JP2021075779A - 積層膜構造体及びその製造方法 - Google Patents

積層膜構造体及びその製造方法 Download PDF

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Publication number
JP2021075779A
JP2021075779A JP2020140980A JP2020140980A JP2021075779A JP 2021075779 A JP2021075779 A JP 2021075779A JP 2020140980 A JP2020140980 A JP 2020140980A JP 2020140980 A JP2020140980 A JP 2020140980A JP 2021075779 A JP2021075779 A JP 2021075779A
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Japan
Prior art keywords
thin film
film
substrate
nitride
less
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Pending
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JP2020140980A
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English (en)
Japanese (ja)
Inventor
裕也 土田
Hironari Tsuchida
裕也 土田
祐也 末本
Yuya SUEMOTO
祐也 末本
義弘 上岡
Yoshihiro Kamioka
義弘 上岡
雅実 召田
Masami Meshida
雅実 召田
倉持　豪人
Toshihito Kuramochi
豪人 倉持
貴弘 長田
Takahiro Osada
貴弘 長田
リウエン サン
li-wen Sang
リウエン サン
知京　豊裕
Toyohiro Chikyo
豊裕 知京
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute for Materials Science
Tosoh Corp
Original Assignee
National Institute for Materials Science
Tosoh Corp
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Publication date
Application filed by National Institute for Materials Science, Tosoh Corp filed Critical National Institute for Materials Science
Priority to PCT/JP2020/040216 priority Critical patent/WO2021085411A1/ja
Priority to CN202080075909.7A priority patent/CN114651084A/zh
Priority to EP20883221.2A priority patent/EP4052899A4/en
Priority to KR1020227015088A priority patent/KR20220092518A/ko
Priority to TW109137626A priority patent/TW202118884A/zh
Publication of JP2021075779A publication Critical patent/JP2021075779A/ja
Pending legal-status Critical Current

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  • Recrystallisation Techniques (AREA)
  • Led Devices (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP2020140980A 2019-10-31 2020-08-24 積層膜構造体及びその製造方法 Pending JP2021075779A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
PCT/JP2020/040216 WO2021085411A1 (ja) 2019-10-31 2020-10-27 積層膜構造体及びその製造方法
CN202080075909.7A CN114651084A (zh) 2019-10-31 2020-10-27 层叠膜结构体和其制造方法
EP20883221.2A EP4052899A4 (en) 2019-10-31 2020-10-27 MULTI-LAYER FILM STRUCTURE AND METHOD OF MAKING THEREOF
KR1020227015088A KR20220092518A (ko) 2019-10-31 2020-10-27 적층막 구조체 및 그 제조 방법
TW109137626A TW202118884A (zh) 2019-10-31 2020-10-29 積層膜結構體、半導體元件、電子設備、及積層膜結構體的製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019198886 2019-10-31
JP2019198886 2019-10-31

Publications (1)

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JP2021075779A true JP2021075779A (ja) 2021-05-20

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JP2020140980A Pending JP2021075779A (ja) 2019-10-31 2020-08-24 積層膜構造体及びその製造方法

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JP (1) JP2021075779A (zh)
TW (1) TW202118884A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023058706A1 (ja) 2021-10-08 2023-04-13 東ソー株式会社 積層体及びその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023058706A1 (ja) 2021-10-08 2023-04-13 東ソー株式会社 積層体及びその製造方法

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TW202118884A (zh) 2021-05-16

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