JP2020519878A - ガス計測システム - Google Patents
ガス計測システム Download PDFInfo
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- JP2020519878A JP2020519878A JP2019561811A JP2019561811A JP2020519878A JP 2020519878 A JP2020519878 A JP 2020519878A JP 2019561811 A JP2019561811 A JP 2019561811A JP 2019561811 A JP2019561811 A JP 2019561811A JP 2020519878 A JP2020519878 A JP 2020519878A
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- 238000005259 measurement Methods 0.000 title claims abstract description 38
- 230000003287 optical effect Effects 0.000 claims abstract description 72
- 239000000919 ceramic Substances 0.000 claims abstract description 44
- 230000001427 coherent effect Effects 0.000 claims abstract description 16
- 239000007789 gas Substances 0.000 claims description 158
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 13
- 230000008569 process Effects 0.000 claims description 13
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 12
- 238000010521 absorption reaction Methods 0.000 claims description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 9
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 9
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 6
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 238000002360 preparation method Methods 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 4
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 4
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims description 3
- 229910005540 GaP Inorganic materials 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 229910021529 ammonia Inorganic materials 0.000 claims description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 3
- 239000001569 carbon dioxide Substances 0.000 claims description 3
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 claims description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 3
- 239000000395 magnesium oxide Substances 0.000 claims description 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 3
- 229910000069 nitrogen hydride Inorganic materials 0.000 claims description 3
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 3
- 229910021426 porous silicon Inorganic materials 0.000 claims description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 238000011144 upstream manufacturing Methods 0.000 claims description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- 239000012433 hydrogen halide Substances 0.000 claims 1
- 229910000039 hydrogen halide Inorganic materials 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000011593 sulfur Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 abstract description 4
- 239000011148 porous material Substances 0.000 description 9
- 238000013461 design Methods 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229910010293 ceramic material Inorganic materials 0.000 description 5
- 238000000041 tunable diode laser absorption spectroscopy Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000005070 sampling Methods 0.000 description 3
- 230000001629 suppression Effects 0.000 description 3
- 238000010276 construction Methods 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- 150000002483 hydrogen compounds Chemical class 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical class S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 2
- 239000002023 wood Substances 0.000 description 2
- -1 HCl or HF Chemical class 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 1
- 238000004847 absorption spectroscopy Methods 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- VXAUWWUXCIMFIM-UHFFFAOYSA-M aluminum;oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Al+3] VXAUWWUXCIMFIM-UHFFFAOYSA-M 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- TXKMVPPZCYKFAC-UHFFFAOYSA-N disulfur monoxide Inorganic materials O=S=S TXKMVPPZCYKFAC-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000001285 laser absorption spectroscopy Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 239000012229 microporous material Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 239000007783 nanoporous material Substances 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052815 sulfur oxide Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 238000004056 waste incineration Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0208—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using focussing or collimating elements, e.g. lenses or mirrors; performing aberration correction
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0229—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using masks, aperture plates, spatial light modulators or spatial filters, e.g. reflective filters
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/10—Arrangements of light sources specially adapted for spectrometry or colorimetry
- G01J3/108—Arrangements of light sources specially adapted for spectrometry or colorimetry for measurement in the infrared range
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
- G01N21/031—Multipass arrangements
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
- G01J2003/421—Single beam
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
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- G—PHYSICS
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- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
- G01N2021/396—Type of laser source
- G01N2021/399—Diode laser
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- G01N2201/06—Illumination; Optics
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- General Health & Medical Sciences (AREA)
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- Pathology (AREA)
- Optics & Photonics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Optical Measuring Cells (AREA)
Abstract
Description
[0050]信号対雑音比におけるこの顕著な改善は、完全に光学的な解決策および/または可動要素も追加の電子作動装置も必要としない受動的な解決策を用いて本発明によるガス計測システムにおいて実現される。したがって、本発明によるガス計測システムは、極めて堅牢であり、小型のおよびコンパクトな設計により実現することもできる。
1、201、301、401 光源
2、202、302 ビーム経路
3、203、303、403 光学要素
4、204、304、404 ガスセル
5、205、405 接続部
6、206、406 接続部
7 試料除去または試料調製システム
8、208、308、408 検出器
9、209、309、409 さらなる光学要素
10、210 制御および/または調節ユニット
11、211、311、411 多孔質セラミック
212 筐体
313 開口部
314 光学経路
415 計測センサ
416 筐体ブロック
417 ブラケット
418 枠組み
Claims (13)
- ガス計測システムであって、
光ビームを放射するコヒーレント光源(1、201、301、401)と、
検出器(8、208、308、408)と、
前記光源(1、201、301、401)と前記検出器(8、208、308、408)との間に形成されるビーム経路(2、202、302)と、
前記検出器(8、208、308、408)がガスセル(4、204、304、404)を通して透過された光を受けるように、前記光源(1、201、301、401)と前記検出器(8、208、308、408)との間の前記ビーム経路に配置される前記ガスセル(4、204、304、404)と、
前記光源(1、201、301、401)と前記ガスセル(4、204、304、404)との間の前記ビーム経路(2、202、302)に配置される光学要素(3、203、303、403)とを備え、
前記ガスセル(4、204、304、404)が、多孔質セラミック(11、211、311、411)を備え、前記ガスセル(4、204、304、404)が、前記ガスセル(4、204、304、404)の実際の層厚さの倍数である光路長を有する、ガス計測システムにおいて、
前記光学要素(3、203、303、403)が、
前記光源(1、201、301、401)によって放射された前記光ビームが、前記ガスセル(4、204、304、404)に入射したとき拡大され、集束されないように、
i. 光学的に透明な窓であり、および前記光ビームの拡大が、前記光ビームの発散に基づいて起き、または
ii. 前記光ビームを変形させる、拡散体もしくは少なくとも1つの回折光学要素を備えることを特徴とする、ガス計測システム。 - 前記光路長が、前記ガスセル(4、204、304、404)の実際の層厚さよりも少なくとも10倍、特に少なくとも50倍、および好ましくは数百倍長いことを特徴とする、請求項1に記載のガス計測システム。
- 前記ガスセルおよび/または前記多孔質セラミックが、交換可能であることを特徴とする、請求項1に記載のガス計測システム。
- プロセス窓を備えることを特徴とする、請求項1から3のいずれかに記載のガス計測システム。
- 前記光学要素(3、203、303、403)が、プロセス窓として機能することを特徴とする、請求項4に記載のガス計測システム。
- 前記ガスセル(4、204、304、404)と前記検出器(8、208、308、408)との間の前記ビーム経路(2、202、302)に配置され、光学窓または反射体を備えたさらなる光学要素(9、209、309、409)を備えることを特徴とする、請求項1から5のいずれかに記載のガス計測システム。
- 前記コヒーレント光源(1、201、301、401)が、レーザ、特に波長可変レーザであることを特徴とする、請求項1から6のいずれかに記載のガス計測システム。
- 前記検出器(8、208、308、408)が、光検出器、特にサーモパイル検出器、ボロメータ、焦電検出器、光電子増倍管、フォトダイオード、またはフォロレジスタであることを特徴とする、請求項1から7のいずれかに記載のガス計測システム。
- 前記ガスセル(4、204、304、404)の上流の試料調製ユニット(7)をさらに備えることを特徴とする、請求項1から8のいずれかに記載のガス計測システム。
- NeSSI対応であることを特徴とする、請求項1から9のいずれかに記載のガス計測システム。
- 前記多孔質セラミック(11、211、311、411)が、ナノ多孔質または微孔質であることを特徴とする、請求項1から10のいずれかに記載のガス計測システム。
- 前記多孔質セラミック(11、211、311、411)が、酸化ジルコニウム、酸化アルミニウム、酸化チタン、酸化ケイ素、酸化マグネシウム、酸化イットリウム、ガリウムリン、多孔質シリコン、またはその混合物を備えることを特徴とする、請求項1から11のいずれかに記載のガス計測システム。
- 以下のガス、すなわち、酸素(O2)、二酸化炭素(CO2)、一酸化炭素(CO)、窒素酸化物(NOx)、メタン(CH4)、アミン、アンモニア(NH3)、硫化水素(H2S)、硫黄酸化物(SO2)、HClもしくはHFなどのハロゲン化水素、水および/または水分(H2O)、またはその混合物のうちの1つまたは複数の含有量の吸収分光測定のための請求項1から12のいずれかに記載のガス計測システムの使用。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP17170667.4 | 2017-05-11 | ||
EP17170667.4A EP3401666A1 (de) | 2017-05-11 | 2017-05-11 | Gasmesssystem |
PCT/EP2018/061461 WO2018210583A1 (de) | 2017-05-11 | 2018-05-04 | Gasmesssystem |
Publications (1)
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CN110940632B (zh) * | 2019-10-31 | 2022-04-26 | 河南农业大学 | 一种基于tdlas的甲烷气体浓度的检测装置及检测方法 |
US11774355B1 (en) * | 2020-02-05 | 2023-10-03 | United States Of America As Represented By The Administrator Of Nasa | System, apparatus and methods for detecting methane leak |
US11740179B2 (en) | 2020-02-07 | 2023-08-29 | Lumileds Llc | Gas sensing system having quadric reflective surface |
US11150332B1 (en) | 2020-06-30 | 2021-10-19 | Apple Inc. | Self-calibrating optical transceiver system with reduced crosstalk sensitivity for through-display proximity sensing |
WO2022055416A1 (en) * | 2020-09-09 | 2022-03-17 | Agency For Science, Technology And Research | Gas cell and method of forming the same |
US11874110B2 (en) | 2020-09-25 | 2024-01-16 | Apple Inc. | Self-mixing interferometry device configured for non-reciprocal sensing |
US11460293B2 (en) | 2020-09-25 | 2022-10-04 | Apple Inc. | Surface quality sensing using self-mixing interferometry |
US11243161B1 (en) | 2020-11-20 | 2022-02-08 | Industrial Technology Research Institute | Gas measurement device and gas measurement method |
US20220196550A1 (en) * | 2020-12-17 | 2022-06-23 | California Institute Of Technology | In Mask Sensor System |
US11629948B2 (en) | 2021-02-04 | 2023-04-18 | Apple Inc. | Optical interferometry proximity sensor with optical path extender |
CN116577304B (zh) * | 2023-05-15 | 2024-05-14 | 北京光感慧智科技有限公司 | 基于复杂工况的漫反射激光气体传感器系统 |
CN116539559A (zh) * | 2023-07-05 | 2023-08-04 | 安徽至慧仪器科技有限公司 | 一种基于散射介质的激光气体泄漏传感器 |
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CN110621980B (zh) | 2023-12-15 |
US11327008B2 (en) | 2022-05-10 |
CN110621980A (zh) | 2019-12-27 |
EP3401666A1 (de) | 2018-11-14 |
EP3622270A1 (de) | 2020-03-18 |
WO2018210583A1 (de) | 2018-11-22 |
EP3622270B1 (de) | 2024-02-21 |
US20200072740A1 (en) | 2020-03-05 |
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