JP2021027180A - Supporting device - Google Patents

Abstract

To inhibit a crack from occurring at a first brazed portion joining a terminal member to a buffer member disposed between an electrode and the terminal member.SOLUTION: A supporting device comprises a supporter having a first surface and a second surface, an electrode, and a terminal member, and supports an object on the first surface of the supporter. The electrode is disposed so that at least part of the electrode is exposed on the second surface of the supporter. The supporting device further comprises a buffer member disposed between the electrode and the terminal member, a first brazed portion joining the terminal member to the buffer member, and a second brazed portion joining the electrode to the buffer member. A thermal expansion coefficient of the buffer member is smaller than a thermal expansion coefficient of the terminal member. In at least one specific cross section approximately perpendicular to the first surface and in a second direction, a terminal member side end face of the buffer member is positioned within a range of an electrode side end face of the buffer member and the terminal member side end face of the buffer member is positioned inside a range of a buffer member side end face of the terminal member.SELECTED DRAWING: Figure 3

Description

The techniques disclosed herein relate to holding devices that hold objects.

A heating device (also referred to as a "susceptor") that heats an object (for example, a semiconductor wafer) to a predetermined temperature (for example, about 400 to 800 ° C.) while holding it is known. The heating device is used as a part of a semiconductor manufacturing device such as a film forming apparatus (CVD film forming apparatus, sputtering film forming apparatus, etc.) or an etching apparatus (plasma etching apparatus, etc.).
In general, a heating device includes a holding body having a surface substantially orthogonal to a predetermined direction (hereinafter referred to as "holding surface") and a surface opposite to the holding surface (hereinafter referred to as "back surface"). .. A heater electrode is arranged inside the holding body. An electrode (also referred to as an “electrode pad”) is electrically connected to the heater electrode via a via conductor or the like. The electrodes are arranged so that at least a part of them is exposed on the back surface of the holder. A terminal member is joined to the electrode by, for example, brazing (hereinafter, also referred to as “brazing portion”). When a voltage is applied to the heater electrode via the terminal member and the electrode, the heater electrode generates heat and the object held on the holding surface of the holding body is heated.

If the forming materials of the electrode and the terminal member are different from each other, a crack may occur in the holding body in the vicinity of the joint portion between the two due to the stress generated due to the difference in thermal expansion between the two. Conventionally, in order to suppress the occurrence of such cracks, a technique of arranging a cushioning member between an electrode and a terminal member has been known (see, for example, Patent Document 1). The buffer member is made of a material having a coefficient of thermal expansion between the coefficient of thermal expansion of the material for forming the electrode and the coefficient of thermal expansion of the material for forming the terminal member, or a material having the same coefficient of thermal expansion as the coefficient of thermal expansion of the material for forming the electrode. By forming the buffer member, it is possible to have a function of reducing the difference in thermal expansion between the electrode and the terminal member.

Here, the general process of brazing is as follows. First, the brazing material is placed between the terminal member and the cushioning member, and then the brazing material is heated. The brazing material melted by heating is permeated into the surface of the terminal member facing the buffer member and the surface of the cushioning member facing the terminal member, and then the brazing material is solidified by returning to room temperature, for example. As a result, the terminal member and the cushioning member can be brazed and joined by the brazing portion.

JP-A-2007-123601

If the cushioning member is simply arranged as in the above-mentioned conventional technique, a crack is generated in the brazed portion that joins the cushioning member and the terminal member due to the stress caused by the difference in thermal expansion between the cushioning member and the terminal member. It may occur.

It should be noted that such a problem is not limited to the above heating device, but is electrically applied to the holding body and electrodes (for example, a heater electrode, an RF electrode, and an RF electrode) arranged so that at least a part is exposed on the back surface of the holding body. The electrode (electrode pad) connected to the electrode, the terminal member, the cushioning member arranged between the electrode and the terminal member, and the space between the electrode and the cushioning member and between the cushioning member and the terminal member. This is a common problem for holding devices that have a brazed portion and hold an object on the surface of the holding body.

This specification discloses a technique capable of solving the above-mentioned problems.

The technique disclosed in the present specification can be realized, for example, in the following forms.

(1) The holding device disclosed in the present specification includes a holding body having a first surface substantially orthogonal to the first direction and a second surface opposite to the first surface. An electrode arranged so that at least a part is exposed on the second surface of the holding body, a terminal member, and a cushioning member arranged between the electrode and the terminal member in the first direction. A first brazing portion for joining the cushioning member and the terminal member, and a second brazing portion for joining the electrode and the cushioning member are provided, and the first surface of the holding body is provided. In a holding device that holds an object on top, the coefficient of thermal expansion of the cushioning member is smaller than the coefficient of thermal expansion of the terminal member, and in at least one specific cross section substantially orthogonal to the first surface, the first In the second direction substantially orthogonal to the direction, among the end faces of the cushioning member in the first direction, the terminal member-side end face facing the terminal member is the electrode-side end face of the cushioning member facing the electrode. It is located within the range, and in the second direction, the terminal member side end face of the shock absorber is a cushioning member facing the terminal member side end face of the terminal face of the terminal member in the first direction. It is located inside the range of the side end faces.

In the present holding device, in the second direction in the specific cross section, the terminal member side end surface of the cushioning member is located inside the range of the cushioning member side end surface of the terminal member. Therefore, at the time of brazing joining, the brazing material forming the first brazing portion tends to crawl up to the outer peripheral surface of the cushioning member rather than the outer peripheral surface of the terminal member. In other words, the first brazed portion is difficult to be arranged on the outer peripheral surface of the terminal member.

Here, when the terminal member side end surface of the cushioning member is located outside the range of the cushioning member side end surface of the terminal member, the brazing material forming the first brazed portion at the time of brazing joining is It easily crawls up on the outer peripheral surface of the terminal member. In the configuration in which the brazing material forming the brazed portion is arranged on the outer peripheral surface of the terminal member, the brazing material in the brazing joint is due to the fact that the coefficient of thermal expansion of the terminal member is larger than the coefficient of thermal expansion of the buffer member. At the time of solidification, the brazing material tends to be subjected to tensile stress due to the shrinkage of the terminal member. As a result, cracks tend to occur on the surface of the brazed portion. On the other hand, in the configuration in which the terminal member side end surface of the cushioning member is located inside the range of the cushioning member side end surface of the terminal member in the second direction in the specific cross section as in the present holding device, the first The brazed portion is more likely to be arranged on the cushioning member side end surface of the terminal member than on the outer peripheral surface of the terminal member. Therefore, when the brazing material is solidified, the generation of tensile stress on the brazing material due to the shrinkage of the terminal member is suppressed.

Further, in this holding device, since the generation of tensile stress is suppressed at the time of solidification of the brazing material in the brazing joint, the generation of the tensile residual stress remaining in the first brazing portion is suppressed. Can be done. Therefore, even during the thermal cycle after the brazing joint, it is possible to suppress the generation of cracks in the first brazed portion due to the tensile residual stress and the extension of the cracks.

Therefore, according to this holding device, it is possible to suppress the application of tensile stress to the first brazed portion that joins the cushioning member and the terminal member, and eventually cracks occur in the first brazed portion. Can be suppressed.

(2) In the holding device, in the second direction in the specific cross section, the terminal member side end surface of the cushioning member is located inside the range of the electrode side end surface of the cushioning member, and the specific In the cross section, the cushioning member is composed of a substantially rectangular terminal member side portion having the terminal member side end surface as one side and a substantially rectangular electrode side portion having the electrode side end surface as one side. May be. In other words, in the present holding device, the electrode side end face of the cushioning member may be larger than the terminal member side end face in the specific cross section. If this configuration is adopted, the joint strength between the cushioning member and the electrode is improved as compared with the configuration in which the electrode side end face of the cushioning member has the same area as the terminal member side end face, and by extension, the second brazed portion. The tensile strength in the above can be improved. Therefore, according to this holding device, it is possible to suppress the detachment of the cushioning member and thus the terminal member from the electrode.

(3) In the holding device, the exposed surface exposed on the second surface of the electrode is located inside the range of the electrode side end surface of the cushioning member in the second direction in the specific cross section. It may be configured as such. In other words, in the specific cross section, the entire surface of the exposed surface may be covered with the electrode side end surface. If a portion of the exposed surface that is not covered by the second brazed portion is formed, the portion, and thus the electrode itself, may be oxidized or deteriorated in the air atmosphere. If this configuration is adopted, the entire surface of the exposed surface in the second direction in the specific cross section is compared with the configuration in which the exposed surface of the electrode is located outside the range of the electrode side end surface of the cushioning member. Is easily covered by the brazing material (second brazed portion). Therefore, according to this holding device, oxidation and deterioration of the electrode in the atmospheric atmosphere can be suppressed, and by extension, detachment of the cushioning member and thus the terminal member from the electrode can be suppressed.

(4) In the holding device, in the first directional view, the outer edge of the end face on the side of the shock absorber of the terminal member may surround the outer edge of the end face on the side of the terminal member of the shock absorber. If this configuration is adopted, the generation of tensile stress on the brazed material at the time of the brazing joint can be suppressed and the generation of the tensile residual stress at the first brazing portion can be suppressed in any of the specific cross sections. It can be suppressed. Therefore, according to this holding device, it is possible to more effectively suppress the application of tensile stress to the first brazed portion that joins the cushioning member and the terminal member, and by extension, the first brazed portion. It is possible to more effectively suppress the occurrence of cracks.

The technique disclosed in the present specification can be realized in various forms, for example, a heating device, an electrostatic chuck, a holding device, a manufacturing method thereof, and the like. is there.

It is a perspective view which shows schematic appearance structure of the heating apparatus 100 in this embodiment. It is explanatory drawing which shows typically the XZ cross-sectional structure of the heating apparatus 100 in this embodiment. It is explanatory drawing which enlarges and shows the XZ cross-sectional structure of a part (X1 part of FIG. 2) of the heating apparatus 100 in this embodiment. It is explanatory drawing which enlarges and shows the XY cross-sectional structure of a part (X1 part of FIG. 2) of the heating apparatus 100 in this embodiment. It is explanatory drawing which shows typically the XZ cross-sectional structure of the heating apparatus in each modification. It is explanatory drawing which shows typically the XZ cross-sectional structure of the heating apparatus in the modified example and the comparative example. It is explanatory drawing which shows the performance evaluation result.

A. Embodiment:
A-1. Configuration of heating device 100:
FIG. 1 is a perspective view schematically showing an external configuration of the heating device 100 in the present embodiment, and FIG. 2 is an explanatory view schematically showing an XZ cross-sectional configuration of the heating device 100 in the present embodiment. Further, FIG. 3 is an explanatory view showing an enlarged XZ cross-sectional configuration of a part (X1 part of FIG. 2) of the heating device 100 in the present embodiment. FIG. 4 is an explanatory view showing an enlarged XY cross-sectional configuration of a part (X1 part of FIG. 2) of the heating device 100 in the present embodiment. Each figure shows XYZ axes that are orthogonal to each other to identify the direction. In the present specification, for convenience, the Z-axis positive direction is referred to as an upward direction, and the Z-axis negative direction is referred to as a downward direction, but the heating device 100 is actually installed in a direction different from such a direction. You may.

The heating device 100 is a device that heats an object (for example, a semiconductor wafer W) to a predetermined processing temperature (for example, about 400 to 800 ° C.) while holding it, and is also called a susceptor. The heating device 100 is used as a part of a semiconductor manufacturing device such as a film forming apparatus (CVD film forming apparatus, sputtering film forming apparatus, etc.) or an etching apparatus (plasma etching apparatus, etc.).

As shown in FIGS. 1 and 2, the heating device 100 includes a holding body 10 and a columnar support 20.

The holding body 10 has a surface (hereinafter, referred to as “holding surface S1”) substantially orthogonal to a predetermined direction (Z-axis direction in the present embodiment) and a surface opposite to the holding surface S1 (hereinafter, “back surface S2”). It is a substantially disk-shaped member having.). Holder 10 is formed of ceramics mainly composed of aluminum nitride (AlN) or alumina _(Al 2 _{O 3).} The main component referred to here means the component having the highest content ratio (weight ratio). The diameter of the holding body 10 is, for example, about 100 mm or more and 500 mm or less, and the thickness of the holding body 10 (length in the vertical direction) is, for example, about 3 mm or more and about 20 mm or less. The holding body 10 corresponds to a ceramic member in the claims, the holding surface S1 corresponds to the first surface in the claims, and the back surface S2 corresponds to the second surface in the claims. , Z-axis direction corresponds to the first direction in the claims.

As shown in FIG. 2, a heater electrode 50, which is a heat generating resistor, is arranged inside the holding body 10. The heater electrode 50 is made of a material containing a metal such as tungsten or molybdenum. In the present embodiment, the heater electrode 50 constitutes a linear pattern extending substantially concentrically in the Z-axis direction. Both ends of the linear pattern of the heater electrode 50 are arranged near the center of the holding body 10, and the upper end of the via conductor 52 is connected to each end. Further, as shown in FIGS. 2 and 3, a pair of recesses 12 are formed on the back surface S2 of the holding body 10, and a conductive feeding electrode (electrode pad) 54 is provided at the position of each recess 12. It is provided. In the present embodiment, the feeding electrode 54 is substantially circular in the Z-axis direction, and is formed of a material containing tungsten (for example, a mixed material of tungsten and aluminum nitride). Further, in the present embodiment, the entire surface of the feeding electrode 54 on the side of the buffer member 60 is exposed on the back surface S2 of the holding body 10 (hereinafter, the surface exposed on the back surface S2 of the feeding electrode 54 is "exposed". Also called "face Se"). However, as long as at least a part of the feeding electrode 54 is exposed on the back surface S2 of the holding body 10, a part (for example, an end portion) of the feeding electrode 54 may be embedded inside the holding body 10. The lower end of the via conductor 52 is connected to the feeding electrode 54. As a result, the heater electrode 50 and the feeding electrode 54 are electrically connected via the via conductor 52. The feeding electrode 54 corresponds to an electrode in the claims.

The columnar support 20 is a substantially columnar member extending in the predetermined direction (vertical direction). Like the holding body 10, the columnar support 20 is made of ceramics containing aluminum nitride or alumina as a main component. The outer diameter of the columnar support 20 is, for example, about 30 mm or more and 90 mm or less, and the height (length in the vertical direction) of the columnar support 20 is, for example, about 100 mm or more and 300 mm or less.

The holding body 10 and the columnar support 20 are arranged so that the back surface S2 of the holding body 10 and the upper surface S3 of the columnar support 20 face each other in the vertical direction. The columnar support 20 is joined to the vicinity of the center of the back surface S2 of the holding body 10 via a joining portion 30 formed of a known joining material.

As shown in FIG. 2, the columnar support 20 is formed with a through hole 22 that opens on the back surface S2 side of the holding body 10. A plurality of (two in this embodiment) terminal members 70 are housed in the through hole 22. The terminal member 70 is, for example, a substantially circular columnar member in the Z-axis direction, and is formed of a nickel (Ni) -containing material (for example, pure nickel or an alloy containing nickel (for example, Kovar)). Here, the coefficient of thermal expansion of the material for forming the terminal member 70 is, for example, 5K ^-1 or more and 13K ^-1 or less. The dimensions of the cushioning member side end surface St (see FIG. 3) of the terminal member 70 will be described later.

Further, a cushioning member 60 is arranged between the upper end portion of each terminal member 70 and each feeding electrode 54 in the Z-axis direction. The cushioning member 60 is, for example, a plate-shaped member that is substantially circular in the Z-axis direction, and is formed of a material containing tungsten (for example, pure tungsten or an alloy containing tungsten). The cushioning member 60 is a member having a function of reducing the difference in thermal expansion between the terminal member 70 and the feeding electrode 54. Therefore, the coefficient of thermal expansion of the material for forming the buffer member 60 is the same as the coefficient of thermal expansion of the material for forming the feeding electrode 54, or the coefficient of thermal expansion of the material for forming the buffer member 60 is the coefficient of thermal expansion of the material for forming the terminal member 70. Less than a coefficient. The coefficient of thermal expansion of the material for forming the buffer member 60 is, for example, 6K- ¹ or less. Further, the difference between the coefficient of thermal expansion of the material for forming the buffer member 60 and the coefficient of thermal expansion of the material for forming the terminal member 70 is, for example, 9K- ¹ or less. The diameter of the cushioning member 60 is, for example, 4.5 mm to 10.0 mm. The thickness ta of the cushioning member 60 is, for example, 2 mm or more. The configuration of the cushioning member 60 will be described in detail later.

As shown in FIG. 3, the lower surface (terminal member side end surface Sbt) of the cushioning member 60 is joined to the terminal member 70 (specifically, the cushioning member side end surface St) by the terminal side brazing portion 81. Further, the upper surface (electrode side end surface Sbe) of the buffer member 60 is joined (brazed) to the lower surface (exposed surface Se) of the power feeding electrode 54 by the electrode side brazing portion 82. The terminal-side brazing portion 81 and the electrode-side brazing portion 82 are, for example, Ni-based (Ni—Cr-based alloy, etc.), Au-based (pure Au, Au-Ni-based alloy, etc.), Ag-based (pure Ag, etc.). It is a brazing material. The terminal-side brazing portion 81 corresponds to the first brazing portion in the claims, and the electrode-side brazing portion 82 corresponds to the second brazing portion in the claims.

When a voltage is applied to the heater electrode 50 from a power source (not shown) via each terminal member 70, each cushioning member 60, each feeding electrode 54, and each via conductor 52, the heater electrode 50 generates heat and the holding surface of the holding body 10 The object held on S1 (for example, the semiconductor wafer W) is heated to a predetermined temperature (for example, about 400 to 800 ° C.).

In the heating device 100 of the present embodiment, a cross section that is parallel to the Z-axis direction (that is, substantially orthogonal to the holding surface S1) and passes through the center of the cushioning member 60 in the Z-axis direction (FIG. 3). The following configuration is adopted in the cross section (cross section shown in FIG. 4) and the cross section (cross section shown in FIG. 4) at the position IV-IV in FIG. 3 (the position of the end surface St on the cushioning member side of the terminal member 70). The dotted line shown in FIG. 4 is a dotted line shown for convenience for later explanation. Further, as described below, in the present embodiment, the following configuration is adopted in an arbitrary cross section that is parallel to the Z-axis direction and passes through the center of the cushioning member 60 in the Z-axis direction. Therefore, the heating device 100 of the present embodiment has the same configuration as the following configuration in an arbitrary cross section parallel to the Z-axis direction.

<Structure 1>
In the X-axis direction, the terminal member side end surface Sbt of the cushioning member 60 is located inside the range of the electrode side end surface Sbe of the cushioning member 60. Specifically, in the cross section, the end points of the line segment corresponding to the terminal member side end surface Sbt are located inside the end points of the line segment corresponding to the electrode side end surface Sbe. Here, the length of the line segment corresponding to the terminal member side end surface Sbt (diameter Dbt of the terminal member side end surface Sbt) is preferably 4.5 mm or less, for example. Further, the length of the line segment corresponding to the electrode side end surface Sbe (diameter Dbe of the electrode side end surface Sbe) is preferably 5 mm or more, for example. Further, the distance between one end point of the line segment corresponding to the terminal member side end surface Sbt and one end point of the line segment corresponding to the electrode side end surface Sbe is twice the distance Lb (that is, the terminal member side end surface Sbt). The difference between the diameter Dbt and the diameter Dbe of the electrode side end surface Sbe) is preferably 1 mm or less from the viewpoint of securing the brazing area of the terminal member side end surface Sbt, for example. Further, in the present embodiment, in the Z-axis direction view, the outer edge Ebe of the electrode side end surface Sbe of the cushioning member 60 surrounds the outer edge Ebt of the terminal member side end surface Sbt of the cushioning member 60. The X-axis direction corresponds to the second direction in the claims.

<Structure 2>
In the present embodiment, the terminal member side end surface Sbt of the cushioning member 60 is located inside the range of the cushioning member side end surface St of the terminal member 70 in the X-axis direction. Specifically, in the cross section, the end points of the line segment corresponding to the terminal surface Sbt on the terminal member side are located inside the end points of the line segment corresponding to the end surface St on the cushioning member side. Here, the length of the line segment corresponding to the cushioning member side end surface St (diameter Dt of the cushioning member side end surface St) is preferably 4.5 mm or less, for example. Further, the distance between one end point of the line segment corresponding to the cushion member side end surface St and one end point of the line segment corresponding to the terminal member side end surface Sbt is twice the distance Lt (that is, the cushion member side end surface). The difference between the diameter Dt of St and the diameter Dbt of the terminal member side end surface Sbt) is preferably 1 mm or less from the viewpoint of securing the brazing area of the terminal member side end surface Sbt, for example. Further, in the present embodiment, the outer edge Et of the cushioning member side end surface St of the terminal member 70 surrounds the outer edge Ebt of the terminal member side end surface Sbt of the cushioning member 60 in the Z-axis direction view.

<Structure 3>
In the present embodiment, the cushioning member 60 is composed of a substantially rectangular terminal member side portion 61 having a terminal member side end surface Sbt as one side and a substantially rectangular electrode side portion 62 having an electrode side end surface Sbe as one side. Has been done. In other words, the buffer member 60 is composed of a substantially columnar terminal member side portion 61 having a terminal member side end surface Sbt and a substantially columnar electrode side portion 62 having an electrode side end surface Sbe. Here, in the Z-axis direction, the thickness t1 of the terminal member side portion 61 is, for example, 1 mm or more, and the thickness t2 of the electrode side portion 62 is, for example, 1 mm or more.

<Structure 4>
In the present embodiment, the exposed surface Se of the feeding electrode 54 is located inside the range of the electrode side end surface Sbe of the buffer member 60 in the X-axis direction. Specifically, in the cross section, the end points of the line segment corresponding to the exposed surface Se are located inside the end points of the electrode side end surface Sbe. Here, the length of the line segment corresponding to the exposed surface Se (diameter De of the exposed surface Se) is preferably, for example, 5 mm or more. Further, the distance between one end point of the line segment corresponding to the electrode side end surface Sbe and one end point of the line segment corresponding to the exposed surface Se is twice the distance Le (that is, the diameter Dbe of the electrode side end surface Sbe). The difference between the exposed surface Se and the diameter De of the exposed surface Se) is, for example, 2 mm from the viewpoint that the entire surface of the exposed surface Se is easily covered by the electrode-side brazing portion 82 interposed between the feeding electrode 54 and the buffer member 60. The following is preferable. Further, in the present embodiment, in the Z-axis direction view, the outer edge Ebe of the electrode side end surface Sbe of the buffer member 60 surrounds the outer edge Ee of the exposed surface Se of the feeding electrode 54.

A-2. First modification of this embodiment:
FIG. 5A is an explanatory diagram schematically showing the configuration of the heating device 100a in the first modification of the present embodiment. FIG. 5A shows an XZ cross-sectional configuration of the heating device 100a of the first modification corresponding to the cross section of FIG. 3 described above. In the following, among the configurations of the heating apparatus 100a of the first modification, the same configurations as the configurations of the heating apparatus 100 of the present embodiment described above will be appropriately omitted by adding the same reference numerals.

As shown in FIG. 5A, the configuration of the heating device 100a of the first modification is different from the configuration of the heating device 100 of the present embodiment described above in that the shape of the buffer member 60a is different. That is, the cushioning member 60a in the first modification is different from the cushioning member 60 of the present embodiment in the above configuration 3. Specifically, in the cross section, the cushioning member 60a has a substantially trapezoidal shape with the terminal member side end surface Sbt and the electrode side end surface Sbe as one side. In other words, the cushioning member 60a has a substantially truncated cone shape with the terminal member side end surface Sbt as one surface and the electrode side end surface Sbe as the other surface. Here, the narrowing angle θa formed from the cushioning member side end surface St of the terminal member 70 and the side surface Sa of the cushioning member 60a stabilizes the structure (for example, shape) of the fillet of the formed terminal side brazing portion 81. From the viewpoint of sex, for example, it is 50 ° or more and 90 ° or less.

A-3. Second variant of this embodiment:
FIG. 5B is an explanatory diagram schematically showing the configuration of the heating device 100b in the second modification of the present embodiment. FIG. 5B shows the XZ cross-sectional configuration of the heating device 100b of the second modification corresponding to the cross section of FIG. 3 described above. In the following, among the configurations of the heating apparatus 100b of the second modification, the same configurations as the configurations of the heating apparatus 100 of the present embodiment described above will be appropriately described by adding the same reference numerals.

As shown in FIG. 5B, the configuration of the heating device 100b of the second modification is different from the configuration of the heating device 100 of the present embodiment described above in that the shape of the buffer member 60b is different. That is, the cushioning member 60b in the second modification is different from the cushioning member 60 of the present embodiment in the above configuration 3. Specifically, in the cross section, the cushioning member 60b has a substantially trapezoidal terminal member side portion 61b having the terminal member side end surface Sbt as one side and a substantially rectangular electrode side portion 62b having the electrode side end surface Sbe as one side. It is composed of and. In other words, it is composed of a substantially truncated cone-shaped terminal member side portion 61b having a terminal member side end surface Sbt and a substantially cylindrical electrode side portion 62b having an electrode side end surface Sbe. Here, the narrowing angle θb formed from the end surface St on the buffer member side of the terminal member 70 and the side surface Sb on the terminal member side portion 61b of the cushioning member 60b is formed by the fillet structure of the terminal side brazed portion 81. For example, from the viewpoint of stability of the shape), for example, it is 10 ° or more and 45 ° or less. Further, in the Z-axis direction, the thickness t1 of the terminal member side portion 61b is, for example, 1 mm or more, and the thickness t2 of the electrode side portion 62b is, for example, 1 mm or more.

A-4. Third variant of this embodiment:
FIG. 5C is an explanatory diagram schematically showing the configuration of the heating device 100c in the third modification of the present embodiment. FIG. 5C shows the XZ cross-sectional configuration of the heating device 100c of the third modification corresponding to the cross section of FIG. 3 described above. In the following, among the configurations of the heating apparatus 100c of the third modification, the same configurations as the configurations of the heating apparatus 100 of the present embodiment described above will be appropriately described by adding the same reference numerals.

As shown in FIG. 5C, the configuration of the heating device 100c of the third modification is different from the configuration of the heating device 100 of the present embodiment described above in that the shape of the buffer member 60c is different. That is, the cushioning member 60c in the third modification is different from the cushioning member 60 of the present embodiment in the above configuration 4. Specifically, in the cross section, the exposed surface Se of the feeding electrode 54 is located outside the range of the electrode side end surface Sbe of the buffer member 60c in the X-axis direction. Specifically, in the cross section, both end points of the line segment corresponding to the exposed surface Se are located outside the end points of the electrode side end surface Sbe. Here, the length of the line segment corresponding to the electrode side end surface Sbe (diameter Dbe of the electrode side end surface Sbe) is, for example, 4 mm or more. Further, the distance between one end point of the line segment corresponding to the electrode side end surface Sbe and one end point of the line segment corresponding to the exposed surface Se is twice the distance Le (that is, the diameter Dbe of the electrode side end surface Sbe). The difference between the exposed surface Se and the diameter De of the exposed surface Se) is 1 mm or less. Further, in the third modification, in the Z-axis direction view, the outer edge Ee of the exposed surface Se of the feeding electrode 54 surrounds the outer edge Ebe of the electrode side end surface Sbe of the cushioning member 60. In the heating device 100c as well, similarly to the heating device 100 of the first embodiment, a substantially rectangular terminal member side portion 61c having the terminal member side end surface Sbt as one side and a substantially rectangular shape having the electrode side end surface Sbe as one side. It is composed of an electrode side portion 62c of the shape.

A-5. Fourth variant of this embodiment:
FIG. 6A is an explanatory diagram schematically showing the configuration of the heating device 100d in the fourth modification of the present embodiment. FIG. 6A shows the XZ cross-sectional configuration of the heating device 100d of the fourth modification corresponding to the cross section of FIG. 3 described above. In the following, among the configurations of the heating apparatus 100d of the fourth modification, the same configurations as the configurations of the heating apparatus 100 of the present embodiment described above will be appropriately omitted by adding the same reference numerals.

As shown in FIG. 6A, the configuration of the heating device 100d of the fourth modification is different from the configuration of the heating device 100 of the present embodiment described above in that the shape of the buffer member 60d is different. That is, the cushioning member 60d in the fourth modification is different from the cushioning member 60 of the present embodiment in the above configurations 1 and 3. Specifically, in the cross section, the terminal member side end surface Sbt of the cushioning member 60d is located at the same position as the electrode side end surface Sbe of the cushioning member 60d in the X-axis direction. In other words, in the cross section, the end points of the line segment corresponding to the terminal member side end surface Sbt are located at the same positions as the end points of the line segment corresponding to the electrode side end surface Sbe. That is, in the cross section, the cushioning member 60d has a substantially rectangular shape with the terminal member side end surface Sbt and the electrode side end surface Sbe as one side. Further, the cushioning member 60d is a substantially cylindrical shape extending in the Z-axis direction, with the terminal member side end surface Sbt as one surface and the electrode side end surface Sbe as the other surface. In the fourth modification, the length of the line segment corresponding to the terminal member side end surface Sbt (diameter Dbt of the terminal member side end surface Sbt) and the length of the line segment corresponding to the electrode side end surface Sbe in the buffer member 60d (electrode side). The diameter Dbe) of the end face Sbe) is, for example, 6 mm or less. Further, in the fourth modification, the length of the line segment corresponding to the exposed surface Se of the feeding electrode 54 (diameter De of the exposed surface Se) is, for example, 6 mm or less.

A-6. Comparative example:
FIG. 6B is an explanatory diagram schematically showing the configuration of the heating device 100x in the comparative example. FIG. 6B shows the XZ cross-sectional configuration of the heating device 100x of the comparative example corresponding to the cross section of FIG. 3 described above. In the following, among the configurations of the heating apparatus 100x of the comparative example, the same configurations as the configurations of the heating apparatus 100 of the present embodiment described above will be appropriately omitted by adding the same reference numerals.

As shown in FIG. 6B, the configuration of the heating device 100x of the comparative example is different from the configuration of the heating device 100 of the present embodiment described above in that the shape of the buffer member 60x is different. That is, the cushioning member 60x in the comparative example is different from the cushioning member 60 of the present embodiment in the above configuration 2. Specifically, in the comparative example, in the X-axis direction, the terminal member side end surface Sbt of the cushioning member 60x is located outside the range of the cushioning member side end surface St of the terminal member 70. Specifically, in the cross section, the end points of the line segment corresponding to the terminal surface Sbt on the terminal member side are located outside the end points of the line segment corresponding to the end surface St on the cushioning member side. Here, the length of the line segment corresponding to the terminal member side end surface Sbt (diameter Dbt of the terminal member side end surface Sbt) is, for example, 4 mm or more. Further, the distance between one end point of the line segment corresponding to the cushion member side end surface St and one end point of the line segment corresponding to the terminal member side end surface Sbt is twice the distance Lt (that is, the cushion member side end surface). The difference between the diameter Dt of St and the diameter Dbt of the end surface Sbt on the terminal member side) is, for example, 1 mm or more.

A-7. Manufacturing method of heating device 100:
The manufacturing method of the heating device 100 of this embodiment is as follows, for example. First, the holding body 10 and the columnar support 20 are produced.

The method for producing the retainer 10 is as follows, for example. First, 100 parts by weight of aluminum nitride powder, and yttrium oxide (Y 2 _{O 3)} powder, 1 part by weight, and 20 parts by weight of an acrylic binder, the mixture was added a suitable amount of dispersant and plasticizer, organic or toluene A solvent is added and mixed in a ball mill for 20 hours to prepare a slurry for a green sheet. This green sheet slurry is formed into a sheet by a casting device and then dried to prepare a plurality of green sheets.

Further, a metallized paste is prepared by adding a metal powder such as tungsten to a mixture of an organic solvent such as aluminum nitride powder, an acrylic binder and terpineol and kneading the mixture. By printing this metallized paste using, for example, a screen printing device, an unsintered conductor layer that will later become a heater electrode 50, a feeding electrode 54, or the like is formed on each specific green sheet. Further, by printing with the via holes provided in advance on the green sheet, an unsintered conductor portion that will later become the via conductor 52 is formed.

Next, a plurality of these green sheets (for example, 20 sheets) are thermocompression bonded, and if necessary, the outer circumference is cut to prepare a green sheet laminate (for example, a thickness of 8 mm). This green sheet laminate is cut by machining to produce a disk-shaped molded body, the molded body is degreased, and the degreased body is further fired to produce a fired body. The surface of this fired body is polished. The holding body 10 is manufactured by the above steps.

The method for producing the columnar support 20 is as follows, for example. First, an organic solvent such as methanol is added to a mixture of 100 parts by weight of aluminum nitride powder, 1 part by weight of yttrium oxide powder, 3 parts by weight of PVA binder, and an appropriate amount of a dispersant and a plasticizer, and a ball mill is used. Mix to obtain a slurry. This slurry is granulated with a spray dryer to prepare a raw material powder. Next, the raw material powder is filled in the rubber mold in which the core corresponding to the through hole 22 is arranged, and cold hydrostatic pressure pressing is performed to obtain a molded product. The obtained molded body is degreased, and the degreased body is further fired. The columnar support 20 is manufactured by the above steps.

Next, the holding body 10 and the columnar support 20 are joined. After lapping the back surface S2 of the holding body 10 and the upper surface S3 of the columnar support 20 as necessary, at least one of the back surface S2 of the holding body 10 and the upper surface S3 of the columnar support 20 is, for example, rare earth or organic. A known bonding agent made into a paste by mixing a solvent or the like is uniformly applied, and then degreased. Next, the back surface S2 of the holding body 10 and the upper surface S3 of the columnar support 20 are overlapped with each other, and hot press firing is performed to join the holding body 10 and the columnar support 20.

After joining the holding body 10 and the columnar support 20, each cushioning member 60 is inserted into the through hole 22, and the electrode side end surface Sbe of each cushioning member 60 is placed on the exposed surface Se of each feeding electrode 54 with a brazing material ( For example, the electrode side brazed portion 82 is formed by brazing using a Ni-based, Au-based, or Ag-based brazing material). Further, each terminal member 70 is inserted into the through hole 22, and a brazing material (for example, Ni-based, Au-based, Ag) is used to connect the cushioning member-side end surface St of each terminal member 70 to the terminal member-side end surface Sbt of each cushioning member 60. The terminal-side brazing portion 81 is formed by brazing using the brazing material of the system). Each brazing can be performed using a vacuum furnace under predetermined brazing conditions (in vacuum, temperature: about 950 ° C to 1150 ° C, time: about 10 minutes to 30 minutes). The heating device 100 having the above-described configuration is mainly manufactured by the above manufacturing method.

The method for manufacturing the buffer member 60 is as follows, for example. A substantially columnar pillar body formed of the material for forming the cushioning member 60 and having a diameter substantially the same as the diameter Dbe of the electrode side end surface Sbe in the cushioning member 60 is prepared. The pillar is cut so as to be substantially the same as the thickness ta of the cushioning member 60 in the longitudinal direction thereof. The buffer member 60 is formed by lathe processing the cut pillar body so as to have the above shape (diameter Dbt, thickness t1 of the terminal member side portion 61, diameter Dbe, thickness t2 of the electrode side portion 62). Can be made.

A-8. Performance evaluation:
Performance evaluation was performed to confirm the effects of the heating device 100 of the present embodiment described above, the heating device of each modification, and the heating device of the comparative example. FIG. 7 is an explanatory diagram showing the performance evaluation result.

As shown in FIG. 7, a heating device for 6 samples (SA1 to SA6) was used for the performance evaluation. Each sample was prepared by a manufacturing method according to the manufacturing method of the heating device of the above-described embodiment. Each sample has a different structure of cushioning member.

Specifically, in the sample SA1, a buffer member having the same configuration as the buffer member 60 in the heating device 100 of the present embodiment was used. Regarding the samples SA2 to SA6, the cushioning member 60a in the heating device 100a of the first modification, the cushioning member 60b in the heating device 100b of the second modification, the buffer member 60c in the heating device 100c of the third modification, and the fourth A cushioning member 60d in the heating device 100d of the modified example, a cushioning member 60x in the heating device 100x of the comparative example, and a cushioning member having the same configuration were used.

A-8-1. Evaluation method:
For the samples SA1 to SA6, the occurrence of cracks in the terminal-side brazed portion 81 at the time of joining the terminal member 70 to the feeding electrode 54 (that is, at the time of brazing) was evaluated. The brazing conditions at the time of brazing were the brazing conditions according to the manufacturing method of the heating device 100 of the above-described embodiment. The generation of cracks during brazing was evaluated for each sample after brazing and cooling to room temperature. A plurality of each sample was prepared (for example, n pieces. Specifically, for example, two samples SA1 to SA6 each). First, a part (for example, m pieces) of each of the samples is polished to have a cross section substantially parallel to the Z-axis direction and includes a terminal-side brazed portion 81 (for example, in FIG. 3). (Cross section shown) was cross-sectioned. The presence or absence of cracks was determined by microscopic observation of the obtained cross section. When there was no crack, it was judged as "⊚", when there were one or two cracks, it was judged as "◯", and when there were three or more cracks, it was judged as "x". For the cracked sample, the length of the crack was measured.

Further, for the samples SA1 to SA6, the occurrence of cracks in the terminal-side brazed portion 81 and the extension of the generated cracks during the thermal cycle were evaluated. The thermal cycle condition of the thermal cycle was that each sample was heated to a temperature of 700 ° C. and then cooled to room temperature as one cycle, and the cycle was performed for 300 cycles. The evaluation of the occurrence of cracks during the thermal cycle was carried out for each sample after cooling to room temperature, in which the judgment of the occurrence of cracks was “⊚” at the time of brazing. First, the remaining (for example, nm) of each of the samples was cross-sectioned in the same manner as described above. The presence or absence of cracks was determined by microscopic observation of the obtained cross section. When there was no crack, it was judged as "⊚", when there were one or two cracks, it was judged as "◯", and when there were three or more cracks, it was judged as "x". In addition, the elongation of cracks generated during the thermal cycle was evaluated for each sample after cooling to room temperature, in which the judgment of crack generation during brazing was "○" or "×". .. First, the remaining (for example, nm) of each of the samples was cross-sectioned in the same manner as described above. The length of the crack was measured by microscopic observation of the obtained cross section. When the length of the crack was 20% or more longer than the length of the crack generated during brazing, it was judged as "x", and when it was less than 20%, it was judged as "⊚".

In addition, the tensile strength of the electrode-side brazed portion 82 was evaluated for the samples SA1 to SA6. Specifically, the load for tensilely breaking the terminal member 70 in the vertical direction was measured. As a result, it was determined as "⊚" when the tensile strength was 20 kgf or more, and as "x" when the tensile strength was less than 20 kgf.

In addition, the oxidation resistance of the feeding electrode 54 was evaluated for the samples SA1 to SA6. Specifically, each sample was exposed to predetermined conditions (temperature: 600 ° C., time: 1000 hours). As a result, it was determined that the terminal member 70 was “x” when it was detached from the feeding electrode 54, and “⊚” when it was not detached.

A-8-2. Evaluation result:
As shown in FIG. 7, in the sample SA1, cracks were generated during brazing, cracks were generated during the thermal cycle, and the tensile strength and oxidation resistance were all “⊚”, and good results were obtained. In the sample SA1, similarly to the heating device 100 of the embodiment, in the above cross section, the terminal member side end surface Sbt of the cushioning member 60 is located inside the range of the cushioning member side end surface St of the terminal member 70 in the X-axis direction. (See Fig. 3). Therefore, at the time of brazing joining, the brazing material forming the terminal-side brazing portion 81 is more likely to crawl up to the outer peripheral surface of the cushioning member 60 than the outer peripheral surface of the terminal member 70, in other words, the terminal-side brazing. It is difficult for the attachment portion 81 to be arranged on the outer peripheral surface of the terminal member 70. As a result, it is considered that good results were obtained in the generation of cracks during brazing and the generation of cracks during the thermal cycle. Further, in the sample SA1, in the buffer member 60, the diameter Dbe of the electrode side end surface Sbe (area of the electrode side end surface Sbe) to be joined to the feeding electrode 54 is the diameter Dbt of the terminal member side end surface Sbt (area of the terminal member side end surface Sbt). ) Greater. As a result, it is considered that as a result of improving the bonding strength between the buffer member 60 and the feeding electrode 54, a good result was obtained in the tensile strength of the electrode-side brazed portion 82. Further, in the sample SA1, the exposed surface Se of the feeding electrode 54 is covered with the electrode side end surface Sbe of the buffer member 60. As a result, the entire surface of the exposed surface Se is easily covered by the electrode-side brazing portion 82 interposed between the feeding electrode 54 and the buffer member 60, and oxidation and deterioration of the feeding electrode 54 in the atmospheric atmosphere are suppressed. As a result, it is considered that good results were obtained in the detachment of the terminal member 70 from the feeding electrode 54.

Further, in the sample SA2 as well, as in the sample SA1, the cracks generated during brazing, the cracks generated during the thermal cycle, the tensile strength and the oxidation resistance were all “◎”, and good results were obtained. .. This is because, in the sample SA2 as well, in the cross section, the terminal member side end surface Sbt of the cushioning member 60a is located inside the range of the cushioning member side end surface St of the terminal member 70 in the X-axis direction. The diameter Dbe of the electrode side end surface Sbe to be joined to the power supply electrode 54 (area of the electrode side end surface Sbe) is larger than the diameter Dbt of the terminal member side end surface Sbt (area of the terminal member side end surface Sbt). It is considered that this is because the exposed surface Se of the electrode 54 is covered with the electrode side end surface Sbe of the cushioning member 60a.

Further, in the sample SA3, except that the occurrence of cracks during brazing was "○", the elongation, tensile strength and oxidation resistance of the cracks during the thermal cycle were all "◎", and good results were obtained. Was brazed. This is because, in the sample SA3 as well, in the cross section, the terminal member side end surface Sbt of the cushioning member 60b is located inside the range of the cushioning member side end surface St of the terminal member 70 in the X-axis direction. The diameter Dbe of the electrode side end surface Sbe to be joined to the power supply electrode 54 (area of the electrode side end surface Sbe) is larger than the diameter Dbt of the terminal member side end surface Sbt (area of the terminal member side end surface Sbt). It is considered that this is because the exposed surface Se of the electrode 54 is covered with the electrode side end surface Sbe of the cushioning member 60b. Regarding the result that the occurrence of cracks at the time of brazing is “◯”, the sandwich angle θb formed from the end surface St on the buffer member side of the terminal member 70 and the side surface Sb on the terminal member side portion 61b of the buffer member 60b If it is too small, it is considered that it is easily affected by thermal stress.

Further, in the sample SA4, except that the oxidation resistance was "x", the cracks during brazing, the cracks during the thermal cycle, and the tensile strength were all "◎", and good results were obtained. Was brazed. This is because, in the sample SA4 as well, in the cross section, the terminal member side end surface Sbt of the cushioning member 60c is located inside the range of the cushioning member side end surface St of the terminal member 70 in the X-axis direction. This is because the diameter Dbe (area of the electrode side end surface Sbe) of the electrode side end surface Sbe to be joined to the feeding electrode 54 is larger than the diameter Dbt (area of the terminal member side end surface Sbt) of the terminal member side end surface Sbt. it is conceivable that. Further, it is considered that the result that the oxidation resistance is "x" is that a part of the exposed surface Se of the feeding electrode 54 is not covered with the electrode side end surface Sbe of the buffer member 60c.

Further, in the sample SA5, except that the tensile strength was "x", the cracks during brazing, the cracks during the thermal cycle, and the oxidation resistance were all "◎", and good results were obtained. Was brazed. This is because, in the sample SA5 as well, in the cross section, the terminal member side end surface Sbt of the cushioning member 60d is located inside the range of the cushioning member side end surface St of the terminal member 70 in the X-axis direction. It is considered that this is because the exposed surface Se of the feeding electrode 54 is covered with the electrode side end surface Sbe of the buffer member 60b. Regarding the result that the tensile strength is "x", in the above cross section, in the X-axis direction, the diameter Dbe of the electrode side end surface Sbe (area of the electrode side end surface Sbe) to be joined to the feeding electrode 54 and the terminal member side end surface. It is considered that this is because the diameter Dbt of Sbt (the area of the end surface Sbt on the terminal member side) is equivalent.

Further, in the sample SA6, the tensile strength and the oxidation resistance were "⊚", while the occurrence of cracks during brazing and the extension of cracks during the thermal cycle were "x". Regarding the tensile strength and oxidation resistance, in the sample SA6 as well as in the sample SA1, in the cross section, in the X-axis direction, the diameter Dbe of the electrode side end surface Sbe to be joined to the feeding electrode 54 (the area of the electrode side end surface Sbe). ) Is larger than the diameter Dbt of the terminal member side end surface Sbt (the area of the terminal member side end surface Sbt), and the exposed surface Se of the feeding electrode 54 is covered with the electrode side end surface Sbe of the cushioning member 60x. Conceivable. On the other hand, regarding the occurrence of cracks during brazing and the extension of cracks during the thermal cycle, in the above cross section, the terminal member side end surface Sbt of the cushioning member 60x is within the range of the cushioning member side end surface St of the terminal member 70 in the X-axis direction. It is considered that it is located on the outside.

A-9. Effect of this embodiment:
As described above, the heating device 100 of the present embodiment is a device including a holding body 10 and a terminal member 70, and holds an object such as a semiconductor wafer W on the holding surface S1 of the holding body 10. The holding body 10 is a member having a holding surface S1 substantially orthogonal to the Z-axis direction and a back surface S2 on the opposite side of the holding surface S1. The feeding electrode 54 is arranged so as to be exposed on the back surface S2 of the holding body 10. A buffer member 60 having a coefficient of thermal expansion smaller than the coefficient of thermal expansion of the terminal member 70 is arranged between the feeding electrode 54 and the terminal member 70 in the Z-axis direction. Further, the heating device 100 of the present embodiment includes a terminal-side brazing portion 81 for joining the buffer member 60 and the terminal member 70, and an electrode-side brazing portion 82 for joining the feeding electrode 54 and the buffer member 60. .. Further, in the heating device 100 of the present embodiment, in the above cross section, the terminal member side end surface Sbt of the buffer member 60 is located within the range of the electrode side end surface Sbe in the X-axis direction. Further, in the X-axis direction, the terminal member side end surface Sbt of the cushioning member 60 is located inside the range of the cushioning member side end surface St of the terminal member 70.

In the heating device 100 of the present embodiment, the terminal member side end surface Sbt of the cushioning member 60 is located inside the range of the cushioning member side end surface St of the terminal member 70 in the X-axis direction in the cross section. Therefore, at the time of brazing joining, the brazing material forming the terminal-side brazing portion 81 tends to crawl up to the outer peripheral surface of the cushioning member 60 rather than the outer peripheral surface of the terminal member 70. In other words, the terminal-side brazing portion 81 is difficult to be arranged on the outer peripheral surface of the terminal member 70.

Here, when the terminal member side end surface Sbt of the cushioning member 60 is located outside the range of the cushioning member side end surface St of the terminal member 70, the terminal side brazing portion 81 is formed at the time of brazing joining. The brazing material easily crawls up on the outer peripheral surface of the terminal member 70. In the configuration in which the brazing material forming the brazing portion is arranged on the outer peripheral surface of the terminal member 70, the brazing joint is caused by the fact that the coefficient of thermal expansion of the terminal member 70 is larger than the coefficient of thermal expansion of the buffer member 60. When the brazing material is solidified in the above, the brazing material tends to be subjected to tensile stress due to the shrinkage of the terminal member 70. As a result, cracks tend to occur on the surface of the brazed portion. On the other hand, like the heating device 100 of the present embodiment, the terminal member side end surface Sbt of the cushioning member 60 is located inside the range of the cushioning member side end surface St of the terminal member 70 in the X-axis direction in the cross section. In the configuration, the terminal-side brazing portion 81 is more likely to be arranged on the cushioning member-side end surface St of the terminal member 70 than on the outer peripheral surface of the terminal member 70. Therefore, when the brazing material is solidified, the generation of tensile stress on the brazing material due to the shrinkage of the terminal member 70 is suppressed.

Further, in the heating device 100 of the present embodiment, the generation of tensile stress is suppressed at the time of solidification of the brazing material in the brazing joint, so that the generation of tensile residual stress remaining in the brazing portion 81 on the terminal side is generated. It can be suppressed. Therefore, even during the thermal cycle after the brazing joint, it is possible to suppress the generation of cracks in the terminal-side brazing portion 81 due to the tensile residual stress and the extension of the cracks.

Therefore, according to the heating device 100 of the present embodiment, it is possible to suppress the application of tensile stress to the terminal-side brazing portion 81 that joins the cushioning member 60 and the terminal member 70, and by extension, the terminal-side brazing portion. It is possible to suppress the occurrence of cracks in 81.

Further, in the heating device 100 of the present embodiment, the terminal member side end surface Sbt of the cushioning member 60 is located inside the range of the electrode side end surface Sbe of the cushioning member 60 in the X-axis direction in the cross section. Further, in the above cross section, the cushioning member 60 is composed of a substantially rectangular terminal member side portion 61 having a terminal member side end surface Sbt as one side and a substantially rectangular electrode side portion 62 having an electrode side end surface Sbe as one side. Has been done. In other words, in the heating device 100 of the present embodiment, in the above cross section, the electrode side end surface Sbe of the buffer member 60 is larger than the terminal member side end surface Sbt. Therefore, the joint strength between the cushioning member 60 and the feeding electrode 54 is improved as compared with the configuration in which the electrode side end surface Sbe of the cushioning member 60 has the same area as the terminal member side end surface Sbt, and thus the electrode side brazing. The tensile strength in the portion 82 can be improved. Therefore, according to the heating device 100 of the present embodiment, it is possible to suppress the detachment of the buffer member 60 and thus the terminal member 70 from the feeding electrode 54.

Further, in the heating device 100 of the present embodiment, the exposed surface Se exposed on the back surface S2 of the holding body 10 in the feeding electrode 54 in the X-axis direction in the cross section is within the range of the electrode side end surface Sbe of the cushioning member 60. It is located inside. In other words, in the cross section, the entire surface of the exposed surface Se is covered with the electrode side end surface Sbe. If a portion of the exposed surface Se that is not covered by the electrode-side brazed portion 82 is formed, the portion, and thus the feeding electrode 54 itself, may be oxidized or deteriorated in the air atmosphere. In the heating device 100 of the present embodiment, the exposed surface Se of the feeding electrode 54 is located outside the range of the electrode side end surface Sbe of the buffer member 60 in the X-axis direction in the cross section, as compared with the configuration. The entire surface of the exposed surface Se is easily covered with the brazing material (electrode-side brazing portion 82). Therefore, according to the heating device 100 of the present embodiment, oxidation and deterioration of the feeding electrode 54 in the atmospheric atmosphere can be suppressed, and by extension, detachment of the buffer member 60 and thus the terminal member 70 from the feeding electrode 54 can be suppressed. can do.

Further, in the heating device 100 of the present embodiment, the outer edge Et of the cushioning member side end surface St of the terminal member 70 surrounds the outer edge Ebt of the terminal member side end surface Sbt of the cushioning member 60 in the Z-axis direction view. Therefore, in any of the above cross sections, it is possible to suppress the generation of tensile stress on the brazed material at the time of the brazing joint and the generation of the tensile residual stress at the terminal side brazing portion 81. .. Therefore, according to the heating device 100 of the present embodiment, it is possible to more effectively suppress the application of tensile stress to the terminal-side brazed portion 81 that joins the cushioning member 60 and the terminal member 70, and by extension, the terminal. It is possible to more effectively suppress the occurrence of cracks in the side brazed portion 81.

B. Modification example:
The technique disclosed in the present specification is not limited to the above-described embodiment, and can be transformed into various forms without departing from the gist thereof. For example, the following modifications are also possible.

The configuration of the heating device 100 in the above embodiment is merely an example and can be variously modified. For example, in the present embodiment, the above configuration may be adopted in at least one cross section that is parallel to the Z-axis direction and passes through the center of the cushioning member 60 in the Z-axis direction. Further, in the present embodiment, the above configuration may be adopted in at least one cross section that is parallel to the Z-axis direction and does not pass through the center of the cushioning member 60 in the Z-axis direction.

In the heating device 100 of the present embodiment, a part of the surface of the feeding electrode 54 facing the electrode side end surface Sbe of the buffer member 60 (hereinafter, also referred to as “lower surface of the feeding electrode 54”) is the holding body 10. A configuration exposed on the back surface S2 of the above may be adopted. In such a configuration, the exposed surface Se corresponds to a portion of the lower surface of the feeding electrode 54 exposed to the back surface S2 of the holding body 10.

Further, the shape of each member in the above embodiment is merely an example and can be variously deformed. For example, in the above embodiment, the feeding electrode 54 is said to be substantially circular in the Z-axis direction, but the shape of the feeding electrode 54 in the Z-axis direction may be a shape other than the substantially circular shape. The same applies to the cushioning member 60 and the terminal member 70.

Further, the material forming each member in the heating device 100 of the above embodiment is merely an example, and each member may be formed of another material. Further, the method for manufacturing the heating device 100 in the above embodiment is merely an example, and various modifications can be made.

Further, in the above embodiment, the feeding electrode 54 electrically connected to the heater electrode 50, the terminal member 70, the cushioning member 60 arranged between the feeding electrode 54 and the terminal member 70, and the buffering member 60 Although the heating device 100 including the terminal-side brazing portion 81 for joining the terminal member 70 and the electrode-side brazing portion 82 for joining the buffer member 60 and the feeding electrode 54 has been described in detail. The techniques disclosed herein include electrodes such as heater electrodes, RF electrodes or feeding electrodes electrically connected to RF electrodes, which are arranged so that at least a part is exposed on the back surface of the holder, and terminal members. And a cushioning member arranged between the electrode and the terminal member, a terminal-side brazing portion for joining between the cushioning member and the terminal member, and an electrode-side brazing portion for joining between the cushioning member and the electrode. And, it can be similarly applied to other holding devices (for example, an electrostatic chuck, etc.) that hold an object on the surface of the holding body.

10: Holder 12: Recession 20: Columnar support 22: Through hole 30: Joint 50: Heater electrode 52: Via conductor 54: Feed electrode 60: Buffer member 60a: Buffer member 60b: Buffer member 60c: Buffer member 60d: Buffer member 60x: Buffer member 61: Terminal member side part 61b: Terminal member side part 61c: Terminal member side part 62: Electrode side part 62b: Electrode side part 62c: Electrode side part 70: Terminal member 81: Terminal side brazed part 82: Electrode side brazed part 100: Heating device 100a: Heating device 100b: Heating device 100c: Heating device 100d: Heating device 100x: Heating device S1: Holding surface S2: Back surface S3: Top surface Sa: Side surface Sb: Side surface Sbe: Electrode Side end surface Sbt: Terminal member side end surface Se: Exposed surface St: Buffer member side end surface W: Semiconductor wafer

Claims (4)

A retainer having a first surface that is substantially orthogonal to the first direction and a second surface that is opposite to the first surface.
An electrode arranged so that at least a part of the holder is exposed on the second surface of the holder.
With terminal members
A cushioning member arranged between the electrode and the terminal member in the first direction,
A first brazed portion that joins the cushioning member and the terminal member,
A second brazed portion that joins the electrode and the buffer member,
In a holding device for holding an object on the first surface of the holding body.
The coefficient of thermal expansion of the buffer member is smaller than the coefficient of thermal expansion of the terminal member.
In at least one specific cross section substantially orthogonal to the first surface
In the second direction substantially orthogonal to the first direction, of the end faces of the cushioning member in the first direction, the terminal member-side end face facing the terminal member faces the electrode of the cushioning member. It is located within the range of the electrode side end face and
In the second direction, the terminal member side end face of the shock absorber is located inside the range of the cushion member side end face facing the terminal member side end face of the terminal face of the terminal member in the first direction. doing,
A holding device characterized by that. In the holding device according to claim 1,
In the second direction of the specific cross section, the terminal member side end face of the cushioning member is located inside the range of the electrode side end face of the cushioning member.
In the specific cross section, the cushioning member is
A substantially rectangular terminal member side portion having the terminal member side end surface as one side,
It is composed of a substantially rectangular electrode-side portion having the electrode-side end surface as one side.
A holding device characterized by that. In the holding device according to claim 1 or 2.
In the second direction of the specific cross section, the exposed surface exposed on the second surface of the electrode is located inside the range of the electrode side end surface of the cushioning member.
A holding device characterized by that. In the holding device according to any one of claims 1 to 3.
In the first directional view, the outer edge of the end face of the terminal member on the side of the shock absorber surrounds the outer edge of the end face of the shock absorber on the side of the terminal member.
A holding device characterized by that.

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