JP2020507202A - 集積デジタルレーザ - Google Patents
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Abstract
Description
Claims (27)
- 可変横空間モード出力を有するレーザデバイスであって、
レーザ波長透過性を有する材料から形成された基板と、
前記基板によって支持された第1の反射層であって、前記レーザ波長の少なくとも一部の入射放射線を反射するように構成された第1の反射層と、
前記レーザ波長の放射線の誘導放出を発生させるための利得媒質含有層であって、前記第1の反射層と前記基板との間に位置決めされた利得媒質含有層と、
前記基板を挟んで前記第1の反射層とは反対側で前記基板によって支持された第2の反射層であって、前記レーザ波長の少なくとも一部の入射放射線を反射するように構成された第2の反射層と、
前記基板によって支持され、前記第1の反射層および前記第2の反射層を備える光学キャビティ内の放射線経路内に位置決めされた空間光変調器であって、各々が前記光学キャビティ内の異なる放射線経路に対応する素子アレイを備える空間光変調器と、
前記空間光変調器と通信するコンピュータ制御装置と
を備え、
動作中、前記コンピュータ制御装置は、前記レーザデバイスからの放射線の可変横空間モード出力を生成するために、前記空間光変調器に前記光学キャビティ内の前記放射線経路の各々における放射線の強度または位相を選択的に変化させる、レーザデバイス、 - 前記空間光変調器は、前記基板を挟んで前記利得媒質含有層とは反対側に位置する、請求項1に記載のレーザデバイス。
- 前記空間光変調器は、透過型空間光変調器である、請求項2に記載のレーザデバイス。
- 前記空間光変調器は、前記基板の前記利得媒質含有層と同じ側に位置する、請求項1に記載のレーザデバイス。
- 前記空間光変調器は、反射型空間光変調器である、請求項4に記載のレーザデバイス。
- 前記第2の反射層は、前記利得媒質によって放出された入射放射線を前記空間光変調器に向けて反射するように、そして、前記空間光変調器によって反射された入射放射線を前記利得媒質に向けて反射するように配置される、請求項4に記載のレーザデバイス。
- 前記第1の反射層は、前記レーザ波長の放射線のためのブラッグ反射器を備える、請求項1に記載のレーザデバイス。
- 前記第2の反射層は、反射格子を備える、請求項1に記載のレーザデバイス。
- 前記反射格子は、チャープ格子である、請求項8に記載のレーザデバイス。
- 前記利得媒質は、量子井戸層を備える、請求項1に記載のレーザデバイス。
- 前記利得媒質含有層と前記基板との間に第1の電極層をさらに備える、請求項1に記載のレーザデバイス。
- 第2の電極層をさらに備え、前記第1の電極層および前記第2の電極層は、前記利得媒質含有層の反対側に位置する、請求項11に記載のレーザデバイス。
- 前記第1の電極層および前記第2の電極層の一方または両方は、パターン電極層である、請求項11に記載のレーザデバイス。
- 前記第1の電極層は、前記レーザ波長透過性を有する導電性材料から形成される、請求項11に記載のレーザデバイス。
- 前記第1の電極層は、レーザ放射線を通過させるためのアパーチャを備える、請求項11に記載のレーザデバイス。
- 前記第1の反射層または前記第2の反射層は、前記レーザ波長の放射線のための部分反射層である、請求項1に記載のレーザデバイス。
- 前記レーザ波長は、250nm〜5,000nmである、請求項1に記載のレーザデバイス。
- 動作中、前記利得媒質は、電気的にポンピングされる、光学的にポンピングされる、または電子ビームを使用してポンピングされる、請求項1に記載のレーザデバイス。
- 請求項1に記載のレーザデバイスを備えるディスプレイ。
- 請求項1に記載のレーザデバイスを備える光通信システム。
- レーザデバイスの形成方法であって、
第1の反射層と利得媒質含有層とを備える発光モジュールを形成するステップであって、前記第1の反射層はレーザ波長の少なくとも一部の入射放射線を反射するように構成され、前記利得媒質含有層は前記レーザ波長の放射線の誘導放出を発生させるように構成される、発光モジュール形成ステップと、
空間光変調器を形成するステップと、
前記第1の反射層および第2の反射器によって画定された光学キャビティ内の放射線経路内に前記空間光変調器が位置決めされるように、前記レーザ波長透過性を有する材料から形成された共通基板に前記発光モジュールおよび前記空間光変調器を取り付けることによって前記レーザデバイスを組み立てるステップであって、前記空間光変調器は各々が前記光学キャビティ内の前記基板層を通過する異なる放射線経路に対応する素子アレイを備える、レーザデバイス組み立てステップと
を含む、方法。 - 前記発光モジュールを形成するステップは、複数の層を積み重ねて連続的に形成するステップと、前記層の少なくともいくつかにパターン形成するステップとを含む、請求項21に記載の方法。
- 前記レーザデバイスを形成するステップは、共通基板を使用して複数のデバイスを形成するステップと、複数の個々のデバイスを形成するために前記基板をダイシングするステップとを含む、請求項21に記載の方法。
- 前記空間光変調器は、前記第2の反射器を備える、請求項21に記載の方法。
- 前記第2の反射器は、第2の反射層であり、前記空間光変調器は、透過型空間光変調器であり、前記第1の反射層と前記第2の反射層との間のレーザ放射線の経路である、請求項21に記載の方法。
- 前記空間光変調器および前記発光モジュールは、前記共通基板を挟んで前記共通基板の両側に配置される、請求項21に記載の方法。
- 前記空間光変調器および前記発光モジュールは、前記共通基板の同じ側に配置され、追加の反射器は、前記基板を挟んだ反対側に配置され、前記発光モジュールから前記空間光変調器へと光を方向付けし、またその逆に前記空間光変調器から前記発光モジュールへと光を方向付けるように構成される、請求項21に記載の方法。
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US15/394,164 | 2016-12-29 | ||
US15/394,164 US9843160B1 (en) | 2016-12-29 | 2016-12-29 | Integrated digital laser |
PCT/US2017/059793 WO2018125380A1 (en) | 2016-12-29 | 2017-11-02 | Integrated digital laser |
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JP2020507202A true JP2020507202A (ja) | 2020-03-05 |
JP6886520B2 JP6886520B2 (ja) | 2021-06-16 |
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EP (1) | EP3563455A4 (ja) |
JP (1) | JP6886520B2 (ja) |
CN (1) | CN110214400B (ja) |
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EP3496216A1 (en) * | 2017-12-08 | 2019-06-12 | Koninklijke Philips N.V. | Segmented vertical cavity surface emitting laser |
JP7219552B2 (ja) * | 2018-05-15 | 2023-02-08 | 浜松ホトニクス株式会社 | 発光デバイス |
CN113381297B (zh) * | 2020-03-09 | 2022-07-01 | 济南晶正电子科技有限公司 | 一种集成光学复合基板 |
US11355899B2 (en) * | 2020-08-27 | 2022-06-07 | Hewlett Packard Enterprise Development Lp | Semiconductor laser diode integrated with memristor |
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CN110214400B (zh) | 2021-06-01 |
TW201841443A (zh) | 2018-11-16 |
CN110214400A (zh) | 2019-09-06 |
EP3563455A1 (en) | 2019-11-06 |
JP6886520B2 (ja) | 2021-06-16 |
US9843160B1 (en) | 2017-12-12 |
TWI666838B (zh) | 2019-07-21 |
WO2018125380A1 (en) | 2018-07-05 |
EP3563455A4 (en) | 2020-08-26 |
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