JP2021163753A5 - - Google Patents
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- Publication number
- JP2021163753A5 JP2021163753A5 JP2021054601A JP2021054601A JP2021163753A5 JP 2021163753 A5 JP2021163753 A5 JP 2021163753A5 JP 2021054601 A JP2021054601 A JP 2021054601A JP 2021054601 A JP2021054601 A JP 2021054601A JP 2021163753 A5 JP2021163753 A5 JP 2021163753A5
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- sample
- particle beam
- roi
- irradiating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002245 particle Substances 0.000 claims 51
- 238000000034 method Methods 0.000 claims 17
- 230000001678 irradiating effect Effects 0.000 claims 10
- 230000003287 optical effect Effects 0.000 claims 4
- 238000003384 imaging method Methods 0.000 claims 3
- 239000013078 crystal Substances 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/835,218 | 2020-03-30 | ||
| US16/835,218 US11456149B2 (en) | 2020-03-30 | 2020-03-30 | Methods and systems for acquiring 3D diffraction data |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021163753A JP2021163753A (ja) | 2021-10-11 |
| JP2021163753A5 true JP2021163753A5 (https=) | 2024-02-27 |
| JP7489348B2 JP7489348B2 (ja) | 2024-05-23 |
Family
ID=75277788
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021054601A Active JP7489348B2 (ja) | 2020-03-30 | 2021-03-29 | ３ｄ回折データを取得するための方法およびシステム |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US11456149B2 (https=) |
| EP (1) | EP3889591B1 (https=) |
| JP (1) | JP7489348B2 (https=) |
| CN (1) | CN113466266B (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12259343B2 (en) * | 2019-09-20 | 2025-03-25 | The Regents Of The University Of California | Systems and methods for structurally characterizing compounds |
| US11815476B2 (en) * | 2021-03-30 | 2023-11-14 | Fei Company | Methods and systems for acquiring three-dimensional electron diffraction data |
| EP4632787A1 (en) * | 2024-04-10 | 2025-10-15 | Fei Company | Method for obtaining a tilt series of images of a sample at a plurality of tilt angles |
| EP4632786A1 (en) * | 2024-04-10 | 2025-10-15 | Fei Company | Method for obtaining a tilt series of images of a sample at a plurality of tilt angles |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6882477B1 (en) * | 1999-11-10 | 2005-04-19 | Massachusetts Institute Of Technology | Method and system for interference lithography utilizing phase-locked scanning beams |
| JP4164261B2 (ja) * | 2000-03-30 | 2008-10-15 | 独立行政法人科学技術振興機構 | 干渉計測装置 |
| US7230703B2 (en) * | 2003-07-17 | 2007-06-12 | Tokyo Electron Limited | Apparatus and method for measuring overlay by diffraction gratings |
| JP4807592B2 (ja) | 2005-02-21 | 2011-11-02 | 国立大学法人京都工芸繊維大学 | 電子顕微鏡及び複合照射レンズ |
| WO2007008792A2 (en) * | 2005-07-08 | 2007-01-18 | Nexgensemi Holdings Corporation | Apparatus and method for controlled particle beam manufacturing |
| GB0713276D0 (en) | 2007-07-09 | 2007-08-15 | Medical Res Council | Transmission electron microscope |
| US8350237B2 (en) * | 2010-03-31 | 2013-01-08 | Fei Company | Automated slice milling for viewing a feature |
| US8841613B2 (en) * | 2010-05-20 | 2014-09-23 | California Institute Of Technology | Method and system for 4D tomography and ultrafast scanning electron microscopy |
| EP2413345B1 (en) * | 2010-07-29 | 2013-02-20 | Carl Zeiss NTS GmbH | Charged particle beam system |
| JP2014082143A (ja) | 2012-10-18 | 2014-05-08 | Hitachi High-Technologies Corp | 電子顕微鏡 |
| WO2015029201A1 (ja) * | 2013-08-30 | 2015-03-05 | 株式会社日立製作所 | スピン検出器、及び荷電粒子線装置および光電子分光装置 |
| DE102014008105B4 (de) | 2014-05-30 | 2021-11-11 | Carl Zeiss Multisem Gmbh | Mehrstrahl-Teilchenmikroskop |
| NL2014994A (en) * | 2014-07-09 | 2016-04-12 | Asml Netherlands Bv | Inspection apparatus and methods, methods of manufacturing devices. |
| JP6677519B2 (ja) * | 2016-02-03 | 2020-04-08 | 日本電子株式会社 | 電子顕微鏡および収差測定方法 |
| US9978557B2 (en) * | 2016-04-21 | 2018-05-22 | Fei Company | System for orienting a sample using a diffraction pattern |
| US10347460B2 (en) | 2017-03-01 | 2019-07-09 | Dongfang Jingyuan Electron Limited | Patterned substrate imaging using multiple electron beams |
| WO2018172186A1 (en) * | 2017-03-20 | 2018-09-27 | Carl Zeiss Microscopy Gmbh | Charged particle beam system and method |
| DE102017205528B4 (de) * | 2017-03-31 | 2021-06-10 | Carl Zeiss Smt Gmbh | Vorrichtung und Verfahren für ein Rastersondenmikroskop |
| US20210305007A1 (en) * | 2020-03-30 | 2021-09-30 | Fei Company | Dual beam bifocal charged particle microscope |
| US11404241B2 (en) * | 2020-03-30 | 2022-08-02 | Fei Company | Simultaneous TEM and STEM microscope |
-
2020
- 2020-03-30 US US16/835,218 patent/US11456149B2/en active Active
-
2021
- 2021-03-25 EP EP21164764.9A patent/EP3889591B1/en active Active
- 2021-03-29 JP JP2021054601A patent/JP7489348B2/ja active Active
- 2021-03-29 CN CN202110331190.5A patent/CN113466266B/zh active Active
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