JP2021022601A - 過電流保護素子 - Google Patents
過電流保護素子 Download PDFInfo
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- JP2021022601A JP2021022601A JP2019136534A JP2019136534A JP2021022601A JP 2021022601 A JP2021022601 A JP 2021022601A JP 2019136534 A JP2019136534 A JP 2019136534A JP 2019136534 A JP2019136534 A JP 2019136534A JP 2021022601 A JP2021022601 A JP 2021022601A
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- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 claims abstract description 24
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 15
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 claims abstract description 11
- 150000003839 salts Chemical class 0.000 claims abstract description 11
- LYTMVABTDYMBQK-UHFFFAOYSA-N 2-benzothiophene Chemical compound C1=CC=CC2=CSC=C21 LYTMVABTDYMBQK-UHFFFAOYSA-N 0.000 claims abstract description 9
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- AVBCFBRGFCGJKX-UHFFFAOYSA-N thieno[3,4-d][1,3]dioxole Chemical compound S1C=C2OCOC2=C1 AVBCFBRGFCGJKX-UHFFFAOYSA-N 0.000 claims abstract description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 14
- 229910052799 carbon Inorganic materials 0.000 claims description 14
- 239000000945 filler Substances 0.000 claims description 11
- 229910021578 Iron(III) chloride Inorganic materials 0.000 claims description 9
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims description 9
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 claims description 6
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 claims description 6
- LBLYYCQCTBFVLH-UHFFFAOYSA-M 2-methylbenzenesulfonate Chemical compound CC1=CC=CC=C1S([O-])(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-M 0.000 claims description 4
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 claims description 4
- 229910000360 iron(III) sulfate Inorganic materials 0.000 claims description 4
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 claims description 4
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 claims description 2
- 229910001870 ammonium persulfate Inorganic materials 0.000 claims description 2
- 238000000034 method Methods 0.000 description 22
- 238000006116 polymerization reaction Methods 0.000 description 14
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 12
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 11
- 239000000203 mixture Substances 0.000 description 9
- 239000002131 composite material Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 239000003960 organic solvent Substances 0.000 description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 7
- GKWLILHTTGWKLQ-UHFFFAOYSA-N 2,3-dihydrothieno[3,4-b][1,4]dioxine Chemical group O1CCOC2=CSC=C21 GKWLILHTTGWKLQ-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 229920000123 polythiophene Polymers 0.000 description 5
- 239000003115 supporting electrolyte Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- -1 thiophene-3,4-bissulfonic acid ester Chemical class 0.000 description 4
- JEDHEMYZURJGRQ-UHFFFAOYSA-N 3-hexylthiophene Chemical compound CCCCCCC=1C=CSC=1 JEDHEMYZURJGRQ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229920000280 Poly(3-octylthiophene) Polymers 0.000 description 3
- 238000006254 arylation reaction Methods 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- LOEBUNMAFMIUNQ-UHFFFAOYSA-N (4-carbamoyloxythiophen-3-yl) carbamate Chemical class C(N)(=O)OC1=CSC=C1OC(N)=O LOEBUNMAFMIUNQ-UHFFFAOYSA-N 0.000 description 2
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- RFKWIEFTBMACPZ-UHFFFAOYSA-N 3-dodecylthiophene Chemical compound CCCCCCCCCCCCC=1C=CSC=1 RFKWIEFTBMACPZ-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 239000012935 ammoniumperoxodisulfate Substances 0.000 description 2
- LPTWEDZIPSKWDG-UHFFFAOYSA-N benzenesulfonic acid;dodecane Chemical compound OS(=O)(=O)C1=CC=CC=C1.CCCCCCCCCCCC LPTWEDZIPSKWDG-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000002685 polymerization catalyst Substances 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- YMMGRPLNZPTZBS-UHFFFAOYSA-N 2,3-dihydrothieno[2,3-b][1,4]dioxine Chemical compound O1CCOC2=C1C=CS2 YMMGRPLNZPTZBS-UHFFFAOYSA-N 0.000 description 1
- FKXCQUBXKMXXBG-UHFFFAOYSA-N 3,4-dibutylthiophene Chemical compound CCCCC1=CSC=C1CCCC FKXCQUBXKMXXBG-UHFFFAOYSA-N 0.000 description 1
- KWMRVTDUWMBHRV-UHFFFAOYSA-N 3,4-diethylthiophene Chemical compound CCC1=CSC=C1CC KWMRVTDUWMBHRV-UHFFFAOYSA-N 0.000 description 1
- ZUDCKLVMBAXBIF-UHFFFAOYSA-N 3,4-dimethoxythiophene Chemical compound COC1=CSC=C1OC ZUDCKLVMBAXBIF-UHFFFAOYSA-N 0.000 description 1
- MHKXKQNKNKCYKD-UHFFFAOYSA-N 3-butoxy-4-methylthiophene Chemical compound CCCCOC1=CSC=C1C MHKXKQNKNKCYKD-UHFFFAOYSA-N 0.000 description 1
- JAYBIBLZTQMCAY-UHFFFAOYSA-N 3-decylthiophene Chemical compound CCCCCCCCCCC=1C=CSC=1 JAYBIBLZTQMCAY-UHFFFAOYSA-N 0.000 description 1
- QWCYHUDGBIAFEG-UHFFFAOYSA-N 3-dodecoxy-4-methylthiophene Chemical compound CCCCCCCCCCCCOC1=CSC=C1C QWCYHUDGBIAFEG-UHFFFAOYSA-N 0.000 description 1
- LBJLOQHZMLJQPB-UHFFFAOYSA-N 3-heptadecylthiophene Chemical compound CCCCCCCCCCCCCCCCCC=1C=CSC=1 LBJLOQHZMLJQPB-UHFFFAOYSA-N 0.000 description 1
- IUUMHORDQCAXQU-UHFFFAOYSA-N 3-heptylthiophene Chemical compound CCCCCCCC=1C=CSC=1 IUUMHORDQCAXQU-UHFFFAOYSA-N 0.000 description 1
- STXGEZASQLSGHD-UHFFFAOYSA-N 3-hexadecoxy-4-methylthiophene Chemical compound CCCCCCCCCCCCCCCCOC1=CSC=C1C STXGEZASQLSGHD-UHFFFAOYSA-N 0.000 description 1
- FRVZSODZVJPMKO-UHFFFAOYSA-N 3-hexadecylthiophene Chemical compound CCCCCCCCCCCCCCCCC=1C=CSC=1 FRVZSODZVJPMKO-UHFFFAOYSA-N 0.000 description 1
- HGDGACBSGVRCSM-UHFFFAOYSA-N 3-methoxy-4-methylthiophene Chemical compound COC1=CSC=C1C HGDGACBSGVRCSM-UHFFFAOYSA-N 0.000 description 1
- KYVOCPGWCUIAOR-UHFFFAOYSA-N 3-methyl-4-octoxythiophene Chemical compound CCCCCCCCOC1=CSC=C1C KYVOCPGWCUIAOR-UHFFFAOYSA-N 0.000 description 1
- UUHSVAMCIZLNDQ-UHFFFAOYSA-N 3-nonylthiophene Chemical compound CCCCCCCCCC=1C=CSC=1 UUHSVAMCIZLNDQ-UHFFFAOYSA-N 0.000 description 1
- XCDPMYHGQPPZST-UHFFFAOYSA-N 3-pentadecylthiophene Chemical compound CCCCCCCCCCCCCCCC=1C=CSC=1 XCDPMYHGQPPZST-UHFFFAOYSA-N 0.000 description 1
- CAEIOINMYGTXNS-UHFFFAOYSA-N 3-tetradecylthiophene Chemical compound CCCCCCCCCCCCCCC=1C=CSC=1 CAEIOINMYGTXNS-UHFFFAOYSA-N 0.000 description 1
- GWLZAINKLAPIBB-UHFFFAOYSA-N 3-tridecylthiophene Chemical compound CCCCCCCCCCCCCC=1C=CSC=1 GWLZAINKLAPIBB-UHFFFAOYSA-N 0.000 description 1
- STIIRMZYURVVGK-UHFFFAOYSA-N 3-undecylthiophene Chemical compound CCCCCCCCCCCC=1C=CSC=1 STIIRMZYURVVGK-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 235000008429 bread Nutrition 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N malonic acid group Chemical group C(CC(=O)O)(=O)O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000004899 motility Effects 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920002849 poly(3-ethoxythiophene) polymer Polymers 0.000 description 1
- 229920002850 poly(3-methoxythiophene) polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/16—Halogen-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/30—Sulfur-, selenium- or tellurium-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L65/00—Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/12—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances organic substances
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/02—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient
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- Chemical & Material Sciences (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Ceramic Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Thermistors And Varistors (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
また、式(8)において、R16、R17はそれぞれ独立して水素原子、ヒドロキシ基、カルボキシ基を表している。R16、R17のうち、一方が水素原子の場合、他方は水素原子以外のヒドロキシ基、又はカルボキシ基を表している。
本発明において、ポリ(3−アルキルチオフェン)以外のポリチオフェンとしては、例えば、ポリ(3,4−メチレンジオキシチオフェン)、ポリ(3,4−エチレンジオキシチオフェン)、ポリ(3,4−ジメチルチオフェン)、ポリ(3,4−ジエチルチオフェン)、ポリ(3,4−ジブチルチオフェン)、ポリ(3−メトキシチオフェン)、ポリ(3,4−ジメトキシチオフェン)、ポリ(3−エトキシチオフェン)、ポリ(3−メチル−4−メトキシチオフェン)、ポリ(3−メチル−4−ブトキシチオフェン)、ポリ(3−メチル−4−オクチルオキシチオフェン)、ポリ(3−メチル−4−ラウリルオキシチオフェン)、ポリ(3−メチル−4−セチルオキシチオフェン)、ポリ{R,S−3,4−(1’−ヒドロキシメチル)エチレンジオキシチオフェン}、ポリ(3,4−エチレンオキシチアチオフェン)、ポリ(イソベンゾチオフェン){ポリ(2−ベンゾチオフェン)}等が挙げられる。これらのうち、高導電性、加工性及び工業的な入手可能性から、ポリ(3,4−メチレンジオキシチオフェン)、ポリ(3,4−エチレンジオキシチオフェン)又はポリ(イソベンゾチオフェン){ポリ(2−ベンゾチオフェン)}が特に好ましい。
本発明の過電流保護素子を構成する複合体の製造方法としては、特に限定するものではないが、例えば、以下に示す(a)及び(b)の方法がある。
本発明の過電流保護素子は、上記した本発明の複合体からなる。
本発明の過電流保護素子の製造方法としては、特に限定するものではないが、例えば、以下に示す(c)及び(d)の方法がある。
(組成)
図1の左側に今回作製した実施例及び比較例の各過電流保護素子の組成の一例を示す。PEDOT及びP3HTにおいて、%は重量%における互いの比率を意味している。また、塩化第二鉄(FeCl3)及び炭素充填剤において、○は当該物質が含まれていることを示し、×は当該物質が含まれていないことを示している。
図2に実施例及び比較例に係る過電流保護素子の特性を測定するための測定装置の回路図の一例を示す。この測定装置は、直流安定化電源(菊水電子工業株式会社製、型番:7325)、2つの熱電対(製造会社及び型番いずれも不明)、2本の炭素皮膜抵抗(製造会社及び型番いずれも不明)及びデータロガー(日置電機株式会社製、型番:8420)から構成されている。
図1の右側に今回作製した過電流保護素子単体の測定開始時抵抗値及びPTC現象の有無について示す。測定開始時抵抗値は、測定回路全体をオーブントースター内に載置し、測定を開始する時に測定した抵抗値を表している。
Claims (4)
- 炭素充填剤をさらに含むことを特徴とする請求項1に記載の過電流保護素子。
- 前記ポリ(3−アルキルチオフェン)と前記ポリ(3,4−メチレンジオキシチオフェン)、前記ポリ(3,4−エチレンジオキシチオフェン)又は前記ポリ(2−ベンゾチオフェン)のいずれかとの割合は、1:3から3:1であることを特徴とする請求項1又は2に記載の過電流保護素子。
- 前記過硫酸塩は、過硫酸アンモニウム、過硫酸カリウム又は過硫酸ナトリウムのいずれかであり、前記第二鉄塩は、硫酸第二鉄、塩化第二鉄又はトルエンスルホン酸第二鉄のいずれかであることを特徴とする請求項1乃至3のいずれかに記載の過電流保護素子。
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JP2019136534A JP6795826B1 (ja) | 2019-07-25 | 2019-07-25 | 過電流保護素子 |
PCT/JP2020/028381 WO2021015223A1 (ja) | 2019-07-25 | 2020-07-22 | 過電流保護素子 |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2008205037A (ja) * | 2007-02-16 | 2008-09-04 | Tetsuo Hino | ポリマーヒューズおよびそれを用いた電子機器 |
WO2011099474A1 (ja) * | 2010-02-09 | 2011-08-18 | 王子製紙株式会社 | 導電性積層体およびそれを用いたタッチパネル |
JP2019164049A (ja) * | 2018-03-20 | 2019-09-26 | 富士通株式会社 | 検出装置及びその製造方法、測定装置 |
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- 2019-07-25 JP JP2019136534A patent/JP6795826B1/ja active Active
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2008205037A (ja) * | 2007-02-16 | 2008-09-04 | Tetsuo Hino | ポリマーヒューズおよびそれを用いた電子機器 |
WO2011099474A1 (ja) * | 2010-02-09 | 2011-08-18 | 王子製紙株式会社 | 導電性積層体およびそれを用いたタッチパネル |
JP2019164049A (ja) * | 2018-03-20 | 2019-09-26 | 富士通株式会社 | 検出装置及びその製造方法、測定装置 |
Non-Patent Citations (2)
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