JP2021008015A - Installation method for processing-liquid waste treatment apparatus - Google Patents
Installation method for processing-liquid waste treatment apparatus Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 35
- 238000009434 installation Methods 0.000 title claims abstract description 21
- 239000010808 liquid waste Substances 0.000 title abstract 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 108
- 239000007788 liquid Substances 0.000 claims description 149
- 239000002699 waste material Substances 0.000 claims description 149
- 238000011900 installation process Methods 0.000 claims description 20
- 238000007599 discharging Methods 0.000 claims description 2
- 238000011084 recovery Methods 0.000 abstract description 11
- 239000013505 freshwater Substances 0.000 description 24
- 238000001914 filtration Methods 0.000 description 23
- 238000005342 ion exchange Methods 0.000 description 19
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 5
- 239000003456 ion exchange resin Substances 0.000 description 5
- 229920003303 ion-exchange polymer Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000002918 waste heat Substances 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
Abstract
Description
本発明は、加工装置に加工水を供給すると共に、使用済みの加工廃液を回収して加工水に生成して循環させる加工廃液処理装置の設置方法に関する。 The present invention relates to a method for installing a processing waste liquid treatment apparatus that supplies processing water to the processing apparatus and collects used processing waste liquid to generate and circulate it in the processing water.
ＩＣ、ＬＳＩ等の複数のデバイスが分割予定ラインによって区画され、表面に形成されたウエーハは、研削装置によって裏面が研削され、所定の厚みに形成された後、ダイシング装置によって個々のデバイスチップに分割され、携帯電話、パソコン等の電気機器に利用される。 A plurality of devices such as ICs and LSIs are partitioned by a planned division line, and the wafer formed on the front surface is divided into individual device chips by a dicing device after the back surface is ground by a grinding device and formed to a predetermined thickness. It is used for electric devices such as mobile phones and personal computers.
研削装置、ダイシング装置等の加工装置は、加工水として純水を多く利用する。加工に使用された加工水をそのまま廃棄したのでは不経済であることから、本出願人によって加工装置から排出される使用済みの加工廃液を精製して加工水を生成し循環させて加工水を再利用するための加工廃液処理装置を提案している（特許文献１を参照）。 Processing equipment such as grinding equipment and dicing equipment uses a large amount of pure water as processing water. Since it is uneconomical to dispose of the processing water used for processing as it is, the applicant purifies the used processing waste liquid discharged from the processing equipment to generate and circulate the processing water to generate the processing water. We have proposed a processing waste liquid treatment device for reuse (see Patent Document 1).
上記した加工廃液処理装置を設置する場合、加工廃液処理装置の設置台数は、加工装置の台数に応じて決定され、例えば、研削装置１台に対して２台配設される場合や、ダイシング装置２台に対して１台を設置する場合等ある。この加工廃液処理装置の設置台数は、連通される加工装置がフル稼働した場合に使用される加工水の水量を加工廃液処理装置が供給できることを前提に決定される。 When the above-mentioned processing waste liquid treatment equipment is installed, the number of processing waste liquid treatment equipment installed is determined according to the number of processing equipment. For example, two units are arranged for one grinding device or a dicing device. In some cases, one unit is installed for every two units. The number of installed processing waste liquid treatment devices is determined on the premise that the processing waste liquid treatment device can supply the amount of processing water used when the communication processing device is fully operated.
ところで、ダイシング装置や研削装置等の加工装置は、常にフル稼働しているわけではなく、被加工物を収容したカセットを搬入、排出したりする時間、被加工物の種類が変更になった場合等において加工手段(切削ブレード、研削砥石）を交換する時間、加工装置のメンテナンスを実施する時間、作業者によって加工条件を設定したりする時間等、様々な場面で加工装置が実際に加工を実施せずに停止している時間が存在する。 By the way, processing equipment such as dicing equipment and grinding equipment is not always in full operation, and when the time for loading and unloading cassettes containing the workpiece and the type of workpiece are changed. The processing equipment actually performs processing in various situations such as the time to replace the processing means (cutting blade, grinding wheel), the time to perform maintenance of the processing equipment, the time to set the processing conditions by the operator, etc. There is a time when it is stopped without.
すなわち、加工水を使用する複数の加工装置を同じ作業スペースに設置して、加工廃液処理装置を設置して加工水を循環させるシステムを構築する場合、複数の加工装置の全てが同時にフル稼働状態となって、長時間その状態が維持されることは殆どなく、各加工装置がフル稼働した場合を想定して、加工廃液処理装置の台数を決定して設置すると、加工廃液処理装置がフル活用されず、不経済であるという問題が生じ、加工装置の台数が増えた場合に特に問題となる。 That is, when a plurality of processing devices that use processing water are installed in the same work space and a processing waste liquid treatment device is installed to construct a system for circulating the processing water, all of the plurality of processing devices are in full operation at the same time. Therefore, the state is rarely maintained for a long time, and if the number of processing waste liquid treatment equipment is determined and installed assuming that each processing equipment is fully operated, the processing waste liquid treatment equipment will be fully utilized. However, there is a problem that it is uneconomical, which becomes a particular problem when the number of processing devices increases.
本発明は、上記事実に鑑みなされたものであり、その主たる技術課題は、適正な台数の加工廃液処理装置を設置して、不経済とならない加工廃液処理装置の設置方法を提供することにある。 The present invention has been made in view of the above facts, and a main technical problem thereof is to provide an installation method of a processing waste liquid treatment apparatus that does not become uneconomical by installing an appropriate number of processing waste liquid treatment apparatus. ..
上記主たる技術課題を解決するため、本発明によれば、加工装置に加工水を供給すると共に、使用済みの加工廃液を回収して加工水に生成して循環させる加工廃液処理装置の設置方法であって、複数の加工装置がフル稼働した際に使用する総加工水量と、該加工廃液処理装置の加工水供給能力とを比較して、該加工廃液処理装置の必要台数を設定する必要台数設定工程と、該複数の加工装置の稼働率を算定する稼働率算定工程と、該必要台数設定工程において設定された加工廃液処理装置の必要台数に該稼働率算定工程において算定された稼働率を乗じて小数点以下を繰り上げて加工廃液処理装置の適正台数を算定する適正台数算定工程と、該適正台数の加工廃液処理装置を設置する加工廃液処理装置設置工程と、該複数の加工装置から排出される加工廃液を収集する収集タンクを設置する収集タンク設置工程と、各加工廃液処理装置が生成した加工水を貯水する貯水タンクを設置する貯水タンク設置工程と、該収集タンクに連通し各加工廃液処理装置が加工廃液を回収するための回収路を設置する回収路設置工程と、各加工廃液処理装置に連通し加工廃液処理装置が生成した加工水を、該貯水タンクに排出する排出路を設置する排出路設置工程と、該貯水タンクに連通し、各加工装置に加工水を供給する供給路を設置する供給路設置工程と、を含む加工廃液処理装置の設置方法が提供される。 In order to solve the above-mentioned main technical problem, according to the present invention, according to the present invention, there is a method of installing a processing waste liquid treatment device that supplies processing water to the processing device and collects used processing waste liquid to generate it in the processing water and circulates it. Therefore, the required number of processing waste liquid treatment equipment is set by comparing the total amount of processing water used when a plurality of processing equipments are fully operated with the processing water supply capacity of the processing waste liquid treatment equipment. The process, the operation rate calculation process for calculating the operation rate of the plurality of processing devices, and the required number of processing waste liquid treatment devices set in the required number setting process are multiplied by the operation rate calculated in the operation rate calculation process. The appropriate number calculation process for calculating the appropriate number of processing waste liquid treatment devices by moving up the decimal point, the processing waste liquid treatment device installation process for installing the appropriate number of processing waste liquid treatment devices, and the discharge from the plurality of processing devices. A collection tank installation process that installs a collection tank that collects processing waste liquid, a water storage tank installation process that installs a water storage tank that stores the processed water generated by each processing waste liquid treatment device, and each processing waste liquid treatment that communicates with the collection tank. A collection path installation process for installing a collection path for the device to collect the processing waste liquid, and a discharge path for discharging the processed water generated by the processing waste liquid treatment device to the water storage tank by communicating with each processing waste liquid treatment device are installed. Provided is a method for installing a processing waste liquid treatment device, which includes a discharge path setting step and a supply path setting step of installing a supply path for supplying processed water to each processing device by communicating with the water storage tank.
本発明の加工廃液処理装置の設置方法は、加工装置に加工水を供給すると共に、使用済みの加工廃液を回収して加工水に生成して循環させる加工廃液処理装置の設置方法であって、複数の加工装置がフル稼働した際に使用する総加工水量と、該加工廃液処理装置の加工水供給能力とを比較して、該加工廃液処理装置の必要台数を設定する必要台数設定工程と、該複数の加工装置の稼働率を算定する稼働率算定工程と、該必要台数設定工程において設定された加工廃液処理装置の必要台数に該稼働率算定工程において算定された稼働率を乗じて小数点以下を繰り上げて加工廃液処理装置の適正台数を算定する適正台数算定工程と、該適正台数の加工廃液処理装置を設置する加工廃液処理装置設置工程と、該複数の加工装置から排出される加工廃液を収集する収集タンクを設置する収集タンク設置工程と、各加工廃液処理装置が生成した加工水を貯水する貯水タンクを設置する貯水タンク設置工程と、該収集タンクに連通し各加工廃液処理装置が加工廃液を回収するための回収路を設置する回収路設置工程と、各加工廃液処理装置に連通し加工廃液処理装置が生成した加工水を、該貯水タンクに排出する排出路を設置する排出路設置工程と、該貯水タンクに連通し、各加工装置に加工水を供給する供給路を設置する供給路設置工程と、を含むことにより、複数の加工装置の稼働率に対応して適正な台数の加工廃液処理装置することができ、不経済であるという問題が解消する。 The method for installing the processing waste liquid treatment device of the present invention is a method for installing the processing waste liquid treatment device that supplies the processing water to the processing device, collects the used processing waste liquid, generates it in the processing water, and circulates it. A required number setting process for setting the required number of processing waste liquid treatment equipment by comparing the total amount of processing water used when a plurality of processing equipments are fully operated with the processing water supply capacity of the processing waste liquid treatment equipment. The operating rate calculation process for calculating the operating rates of the plurality of processing devices and the required number of processing waste liquid treatment devices set in the required number setting process are multiplied by the operating rate calculated in the operating rate calculation process to the decimal point. The appropriate number calculation process for calculating the appropriate number of processing waste liquid treatment equipment, the processing waste liquid treatment equipment installation process for installing the appropriate number of processing waste liquid treatment equipment, and the processing waste liquid discharged from the plurality of processing equipment. A collection tank installation process that installs a collection tank to collect, a water storage tank installation process that installs a water storage tank that stores the processed water generated by each processing waste liquid treatment device, and each processing waste liquid treatment device that communicates with the collection tank A collection path installation process that installs a collection path for collecting waste liquid, and a discharge channel installation that installs a discharge path that communicates with each processing waste liquid treatment device and discharges the processed water generated by the processing waste liquid treatment device to the water storage tank. By including the process and the supply path installation process of installing a supply path for supplying processed water to each processing device by communicating with the water storage tank, an appropriate number of units can be used according to the operating rates of a plurality of processing devices. It can be used as a processing waste liquid treatment device, and the problem of being uneconomical is solved.
以下、本発明に基づく加工廃液処理装置の設置方法に係る実施形態について、添付図面を参照しながら、詳細に説明する。 Hereinafter, embodiments relating to the installation method of the processing waste liquid treatment apparatus based on the present invention will be described in detail with reference to the attached drawings.
図１には、本実施形態に基づいて、複数の加工装置（１０台：Ｎ１〜Ｎ１０）に対して、適正な台数の加工廃液処理装置Ｍ１〜Ｍ８を設置した加工水の循環システムの例を示すものである。図１〜図３を参照しながら、本実施形態の加工廃液処理装置Ｍ１〜Ｍ８の設置方法について説明する。 FIG. 1 shows an example of a processed water circulation system in which an appropriate number of processing waste liquid treatment devices M1 to M8 are installed for a plurality of processing devices (10 units: N1 to N10) based on the present embodiment. It shows. The installation method of the processing waste liquid treatment devices M1 to M8 of the present embodiment will be described with reference to FIGS. 1 to 3.
（必要台数設定工程）
まず、図１に示す本実施形態の複数の加工装置Ｎ１〜Ｎ１０を特定する。加工装置Ｎ１〜Ｎ１０は、被加工物に対して切削加工を施すものであり、所定量の加工水（切削水）を必要とする切削装置である。本実施形態では、説明の便宜上、加工装置Ｎ１、Ｎ１０のみ詳細を示し、加工装置Ｎ２〜Ｎ９は図示を簡略化して示している。なお、加工装置Ｎ１〜Ｎ１０は、同一の切削装置であるとして以下説明する。
(Required number setting process)
First, the plurality of processing devices N1 to N10 of the present embodiment shown in FIG. 1 are specified. The processing devices N1 to N10 are cutting devices that perform cutting on the workpiece and require a predetermined amount of processing water (cutting water). In the present embodiment, for convenience of explanation, only the processing devices N1 and N10 are shown in detail, and the processing devices N2 to N9 are shown in a simplified manner. The processing devices N1 to N10 will be described below assuming that they are the same cutting device.
加工廃液処理装置の必要台数を設定するに際し、図１に示す加工水の循環システムに含まれる加工装置Ｎ１〜Ｎ１０を特定したならば、各加工装置Ｎ１〜Ｎ１０がフル稼働している最中に必要とする加工水の単位時間当たりの加工水量をＷＮ１〜ＷＮ１０とし、それらの全てを加算し（又は乗算し）、全加工装置Ｎ１〜Ｎ１０がフル稼働した場合の総加工水量ＷＳＵＭを算出する。 When setting the required number of processing waste liquid treatment devices, if the processing devices N1 to N10 included in the processing water circulation system shown in FIG. 1 are specified, while each processing device N1 to N10 is in full operation. The amount of processing water required per unit time is W N1 to W N10 , all of them are added (or multiplied), and the total amount of processing water W SUM when all the processing devices N1 to N10 are fully operated is calculated. calculate.
上記したように総加工水量ＷＳＵＭを算出したならば、この総加工水量ＷＳＵＭを処理することを想定した場合に必要となる加工廃液処理装置の必要台数を設定する。加工廃液処理装置の台数を設定するに際しては、各加工廃液処理装置の加工水供給能力Ｍｗを考慮する。本実施形態では、１台の加工廃液処理装置の加工水供給能力Ｍｗが、各加工装置（Ｎ１〜Ｎ１０）がフル稼働した際の加工水量（ＷＮ１〜ＷＮ１０）のそれぞれと同一である。これに基づき、複数の加工装置Ｎ１〜Ｎ１０がフル稼働した際に使用する総加工水量ＷＳＵＭと、１台の加工廃液処理装置の加工水供給能力Ｍｗとを比較して、加工廃液処理装置の必要台数を設定する。すなわち、加工廃液処理装置の必要台数は、以下の如く演算される。
ＷＳＵＭ／１台の加工廃液処理装置の加工水供給量Ｍｗ＝１０台
After calculating the total processing water amount W SUM as described above, the required number of processing waste liquid treatment devices required when it is assumed that the total processing water amount W SUM is to be processed is set. When setting the number of processing waste liquid treatment devices, the processing water supply capacity Mw of each processing waste liquid treatment device is taken into consideration. In the present embodiment, the processing water supply capacity Mw of one processing waste liquid treatment apparatus is the same as the amount of processing water (W N1 to W N10 ) when each processing apparatus ( N1 to N10 ) is fully operated. Based on this, the total processing water amount W SUM used when a plurality of processing devices N1 to N10 are fully operated is compared with the processing water supply capacity Mw of one processing waste liquid treatment device, and the processing waste liquid treatment device is compared. Set the required number. That is, the required number of processing waste liquid treatment devices is calculated as follows.
W SUM / Processing water supply amount of 1 processing waste liquid treatment device Mw = 10 units
（稼働率算定工程）
次いで、加工装置Ｎ１〜Ｎ１０の稼働率を算定する。稼働率は、過去の稼働実績、又は、加工計画に基づき算定することができる。最も典型的には、加工作業が実施される加工作業時間（例えば８時間／１日）内において、加工水を供給しながら被加工物に対し加工を施す時間の合計を稼働時間として、所定日数における平均値を算出し、該加工作業時間の合計時間における該稼働時間の割合に基づいて該稼働率を算定する。本実施形態では、加工装置Ｎ１〜Ｎ１０の全体の稼働率が７５％であったとする。
(Operating rate calculation process)
Next, the operating rates of the processing devices N1 to N10 are calculated. The operating rate can be calculated based on past operating results or processing plans. Most typically, within the processing work time (for example, 8 hours / day) in which the processing work is performed, the total time for processing the workpiece while supplying the processing water is set as the operating time, and the predetermined number of days The average value in the above is calculated, and the operating rate is calculated based on the ratio of the operating time to the total time of the processing work time. In the present embodiment, it is assumed that the overall operating rate of the processing devices N1 to N10 is 75%.
（適正台数算定工程）
上記したように、加工装置が全てフル稼働した場合を想定して算定した加工廃液処理装置の必要台数（１０台）、と稼働率（７５％）を算定したならば、該必要台数（１０台）に該稼働率（７５％）を乗じて仮適正台数を算定する。
仮適正台数：１０台×０．７５＝７．５（台）
(Appropriate number calculation process)
As described above, if the required number of processing waste liquid treatment equipment (10 units) and the operating rate (75%) are calculated assuming that all the processing equipment is fully operated, the required number (10 units) is calculated. ) Is multiplied by the operating rate (75%) to calculate the provisional appropriate number of units.
Temporary appropriate number: 10 units x 0.75 = 7.5 (units)
上記したように、必要台数（１０台）に稼働率（７５％）を乗じて得られた仮適正台数が７．５台であったことから、小数点以下を繰り上げて、実際に設置する加工廃液処理装置の適正台数を８台と算定する。 As mentioned above, the provisional appropriate number of units obtained by multiplying the required number of units (10 units) by the operating rate (75%) was 7.5 units, so the processing waste liquid to be actually installed is moved up to the nearest whole number. Calculate the appropriate number of processing devices as eight.
（加工廃液処理装置設置工程）
上記した適正台数算定工程によって、加工廃液処理装置の適正台数（８台）を算定したならば、図１に示すように、加工装置Ｎ１〜Ｎ１０に対応して、８台の加工廃液処理装置Ｍ１〜Ｍ８を設置する。なお、図１では、説明の都合上、加工排熱処理装置Ｍ１、Ｍ８のみを詳細に示し、加工廃液処理装置Ｍ２〜Ｍ７についてはその記載を簡略化して示している。
(Processing waste liquid treatment equipment installation process)
After calculating the appropriate number of processing waste liquid treatment devices (8 units) by the above-mentioned appropriate number calculation process, as shown in FIG. 1, eight processing waste liquid treatment devices M1 correspond to the processing devices N1 to N10. ~ M8 is installed. In FIG. 1, for convenience of explanation, only the processing waste heat treatment devices M1 and M8 are shown in detail, and the processing waste liquid treatment devices M2 to M7 are shown in a simplified manner.
（収集タンク設置工程）
本実施形態では、さらに、加工装置Ｎ１〜Ｎ１０から排出される加工廃液を収集する収集タンク１０を設置する（収集タンク設置工程）。なお、収集タンク１０は、複数の加工装置からの加工廃液を集約して収集するものであり、１つの収集タンク１０によって全ての加工装置Ｎ１〜Ｎ１０の加工廃液を収集するものである。
(Collection tank installation process)
In the present embodiment, a collection tank 10 for collecting the processing waste liquid discharged from the processing devices N1 to N10 is further installed (collection tank installation step). The collection tank 10 aggregates and collects the processing waste liquids from a plurality of processing devices, and collects the processing waste liquids of all the processing devices N1 to N10 by one collection tank 10.
（貯水タンク設置工程）
さらに、加工廃液処理装置Ｍ１〜Ｍ８が加工廃液を精製して生成した加工水を貯水する貯水タンク１２を設置する（貯水タンク設置工程）。貯水タンク１２も、収集タンク１０と同様に、複数の加工廃液処理装置Ｍ１〜Ｍ８が生成して排出した加工水を集約して貯水するものであり、１つの貯水タンク１２によって全ての加工廃液処理装置Ｍ１〜Ｍ８の加工水を貯水するものである。
(Water storage tank installation process)
Further, the processing waste liquid treatment devices M1 to M8 install a water storage tank 12 for storing the processed water produced by purifying the processing waste liquid (water storage tank installation step). Similar to the collection tank 10, the water storage tank 12 also collects and stores the processed water generated and discharged by the plurality of processing waste liquid treatment devices M1 to M8, and treats all the processing waste liquid by one water storage tank 12. The processing water of the devices M1 to M8 is stored.
（回収路設置工程）
さらに、収集タンク１０に連通し各加工廃液処理装置Ｍ１〜Ｍ８が収集タンク１０から加工廃液を回収するための回収路２０を設置する（回収路設置工程）。回収路２０は、図１に示すように、各加工装置Ｎ１〜Ｎ１０から収集タンク１０に加工廃液を導く第１回収路２２と、収集タンク１０から加工廃液処理装置Ｍ１〜Ｍ８に導く第２回収路２４とからなる。第１回収路２２は、各加工装置Ｎ１〜Ｎ１０から、収集タンク１０に加工廃液を導く個別配管２２ａ〜２２ｊによって構成される。また、第２回収路２４は、収集タンク１０から各加工廃液処理装置Ｍ１〜Ｍ８に加工廃液を導く個別配管２４ａ〜２４ｈによって構成される。
(Recovery path installation process)
Further, the processing waste liquid treatment devices M1 to M8 communicate with the collection tank 10 and install a collection path 20 for collecting the processing waste liquid from the collection tank 10 (collection path installation step). As shown in FIG. 1, the recovery path 20 includes a first recovery path 22 for guiding the processing waste liquid from the processing devices N1 to N10 to the collection tank 10, and a second recovery path 22 for guiding the processing waste liquid from the collection tank 10 to the processing waste liquid treatment devices M1 to M8. It consists of a road 24. The first recovery path 22 is composed of individual pipes 22a to 22j for guiding the processing waste liquid from the processing devices N1 to N10 to the collection tank 10. The second recovery path 24 is composed of individual pipes 24a to 24h for guiding the processing waste liquid from the collection tank 10 to the processing waste liquid treatment devices M1 to M8.
ここで、図２、及び図３を参照しながら、本実施形態において設置される加工廃液処理装置の概略について、より具体的に説明する。 Here, the outline of the processing waste liquid treatment apparatus installed in the present embodiment will be described more specifically with reference to FIGS. 2 and 3.
図２は、本実施形態の加工廃液処理装置Ｍ１の全体斜視図であって、通常時に加工廃液処理装置Ｍ１の全体を覆う図示しないカバー部材を取り外し、各構成間を連通する配管を適宜省略した状態を示している。また、図３は、図２に示す加工廃液処理装置Ｍ１を分解した状態の斜視図を示し、各構成を配管で連通した状態を示している。 FIG. 2 is an overall perspective view of the processing waste liquid treatment device M1 of the present embodiment, in which a cover member (not shown) that normally covers the entire processing waste liquid treatment device M1 is removed, and piping communicating between the configurations is appropriately omitted. Indicates the state. Further, FIG. 3 shows a perspective view of the processing waste liquid treatment apparatus M1 shown in FIG. 2 in a disassembled state, and shows a state in which each configuration is communicated with a pipe.
図２に示すように、加工廃液処理装置Ｍ１は、収集タンク１０から第２回収路２４を構成する個別配管２４ａを介して導入される加工廃液を一旦収容する廃液予備タンク２と、廃液予備タンク２に収容された加工廃液を送給する廃液送給ポンプ３と、廃液送給ポンプ３によって送られた加工廃液を濾過する廃液濾過手段４と、廃液濾過手段４によって濾過された清水を貯水する清水貯水タンク５と、清水貯水タンク５に貯水された清水を、純水化処理して後述する排出路３０を構成する個別配管３０ａに排出する純水生成手段６と、廃液濾過手段４の後壁側に設置されフレキシブルパイプ状の配管を支持する傾斜支持板７と、操作パネル及び表示モニタを備え各構成の作動を制御する制御手段８と、を備えている。なお、図２では、各加工廃液処理装置Ｍ１の各構成を連通する配管構成は適宜省略されており、図３を参照しながら、加工廃液処理装置Ｍ１に導入された加工廃液が、各構成を経て純水化されて排出されるまでの加工廃液の流れについて説明する。 As shown in FIG. 2, the processing waste liquid treatment device M1 includes a waste liquid reserve tank 2 for temporarily storing the processing waste liquid introduced from the collection tank 10 via the individual pipes 24a constituting the second collection path 24, and a waste liquid reserve tank. The waste liquid feeding pump 3 for supplying the processing waste liquid contained in 2, the waste liquid filtering means 4 for filtering the processing waste liquid sent by the waste liquid feeding pump 3, and the fresh water filtered by the waste liquid filtering means 4 are stored. After the fresh water storage tank 5 and the pure water generating means 6 and the waste liquid filtering means 4 that purify the fresh water stored in the fresh water storage tank 5 and discharge it to the individual pipes 30a constituting the discharge passage 30 described later. It is provided with an inclined support plate 7 installed on the wall side to support flexible pipe-shaped pipes, and a control means 8 having an operation panel and a display monitor to control the operation of each configuration. In addition, in FIG. 2, the piping configuration for communicating each configuration of each processing waste liquid treatment device M1 is appropriately omitted, and the machining waste liquid introduced into the machining waste liquid treatment device M1 has each configuration with reference to FIG. The flow of the processing waste liquid from being purified to pure water and being discharged will be described.
加工廃液処理装置Ｍ１に配設された制御手段８によって、加工廃液の処理が開始されると、廃液送給ポンプ３が作動され、廃液予備タンク２から吸い上げられた加工廃液は配管５０を介して廃液濾過手段４に送給される。なお、廃液予備タンク２内の加工廃液が少なくなると、収集タンク１０から加工廃液が適宜導入される。廃液濾過手段４は、第１の濾過フィルター４ａと、第２の濾過フィルター４ｂとを備え、清水受けパン４ｃ上に設置されている。廃液送給ポンプ３と、第１の濾過フィルター４ａ、及び第２の濾過フィルター４ｂとを接続する配管５０上には、電磁開閉弁５２が配設されている。図に示すように、電磁開閉弁５２がＯＦＦで、ばねにより左方（１側）に付勢されている場合は、廃液送給ポンプ３によって送給された加工廃液が第１の濾過フィルター４ａに導かれ、電磁開閉弁５２が通電（ＯＮ）され右方（０側）に付勢されると、廃液送給ポンプ３によって送給された加工廃液が第２の濾過フィルター４ｂに導かれる。第１の濾過フィルター４ａ、又は第２の濾過フィルター４ｂに導かれた加工廃液は、加工廃液に混入している切削屑等が濾過されて清水に精製され、清水受けパン４ｃに流出する。配管５０上には、分岐配管５１を介して制御手段８に接続された圧力計６０が接続されており、配管５０内の圧力を監視する。加工廃液の濾過が一方の濾過フィルターによって継続して実施されると、フィルターに切削屑等が堆積してやがて目詰まりを起こし、圧力計６０の圧力が上昇する。これを検出した制御手段８は、接続されている該一方の濾過フィルターの機能が失われたと判断し、制御手段８の表示モニタに該一方の濾過フィルターの交換を指示する表示を行うと共に、上記電磁開閉弁５２を切り換えて、加工廃液の流れを、目詰まりを起こしていない他方の濾過フィルターへ切り替える。これによりオペレータは、制御手段８の指示によって、目詰まりを起こした側の濾過フィルターの交換を実施することができる。 When the processing of the processing waste liquid is started by the control means 8 arranged in the processing waste liquid treatment device M1, the waste liquid feed pump 3 is operated, and the processing waste liquid sucked up from the waste liquid reserve tank 2 is passed through the pipe 50. It is sent to the waste liquid filtering means 4. When the amount of processing waste liquid in the waste liquid reserve tank 2 is reduced, the processing waste liquid is appropriately introduced from the collection tank 10. The waste liquid filtration means 4 includes a first filtration filter 4a and a second filtration filter 4b, and is installed on the fresh water receiving pan 4c. An electromagnetic on-off valve 52 is provided on the pipe 50 that connects the waste liquid feeding pump 3, the first filtration filter 4a, and the second filtration filter 4b. As shown in the figure, when the electromagnetic on-off valve 52 is OFF and is urged to the left (1 side) by the spring, the processing waste liquid fed by the waste liquid feed pump 3 is the first filtration filter 4a. When the electromagnetic on-off valve 52 is energized (ON) and urged to the right (0 side), the processing waste liquid fed by the waste liquid feed pump 3 is guided to the second filtration filter 4b. In the processing waste liquid guided to the first filtration filter 4a or the second filtration filter 4b, cutting chips and the like mixed in the processing waste liquid are filtered, purified into fresh water, and flowed out to the fresh water receiving pan 4c. A pressure gauge 60 connected to the control means 8 via the branch pipe 51 is connected to the pipe 50 to monitor the pressure in the pipe 50. When the filtration of the processing waste liquid is continuously performed by one of the filtration filters, cutting chips and the like are accumulated on the filter, which eventually causes clogging, and the pressure of the pressure gauge 60 rises. Upon detecting this, the control means 8 determines that the function of the one connected filtration filter has been lost, displays a display instructing the display monitor of the control means 8 to replace the one filtration filter, and displays the above. The electromagnetic on-off valve 52 is switched to switch the flow of processing waste liquid to the other filtration filter that is not clogged. As a result, the operator can replace the filtration filter on the clogged side according to the instruction of the control means 8.
第１の濾過フィルター４ａ、又は第２の濾過フィルター４ｂによって濾過され、清水受けパン４ｃに流出した清水は、配管５３を介して清水貯水タンク５に導入される。清水貯水タンク５に貯留された清水は、清水送給ポンプ５ａによって送給され配管５４を介して純水生成手段６に送られる。 The fresh water filtered by the first filtration filter 4a or the second filtration filter 4b and flowing out to the fresh water receiving pan 4c is introduced into the fresh water storage tank 5 via the pipe 53. The fresh water stored in the fresh water storage tank 5 is fed by the fresh water feeding pump 5a and sent to the pure water generating means 6 via the pipe 54.
図示の実施形態における純水生成手段６は、支持台６ａと、支持台６ａの奥側に立設された紫外線照射手段６ｂと、手前側に配置されイオン交換樹脂を内蔵した第１のイオン交換手段６ｃ及び第２のイオン交換手段６ｄと、紫外線照射手段６ｂに隣接して配設された精密フィルター６ｅと、紫外線照射手段６ｂ及び精密フィルター６ｅ側と、第１のイオン交換手段６ｃ及び第２のイオン交換手段６ｄ側とを仕切る仕切り板６ｆとを備えている。 The pure water generating means 6 in the illustrated embodiment includes a support base 6a, an ultraviolet irradiation means 6b erected on the back side of the support base 6a, and a first ion exchange house arranged on the front side and incorporating an ion exchange resin. The means 6c and the second ion exchange means 6d, the precision filter 6e arranged adjacent to the ultraviolet irradiation means 6b, the ultraviolet irradiation means 6b and the precision filter 6e side, and the first ion exchange means 6c and the second. It is provided with a partition plate 6f that separates the ion exchange means 6d side of the above.
清水送給ポンプ５ａによって送給され配管５４を介して送られた清水は、紫外線照射手段６ｂに導入され、ここで紫外線（ＵＶ）が照射されることによって殺菌される。紫外線照射手段６ｂにおいて殺菌処理された清水は、配管５５を介して第１のイオン交換手段６ｃ又は第２のイオン交換手段６ｄに導入される。配管５５には電磁開閉弁５６が配設されている。電磁開閉弁５６がＯＦＦで、ばねにより左方（１側）に付勢されている場合は、清水送給ポンプ５ａによって送給された清水が第１のイオン交換手段６ｃに導かれ、電磁開閉弁５６が通電（ＯＮ）され右方（０側）に付勢されると、清水送給ポンプ５ａによって送給された清水が第２のイオン交換手段６ｄに導かれる。 The fresh water supplied by the fresh water feeding pump 5a and sent through the pipe 54 is introduced into the ultraviolet irradiation means 6b, where it is sterilized by being irradiated with ultraviolet rays (UV). The fresh water sterilized by the ultraviolet irradiation means 6b is introduced into the first ion exchange means 6c or the second ion exchange means 6d via the pipe 55. An electromagnetic on-off valve 56 is provided on the pipe 55. When the electromagnetic on-off valve 56 is OFF and is urged to the left (1 side) by a spring, the fresh water supplied by the fresh water feed pump 5a is guided to the first ion exchange means 6c to open and close electromagnetically. When the valve 56 is energized (ON) and urged to the right (0 side), the fresh water fed by the fresh water feed pump 5a is guided to the second ion exchange means 6d.
第１のイオン交換手段６ｃ、又は第２のイオン交換手段６ｄに導入された清水は、イオンが交換されて純水に精製される。このようにして清水がイオン交換されて精製された純水には、第１のイオン交換手段６ｃ及び第２のイオン交換手段６ｄを構成するイオン交換樹脂の樹脂屑等の微細な物質が混入されている場合がある。このため、図示の実施形態においては上述したように第１のイオン交換手段６ｃ及び第２のイオン交換手段６ｄによって清水がイオン交換されて精製された純水を、配管５７を介して精密フィルター６ｅに導入し、この精密フィルター６ｅによって純水に混入されているイオン交換樹脂の樹脂屑等の微細な物質を捕捉し、加工水として再使用可能な状態となる。 The fresh water introduced into the first ion exchange means 6c or the second ion exchange means 6d is purified into pure water by exchanging ions. Fine substances such as resin scraps of the ion exchange resin constituting the first ion exchange means 6c and the second ion exchange means 6d are mixed in the pure water purified by ion exchange of fresh water in this manner. May be. Therefore, in the illustrated embodiment, as described above, pure water purified by ion exchange of fresh water by the first ion exchange means 6c and the second ion exchange means 6d is subjected to the precision filter 6e via the pipe 57. The precision filter 6e captures fine substances such as resin debris of the ion exchange resin mixed in the pure water and makes it reusable as processing water.
配管５７には、分岐配管５８を介して第１のイオン交換手段６ｃ、又は第２のイオン交換手段６ｄから精密フィルター６ｅに送給される純水の圧力を検出する制御手段８に接続された圧力検出手段６２が配設されており、この圧力検出手段６２の検出信号は制御手段８に送られる。圧力検出手段６２からの検出信号が所定圧力値以上に達したならば、制御手段８は精密フィルター６ｅに樹脂屑等の微細な物質が堆積してフィルターとしての機能が失われたと判断し、制御手段８に設けられた表示モニタに表示し、オペレータは精密フィルターを交換することができる。なお、図示は省略しているが、上記した圧力検出手段６２と平行して、配管５７内を流れる純水の比抵抗を検出する比抵抗計を配置する。これにより、各イオン交換手段のイオン交換樹脂の状態を検出し、オペレータに対し、イオン交換樹脂の交換を指示することができる。 The pipe 57 was connected to the control means 8 for detecting the pressure of pure water supplied from the first ion exchange means 6c or the second ion exchange means 6d to the precision filter 6e via the branch pipe 58. A pressure detecting means 62 is arranged, and the detection signal of the pressure detecting means 62 is sent to the control means 8. When the detection signal from the pressure detecting means 62 reaches a predetermined pressure value or more, the control means 8 determines that fine substances such as resin dust are deposited on the precision filter 6e and loses the function as a filter, and controls the filter. The display is displayed on the display monitor provided in the means 8, and the operator can replace the precision filter. Although not shown, a resistivity ohmmeter for detecting the resistivity of pure water flowing in the pipe 57 is arranged in parallel with the pressure detecting means 62 described above. As a result, the state of the ion exchange resin of each ion exchange means can be detected, and the operator can be instructed to replace the ion exchange resin.
上記純水生成手段６によって生成された加工水は、後述する個別配管３０ａを介し貯水タンク１２に排出され、加工装置にて再使用される。加工廃液処理装置Ｍ１は、概ね上記したとおりの構成を備えており、本実施形態では、他の加工廃液処理装置Ｍ２〜Ｍ８も同一の構成である。 The processed water generated by the pure water generating means 6 is discharged to the water storage tank 12 via the individual pipe 30a described later, and is reused in the processing apparatus. The processing waste liquid treatment device M1 has substantially the same configuration as described above, and in the present embodiment, the other processing waste liquid treatment devices M2 to M8 also have the same configuration.
（排出路設置工程）
図１に戻り、本実施形態の加工廃液処理装置の設置方法についての説明を続ける。本実施形態では、各加工廃液処理装置Ｍ１〜Ｍ８に連通し加工廃液処理装置Ｍ１〜Ｍ８が生成した加工水を貯水タンク１２に排出する排出路３０を設置する（排出路設置工程）。排出路３０は、図１に示すように、各加工廃液処理装置Ｍ１〜Ｍ８から貯水タンク１２に導くものであり、各加工廃液処理装置Ｍ１〜Ｍ８と貯水タンク１２とを接続する個別配管３０ａ〜３０ｊにより構成される。
(Discharge channel installation process)
Returning to FIG. 1, the description of the installation method of the processing waste liquid treatment device of the present embodiment will be continued. In the present embodiment, a discharge path 30 is installed in each of the processing waste liquid treatment devices M1 to M8 to communicate with each other and discharge the processed water generated by the processing waste liquid treatment devices M1 to M8 to the water storage tank 12 (discharge path installation step). As shown in FIG. 1, the discharge passage 30 leads from the processing waste liquid treatment devices M1 to M8 to the water storage tank 12, and the individual pipes 30a to connect the processing waste liquid treatment devices M1 to M8 and the water storage tank 12. It is composed of 30j.
（供給路設置工程）
本実施形態では、さらに、貯水タンク１２に連通し、各加工装置Ｎ１〜Ｎ１０に加工水を供給する供給路４０を設置する供給路設置工程を実施する。図に示すように、貯水タンク１２から各加工装置Ｎ１〜Ｎ１０に加工水を供給するように、供給路４０は、個別配管４０ａ〜４０ｊによって構成される。貯水タンク１２から各加工装置Ｎ１〜Ｎ１０への加工水の供給は、各加工装置Ｎ１〜Ｎ１０に対応して配設される送給ポンプＰ１〜Ｐ１０の作動による。なお、説明の便宜上、加工装置Ｎ２〜Ｎ９に接続される供給路４０ｂ〜４０ｉの一部、及び送給ポンプＰ２〜Ｐ９は図示を省略している。
(Supply channel installation process)
In the present embodiment, a supply path installation step of communicating with the water storage tank 12 and installing a supply path 40 for supplying processed water to the processing devices N1 to N10 is further carried out. As shown in the figure, the supply path 40 is composed of individual pipes 40a to 40j so that the processing water is supplied from the water storage tank 12 to the processing devices N1 to N10. The supply of processed water from the water storage tank 12 to the processing devices N1 to N10 depends on the operation of the feed pumps P1 to P10 arranged corresponding to the processing devices N1 to N10. For convenience of explanation, a part of the supply paths 40b to 40i connected to the processing devices N2 to N9 and the feed pumps P2 to P9 are not shown.
また、本実施形態では、貯水タンク１２から、供給路４０を介して加工水を各加工装置Ｎ１〜Ｎ１０に導入する経路上に、配管３２を介して接続される温度コントローラ１４を配置している。この温度コントローラ１４に送られた加工水は、ここで所定温度（例えば２３℃）に調整され上記した供給路４０を介して加工装置Ｎ１〜Ｎ１０に供給される。加工水の温度調整は、温度コントローラを各加工装置に個別に配設して実施してもよいが、この温度コントローラ１４を貯水タンク１２と供給路４０との間に設置し、集中して温度管理することにより、各加工廃液処理装置Ｍ１〜Ｍ８、及び加工装置Ｎ１〜Ｎ１０に、温度コントローラを設置する必要がなく、設備をシンプルに構成することが可能になる。 Further, in the present embodiment, the temperature controller 14 connected via the pipe 32 is arranged on the path for introducing the processed water from the water storage tank 12 to the processing devices N1 to N10 via the supply path 40. .. The processing water sent to the temperature controller 14 is adjusted to a predetermined temperature (for example, 23 ° C.) and is supplied to the processing devices N1 to N10 via the supply path 40 described above. The temperature of the processing water may be adjusted by individually arranging a temperature controller in each processing apparatus, but the temperature controller 14 is installed between the water storage tank 12 and the supply path 40 to concentrate the temperature. By managing, it is not necessary to install a temperature controller in each of the processing waste liquid treatment devices M1 to M8 and the processing devices N1 to N10, and the equipment can be simply configured.
上記した本実施形態に基づいて、加工廃液処理装置を設置することで、複数の加工装置の稼働率に対応して適正な台数の加工廃液処理装置することができ、不経済であるという問題が解消する。なお、上記した実施形態では、全加工装置の稼働率に基づいて、加工廃液処理装置の適正台数を算定して設置した。該稼働率は、加工実績、加工計画等に基づいて算定されるものであり、場合によっては、一時的に全加工装置Ｎ１〜Ｎ１０の稼働率が、想定した稼働率を超えて稼働する可能性を否定できない。しかし、上記した実施形態では、収集タンク１０によって、加工廃液を集中して収集し、さらに、貯水タンク１２によって加工水を集中して貯水している。よって、収集タンク１０及び貯水タンク１２がバッファータンクとしての機能を有することにより、加工装置Ｎ１〜Ｎ１０が同時に作動され、一時的に想定した稼働率を超えて運転される場合があっても、直ぐに加工水が不足することにはならず、対応することが可能である。 By installing the processing waste liquid treatment equipment based on the above-described embodiment, it is possible to obtain an appropriate number of processing waste liquid treatment equipment corresponding to the operating rates of a plurality of processing equipment, which is uneconomical. Eliminate. In the above-described embodiment, the appropriate number of processing waste liquid treatment devices is calculated and installed based on the operating rate of all the processing devices. The operating rate is calculated based on the processing results, processing plans, etc., and in some cases, the operating rates of all the processing devices N1 to N10 may temporarily exceed the assumed operating rates. Cannot be denied. However, in the above-described embodiment, the processing waste liquid is intensively collected by the collection tank 10, and the processed water is intensively stored by the water storage tank 12. Therefore, since the collection tank 10 and the water storage tank 12 have a function as a buffer tank, even if the processing devices N1 to N10 are operated at the same time and temporarily exceed the assumed operating rate, they are immediately operated. There is no shortage of processing water, and it is possible to deal with it.
２：廃液予備タンク
３：廃液供給ポンプ
４：廃液濾過手段
５：清水貯水タンク
６：純水生成手段
８：制御手段
１０：収集タンク
１２：貯水タンク
１４：温度コントローラ
２０：回収路
２２：第１回収路
２４：第２回収路
３０：排出路
４０：供給路
Ｐ１〜Ｐ１０：ポンプ
Ｎ１〜Ｎ１０：加工装置
Ｍ１〜Ｍ８：加工廃液処理装置
2: Waste liquid reserve tank 3: Waste liquid supply pump 4: Waste liquid filtration means 5: Fresh water water storage tank 6: Pure water generation means 8: Control means 10: Collection tank 12: Water storage tank 14: Temperature controller 20: Recovery path 22: First Recovery path 24: Second recovery path 30: Discharge path 40: Supply path P1 to P10: Pump N1 to N10: Processing device M1 to M8: Processing waste liquid treatment device
Claims (1)
複数の加工装置がフル稼働した際に使用する総加工水量と、該加工廃液処理装置の加工水供給能力とを比較して、該加工廃液処理装置の必要台数を設定する必要台数設定工程と、
該複数の加工装置の稼働率を算定する稼働率算定工程と、
該必要台数設定工程において設定された加工廃液処理装置の必要台数に該稼働率算定工程において算定された稼働率を乗じて小数点以下を繰り上げて加工廃液処理装置の適正台数を算定する適正台数算定工程と、
該適正台数の加工廃液処理装置を設置する加工廃液処理装置設置工程と、
該複数の加工装置から排出される加工廃液を収集する収集タンクを設置する収集タンク設置工程と、
各加工廃液処理装置が生成した加工水を貯水する貯水タンクを設置する貯水タンク設置工程と、
該収集タンクに連通し各加工廃液処理装置が加工廃液を回収するための回収路を設置する回収路設置工程と、
各加工廃液処理装置に連通し加工廃液処理装置が生成した加工水を、該貯水タンクに排出する排出路を設置する排出路設置工程と、
該貯水タンクに連通し、各加工装置に加工水を供給する供給路を設置する供給路設置工程と、を含む加工廃液処理装置の設置方法。 It is a method of installing a processing waste liquid treatment equipment that supplies processing water to the processing equipment, collects used processing waste liquid, generates it in processing water, and circulates it.
A required number setting process for setting the required number of processing waste liquid treatment equipment by comparing the total amount of processing water used when a plurality of processing equipments are fully operated with the processing water supply capacity of the processing waste liquid treatment equipment.
An operating rate calculation process for calculating the operating rates of the plurality of processing devices, and
Appropriate number calculation process to calculate the appropriate number of processing waste liquid treatment equipment by multiplying the required number of processing waste liquid treatment equipment set in the required number setting process by the operating rate calculated in the operating rate calculation process and moving up after the decimal point. When,
The processing waste liquid treatment equipment installation process for installing the appropriate number of processing waste liquid treatment equipment, and
A collection tank installation process for installing a collection tank for collecting processing waste liquid discharged from the plurality of processing devices, and
A water storage tank installation process that installs a water storage tank that stores the processed water generated by each processing waste liquid treatment device,
A collection path installation process in which each processing waste liquid treatment device communicates with the collection tank and installs a collection path for collecting the processing waste liquid.
A discharge channel installation process that establishes a discharge path for discharging the processed water generated by the processing waste liquid treatment device to the water storage tank by communicating with each processing waste liquid treatment device.
A method for installing a processing waste liquid treatment device, which includes a supply path installation step of communicating with the water storage tank and installing a supply path for supplying processing water to each processing device.
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