JP2022021476A - Polyolefin system resin film, adhesive film, adhesive film for semiconductor manufacturing process - Google Patents

Abstract

To provide a film that is excellent in antistatic property, and also in production of a film for a long time, and can maintain excellent appearance.SOLUTION: A polyolefin system resin film characterized by containing a resin having a polyolefin system resin as a main component, a polymer type antistatic agent (A) having a melt flow rate measured at a temperature of 190°C and load of 2.16 kg of 10 g/10 minutes or smaller and a polymer type antistatic agent (B) having 10 g/10 minutes or larger, in which a total content of the polymer type antistatic agent (A) and the polymer type antistatic agent (B) is 25 to 40 mass% relative to a total of contents the resin, the polymer type antistatic agent (A) and the polymer type antistatic agent (B), and having a layer formed of a resin composition containing 40 to 95 mass% of the polymer type antistatic agent (A) and 5 to 60 mass% of the polymer type antistatic agent (B) on at least one of front and back surfaces.SELECTED DRAWING: None

Description

The present invention relates to an adhesive film (tape) used in a semiconductor manufacturing process, an adhesive film (tape) such as a sticker, a label, a marking film, etc., which is attached to give a design to a signboard, an automobile, etc., a decorative sheet, etc. The present invention relates to a polyolefin-based resin film preferably used as a base material of the above, and an adhesive film in which an adhesive layer is laminated on the film.

Conventionally, adhesive films (tapes) such as stickers, labels and marking films, which are conventionally attached to adhesive films (tapes), signs, automobiles, etc., and decorative sheets, etc., have colorability and processability. A film made of a polyvinyl chloride resin (hereinafter, also referred to as "PVC-based film") having excellent scratch resistance, weather resistance, etc. is often used as a base material.

The PVC-based film has rigidity by itself, but a plasticizer is added for the purpose of imparting flexibility so that it can function as an adhesive film. However, depending on the plasticizer used, there are problems that the compatibility with the pressure-sensitive adhesive is poor, the stability is poor when the pressure-sensitive adhesive film is used, and the bleed-out of the plasticizer becomes remarkable. There is also a tendency for regulations to be tightened on the use of plasticizers themselves.
Therefore, a polyolefin-based resin film has been widely used as a material in place of the PVC-based film.

Also, in the process of manufacturing semiconductors, adhesive films for processing semiconductor wafers are used when cutting semiconductor wafers, packages, etc., and due to the above problems, the number of cases where polyolefin resin films are used is increasing. ing.
As a film for such a semiconductor manufacturing process, a film using a PVC-based or polyolefin-based resin has been developed (for example, Patent Document 1).

In recent years, semiconductor devices have become smaller and thinner, and the problem of device destruction due to static electricity, which has not been a problem until now, has become apparent. In particular, ethylene-vinyl alcohol-based sheets and ethylene-methacrylic acid acrylate-based sheets have a problem of adhesion of chips (whisker-like cut residue extending from the cut line of the base sheet) to the device. Therefore, in the adhesive tape for processing semiconductor wafers, there is an increasing demand for a polyolefin-based sheet having excellent antistatic performance and less generation of chips.

For example, Patent Document 2 discloses a polyolefin-based sheet and an adhesive tape for processing a polyolefin-based semiconductor wafer using a polyolefin-based sheet and a base sheet thereof, which have excellent antistatic properties and generate less chips during dicing.
Further, Patent Document 3 discloses a base film for a semiconductor manufacturing process, which imparts antistatic performance and is excellent in flexibility and heat resistance.

Japanese Unexamined Patent Publication No. 09-008111 Japanese Unexamined Patent Publication No. 2012-69999 Japanese Unexamined Patent Publication No. 2020-84143

However, as in the inventions described in Patent Documents 2 and 3, when the resin composition contains a large amount of a polymer-type antistatic agent, the polymer-type film is produced when the film is produced for a long time. There is a problem that the layer containing the antistatic agent has a streak-like appearance defect with time.
In view of these problems, it is an object of the present invention to provide a film having excellent antistatic properties, maintaining an excellent appearance even in the production of a film for a long time, and suppressing appearance defects. Another object of the present invention is to provide an adhesive film for a semiconductor manufacturing process, which has excellent antistatic properties and film appearance.

The present inventor has diligently studied a formulation in which a large amount of antistatic agent is contained in a film and the film has excellent antistatic performance and excellent appearance characteristics even when the film is produced for a long time. , The present invention has been completed.

That is, the gist of the present invention is as follows.
[1]
A resin composition containing a resin containing a polyolefin resin as a main component, a polymer-type antistatic agent (A) and a polymer-type antistatic agent (B), and the resin, the polymer-type antistatic agent (A). And when the total content of the polymer type antistatic agent (B) is 100% by mass, the total content of the polymer type antistatic agent (A) and the polymer type antistatic agent (B) is 25. When the content is ~ 40% by mass and the total content of the polymer type antistatic agent (A) and the polymer type antistatic agent (B) is 100% by mass, the polymer type antistatic agent (A). ) Is contained in an amount of 40 to 95% by mass and a polymer-type antioxidant (B) is contained in an amount of 5 to 60% by mass. Resin film.
Polymer type antistatic agent (A):
Melt flow rate (MFR) measured according to JIS K7210 (190 ° C, 2.16 kg load) is 10 g / 10 minutes or less Polymeric antistatic agent (B):
Melt flow rate measured according to JIS K7210 (190 ° C, 2.16 kg load) is 10 g / 10 minutes or more [2]
The polyolefin-based resin film according to [1], wherein the polymer-type antistatic agent (A) and the polymer-type antistatic agent (B) are polyether-polyolefin block copolymers.
[3]
The polyolefin-based resin film according to [1] or [2], wherein the surface resistance value of the layer made of the resin composition is 1.0 × 10 ¹⁰ Ω / □ or less.
[4]
The polyolefin-based resin film according to any one of [1] to [3], wherein the film is provided with a layer made of the resin composition on the front and back surfaces of the film.
[5]
The polyolefin-based resin according to any one of [1] to [4], wherein the thickness of the layer made of the resin composition is in the range of 5 to 50% with respect to the total thickness of the film. the film.
[6]
An adhesive film obtained by laminating an adhesive layer on at least one surface of the polyolefin-based resin film according to any one of [1] to [5].
[7]
The pressure-sensitive adhesive film for a semiconductor manufacturing process according to claim 7, which is used in the semiconductor manufacturing process.

By using the polyolefin-based resin film of the present invention, it is possible to provide a film having excellent antistatic properties and maintaining an excellent appearance even in the production of a film for a long time. Further, according to the present invention, it becomes possible to provide an adhesive film for a semiconductor manufacturing process having excellent antistatic properties and film appearance.

The present invention will be described in detail below, but the present invention is not limited to the following embodiments, and can be variously modified and carried out within the scope of the gist thereof. In addition, when the expression "-" is used in this specification, it shall be used as an expression including numerical values or physical property values before and after the expression.

One embodiment of the present invention is a resin composition containing a resin containing a polyolefin resin as a main component, a polymer-type antistatic agent (A) and a polymer-type antistatic agent (B), and the resin. When the total content of the polymer type antistatic agent (A) and the polymer type antistatic agent (B) is 100% by mass, the polymer type antistatic agent (A) and the polymer type antistatic agent (A) When the total content of B) is 25 to 40% by mass, and the total content of the polymer-type antistatic agent (A) and the polymer-type antistatic agent (B) is 100% by mass. A layer made of a resin composition containing 40 to 95% by mass of the polymer type antistatic agent (A) and 5 to 60% by mass of the polymer type antistatic agent (B) on the side of at least one of the front and back surfaces. It is a polyolefin-based resin film characterized by having a polymer (hereinafter, also referred to as “the film of the present invention”).
Polymer type antistatic agent (A):
Melt flow rate (MFR) measured according to JIS K7210 (190 ° C, 2.16 kg load) is 10 g / 10 minutes or less Polymeric antistatic agent (B):
Melt flow rate (MFR) measured according to JIS K7210 (190 ° C, 2.16 kg load) is 10 g / 10 minutes or more.

1. 1. Resin composition A
The resin composition used for the film of the present invention contains a resin containing a polyolefin-based resin as a main component, a polymer-type antistatic agent (A) and a polymer-type antistatic agent (B), and the resin and the polymer. When the total content of the type antistatic agent (A) and the polymer type antistatic agent (B) is 100% by mass, the polymer type antistatic agent (A) and the polymer type antistatic agent (B) Is high when the total content of the above is 25 to 40% by mass and the total content of the polymer type antistatic agent (A) and the polymer type antistatic agent (B) is 100% by mass. The molecular antistatic agent (A) is 40 to 95% by mass, and the polymer antistatic agent (B) is 5 to 60% by mass. Hereinafter, the resin composition used for the film of the present invention is also referred to as "resin composition A".

<Various resins>
The resin composition A contains a resin containing a polyolefin-based resin as a main component as an essential component.
As the polyolefin-based resin, one or more resins selected from polypropylene-based resins, polyethylene-based resins, and olefin-based elastomers are preferably used from the viewpoints of availability, flexibility, handleability, economy, and the like. ..

Examples of the polypropylene-based resin include a homopolymer of propylene (homopolypropylene), a copolymer of propylene containing propylene as a main component and another monomer copolymerizable with the copolymer, and a mixture thereof.
Examples of the copolymer of propylene containing propylene as a main component and a copolymerizable other monomer include a random copolymer (random polypropylene) of propylene and ethylene or another α-olefin, or a block copolymer. (Block polypropylene), a block copolymer containing a rubber component, a graft copolymer and the like can be mentioned.
The α-olefin used as another monomer copolymerizable with propylene is preferably one having 4 to 12 carbon atoms, and is, for example, 1-butene, 1-pentene, 1-hexene, 1-hexene. , 1-octene, 4-methyl-1-pentene, 1-decene and the like, and one or a mixture of two or more thereof is used.

Examples of the polyethylene-based resin include homopolymers of ethylene, copolymers of ethylene containing ethylene as a main component and other monomers copolymerizable (low-density polyethylene (LDPE), high-pressure low-density polyethylene, and the like. Linear low-density polyethylene (LLDPE), high-density polyethylene (HDPE), ethylene-based copolymer (metallocene-based polyethylene) obtained by polymerization using a metallocene-based catalyst, ethylene-vinyl acetate copolymer, ethylene- (meth). ) Methyl acrylate copolymer, ethylene- (meth) ethyl acrylate copolymer, ethylene- (meth) butyl acrylate copolymer, ethylene- (meth) acrylate copolymer, ethylene- (meth) acrylic acid Examples thereof include a metal ion cross-linking resin (ionomer) of a copolymer.
Among them, high-density polyethylene (HDPE), low-density polyethylene (LDPE), and linear low-density polyethylene (LLDPE) are easy to obtain, handle the resin, and adjust the flexibility of the obtained film. ) Is preferably used.

The olefin-based elastomer is a soft resin containing a polyolefin-based resin and a rubber component, and the rubber component may be dispersed in the polyolefin-based resin or may be copolymerized with each other.
Specific examples of the olefin-based elastomer include, for example, ethylene-propylene copolymer elastomer, ethylene-1-butene copolymer elastomer, ethylene-propylene-1-butene copolymer elastomer, and ethylene-1-hexene copolymer elastomer. , Ethylene-1-octene copolymer elastomer, ethylene-styrene copolymer elastomer, ethylene-norbornen copolymer elastomer, propylene-1-butene copolymer elastomer, ethylene-propylene-non-conjugated diene copolymer elastomer, ethylene Atypical elastic copolymers mainly composed of olefins such as -1-butene-non-conjugated diene copolymer elastomer and ethylene-propylene-1-butene-non-conjugated diene copolymer elastomer, derivatives thereof and acid modification. Derivatives and the like can be mentioned.

The melt flow rate of the above-mentioned polypropylene-based resin, polyethylene-based resin, olefin-based elastomer, etc. is appropriately selected depending on the molding method and application to which it is applied, but is measured under a temperature condition of 190 ° C. or 230 ° C. under a load of 2.16 kg. The value obtained is preferably 0.1 to 50 g / 10 minutes. When it is 0.1 g / 10 minutes or more, the formability of the film is good, and when it is 50 g / 10 minutes or less, the thickness accuracy of the film can be kept good. It is more preferably 0.5 to 40 g / 10 minutes, still more preferably 1.0 to 30 g / 10 minutes.
Further, from the viewpoint of reducing streak-like appearance defects, it is preferable that the melt flow rate is 10 g / 10 minutes or less as measured under a load of 2.16 kg under a temperature condition of 190 ° C. or 230 ° C. It is presumed that if it is 10 g / 10 minutes or less, it is possible to improve the dispersibility when the antistatic agent described later is added to the above resin and reduce the occurrence of streak-like defects due to the difference in fluidity. ..

Regarding the strength of polypropylene-based resins, polyethylene-based resins, olefin-based elastomers, etc., it is preferable that the tensile elastic modulus of the film obtained by these resins alone is in the range of 50 to 2000 MPa. When the tensile elastic modulus is in the range of 50 to 2000 MPa, it is possible to impart appropriate flexibility to the film of the present invention. It is more preferably in the range of 80 to 1900 MPa, and even more preferably in the range of 100 to 1800 MPa.

It is also possible to use a styrene-based elastomer as a resin other than the polyolefin-based resin such as the above-mentioned polyethylene-based resin, polypropylene-based resin, and olefin-based elastomer.
The styrene-based elastomer is preferably a block copolymer represented by the following formula (I) or (II).
X- (YX) n ... (I)
(XY) n ... (II)
X in the general formulas (I) and (II) is an aromatic vinyl polymer block typified by styrene, and in the formula (I), the degree of polymerization may be the same or different at both ends of the molecular chain. May be good. In addition, Y is a butadiene polymer block, an isoprene polymer block, a butadiene / isoprene copolymer block, a hydrogenated butadiene polymer block, a hydrogenated isoprene polymer block, and a hydrogenated butadiene / isoprene co-weight. At least one selected from coalesced blocks, partially hydrogenated butadiene polymer blocks, partially hydrogenated isoprene polymer blocks and partially hydrogenated butadiene / isoprene copolymer blocks. Further, n is an integer of 1 or more.

The polypropylene-based resin, polyethylene-based resin, olefin-based elastomer, and styrene-based elastomer used in the present invention may each use a single resin, or two or more of them may be mixed and used. From the viewpoint of imparting flexibility to the obtained film, it is more preferable to use an olefin-based elastomer and / or a styrene-based elastomer in combination.

As a resin other than the above-mentioned polypropylene-based resin, polyethylene-based resin, olefin-based elastomer, and styrene-based elastomer, a cyclic olefin-based resin, polymethylpentene-based resin, or the like can be added.

Examples of the cyclic olefin-based resin include norbornene-based polymers, vinyl alicyclic hydrocarbon polymers, and cyclic conjugated diene polymers. Among these, norbornene-based polymers are preferable. Examples of the norbornene-based polymer include a ring-opening polymer of a norbornene-based monomer, a norbornene-based copolymer obtained by copolymerizing a norbornene-based monomer and an α-olefin such as ethylene. Moreover, these hydrogenated additives can also be used.

<Polymer antistatic agent>
The resin composition A contains the following polymer-type antistatic agent (A) and polymer-type antistatic agent (B) as essential components.
Polymer type antistatic agent (A):
Melt flow rate (MFR) measured according to JIS K7210 (190 ° C, 2.16 kg load) is 10 g / 10 minutes or less Polymeric antistatic agent (B):
Melt flow rate (MFR) measured according to JIS K7210 (190 ° C, 2.16 kg load) is 10 g / 10 minutes or more.

Further, when the total content of the resin containing a polyolefin resin as a main component, the polymer type antistatic agent (A) and the polymer type antistatic agent (B) is 100% by mass, the polymer type antistatic agent is prevented. The total content of the agent (A) and the polymer-type antistatic agent (B) is 25 to 40% by mass, and the polymer-type antistatic agent (A) and the polymer-type antistatic agent (B) When the total content is 100% by mass, it is necessary to contain 40 to 95% by mass of the polymer-type antistatic agent (A) and 5 to 60% by mass of the polymer-type antistatic agent (B). be.

Further, the content of only the polymer-type antistatic agent (A) is 25 to 40% by mass (the total content of the resin containing a polyolefin resin as a main component and the polymer-type antistatic agent (A) is 100% by mass. When used in (1), the melt flow rate measured with a load of 2.16 kg under the temperature condition of 190 ° C. of the polymer-type antistatic agent (A) is 10 g / 10 minutes or less, so that the MFR is Dispersibility in the above-mentioned various resins due to the low value becomes insufficient, and streak-like defects due to poor dispersion of the antistatic agent may occur during long-term production.
The content of only the polymer-type antistatic agent (B) is 25 to 40% by mass (the total content of the resin containing a polyolefin resin as a main component and the polymer-type antistatic agent (B) is 100% by mass. ), The melt flow rate measured at a load of 2.16 kg under the temperature condition of 190 ° C. of the polymer-type antistatic agent (B) is 10 g / 10 minutes or more, and it is charged due to its high MFR. The flowability of the inhibitor itself is good, and unevenness in the flow direction of the polymer-type antistatic agent (B) is likely to occur during long-term production, and streak-like defects may occur.
In order to solve the streak-like appearance defects caused by the dispersibility and fluidity of the polymer-type antistatic agent as described above, the polymer-type antistatic agent (A) and the polymer-type antistatic agent (B) are used. Both need to be used together.

If the total content of the polymer-type antistatic agent (A) and the polymer-type antistatic agent (B) is 25% by mass or more, it is possible to impart sufficient antistatic performance to the film, and 40 mass. When it is less than%, it is possible to maintain the antistatic performance and the beautiful appearance of the film. It is more preferably in the range of 27 to 40% by mass, still more preferably in the range of 29 to 40% by mass.

Further, when the total content of the polymer-type antistatic agent (A) and the polymer-type antistatic agent (B) is 100% by mass, the respective contents are the polymer antistatic agent (A). Is preferably 40 to 95% by mass, and the polymer type antistatic agent (B) is preferably 5 to 60% by mass. By setting the polymer type antistatic agent (A) to 40 to 95% by mass and the polymer type antistatic agent (B) to 5 to 60% by mass, the polymer type antistatic agent (A) can be uniformly applied to various resins. It is possible to suppress flow unevenness due to the fluidity of the polymer-type antistatic agent (B) while dispersing the polymer-type antistatic agent (B). More preferably, the polymer antistatic agent (A) is 50 to 88% by mass, the polymer type antistatic agent (B) is 12 to 50% by mass, and more preferably the polymer antistatic agent (A) is 55 to 86. The mass% is 14 to 45% by mass of the polymer type antistatic agent (B).

As the polymer type antistatic agent, known ones can be used, and for example, a block copolymer of a hydrophobic block and a hydrophilic block can be used. In the polymer-type antistatic agent, a hydrophobic block and a hydrophilic block form a block copolymer by an ester bond, an ether bond, an amide bond, an imide bond, a urethane bond, a urea bond, or the like.

Examples of the hydrophobic block include a polyolefin block, and examples of the polyolefin block include a block made of polyethylene, polypropylene, and an ethylene-propylene copolymer. Here, the polyolefin block may be fluorinated. Further, the hydrophobic block may be hydrophobic as long as it is hydrophobic, for example, a hydrophobic amine having a hydrophobic group such as an alkylene group or an aromatic group, a hydrophobic ester, a hydrophobic amide, a hydrophobic imide, and a hydrophobic block. It may be a hydrophobic ester amide or the like. Further, the hydrophobic block may have a hydrophobic side chain such as an alkyl group.

Hydrophobic blocks such as polyolefin blocks have polar groups such as carbonyl groups, hydroxyl groups, and amino groups at both ends thereof. The polar groups possessed at both ends of the hydrophobic block are polymerized to carbonyl groups, hydroxyl groups, amino groups, etc. existing at both ends of the hydrophilic block, or crosslinked with diisocyanate, diglycidyl ether, or the like. Thereby, a block copolymer of a hydrophobic block and a hydrophilic block can be obtained.

Examples of the hydrophilic block include a polyether block, a polyether-containing hydrophilic polymer block, a cationic polymer block and an anionic polymer block. The polyether block is typically a polyether diol, and examples thereof include polyethylene glycol, polypropylene glycol, and a copolymer of ethylene glycol and propylene glycol. The polyether-containing hydrophilic polymer block has a polyether segment, and examples thereof include polyether diamine, polyether ester amide, polyether amide imide, polyether ester, polyether amide, and ether urethane. Further, the polyether block and the segment of the polyether may be linear or branched. Further, the cationic polymer block has a quaternary ammonium salt structure or a phosphonium salt structure having a superacid anion such as BF _4- , PF _6- ^, BF ₃ ^Cl- , ^and PF ₅ ^Cl- as counterions. , Cationic polymer blocks separated by nonionic molecular chains. In addition, examples of the anionic polymer block include a polymer block in which an aromatic dicarboxylic acid or an aliphatic dicarboxylic acid having a sulfonyl group in which only a sulfonyl group is a salt and a diol or a polyether are copolymerized with each other.

Among the polymer type antistatic agents having the above structure, for example, a polyether-polyolefin block copolymer, a polyether ester amide which is a block copolymer of a polyether and a hydrophobic ester amide, and a polyether are used. More preferably, a polyether amide which is a block copolymer with a hydrophobic amide, a polyether amide imide which is a block copolymer of a polyether and a hydrophobic amide imide, or a polyethylene glycol (meth) acrylate copolymer is preferable. Can be used. Further, for example, when a polyolefin-based resin is used as the thermoplastic resin, the polymer-type antistatic agent is exemplified as a polyether-polyolefin block copolymer from the viewpoint of compatibility with the polyolefin-based resin, Japanese Patent Application Laid-Open No. 2008. -It is preferable to use a block copolymer having a structure in which each block of the polyolefin part and the hydrophilic polymer part described in Japanese Patent Application Laid-Open No. 274031 is repeatedly and alternately bonded.

In addition, the polymer type antistatic agent is an alkali metal or alkaline earth metal salt, a quaternary ammonium salt, a surfactant and an ionic property in order to further improve the antistatic property within the range not impairing the effect of the present invention. A liquid or the like may be blended.

Examples of commercially available products of the polyether ester amide include TPAE manufactured by Fuji Kasei Kogyo Co., Ltd. Examples of commercially available products of the polyether-polyolefin block copolymer include Perestat 300, Perestat 230, Perectron PVL, and Perectron PVH manufactured by Sanyo Chemical Industries, Ltd.

<Other ingredients>
In addition to the above-mentioned polyolefin resin and polymer-type antistatic agent, various additives can be added to the resin composition A in order to impart heat resistance, weather resistance, and the like.
Specific examples include, for example, antistatic agents, antioxidants, neutralizing agents, lubricants, antiblocking agents, plasticizers, heat stabilizers, light stabilizers, dye pigments, and crystals other than the above-mentioned polymer-type antistatic agents. A nucleating agent, an ultraviolet absorber, a filler, an inorganic filler that imparts rigidity, an elastomer other than those described above for imparting flexibility, and the like may be used as long as the effects of the present invention are not impaired.

As the ultraviolet absorber, known ones can be used, and examples thereof include a benzotriazole-based ultraviolet absorber, a benzophenone-based ultraviolet absorber, and a triazine-based ultraviolet absorber.
As the light stabilizer, known ones can be used, and examples thereof include hindered amine-based light stabilizers.
As a lubricant or anti-blocking agent, it has excellent compatibility with the above-mentioned polyolefin resin, and it enables defects due to bleed-out to the surface of the obtained film and long-term scratch resistance and slipperiness. It is preferable to use a silicone-olefin copolymer.

2. 2. Polyolefin-based resin film The film of the present invention is a polyolefin-based resin film having a layer made of a resin composition A containing the above-mentioned various resins and a polymer-type antistatic agent on either the front or back side.
By having a layer having the above-mentioned various resins and a polymer-type antistatic agent on either the front or the back surface, it is possible to impart good antistatic performance to the obtained polyolefin resin film.

Whether to provide the layer made of the resin composition A only on one of the front and back sides or to provide the layer made of the resin composition A on both sides of the front and back can be appropriately determined according to the intended use. From the viewpoint of imparting antistatic performance to the obtained film and suppressing adhesion of foreign substances such as dust and other suspended matter to the film, it is preferable to provide a layer made of the resin composition on both the front and back surfaces.

The film of the present invention has a layer made of the resin composition A on at least one of the front and back sides, and the basic structure thereof is as follows.
(1) A two-layer film comprising a layer made of a resin composition A and a layer made of a resin composition containing a polyolefin-based resin as a main component (hereinafter, also referred to as "resin composition B").
(2) A three-layer film comprising a layer (surface layer) made of the resin composition A, a layer (intermediate layer) made of the resin composition B, and a layer (back layer) made of the resin composition A.
(3) A three-layer film comprising a layer (surface layer) made of the resin composition A, a layer (intermediate layer) made of the resin composition B, and a layer (back layer) made of the resin composition B.
Here, in the configuration of the three-layer film of (2), the resin composition A constituting the surface layer and the back layer may have the same composition or different compositions.
Further, in the configuration of the three-layer film of (3), the resin composition B constituting the intermediate layer and the back layer may have the same composition or different compositions.
Further, in the configurations (2) and (3), the intermediate layer may be composed of two or more multilayer layers. In that case, the configurations of (2) and (3) also include a film configuration consisting of three or more layers.

The above resin composition B is a resin composition containing a polyolefin-based resin as a main component, and the details thereof are the same as those described in detail for the resin composition A.
That is, also in the resin composition B, one or more resins selected from polypropylene-based resins, polyethylene-based resins, and olefin-based elastomers are preferably used as the polyolefin-based resins. Further, the resin composition B may contain a styrene-based elastomer as a resin other than the polyolefin-based resin such as a polyethylene-based resin, a polypropylene-based resin, and an olefin-based elastomer.
Further, as a resin other than polypropylene-based resin, polyethylene-based resin, olefin-based elastomer, and styrene-based elastomer, cyclic olefin-based resin, polymethylpentene-based resin, and the like can be added to the resin composition B.
Further, in addition to the polyolefin-based resin and the like, various additives can be added to the resin composition B in order to impart heat resistance, weather resistance and the like.
The resin composition B may or may not contain the polymer-type antistatic agent, but it is preferable that the resin composition B does not contain the polymer-type antistatic agent from the viewpoint of cost.

One aspect of the film of the present invention is a polyolefin-based resin film having two or more layers, in which at least one layer is made of the resin composition A and the layer made of the resin composition A is the polyolefin-based resin film. It is a polyolefin-based resin film having on at least one of the front and back sides of the above.
Here, it is preferable that the layers other than at least one layer are made of the resin composition B.

Further, the surface resistance value of the surface provided with the layer made of the resin composition A is preferably 1.0 × 10 ¹⁰ Ω / □ or less. If the surface resistance value is 1.0 × 10 ¹⁰ Ω / □ or less, it has excellent antistatic performance, and dust and other suspended matter, etc., even during film production and the subsequent process of laminating the printing layer and adhesive layer. This is preferable because foreign matter is less likely to adhere. It is more preferably 9.0 × 10 ⁹ Ω / □ or less, and further preferably 8.0 × 10 ⁹ Ω / □ or less.
The measurement of the surface resistance value performed in the present invention is carried out in accordance with JIS K6911 under the conditions of a temperature of 23 ° C. and a relative humidity of 50% using a double ring method electrode.

The thickness of the film of the present invention is preferably 30 to 250 μm. If it is 30 μm or more, the film-forming property and the handleability of the obtained film are good when the film is produced, and if it is 250 μm or less, the film handleability and the process passage in the process of laminating the print layer and the adhesive layer on the film are good. It is possible to maintain good sex. The thickness of the film of the present invention is more preferably 40 to 230 μm, still more preferably 50 to 210 μm.

Further, the tensile elastic modulus of the film of the present invention is preferably in the range of 50 to 1500 MPa. If it is 50 MPa or more, sufficient rigidity is imparted to the film, so that it is possible to maintain good handleability. If it is 1500 MPa or less, the film is processed in the step of laminating a printing layer or an adhesive layer on the film. It is possible to maintain good sex. It is more preferably in the range of 70 to 1400 MPa, still more preferably in the range of 90 to 1300 MPa.

As a method for forming the film of the present invention, a known method can be used, but it is preferable to use a melt extrusion molding method. Among the melt extrusion molding methods, the T-die molding method in which a resin in a molten state is extruded from an extruder having a T-die and cooled and solidified to obtain a film is more preferable.

In order to obtain a film, it is preferable to use a coextrusion T-die molding method using a plurality of extruders. By using a coextrusion T-die molding method using a plurality of extruders, it is possible to obtain a multi-layer film, and the layer made of the resin composition of the present invention can be formed on only one of the front and back surfaces. It is also possible to use both sides.
Further, by extruding the same resin from all extruders, it is possible to obtain a substantially single-layer film in which all layers are made of the same resin composition.
As a coextrusion T-die molding method, a method of forming a plurality of resin layers into a film by using a multi-manifold die and then contacting the resin layers in the T-die to obtain a film, and a molten state called a feed block. A method of obtaining a multi-layer film after merging and adhering a plurality of resins using a device for merging the resins of the above can be mentioned.

If necessary, the film may be surface-treated on one or both sides by a method such as plasma treatment, corona treatment, ozone treatment, and flame treatment. Depending on the application of the obtained film, it is possible to select whether to perform surface treatment on one side or both sides.

Further, it is preferable that the thickness of the layer made of the resin composition A is within the range of 5 to 50% of the thickness of the entire film. When it is 5% or more, the antistatic performance of the layer containing the polymer-type antistatic agent can be sufficiently exhibited, and when it is 50% or less, the film-forming property when producing a film is improved. It can be kept good and is preferable from the viewpoint of economy. It is more preferably in the range of 5 to 45%, still more preferably 5 to 40% of the total thickness of the film.

3. 3. Adhesive film The film of the present invention can be made into an adhesive film by laminating an adhesive layer on at least one surface (hereinafter, also referred to as "adhesive film of the present invention").

The pressure-sensitive adhesive used as the pressure-sensitive adhesive layer is not particularly limited, and for example, various pressure-sensitive adhesives such as natural rubber-based resin, acrylic-based resin, styrene-based resin, silicon-based resin, and polyvinyl ether-based resin are used. Further, a functional layer such as an adhesive layer or a thermosetting resin layer may be further provided on the pressure-sensitive adhesive layer.

In the pressure-sensitive adhesive film of the present invention, one or both sides of the film before laminating the pressure-sensitive adhesive layer may be subjected to the above-mentioned surface treatment. Further, a primer layer may be provided between the base film and the adhesive layer, if necessary.
The thickness of the adhesive layer and the primer layer can be appropriately determined as needed.

The film of the present invention is a film having excellent antistatic properties, maintaining an excellent appearance even in the production of a film for a long time, and suppressing appearance defects.
Further, it is also possible to obtain an adhesive film by laminating an adhesive layer on the film of the present invention, and the adhesive film can be suitably used for semiconductor manufacturing process applications.

Hereinafter, examples and comparative examples of the present invention will be shown and specifically described, but the present invention is not limited to these examples. The materials used in the following examples and comparative examples, the method for measuring the evaluated characteristics, and the like are as follows.

[Material used]
<Polyolefin resin>
Homopolypropylene:
"MA3U" manufactured by Japan Polypropylene Corporation (homopolypropylene, melt flow rate at 230 ° C., 2.16 kg: 15.0 g / 10 minutes, melting point: 168 ° C., tensile modulus of elasticity of a single film: 900 MPa)
Random polypropylene:
"PC630A" manufactured by SunAllomer Ltd. (random polypropylene, melt flow rate at 230 ° C., 2.16 kg: 7.5 g / 10 minutes, melting point: 135 ° C., tensile modulus of elasticity of a single film: 600 MPa)
Olefin elastomer:
"Wellnex RFX4V" manufactured by Japan Polypropylene (olefin elastomer, melt flow rate at 230 ° C., 2.16 kg: 6.0 g / 10 minutes, melting point: 127 ° C., tensile modulus of elasticity of a single film: 250 MPa)
Low density polyethylene:
Made by Japan Polyethylene Corporation, "Novatec LC500, 190 ° C, 2.16 kg melt flow rate: 4.0 g / 10 minutes, melting point: 106 ° C, tensile modulus of single film: 140 MPa)
Styrene-based elastomer:
Kuraray, "Hybler 7311F, 230 ° C, 2.16 kg melt flow rate: 2.0 g / 10 minutes)

<Polymer antistatic agent>
Polymer-type antistatic agent (A) (polyester-polyolefin block copolymer):
Sanyo Chemical Industries, Ltd., "Perectron PVH, melt flow rate at 190 ° C, 2.16 kg: 8.0 g / 10 minutes)"
Polymer-type antistatic agent (B) (polyester-polyolefin block copolymer):
Sanyo Chemical Industries, Ltd., "Pelectron PVL, melt flow rate at 190 ° C, 2.16 kg: 15.0 g / 10 minutes)"

<Preparation of resin composition>
The above-mentioned polyolefin resin and the polymer-type antistatic agent were blended so as to have a total of 100 parts by mass, and mixed by dry blending. After visually confirming that the mixture was uniformly mixed, a resin composition for film molding was prepared.

<Film formation method>
Each hopper of three Toshiba Machine single-screw extruders (for surface layer: 35φmm, L / D = 25mm, for intermediate layer: 50φmm, L / D = 32, for back layer: 35φmm, L / D = 25mm) The dry-blended raw material was put into the machine, the extruder temperature of each extruder was set to 190 to 210 ° C, and the feed block was combined into a three-layer structure of surface layer / intermediate layer / back layer to form a 650 mm wide T-die. Extruded from (temperature setting 210 ° C., lip opening 0.5 mm). As for the thickness configuration, each extruder rotation speed was set so as to have the thickness shown in Table 1.
The extruded molten resin is cooled and solidified by a winder equipped with a mirror-shaped cooling roll (cooling roll 700 mm width x φ350 mm, roll temperature of about 30 ° C.), and then corona-treated on both sides to perform winding. A multi-layer film having a thickness of about 80 μm and having two types and three layers or three types and three layers was obtained.
Further, in the present invention, the surface of the obtained film on the mirror surface on the cooling roll side is expressed as the surface layer.

[Contents of polymer antistatic agent]
It was calculated from the total amount of the polymer-type antistatic agents (A) and (B) contained in each layer and their respective contents.

[Thickness of each layer]
The thickness of each layer was set by calculating from the discharge amount of the resin extruded from each extruder. In addition, from the results of cross-sectional observation of the obtained film, it was confirmed that the thickness was as set.

[Total film thickness]
The thickness of the center and both ends of the film was measured using a contact thickness gauge, and it was confirmed that the thickness was a predetermined value.

[Appearance of film]
The appearance of the film after 1 hour when the film was produced by the above-mentioned film forming method was visually observed and evaluated according to the following criteria.
⊚: The film has no streak-like results and the appearance is good. ○: The film has slight streak-like defects, but can be used. ×: The film has remarkable streak-like defects and cannot be used.

[Surface resistance value]
The surface resistance value was measured using a high resistivity meter (MCP-HT450, electrode: double ring method (URS probe) manufactured by Dia Instruments Co., Ltd., which conforms to JIS K6911. Also, the value after 10 seconds at a voltage of 500 V. Was adopted as the measured value.

[Example 1]
As the polyolefin resin used for the surface layer, the intermediate layer, and the back layer, random polypropylene, an olefin elastomer, a polymer-type antistatic agent (A), and a polymer-type antistatic agent (B) were used at the contents shown in Table 1. By the film forming method described above, a film having a thickness of 80 μm composed of 3 types and 3 layers was obtained. The thickness of each layer was 4 μm for the surface layer, 72 μm for the intermediate layer, and 4 μm for the back layer, and the ratio of each thickness was 5% for the surface layer, 90% for the intermediate layer, and 5% for the back layer.
When the total amount of the polymer-type antistatic agent used for the back layer of the film is 100% by mass, the content of the polymer-type antistatic agent (A) is 50% by mass, and the polymer-type antistatic agent ( The content of B) was 50% by mass. Since the polymer type antistatic agent is contained only in the back layer, the ratio of the thickness of the layer containing the antistatic agent was 5%.
Further, since the contents of the polymer-type antistatic agents (A) and (B) contained in the film were within the predetermined contents, the appearance of the film after 1 hour from the start of production was obtained. No streak-like appearance defects were confirmed, and a film having an excellent appearance could be obtained.
Since the back layer of the obtained film contains a sufficient polymer antistatic agent, the surface resistance value is 3.3 × 10 ⁹ Ω / □, and 1.0 × 10 ¹⁰ Ω / □. Since it was lower than that, it was confirmed that the antistatic performance was also excellent.

[Example 2]
Example 1 except that random polypropylene, an olefin-based elastomer, and polymer-type antistatic agents (A) and (B) are used in the amounts shown in Table 1 and the polymer-type antistatic agent is also blended in the surface layer and the back layer. I went in the same way.
The thickness of each layer was 16 μm for the surface layer, 48 μm for the intermediate layer, and 16 μm for the back layer, and the ratio of each thickness was 20% for the surface layer, 60% for the intermediate layer, and 20% for the back layer.
When the total amount of the polymer-type antistatic agent used for the surface layer of the film is 100% by mass, the content of the polymer-type antistatic agent (A) is 50% by mass, and the polymer-type antistatic agent (B). ) Is 50% by mass, and the content of the polymer-type antistatic agent (A) is 50% by mass when the total amount of the polymer-type antistatic agents used for the back layer is 100% by mass. The content of the polymer-type antistatic agent (B) was 50% by mass. Since both the front layer and the back layer contain the polymer type antistatic agent, the ratio of the thickness of the layer containing the antistatic agent was 40%.
Further, since the contents of the polymer-type antistatic agents (A) and (B) contained in the film were within the predetermined contents, the appearance of the film after 1 hour from the start of production was obtained. No streak-like appearance defects were confirmed, and a film having an excellent appearance could be obtained.
Since both the surface layer and the back layer of the obtained film contain a sufficient polymer antistatic agent, the surface resistance value on the surface layer side is 1.7 × ¹⁰⁹ Ω / □, and that on the back layer side. The surface resistance value was 1.7 × 10 ⁹ Ω / □, which was lower than 1.0 × 10 ¹⁰ Ω / □, confirming that both the front and back sides were excellent in antistatic performance.

[Example 3]
Random polypropylene, olefin-based elastomer, styrene-based elastomer, polymer-type antistatic agents (A) and (B) were used in the same manner as in Example 1 except that the amounts shown in Table 1 were used.
The thickness of each layer was 16 μm for the surface layer, 48 μm for the intermediate layer, and 16 μm for the back layer, and the ratio of each thickness was 20% for the surface layer, 60% for the intermediate layer, and 20% for the back layer.
When the total amount of the polymer-type antistatic agent used on the back layer side of the film is 100% by mass, the content of the polymer-type antistatic agent (A) is 67% by mass, and the polymer-type antistatic agent. The content of (B) was 33% by mass. Since the polymer type antistatic agent is contained only in the back layer, the ratio of the thickness of the layer containing the antistatic agent was 20%.
Further, since the contents of the polymer-type antistatic agents (A) and (B) contained in the film were within the predetermined contents, the appearance of the film after 1 hour from the start of production was obtained. No streak-like appearance defects were confirmed, and a film having an excellent appearance could be obtained.
Since the back layer of the obtained film contains a sufficient polymer antistatic agent, the surface resistance value on the back layer side is 3.4 × 10 ⁹ Ω / □, 1.0 × 10 ¹⁰ . Since it was less than Ω / □, it was confirmed that it was also excellent in antistatic performance.

[Example 4]
Examples except that the amounts of the olefin-based elastomer, the styrene-based elastomer, and the polymer-type antistatic agents (A) and (B) are shown in Table 1 and the polymer-type antistatic agent is also blended in the surface layer and the back layer. The same procedure as in 2 was performed.
The thickness of each layer was 16 μm for the surface layer, 48 μm for the intermediate layer, and 16 μm for the back layer, and the ratio of each thickness was 20% for the surface layer, 60% for the intermediate layer, and 20% for the back layer.
When the total amount of the polymer-type antistatic agent used for the surface layer of the film is 100% by mass, the content of the polymer-type antistatic agent (A) is 57% by mass, and the polymer-type antistatic agent (B). ) Is 43% by mass, and the content of the polymer-type antistatic agent (A) is 57% by mass when the total amount of the polymer-type antistatic agents used for the back layer is 100% by mass. The content of the polymer-type antistatic agent (B) was 43% by mass. Since both the front layer and the back layer contain the polymer type antistatic agent, the ratio of the thickness of the layer containing the antistatic agent was 40%.
Further, since the contents of the polymer-type antistatic agents (A) and (B) contained in the film were within the predetermined contents, the appearance of the film after 1 hour from the start of production was obtained. Although a slight streak-like appearance defect was observed, it was possible to use it, and a film having a good appearance could be obtained.
Since both the surface layer and the back layer of the obtained film contain a sufficient polymer antistatic agent, the surface resistance value on the surface layer side is 1.4 × ¹⁰⁹ Ω / □, and that on the back layer side. The surface resistance value was 1.4 × 10 ⁹ Ω / □, which was lower than 1.0 × 10 ¹⁰ Ω / □, confirming that both the front and back sides were excellent in antistatic performance.

[Example 5]
Examples except that olefin-based elastomer, low-density polyethylene, polymer-type antistatic agents (A) and (B) were used in the amounts shown in Table 1, and polymer-type antistatic agents were also blended in the surface layer and the back layer. The same procedure as in 2 was performed.
The thickness of each layer was 4 μm for the surface layer, 72 μm for the intermediate layer, and 4 μm for the back layer, and the ratio of each thickness was 5% for the surface layer, 90% for the intermediate layer, and 5% for the back layer.
When the total amount of the polymer-type antistatic agent used on the surface layer side of the film is 100% by mass, the content of the polymer-type antistatic agent (A) is 71% by mass, and the polymer-type antistatic agent ( The content of B) is 29% by mass, and the content of the polymer-type antistatic agent (A) is 71% by mass when the total amount of the polymer-type antistatic agents used for the back layer is 100% by mass. %, The content of the polymer-type antistatic agent (B) was 29% by mass. Since both the front layer and the back layer contain the polymer type antistatic agent, the ratio of the thickness of the layer containing the antistatic agent was 10%.
Further, since the contents of the polymer-type antistatic agents (A) and (B) contained in the film were within the predetermined contents, the appearance of the film after 1 hour from the start of production was obtained. No streak-like appearance defects were confirmed, and a film having an excellent appearance could be obtained.
Since both the surface layer and the back layer of the obtained film contain a sufficient polymer antistatic agent, the surface resistance value on the surface layer side is 1.7 × ¹⁰⁹ Ω / □, and that on the back layer side. The surface resistance value was 2.1 × 10 ⁹ Ω / □, which was lower than 1.0 × 10 ¹⁰ Ω / □, confirming that both the front and back sides were excellent in antistatic performance.

[Comparative Example 1]
Homopolypropylene, olefin-based elastomer, styrene-based elastomer, polymer-type antistatic agents (A) and (B) are used in the amounts shown in Table 1, except that the surface layer and the back layer are also compounded with the polymer-type antistatic agent. , The same procedure as in Example 5.
The thickness of each layer was 4 μm for the surface layer, 72 μm for the intermediate layer, and 4 μm for the back layer, and the ratio of each thickness was 5% for the surface layer, 90% for the intermediate layer, and 5% for the back layer.
When the total amount of the polymer-type antistatic agent used for the surface layer of the film is 100% by mass, the content of the polymer-type antistatic agent (A) is 50% by mass, and the polymer-type antistatic agent (B). ) Is 50% by mass, and the content of the polymer-type antistatic agent (A) is 50% by mass when the total amount of the polymer-type antistatic agents used for the back layer is 100% by mass. The content of the polymer-type antistatic agent (B) was 50% by mass. Since both the front layer and the back layer contain the polymer type antistatic agent, the ratio of the thickness of the layer containing the antistatic agent was 10%.
Although no streak-like appearance defects were confirmed in the appearance of this film one hour after the start of production of the film and the film was excellent in appearance, the polymer antistatic agents (A) and (B) The content of is 20% by mass in the resin composition, does not contain a predetermined amount, the surface resistance value on the surface layer side is 3.2 × 10 ¹⁰ Ω / □, and the surface resistance value on the back layer side is 2. It showed .2 × 10 ¹⁰ Ω / □, which exceeded 1.0 × 10 ¹⁰ Ω / □, and it was confirmed that both front and back were inferior in antistatic performance.

[Comparative Example 2]
Example 5 except that homopolypropylene, an olefin-based elastomer, a styrene-based elastomer, and a polymer-type antistatic agent (B) were used in the amounts shown in Table 1 and the polymer-type antistatic agent was also blended in the surface layer and the back layer. I went in the same way.
The thickness of each layer was 4 μm for the surface layer, 72 μm for the intermediate layer, and 4 μm for the back layer, and the ratio of each thickness was 5% for the surface layer, 90% for the intermediate layer, and 5% for the back layer.
When the total amount of the polymer-type antistatic agent used for the surface layer of the film was 100% by mass, the content of the polymer-type antistatic agent (B) was 100% by mass, which was high as used for the back layer. When the total amount of the molecular antistatic agent is 100% by mass, the content of the polymer antistatic agent (B) is 100% by mass, and the polymer antistatic agent (A) is not contained. there were. Since both the front layer and the back layer contain the polymer type antistatic agent, the ratio of the thickness of the layer containing the antistatic agent was 10%.
Since this film was a film containing only the polymer-type antistatic agent (B), streaky appearance defects were noticeably confirmed in the appearance one hour after the start of production of the film, and the appearance was inferior. It was a thing.
The surface resistance value on the surface layer side is 5.3 × 10 ⁹ Ω / □, and the surface resistance value on the back layer side is 5.2 × 10 ⁹ Ω / □, both of which are lower than 1.0 × 10 ¹⁰ Ω / □. However, it was confirmed that both excellent appearance and antistatic performance were not achieved.

[Comparative Example 3]
The same as in Example 5 except that the amounts of the olefin-based elastomer, the low-density polyethylene, and the polymer-type antistatic agent (A) are shown in Table 1 and the polymer-type antistatic agent is also blended in the surface layer and the back layer. went.
The thickness of each layer was 4 μm for the surface layer, 72 μm for the intermediate layer, and 4 μm for the back layer, and the ratio of each thickness was 5% for the surface layer, 90% for the intermediate layer, and 5% for the back layer.
When the total amount of the polymer-type antistatic agent used for the surface layer of the film was 100% by mass, the content of the polymer-type antistatic agent (A) was 100% by mass, which was high as used for the back layer. When the total amount of the molecular antistatic agent is 100% by mass, the content of the polymer antistatic agent (A) is 100% by mass, and the polymer antistatic agent (B) is not contained. there were. Since both the front layer and the back layer contain the polymer type antistatic agent, the ratio of the thickness of the layer containing the antistatic agent was 10%.
Since this film was a film containing only the polymer-type antistatic agent (A), streaky appearance defects were noticeably confirmed in the appearance one hour after the start of production of the film, and the appearance was inferior. It was a thing.
The surface resistance value on the surface layer side is 4.0 × 10 ⁹ Ω / □, and the surface resistance value on the back layer side is 4.0 × 10 ⁹ Ω / □, both of which are lower than 1.0 × 10 ¹⁰ Ω / □. However, it was confirmed that both excellent appearance and antistatic performance were not achieved.

[Comparative Example 4]
Homopolypropylene, olefin-based elastomer, styrene-based elastomer, polymer-type antistatic agents (A) and (B) are used in the amounts shown in Table 1, except that the surface layer and the back layer are also compounded with the polymer-type antistatic agent. , The same procedure as in Example 5.
The thickness of each layer was 4 μm for the surface layer, 72 μm for the intermediate layer, and 4 μm for the back layer, and the ratio of each thickness was 5% for the surface layer, 90% for the intermediate layer, and 5% for the back layer.
When the total amount of the polymer-type antistatic agent used for the surface layer of the film is 100% by mass, the content of the polymer-type antistatic agent (A) is 56% by mass, and the polymer-type antistatic agent (B). ) Is 44% by mass, and the content of the polymer-type antistatic agent (A) is 56% by mass when the total amount of the polymer-type antistatic agents used for the back layer is 100% by mass. The content of the polymer-type antistatic agent (B) was 44% by mass. Since both the front layer and the back layer contain the polymer type antistatic agent, the ratio of the thickness of the layer containing the antistatic agent was 10%.
Since this film contains 45% by mass of the polymer-type antistatic agents (A) and (B) in the resin composition and exceeds a predetermined amount, the appearance of the film after 1 hour from the start of production of the film , A streak-like appearance defect was remarkably confirmed, and the appearance was inferior.
The surface resistance value on the surface layer side is 8.0 × 10 ⁸ Ω / □, and the surface resistance value on the back layer side is 8.1 × 10 ⁸ Ω / □, both of which are lower than 1.0 × 10 ¹⁰ Ω / □. However, it was confirmed that both excellent appearance and antistatic performance were not achieved.

[Comparative Example 5]
The same procedure as in Example 3 was carried out except that the olefin-based elastomer, the polymer-type antistatic agents (A) and (B) were used in the amounts shown in Table 1 and the polymer-type antistatic agent was blended only in the back layer. ..
The thickness of each layer was 16 μm for the surface layer, 48 μm for the intermediate layer, and 16 μm for the back layer, and the ratio of each thickness was 20% for the surface layer, 60% for the intermediate layer, and 20% for the back layer.
When the total amount of the polymer-type antistatic agent used for the back layer of the film is 100% by mass, the content of the polymer-type antistatic agent (A) is 33% by mass, and the polymer-type antistatic agent ( The content of B) was 67% by mass. Since the polymer type antistatic agent is contained only in the back layer, the ratio of the thickness of the layer containing the antistatic agent was 20%.
Although this film contains 30% by mass of the polymer-type antistatic agents (A) and (B) in the resin composition and contains a predetermined amount, the polymer-type antistatic agent is contained in the polymer-type antistatic agent. Since the content of the inhibitor (B) was 67% by mass, which exceeded 50% by mass, streaky appearance defects were remarkably confirmed in the appearance one hour after the start of production of the film, and the appearance was inferior. Met.
The surface resistance value on the back layer side is 1.8 × 10 ⁹ Ω / □, which is lower than 1.0 × 10 ¹⁰ Ω / □, but it is confirmed that both excellent appearance and antistatic performance are not achieved. rice field.

[Example 6]
Acrylic adhesive (SK Dyne 1502C manufactured by Soken Chemical Co., Ltd.) is applied on the separator by the comma coating method so that the thickness of the adhesive layer after drying is 25 μm, and it is put into a hot air dryer at 80 ° C. After drying for 5 minutes, an adhesive layer was formed.
By adhering the surface of the prepared separator on the pressure-sensitive adhesive layer side to the surface of the film on the cooling roll side, an pressure-sensitive adhesive film in which the film of the present invention and the pressure-sensitive adhesive layer were laminated was obtained.
Further, by using this adhesive film having excellent appearance and antistatic performance as an adhesive film for a semiconductor manufacturing process, it is possible to suppress a decrease in yield due to deterioration of appearance, and it is possible to suppress adhesion of foreign substances such as dust and other suspended matter, and a semiconductor. It is possible to reduce defects in the manufacturing process.

[Industrial applicability]
By using the film of the present invention, it is possible to provide a film having excellent antistatic properties and maintaining an excellent appearance even in the production of a film for a long time. Further, according to the present invention, it becomes possible to provide an adhesive film for a semiconductor manufacturing process having excellent antistatic properties and film appearance.

Claims (7)

A resin composition containing a resin containing a polyolefin resin as a main component, a polymer-type antistatic agent (A) and a polymer-type antistatic agent (B), and the resin, the polymer-type antistatic agent (A). And when the total content of the polymer type antistatic agent (B) is 100% by mass, the total content of the polymer type antistatic agent (A) and the polymer type antistatic agent (B) is 25. When the content is ~ 40% by mass and the total content of the polymer type antistatic agent (A) and the polymer type antistatic agent (B) is 100% by mass, the polymer type antistatic agent (A). ) Is contained in an amount of 40 to 95% by mass and a polymer-type antioxidant (B) is contained in an amount of 5 to 60% by mass. Resin film.
Polymer type antistatic agent (A):
Melt flow rate (MFR) measured according to JIS K7210 (190 ° C, 2.16 kg load) is 10 g / 10 minutes or less Polymeric antistatic agent (B):
Melt flow rate (MFR) measured according to JIS K7210 (190 ° C, 2.16 kg load) is 10 g / 10 minutes or more. The polyolefin-based resin film according to claim 1, wherein the polymer-type antistatic agent (A) and the polymer-type antistatic agent (B) are polyether-polyolefin block copolymers. The polyolefin-based resin film according to claim 1 or 2, wherein the surface resistance value of the layer made of the resin composition is 1.0 × 10 ¹⁰ Ω / □ or less. The polyolefin-based resin film according to any one of claims 1 to 3, wherein the layer made of the resin composition is provided on the front and back surfaces of the film. The polyolefin-based resin film according to any one of claims 1 to 4, wherein the thickness of the layer made of the resin composition is in the range of 5 to 50% with respect to the total thickness of the film. An adhesive film obtained by laminating an adhesive layer on at least one surface of the polyolefin-based resin film according to any one of claims 1 to 5. The pressure-sensitive adhesive film for a semiconductor manufacturing process according to claim 6, which is used in the semiconductor manufacturing process.