JP2021115498A - Aging device, processing system and aging method - Google Patents

Abstract

To provide a technology capable of reducing the initial dust emission of a filter while suppressing the used amount of a processing liquid.SOLUTION: In an aging device 2 having a first tank 40, a second tank 50, a first branch pipe 63 and a second branch pipe 64, the first branch pipe 63 and the second branch pipe 64 extend in parallel between the first tank 40 and the second tank 50; filters F1, F2 can be mounted on the routes of the first branch pipe 63 and the second branch pipe 64; a controller 80 executes that a processing liquid is sent from the first tank 40 to the second tank 50 through the first branch pipe 63 and the processing liquid is sent from the second tank 50 to the first tank 40 through the second branch pipe 64 alternately; and thereby, the initial dust emission of the filter can be reduced while suppressing the used amount of the processing liquid.SELECTED DRAWING: Figure 4

Description

The present invention relates to a technique for cleaning a filter for filtering a highly viscous treatment liquid before use.

Conventionally, in the manufacturing process of an organic EL display device or a liquid crystal display device, a coating device for applying a treatment liquid such as a photoresist to the surface of a substrate has been used. A conventional coating device is described in, for example, Patent Document 1. The coating apparatus of Patent Document 1 discharges a treatment liquid from a slit die having a slit-shaped discharge port to a substrate that is adsorbed and held on a stage that can move in the horizontal direction.

Japanese Unexamined Patent Publication No. 2018-43219

This type of coating apparatus includes a filter for removing foreign substances contained in the coating liquid before discharging and applying the treatment liquid. New filters are generally pre-cleaned with a cleaning solution. Therefore, even if a treatment liquid having the same viscosity as the cleaning liquid is passed through the filter, dust is not generated from the filter. However, when a high-viscosity treatment liquid is passed through a new filter, dust may be separated from the filter.

For this reason, in a coating apparatus using a high-viscosity treatment liquid, a so-called aging treatment is performed in which the treatment liquid is passed through the filter for a while after the filter is attached to the coating apparatus. The aging treatment may be carried out, for example, over a period of one day to two weeks. During this aging process, the coating device cannot perform the coating process on the substrate. As a result, the production efficiency of the coating apparatus is reduced. In addition, a large amount of expensive processing liquid is consumed.

The present invention has been made in view of such circumstances, and an object of the present invention is to provide a technique capable of reducing initial dust generation of a filter while suppressing the amount of treatment liquid used.

In order to solve the above problems, the first invention of the present application is an aging device for cleaning a filter for filtering a high-viscosity treatment liquid before use, the first tank, the second tank, and the first tank. A first flow path and a second flow path extending in parallel between the tank and the second tank, and a first flow path for sending the treatment liquid from the first tank to the second tank through the first flow path. The liquid feeding unit, the second liquid feeding unit that feeds the processing liquid from the second tank to the first tank through the second flow path, and the first liquid feeding unit and the second liquid feeding unit. , And a control unit that operates alternately, and the filter can be mounted on at least one of the first flow path and the second flow path.

The second invention of the present invention is the aging apparatus of the first invention, in which the first liquid feeding unit pushes out the processing liquid from the first tank by supplying a high-pressure gas into the first tank. The second liquid feeding unit pushes out the processing liquid from the second tank by supplying a high-pressure gas into the second tank.

The third invention of the present application is the aging apparatus of the second invention, further including a pressure adjusting unit for adjusting the pressure of the gas.

The fourth invention of the present application is an aging apparatus according to any one of the first to third inventions, and is a rinsing liquid having a viscosity lower than that of the treatment liquid in the first flow path and the second flow path. A rinse liquid supply unit for supplying the above-mentioned liquid is further provided.

The fifth invention of the present application is the aging apparatus of any one of the first to fourth inventions, and is a decompression unit that sucks gas from the first tank to lower the air pressure in the first tank. Further prepare.

The sixth invention of the present application is the aging apparatus of the fifth invention, further including a stirring mechanism for stirring the processing liquid in the first tank.

The seventh invention of the present application is an aging apparatus according to any one of the first to sixth inventions, the treatment liquid is a varnish containing a polyimide precursor, and the filter is a varnish coating apparatus. It is a filter to be attached to.

The eighth invention of the present application is a processing system, comprising the aging apparatus of the seventh invention and the coating apparatus, and the aging apparatus and the coating apparatus are separate bodies.

The ninth invention of the present application is an aging method for cleaning a filter for filtering a high-viscosity treatment liquid before use. A) The treatment liquid is transferred from a first tank to a second tank through a first flow path. And b) the step of sending the processing liquid from the second tank to the first tank through a second flow path different from the first flow path are alternately executed, and the first step is performed. The filter is installed in at least one of the flow path and the second flow path.

According to the first to ninth inventions of the present application, dust generated from a new filter is removed by using a treatment liquid having the same high viscosity as the environment in which the filter is used. Further, the liquid transfer of the treatment liquid from the first tank to the second tank and the liquid supply of the treatment liquid from the second tank to the first tank are alternately executed. As a result, the initial dust generation of the filter can be reduced while suppressing the amount of the treatment liquid used.

In particular, according to the second invention of the present application, dust generated from the liquid feeding portion can be suppressed as compared with the case where the liquid is fed by a pump provided in the flow path.

In particular, according to the third invention of the present application, the treatment liquid can be sent at a pressure equal to or higher than the usage environment of the filter. As a result, dust that may be generated in the environment in which the filter is used can be appropriately removed.

In particular, according to the fourth invention of the present application, fine bubbles in the filter can be removed by supplying the rinse liquid to the filter. Thereby, the liquid permeability of the filter can be improved.

In particular, according to the fifth invention of the present application, the treatment liquid in the first tank can be degassed by depressurizing.

In particular, according to the sixth invention of the present application, degassing of the treatment liquid in the first tank can be further promoted.

In particular, according to the eighth invention of the present application, the cleaning process of the filter can be advanced in a separate aging device without stopping the operation of the coating device.

It is the schematic which showed the structure of the coating apparatus. It is a perspective view of the coating unit. It is a block diagram which showed the connection between the 1st control part and each part in a coating apparatus. It is a figure which showed the structure of the aging apparatus. It is sectional drawing of the 1st mounting part and 1st filter. It is a block diagram which showed the connection between the 2nd control part and each part in an aging device. It is a flowchart which showed the flow of the process at the time of exchanging a 1st filter and a 2nd filter with a new filter. It is a figure which showed the structure of the aging apparatus which concerns on the 1st modification. It is a figure which showed the structure of the aging apparatus which concerns on the 2nd modification. It is a figure which showed the structure of the aging apparatus which concerns on 3rd modification. It is a figure which showed the structure of the aging apparatus which concerns on 4th modification. It is a figure which showed the structure of the aging apparatus which concerns on 5th modification.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

<1. About coating equipment>
FIG. 1 is a diagram showing a configuration of a coating device 1 included in a processing system according to an embodiment of the present invention. The coating device 1 is a device used in a manufacturing process of a polyimide film as a base material of a flexible display. In the process of manufacturing a polyimide film, first, in this coating device 1, a varnish, which is a high-viscosity treatment liquid containing a polyimide precursor (polyamic acid), is coated on the upper surface of a glass carrier substrate C. After that, the polyimide film is produced by performing treatments such as heating, depressurizing, and firing the varnish in another device.

As shown in FIG. 1, the coating device 1 of the present embodiment includes a liquid supply unit 10, a coating unit 20, and a first control unit 30.

The liquid supply unit 10 includes a supply tank 11, a first liquid supply pipe 12, a degassing tank 13, a second liquid supply pipe 14, a pressurizing mechanism 15, and a depressurizing mechanism 16.

The supply tank 11 is a container for storing the varnish before supply. The varnish stored in the supply tank 11 may be an unused varnish, or may be a varnish that has been used and then regenerated. As mentioned above, the varnish is a highly viscous treatment liquid. The viscosity of the varnish is, for example, about 1000 to 10000 cP (1 to 10 Pa · s). In the following description, "high viscosity" means a viscosity of 1000 cP (1 to 10 Pa · s) or more.

In the example of FIG. 1, the liquid supply unit 10 has one supply tank 11. However, the liquid supply unit 10 may have a plurality of supply tanks 11. In that case, it is sufficient that the plurality of supply tanks 11 are switchably connected to the first liquid supply pipe 12.

The first liquid supply pipe 12 is a pipe that connects the supply tank 11 and the degassing tank 13. The upstream end of the first liquid supply pipe 12 is connected to the supply tank 11. The downstream end of the first liquid supply pipe 12 is connected to the degassing tank 13. Further, a first liquid supply valve V11 and a first filter F1 are provided on the path of the first liquid supply pipe 12. When the first liquid supply valve V11 and the first pressurizing valve V21 described later are opened, the varnish in the supply tank 11 passes through the first liquid supply pipe 12 due to the pressure of the gas supplied from the pressurizing mechanism 15. It is sent to the degassing tank 13. At that time, the varnish is filtered by the first filter F1. As a result, fine dust contained in the varnish is collected and removed by the first filter F1.

In the example of FIG. 1, the liquid supply unit 10 has one first filter F1. However, the liquid supply unit 10 may have a plurality of first filters F1. In that case, a plurality of first filters F1 may be connected in parallel on the path of the first liquid supply pipe 12.

The degassing tank 13 is a container for reducing the dissolved amount of gas in the varnish. A decompression mechanism 16 described later is connected to the degassing tank 13. When the pressure reducing valve V23 of the pressure reducing mechanism 16 is opened to operate the pressure reducing pump 162, the internal space of the degassing tank 13 is depressurized, and the pressure inside the degassing tank 13 becomes a negative pressure lower than the atmospheric pressure. As a result, the dissolved gas contained in the varnish in the degassing tank 13 becomes bubbles. Further, a stirring mechanism 131 is provided in the degassing tank 13. When the stirring mechanism 131 is rotated, the varnish in the degassing tank 13 is stirred, and the bubbles in the varnish float toward the liquid surface of the varnish. The air bubbles after floating are removed by being sucked from the degassing tank 13 to the decompression mechanism 16. This reduces the amount of dissolved gas in the varnish.

As described above, in the coating apparatus 1 of the present embodiment, the dissolved gas contained in the varnish before coating is removed in advance. This makes it possible to prevent bubbles from being generated in the varnish when the varnish applied to the carrier substrate C is heated and fired in a subsequent step.

In the example of FIG. 1, the liquid supply unit 10 has one degassing tank 13. However, the liquid supply unit 10 may have a plurality of degassing tanks 13. In that case, a plurality of degassing tanks 13 may be interchangeably connected between the first liquid supply pipe 12 and the second liquid supply pipe 14.

The second liquid supply pipe 14 is a pipe that connects the degassing tank 13 and the coating unit 20. The upstream end of the second liquid supply pipe 14 is connected to the lower part of the degassing tank 13. The downstream end of the second liquid supply pipe 14 is connected to the third liquid supply pipe 23, which will be described later, of the coating unit 20. Further, a second liquid supply valve V12, a second filter F2, and an assist pump P1 are provided on the path of the second liquid supply pipe 14.

When the pressure reducing valve V23 is closed and the second liquid supply valve V12 and the second pressure valve V22, which will be described later, are opened, the varnish in the degassing tank 13 is released by the pressure of the gas supplied from the pressure mechanism 15. It is sent to the third liquid supply pipe 23 through the liquid supply pipe 14. At that time, by driving the assist pump P1, the liquid feeding force of the varnish is assisted. The second filter F2 is a filter having a smaller pore diameter (finer mesh) than the first filter F1. The varnish flowing through the second liquid supply pipe 14 is filtered by the second filter F2. As a result, fine dust contained in the varnish is collected and removed by the second filter F2.

In the example of FIG. 1, the liquid supply unit 10 has one second filter F2. However, the liquid supply unit 10 may have a plurality of second filters F2. In that case, a plurality of second filters F2 may be connected in parallel on the path of the second liquid supply pipe 14.

The pressurizing mechanism 15 is a mechanism for supplying pressure for sending liquid to the supply tank 11 and the degassing tank 13. As shown in FIG. 1, the pressurizing mechanism 15 includes a high-pressure gas supply source 151, a pressurizing pipe 152, a regulator 153, a first pressurizing valve V21, and a second pressurizing valve V22. The high-pressure gas supply source 151 is filled with a high-pressure gas (for example, nitrogen). The upstream end of the pressurizing pipe 152 is connected to the high pressure gas supply source 151. The regulator 153 is provided on the path of the pressurizing pipe 152. The downstream end of the pressurizing pipe 152 is branched into two and connected to the supply tank 11 and the degassing tank 13, respectively. The first pressure valve V21 and the second pressure valve V22 are provided in the two pressure pipes 152 after branching, respectively.

The gas supplied from the high-pressure gas supply source 151 is stepped down to a predetermined pressure higher than the atmospheric pressure by the regulator 153. When the second pressure valve V22 is closed and the first pressure valve V21 is opened, gas of the predetermined pressure is supplied from the pressure pipe 152 to the supply tank 11. As a result, the varnish is pushed out from the supply tank 11 to the first liquid supply pipe 12. When the first pressurizing valve V21 is closed and the second pressurizing valve V22 is opened, gas of the predetermined pressure is supplied from the pressurizing pipe 152 to the degassing tank 13. As a result, the varnish is pushed out from the degassing tank 13 to the second liquid supply pipe 14.

The decompression mechanism 16 is a mechanism for decompressing the inside of the degassing tank 13. As shown in FIG. 1, the pressure reducing mechanism 16 includes a pressure reducing pipe 161, a pressure reducing pump 162, and a pressure reducing valve V23. One end of the decompression pipe 161 is connected to the degassing tank 13. The other end of the pressure reducing pipe 161 is connected to an exhaust line in the factory. The pressure reducing valve V23 and the pressure reducing pump 162 are provided on the path of the pressure reducing pipe 161. When the pressure reducing valve V23 is opened and the pressure reducing pump 162 is operated, the gas in the degassing tank 13 is sucked into the exhaust line through the pressure reducing pipe 161. As a result, the air pressure in the degassing tank 13 decreases.

FIG. 2 is a perspective view of the coating unit 20. As shown in FIGS. 1 and 2, the coating unit 20 includes a stage 21, a slit nozzle 22, a third liquid supply pipe 23, a nozzle holding portion 24, and a traveling mechanism 25. In the following, for convenience of explanation, the moving direction of the slit nozzle 22 in the coating unit 20 is referred to as "front-back direction", and the horizontal direction orthogonal to the front-back direction is referred to as "left-right direction".

The stage 21 is a substantially rectangular parallelepiped holding table on which the carrier substrate C is placed and held. The stage 21 is formed of, for example, an integral stone material. The upper surface of the stage 21 is a flat substrate holding surface 211. The substrate holding surface 211 is provided with a large number of vacuum suction holes (not shown). When the carrier substrate C is placed on the substrate holding surface 211, the lower surface of the carrier substrate C is attracted to the substrate holding surface 211 by the suction force of the vacuum suction holes. As a result, the carrier substrate C is fixed on the stage 21 in a horizontal posture. Further, a plurality of lift pins (not shown) are provided inside the stage 21. When the carrier substrate C is carried out from the stage 21, a plurality of lift pins project onto the substrate holding surface 211. As a result, the carrier substrate C is separated from the substrate holding surface 211.

The slit nozzle 22 is a nozzle for discharging varnish. The slit nozzle 22 has a nozzle body 221 extending in the left-right direction. A slit-shaped discharge port 223 extending in the left-right direction is provided at the lower end of the nozzle body 221. The discharge port 223 faces the upper surface of the carrier substrate C mounted on the stage 21.

The third liquid supply pipe 23 is a pipe for supplying varnish to the slit nozzle 22. The upstream end of the third liquid supply pipe 23 is connected to the downstream end of the second liquid supply pipe 14 described above. The downstream end of the third liquid supply pipe 23 is connected to the slit nozzle 22. Further, a main pump P2 is provided on the path of the third liquid supply pipe 23. When the main pump P2 is operated, the varnish supplied from the second liquid supply pipe 14 is introduced into the slit nozzle 22. Then, the varnish is discharged from the discharge port 223 of the slit nozzle 22 toward the upper surface of the carrier substrate C.

The nozzle holding portion 24 is a mechanism for holding the slit nozzle 22 above the substrate holding surface 211. The nozzle holding portion 24 has a bridge portion 241 extending in the left-right direction above the stage 21, and a pair of support portions 242 that support both ends of the bridge portion 241. Further, the nozzle holding portion 24 has an elevating mechanism 243. When the elevating mechanism 243 is operated, the height of the cross-linked portion 241 changes. Thereby, the height of the slit nozzle 22 can be adjusted.

The traveling mechanism 25 is a mechanism for moving the slit nozzle 22 in the front-rear direction. The traveling mechanism 25 has a pair of rails 251 and a pair of linear motors 252. The pair of rails 251 extend in the front-rear direction near the left and right side portions of the stage 21. The pair of rails 251 function as linear guides that regulate the moving direction of the pair of support portions 242 in the front-rear direction. The pair of linear motors 252 move the pair of support portions 242 in the front-rear direction along the rail 251 by magnetic power. As a result, the slit nozzle 22 moves in the front-rear direction together with the nozzle holding portion 24.

When performing the coating process, the coating unit 20 discharges the varnish from the discharge port 223 while moving the slit nozzle 22 in the front-rear direction above the carrier substrate C. As a result, the varnish is applied to the upper surface of the carrier substrate C.

The first control unit 30 is a means for controlling the operation of each unit in the coating device 1. FIG. 3 is a block diagram showing the connection between the first control unit 30 and each unit in the coating device 1. The first control unit 30 is realized by, for example, a computer. As conceptually shown in FIG. 3, the first control unit 30 includes a processor 31 such as a CPU, a memory 32 such as a RAM, and a storage unit 33 such as a hard disk drive. Further, the first control unit 30 includes the above-mentioned stirring mechanism 131, regulator 153, pressure reducing pump 162, first liquid supply valve V11, second liquid supply valve V12, first pressure valve V21, second pressure valve V22, and the like. It is electrically connected to each part in the liquid supply unit 10 such as the assist pump P1. Further, the first control unit 30 is also electrically connected to each part in the coating unit 20 such as the lift pin, the main pump P2, the elevating mechanism 243, and the linear motor 252 described above.

The first control unit 30 temporarily reads the computer program and data stored in the storage unit 33 into the memory 32, and the processor 31 performs arithmetic processing based on the computer program and data, whereby the coating device 1 The operation of each part inside is controlled. As a result, the coating process on the carrier substrate C proceeds.

<2. About aging equipment>
FIG. 4 is a diagram showing a configuration of an aging device 2 used together with the above-mentioned coating device 1. If the new first filter F1 and second filter F2 are attached to the liquid supply unit 10 of the coating device 1 as they are, dust (hereinafter referred to as "initial dust") is separated from these filters F1 and F2 after the start of use. In some cases. Therefore, in the processing system of the present embodiment, the new first filter F1 and second filter F2 are washed in advance in the aging device 2 before being used in the coating device 1.

As shown in FIG. 4, the aging device 2 includes a first tank 40, a second tank 50, a piping unit 60, a pressurizing mechanism 70, and a second control unit 80.

The first tank 40 and the second tank 50 are containers for storing varnish for cleaning the filters F1 and F2. The first tank 40 and the second tank 50 are separate tanks from each other. Further, the first tank 40 and the second tank 50 are pressure-resistant airtight containers that can withstand the pressurization by the pressurizing mechanism 70 described later. The first tank 40 is connected to the varnish supply source 42 via the supply pipe 41. When the supply valve V30 provided on the path of the supply pipe 41 is opened, the varnish is supplied from the varnish supply source 42 to the first tank 40 through the supply pipe 41.

The varnish supplied from the varnish supply source 42 is the same treatment liquid as the varnish used in the coating apparatus 1 described above. Therefore, the viscosity of the varnish supplied from the varnish supply source 42 is the same as the viscosity of the varnish used in the coating apparatus 1.

The piping unit 60 includes a first main pipe 61, a second main pipe 62, a first branch pipe 63, and a second branch pipe 64.

One end of the first main pipe 61 is connected to the lower part of the first tank 40. One end of the first branch pipe 63 and the second branch pipe 64 is connected to the other end of the first main pipe 61. The other ends of the first branch pipe 63 and the second branch pipe 64 are connected to one end of the second main pipe 62. The other end of the second main pipe 62 is connected to the lower part of the second tank 50. That is, the first branch pipe 63 and the second branch pipe 64 extend in parallel between the first tank 40 and the second tank 50. The first branch pipe 63 is an example of the “first flow path” in the present invention. The second branch pipe 64 is an example of the "second flow path" in the present invention.

A first switching valve V31 and a second switching valve V32 are provided on the path of the first branch pipe 63. Further, the first branch pipe 63 has a first mounting portion 65 to which the first filter F1 can be mounted between the first switching valve V31 and the second switching valve V32. A third switching valve V33 and a fourth switching valve V34 are provided on the path of the second branch pipe 64. Further, the second branch pipe 64 has a second mounting portion 66 to which the second filter F2 can be mounted between the third switching valve V33 and the fourth switching valve V34.

The pressurizing mechanism 70 is a mechanism for supplying pressure for sending liquid to the first tank 40 and the second tank 50. As shown in FIG. 4, the pressurizing mechanism 70 includes a high-pressure gas supply source 71, a pressurizing pipe 72, a regulator 73, a fifth switching valve V35, and a sixth switching valve V36. The high-pressure gas supply source 71 is filled with a high-pressure gas (for example, nitrogen). The upstream end of the pressure pipe 72 is connected to the high pressure gas supply source 71. The regulator 73 is provided on the path of the pressurizing pipe 72. The downstream end of the pressure pipe 72 is branched into two and connected to the first tank 40 and the second tank 50, respectively. The fifth switching valve V35 and the sixth switching valve V36 are provided in the two pressure pipes 72 after branching, respectively.

The gas supplied from the high-pressure gas supply source 71 is stepped down to a predetermined pressure higher than the atmospheric pressure by the regulator 73. When the sixth switching valve V36 is closed and the fifth switching valve V35 is opened, gas at the predetermined pressure is supplied from the pressurizing pipe 72 to the first tank 40. As a result, the varnish is pushed out from the first tank 40 to the first main pipe 61. When the fifth switching valve V35 is closed and the sixth switching valve V36 is opened, gas of the predetermined pressure is supplied from the pressurizing pipe 72 to the second tank 50. As a result, the varnish is pushed out from the second tank 50 to the second main pipe 62.

That is, in the present embodiment, the pressurizing mechanism 70 has a function of a first liquid feeding unit that sends varnish from the first tank 40 to the second tank 50, and a second that sends the varnish from the second tank 50 to the first tank 40. It also has the function of a liquid feeding unit.

FIG. 5 is a cross-sectional view of the first mounting portion 65 and the first filter F1 mounted on the first mounting portion 65. As shown in FIG. 5, the first mounting portion 65 has a holder 650 to which the first filter F1 can be connected.

The first filter F1 has a housing 91, a filter cartridge 92, and a cover 93. The housing 91 is a cylindrical housing extending in the vertical direction. The filter cartridge 92 is housed inside the housing 91. The cover 93 covers the outer surface of the housing 91. The cover 93 is made of a material that is more rigid than the housing 91, such as metal. As a result, the deformation of the housing 91 is suppressed.

The filter cartridge 92 has a filter body 921 and an upper lid 922. The filter body 921 has a cylindrical outer shape extending in the vertical direction. The filter body 921 is formed of resin fibers such as polypropylene, polyethylene, and PTFE (Poly Tetra Fluoro Ethylene). However, the filter body 921 may be made of a material other than resin. The upper lid 922 covers the upper part of the filter body 921.

An inflow port 911 and an outflow port 912 are provided at the bottom of the housing 91. The inflow port 911 communicates with the space outside the filter cartridge 92 in the internal space of the housing 91. The outlet 912 communicates with the internal space of the filter cartridge 92 in the internal space of the housing 91.

The holder 650 has an inflow connection hole 651 and an outflow connection hole 652. The inflow connection hole 651 and the outflow connection hole 652 are through holes that penetrate the holder 650 in the vertical direction, respectively. The inflow connection hole 651 is connected to the first branch pipe 63 on the upstream side. The outflow connection hole 652 is connected to the first branch pipe 63 on the downstream side. Further, when the first filter F1 is mounted on the first mounting portion 65, the above-mentioned inflow port 911 is connected to the inflow connection hole 651, and the above-mentioned outflow port 912 is connected to the outflow connection hole 652.

Therefore, when the varnish flows through the first branch pipe 63, the varnish is introduced from the inflow connection hole 651 to the inside of the housing 91 via the inflow port 911. Then, the varnish passes through the filter body 921 as shown by the broken line arrow in FIG. Further, the varnish that has passed through the filter main body 921 flows out from the inside of the filter main body 921 through the outflow port 912 and the outflow connection hole 652 to the first branch pipe 63 on the downstream side.

Further, as shown in FIG. 5, a first exhaust pipe 94 is connected to the upper part of the housing 91. The air bubbles accumulated in the upper part of the housing 91 are discharged to the exhaust line in the factory through the first exhaust pipe 94. A second exhaust pipe 95 is connected to the upper part of the filter cartridge 92. The air bubbles accumulated in the upper part of the filter cartridge 92 are discharged to the exhaust line in the factory through the second exhaust pipe 95.

Since the structures of the second mounting portion 66 and the second filter F2 are the same as the structures of the first mounting portion 65 and the first filter F1, duplicate description will be omitted.

The second control unit 80 is a means for controlling the operation of each unit in the aging device 2. FIG. 6 is a block diagram showing the connection between the second control unit 80 and each unit in the aging device 2. The second control unit 80 is realized by, for example, a computer. As conceptually shown in FIG. 6, the second control unit 80 includes a processor 81 such as a CPU, a memory 82 such as a RAM, and a storage unit 83 such as a hard disk drive. Further, the second control unit 80 includes the supply valve V30, the first switching valve V31, the second switching valve V32, the third switching valve V33, the fourth switching valve V34, the fifth switching valve V35, and the sixth switching valve V36 described above. , Regulator 73, etc., are electrically connected to each part in the aging device 2.

The second control unit 80 temporarily reads the computer program and data stored in the storage unit 83 into the memory 82, and the processor 81 performs arithmetic processing based on the computer program and data, whereby the aging device 2 The operation of each part inside is controlled. As a result, the cleaning process of the first filter F1 and the second filter F2 proceeds.

<3. Cleaning and replacement of filters ＞
Subsequently, in the processing system including the coating device 1 and the aging device 2, the flow of processing when the first filter F1 and the second filter F2 are replaced with new filters is described with reference to the flowchart of FIG. explain.

The replacement time of the first filter F1 and the second filter F2 is set in advance in the first control unit 30 of the coating device 1. In this example, it is assumed that the first filter F1 and the second filter F2 are exchanged at the same timing. As shown in FIG. 7, the first control unit 30 constantly monitors whether or not the first filter F1 and the second filter F2 are replaced within a predetermined time (for example, 24 hours before) while executing the coating process. (Step S11: no).

When a predetermined time before the replacement time comes (step S11: yes), the first control unit 30 notifies the operator that it is before the predetermined time by screen display, voice, or the like (step S12). Upon confirming the notification, the operator attaches the new first filter F1 to the first mounting portion 65 of the aging device 2, and mounts the new second filter F2 to the second mounting portion 66 of the aging device 2. (Step S21). Then, the operation of the aging device 2 is started.

The second control unit 80 of the aging device 2 first opens the supply valve V30. As a result, the varnish for cleaning is supplied from the varnish supply source 42 to the first tank 40 (step S22). When a predetermined amount of varnish is stored in the first tank 40, the second control unit 80 closes the supply valve V30.

Next, the second control unit 80 opens the first switching valve V31, the second switching valve V32, and the fifth switching valve V35. Then, the high-pressure gas is supplied from the pressure pipe 72 to the first tank 40. As a result, the varnish in the first tank 40 is pushed out to the first main pipe 61. Then, as shown by the broken line arrow A1 in FIG. 4, the varnish is sent from the first main pipe 61 to the second tank 50 through the first branch pipe 63 and the second main pipe 62 (step S23).

In this step S23, the varnish passes through the first filter F1. Therefore, when the initial dust is present on the downstream surface of the first filter F1, the initial dust separates from the downstream surface of the first filter F1 and flows to the second tank 50 together with the varnish.

Subsequently, the second control unit 80 closes the first switching valve V31, the second switching valve V32, and the fifth switching valve V35, and the third switching valve V33, the fourth switching valve V34, and the sixth switching valve V36. To open. Then, the high-pressure gas is supplied from the pressure pipe 72 to the second tank 50. As a result, the varnish in the second tank 50 is pushed out to the second main pipe 62. Then, as shown by the broken line arrow A2 in FIG. 4, the varnish is sent from the second main pipe 62 to the first tank 40 through the second branch pipe 64 and the first main pipe 61 (step S24).

In this step S24, the varnish passes through the second filter F2. Therefore, the above-mentioned initial dust separated from the first filter F1 is received on the surface on the upstream side of the second filter F2. Since the pore size of the second filter F2 is sufficiently smaller than the particle size of the initial dust, the initial dust does not pass through the second filter F2. Further, when the initial dust adheres to the surface on the downstream side of the second filter F2, the initial dust separates from the surface on the downstream side of the second filter F2 and flows to the first tank 40 together with the varnish.

After that, the second control unit 80 transfers the varnish from the first tank 40 to the second tank 50 and the varnish from the second tank 50 to the first tank 40 a predetermined number of times. It is determined whether or not it has been executed (step S25). Then, when the predetermined number of times has not been reached (step S25: no), the liquid feeding process of steps S23 to S24 described above is executed again.

The above-mentioned initial dust separated from the second filter F2 is received on the upstream surface of the first filter F1 in the second and subsequent steps S23. Since the pore size of the first filter F1 is sufficiently smaller than the particle size of the initial dust, the initial dust does not pass through the first filter F1.

Eventually, when the liquid feeding process for a predetermined number of times is completed (step S25: yes), the second control unit 80 stops the operation of the aging device 2. Then, the cleaned first filter F1 is removed from the first mounting portion 65, and the cleaned second filter F2 is removed from the second mounting portion 66 (step S26).

On the other hand, the first control unit 30 of the coating device 1 stops the operation of the coating device 1 at a good timing after the cleaning processing of the first filter F1 and the second filter F2 in the aging device 2 is completed (step). S13). Then, the first filter F1 on the first liquid supply pipe 12 is replaced with the first filter F1 cleaned in the aging device 2. Further, the second filter F2 on the second liquid supply pipe 14 is replaced with the second filter F2 cleaned in the aging device 2 (step S14).

After the replacement of the first filter F1 and the second filter F2 is completed, the first control unit 30 restarts the operation of the coating device 1 (step S15).

As described above, the aging device 2 cleans the new first filter F1 and second filter F2 using a varnish having the same high viscosity as the environment in which the first filter F1 and the second filter F2 are used. Therefore, the initial dust generated from the first filter F1 and the second filter F2 can be satisfactorily removed. Further, in the aging device 2, the varnish liquid is sent from the first tank 40 to the second tank 50 and the varnish is sent from the second tank 50 to the first tank 40 alternately. As a result, the initial dust generation of the first filter F1 and the second filter F2 can be reduced while suppressing the amount of varnish used.

In particular, the aging device 2 is a device separate from the coating device 1 that uses the first filter F1 and the second filter F2. Therefore, the cleaning process of the first filter F1 and the second filter F2 can proceed in the separate aging device 2 without stopping the operation of the coating device 1. Therefore, the down period of the coating device 1 can be shortened and the production efficiency can be improved.

The regulator 73 of the aging device 2 is an example of the “pressure adjusting unit” in the present invention. It is desirable that the pressure of the gas adjusted by the regulator 73 is equal to or higher than the pressure of the gas adjusted by the regulator 153 of the coating device 1. Then, the initial dust that may be generated in the usage environment of the first filter F1 and the second filter F2 can be appropriately removed.

<4. Modification example>
Although one embodiment of the present invention has been described above, the present invention is not limited to the above embodiment. Hereinafter, various modifications will be described focusing on the differences from the above-described embodiment.

<4-1. First modification>
FIG. 8 is a diagram showing the configuration of the aging device 2 according to the first modification. The aging device 2 of FIG. 8 is different from the above embodiment in that it includes a rinse liquid supply unit 100 and a rinse liquid discharge unit 110.

As shown in FIG. 8, the rinse liquid supply unit 100 has a rinse liquid supply pipe 101 and a rinse liquid supply source 102. The upstream end of the rinse liquid supply pipe 101 is connected to the rinse liquid supply source 102. The downstream end of the rinse liquid supply pipe 101 is connected to the first main pipe 61. Further, a seventh switching valve V37 is provided on the path of the rinse liquid supply pipe 101.

The rinse liquid discharge unit 110 includes a rinse liquid discharge pipe 111 and a drain tank 112. The upstream end of the rinse liquid discharge pipe 111 is connected to the second main pipe 62. The downstream end of the rinse liquid discharge pipe 111 is connected to the drain tank 112. Further, an eighth switching valve V38 is provided on the path of the rinse liquid discharge pipe 111.

Further, in the example of FIG. 8, the ninth switching valve V39 is provided at a position on the first tank 40 side of the first main pipe 61 with respect to the connection portion with the rinse liquid supply pipe 101. Further, the tenth switching valve V40 is provided at a position on the second tank 50 side of the connection portion of the second main pipe 62 with the rinse liquid discharge pipe 111.

In the aging device 2 of this modified example, the rinse liquid is fed before the varnish is fed. Specifically, first, the 9th switching valve V39 and the 10th switching valve V40 are closed, and the 1st switching valve V31, the 2nd switching valve V32, the 3rd switching valve V33, the 4th switching valve V34, and the 7th switching valve are closed. The valve V37 and the eighth switching valve V38 are opened. Then, as shown by the broken arrow in FIG. 8, from the rinse liquid supply source 102, the rinse liquid supply pipe 101, the first main pipe 61, the first branch pipe 63, the second branch pipe 64, and the second main pipe 62, And the rinse liquid flows to the drain tank 112 through the rinse liquid discharge pipe 111. At that time, the rinse liquid passes through the first filter F1 and the second filter F2.

The rinse liquid is a liquid having a lower viscosity than the varnish. Therefore, by passing the rinsing liquid before the varnish, fine bubbles contained in the new first filter F1 and second filter F2 are removed. Thereby, the liquid permeability of the first filter F1 and the second filter F2 can be improved. Therefore, the first filter F1 and the second filter F2 can be better cleaned by the varnish sent thereafter.

<4-2. Second modification>
FIG. 9 is a diagram showing the configuration of the aging device 2 according to the second modification. The aging device 2 of FIG. 9 is different from the above embodiment in that it includes a decompression unit 120.

As shown in FIG. 9, the decompression unit 120 includes a decompression pipe 121, a decompression pump 122, and a decompression valve V41. One end of the pressure reducing pipe 121 is connected to the first tank 40. The other end of the pressure reducing pipe 121 is connected to an exhaust line in the factory. The pressure reducing valve V41 and the pressure reducing pump 122 are provided on the path of the pressure reducing pipe 121. When the pressure reducing valve V41 is opened and the pressure reducing pump 122 is operated, the gas in the first tank 40 is sucked into the exhaust line through the pressure reducing pipe 121. As a result, the pressure in the first tank 40 becomes a negative pressure lower than the atmospheric pressure.

When the internal space of the first tank 40 is depressurized, the dissolved gas contained in the varnish in the first tank 40 becomes bubbles. Further, in the example of FIG. 9, a stirring mechanism 43 is provided in the first tank 40. When the stirring mechanism 43 is rotated, the varnish in the first tank 40 is stirred, and the bubbles in the varnish float toward the liquid surface of the varnish. The air bubbles after levitation are sucked from the first tank 40 through the pressure reducing pipe 121 to the exhaust line. This reduces the amount of dissolved gas in the varnish.

In the aging device 2 of this modified example, after storing the varnish in the first tank 40, first, the varnish is degassed by using the decompression unit 120 and the stirring mechanism 43. Then, the first filter F1 and the second filter F2 are washed using the degassed varnish. By doing so, it is possible to suppress foaming of the first filter F1 and the second filter F2 during cleaning. Therefore, the first filter F1 and the second filter F2 can be cleaned better.

<4-3. Third variant>
FIG. 10 is a diagram showing the configuration of the aging device 2 according to the third modification. The aging device 2 of FIG. 10 is different from the above embodiment in that the second branch pipe 64 is provided with a dust collecting filter F3 instead of the second mounting portion 66.

The dust collecting filter F3 is not a filter used in the coating device 1, but a filter for collecting initial dust generated from the first filter F1 and the second filter F2. In the aging device 2 of this modification, the initial dust separated from the first filter F1 in step S23 described above is collected by the dust collecting filter F3 in step S24. When the cleaning process of the first filter F1 is completed, the second filter F2 is attached to the first mounting portion 65 in place of the first filter F1 to perform the cleaning process of the second filter F2. The initial dust separated from the second filter F2 is also collected by the dust collecting filter F3.

In this way, it is not necessary to receive the initial dust on the surface on the upstream side of the first filter F1 and the second filter F2. Therefore, since it is not necessary to bring the initial dust into the coating device 1, the reliability of the first filter F1 and the second filter F2 is further improved.

<4-4. Fourth modification>
FIG. 11 is a diagram showing the configuration of the aging device 2 according to the fourth modification. The aging device 2 of FIG. 11 differs from the above embodiment in that it has a plurality of first branch pipes 63 and a plurality of second branch pipes 64, respectively.

The plurality of first branch pipes 63 are connected in parallel with each other. Further, the plurality of second branch pipes 64 are also connected in parallel with each other. In this way, when a plurality of the first filter F1 and the second filter F2 are used in the coating apparatus 1, the plurality of first filters F1 and the plurality of second filters F2 are collectively used. Can be washed. Therefore, the cleaning / replacement processing of the first filter F1 and the second filter F2 can be performed more efficiently.

<4-5. Fifth variant>
FIG. 12 is a diagram showing the configuration of the aging device 2 according to the fifth modification. The aging device 2 of FIG. 12 differs from the above embodiment in that it does not have the first main pipe 61 and the second main pipe 62.

In the aging device 2 of this modified example, one end of the first branch pipe 63 and the second branch pipe 64 is directly connected to the first tank 40. Further, the other ends of the first branch pipe 63 and the second branch pipe 64 are directly connected to the second tank 50. Even with such a configuration, the first filter F1 and the second filter F2 can be cleaned by the same processing as in FIG. 7 described above.

<4-6. Other variants>
In the above embodiment, the varnish liquid from the first tank 40 to the second tank 50 and the varnish liquid from the second tank 50 to the first tank 40 are both gas by the pressurizing mechanism 70. It was done by the pressure of. However, a pump may be provided as a first liquid feeding unit on the path of the first branch pipe 63. Further, a pump as a second liquid feeding unit may be provided on the path of the second branch pipe 64. Then, the varnish may be fed at the pressure of these pumps. However, if the gas pressure is used as in the above embodiment, dust generation due to the pump can be prevented. Therefore, the varnish can be sent in a cleaner state.

Further, in the above embodiment, the first control unit 30 of the coating device 1 monitors whether or not it is a predetermined time before the replacement time of the first filter F1 and the second filter F2. However, the first control unit 30 does not determine whether or not the replacement time of the first filter F1 and the second filter F2 has come before a predetermined time, and the user of the coating device 1 may manage the time. ..

Further, the aging device 2 of the above embodiment was a device for cleaning the filter used in the coating device 1. However, the aging device of the present invention may be used to clean the filter used in a device that performs a treatment other than coating.

Further, in the above embodiment, the treatment liquid was a varnish containing a polyimide precursor. However, the treatment liquid of the present invention may be a treatment liquid having a high viscosity other than varnish.

Further, the first filter F1 and the second filter F2 may have a structure different from that of FIG.

Further, the details of the aging device and the coating device may be different from the configurations shown in the respective figures of the present application. Further, the elements appearing in the above-described embodiments and modifications may be appropriately combined as long as there is no contradiction.

1 Coating device 2 Aging device 10 Liquid supply unit 20 Coating unit 30 1st control unit 40 1st tank 43 Stirring mechanism 50 2nd tank 60 Piping unit 61 1st main piping 62 2nd main piping 63 1st branch piping 64 2nd Branch piping 65 1st mounting part 66 2nd mounting part 70 Pressurizing mechanism 73 Regulator 80 2nd control part 100 Rinse liquid supply part 110 Rinse liquid discharge part 120 Decompression part C Carrier board F1 1st filter F2 2nd filter F3 Dust collection Filter for

Claims (9)

An aging device that cleans the filter for filtering high-viscosity treatment liquid before use.
1st tank and
With the second tank
A first flow path and a second flow path extending in parallel between the first tank and the second tank,
A first liquid feeding unit that feeds the processing liquid from the first tank to the second tank through the first flow path,
A second liquid feeding unit that feeds the processing liquid from the second tank to the first tank through the second flow path,
A control unit that alternately operates the first liquid feeding unit and the second liquid feeding unit,
With
An aging device capable of mounting the filter on at least one of the first flow path and the second flow path. The aging device according to claim 1.
The first liquid feeding unit pushes out the processing liquid from the first tank by supplying a high-pressure gas into the first tank.
The second liquid feeding unit is an aging device that pushes out the processing liquid from the second tank by supplying a high-pressure gas into the second tank. The aging device according to claim 2.
An aging device further comprising a pressure adjusting unit for adjusting the pressure of the gas. The aging device according to any one of claims 1 to 3.
An aging apparatus further comprising a rinse liquid supply unit for supplying a rinse liquid having a viscosity lower than that of the treatment liquid to the first flow path and the second flow path. The aging device according to any one of claims 1 to 4.
An aging device further comprising a decompression unit that sucks gas from the first tank and lowers the air pressure in the first tank. The aging device according to claim 5.
An aging device further comprising a stirring mechanism for stirring the processing liquid in the first tank. The aging device according to any one of claims 1 to 6.
The treatment liquid is a varnish containing a polyimide precursor.
The filter is an aging device that is a filter to be attached to the varnish coating device. The aging device according to claim 7 and
With the coating device
With
A processing system in which the aging device and the coating device are separate bodies. An aging method in which a filter for filtering a high-viscosity treatment liquid is washed before use.
a) The process of sending the processing liquid from the first tank to the second tank through the first flow path,
b) A step of sending the treatment liquid from the second tank to the first tank through a second flow path different from the first flow path.
Alternately
An aging method in which the filter is installed in at least one of the first flow path and the second flow path.

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