JP2021529043A - スパイラルベースの薄膜メッシュシステム及び関連の方法 - Google Patents
スパイラルベースの薄膜メッシュシステム及び関連の方法 Download PDFInfo
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- JP2021529043A JP2021529043A JP2020572542A JP2020572542A JP2021529043A JP 2021529043 A JP2021529043 A JP 2021529043A JP 2020572542 A JP2020572542 A JP 2020572542A JP 2020572542 A JP2020572542 A JP 2020572542A JP 2021529043 A JP2021529043 A JP 2021529043A
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- thin film
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Abstract
Description
[0065] 本明細書で開示する方法及び装置は、スパイラルベースの薄膜メッシュ用の操作システムを提供する。1つ以上の実施形態では、本開示のシステムは、様々な異なる医学的応用に利用され得るスパイラルベースの薄膜メッシュを提供する。
[0073] 上述のように、開示の薄膜メッシュは、複数の次元において可撓性であるため、不規則な解剖面に簡単に適合できる。そのようなものとして、これらの特性は、薄膜メッシュを、様々な異なる植込み型医療機器の理想的な構成要素にする。1つのそのような植込み型機器は、血管内ステントである。
[0081] 薄膜メッシュ110は、複数のモザイクの単位セルを含むような構造にされる。単位セルのそれぞれは、対数スパイラルとし得るスパイラル部を含む。図2A〜17Bは、開示の薄膜メッシュ110の単位セルに用いられ得る様々な多数の異なるスパイラルを示す。単位セルは、薄膜メッシュ110のほぼ中心点の周りに配置される。単位セルは、拡大縮小(scaled)され、且つ2次元にモザイクにされて、独特の望ましい特性を備える構造を生じ得る。中心点の周りに配置された単位セルの数を増減させることによって、及び/又は単位セルのスパイラル部のそれぞれのスパイラルアームの長さを長くすることによって、追加的な構造変更が行われ得る。
[0103] 薄膜メッシュ110は、薄膜メッシュ機器120、例えば血管内ステントにおいて用いられ得る。図18は、薄膜メッシュ110で被覆された薄膜メッシュ機器(例えば、血管内ステント)120を示す。薄膜メッシュ機器120は、起伏のある湾曲形状を含むバックボーン(例えば、ステントバックボーン)122を含み得、これは、図18に示すように、さらに、湾曲形状の起伏部間に取り付けられた複数のS字形状122sを含む。バックボーン122に組み込まれたS字形状122sは、薄膜機器120が曲線状の輪郭を付けられるすなわち曲げられるときに、薄膜機器120の薄膜メッシュ110の脱出を防止する。
[0106] 図20は、薄膜メッシュ機器、例えば薄膜メッシュ機器120用の薄膜メッシュ、例えば薄膜メッシュ110を製作するためのプロセス2000のフロー図である。図21A〜21Eに示すように、ブロック2002において、トレンチがウエハ2100(例えば、シリコンウエハ又は他のウエハ)に形成される。図21Aは、上部に厚さ500ナノメートル(nm)〜1マイクロメートル(μm)の酸化物層を有し得るウエハ2100を示す。図21Bに示すように、フォトレジスト2102が、ウエハ2100上にスピンコート(spun-coated)される。図21Cに示すように、フォトレジスト2102をパターニングし、且つフォトリソグラフィを使用して現像することによって、露出した領域2104のパターンが形成される。パターンは、スパイラル部の陰の領域及び/又は相互接続部、例えば三角形の相互接続部の陰の領域を規定し得る。露出した領域2104のパターンは、エッチングに利用可能である。図21Dに示すように、少なくとも15μmの深さ(例えば、25μm〜200μmの深さ)の溝又はトレンチ2106を形成するために、深掘反応性イオンエッチング(DRIE:Deep reactive ion etching)が行われる。フォトレジスト2102が除去され、且つウエハ2100が洗浄されて、図21Eに示すような、トレンチ2106のある、エッチング済みのウエハ2100を生じる。トレンチ2106は、薄膜メッシュ210用のテンプレートを提供する微細パターンを形成し得る。例えば、微細パターンは、図15A〜17Bに示すものなどのスパイラル部の陰の領域を規定し得る。DRIEプロセスを使用する微細パターンの解像度は、例えばおよそ1μmとし得る。ウエハ2100は、複数の微細パターンを含み得る。本明細書では、測定可能な値に言及するときの用語「およそ」は、その値の±20%、±10%、±5%、±1%、±0.5%、又は±0.1%の変動を含む。
Claims (20)
- 全方向に拡張可能な複数のスパイラル部を含む、薄膜メッシュ
を含む、薄膜メッシュ機器。 - 前記複数のスパイラル部は、前記薄膜メッシュのほぼ中心点の周りに配置されている、請求項1に記載の薄膜メッシュ機器。
- 前記スパイラル部のそれぞれは、3個のスパイラルアーム、4個のスパイラルアーム、6個のスパイラルアーム、12個のスパイラルアーム、又は24個のスパイラルアームのうちの1つを含む、請求項1に記載の薄膜メッシュ機器。
- 前記スパイラル部のそれぞれに関し、隣接するスパイラルアーム間の距離は、前記スパイラルアームが前記スパイラル部の中心から放射状に広がるにつれて、長くなる、請求項1に記載の薄膜メッシュ機器。
- 前記薄膜メッシュは、さらに、複数の三角形の相互接続部を含み、前記三角形の相互接続部のそれぞれは、前記スパイラル部のうちの3つを互いにつないでいる、請求項1に記載の薄膜メッシュ機器。
- 前記スパイラル部のそれぞれは、対数スパイラル部、黄金スパイラル部、近似黄金スパイラル部、ボックスファイスパイラル部、又はフィボナッチスパイラル部のうちの1つである、請求項1に記載の薄膜メッシュ機器。
- 前記ボックスファイスパイラル部は、2ボックスファイスパイラル部、3ボックスファイスパイラル部、又は4ボックスファイスパイラル部のうちの1つである、請求項6に記載の薄膜メッシュ機器。
- 前記薄膜メッシュは薄膜ニチノール(TFN)を含む、請求項1に記載の薄膜メッシュ機器。
- 前記薄膜メッシュは、治療モダリティにコーティングされるか又は接合されるかの少なくとも一方である、請求項1に記載の薄膜メッシュ機器。
- 前記治療モダリティは、小分子、ペプチド、抗体、ポリマー、バイオポリマー、細胞、又は組み換え細胞のうちの少なくとも1つを含む、請求項9に記載の薄膜メッシュ機器。
- 長手方向軸に延在するバックボーン;及び
前記バックボーンに組み立てられた薄膜メッシュ
を含む、薄膜メッシュ機器であって、
前記薄膜メッシュは、全方向に拡張可能な複数のスパイラル部を含む、薄膜メッシュ機器。 - 前記複数のスパイラル部は、前記薄膜メッシュのほぼ中心点の周りに配置されている、請求項11に記載の薄膜メッシュ機器。
- 前記スパイラル部のそれぞれは、3個のスパイラルアーム、4個のスパイラルアーム、6個のスパイラルアーム、12個のスパイラルアーム、又は24個のスパイラルアームのうちの1つを含む、請求項11に記載の薄膜メッシュ機器。
- 前記薄膜メッシュは、さらに、複数の三角形の相互接続部を含み、前記三角形の相互接続部のそれぞれは、前記スパイラル部のうちの3つを互いにつないでいる、請求項11に記載の薄膜メッシュ機器。
- 前記薄膜メッシュはシリンダー形状を含み、及び、前記スパイラル部のうちの少なくとも1つが、前記薄膜メッシュが前記シリンダー形状の長手方向軸に沿って及び前記シリンダー形状の周方向に沿って拡張するように、拡張される、請求項11に記載の薄膜メッシュ機器。
- 前記薄膜メッシュは、前記周方向に沿って拡張可能であり、前記シリンダー形状を半径方向に拡張させて、前記シリンダー形状の直径を大きくさせることができる、請求項15に記載の薄膜メッシュ機器。
- 前記バックボーンは、複数のS字形状の湾曲部を含む、請求項11に記載の薄膜メッシュ機器。
- 薄膜メッシュを形成するための方法であって:
基板の表面にトレンチの微細パターンを深掘反応性イオンエッチングすることであって、前記トレンチは、形成されるべき、前記薄膜メッシュにある、複数のスパイラル部の陰の領域に対応していること;
前記エッチングされた基板にリフトオフ層を堆積すること;
前記リフトオフ層の上側を覆って第1のニチノール層を堆積すること;及び
前記薄膜メッシュを形成するために前記リフトオフ層をエッチングすること
を含む、方法。 - 前記トレンチは、さらに、三角形の相互接続部の陰の領域に対応し、これは、それぞれ、前記スパイラル部のうちの3つを互いにつなぐ、請求項18に記載の方法。
- さらに、
前記第1のニチノール層の少なくとも1つの領域にボンディング層を堆積すること;
前記第1のニチノール層の残りの領域に犠牲層を堆積すること;
前記ボンディング層及び前記犠牲層に第2のニチノール層を堆積すること;並びに
前記ボンディング層を備える前記第1のニチノール層及び前記第2のニチノール層をアニールすること;
を含み、
前記エッチングは、さらに、前記犠牲層をエッチングして、三次元形状を有する前記薄膜メッシュを形成する、請求項18に記載の方法。
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