JP2020513918A5 - - Google Patents

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Publication number
JP2020513918A5
JP2020513918A5 JP2019535892A JP2019535892A JP2020513918A5 JP 2020513918 A5 JP2020513918 A5 JP 2020513918A5 JP 2019535892 A JP2019535892 A JP 2019535892A JP 2019535892 A JP2019535892 A JP 2019535892A JP 2020513918 A5 JP2020513918 A5 JP 2020513918A5
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JP
Japan
Prior art keywords
asymmetric
measurement parameters
head measurement
patient
calculated
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JP2019535892A
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English (en)
Japanese (ja)
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JP2020513918A (ja
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Priority claimed from US15/395,190 external-priority patent/US10368814B2/en
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Publication of JP2020513918A publication Critical patent/JP2020513918A/ja
Publication of JP2020513918A5 publication Critical patent/JP2020513918A5/ja
Priority to JP2022192684A priority Critical patent/JP7543380B2/ja
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JP2019535892A 2016-12-30 2017-12-22 頭部計測解析のための方法 Pending JP2020513918A (ja)

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Application Number Priority Date Filing Date Title
JP2022192684A JP7543380B2 (ja) 2016-12-30 2022-12-01 頭部計測解析のための方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/395,190 US10368814B2 (en) 2016-12-30 2016-12-30 Method for cephalometric analysis
US15/395,190 2016-12-30
PCT/GB2017/053885 WO2018122553A1 (en) 2016-12-30 2017-12-22 Method for cephalometric analysis

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JP2022192684A Division JP7543380B2 (ja) 2016-12-30 2022-12-01 頭部計測解析のための方法

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JP2020513918A JP2020513918A (ja) 2020-05-21
JP2020513918A5 true JP2020513918A5 (enExample) 2021-02-04

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JP2022192684A Active JP7543380B2 (ja) 2016-12-30 2022-12-01 頭部計測解析のための方法

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US (1) US10368814B2 (enExample)
EP (1) EP3563341B1 (enExample)
JP (2) JP2020513918A (enExample)
KR (1) KR20190107683A (enExample)
CN (1) CN110326023B (enExample)
WO (1) WO2018122553A1 (enExample)

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DE102019130344A1 (de) * 2019-11-11 2021-05-12 Westfälische Wilhelms-Universität Münster Verfahren zum Planen eines kieferchirurgischen Eingriffs bei einem Patienten
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CN111227977A (zh) * 2020-03-12 2020-06-05 四川大学 一种自动化头影测量系统
KR102373428B1 (ko) * 2020-03-20 2022-03-15 부산대학교 산학협력단 3차원 세팔로메트리를 위한 기준점 결정 방법 및 시스템
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