JP2021039302A5 - - Google Patents

Download PDF

Info

Publication number
JP2021039302A5
JP2021039302A5 JP2019161966A JP2019161966A JP2021039302A5 JP 2021039302 A5 JP2021039302 A5 JP 2021039302A5 JP 2019161966 A JP2019161966 A JP 2019161966A JP 2019161966 A JP2019161966 A JP 2019161966A JP 2021039302 A5 JP2021039302 A5 JP 2021039302A5
Authority
JP
Japan
Prior art keywords
width
novolac
sio
etching
adhesion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2019161966A
Other languages
English (en)
Japanese (ja)
Other versions
JP7427885B2 (ja
JP2021039302A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2019161966A priority Critical patent/JP7427885B2/ja
Priority claimed from JP2019161966A external-priority patent/JP7427885B2/ja
Publication of JP2021039302A publication Critical patent/JP2021039302A/ja
Publication of JP2021039302A5 publication Critical patent/JP2021039302A5/ja
Application granted granted Critical
Publication of JP7427885B2 publication Critical patent/JP7427885B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2019161966A 2019-09-05 2019-09-05 フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物 Active JP7427885B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2019161966A JP7427885B2 (ja) 2019-09-05 2019-09-05 フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019161966A JP7427885B2 (ja) 2019-09-05 2019-09-05 フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物

Publications (3)

Publication Number Publication Date
JP2021039302A JP2021039302A (ja) 2021-03-11
JP2021039302A5 true JP2021039302A5 (cg-RX-API-DMAC7.html) 2022-09-02
JP7427885B2 JP7427885B2 (ja) 2024-02-06

Family

ID=74847064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019161966A Active JP7427885B2 (ja) 2019-09-05 2019-09-05 フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物

Country Status (1)

Country Link
JP (1) JP7427885B2 (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7815022B2 (ja) * 2022-05-09 2026-02-17 東京応化工業株式会社 ネガ型感光性樹脂組成物、硬化物及びパターン化された硬化物の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5912102A (en) * 1994-12-28 1999-06-15 Nippon Zeon Co., Ltd. Positive resist composition
JP6302643B2 (ja) * 2013-11-08 2018-03-28 東京応化工業株式会社 ポジ型レジスト組成物、及びレジストパターン形成方法、並びに、メタル層からなるパターンの形成方法、及び貫通電極の製造方法
JP7147768B2 (ja) * 2017-09-11 2022-10-05 Ｕｂｅ株式会社 フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物

Similar Documents

Publication Publication Date Title
JP2018084740A5 (cg-RX-API-DMAC7.html)
JP2017518645A5 (cg-RX-API-DMAC7.html)
JP2009505424A5 (cg-RX-API-DMAC7.html)
WO2010018430A8 (en) A hardmask process for forming a reverse tone image
JP2020107947A5 (cg-RX-API-DMAC7.html)
JP2016153424A5 (cg-RX-API-DMAC7.html)
JP2010213262A5 (cg-RX-API-DMAC7.html)
JP2014149409A5 (cg-RX-API-DMAC7.html)
JP2019212872A5 (cg-RX-API-DMAC7.html)
JP2018127649A5 (cg-RX-API-DMAC7.html)
JP2009524697A5 (cg-RX-API-DMAC7.html)
ATE535575T1 (de) Polyamid-nanokomposite mit hyperverzweigten polyetheraminen
JP2014158035A5 (cg-RX-API-DMAC7.html)
WO2016042408A3 (en) Compositions for etching titanium nitride having compatability with silicon germanide and tungsten
JP2017152541A5 (cg-RX-API-DMAC7.html)
TW200506532A (en) Antireflective film material, and antireflective film and pattern formation method using the same
JP2012099598A5 (cg-RX-API-DMAC7.html)
JP2013232513A5 (cg-RX-API-DMAC7.html)
WO2017137142A8 (en) A polymer, composition, forming sacrificial layer and method for semiconductor device therewith
SG11201903267UA (en) High etch resistance spin-on carbon hard mask composition and patterning method using same
JP2021039302A5 (cg-RX-API-DMAC7.html)
JP2018526252A5 (cg-RX-API-DMAC7.html)
JP2018509309A5 (cg-RX-API-DMAC7.html)
JP2019169729A5 (cg-RX-API-DMAC7.html)
JP2016060081A5 (cg-RX-API-DMAC7.html)