JP2020521330A - ウエハ縁部接触ハードウェア、ならびにウエハの裏面縁部およびノッチで堆積物を除去する方法 - Google Patents
ウエハ縁部接触ハードウェア、ならびにウエハの裏面縁部およびノッチで堆積物を除去する方法 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims description 60
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 152
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
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- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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Abstract
Description
Claims (20)
- プラズマ処理システムための台座アセンブリであって、
台座であって、
中央上面であって、前記中央上面の中心から前記中央上面の外径まで延びている、中央上面と、
前記中央上面を囲む環状表面であって、前記環状上面が前記中央上面から一段下がって配置されている、環状表面と、
前記中央上面の上方に支持体高度距離で前記中央上面から突出している複数のウエハ支持体であって、前記中央上面の内半径の周りに均等に配列されており、前記内半径が、前記中央上面の前記中心と中間半径未満との間に位置付けられており、前記中間半径は、前記台座の前記中心と前記中央上面の前記外径との間のおおよそ中間に定義されている、複数のウエハ支持体と
を含む、台座と、
前記台座の前記環状表面上に位置決めするように構成されたキャリアリングであって、キャリアリング内径、キャリアリング外径、および前記キャリアリングの上部内側領域の周りに環状に配置された棚面を有し、前記棚面が、前記キャリアリングの上部外側領域の下に凹んでいる、キャリアリングと、
前記台座の前記環状表面の外側に配置された複数のキャリアリング支持体であって、前記キャリアリング支持体が、前記台座の前記中央上面の上方に前記キャリアリングのキャリアリング高度寸法を定義し、前記キャリアリングが前記複数のキャリアリング支持体上に載っているときに、前記キャリアリング高度寸法が、前記支持体高度距離よりも前記台座の前記中央上面よりも高くなるように構成されている、複数のキャリアリング支持体と、
を備える、台座アセンブリ。 - 請求項1に記載の台座アセンブリであって、前記複数のウエハ支持体が、前記複数のウエハ支持体上に配設されているときのウエハに動嵌合を提供する、台座アセンブリ。
- 請求項1に記載の台座アセンブリであって、前記キャリアリングの前記棚面が、前記キャリアリングの前記上部外側領域に移行する段差を有し、前記棚面が、キャリアリングの支持体寸法によって前記複数のウエハ支持体の上方に上昇している、台座アセンブリ。
- 請求項1に記載の台座アセンブリであって、前記内半径が約2.5インチであり、前記中央上面の前記外径が約11.5インチである、台座アセンブリ。
- 請求項1に記載の台座アセンブリであって、重複部分の表面領域が前記棚面上に画定され、前記重複部分の表面領域が、前記台座の前記中央上面上に配置されているときにウエハ下面に対する接触表面を画定する、台座アセンブリ。
- 請求項1に記載の台座アセンブリであって、複数のスペーサが、前記キャリアリング支持体の下に配置されて前記キャリアリング高度寸法の較正された位置決めを定義する、台座アセンブリ。
- 請求項1に記載の台座アセンブリであって、前記複数のウエハ支持体の前記内半径が、前記中心と1/4半径との間に位置付けられ、前記1/4半径が前記中間半径と前記中心との間に位置付けられている、台座アセンブリ。
- 請求項1に記載の台座アセンブリであって、前記支持体高度距離が、約2ミルと約6ミルとの間にあり、前記キャリアリング高度寸法が、約1ミルと約3ミルとの間にある、台座アセンブリ。
- 請求項1に記載の台座アセンブリであって、前記支持体高度距離が約4ミルであり、前記キャリアリング高度寸法が約1.5ミルであり、前記内半径が、前記台座の前記中央上面の前記中心に対して約2.5インチである、台座アセンブリ。
- 請求項9に記載の台座アセンブリであって、前記中央上面の前記外径が約11.52である、台座アセンブリ。
- 請求項1に記載の台座アセンブリであって、前記支持体高度距離が、約2ミルと約6ミルとの間にあり、前記キャリアリング高度寸法が、約1ミルと約3ミルとの間にあり、前記複数のウエハ支持体の前記内半径が、前記中心と1/4半径との間に位置付けられており、前記1/4半径が、前記中間半径と前記中心との間に位置付けられており、前記複数のウエハ支持体が、前記複数のウエハ支持体上に配設されているときのウエハに動嵌合を提供する、台座アセンブリ。
- 請求項1に記載の台座アセンブリであって、前記支持体高度距離が約4ミルであり、前記キャリアリング高度寸法が約1.5ミルであり、前記内半径が、前記台座の前記中央上面の前記中心に対して約2.5インチであり、前記複数のウエハ支持体の前記内半径が、前記中心と1/4半径との間に位置付けられており、前記1/4半径が、前記中間半径と前記中心との間に位置付けられており、前記複数のウエハ支持体が、前記複数のウエハ支持体上に配設されているときのウエハに動嵌合を提供し、前記ウエハが前記複数のウエハ支持体上に配設されているときに前記キャリアリング高度距離が前記支持体高度距離よりも大きいため、前記キャリアリングの前記棚面が、前記中心から前記縁部にわずかに上に傾斜するように構成されている、台座アセンブリ。
- 請求項1に記載の台座アセンブリであって、前記プラズマ処理システムがリングレス移送システムとして構成され、リングレス移送システムが前記台座の前記環状表面上に配置された前記キャリアリングを維持するように構成され、かつウエハが前記複数のウエハ支持体および前記キャリアリングの前記棚面上を移動させるように構成されており、前記台座が、存在するときに前記ウエハを上げ、かつ下げるためのリフトピンを含み、前記プロセスシステムが、前記プラズマ処理システムの複数の台座アセンブリの各台座アセンブリのウエハを移動させるための移送アームを含む、台座アセンブリ。
- プラズマ処理システムの台座アセンブリであって、前記プラズマ処理システムが、前記プラズマ処理システム内に配置された1つ以上の台座アセンブリにウエハを移動させるためのリングレス移送構成を有し、
台座であって、
中央上面であって、前記中央上面の中心から前記中央上面の外径まで延びている、中央上面と、
前記中央上面を囲む環状表面であって、前記環状上面が前記中央上面から一段下がって配置されている、環状表面と、
前記中央上面の上方に支持体高度距離で前記中央上面から突出している複数のウエハ支持体であって、前記中央上面の内半径の周りに均等に配列されており、前記内半径が、前記中央上面の前記中心と中間半径未満との間に位置付けられており、前記中間半径が、前記台座の前記中心と前記中央上面の前記外径との間のおおよそ中間に定義されている、複数のウエハ支持体と、
を含む、台座と、
前記台座の前記環状表面上に位置決めするように構成されたキャリアリングであって、キャリアリング内径、キャリアリング外径、および前記キャリアリングの上部内側領域の周りに環状に配置された棚面を有し、前記棚面が、前記キャリアリングの上部外側領域の下に凹んでいる、キャリアリングと、
前記台座の前記環状表面の外側に配置された複数のキャリアリング支持体であって、前記キャリアリング支持体が、前記台座の前記中央上面の上方に前記キャリアリングのキャリアリング高度寸法を定義し、前記キャリアリングが前記複数のキャリアリング支持体上に載っているときに、前記キャリアリング高度寸法が、前記支持体高度距離よりも前記台座の前記中央上面よりも高くなるように構成されている、複数のキャリアリング支持体と、
前記複数のウエハ支持体および前記キャリアリングの前記棚面上にウエハを上げ、かつ下げるための複数のリフトピンと、
を備える、台座アセンブリ。 - 請求項14に記載の台座アセンブリであって、前記複数のウエハ支持体が、前記複数のウエハ支持体上に配設されているときのウエハに動嵌合を提供し、前記キャリアリングの前記棚面が、前記キャリアリングの前記上部外側領域に移行する段差を有し、前記棚面が、キャリアリングの支持体寸法によって前記複数のウエハ支持体の上方に上昇している、台座アセンブリ。
- 請求項14に記載の台座アセンブリであって、前記内半径が約2.5インチであり、前記中央上面の前記外径が約11.5インチであり、重複部分の表面領域が前記棚面上に画定され、前記重複部分の表面領域が、前記台座の前記中央上面上に配置されているときにウエハ下面に対する接触表面を画定する、台座アセンブリ。
- 請求項16に記載の台座アセンブリであって、複数のスペーサが、前記キャリアリング支持体の下に配置されて前記キャリアリング高度寸法の較正された位置決めを定義する、台座アセンブリ。
- 請求項14に記載の台座アセンブリであって、前記支持体高度距離が、約2ミルと約6ミルとの間にあり、前記キャリアリング高度寸法が、約1ミルと約3ミルとの間にある、台座アセンブリ。
- 請求項14に記載の台座アセンブリであって、前記支持体高度距離が、約2ミルと約6ミルとの間にあり、前記キャリアリング高度寸法が、約1ミルと約3ミルとの間にあり、前記複数のウエハ支持体の前記内半径が、前記中心と1/4半径との間に位置付けられており、前記1/4半径が、前記中間半径と前記中心との間に位置付けられており、前記複数のウエハ支持体が、前記複数のウエハ支持体上に配設されているときのウエハに動嵌合を提供する、台座アセンブリ。
- 請求項14に記載の台座アセンブリであって、前記支持体高度距離が約4ミルであり、前記キャリアリング高度寸法が約1.5ミルであり、前記内半径が、前記台座の前記中央上面の前記中心に対して約2.5インチであり、前記複数のウエハ支持体の前記内半径が、前記中心と1/4半径との間に位置付けられており、前記1/4半径が、前記中間半径と前記中心との間に位置付けられており、前記複数のウエハ支持体が、前記複数のウエハ支持体上に配設されているときのウエハに動嵌合を提供し、前記ウエハが前記複数のウエハ支持体上に配設されているときに、前記キャリアリング高度距離が前記支持体高度距離よりも大きいため、前記キャリアリングの前記棚面が、前記中心から前記縁部にわずかに上に傾斜する、台座アセンブリ。
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