JP2021524887A - Upper electrode assembly, reaction chamber and atomic layer deposition equipment - Google Patents

Abstract

The present disclosure provides an upper electrode assembly, a reaction chamber and an atomic layer deposition apparatus. The upper electrode assembly includes an intake structure (10) with a first path (101) and an upper electrode plate (2) with a second path (21), the first path (101). , The second path (21) is configured to charge the process gas into the reaction chamber, and the second path (21) is configured to charge the process gas into the reaction chamber. The upper electrode assembly further includes an intake insulation assembly disposed between the upper electrode plate (2) and the intake structure (10). In the intake insulation assembly, the inner wall of the first path (101) is changed to the inner wall of the second path (21) while the process gas is introduced into the first path (101) to the second path (21). It is configured to be electrically insulated from. The technical solution of the upper electrode assembly, reaction chamber and atomic layer deposition device avoids the potential difference between the intake structure (10) and the upper electrode plate (2), thereby effectively avoiding ignition. do.

Description

Technical Fields The present disclosure relates to the field of semiconductor manufacturing technology, in particular to upper electrode assemblies, reaction chambers and atomic layer deposition equipment.

Background Currently, thin film deposition technology is widely applied to devices in multiple disciplines such as semiconductors, integrated circuits, solar panels, flat panel displays, microelectronics and light emitting diodes. Atomic layer deposition (ALD) techniques are commonly used in some thin film deposition processes to deposit thin films, and other techniques because the films produced by the ALD process are so thin. It has a significant advantage over it.

A variety of thin films can be produced using the plasma enhanced ALD (PE-ALD) process in ALD technology. In the capacitive PE-ALD process, two process gases that do not react with each other under normal conditions are introduced into the reaction chamber and the ALD process is performed by adjusting the radio frequency (RF) period.

As shown in FIG. 1, the existing capacitive PE-ALD apparatus includes a reaction chamber 100 and an upper electrode assembly including a shower plate 200 and an intake pipe 300. The intake port 400 of the intake pipe 300 is grounded, and the process gas sequentially passes through the intake pipe 300 and the shower plate 200 and flows into the reaction chamber 100. The shower plate 200 is electrically connected to the RF power supply and functions as an electrode plate for exciting the process gas in the reaction chamber to generate plasma when the RF power supply is switched on.

In the process of achieving this disclosure, Applicants have found that the prior art has the following drawbacks:

Since the intake port 400 of the intake pipe 300 is grounded and the shower plate 200 is electrically connected to the RF power supply, a potential difference is generated between the intake pipe 300 and the shower plate 200, and the potential difference causes the intake pipe 300. Plasma is generated inside, which causes a conductive thin film to be deposited on the inner wall of the intake pipe 300. As a result, a short circuit occurs between the intake port 400 and the shower plate 200, which facilitates ignition.

Overview To at least partially solve the technical problems of the prior art, the present disclosure provides an upper electrode assembly, a reaction chamber and an atomic layer deposition apparatus to provide a potential difference between the intake structure and the upper electrode plate. Is to be avoided, thereby effectively avoiding ignition.

According to one aspect of the present disclosure, an upper electrode assembly comprising an intake structure with a first path and an upper electrode plate with a second path is provided. The first path is configured to charge the process gas into the second path, and the second path is configured to charge the process gas into the reaction chamber. The upper electrode assembly further includes an intake insulation assembly disposed between the upper electrode plate and the intake structure. The intake insulation assembly electrically insulates the inner wall of the first path from the inner wall of the second path while the process gas is being introduced into the second path from the first path. It is configured as follows.

In some embodiments of the present disclosure, the intake insulation assembly comprises an insulating member disposed between the upper electrode plate and the intake structure, the insulating member having an intermediate path.

The intermediate route communicates with each of the first route and the second route, and is configured to electrically insulate the inner wall of the first route from the inner wall of the second route. Adopts the intake insulation structure.

In some embodiments of the present disclosure, the intake insulation assembly is
An insulating member arranged between the upper electrode plate and the intake structure is provided, and the insulating member is configured to electrically insulate the upper electrode plate from the intake structure, and an intermediate path is formed. The intake insulation assembly is further located on the insulating member and communicates with each of the first path and the second path.
The intake insulation structure includes an intake insulation structure arranged in the intermediate path, and the intake insulation structure is configured to electrically insulate the inner wall of the first path from the inner wall of the second path.

In some embodiments of the present disclosure, the intake insulation structure comprises at least one intake hole, the axis of the intake hole being parallel to the axis of the intermediate path, or the intake hole. A predetermined angle is formed between the axis of the above and the axis of the intermediate path.

In some embodiments of the present disclosure, a plurality of intake holes are provided, and the plurality of intake holes are distributed on at least one circumference centered on the axis of the intermediate path. Alternatively, the plurality of intake holes are arranged in an array with respect to the radial cross section of the intermediate path.

In some embodiments of the present disclosure, the intake insulation structure comprises at least two intake hole groups, each intake hole group includes at least one intake hole, and the axis of the intake hole in the intake hole group. Is parallel to the axis of the intermediate path, or a predetermined angle is formed between the axis of the intake hole and the axis of the intermediate path.
The angles between the axes of the intake holes in the different intake hole groups and the axes of the intermediate path are different, and / or the intake holes in the different intake hole groups are different. It has a plurality of radial cross-sectional shapes.

In some embodiments of the present disclosure, the intake insulation structure comprises two intake hole groups, a first intake hole group and a second intake hole group.
The first intake hole group includes a plurality of intake holes distributed on at least two first circumferences, and the at least two first circumferences are centered on and different from the axis of the intermediate path. Each intake hole in the first intake hole group having a radius is a circular through hole.
The second intake hole group includes a plurality of intake holes distributed on the second circumference centered on the axis of the intermediate path, and each intake hole in the second intake hole group penetrates a rectangle. It is a hole, and the length of the radial cross-sectional shape of the rectangular through hole is arranged along the radial direction of the second circumference.

In some embodiments of the present disclosure, the larger the radius of the first circumference where the intake hole is located in the first intake hole group, the larger the diameter of the intake hole.

In some embodiments of the present disclosure, the predetermined angle is in the range of 30 ° to 89 °.

In some embodiments of the present disclosure, the intake hole is a circular through hole and the diameter of the circular through hole ranges from 0.5 mm to 4 mm.

In some embodiments of the present disclosure, the diameter of the circular through hole ranges from 0.5 mm to 4 mm.

In some embodiments of the present disclosure, the area of the radial cross section of the rectangular through-holes is in the range of 1 mm ² to 20 mm ^2.

In some embodiments of the present disclosure, the upper electrode plate is a shower plate provided with a spout, and the shaft of the intake hole and the shaft of the spout are alternately arranged.

In some embodiments of the present disclosure, the upper electrode plate is a shower plate provided with a spout, and the shaft of the intake hole and the shaft of the spout are alternately arranged.

According to other aspects of the disclosure, a reaction chamber comprising a chamber body and the upper electrode assembly is provided.

According to yet another aspect of the present disclosure, an ALD apparatus including the above reaction chamber is provided.
In the technical solution of the upper electrode assembly, reaction chamber and ALD apparatus provided by the present disclosure, the intake insulation assembly blocks the path through which the intake structure comes into direct contact with the upper electrode plate and provides an inner wall of the first path. It is arranged so as to be electrically insulated from the inner wall of the second path, so that a potential difference does not occur between the intake structure and the upper electrode plate, thereby effectively preventing ignition.

Brief Description of Drawings The above and other objectives, technical features and advantages of this disclosure will be further clarified by the following description of embodiments of this disclosure with reference to the accompanying drawings.

It is the schematic which shows the capacitive PE-ALD apparatus in the prior art. It is a structural drawing which shows the cross section of the upper electrode assembly according to 1st Embodiment of this disclosure. It is a side view which shows the intake insulation structure used in 1st Embodiment of this disclosure. FIG. 3 is a three-dimensional structural diagram showing an intake insulation structure according to the first embodiment of the present disclosure. It is a top view which shows the intake insulation structure according to 1st Embodiment of this disclosure. It is another side view which shows the intake insulation structure used in 1st Embodiment of this disclosure. It is still another side view which shows the intake insulation structure used in 1st Embodiment of this disclosure. It is a structural drawing which shows the cross section of the upper electrode assembly according to the 2nd Embodiment of this disclosure. It is a three-dimensional structure diagram which shows the intake insulation structure used in the 2nd Embodiment of this disclosure. It is a top view which shows the intake insulation structure used in the 2nd Embodiment of this disclosure. It is a perspective view which shows the intake insulation structure used in the 2nd Embodiment of this disclosure. It is a structural drawing which shows the cross section of the reaction chamber according to the 3rd Embodiment of this disclosure.

reference number:
[Prior art]
100 reaction chamber, 200 shower plate, 300 air intake pipe, 400 air intake.

[Disclosure]
10 Intake structure, 101 1st path, 102 1st branch path, 103 2nd branch path, 104 purge path, 105 intake manifold seal groove, 11 insulation member, 111 intermediate path, 112 insulation block seal groove, 12 Intake insulation structure, 120, 120'intake hole, 121 first intake hole, 122 second intake hole, Θ predetermined angle, 2 upper electrode plate, 21 second path, 22 high frequency generator, 3 Chamber body, 31 process reaction zones, 32 process zone distribution grids, 33 support bases.

Detailed Description To solve at least one technical problem in the prior art, the present disclosure provides an upper electrode assembly, a reaction chamber and an ALD device. To better clarify the objectives, technical solutions and advantages of the present disclosure, the present disclosure will be further described below with reference to specific embodiments and accompanying drawings. It should be understood that these explanations are for illustration purposes only and are not intended to limit the scope of this disclosure. In addition, the following description does not describe well-known structures and techniques to avoid unnecessary confusion of the concepts of the present disclosure.

The first embodiment of the present disclosure provides an upper electrode assembly that can be applied to an ALD device, particularly a capacitive PE-ALD device.

As shown in FIG. 2, the upper electrode assembly is located above the reaction chamber of the ALD device and includes the intake structure 10 and the upper electrode plate 2. The intake structure 10 includes a first path 101, further comprising at least two branch paths in this embodiment. When the ALD device is activated, the precursor A and the precursor B each pass through two branch paths and simultaneously enter the first path 101 and are mixed in the first path 101. That is, the first route 101 is used as a main pipe for mixing the precursor A and the precursor B and delivering the mixed gas of the precursor A and the precursor B. Precursor A and Precursor B are two process gases that do not react with each other under normal conditions.

The upper electrode plate 2 is provided with a second path 21. The mixed gas of the precursor A and the precursor B is introduced into the second path 21 via the first path 101, and the second path 21 is configured to input the mixed gas into the reaction chamber. There is. In the present embodiment, the upper electrode plate 2 is a shower plate. The shower plate is located above the reaction chamber and is connected to the RF generator 22. The RF generator 22 is configured to apply RF power to the shower plate to excite the process gas in the reaction chamber to generate plasma. Further, the shower plate has a dispersion chamber, a central intake hole is provided at the upper end of the dispersion chamber, and a plurality of spouts are provided at the lower end for uniformly discharging the process gas into the reaction chamber. Has been done. The second path 21 may be a hollow tube, extending along the axis of the shower plate and communicating with the central intake hole of the dispersion chamber, or the second path 21 is the center of the dispersion chamber. It is an intake hole.

The upper electrode assembly further includes an intake insulation assembly. The intake insulation assembly is located between the upper electrode plate 2 and the intake structure 10 and is located in the first path 101 while the process gas is being introduced into the second path 21 from the first path 101. The inner wall is configured to be electrically insulated from the inner wall of the second path 21. Electrical insulation refers to blocking the path in which the positive electrode is in direct contact with the negative electrode so that no current flows between the positive electrode and the negative electrode.

When the treatment is performed in the reaction chamber, the shower plate functions as a positive electrode and the intake structure 10 functions as a negative electrode, and when the first path 101 directly communicates with the second path 21, the shower plate and the intake structure A potential difference is likely to occur between the two. In order to solve this problem, an intake insulation assembly is arranged between the upper electrode plate 2 and the intake structure 10 to block the path in which the positive electrode is in direct contact with the negative electrode (indicated by the arrow in FIG. 2). The inner wall of the path 101 is electrically insulated from the inner wall of the second path 21. In this way, by preventing the occurrence of the potential difference, ignition is effectively avoided. The intake insulation assembly, on the other hand, allows the process gas to pass through, which allows the gas to flow from the first path 101 into the second path 21 without affecting the gas flow. ..

The structure of the intake insulation assembly will be described in detail below. Specifically, in this embodiment, the intake insulation assembly includes an insulating member 11 and an intake insulation structure 12. The insulating member 11 made of an insulating material is arranged between the upper electrode plate 2 and the intake structure 10, and is configured to electrically insulate the upper electrode plate 2 from the intake structure 10. The insulating member 11 is provided with an intermediate path 111, and the intermediate path 111 communicates with each of the first path 101 and the second path 21 to allow gas to flow from the first path 101 to the second path 21. Put it in.

The intake insulation structure 12 is arranged in the intermediate path 111, and is configured to electrically insulate the inner wall of the first path 101 from the inner wall of the second path 21 in order to avoid the occurrence of a potential difference. ..

Preferably, the intake structure 10, the insulating member 11, and the shower plate are coaxially arranged, and the first path 101, the intermediate path 111, and the second path 21 are also coaxially arranged.

In the present embodiment, the intake insulation structure 12 is arranged in the intermediate path 111 in order to secure a sufficient space for gas mixing in the first path 101, but the present disclosure is limited to this. Not done. In practice, as long as there is sufficient space in the first path 101 for gas mixing, the intake insulation structure 12 will be in the first path 101, or both in the first path 101 and the intermediate path 111. Can be placed in.

In the present embodiment, the intake insulation structure 12 is a component independent of the insulating member 11, but the present disclosure is not limited to this. In practical use, the intake insulation structure 12 may be formed in the intermediate path 111, that is, the intermediate path 111 electrically insulates the inner wall of the first path 101 from the inner wall of the second path 21. The intake insulation structure 12 that can also be used is adopted.

Referring to FIGS. 3 to 4b, in the present embodiment, the intake insulation structure 12 includes a plurality of intake holes 120, and the axes of the plurality of intake holes 120 are parallel to the axes of the intermediate path 111. Therefore, the process gas can be charged more smoothly.

Optionally, the plurality of intake holes 120 are arranged in an array with respect to the radial cross section of the intermediate path 111 so that the gas is uniformly introduced into the second path 21. The array may be a substantially circular array, a square array, or the like. In practical use, the plurality of intake holes 120 may be distributed in any other manner. For example, the plurality of intake holes 120 are distributed on at least one circumference centered on the axis of the intermediate path 111. ing.

Optionally, the number of intake holes 120 is 20 to 200, preferably 80 to 170, in order to meet the gas flow requirements.

In the present embodiment, all the intake holes 120 are circular through holes, and the diameter of these circular through holes is 0.5 mm to 4 mm, preferably 0.8 mm to 3 mm. Within such a diameter range, the inner wall of the first path 101 can be electrically insulated from the inner wall of the second path 21. The diameters of the intake holes 120 may be the same, different from each other, or partially the same.

In the present embodiment, all the intake holes 120 are circular through holes, but the present disclosure is not limited to this. In practice, the radial cross section of all intake holes 120 may have other shapes such as square, oval or polygonal. In addition, the intake holes 120 may include two or more types of intake holes having different radial cross-sectional shapes.

In the present embodiment, all the intake holes 120 are through holes, but the present disclosure is not limited to this. In practical use, the intake hole 120 may adopt a structure having different axial dimensions such as a tapered hole.

Optionally, the thickness of the intake hole 120 is about 2 mm to 20 mm, preferably 5 mm to 15 mm, for example 10 mm.

Optionally, for a process applicable to a silicon wafer having a diameter of 12 inches, the inner diameter of the first path 101 and the inner diameter of the intermediate path 111 are 6 mm to 60 mm, preferably 25 mm to 45 mm, more preferably 30 mm. ~ 40 mm, for example 38 mm.

In the present embodiment, the axes of the plurality of intake holes 120 are parallel to the axes of the intermediate path 111, but the present disclosure is not limited to this. In practical use, as shown in FIG. 5, a predetermined angle Θ is formed between the axes of the plurality of intake holes 120'and the axes of the intermediate path 111. In this way, the inner wall of the first path 101 can be effectively electrically insulated from the inner wall of the second path 21 to avoid ignition, and the process gas has an inclined intake hole 120'. After passing through, a disk-shaped magnetic field or a circulating magnetic field can be generated, so that the process gas can be sufficiently mixed.

Optionally, the predetermined angle Θ is preferably 30 ° to 89 °, more preferably 60 ° to 80 °.

A second embodiment of the present disclosure provides an upper electrode assembly. Since the technical features of the upper electrode assembly according to the second embodiment are the same as or similar to the technical features of the upper electrode assembly according to the first embodiment, description thereof will be omitted here. Hereinafter, only the contents of the second embodiment different from those of the first embodiment will be described.

In the present embodiment, the intake insulation structure 12 includes at least two intake holes, and each of the at least two intake holes includes at least one intake hole. The axis of the intake hole in the intake hole group is parallel to the axis of the intermediate path 111, or a predetermined angle is formed between the axis of the intake hole and the axis of the intermediate path 111. Further, the angles between the axes of the plurality of intake holes and the axes of the intermediate path 111 in different groups of intake holes are different, and / or the plurality of intake holes in different groups of intake holes have different radial directions. It has a cross-sectional shape. That is, the intake insulation structure 12 includes two or more intake hole groups having different inclination angles and / or radial cross-sectional shapes of the intake holes.

For example, as shown in FIG. 6, the intake insulation structure 12 includes at least two intake hole groups including a first intake hole group and a second intake hole group. The first intake hole group includes at least one first intake hole 121. The second intake hole group includes at least one second intake hole 122. The axis of the first intake hole 121 is parallel to the axis of the intermediate path 111, and a predetermined angle Θ is formed between the axis of the second intake hole 122 and the axis of the intermediate path 111. .. The predetermined angle Θ is preferably 30 ° to 89 °, more preferably 60 ° to 80 °.

By setting two types of intake holes having different inclination angles, the inner wall of the first path 101 can be effectively electrically insulated from the inner wall of the second path 21 to avoid ignition, and further, ignition can be avoided. Since the process gas flows in different directions after passing through the first intake hole 121 and the second intake hole 122, respectively, the process gas can be mixed more sufficiently.

Optionally, the radial cross-sectional shape of the first intake hole 121 and the radial cross-sectional shape of the second intake hole 122 may be the same or different. In addition, although the first intake hole 121 and the second intake hole 122 are both circular through holes, they may have different diameters.

As another example, with reference to FIGS. 7, 8a, 8b and 9, the intake insulation structure 12 includes at least two intake hole groups including a first intake hole group and a second intake hole group. The first intake hole group includes a plurality of first intake holes 121, and these first intake holes 121 are on at least two first circumferences centered on the axis of the intermediate path 111 and having different radii. It is distributed in. Each of the first intake holes 121 is a circular through hole.

As shown in FIGS. 8a and 8b, the plurality of first intake holes 121 are distributed on three first circumferences centered on the axis of the intermediate path 111 and having different radii. The three first circumferences are located in the central region, the intermediate region, and the peripheral region of the intermediate path 111, respectively, so that the first intake hole 121 is uniformly arranged along the radial direction of the intermediate path 111. Can be distributed.

Optionally, the radial distance between the two adjacent first circumferences is 3 mm to 10 mm, preferably 4 mm to 8 mm.

In practice, the number of first intake holes 121 on each first circumference may be freely set according to specific requirements. Optionally, the number of first intake holes 121 on the outermost first circumference is 5 to 20, preferably 8 to 15. The number of first intake holes 121 on the first circumference in the middle may be less than or equal to the number of first intake holes 121 on the outermost first circumference. Optionally, the number of first intake holes 121 on the first circumference in the middle is 5 to 20, preferably 8 to 15. The number of first intake holes 121 on the innermost first circumference may be less than or equal to the number of first intake holes 121 on the middle first circumference. Optionally, the number of first intake holes 121 on the innermost first circumference is 1 to 8, preferably 2 to 6.

In practice, the diameter of the first intake hole 121 on each first circumference may be freely set according to specific requirements. Optionally, the larger the radius of the first circumference on which the first intake holes 121 are located, the larger the diameter of these first intake holes 121. Specifically, the diameter of the first intake hole 121 on the outermost first circumference is the largest, and the diameter of the first intake hole 121 on the innermost first circumference is the smallest. In this way, the space of the intake insulation structure 12 can be fully utilized to increase the amount of process gas passing through the intake insulation structure 12 per unit time, whereby the process gas can be intake-insulated more quickly. It can be passed through the structure 12.

In practical use, the inclination angle of the first intake hole 121 on each first circumference may be freely set according to a specific requirement. Specifically, the axis of the first intake hole 121 on each first circumference is parallel to the axis of the intermediate path 111, or the first one on each first circumference. A predetermined angle Θ is formed between the axis of the intake hole 121 and the axis of the intermediate path 111. The predetermined angle Θ is preferably 30 ° to 89 °, more preferably 60 ° to 80 °.

Further, the inclination angles of the first intake holes 121 on the same first circumference may be the same or different. The inclination angles of the plurality of first intake holes 121 on the plurality of different first circumferences may be the same or different.

In the present embodiment, the first intake hole 121 is a circular through hole, but the present disclosure is not limited to this. In practical use, the radial cross-sectional shape of the first intake hole 121 may be square, elliptical, or polygonal.

As shown in FIGS. 8a, 8b and 9, the second intake hole group includes a plurality of second intake holes 122. These plurality of second intake holes 122 are distributed on the second circumference centered on the axis of the intermediate path 111. Each of the second intake holes 122 is a rectangular through hole, and the length of the radial cross-sectional shape of the rectangular through hole is arranged along the radial direction of the second circumference. In practical use, the radial cross-sectional shape of the second intake hole 122 may be an elongated ellipse or a quasi-rectangle with rounded corners.

Further, in the present embodiment, the two adjacent first intake holes 121 on the outermost first circumference and adjacent to each other on the outermost first circumference. A second intake hole 122 is provided between two adjacent first intake holes 121 on an intermediate first circumference corresponding to the first intake hole 121. Further, all the first intake holes 121 on the innermost first circumference are located inside the inner end of the second intake hole 122. In this way, the first intake holes 121 and the second intake holes 122 can be alternately arranged along the circumferential direction of the intermediate path 111, whereby the process gas can be sufficiently mixed. It will be possible.

Optionally, the second suction hole 122 is a rectangular through-hole, the radial cross-section of the area ^{1 mm} 2 to 20 mm ^2, preferably in the range of ^{5mm 2 ~15mm} 2.

In practical use, the inclination angle of the second intake hole 122 may be freely set according to a specific requirement. Specifically, the axis of the second intake hole 122 (parallel to the axis of the intermediate path) and the axis of the intermediate path 111 are parallel to each other, or the axis of the second intake hole 122. A predetermined angle Θ is formed between the shaft and the axis of the intermediate path 111. The predetermined angle Θ is preferably 30 ° to 89 °, more preferably 60 ° to 80 °.

Hereinafter, an example of the upper electrode assembly according to each of the above-described embodiments will be described with reference to FIGS. 2 and 3. The intake insulation structure 12 is embedded in the intermediate path 111, and the radial cross-sectional shape of the intermediate path 111 is circular. Further, the intermediate route 111 is divided into an entrance area and a main body area. The main body area communicates with the entrance area along a direction extending from the first path 101 to the second path 21. The diameter of the entrance area is larger than the diameter of the main body area. The intake insulation structure 12 includes a cylindrical body divided into a first area and a second area along the axis, and the outer diameter of the first area is larger than the outer diameter of the second area. In addition, the outer wall of the first area is compatible with the inner wall of the entrance area of intermediate path 111, and the outer wall of the second area is compatible with the inner wall of the main body area of intermediate path 111, and thus the intake insulation structure. 12 can be embedded in the intermediate path 111. This is convenient for positioning, installing, disassembling and cleaning the intake insulation structure 12.

In addition, the radial cross-sectional shape of the first path 101 is also circular, and the diameter of the first path 101 is smaller than the outer diameter of the first area of the intake insulation structure 12, so that the intake structure 10 is The intake insulation structure 12 can be pressed, which facilitates the improvement of a solid installation.

Another embodiment of the present disclosure provides a reaction chamber comprising a chamber body 3 and an upper electrode assembly according to any one of the above embodiments.

As shown in FIG. 10, the support base 33 is provided at the bottom of the chamber body 3 and is grounded, has a heating function, and is configured to support and heat the substrate.

The chamber body 3, the shower plate of the upper electrode assembly and the support base 33 form a process reaction zone 31 for realizing the ALD process. The dispersion grid of the process zone 32 is arranged on a part of the side wall of the chamber body 3 constituting the process reaction zone 31. The dispersion grid of the process zone 32 is configured to improve the uniformity of the process gas flow.

The first path 101, the first branch path 102, the second branch path 103, and the purge path 104 are provided on the side wall of the intake structure 10, and the first branch path 102, the second branch path 103, and the purge path 104 are provided. All purge paths 104 communicate with the first path 101. In one example, the first branch path 102, the second branch path 103, and the purge path 104 are located at different positions along the circumferential direction on the side wall of the intake structure 10, but they are all located at the same height. ing. An insulating block seal groove 112 is provided on the upper surface of the shower plate, and the insulating member 11 and the shower plate are sealed by a seal ring in the insulating block seal groove 112. A seal groove 105 for an intake manifold is provided on the lower surface of the intake structure 10, and the intake structure 10 and an insulating block are sealed by a seal ring in the seal groove 105 for the intake manifold.

Precursor A passes through the first branch path 102 and enters the first path 101, and precursor B passes through the second branch path 103 and enters the first path 101. The precursor A and the precursor B enter the process reaction zone 31 of the chamber body 3 after entering the reaction chamber. In the process reaction zone 31, the precursor A is adsorbed on the surface of the substrate. The inert gas then passes through the purge path 104 and into the first path 101, and further passes through the intake insulation structure, the intermediate path 111 and the shower plate into the process reaction zone 31 and remains a precursor. Purge body A. Finally, the RF generator 22 is switched on to generate the plasma of precursor B. This plasma reacts with the precursor A on the surface of the substrate to form a thin film. The above steps are continuously repeated throughout the process, and the thin film is repeatedly deposited on the substrate until the thickness of the obtained thin film meets the process requirements.

Yet another embodiment of the present disclosure provides an ALD device, more specifically, a capacitive PE-ALD device including a reaction chamber provided by the embodiments described above.

The objectives, technical solutions and beneficial effects of the present disclosure will be described in more detail by the specific embodiments described above. However, it should be understood that what is described above is only a specific embodiment of the present disclosure and is not intended to limit this disclosure. Any modifications, equivalents and improvements implemented within the spirit and principles of this disclosure should be included within the scope of protection of this disclosure.

In the embodiment, the terms used to indicate the directions such as "up", "down", "front", "rear", "left", and "right" indicate the directions based on the attached drawings. It is merely intended to limit the scope of protection of this disclosure. Throughout the accompanying drawings, the same elements are labeled with the same or similar reference numerals. Where the misunderstandings of this disclosure may arise, conventional structures or configurations are omitted.

Unless otherwise specified, the numerical parameters provided in the specification and the appended claims are approximations that may vary depending on the required properties obtained by the present disclosure. Specifically, it should be understood that all numbers representing the content of ingredients or reaction conditions herein and in the claims are modified by the word "about" in all circumstances. In general, number means that some embodiments include specific number variations such as ± 10%, ± 5%, ± 1%, or ± 0.5%.

Moreover, the term "include" does not exclude elements or steps not listed in the claims. The word "one (" a "or" an ")" preceded by an element does not preclude the existence of multiple such elements.

Sequence numbers such as "first," "second," and "third" in the specification and claims are intended to alter the corresponding element, but the modified element is arbitrary. It does not imply or indicate that it has a sequence number. Moreover, the sequence number does not indicate the sequence of the elements or the sequence of the manufacturing process of the elements, but is only intended to distinguish between two elements with the same name.

Similarly, to simplify the disclosure and help understand one or more aspects of the disclosure, the technical features of the disclosure are single in the above description of the exemplary embodiments of the disclosure. It should be understood that they may be categorized together in embodiments, accompanying drawings or descriptions thereof. However, the methods of this disclosure should not be construed as reflecting the intent that the requested disclosure requires more features than those expressly recorded in each claim. More precisely, as reflected in the appended claims, the disclosed aspects are less than all the technical features in the single embodiment described above. Therefore, the scope of claims according to the detailed description in the present specification is explicitly incorporated in the detailed description, and each claim itself is regarded as a single embodiment of the present disclosure.

Claims (17)

An upper electrode assembly comprising an intake structure with a first path and an upper electrode plate with a second path, wherein the process gas is introduced into the second path. The second path is configured to bring the process gas into the reaction chamber, and the upper electrode assembly is further configured between the upper electrode plate and the intake structure. The intake insulation assembly includes the arranged intake insulation assembly, and the inner wall of the first path is applied to the second path while the process gas is introduced into the second path from the first path. An upper electrode assembly that is configured to be electrically isolated from the inner wall of the path. The intake insulation assembly includes an insulating member disposed between the upper electrode plate and the intake structure, and an intermediate path is arranged in the insulating member.
The intermediate path communicates with each of the first path and the second path, and is configured to electrically insulate the inner wall of the first path from the inner wall of the second path. The upper electrode assembly according to claim 1, wherein the intake insulation structure is adopted. The intake insulation assembly
An insulating member arranged between the upper electrode plate and the intake structure is provided, and the insulating member is configured to electrically insulate the upper electrode plate from the intake structure, and an intermediate path is formed. The intake insulation assembly is further located on the insulating member and communicates with each of the first path and the second path.
The intake insulation structure includes an intake insulation structure arranged in the intermediate path, and the intake insulation structure is configured to electrically insulate the inner wall of the first path from the inner wall of the second path. The upper electrode assembly according to claim 1. The intake insulation structure includes at least one intake hole, the axis of the intake hole being parallel to the axis of the intermediate path, or the axis of the intake hole and the axis of the intermediate path. The upper electrode assembly according to claim 2 or 3, wherein a predetermined angle is formed between the two. A plurality of intake holes are provided, and the plurality of intake holes are distributed on at least one circumference centered on the axis of the intermediate path, or the plurality of intake holes are the intermediate. The upper electrode assembly according to claim 4, which is arranged in an array with respect to the radial cross section of the path. The intake insulation structure includes at least two intake hole groups, each intake hole group includes at least one intake hole, and the axis of the intake hole in the intake hole group is parallel to the axis of the intermediate path. There is, or a predetermined angle is formed between the axis of the intake hole and the axis of the intermediate path.
The angles between the axes of the intake holes in the different intake hole groups and the axes of the intermediate path are different, and / or the intake holes in the different intake hole groups are different. The upper electrode assembly according to claim 2 or 3, which has a radial cross-sectional shape. The intake insulation structure includes two intake holes, which are a first intake hole group and a second intake hole group.
The first intake hole group includes a plurality of intake holes distributed on at least two first circumferences, and the at least two first circumferences are centered on and different from the axis of the intermediate path. Each intake hole in the first intake hole group having a radius is a circular through hole.
The second intake hole group includes a plurality of intake holes distributed on a second circumference centered on the axis of the intermediate path, and each intake hole in the second intake hole group penetrates a rectangle. The upper electrode assembly according to claim 6, wherein the hole is a hole, and the length of the radial cross-sectional shape of the rectangular through hole is arranged along the radial direction of the second circumference. The upper electrode assembly according to claim 7, wherein the larger the radius of the first circumference where the intake hole is located in the first intake hole group, the larger the diameter of the intake hole. The upper electrode assembly according to claim 4, wherein the predetermined angle is in the range of 30 ° to 89 °. The upper electrode assembly according to claim 6, wherein the predetermined angle is in the range of 30 ° to 89 °. The upper electrode assembly according to claim 4, wherein the intake hole is a circular through hole, and the diameter of the circular through hole is in the range of 0.5 mm to 4 mm. The upper electrode assembly according to claim 7, wherein the diameter of the circular through hole is in the range of 0.5 mm to 4 mm. The area of the radial cross section of the rectangular through-holes ^is in the range of 1 mm 2 to 20 mm ^2, the upper electrode assembly according to claim 7. The upper electrode assembly according to claim 4, wherein the upper electrode plate is a shower plate provided with a spout, and the shaft of the intake hole and the shaft of the spout are alternately arranged. The upper electrode assembly according to claim 6, wherein the upper electrode plate is a shower plate provided with a spout, and the shaft of the intake hole and the shaft of the spout are alternately arranged. A reaction chamber comprising the upper electrode assembly according to any one of claims 1 to 15. An atomic layer deposition apparatus comprising the reaction chamber according to claim 16.

Images