物としては、ビニル基を1つ有する芳香族化合物であればよく、例えば、スチレン、ビニルナフタレン、ビニルビフェニルなどのビニル芳香族化合物、アルキルスチレン(例えばo-メチルスチレン、m-メチルスチレン、p-メチルスチレン、o-エチルスチレンン、m-エチルスチレン、p-エチルスチレン)、ジアルキルスチレン(例えば3,5-ジメチルスチレン、2,5-ジメチルスチレン、2,5-ジエチルスチレン)、アルキルビニルビフェニル(例えばエチルビニルビフェニル)、アルキルビニルナフタレン(例えばエチルビニルナフタレン)などの核アルキル置換ビニル芳香族化合物などが挙げられ、これらはいずれか1種または2種以上組み合わせて用いることができる。これらの中でもスチレンが好ましい。 The monovinyl aromatic compound forming such a repeating unit may be any aromatic compound having one vinyl group, for example, vinyl aromatic compounds such as styrene, vinylnaphthalene and vinylbiphenyl, and alkylstyrene (for example, o). -Methyl styrene, m-methyl styrene, p-methyl styrene, o-ethyl styrene, m-ethyl styrene, p-ethyl styrene), dialkyl styrene (eg 3,5-dimethyl styrene, 2,5-dimethyl styrene, 2) , 5-Diethylstyrene), alkyl vinyl biphenyl (eg ethyl vinyl biphenyl), nuclear alkyl substituted vinyl aromatic compounds such as alkyl vinyl naphthalene (eg ethyl vinyl naphthalene), etc., any one or more. Can be used in combination. Of these, styrene is preferable.
ジビニル芳香族化合物に対応する繰り返し単位とは、ビニル共重合体の構成単位であって、ジビニル芳香族化合物をモノマーとして付加重合させることで形成される構造を持つ構成単位であり、当該ジビニル芳香族化合物に対応する構造を持つものであれば、必ずしも当該ジビニル芳香族化合物を用いて重合してなるものには限定されず、重合後に更に反応させることでジビニル芳香族化合物に対応する構造としたものでもよい。 The repeating unit corresponding to the divinyl aromatic compound is a structural unit of the vinyl copolymer, which has a structure formed by addition polymerization of the divinyl aromatic compound as a monomer, and is the divinyl aromatic compound. As long as it has a structure corresponding to the compound, it is not necessarily limited to the one obtained by polymerizing using the divinyl aromatic compound, and the structure corresponding to the divinyl aromatic compound is obtained by further reacting after the polymerization. But it may be.
ジビニル芳香族化合物に対応する繰り返し単位としては、下記一般式(2)で表されるようにジビニル芳香族化合物の1つのビニル基が付加重合により単結合となった構造を持つ繰り返し単位が挙げられる。
式(2)中、R2は、炭素数6~30の二価の芳香族炭化水素基を表し、より詳細には、置換基を有してもよいフェニレン基、置換基を有していてもよいビフェニルジイル基、置換基を有していてもよいナフチレン基、及び置換基を有していてもよいターフェニルジイル基からなる群から選ばれる炭素数6~30の二価の芳香族炭化水素基が挙げられる。 In the formula (2), R 2 represents a divalent aromatic hydrocarbon group having 6 to 30 carbon atoms, and more specifically, it has a phenylene group and a substituent which may have a substituent. A divalent aromatic carbide having 6 to 30 carbon atoms selected from the group consisting of a good biphenyldiyl group, a naphthylene group which may have a substituent, and a turphenyldiyl group which may have a substituent. A hydrogen group can be mentioned.
このような繰り返し単位を形成するジビニル芳香族化合物としては、ビニル基を2つ有する芳香族化合物であればよく、例えば、ジビニルベンゼン(各位置異性体又はこれらの混合物を含む)、ジビニルナフタレン(各位置異性体又はこれらの混合物を含む)、ジビニルビフェニル(各位置異性体又はこれらの混合物を含む)が挙げられ、これらはいずれか1種または2種以上組み合わせて用いることができる。これらの中でも、ジビニルベンゼン(m-体、p-体又はこれらの位置異性体混合物)が好ましい。 The divinyl aromatic compound forming such a repeating unit may be any aromatic compound having two vinyl groups, for example, divinylbenzene (including each position isomer or a mixture thereof), divinylnaphthalene (each). Examples thereof include position isomers (including position isomers or mixtures thereof) and divinylbiphenyl (including position isomers or mixtures thereof), which may be used alone or in combination of two or more. Among these, divinylbenzene (m-form, p-form or a mixture of these positional isomers) is preferable.
本実施形態に係る熱硬化性樹脂において、モノビニル芳香族化合物に対応する繰り返し単位とジビニル芳香族化合物に対応する繰り返し単位の配列順序は、規則的に配列されてもよく、ランダムに配列されてもよい。好ましくはランダムに配列されたランダム共重合体である。 In the thermosetting resin according to the present embodiment, the order of the repeating units corresponding to the monovinyl aromatic compound and the repeating units corresponding to the divinyl aromatic compound may be regularly arranged or randomly arranged. good. It is preferably a randomly arranged random copolymer.
また、該熱硬化性樹脂は、モノビニル芳香族化合物に対応する繰り返し単位およびジビニル芳香族化合物に対応する繰り返し単位の他に、その効果が損なわれない範囲で、他のモノマーに対応する繰り返し単位を含んでもよい。そのような他のモノマーとしては、例えば、トリビニル芳香族化合物、トリビニル脂肪族化合物、ジビニル脂肪族化合物、モノビニル脂肪族化合物などが挙げられる。 Further, in the thermosetting resin, in addition to the repeating unit corresponding to the monovinyl aromatic compound and the repeating unit corresponding to the divinyl aromatic compound, the repeating unit corresponding to other monomers is used as long as the effect is not impaired. It may be included. Examples of such other monomers include trivinyl aromatic compounds, trivinyl aliphatic compounds, divinyl aliphatic compounds, monovinyl aliphatic compounds and the like.
本実施形態に係る熱硬化性樹脂は、数平均分子量Mnが1万以上10万以下である。数平均分子量Mnが1万以上であることにより、重合開始剤由来の末端基の濃度を下げて誘電特性を向上することができる。また、数平均分子量Mnが10万以下であることにより、熱硬化性樹脂を溶液としたときの高粘度化を抑えて取り扱い性を向上することができる。数平均分子量Mnは、1.5万以上であることが好ましく、より好ましくは2万以上であり、また、5万以下であることが好ましく、より好ましくは4万以下であり、更に好ましくは3万以下である。 The thermosetting resin according to this embodiment has a number average molecular weight Mn of 10,000 or more and 100,000 or less. When the number average molecular weight Mn is 10,000 or more, the concentration of the terminal group derived from the polymerization initiator can be lowered and the dielectric property can be improved. Further, when the number average molecular weight Mn is 100,000 or less, it is possible to suppress the increase in viscosity when the thermosetting resin is used as a solution and improve the handleability. The number average molecular weight Mn is preferably 15,000 or more, more preferably 20,000 or more, preferably 50,000 or less, more preferably 40,000 or less, still more preferably 3. It is less than 10,000.
本実施形態に係る熱硬化性樹脂は、重量平均分子量Mwが1万以上10万以下である。重量平均分子量Mwが1万以上であることにより、重合開始剤由来の末端基の濃度を下げて誘電特性を向上することができる。また、重量平均分子量Mwが10万以下であることにより、熱硬化性樹脂を溶液としたときの高粘度化を抑えて取り扱い性を向上することができる。重量平均分子量Mwは、2万以上であることが好ましく、より好ましくは2.5万以上であり、更に好ましくは3万以上であり、更に好ましくは4万以上であり、また、7万以下であることが好ましく、より好ましくは6万以下であり、更に好ましくは5万以下である。 The thermosetting resin according to this embodiment has a weight average molecular weight Mw of 10,000 or more and 100,000 or less. When the weight average molecular weight Mw is 10,000 or more, the concentration of the terminal group derived from the polymerization initiator can be lowered and the dielectric property can be improved. Further, when the weight average molecular weight Mw is 100,000 or less, it is possible to suppress the increase in viscosity when the thermosetting resin is used as a solution and improve the handleability. The weight average molecular weight Mw is preferably 20,000 or more, more preferably 25,000 or more, still more preferably 30,000 or more, still more preferably 40,000 or more, and 70,000 or less. It is preferably 60,000 or less, still more preferably 50,000 or less.
本実施形態に係る熱硬化性樹脂において、数平均分子量Mnに対する重量平均分子量Mwの比である分子量分布Mw/Mnは、特に限定されないが、4.0以下であることが好ましく、より好ましくは1.2~3.0であり、更に好ましくは1.5~1.9である。 In the thermosetting resin according to the present embodiment, the molecular weight distribution Mw / Mn, which is the ratio of the weight average molecular weight Mw to the number average molecular weight Mn, is not particularly limited, but is preferably 4.0 or less, more preferably 1. It is .2 to 3.0, more preferably 1.5 to 1.9.
ここで、数平均分子量Mnおよび重量平均分子量Mwは、ゲル浸透クロマトグラフィー(GPC)により測定されるポリスチレン換算の数平均分子量および重量平均分子量である。 Here, the number average molecular weight Mn and the weight average molecular weight Mw are polystyrene-equivalent number average molecular weight and weight average molecular weight measured by gel permeation chromatography (GPC).
本実施形態に係る熱硬化性樹脂において、ジビニル芳香族化合物に対応する繰り返し単位の含有量は5~20モル%である。すなわち、ビニル共重合体を構成する全繰り返し単位を100モル%として、ジビニル芳香族化合物に対応する繰り返し単位の含有量が5モル%以上20モル%以下である。ジビニル芳香族化合物に対応する繰り返し単位の含有量が5モル%以上であることにより、熱硬化性を高めて良好な硬化物を得ることができ、また、該含有量が20モル%以下であることにより、硬化収縮による割れの発生を抑制して成形性を向上することができる。ジビニル芳香族化合物に対応する繰り返し単位の含有量は7モル%以上であることが好ましく、また15モル%以下であることが好ましい。 In the thermosetting resin according to the present embodiment, the content of the repeating unit corresponding to the divinyl aromatic compound is 5 to 20 mol%. That is, the content of the repeating unit corresponding to the divinyl aromatic compound is 5 mol% or more and 20 mol% or less, assuming that all the repeating units constituting the vinyl copolymer are 100 mol%. When the content of the repeating unit corresponding to the divinyl aromatic compound is 5 mol% or more, the thermosetting property can be enhanced to obtain a good cured product, and the content is 20 mol% or less. As a result, it is possible to suppress the occurrence of cracks due to curing shrinkage and improve the moldability. The content of the repeating unit corresponding to the divinyl aromatic compound is preferably 7 mol% or more, and preferably 15 mol% or less.
本実施形態に係る熱硬化性樹脂において、モノビニル芳香族化合物に対応する繰り返し単位の含有量は、ビニル共重合体を構成する全繰り返し単位を100モル%として、80~95モル%であることが好ましい。モノビニル芳香族化合物に対応する繰り返し単位の含有量は、85モル%以上であることが好ましく、また93モル%以下であることが好ましい。 In the thermosetting resin according to the present embodiment, the content of the repeating unit corresponding to the monovinyl aromatic compound is 80 to 95 mol%, where 100 mol% is the total repeating unit constituting the vinyl copolymer. preferable. The content of the repeating unit corresponding to the monovinyl aromatic compound is preferably 85 mol% or more, and preferably 93 mol% or less.
本実施形態に係る熱硬化性樹脂の製造方法は、特に限定されず、例えば、モノビニル芳香族化合物とジビニル芳香族化合物を含むモノマーを、重合開始剤の存在下に重合することにより得ることができる。 The method for producing a thermosetting resin according to the present embodiment is not particularly limited, and can be obtained, for example, by polymerizing a monomer containing a monovinyl aromatic compound and a divinyl aromatic compound in the presence of a polymerization initiator. ..
好ましい製造方法として、ビニルベンジルホスホニウムハライドをモノビニル芳香族化合物と共重合させ、得られた共重合体をホルムアルデヒドと反応させることにより、熱硬化性樹脂を得る方法が挙げられる。これにより熱硬化性樹脂として分岐を持たない直鎖状のビニル共重合体を合成することができるので、重合開始剤由来の末端基の濃度を下げて誘電特性を向上することができる。また、直鎖状構造により分子鎖の絡み合いを生じて成形性が向上する。 As a preferable production method, a method of copolymerizing vinylbenzylphosphonium halide with a monovinyl aromatic compound and reacting the obtained copolymer with formaldehyde to obtain a thermosetting resin can be mentioned. As a result, a linear vinyl copolymer having no branch can be synthesized as a thermosetting resin, so that the concentration of the terminal group derived from the polymerization initiator can be lowered and the dielectric property can be improved. In addition, the linear structure causes entanglement of molecular chains to improve moldability.
上記ビニルベンジルホスホニウムハライドにおけるホスホニウム基としては、例えば、トリアルキルホスホニウム、トリアリールホスホニウム、トリアラルキルホスホニウムなどの第四級ホスホニウム基が挙げられる。また、ホスホニウム基と塩を形成するハロゲンとしては、例えば塩素、臭素などが挙げられる。 Examples of the phosphonium group in the vinylbenzyl phosphonium halide include a quaternary phosphonium group such as trialkylphosphonium, triarylphosphonium, and triaralkylphosphonium. Examples of the halogen that forms a salt with a phosphonium group include chlorine and bromine.
ビニルベンジルホスホニウムハライドをモノビニル芳香族化合物と共重合させる方法としては、公知のビニル重合法を用いることができ、特に限定されない。例えば、アゾビスイソブチロニトリル(AIBN)などのアゾ化合物、過酸化ベンゾイルなどの有機過酸化物などのラジカル重合開始剤を用いて共重合させることにより、ビニルベンジルホスホニウムハライドに由来する繰り返し単位とモノビニル芳香族化合物に由来する繰り返し単位を有する共重合体が得られる。 As a method for copolymerizing vinylbenzylphosphonium halide with a monovinyl aromatic compound, a known vinyl polymerization method can be used and is not particularly limited. For example, by copolymerizing with an azo compound such as azobisisobutyronitrile (AIBN) or a radical polymerization initiator such as an organic peroxide such as benzoyl peroxide, a repeating unit derived from vinylbenzylphosphonium halide can be used. A copolymer having a repeating unit derived from a monovinyl aromatic compound can be obtained.
そして、得られた共重合体をホルムアルデヒドと反応させる方法としては、公知のウィッティッヒ反応を用いることができ、該共重合体を塩基で処理してホルムアルデヒドと反応させることにより、ホスホニウム基が外れてビニル基が導入される。 As a method for reacting the obtained copolymer with formaldehyde, a known Wittig reaction can be used. By treating the copolymer with a base and reacting with formaldehyde, the phosphonium group is removed and vinyl is removed. The group is introduced.
この製造方法であると、共重合工程ではビニルベンジルホスホニウムハライドがモノビニルであるため、分岐を持たない共重合体が得られ、共重合後にビニルベンジルホスホニウムハライドに由来する繰り返し単位にビニル基を導入するため、ジビニル芳香族化合物に対応する繰り返し単位を有するものでありながら、分岐のない直鎖状のビニル共重合体を得ることができる。 In this production method, since vinylbenzylphosphonium halide is monovinyl in the copolymerization step, a copolymer having no branch can be obtained, and a vinyl group is introduced into a repeating unit derived from vinylbenzylphosphonium halide after the copolymerization. Therefore, it is possible to obtain a linear vinyl copolymer having no branch while having a repeating unit corresponding to the divinyl aromatic compound.
本実施形態に係る熱硬化性組成物は、上記熱硬化性樹脂を含むものである。熱硬化性組成物における熱硬化性樹脂の含有量は、当該組成物が熱により硬化する性質を有する限り、特に限定されない。例えば、熱硬化性組成物の固形分(後述する有機溶媒を含む場合は当該有機溶媒を除いた量であり、有機溶媒を含まない場合は当該組成物全体の量)100質量%に対して、1~99質量%でもよく、10~95質量%でもよい。 The thermosetting composition according to the present embodiment contains the above-mentioned thermosetting resin. The content of the thermosetting resin in the thermosetting composition is not particularly limited as long as the composition has a property of being heat-curable. For example, with respect to 100% by mass of the solid content of the thermosetting composition (the amount excluding the organic solvent when the organic solvent described later is contained, and the total amount of the composition when the organic solvent is not contained). It may be 1 to 99% by mass, or 10 to 95% by mass.
熱硬化性組成物には、上記熱硬化性樹脂の他に、例えば、他の熱硬化性樹脂(熱硬化性架橋剤)、熱可塑性樹脂、充填剤、難燃剤、硬化促進剤、重合開始剤、消泡剤、熱安定剤、帯電防止剤、紫外線吸収剤、染料や顔料等の着色剤、滑剤、分散剤などの種々の成分を含有してもよい。 In addition to the above thermosetting resin, the thermosetting composition includes, for example, other thermosetting resins (thermosetting cross-linking agents), thermoplastic resins, fillers, flame retardants, curing accelerators, and polymerization initiators. , Antifoaming agent, heat stabilizer, antistatic agent, ultraviolet absorber, colorant such as dye and pigment, lubricant, dispersant and the like may be contained.
また、熱硬化性組成物はその粘度を調整するために有機溶媒を含んでもよく、熱硬化性組成物は上記熱硬化性樹脂を含む溶液であってもよい。有機溶媒としては、上記熱硬化性樹脂を溶解させることができるものが用いられ、例えば、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン、酢酸エチル、酢酸プロピル、酢酸ブチル等のエステル、ジメチルアセトアミド、ジメチルホルムアミド等のアミド、トルエン、キシレン等の芳香族炭化水素などが挙げられ、これらをいずれか1種または2種以上組み合わせて用いることができる。 Further, the thermosetting composition may contain an organic solvent in order to adjust its viscosity, and the thermosetting composition may be a solution containing the thermosetting resin. As the organic solvent, a solvent capable of dissolving the above-mentioned thermosetting resin is used, for example, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, esters such as ethyl acetate, propyl acetate and butyl acetate, dimethylacetamide and dimethyl. Examples thereof include amides such as formamide, aromatic hydrocarbons such as toluene and xylene, and any one of these or a combination of two or more thereof can be used.
本実施形態の熱硬化性樹脂または熱硬化性組成物は、ビニル共重合体の分子鎖中にビニル基を有することから重合による架橋が可能であり、熱硬化により硬化物を得ることができる。該硬化物は誘電正接が低く誘電特性に優れるため、例えば、プリント基板材料、半導体封止材料などの電子材用途に用いることができる。 Since the thermosetting resin or the thermosetting composition of the present embodiment has a vinyl group in the molecular chain of the vinyl copolymer, it can be crosslinked by polymerization, and a cured product can be obtained by thermosetting. Since the cured product has a low dielectric loss tangent and excellent dielectric properties, it can be used for electronic materials such as printed circuit board materials and semiconductor encapsulation materials.
プリント基板材料としては、片面基板、両面基板、多層基板、ビルドアップ基板などのリジッドプリント基板材料や、フィルム状ないしシート状のフレキシブルプリント基板材料などが挙げられる。また、誘電正接が低いことから高周波通信機器に用いられる高周波基板材料として好適に用いられる。 Examples of the printed circuit board material include a rigid printed circuit board material such as a single-sided substrate, a double-sided substrate, a multilayer substrate, and a build-up substrate, and a film-shaped or sheet-shaped flexible printed circuit board material. Further, since it has a low dielectric loss tangent, it is suitably used as a high-frequency substrate material used in high-frequency communication equipment.
以下、実施例によってさらに具体的に説明するが、本発明は以下の実施例に限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to the following Examples.
<測定・評価方法>
[スチレン/ジビニルベンゼンのモル比、ジビニルベンゼン比率]
実施例1~2および比較例1~3で得た生成物について重水素化クロロホルムに溶解し、核磁気共鳴装置(JEOL製)により1H-NMR測定を行って、スチレンに対応する繰り返し単位とジビニルベンゼンに対応する繰り返し単位のモル比を求め、全繰り返し単位100モル%に対するスチレンに対応する繰り返し単位の含有量(スチレン比率)とジビニルベンゼンに対応する繰り返し単位の含有量(ジビニルベンゼン比率)を算出した。
<Measurement / evaluation method>
[Mole ratio of styrene / divinylbenzene, divinylbenzene ratio]
The products obtained in Examples 1 and 2 and Comparative Examples 1 to 3 were dissolved in dehydrided chloroform, and 1 H-NMR measurement was carried out with a nuclear magnetic resonance apparatus (manufactured by JEOL) to obtain a repeating unit corresponding to styrene. Obtain the molar ratio of the repeating unit corresponding to divinylbenzene, and determine the content of the repeating unit corresponding to styrene (styrene ratio) and the content of the repeating unit corresponding to divinylbenzene (divinylbenzene ratio) with respect to 100 mol% of all repeating units. Calculated.
[数平均分子量、重量平均分子量]
実施例1~2および比較例1~4で得た生成物をテトラヒドロフランに溶解し、ポリスチレン系ゲルを充填剤とした4本のカラム(Shodex GPCカラム KF-601、KF-602、KF-603、KF-604、昭和電工製)を連結したゲル浸透クロマトグラフィー(GPC)(Prominence、島津製作所製)によりポリスチレン換算の数平均分子量Mn、重量平均分子量Mwを測定した。カラムオーブン温度40℃、THF流量0.6mL/minとし、示差屈折率検出器(Shodex RI-504、昭和電工製)を用いた。
[Number average molecular weight, weight average molecular weight]
Four columns (Shodex GPC columns KF-601, KF-602, KF-603, in which the products obtained in Examples 1 and 2 and Comparative Examples 1 to 4 were dissolved in tetrahydrofuran and the polystyrene gel was used as a filler. The polystyrene-equivalent number average molecular weight Mn and weight average molecular weight Mw were measured by gel permeation chromatography (GPC) (Prominence, manufactured by Shimadzu Corporation) in which KF-604 (manufactured by Showa Denko) was linked. The column oven temperature was 40 ° C., the THF flow rate was 0.6 mL / min, and a differential refractive index detector (Shodex RI-504, manufactured by Showa Denko) was used.
[誘電率、誘電正接]
実施例1~2および比較例1~4で得た生成物を試料として用いた。試験用単動圧縮成形機(安田精機製作所製)を用いて圧力10Pa、温度220℃で試料1.5gを15分間プレスし、30mm×30mm×厚さ1mmの平板を作成した。得られた平板を裁断して幅2mm、厚さ1mm、長さ30mmの試験片を作成し、空洞共振器法誘電率測定装置(KEYSIGHT製)を使用して、10GHzでの誘電率及び誘電正接を測定した。
[Permittivity, dielectric loss tangent]
The products obtained in Examples 1 and 2 and Comparative Examples 1 and 4 were used as samples. Using a single-acting compression molding machine for testing (manufactured by Yasuda Seiki Seisakusho), 1.5 g of a sample was pressed at a pressure of 10 Pa and a temperature of 220 ° C. for 15 minutes to prepare a flat plate having a thickness of 30 mm × 30 mm × a thickness of 1 mm. The obtained flat plate is cut to prepare a test piece having a width of 2 mm, a thickness of 1 mm, and a length of 30 mm. Was measured.
[熱硬化性]
実施例1~2および比較例1~4で得た生成物を試料として、示差走査熱量測定装置(リガク製)を用い、昇温速度10℃/分で室温から350℃まで昇温した。発熱ピークの発熱量が40J/g以上のものを「◎」(熱硬化性良好)、20~40J/gのものを「○」、20J/g未満のものを「×」(熱硬化性不良)とした。
[Thermosetting]
Using the products obtained in Examples 1 and 2 and Comparative Examples 1 to 4 as samples, the temperature was raised from room temperature to 350 ° C. using a differential scanning calorimetry device (manufactured by Rigaku) at a heating rate of 10 ° C./min. Those with a heat generation peak of 40 J / g or more are "◎" (good thermosetting), those with a heat generation peak of 20 to 40 J / g are "○", and those with a calorific value of less than 20 J / g are "x" (poor thermosetting). ).
[成形性]
実施例1~2および比較例1~4で得た生成物を試料として、試験用単動圧縮成形機(安田精機製作所製)を用いて圧力10Pa、温度220℃で試料7.0gを10分間プレスし、110mm×60mm×厚さ1mmの自立板が得られたものを「〇」(成形性良好)、硬化物が破断するなどして自立板が得られなかったものを「×」(成形性不良)とした。
[Formability]
Using the products obtained in Examples 1 and 2 and Comparative Examples 1 to 4 as samples, 7.0 g of the sample was applied for 10 minutes at a pressure of 10 Pa and a temperature of 220 ° C. using a single-acting compression molding machine for testing (manufactured by Yasuda Seiki Seisakusho). Pressing to obtain a self-supporting plate of 110 mm x 60 mm x 1 mm thickness is "○" (good formability), and the one for which a self-supporting plate could not be obtained due to breakage of the cured product is "x" (molding). (Poor sex).
(合成例1)化合物1:トリフェニルビニルベンジルホスホニウムクロライドの合成
ビニルベンジルクロライド(商品名:CMS-14、AGCセイミケミカル社製)1.5モル(228.9g)、トリフェニルホスフィン1.8モル(472.1g)、およびジメチルホルムアミド622.4gを2.0Lの反応器内に投入し、窒素条件下70℃で3時間反応させることで白色の固体が析出した。固体をアセトンで十分洗浄した後、92℃で減圧乾燥して化合物1を490g回収した。
(Synthesis Example 1) Compound 1: Synthesis of triphenylvinylbenzylphosphonium chloride Vinyl benzyl chloride (trade name: CMS-14, manufactured by AGC Seimi Chemical Co., Ltd.) 1.5 mol (228.9 g), triphenylphosphine 1.8 mol (472.1 g) and 622.4 g of dimethylformamide were placed in a 2.0 L reactor and reacted at 70 ° C. for 3 hours under nitrogen conditions to precipitate a white solid. The solid was thoroughly washed with acetone and then dried under reduced pressure at 92 ° C. to recover 490 g of compound 1.
(合成例2)共重合体Aの合成
スチレン552.12g、169.2gの化合物1、アゾビスイソブチロニトリル3.27g、およびジメチルホルムアミド1682.68gを、3.0Lの反応器内に投入し、窒素条件下70℃で9時間反応させた。この反応溶液を減圧濃縮した後、ジクロロメタンに溶解させ、大過剰のイソプロピルアルコール中に再沈殿した。次いで上澄みをデカンテーションし、残った固体を92℃で減圧乾燥することで共重合体Aを285.0g回収した。
(Synthesis Example 2) Synthesis of Copolymer A 552.12 g of styrene, 169.2 g of compound 1, 3.27 g of azobisisobutyronitrile, and 1682.68 g of dimethylformamide were put into a 3.0 L reactor. Then, the reaction was carried out at 70 ° C. for 9 hours under nitrogen conditions. The reaction solution was concentrated under reduced pressure, then dissolved in dichloromethane and reprecipitated in a large excess of isopropyl alcohol. Next, the supernatant was decanted, and the remaining solid was dried under reduced pressure at 92 ° C. to recover 285.0 g of the copolymer A.
(合成例3)共重合体Bの合成
スチレン110g、62.6gの化合物1、アゾビスイソブチロニトリル0.78g、およびジメチルホルムアミド258.9gを、1.0Lの反応器内に投入し、窒素条件下70℃で9時間反応させて、共重合体Bをジメチルホルムアミド溶液として得た。
(Synthesis Example 3) Synthesis of Copolymer B 110 g of styrene, 62.6 g of compound 1, 0.78 g of azobisisobutyronitrile, and 258.9 g of dimethylformamide were put into a 1.0 L reactor. The reaction was carried out at 70 ° C. for 9 hours under nitrogen conditions to obtain the copolymer B as a dimethylformamide solution.
(比較合成例1)共重合体Cの合成
スチレン1.37モル(142.7g)、0.051モル(21.2g)の化合物1、アゾビスイソブチロニトリル0.75g、およびジメチルホルムアミド245.9gを、1.0Lの反応器内に投入し、窒素条件下70℃で9時間反応させた。この反応溶液を減圧濃縮した後、ジクロロメタンに溶解させ、大過剰のイソプロピルアルコール中に再沈殿した。次いで上澄みをデカンテーションし、残った固体を92℃で減圧乾燥することで共重合体Cを102.4g回収した。
(Comparative Synthesis Example 1) Synthesis of Copolymer C 1.37 mol (142.7 g) of styrene, 0.051 mol (21.2 g) of compound 1, 0.75 g of azobisisobutyronitrile, and dimethylformamide 245. .9 g was placed in a 1.0 L reactor and reacted at 70 ° C. for 9 hours under nitrogen conditions. The reaction solution was concentrated under reduced pressure, then dissolved in dichloromethane and reprecipitated in a large excess of isopropyl alcohol. Next, the supernatant was decanted, and the remaining solid was dried under reduced pressure at 92 ° C. to recover 102.4 g of the copolymer C.
(比較合成例2)共重合体Dの合成
スチレン0.53モル(55.2g)、0.041モル(16.9g)の化合物1、アゾビスイソブチロニトリル3.24g、およびジメチルホルムアミド108.17gを、500mLの反応器内に投入し、窒素条件下70℃で5時間反応させて共重合体Dをジメチルホルムアミド溶液として得た。
(Comparative Synthesis Example 2) Synthesis of Copolymer D 0.53 mol (55.2 g) of styrene, 0.041 mol (16.9 g) of compound 1, 3.24 g of azobisisobutyronitrile, and 108 of dimethylformamide 108. .17 g was placed in a 500 mL reactor and reacted at 70 ° C. for 5 hours under nitrogen conditions to obtain copolymer D as a dimethylformamide solution.
(比較合成例3)共重合体Eの合成
スチレン0.48モル(50.2g)、0.12モル(50.0g)の化合物1、アゾビスイソブチロニトリル0.45g、およびジメチルホルムアミド186.09gを、500mLの反応器内に投入し、窒素条件下68℃で8時間半反応させて共重合体Eをジメチルホルムアミド溶液として得た。
(Comparative Synthesis Example 3) Synthesis of Copolymer E 0.48 mol (50.2 g) of styrene, 0.12 mol (50.0 g) of compound 1, 0.45 g of azobisisobutyronitrile, and dimethylformamide 186. .09 g was put into a 500 mL reactor and reacted at 68 ° C. for 8 and a half hours under nitrogen conditions to obtain copolymer E as a dimethylformamide solution.
(実施例1)
合成例2で得られた285.0gの共重合体A、37%ホルマリン169.83g、28%水酸化カリウム水溶液209.66g、およびテトラヒドロフラン665.0gを、3Lの反応器内に投入し、室温で4時間反応させた。反応溶液を大過剰のメタノールに再沈殿し、ろ過にて固体を取り出した後、ジクロロメタンに溶解させ、蒸留水で有機層を洗浄し、大過剰のメタノール/水=7/3に再沈殿した。次いでろ過にて固体を取り出した後、92℃で減圧乾燥することで生成物1を回収した。生成物1のMnは24700、Mwは39800、スチレン比率は92.1モル%、ジビニルベンゼン比率は7.9モル%であった。
(Example 1)
285.0 g of the copolymer A obtained in Synthesis Example 2, 37% formalin 169.83 g, 28% potassium hydroxide aqueous solution 209.66 g, and tetrahydrofuran 665.0 g were put into a 3 L reactor at room temperature. Was reacted for 4 hours. The reaction solution was reprecipitated in a large excess of methanol, the solid was removed by filtration, dissolved in dichloromethane, the organic layer was washed with distilled water, and reprecipitated to a large excess of methanol / water = 7/3. Then, after taking out the solid by filtration, the product 1 was recovered by drying under reduced pressure at 92 ° C. The Mn of the product 1 was 24700, the Mw was 39800, the styrene ratio was 92.1 mol%, and the divinylbenzene ratio was 7.9 mol%.
(実施例2)
合成例3で得られた共重合体Bのジメチルホルムアミド溶液20g、37%ホルマリン3.8g、28%水酸化カリウム水溶液9.4g、およびジメチルホルムアミド24gを、50mLの反応器内に投入し、室温で1時間反応させた。析出した固体をジクロロメタンに溶解させ、イソプロピルアルコールに再沈殿し、ろ過にて固体を取り出した。再度ジクロロメタンに溶解させ、蒸留水で有機層を洗浄しメタノール/水=7/3に再沈殿した。次いでろ過にて固体を取り出した後、92℃で減圧乾燥することで生成物2を回収した。生成物2のMnは26600、Mwは48900、スチレン比率は85.3モル%、ジビニルベンゼン比率は14.7モル%であった。
(Example 2)
20 g of the dimethylformamide solution of the copolymer B obtained in Synthesis Example 3, 3.8 g of 37% formalin, 9.4 g of the 28% potassium hydroxide aqueous solution, and 24 g of the dimethylformamide were placed in a 50 mL reactor at room temperature. Was reacted for 1 hour. The precipitated solid was dissolved in dichloromethane, reprecipitated in isopropyl alcohol, and the solid was removed by filtration. It was dissolved in dichloromethane again, the organic layer was washed with distilled water, and reprecipitated to methanol / water = 7/3. Then, after taking out the solid by filtration, the product 2 was recovered by drying under reduced pressure at 92 ° C. The Mn of the product 2 was 26600, the Mw was 48900, the styrene ratio was 85.3 mol%, and the divinylbenzene ratio was 14.7 mol%.
(比較例1)
比較合成例1で得られた6.00gの共重合体C、37%ホルマリン5.47g、28%水酸化カリウム水溶液6.00g、およびテトラヒドロフラン150gを、500mLの反応器内に投入し、室温で4時間反応させた。反応溶液をメタノールに再沈殿し、ろ過にて固体を取り出した後、92℃で減圧乾燥することで生成物3を回収した。生成物3のMnは24300、Mwは39200、スチレン比率は95.7モル%、ジビニルベンゼン比率は4.3モル%であった。
(Comparative Example 1)
6.00 g of the copolymer C obtained in Comparative Synthesis Example 1, 5.47 g of 37% formalin, 6.00 g of a 28% potassium hydroxide aqueous solution, and 150 g of tetrahydrofuran were placed in a 500 mL reactor at room temperature. The reaction was carried out for 4 hours. The reaction solution was reprecipitated in methanol, the solid was taken out by filtration, and then dried under reduced pressure at 92 ° C. to recover the product 3. The Mn of the product 3 was 24300, the Mw was 39200, the styrene ratio was 95.7 mol%, and the divinylbenzene ratio was 4.3 mol%.
(比較例2)
比較合成例2で得られた共重合体Dのジメチルホルムアミド溶液29.7g、37%ホルマリン6.1g、28%水酸化カリウム水溶液7.6g、およびテトラヒドロフラン70gを、300mLの反応器内に投入し、室温で2時間半反応させた。反応溶液をメタノールに再沈殿し、ろ過にて固体を取り出した後、ジクロロメタンに溶解させ、蒸留水で有機層を洗浄し、メタノール/水=7/3に再沈殿した。次いでろ過にて固体を取り出した後、92℃で減圧乾燥することで生成物4を回収した。生成物4のMnは3400、Mwは8400、スチレン比率は91.9モル%、ジビニルベンゼン比率は8.1モル%であった。
(Comparative Example 2)
29.7 g of the dimethylformamide solution of the copolymer D obtained in Comparative Synthesis Example 2, 6.1 g of 37% formalin, 7.6 g of the 28% potassium hydroxide aqueous solution, and 70 g of tetrahydrofuran were placed in a 300 mL reactor. , The reaction was carried out at room temperature for two and a half hours. The reaction solution was reprecipitated in methanol, the solid was taken out by filtration, dissolved in dichloromethane, the organic layer was washed with distilled water, and reprecipitated to methanol / water = 7/3. Then, the solid was taken out by filtration and then dried under reduced pressure at 92 ° C. to recover the product 4. The Mn of the product 4 was 3400, the Mw was 8400, the styrene ratio was 91.9 mol%, and the divinylbenzene ratio was 8.1 mol%.
(比較例3)
比較合成例3で得られた共重合体Eのジメチルホルムアミド溶液280.0g、37%ホルマリン48.5g、28%水酸化カリウム水溶液59.5g、およびテトラヒドロフラン93.8gを1Lの反応器内に投入し、室温で7時間反応させた。反応溶液にジクロロメタンを加えた後メタノールに再沈殿し、ろ過にて固体を取り出した後、ジクロロメタンに溶解させ、蒸留水で有機層を洗浄し、メタノール/水=7/3に再沈殿した。次いでろ過にて固体を取り出した後、92℃で減圧乾燥することで生成物5を回収した。生成物5のMnは24200、Mwは43300、スチレン比率は75.0モル%、ジビニルベンゼン比率は25.0モル%であった。
(Comparative Example 3)
280.0 g of the dimethylformamide solution of the copolymer E obtained in Comparative Synthesis Example 3, 48.5 g of 37% formalin, 59.5 g of the 28% potassium hydroxide aqueous solution, and 93.8 g of tetrahydrofuran were put into a 1 L reactor. Then, the reaction was carried out at room temperature for 7 hours. Dichloromethane was added to the reaction solution and then reprecipitated in methanol. The solid was taken out by filtration, dissolved in dichloromethane, the organic layer was washed with distilled water, and reprecipitated to methanol / water = 7/3. Then, the solid was taken out by filtration and then dried under reduced pressure at 92 ° C. to recover the product 5. The Mn of the product 5 was 24200, the Mw was 43300, the styrene ratio was 75.0 mol%, and the divinylbenzene ratio was 25.0 mol%.
(比較例4)ビニルベンジル化ポリフェニレンエーテル化合物の合成
温度調節器、撹拌装置、冷却コンデンサー、滴下ロートを備えた2L四つ口フラスコに反応型低分子量ポリフェニレンエーテル(商品名:Noryl SA-90、SABICジャパン合同会社製)を158g(0.1モル)、トルエン221g、イソプロピルアルコール94.8gを仕込み、均一溶液にし、続いて、テトラ-n-ブチルアンモニウムブロマイド0.96g、ビニルベンジルクロライド(メタ体/パラ体=50/50、商品名:CMSP、AGCセイミケミカル社製)33.6g(0.22モル)を加え、75℃まで昇温した。ここに、48%水酸化ナトリウム水溶液53.3g(0.64モル)を2時間ごとに1/4量ずつを30分かけて滴下し、75℃で計8時間反応を行なったところ、反応率は98%以上であった。その後、50℃まで冷却し、トルエン295g、イソプロパノール31.6g、水79gを加え、35質量%の塩酸水溶液66.7gで中和した。反応溶液が2層に分離するまで静置し、下層の水溶液層を除去した。さらに、イソプロパノール15.8g、水63.2gによる洗浄を5回行なった。この有機層を、70℃、50mmHgで水分を0.05%以下になるまで除去し、さらにこの溶液を濾過し、ビニルベンジル化ポリフェニレンエーテル化合物の50%トルエン溶液345g(ポリフェニレンエーテル基準で収率95%)を得た。この溶液を大過剰のメタノールに再沈殿し、ろ過にて取り出した固体を92℃で減圧乾燥した。得られたビニルベンジル化ポリフェニレンエーテル化合物の数平均分子量は2200、重量平均分子量は4000であった。
(Comparative Example 4) Synthesis of Vinyl Benzylated Polyphenylene Ether Compound Reactive low molecular weight polyphenylene ether (trade name: Noryl SA-90, SABIC) in a 2L four-necked flask equipped with a temperature controller, agitator, cooling condenser, and dropping funnel. 158 g (0.1 mol), 221 g of toluene and 94.8 g of isopropyl alcohol were added to make a uniform solution (manufactured by Japan GK), followed by tetra-n-butylammonium bromide 0.96 g and vinylbenzyl chloride (meth /). Para-form = 50/50, trade name: CMSP, manufactured by AGC Seimi Chemical Co., Ltd.) 33.6 g (0.22 mol) was added, and the temperature was raised to 75 ° C. Here, 53.3 g (0.64 mol) of a 48% sodium hydroxide aqueous solution was added dropwise every 2 hours in a quarter amount over 30 minutes, and the reaction was carried out at 75 ° C. for a total of 8 hours. The reaction rate was increased. Was 98% or more. Then, the mixture was cooled to 50 ° C., 295 g of toluene, 31.6 g of isopropanol and 79 g of water were added, and the mixture was neutralized with 66.7 g of a 35 mass% hydrochloric acid aqueous solution. The reaction solution was allowed to stand until it was separated into two layers, and the lower aqueous solution layer was removed. Further, washing with 15.8 g of isopropanol and 63.2 g of water was performed 5 times. The organic layer is removed at 70 ° C. and 50 mmHg until the water content is 0.05% or less, and the solution is further filtered to obtain 345 g of a 50% toluene solution of the vinylbenzylated polyphenylene ether compound (yield 95 based on the polyphenylene ether). %) Was obtained. This solution was reprecipitated in a large excess of methanol, and the solid taken out by filtration was dried under reduced pressure at 92 ° C. The obtained vinyl benzylated polyphenylene ether compound had a number average molecular weight of 2200 and a weight average molecular weight of 4000.
実施例1~2および比較例1~4で得られた生成物について、誘電率、誘電正接、熱硬化性および成形性を評価した。結果を下記表1および表2に示す。 The products obtained in Examples 1 and 2 and Comparative Examples 1 to 4 were evaluated for dielectric constant, dielectric loss tangent, thermosetting property and moldability. The results are shown in Tables 1 and 2 below.
表1に示すように、比較例1では、ジビニルベンゼン比率が低く、熱硬化性が不十分であり、誘電率・誘電正接評価用の試験片を作製できなかった。そのため、誘電率および誘電正接は測定しておらず、成形性についても評価していない。 As shown in Table 1, in Comparative Example 1, the divinylbenzene ratio was low, the thermosetting property was insufficient, and a test piece for evaluating the dielectric constant and the dielectric loss tangent could not be prepared. Therefore, the permittivity and the dielectric loss tangent are not measured, and the formability is not evaluated.
比較例2では、数平均分子量Mnおよび重量平均分子量Mwが小さく、そのため、誘電正接が大きく劣っていた。また誘電正接の結果が不良であったため、成形性の評価は実施しなかった。 In Comparative Example 2, the number average molecular weight Mn and the weight average molecular weight Mw were small, and therefore the dielectric loss tangent was significantly inferior. Moreover, since the result of dielectric loss tangent was poor, the moldability was not evaluated.
比較例3では、ジビニルベンゼン比率が高く、そのため未反応のビニル基の残存により誘電正接に劣っていた。また、誘電率・誘電正接評価用の試験片については成形可能であったが、試験片の寸法が大きな成形性評価では試験片に割れが発生し、成形性に劣っていた。官能基数が多いことで硬化収縮が発生して成形性が低下したと考えられる。 In Comparative Example 3, the divinylbenzene ratio was high, and therefore the dielectric loss tangent was inferior due to the residual unreacted vinyl group. Further, although the test piece for evaluating the dielectric constant and the dielectric loss tangent could be molded, the test piece was cracked in the formability evaluation in which the size of the test piece was large, and the formability was inferior. It is considered that the large number of functional groups causes curing shrinkage and deteriorates moldability.
一方、PPE系の熱硬化性樹脂である比較例4では、誘電正接が高く、誘電特性に劣っていた。 On the other hand, in Comparative Example 4, which is a PPE-based thermosetting resin, the dielectric loss tangent was high and the dielectric properties were inferior.
これに対し、数平均分子量Mnと重量平均分子量Mwが規定範囲内であり、かつジビニルベンゼン比率が規定範囲内である実施例1,2では、熱可塑性樹脂や架橋剤を併用せずとも自立する程の十分なシートを成形することができ、成形性に優れるとともに、比較例4のPPE系熱硬化性樹脂に比べて誘電正接が低く、誘電特性に優れていた。 On the other hand, in Examples 1 and 2 in which the number average molecular weight Mn and the weight average molecular weight Mw are within the specified range and the divinylbenzene ratio is within the specified range, they are self-supporting without using a thermoplastic resin or a cross-linking agent. It was possible to form a sufficiently sufficient sheet, and the formability was excellent. At the same time, the dielectric loss tangent was lower than that of the PPE-based thermosetting resin of Comparative Example 4, and the dielectric properties were excellent.
以上、本発明のいくつかの実施形態を説明したが、これら実施形態は、例として提示したものであり、発明の範囲を限定することは意図していない。これら実施形態は、その他の様々な形態で実施されることが可能であり、発明の要旨を逸脱しない範囲で、種々の省略、置き換え、変更を行うことができる。これら実施形態やその省略、置き換え、変更などは、発明の範囲や要旨に含まれると同様に、特許請求の範囲に記載された発明とその均等の範囲に含まれるものである。 Although some embodiments of the present invention have been described above, these embodiments are presented as examples and are not intended to limit the scope of the invention. These embodiments can be implemented in various other embodiments, and various omissions, replacements, and changes can be made without departing from the gist of the invention. These embodiments, omissions, replacements, changes, etc. thereof are included in the scope and gist of the invention, as well as in the scope of the invention described in the claims and the equivalent scope thereof.
Claims (6)
The thermosetting composition according to claim 5, which is a printed circuit board material.
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