JP2020178043A - Processing liquid preparation device, substrate processing device, processing liquid preparation method, and substrate processing method - Google Patents

Abstract

To perform calibration with other phosphoric acid solution with high accuracy.SOLUTION: A processing liquid preparation device (100) includes a reservoir unit (102), a measurement unit (114), and a storage unit (106). The reservoir unit (102) stores a phosphoric acid solution. The measurement unit (114) measures a value indicating the specific gravity of the phosphoric acid solution in the reservoir unit (102). The storage unit (106) stores the value measured by the measurement unit (114). The storage unit (106) stores a reference value indicating the specific gravity of the phosphoric acid solution measured by the measurement unit (114) when the phosphoric acid solution in the reservoir unit (102) is in a boundary state between a sudden boiling state in which the phosphoric acid solution suddenly boils and a non-sudden boiling state in which the phosphoric acid solution does not suddenly boil.SELECTED DRAWING: Figure 4

Description

The present invention relates to a treatment liquid preparation apparatus, a substrate treatment apparatus, a treatment liquid preparation method, and a substrate treatment method.

A substrate processing apparatus for processing a substrate is known. For example, a substrate processing apparatus is used for manufacturing a semiconductor substrate or a glass substrate. The substrate may be treated with phosphoric acid to etch the silicon nitride layer as the insulating layer (see, for example, Patent Document 1). Patent Document 1 describes that a phosphoric acid solution containing silica at a predetermined concentration is used as an etching solution by measuring the phosphoric acid concentration together with the silica concentration.

JP-A-2015-195306

In Patent Document 1, a phosphoric acid solution is produced in one bathtub, but there is a demand for producing a phosphoric acid solution having the same processing characteristics in a plurality of storage tanks. For example, by producing a phosphoric acid solution having the same processing characteristics in a plurality of storage tanks, a large amount of substrates can be continuously and stably processed. However, in reality, even if an attempt is made to calibrate the concentration of the phosphoric acid solution based on the measurement results of the measuring instruments, the phosphoric acid solutions stored in a plurality of storage tanks have the same concentration (specific gravity) due to the difference between the devices of the phosphoric acid concentration meter. ) Was difficult to set.

The present invention has been made in view of the above problems, and an object of the present invention is to provide a treatment liquid preparation device, a substrate treatment device, a treatment liquid preparation method, and a substrate treatment method that enable highly accurate calibration with other phosphoric acid solutions. To provide.

According to one aspect of the present invention, the treatment liquid preparation device includes a storage unit, a measurement unit, and a storage unit. The storage section stores the phosphoric acid solution. The measuring unit measures a value indicating the specific gravity of the phosphoric acid solution in the storage unit. The storage unit stores the value measured by the measurement unit. The storage unit is a reference indicating the specific gravity of the phosphoric acid solution measured by the measuring unit when it is in a boundary state between a sudden boiling state in which the phosphoric acid solution suddenly boils and a non-sudden state in which the phosphoric acid solution does not suddenly boil. Remember the value.

In a certain embodiment, the storage unit prepares the phosphoric acid solution so that the value indicating the specific gravity of the phosphoric acid solution becomes larger than the reference value.

In a certain embodiment, the treatment liquid preparation device and an imaging unit for imaging the phosphoric acid solution in the storage unit are further provided.

In certain embodiments, the reservoir includes a first reservoir that stores a first phosphoric acid solution and a second reservoir that stores a second phosphoric acid solution. The storage unit has a specific gravity of the first phosphoric acid solution measured by the first measuring unit when it is in a boundary state between a sudden boiling state in which the first phosphoric acid solution suddenly boils and a non-sudden state in which the first phosphoric acid solution does not suddenly boil. The first reference value indicating is stored. The storage unit has a specific gravity of the second phosphoric acid solution measured by the second measuring unit when it is in a boundary state between a sudden boiling state in which the second phosphoric acid solution suddenly boils and a non-sudden state in which the second phosphoric acid solution does not suddenly boil. The second reference value indicating is stored.

In certain embodiments, the first phosphoric acid solution is prepared based on the first reference value, and the second phosphoric acid solution is prepared based on the second reference value.

In certain embodiments, the second reservoir supplies the phosphoric acid solution prepared in the second reservoir to the first reservoir.

According to another aspect of the present invention, the substrate processing apparatus includes the processing liquid preparation apparatus described above and a substrate processing unit that processes a substrate using the phosphoric acid solution prepared in the processing liquid preparation apparatus.

In a certain embodiment, the substrate processing unit has a substrate holding unit that holds and rotates the substrate, and a nozzle that supplies the phosphoric acid solution to the substrate held by the substrate holding unit.

In a certain embodiment, the value indicating the specific gravity of the phosphoric acid solution in the storage portion is set based on the state of the phosphoric acid solution supplied to the nozzle.

In a certain embodiment, the substrate processing unit includes a substrate loading unit capable of loading a plurality of the substrates, and a processing tank for storing the phosphoric acid solution prepared in the processing liquid preparation device.

In a certain embodiment, the substrate processing unit has a substrate loading unit capable of loading a plurality of the substrates, and the substrate loading unit is immersed in the phosphoric acid solution in the storage unit of the processing liquid preparation device.

According to still another aspect of the present invention, the treatment liquid preparation method includes a step of setting the phosphoric acid solution at a boundary state between a sudden boiling state in which the stored phosphoric acid solution suddenly boils and a non-sudden state in which the phosphoric acid solution does not suddenly boil. Includes a step of measuring a reference value indicating the specific gravity of the phosphoric acid solution set in the boundary state, and a step of storing the reference value.

In a certain embodiment, the treatment liquid preparation method further includes a step of preparing the phosphoric acid solution so that the value indicating the specific gravity of the phosphoric acid solution becomes larger than the reference value.

In certain embodiments, the step of setting the phosphoric acid solution in the boundary state includes a step of imaging the phosphoric acid solution.

In a certain embodiment, the steps of setting the phosphoric acid solution in the boundary state include a step of setting the first phosphoric acid solution in a boundary state with a non-bumping state in which the first phosphoric acid solution does not suddenly boil, and a step of setting the first phosphoric acid solution in a bumping state. This includes a step of setting the second phosphoric acid solution at a boundary state with a non-sudden state. The step of measuring the reference value is a step of measuring a first reference value indicating the specific gravity of the first phosphoric acid solution set in the boundary state and a step of measuring the specific gravity of the second phosphoric acid solution set in the boundary state. It includes a step of measuring the second reference value shown. The step of storing the reference value includes a step of storing the first reference value and a step of storing the second reference value.

In a certain embodiment, the treatment liquid preparation method includes a step of preparing the first phosphoric acid solution based on the first reference value and a step of preparing the second phosphoric acid solution based on the second reference value. Further include.

In certain embodiments, the treatment solution preparation method further comprises the step of mixing the second phosphoric acid solution with the first phosphoric acid solution.

According to yet another aspect of the present invention, there are a step of preparing a phosphoric acid solution according to the treatment liquid preparation method described above and a step of treating a substrate using the phosphoric acid solution prepared in the treatment liquid preparation method. Include.

In certain embodiments, the step of processing the substrate includes a step of holding and rotating the substrate and a step of supplying the phosphoric acid solution to the rotating substrate.

In one embodiment, in the step of supplying the phosphoric acid solution, a value indicating the specific gravity of the stored phosphoric acid solution is set based on the state of the phosphoric acid solution supplied to the nozzle.

In certain embodiments, the step of treating the substrate comprises supplying the phosphoric acid solution to the treatment tank and immersing the substrate in the phosphoric acid solution of the treatment tank.

In certain embodiments, the step of processing the substrate is to immerse the substrate in a storage tank in which the phosphoric acid solution is prepared.

According to the present invention, calibration with other phosphoric acid solutions can be performed with high accuracy.

It is a schematic diagram of the substrate processing apparatus provided with the processing liquid preparation apparatus of this embodiment. (A) to (d) are schematic views showing the supply of water to the storage tank in the treatment liquid preparation apparatus of the present embodiment, the value indicating the specific gravity of the phosphoric acid solution, and the state of the phosphoric acid solution. (A) to (d) are schematic views showing the supply of water to the first storage tank and the second storage tank in the treatment liquid preparation apparatus of the present embodiment, the value indicating the specific gravity of the phosphoric acid solution, and the state of the phosphoric acid solution. is there. (A) to (c) are schematic views showing the supply of water to the first storage tank and the second storage tank in the treatment liquid preparation apparatus of the present embodiment, the value indicating the specific gravity of the phosphoric acid solution, and the state of the phosphoric acid solution. is there. (A) to (c) are schematic views for demonstrating the preparation of a phosphoric acid solution in the substrate processing apparatus of this embodiment. It is a flow diagram for demonstrating the flow of the substrate processing apparatus provided with the processing liquid preparation apparatus of this embodiment. It is a schematic diagram of the substrate processing apparatus provided with the processing liquid preparation apparatus of this embodiment. It is a schematic diagram of the substrate processing apparatus provided with the processing liquid preparation apparatus of this embodiment. It is a schematic diagram of the substrate processing apparatus provided with the processing liquid preparation apparatus of this embodiment. It is a schematic diagram of the substrate processing system provided with the substrate processing apparatus of this embodiment. It is a flow diagram for demonstrating the flow of the substrate processing apparatus provided with the processing liquid preparation apparatus of this embodiment. It is a schematic diagram of the substrate processing apparatus provided with the processing liquid preparation apparatus of this embodiment. (A) to (f) are schematic diagrams for explaining the change of the flow of the phosphoric acid solution in the substrate processing apparatus provided with the processing solution preparation apparatus of this embodiment.

Hereinafter, embodiments of the treatment liquid preparation apparatus and the treatment liquid preparation method according to the present invention will be described with reference to the drawings. In the drawings, the same or corresponding parts are designated by the same reference numerals and the description is not repeated.

An embodiment of the substrate processing apparatus 200 provided with the processing liquid preparing apparatus 100 according to the present invention will be described with reference to FIG. FIG. 1 is a schematic view of the substrate processing apparatus 200 of the present embodiment. The substrate processing apparatus 200 processes the substrate W. The substrate processing apparatus 200 processes the substrate W so as to perform at least one of etching, surface treatment, character imparting, treatment film formation, removal of at least a part of the film, and cleaning of the substrate W.

The substrate W has a thin plate shape. Typically, the substrate W has a thin substantially disc shape. The substrate W includes, for example, a semiconductor wafer, a substrate for a liquid crystal display device, a substrate for a plasma display, a substrate for a field emission display (FED), a substrate for an optical disk, a substrate for a magnetic disk, a substrate for an optical magnetic disk, and a photomask. Includes substrates, ceramic substrates, solar cell substrates, and the like.

The substrate processing apparatus 200 treats the substrate W with a processing liquid containing a phosphoric acid solution. Typically, the phosphoric acid treatment etches a silicon nitride layer that functions as an insulating layer of the substrate W. Here, the substrate processing apparatus 200 processes the substrate W with a phosphoric acid solution one by one.

The substrate processing apparatus 200 includes a processing liquid preparation apparatus 100 and a substrate processing unit 210. The treatment liquid preparation device 100 prepares the treatment liquid. The treatment liquid contains a phosphoric acid liquid. The treatment liquid preparation device 100 adjusts the temperature and specific gravity of the phosphoric acid liquid to a predetermined state. The treatment liquid preparation device 100 supplies the prepared treatment liquid to the substrate processing unit 210.

The substrate processing unit 210 processes the substrate W with the processing liquid supplied from the processing liquid preparation device 100. Here, the substrate processing unit 210 is a single-wafer processing apparatus. The substrate processing unit 210 treats the substrates W one by one with a phosphoric acid solution. When the substrate processing unit 210 processes the substrate W, if the phosphoric acid solution contains a gas, the substrate W may not be uniformly processed. Therefore, it is preferable that the phosphoric acid liquid supplied from the treatment liquid preparation device 100 to the substrate processing unit 210 does not contain gas.

The substrate processing unit 210 includes a chamber 212, a substrate holding unit 214, a nozzle 216, and a cup 218. The chamber 212 houses the substrate W. One substrate W is housed in the chamber 212. The substrate W is housed in the chamber 212 and processed in the chamber 212.

The substrate holding portion 214 holds the substrate W. Further, the substrate holding portion 214 rotates together with the substrate W while holding the substrate W. For example, the substrate holding portion 214 may be a sandwiching type that sandwiches an end portion of the substrate W.

Alternatively, the substrate holding portion 214 may have an arbitrary mechanism for holding the substrate W from the back surface. For example, the substrate holding portion 214 may be of a vacuum type. In this case, the substrate holding portion 214 holds the substrate W horizontally by adsorbing the central portion of the back surface (lower surface) of the substrate W, which is a non-device forming surface, to the upper surface. Alternatively, the substrate holding portion 214 may be a combination of a holding type and a vacuum type in which a plurality of chuck pins are brought into contact with the peripheral end surface of the substrate W.

The nozzle 216 is housed in the chamber 212. The nozzle 216 discharges the phosphoric acid solution toward the substrate W held by the substrate holding portion 214.

The cup 218 collects the phosphoric acid solution supplied to the substrate W. The details will be described later, but the treatment liquid recovered by the cup 218 returns to the treatment liquid preparation device 100.

The treatment liquid preparation device 100 includes a storage unit 102 for storing a phosphoric acid liquid. In the reservoir 102, the phosphoric acid solution is prepared. The phosphoric acid solution contains phosphoric acid and water. The storage unit 102 prepares the phosphoric acid solution at a predetermined temperature and specific gravity.

Here, the storage unit 102 includes a first storage unit 110 and a second storage unit 120. A phosphoric acid solution is stored as a treatment liquid in the first storage unit 110. A phosphoric acid solution is stored as a treatment liquid in the second storage unit 120. The phosphoric acid solution of the first storage unit 110 and the phosphoric acid solution of the second storage unit 120 are not mixed until the preparation of the first storage unit 110 and the second storage unit 120 is completed. However, after the preparation of the first storage unit 110 and the second storage unit 120 is completed, the phosphoric acid solution of the first storage unit 110 and the phosphoric acid solution of the second storage unit 120 may be mixed with each other. When the phosphoric acid solution of the first reservoir 110 and the phosphoric acid solution of the second reservoir 120 are mixed, the specific gravity of the phosphoric acid solution of the first reservoir 110 is substantially equal to the specific gravity of the phosphoric acid solution of the second reservoir 120. Is preferable. Further, it is preferable that the temperature of the phosphoric acid solution in the first reservoir 110 is substantially equal to the temperature of the phosphoric acid solution in the second reservoir 120.

Here, the first storage unit 110 supplies the phosphoric acid solution to the substrate processing unit 210. The second storage unit 120 replenishes the first storage unit 110 with a phosphoric acid solution. Further, here, the second storage unit 120 collects the processing liquid used in the substrate processing unit 210.

In addition, in this specification, a phosphoric acid solution prepared in a 1st storage part 110 may be described as a 1st phosphoric acid solution. Further, the phosphoric acid solution prepared in the second storage unit 120 may be referred to as a second phosphoric acid solution.

The first storage unit 110 includes a first storage tank 112, a first pipe 113, and a first measurement unit 114. The first storage tank 112 stores a phosphoric acid solution as a treatment solution.

The first pipe 113 connects the first storage tank 112 and the substrate processing unit 210. Further, the first pipe 113 has a circulation pipe 113a that returns to the first storage tank 112 on the way.

The first measurement unit 114 is attached to the first storage tank 112. The first measuring unit 114 measures a value indicating the specific gravity of the phosphoric acid solution stored in the first storage tank 112. The first measuring unit 114 measures the back pressure of the first storage tank 112.

For example, the tip of the first measuring unit 114 is arranged at a predetermined depth from the phosphoric acid liquid surface of the first storage tank 112. The first measuring unit 114 supplies gas to the tip of the first measuring unit 114 to form bubbles in the phosphoric acid solution of the first storage tank 112. As a result, the hydraulic pressure of the phosphoric acid solution stored in the first storage tank 112 is set as the gas pressure at the tip of the first measuring unit 114 arranged at a predetermined depth from the liquid level of the first storage tank 112. Detected. As the gas, nitrogen gas is typically used. By measuring the relationship between the gas pressure and the phosphoric acid solution in advance and creating a look-up table showing the relationship between the gas pressure and the phosphoric acid solution in advance, it is possible to respond to the gas pressure at which bubbles are formed by the gas. The specific gravity of the phosphoric acid solution can be measured.

The first measuring unit 114 does not necessarily have to measure the value of the specific gravity itself of the phosphoric acid solution. For example, the first measuring unit 114 may measure a value that changes in proportion to the specific gravity of the phosphoric acid solution. However, in the present specification, for convenience, measuring a value indicating the specific gravity of the phosphoric acid solution may be described as measuring the specific gravity of the phosphoric acid solution.

The first storage unit 110 further includes a pump 115a, a heater 115b, a filter 115c, a valve 115d, and a valve 115e. The pump 115a, the heater 115b, the filter 115c, and the valve 115d are arranged in the first pipe 113. The valve 115e is arranged in the circulation pipe 113a.

The pump 115a sucks in the phosphoric acid solution once, and then pushes out the sucked phosphoric acid solution toward the downstream side. The phosphoric acid solution is pushed out into the first pipe 113 by the pump 115a. The heater 115b heats the first phosphoric acid solution. The temperature of the first phosphoric acid solution can be set to 130 ° C. or higher by heating the phosphoric acid solution by the heater 115b. The temperature of the first phosphoric acid solution may be set to 130 ° C. or higher and 200 ° C. or lower, or 150 ° C. or higher and 180 ° C. or lower.

The filter 115c filters the suspended matter of the first phosphoric acid solution. The valve 115d controls the flow of the first phosphoric acid solution. When the valve 115d is opened, the phosphoric acid liquid flows toward the substrate processing unit 210. When the valve 115d is closed, the phosphoric acid liquid does not flow from the treatment liquid preparation device 100 toward the substrate processing unit 210.

The valve 115e also controls the flow of the phosphoric acid solution. When the valve 115d is opened, the phosphoric acid solution flows toward the first storage tank 112, so that the phosphoric acid solution can be circulated. When the valve 115e is closed, the circulation of the phosphoric acid solution is stopped.

For example, when the valve 115e is opened with the valve 115d closed, the phosphoric acid solution in the first storage unit 110 circulates through the circulation pipe 113a. At this time, the phosphoric acid solution in the first storage unit 110 can be set to a predetermined temperature by heating the phosphoric acid solution in which the heater 115b circulates.

Further, when the valve 115d and the valve 115e are open, the phosphoric acid solution of the first storage unit 110 circulates through the circulation pipe 113a and is supplied to the substrate processing unit 210 via the first pipe 113. Therefore, the substrate processing unit 210 can process the substrate W with a phosphoric acid solution having a predetermined temperature.

Further, the first storage unit 110 further includes a first water supply unit 116a, a first phosphoric acid supply unit 116b, and a first gas supply unit 116c. The first water supply unit 116a supplies water to the first storage tank 112. For example, when the phosphoric acid solution circulates, when the phosphoric acid solution is heated to a high temperature exceeding the boiling point of water by the heater 115b, water having a low boiling point evaporates preferentially from the phosphoric acid solution. Therefore, in order to keep the temperature and specific gravity of the phosphoric acid solution constant when the phosphoric acid solution circulates, the first water supply unit 116a may continuously supply a constant amount of water.

Since the specific gravity of phosphoric acid is higher than the specific gravity of water, if the phosphoric acid component in the phosphoric acid solution is large, the specific gravity of the phosphoric acid solution increases. On the contrary, when the amount of water component in the phosphoric acid solution is large, the specific gravity of the phosphoric acid solution decreases.

Further, since the boiling point of phosphoric acid is higher than the boiling point of water, if the phosphoric acid component in the phosphoric acid solution is large, the phosphoric acid solution is less likely to boil. On the contrary, when the amount of water component in the phosphoric acid solution is large, the phosphoric acid solution tends to boil. Therefore, even if the temperature of the phosphoric acid solution is constant, the state of the phosphoric acid solution changes according to the components of the phosphoric acid solution. For example, if the phosphoric acid solution contains a large amount of water, the phosphoric acid solution tends to boil. Therefore, by controlling the amount of water supplied from the first water supply unit 116a, the buoyant state and the non-buoyant state of the phosphoric acid solution can be controlled.

The first phosphoric acid supply unit 116b supplies the phosphoric acid solution to the first storage tank 112. Typically, when the first phosphoric acid solution is stored in the first storage tank 112, the first phosphoric acid supply unit 116b supplies the phosphoric acid solution to the first storage tank 112.

The first gas supply unit 116c supplies gas to the first storage tank 112. For example, the first gas supply unit 116c supplies nitrogen gas to the first storage tank 112.

For example, the specific gravity of the phosphoric acid solution in the first storage tank 112 is determined from the amount of water supplied from the first water supply unit 116a and / or from the first phosphoric acid supply unit 116b based on the measurement result of the first measurement unit 114. It is controlled by controlling the amount of phosphoric acid supplied.

The first storage tank 112 has a main body tank 112a and a circulation tank 112b. The circulation tank 112b is arranged adjacent to the main body tank 112a. The main body tank 112a is arranged so that the phosphoric acid liquid overflowing from the circulation tank 112b flows into the main body tank 112a. The volume of the main body tank 112a is larger than the volume of the circulation tank 112b.

The tip of the circulation pipe 113a is located in the circulation tank 112b. The phosphoric acid solution that has passed through the circulation pipe 113a returns to the circulation tank 112b of the first storage tank 112, overflows from the circulation tank 112b, reaches the main body tank 112a, and passes through the first pipe 113 again. Further, the first measuring unit 114 is attached to the circulation tank 112b.

The first storage unit 110 may further include a liquid level sensor 114a. The liquid level sensor 114a detects the height of the liquid level of the phosphoric acid liquid in the first storage tank 112.

The second storage unit 120 has a configuration corresponding to the first storage unit 110. The second storage unit 120 includes a second storage tank 122, a second pipe 123, a second measurement unit 124, a pump 125a, a heater 125b, a filter 125c, a valve 125d, a valve 125e, and a second water. The supply unit 126a, the second phosphoric acid supply unit 126b, and the second gas supply unit 126c are included. Duplicate description of the second storage unit 120 is omitted in order to avoid redundant description.

The second pipe 123 of the second storage unit 120 connects the second storage tank 122 and the first storage tank 112. Further, the valve 125d controls the flow of the phosphoric acid solution from the second storage tank 122 to the first storage tank 112. When the valve 125d is opened, the phosphoric acid solution flows toward the first storage tank 112. When the valve 125d is closed, the phosphoric acid solution does not flow from the second storage unit 120 toward the first storage unit 110.

Further, when the valve 125e is opened, the phosphoric acid solution flows toward the second storage tank 122, so that the phosphoric acid solution can be circulated. When the valve 125e is closed, the circulation of the phosphoric acid solution is stopped.

For example, when the valve 125e is opened with the valve 125d closed, the phosphoric acid solution in the second storage unit 120 circulates through the circulation pipe 123a. At this time, the phosphoric acid solution in the second storage unit 120 can be set to a predetermined temperature by heating the phosphoric acid solution in which the heater 125b circulates.

Further, when the valve 125d and the valve 125e are open, the phosphoric acid solution of the second storage unit 120 circulates through the circulation pipe 123a and is supplied to the first storage unit 110 via the second pipe 123. Therefore, the second storage unit 120 can replenish the phosphoric acid solution of the first storage unit 110.

Further, the second pipe 123 has a circulation pipe 123a that returns to the second storage tank 122 on the way. Further, the second storage unit 120 has a return pipe 123b that connects the substrate processing unit 210 and the second storage tank 122. The processing liquid collected by the cup 126 in the substrate processing unit 210 flows through the return pipe 123b. The processing liquid passing through the return pipe 123b returns to the main body tank 122a of the second storage tank 122.

The treatment liquid preparation device 100 further includes a control unit 104 and a storage unit 106. The control unit 104 includes a processor. The processor has, for example, a central processing unit (CPU). Alternatively, the processor may have a general-purpose arithmetic unit. For example, the control unit 104 includes a first measurement unit 114 of the first storage unit 110, a liquid level sensor 114a, a pump 115a, a heater 115b, a filter 115c, a valve 115d, a valve 115e, a first water supply unit 116a, and a first phosphoric acid supply. The unit 116b and the first gas supply unit 116c are controlled. Further, the control unit 104 includes a second measurement unit 124 of the second storage unit 120, a liquid level sensor 124a, a pump 125a, a heater 125b, a filter 125c, a valve 125d, a valve 125e, a second water supply unit 126a, and a second phosphoric acid supply. The unit 126b and the second gas supply unit 126c are controlled.

The storage unit 106 stores data and computer programs. The storage unit 106 includes a main storage device and an auxiliary storage device. The main storage device is, for example, a semiconductor memory. Auxiliary storage devices are, for example, semiconductor memories and / or hard disk drives. The storage unit 106 may include removable media. The control unit 104 executes the computer program stored in the storage unit 106 to execute the processing liquid preparation method.

A computer program for which a procedure has been determined in advance is stored in the storage unit 106, and the processing liquid preparation device 100 operates according to the procedure specified in the computer program.

The substrate processing unit 210 further includes a pipe 213, a valve 213a, a pipe 215, and a valve 215a. The pipe 213 connects the first pipe 113 of the first storage unit 110 and the chamber 212. The valve 213a is arranged in the pipe 213. The valve 213a controls the flow of the phosphoric acid solution in the pipe 213. When the valve 213a is opened, the phosphoric acid liquid is discharged to the substrate W through the nozzle 216 toward the chamber 212. When the valve 213a is closed, the phosphoric acid solution does not flow toward the chamber 212.

The pipe 215 connects the chamber 212 and the return pipe 123b of the second storage unit 120. The valve 215a is arranged in the pipe 215. The valve 215a controls the flow of the phosphoric acid solution in the pipe 215. When the valve 215a is opened, the phosphoric acid solution flows from the chamber 212 toward the second storage portion 120. When the valve 215a is closed, the phosphoric acid solution does not flow toward the second reservoir 120.

Further, the substrate processing unit 210 further includes a control unit 204 and a storage unit 206. The control unit 204 includes a processor. The processor has, for example, a central processing unit (CPU). Alternatively, the processor may have a general-purpose arithmetic unit. For example, the control unit 204 controls the valve 213a, the substrate holding unit 214, the valve 215a, and the nozzle 216.

The storage unit 206 stores data and computer programs. The storage unit 206 includes a main storage device and an auxiliary storage device. The main storage device is, for example, a semiconductor memory. Auxiliary storage devices are, for example, semiconductor memories and / or hard disk drives. The storage unit 206 may include removable media. The control unit 104 executes the computer program stored in the storage unit 206 to execute the board processing method.

A computer program for which a procedure has been determined in advance is stored in the storage unit 206, and the substrate processing unit 210 operates according to the procedure determined for the computer program.

The control unit 104, the storage unit 106, the control unit 204, and the storage unit 206 may be integrally configured. For example, the control unit 104, the storage unit 106, the control unit 204, and the storage unit 206 may be integrally configured to control the substrate processing device 200 as the device control unit 201.

In the treatment liquid preparation device 100 of the present embodiment, the storage unit 106 determines the measured value of the first measuring unit 114 when the first phosphoric acid liquid of the first storage unit 110 is in the boundary state between the bumped state and the non-bulging state. Remember. The measured value of the measuring unit when the first phosphoric acid solution is in the boundary state can be used as a reference state peculiar to the first phosphoric acid solution. Therefore, by using the measured value of the first measuring unit 114, the first phosphoric acid solution can be calibrated to the same state as other phosphoric acid solutions. For example, by using the measured value of the first measuring unit 114, the first phosphoric acid solution of the first storage unit 110 can be prepared in the same state as the second phosphoric acid solution of the second storage unit 120.

Further, the storage unit 106 stores the measured value of the second measuring unit 124 when the second phosphoric acid liquid of the second storage unit 120 is in the boundary state between the suddenly boiled state and the non-bulging state. The measured value of the measuring unit when the second phosphoric acid solution is in the boundary state can be used as a reference state peculiar to the second phosphoric acid solution. Therefore, the second phosphoric acid solution can be prepared in the same state as the first phosphoric acid solution by using the measured value of the second measuring unit 124.

As described above, the phosphoric acid liquids of the first storage unit 110 and the second storage unit 120 are heated by the heater 115b and the heater 125b. When the temperature of the phosphoric acid solution is constant, the treatment characteristics of the phosphoric acid solution differ depending on the ratio of phosphoric acid and water in the phosphoric acid solution. The more water components in the phosphoric acid solution, the lower the specific gravity of the phosphoric acid solution. Further, if the temperature of the phosphoric acid solution is under a certain condition, the etching rate of the substrate W can be improved as the amount of water components in the phosphoric acid solution increases. Further, the larger the phosphoric acid component in the phosphoric acid solution, the higher the specific gravity of the phosphoric acid solution and the easier the temperature of the phosphoric acid solution can be raised. If the component (or specific gravity) of the phosphoric acid solution is constant, the higher the temperature of the phosphoric acid solution, the better the etching rate of the substrate W.

Next, with reference to FIGS. 1 and 2, a value indicating the supply of water to the first storage tank 112 in the treatment liquid preparation device 100 of the present embodiment, the specific gravity of the phosphoric acid liquid in the first storage unit 110, and phosphoric acid. The state of the liquid will be described. 2 (a) to 2 (d) show the supply of water to the first storage tank 112 in the treatment liquid preparation device 100 of the present embodiment, the specific gravity of the phosphoric acid liquid in the first storage unit 110, and the phosphoric acid. It is a schematic diagram which shows the state of a liquid.

In FIGS. 2 (a) and 2 (d), the temperature of the phosphoric acid solution is kept constant. For example, the temperature of the phosphoric acid solution is 130 ° C. or higher and 180 ° C. or lower. Further, the state of the phosphoric acid solution can be observed in a part of the first pipe 113. The state of the phosphoric acid solution may be visually confirmed in a part of the first pipe 113.

As shown in FIG. 2A, when a relatively large amount of water is supplied from the first water supply unit 116a to the first storage tank 112, the water component of the phosphoric acid solution becomes relatively large. In this case, the first measuring unit 114 measures a relatively low value as the specific gravity of the first phosphoric acid solution. Here, the measured value is 33.9. At this time, the first phosphoric acid solution is boiling and is partially vaporized.

As shown in FIG. 2B, when the amount of water supplied from the first water supply unit 116a to the first storage tank 112 is slightly reduced, the water component of the phosphoric acid solution is slightly reduced. In this case, the first measuring unit 114 measures a slightly higher value as the specific gravity of the first phosphoric acid solution. Here, the measured value is 34.0. Also at this time, the first phosphoric acid solution is boiling and is partially vaporized.

As shown in FIG. 2C, when the amount of water supplied from the first water supply unit 116a to the first storage tank 112 is further reduced, the water component of the phosphoric acid solution is further reduced. In this case, the first measuring unit 114 measures a higher value as the specific gravity of the first phosphoric acid solution. Here, the measured value is 34.1. Also at this time, the first phosphoric acid solution is boiling and is partially vaporized.

As shown in FIG. 2D, when the amount of water supplied from the first water supply unit 116a to the first storage tank 112 is further reduced, the water component of the phosphoric acid solution is further reduced. In this case, the first measuring unit 114 measures the specific gravity of the phosphoric acid solution in the first storage unit 110 to be even higher. Here, the measured value is 34.2. At this time, the first phosphoric acid solution does not boil and remains transparent.

As can be understood from the explanation with reference to FIGS. 2 (a) to 2 (d), even if the temperature of the phosphoric acid solution is constant, the state of the phosphoric acid solution changes with the change in the components of the phosphoric acid solution and the specific gravity of the phosphoric acid solution. Change. Specifically, the smaller the water content of the phosphoric acid solution, the higher the specific gravity of the phosphoric acid solution, and the less likely the phosphoric acid solution to boil.

As described with reference to FIG. 1, in the treatment liquid preparation device 100, the first measuring unit 114 measures a value indicating the specific gravity of the phosphoric acid solution of the first storage unit 110, and the second measuring unit 124 measures the second storage. A value indicating the specific gravity of the phosphoric acid solution of part 120 is measured. However, since there are differences between the first measuring unit 114 and the second measuring unit 124 for each device, even if the phosphoric acid solution of the first storage unit 110 and the phosphoric acid solution of the second storage unit 120 have the same specific gravity, the first measurement unit 114 and the second measurement unit 124 have the same specific gravity. The measurement result of the 1 measurement unit 114 may not be equal to the measurement result of the second measurement unit 124. On the contrary, even if the measurement result of the first measurement unit 114 is equal to the measurement result of the second measurement unit 124, the specific gravities of the phosphoric acid solution of the first storage unit 110 and the phosphoric acid solution of the second storage unit 120 may not be equal. .. In this case, even if the phosphoric acid solution of the first storage unit 110 and the phosphoric acid solution of the second storage unit 120 are prepared so that the measured values of the first measuring unit 114 and the measured values of the second measuring unit 124 match each other, the first The specific gravity of the 1 phosphoric acid solution is different from the specific gravity of the second phosphoric acid solution. When two phosphoric acid solutions having different specific gravities are mixed in this way, the specific gravity of the phosphoric acid solution will be different from the originally planned specific gravity, and the treatment characteristics of the treatment solution will change.

Next, with reference to FIGS. 1 to 3, control of the treatment liquid preparation device 100 before preparing the treatment liquid according to the present embodiment will be described. 3 (a) to 3 (d) show the supply of water to the first storage tank 112 and the second storage tank 122 and the specific gravity of the phosphoric acid solution of the first storage unit 110 and the second storage unit 120. It is a schematic diagram which shows the state of a phosphoric acid solution.

As shown in FIG. 3A, the first water supply unit 116a and the second water supply unit 116a and the second so that the measurement value of the first measurement unit 114 is the same value (33.9) as the measurement value of the second measurement unit 124. The amount of water from the water supply unit 126a is controlled. In this case, both the phosphoric acid liquid flowing through the first pipe 113 and the phosphoric acid liquid flowing through the second pipe 123 are violently boiling. Bubbles are formed on the sides of the pipe, and the phosphoric acid solution flows only in the center of the pipe. At this time, both the first phosphoric acid solution and the second phosphoric acid solution correspond to the state shown in FIG. 2 (a).

As shown in FIG. 3B, the first water supply unit 116a and the second water supply unit 116a and the second water supply unit 116a and the second are so that the measurement value of the first measurement unit 114 and the measurement value of the second measurement unit 124 are both the same value (34.0). The amount of water from the water supply unit 126a is controlled to decrease. In this case, both the phosphoric acid liquid flowing through the first pipe 113 and the phosphoric acid liquid flowing through the second pipe 123 are suddenly boiling. However, while the phosphoric acid solution flowing through the first pipe 113 is relatively violent, the phosphoric acid solution flowing through the second pipe 123 is relatively weak. At this time, the first phosphoric acid solution corresponds to the state shown in FIG. 2 (b), and the second phosphoric acid solution corresponds to the state shown in FIG. 2 (c).

As shown in FIG. 3C, the first water supply unit 116a and the second water supply unit 116a and the second water supply unit 116a so that the measurement value of the first measurement unit 114 and the measurement value of the second measurement unit 124 are both the same value (34.1). The amount of water from the water supply unit 126a is controlled to decrease. In this case, the phosphoric acid solution flowing through the first pipe 113 is still in a sudden boiling state, whereas the phosphoric acid liquid flowing through the second pipe 123 is not suddenly boiling. At this time, the first phosphoric acid solution corresponds to the state shown in FIG. 2C, and the second phosphoric acid solution corresponds to the state shown in FIG. 2D.

As shown in FIG. 3D, the first water supply unit 116a and the second water supply unit 116a and the second water supply unit 116a so that the measurement value of the first measurement unit 114 and the measurement value of the second measurement unit 124 are both the same value (34.2). The amount of water from the water supply unit 126a is controlled to decrease. In this case, neither the phosphoric acid liquid flowing through the first pipe 113 nor the phosphoric acid liquid flowing through the second pipe 123 suddenly boils. At this time, both the first phosphoric acid solution and the second phosphoric acid solution correspond to the state shown in FIG. 2 (d).

As described with reference to FIGS. 3 (a) to 3 (d), the first storage tank 112 and the second storage tank 112 and the second storage tank 112 so that the measured values of the first measuring unit 114 and the measured values of the second measuring unit 124 are equal to each other. Even if the storage tank 122 is controlled, the first phosphoric acid solution and the second phosphoric acid solution are in different states. This is due to the difference between the devices between the first measuring unit 114 and the second measuring unit 124. Therefore, even if the amount of water from the first water supply unit 116a and the second water supply unit 126a is controlled so that the measurement result of the first measurement unit 114 and the measurement result of the second measurement unit 124n match. The specific gravities of the phosphoric acid solution of the first reservoir 110 and the phosphoric acid solution of the second reservoir 120 cannot be made the same.

In the treatment liquid preparation device 100 of the present embodiment, the first measuring unit 114 is set to the first storage unit 110 in a state where the phosphoric acid liquid of the first storage unit 110 and the phosphoric acid liquid of the second storage unit 120 are set to a common state. The value indicating the specific gravity of the phosphoric acid solution is measured, and the second measuring unit 124 measures the value indicating the specific gravity of the phosphoric acid solution of the second storage unit 120. Since these specific gravities indicate a common state between the phosphoric acid solution of the first storage unit 110 and the phosphoric acid solution of the second storage unit 120, the equipment between the first measurement unit 114 and the second measurement unit 124 Not affected by the difference. After that, it is preferable to prepare a phosphoric acid solution of the first reservoir 110 and a phosphoric acid solution of the second reservoir 120 based on these measurement results.

Next, the treatment liquid preparation method of the present embodiment will be described with reference to FIGS. 1 to 4. 4 (a) to 4 (c) show the supply of water to the first storage tank 112 and the second storage tank 122, the first storage unit 110 and the second storage unit in the treatment liquid preparation device 100 of the present embodiment. It is a schematic diagram which shows the value which shows the specific gravity of 120 phosphoric acid liquids, and the state of a phosphoric acid liquid. In the present embodiment, the phosphoric acid solution of the first storage unit 110 and the phosphoric acid solution of the second storage unit 120 are both set to the boundary state between the bumped state and the non-bulging state, and the first measuring unit 114 is the first storage. The value indicating the specific gravity of the phosphoric acid solution of the unit 110 is measured, and the second measuring unit 124 measures the value indicating the specific gravity of the phosphoric acid solution of the second storage unit 120. Typically, in this state, the measured value of the first measuring unit 114 is different from the measured value of the second measuring unit 124.

As shown in FIG. 4A, the first water supply unit 116a and the second water supply unit 116a and the second water supply unit so that the state of the phosphoric acid solution of the first storage unit 110 is substantially equal to the state of the phosphoric acid solution of the second storage unit 120. Control the amount of water from 126a. Here, the first water supply unit 116a and the first water supply unit 116a and the phosphoric acid solution of the second storage unit 120 are set so that both the phosphoric acid solution of the first storage unit 110 and the phosphoric acid solution of the second storage unit 120 are in the bumping state at the boundary between the bumping state and the non-bulging state. The amount of water from the second water supply unit 126a is controlled. At this time, the phosphoric acid solution of the first reservoir 110 and the phosphoric acid solution of the second reservoir 120 are slightly bumped as shown in FIG. 2C.

For example, in FIG. 4A, the measured value of the first storage unit 110 measured by the first measuring unit 114 is 34.1, and the measured value of the first storage unit 110 measured by the second measuring unit 124. Is 34.0.

Further, as shown in FIG. 4B, the first water supply unit 116a and the second water so that the state of the phosphoric acid solution of the first storage unit 110 is substantially equal to the state of the phosphoric acid solution of the second storage unit 120. The amount of water from the supply unit 126a is controlled. Here, the first water supply unit 116a is set so that both the phosphoric acid solution of the first storage unit 110 and the phosphoric acid solution of the second storage unit 120 are in the non-burst state at the boundary between the bumped state and the non-bulging state. And the amount of water from the second water supply unit 126a is controlled. At this time, the phosphoric acid solution of the first reservoir 110 and the phosphoric acid solution of the second reservoir 120 are not suddenly boiled as shown in FIG. 2 (d).

For example, in FIG. 4B, the value indicating the specific gravity of the first phosphoric acid solution measured by the first measuring unit 114 is 34.2, and the specific gravity of the second phosphoric acid solution measured by the second measuring unit 124 is calculated. The value shown is 34.1.

Under the conditions for preparing the phosphoric acid solution of the first storage unit 110, when the measured value of the first measurement unit 114 is between 34.1 and 34.2, the phosphoric acid solution of the first storage unit 110 is in a bumped state. It becomes a boundary state between and the non-sudden state. At this time, the state of the first phosphoric acid solution is equal to the state of the second phosphoric acid solution. Therefore, the storage unit 106 (FIG. 1) stores 34.2 as a reference value of the first storage unit 110 from the measured value of the first measurement unit 114. Further, the storage unit 106 (FIG. 1) stores 34.1 as a reference value of the second storage unit 120 from the measurement value of the second measurement unit 124.

The specific gravity of the phosphoric acid solution actually used in the substrate processing unit 210 is preferably higher than the specific gravity corresponding to the reference value. As a result, even if the temperature of the substrate processing unit 210 is slightly low, it is possible to prevent the phosphoric acid solution from vaporizing and generating bubbles in the processing solution.

As shown in FIG. 4 (c), the measured value of the first measuring unit 114 and the measured value of the second measuring unit 124 are both the first water supply unit 116a so that the specific gravity increases by a predetermined value from the reference value. And the amount of water from the second water supply unit 126a is controlled to decrease. Here, the predetermined value is 0.3. Therefore, the measured value of the first measuring unit 114 is 34.5, and the measured value of the second measuring unit 124 is 34.4. As described above, the measured value of the phosphoric acid solution used for the substrate treatment may be different from the reference value which is the reference value for the calibration of the phosphoric acid solution.

The measured value of the first measuring unit 114 when supplying the phosphoric acid solution of the first storage unit 110 is preferably determined by observing the phosphoric acid solution flowing through the substrate processing unit 210.

Hereinafter, the preparation of the phosphoric acid solution in the substrate processing apparatus 200 of the present embodiment will be described with reference to FIG. 5 (a) to 5 (c) are schematic views of the substrate processing apparatus 200. 5 (a) to 5 (c) are schematic views showing a part of the substrate processing apparatus 200 of FIG. Here, the state of the phosphoric acid liquid flowing through the substrate processing unit 210 is confirmed. For example, the state of the phosphoric acid solution immediately before passing through the nozzle 216 in the substrate processing unit 210 is confirmed.

As shown in FIG. 5A, when the measured value of the first measuring unit 114 is the first reference value (34.2), the first phosphoric acid solution is in a non-buoyant state. Here, the phosphoric acid solution of the first storage unit 110 is not suddenly boiled, whereas the phosphoric acid solution of the substrate processing unit 210 is suddenly boiled. The phosphoric acid solution of the first storage unit 110 corresponds to the state shown in FIG. 2D, and the phosphoric acid solution of the substrate processing unit 210 corresponds to the state shown in FIG. 2B. In this case, the amount of water from the first water supply unit 116a is reduced so that the value indicating the specific gravity of the phosphoric acid solution in the first storage unit 110 is further increased.

As shown in FIG. 5B, when the value indicating the specific gravity of the phosphoric acid solution of the first storage unit 110 is further increased and the measured value of the first measurement unit 114 is 34.4, the first storage unit 110 Although the phosphoric acid solution of the substrate treatment unit 210 was not suddenly boiled, the degree of the phosphoric acid solution of the substrate processing unit 210 was reduced, but the phosphoric acid solution of the substrate processing unit 210 remained in the sudden boiling state. The phosphoric acid solution of the first storage unit 110 corresponds to the state shown in FIG. 2 (d), and the phosphoric acid solution of the substrate processing unit 210 corresponds to the state shown in FIG. 2 (c). In this case, the amount of water from the first water supply unit 116a is reduced so that the value indicating the specific gravity of the phosphoric acid solution in the first storage unit 110 is further increased.

As shown in FIG. 5C, when the measured value of the first measuring unit 114 is the first reference value (34.5), the first phosphoric acid solution of the first storage unit 110 is in a non-buoyant state and is in a substrate. The phosphoric acid solution of the processing unit 210 is in a non-buoyant state. The phosphoric acid solution of the first storage unit 110 corresponds to the state shown in FIG. 2D, and the phosphoric acid solution of the substrate processing unit 210 corresponds to the state shown in FIG. 2D. As described above, the first phosphoric acid solution of the first storage unit 110 is preferably prepared so that the phosphoric acid solution of the substrate processing unit 210 is in a non-buoyant state.

However, the higher the value indicating the specific gravity of the first phosphoric acid solution in the first storage unit 110, the lower the etching rate of the substrate W. Therefore, the value indicating the specific gravity of the first phosphoric acid solution in the first storage section 110 is preferably relatively low within the range in which the phosphoric acid solution in the substrate processing section 210 does not suddenly boil.

In the above description with reference to FIGS. 5 (a) to 5 (c), the state of the phosphoric acid solution immediately before passing through the nozzle 216 as the phosphoric acid solution of the substrate processing unit 210 was observed, but this embodiment has this. Not limited to. The state of the phosphoric acid solution in the pipe 213 may be observed as the phosphoric acid solution of the substrate processing unit 210.

Hereinafter, the flow of the treatment liquid preparation device 100 of the present embodiment will be described with reference to FIGS. 1 to 6. FIG. 6 is a flow chart for explaining the flow of the treatment liquid preparation device 100.

In step S102, the phosphoric acid solution in the first storage unit 110 is set to be in a boundary state between the suddenly boiled state and the non-struck state. Further, the phosphoric acid solution in the second storage unit 120 is set to be in a boundary state between the suddenly boiled state and the non-struck state.

For example, as shown in FIG. 4A, the phosphoric acid solution of the first storage unit 110 and the phosphoric acid solution of the second storage unit 120 are in a bumpy state at the boundary between the bumpy state and the non-burst state. After controlling the amount of water from the first water supply unit 116a and the second water supply unit 126a, the amount of water from the first water supply unit 116a and the second water supply unit 126a is reduced to reduce the first storage. As shown in FIG. 4B, even if the phosphoric acid solution of the portion 110 and the phosphoric acid solution of the second storage portion 120 are controlled to be in the non-burst state at the boundary between the sudden boiling state and the non-burst state. Good. Alternatively, as shown in FIG. 4B, the phosphoric acid solution of the first storage unit 110 and the phosphoric acid solution of the second storage unit 120 are in the non-burst state at the boundary between the sudden boiling state and the non-burst state. After controlling the amount of water from the first water supply unit 116a and the second water supply unit 126a, the amount of water from the first water supply unit 116a and the second water supply unit 126a is increased in FIG. As shown in (a), it may be controlled so that the bumping state is within the boundary between the bumping state and the non-burst state.

In step S104, when the phosphoric acid solution of the first storage unit 110 is in the boundary state between the suddenly boiled state and the non-bulging state, the first measuring unit 114 sets a value indicating the specific gravity of the phosphoric acid solution in the boundary state as the first reference value. measure. Similarly, when the phosphoric acid solution of the second storage unit 120 is in the boundary state between the bumped state and the non-buried state, the second measuring unit 124 measures the value indicating the specific gravity of the phosphoric acid solution in the boundary state as the second reference value. To do.

In step S106, the storage unit 106 stores the specific gravity measured by the first measurement unit 114. Further, the storage unit 106 stores the specific gravity measured by the second measurement unit 124.

In step S108, the first storage unit 110 is prepared so that the value indicating the specific gravity of the phosphoric acid solution in the first storage unit 110 deviates from the first reference value by a predetermined value. Typically, the first reservoir 110 prepares the first phosphoric acid solution so that the value indicating the specific gravity of the phosphoric acid solution of the first reservoir 110 increases from the reference value.

When the difference between the measured value after preparation and the reference value is small, the amount of water additionally supplied is small, so that the phosphoric acid solution can maintain a high temperature. However, since the phosphoric acid solution is prepared so that the measured value of specific gravity increases by a predetermined value from the reference value, in principle, the phosphoric acid solution does not cause bumping, but the possibility of bumping due to unintended factors is further reduced. Therefore, it is preferable that the difference is large to some extent.

Further, the second storage unit 120 is prepared so that the value indicating the specific gravity of the phosphoric acid solution deviates from the second reference value by a predetermined value. Typically, the second reservoir 120 prepares the phosphoric acid solution so that the value indicating the specific gravity of the phosphoric acid solution of the second reservoir 120 increases from the reference value.

As described above, according to the present embodiment, the specific gravity of the phosphoric acid solution of the first storage unit 110 can be made to be the same as the specific gravity of the phosphoric acid solution of the second storage unit 120, and the phosphoric acid solution of the first storage unit 110 is the second. It can be calibrated in the same manner as the phosphoric acid solution in the reservoir 120. Therefore, even if the phosphoric acid solution of the second storage unit 120 is mixed with the phosphoric acid solution of the first storage unit 110, the processing characteristics of the phosphoric acid solution of the first storage unit 110 do not change, and the substrate processing unit 210 is continuous. The substrate W can be processed stably.

In the treatment liquid preparation device 100 shown in FIG. 1, the states of the phosphoric acid liquid in the first storage unit 110 and the phosphoric acid liquid in the second storage unit 120 were visually confirmed, but the present embodiment is not limited to this. .. The state of at least one of the phosphoric acid solution of the first reservoir 110 and the phosphoric acid solution of the second reservoir 120 may be confirmed by an imaging device.

Next, the substrate processing apparatus 200 including the processing liquid preparation apparatus 100 of this embodiment will be described with reference to FIG. 7. FIG. 7 is a schematic view of the substrate processing apparatus 200. The substrate processing apparatus 200 shown in FIG. 7 is the substrate processing apparatus 200 described above with reference to FIG. 1, except that the processing liquid preparation apparatus 100 further includes a first imaging unit 118 and a second imaging unit 128. It has the same configuration as. Therefore, duplicate descriptions are omitted for the purpose of avoiding redundancy.

The substrate processing apparatus 200 includes a processing liquid preparation apparatus 100 and a substrate processing unit 210. The treatment liquid preparation device 100 includes a storage unit 102. The storage unit 102 includes a first storage unit 110 and a second storage unit 120. The first storage unit 110 further includes a first imaging unit 118 in addition to the first storage tank 112 and the first pipe 113. The first imaging unit 118 images at least a part of the first pipe 113. It is preferable that the first imaging unit 118 images the transparent portion of the first pipe 113.

The second storage unit 120 further includes a second imaging unit 128 in addition to the second storage tank 122 and the second pipe 123. The second imaging unit 128 images at least a part of the second pipe 123. It is preferable that the second imaging unit 128 images the transparent portion of the second pipe 123.

The control unit 104 controls the first imaging unit 118 and the second imaging unit 128. For example, the control unit 104 analyzes the imaging result of the first imaging unit 118 and the imaging result of the second imaging unit 128. In one example, the first phosphoric acid solution is in the state shown in FIG. 2C based on the imaging result of the first imaging unit 118 while changing the amount of water flowing from the first water supply unit 116a. It is specified that the first phosphoric acid solution is in the state shown in FIG. 2 (d). In this way, with the phosphoric acid solution of the first storage unit 110 set to the boundary state between the suddenly boiled state and the non-bulging state, the first measuring unit 114 measures a value indicating the specific gravity of the phosphoric acid solution of the first storage unit 110. However, the storage unit 106 may store the measurement result of the first measurement unit 114.

Further, while changing the amount of water flowing from the second water supply unit 126a, the second phosphoric acid solution is in the state shown in FIG. 2C based on the imaging result of the second imaging unit 128. 2 It is specified that the phosphoric acid solution is in the state shown in FIG. 2 (d). In this way, the second measuring unit 124 measures a value indicating the specific gravity of the phosphoric acid solution of the second storage unit 120 in a state where the phosphoric acid solution of the second storage unit 120 is prepared at the boundary state between the bumped state and the non-bulging state. However, the storage unit 106 may store the measurement result of the second measurement unit 124.

In the substrate processing apparatus 200 shown in FIGS. 1 and 7, the processing liquid preparation apparatus 100 supplied the processing liquid to one substrate processing unit 210 in order to avoid the drawings from becoming excessively complicated. The present embodiment is not limited to this. The treatment liquid preparation device 100 may supply the treatment liquid to a plurality of substrate processing units 210. In this case, the specific gravity and temperature of the phosphoric acid solution supplied from the treatment liquid preparation device 100 to the substrate processing unit 210 are the farthest from the treatment liquid preparation device 100 among the plurality of substrate processing units 210 (that is, the treatment liquid preparation device 100). It is preferable that the phosphoric acid solution is set so that no bubbles are generated in the processing portion (where the piping distance from the pipe is long).

In the substrate processing apparatus 200 shown in FIGS. 1 and 7, the processing liquid preparing apparatus 100 supplies the processing liquid to the single-wafer type substrate processing unit 210, but the present embodiment is not limited to this. The treatment liquid preparation device 100 may supply the treatment liquid to the batch type substrate processing unit.

Next, the substrate processing apparatus 200 including the processing liquid preparation apparatus 100 of the present embodiment will be described with reference to FIG. FIG. 8 is a schematic view of the substrate processing apparatus 200. The substrate processing apparatus 200 of FIG. 8 has the same configuration as the substrate processing apparatus 200 described above with reference to FIG. 1 except that the substrate processing unit 220 is a batch type, and avoids redundancy. Duplicate description is omitted for the purpose.

The substrate processing apparatus 200 includes a processing liquid preparation apparatus 100 and a substrate processing unit 220. The treatment liquid preparation device 100 prepares a treatment liquid for the substrate processing unit 220 and supplies the treatment liquid to the substrate processing unit 220. The substrate processing unit 220 processes the substrate W. The substrate processing unit 220 is a batch type.

The substrate processing unit 220 includes a processing tank 222 and a substrate loading unit 224. A phosphoric acid solution is supplied to the treatment tank 222 from the treatment liquid preparation device 100, and the treatment tank 222 stores the phosphoric acid liquid. The board loading unit 224 loads the board W. Typically, the substrate loading unit 224 loads a plurality of substrates W. The substrate loading unit 224 is immersed in the processing tank 222 with the substrate W loaded. As a result, the substrate W is treated with the treatment liquid.

As described above, the processing liquid preparation device 100 of the present embodiment supplies the processing liquid to the batch type substrate processing unit 220. The treatment liquid preparation device 100 is also suitably used for batch processing.

In the substrate processing apparatus 200 shown in FIG. 8, the processing liquid preparing apparatus 100 supplies the processing liquid to the processing tank 222 of the batch type substrate processing unit 220, but the present embodiment is not limited to this. The substrate may be processed in the processing liquid preparation device 100.

Hereinafter, the substrate processing apparatus 200 provided with the processing liquid preparation apparatus 100 of the present embodiment will be described with reference to FIG. FIG. 9 is a schematic view of the substrate processing apparatus 200 of this embodiment. The substrate processing apparatus 200 shown in FIG. 9 is used as a storage tank for the treatment liquid preparation apparatus 100 to process the substrate W, and the phosphoric acid solution of the second storage unit 120 is the phosphoric acid solution of the first storage unit 110. It has the same configuration as the substrate processing apparatus 200 described above with reference to FIG. 8 except that it is not mixed with, and duplicate description is omitted for the purpose of avoiding redundancy.

The substrate processing device 200 includes a processing liquid preparation device 100 and a substrate loading unit 230. The treatment liquid preparation device 100 includes a first storage unit 110 and a second storage unit 120. The first storage unit 110 produces the prepared phosphoric acid solution. In addition, the second reservoir 120 produces the prepared phosphoric acid solution. In the substrate processing apparatus 200 of the present embodiment, the phosphoric acid solution of the second storage unit 120 is not mixed with the phosphoric acid solution of the first storage unit 110.

The board loading unit 230 loads the board W. Typically, the substrate loading unit 230 loads a plurality of substrates W. The substrate loading unit 230 loads the substrate W and immerses it in the phosphoric acid solution of the processing liquid preparation device 100.

The board loading unit 230 includes a first loading unit 232 and a second loading unit 234. The first loading unit 232 is immersed in the first storage tank 112 of the first storage unit 110 while holding the substrate W. The second loading unit 234 is immersed in the second storage tank 122 of the second storage unit 120 while holding the substrate W.

Typically, the phosphoric acid solution of the first storage unit 110 is set to a predetermined temperature and specific gravity before the first loading unit 232 is immersed in the first storage tank 112 of the first storage unit 110. Similarly, before the second loading unit 234 is immersed in the second storage tank 122 of the second storage unit 120, the phosphoric acid solution of the second storage unit 120 is set to a predetermined temperature and specific gravity. Even in this case, the phosphoric acid solution of the second reservoir 120 is prepared based on the measured value of the boundary state in the same manner as the phosphoric acid solution of the first reservoir 110, so that the phosphoric acid solution of the second reservoir 120 is used for the substrate W. The treatment can be aligned with the treatment of the substrate W with the phosphoric acid solution of the first storage unit 110.

As described above, the treatment liquid preparation device 100 of the present embodiment may be used as a storage tank for processing the substrate W. The treatment liquid preparation device 100 is also suitably used as a storage tank for the batch processing device.

In the above description with reference to FIGS. 1 to 9, the substrate processing apparatus 200 includes a plurality of storage units, but the present embodiment is not limited to this. The substrate processing apparatus 200 may include only one storage unit.

Hereinafter, the substrate processing system 300 including the substrate processing apparatus 200 of the present embodiment will be described with reference to FIG. FIG. 10 is a schematic view of the substrate processing system 300. As shown in FIG. 10, the substrate processing system 300 includes a substrate processing apparatus 200A and a substrate processing apparatus 200B. The substrate processing apparatus 200A and the substrate processing apparatus 200B are the same as the substrate processing apparatus 200 described above with reference to FIG. 1 except that the treatment liquid preparation apparatus 100A and the treatment liquid preparation apparatus 100B each include one processing tank. It has a similar configuration, and duplicate descriptions are omitted to avoid redundancy.

Typically, the substrate processing apparatus 200A and the substrate processing apparatus 200B are arranged at a distance from each other. For example, the substrate processing apparatus 200A and the substrate processing apparatus 200B may be arranged at different locations in the same country. Alternatively, the substrate processing apparatus 200A and the substrate processing apparatus 200B may be located in different countries.

The substrate processing apparatus 200A includes a processing liquid preparation apparatus 100A and a substrate processing unit 210A. Here, the treatment liquid preparation device 100A has a first storage unit 110. The first phosphoric acid solution is prepared in the first reservoir 110.

The substrate processing apparatus 200B includes a processing liquid preparation apparatus 100B and a substrate processing unit 210B. Here, the treatment liquid preparation device 100A has a second storage unit 120. The second phosphoric acid solution is prepared in the second reservoir 120.

The substrate processing system 300 may further include an information processing device 310 capable of communicating with the substrate processing apparatus 200A and the substrate processing apparatus 200B. The information processing device 310 is, for example, a server. For example, the board processing device 200A can communicate information with the board processing device 200B via the information processing device 310.

For example, the substrate processing apparatus 200A measures the first reference value indicating the specific gravity of the phosphoric acid solution in the boundary state of the first phosphoric acid solution, and then the substrate processing apparatus 200A provides the information processing apparatus 310 with information indicating the first reference value. Send. The information processing device 310 receives and stores information indicating the first reference value from the substrate processing device 200A. Further, if necessary, the information processing apparatus 310 transmits the first reference value of the substrate processing apparatus 200A to the substrate processing apparatus 200B. After that, the substrate processing apparatus 200B also measures a second reference value indicating the specific gravity of the phosphoric acid solution in the boundary state of the second phosphoric acid solution. After that, the phosphoric acid solution of the substrate processing apparatus 200B is calibrated with reference to the reference value in the same manner as the phosphoric acid solution of the substrate processing apparatus 200A. Thereby, the second phosphoric acid solution of the substrate processing apparatus 200B can be calibrated in the same manner as the first phosphoric acid solution of the substrate processing apparatus 200A.

In the above description with reference to FIG. 10, the substrate processing system 300 includes the substrate processing devices 200A and 200B, but the substrate processing device 200A and the substrate processing device 200B do not have to exist at the same time. For example, the substrate processing apparatus 200A stores the first reference value of the boundary state of the phosphoric acid solution one month ago, and the substrate processing apparatus 200B stores the first reference value of the substrate processing apparatus 200A and the second reference value measured by itself. The value and the value may be used to calibrate the second phosphoric acid solution in the same manner as the first phosphoric acid solution of the substrate processing apparatus 200A one month after the measurement of the substrate processing apparatus 200A.

As described above, even if the substrate processing apparatus 200A and the substrate processing apparatus 200B do not exist at the same time, in the processing liquid preparation apparatus 100B of the substrate processing apparatus 200B, the phosphoric acid solution of the processing liquid preparation apparatus 100B is in a bumped state and a non-bulked state. By using the second reference value and the first reference value in the boundary state with, the second phosphoric acid solution of the treatment liquid preparation device 100B can be made to have the same conditions as the phosphoric acid solution of the treatment liquid preparation device 100A. it can.

Hereinafter, it is a flow chart for demonstrating the flow of the treatment liquid preparation apparatus 100A with reference to FIG. Although FIG. 11 shows the flow of the processing liquid preparation device 100A of FIG. 10, the processing liquid preparation device 100B included in the substrate processing device 200B may also operate in the same flow.

In step S202, the phosphoric acid solution of the first storage unit 110 is brought into a boundary state between the suddenly boiled state and the non-bulked state.

In step S204, when the phosphoric acid solution of the first storage unit 110 is in the boundary state between the sudden and non-bulging state, the first measuring unit 114 indicates the specific gravity of the boundary state of the phosphoric acid solution of the first storage unit 110. Measure the value (first reference value).

In step S206, the storage unit 106 stores the measured value (first reference value) of the first measuring unit 114.

As described above, according to the present embodiment, the storage unit 106 stores the measured value (first reference value) of the first measuring unit 114 in the boundary state of the phosphoric acid solution of the first storage unit 110. Therefore, the specific gravity of the phosphoric acid solution of the second storage unit 120 can be made to be the same as the specific gravity of the phosphoric acid solution of the first storage unit 110, and the phosphoric acid solution of the second storage unit 120 can be mixed with the phosphoric acid solution of the first storage unit 110. Can be calibrated.

Hereinafter, the substrate processing apparatus 200 provided with the processing liquid preparation apparatus 100 of the present embodiment will be described with reference to FIG. FIG. 12 is a schematic view of a substrate processing apparatus 200 provided with the processing liquid preparation apparatus 100 of the present embodiment. Note that the substrate processing apparatus 200 shown in FIG. 12 is provided except that the processing liquid preparation apparatus 100 further includes a third storage unit 130 and a new liquid supply unit 140 in addition to the first storage unit 110 and the second storage unit 120. Therefore, it has the same configuration as the substrate processing apparatus 200 described above with reference to FIG. 1, and duplicated description is omitted in order to avoid redundancy.

The substrate processing apparatus 200 includes a processing liquid preparation apparatus 100 and a substrate processing unit 210. The storage unit 102 of the treatment liquid preparation device 100 further includes a third storage unit 130 in addition to the first storage unit 110 and the second storage unit 120. Further, the treatment liquid preparation device 100 further includes a new liquid supply unit 140.

As described above, the second storage unit 120 prepares the second phosphoric acid solution, and the first storage unit 110 is replenished with the second phosphoric acid solution. Similarly, the third storage unit 130 prepares a third phosphoric acid solution, and the first storage unit 110 is replenished with the third phosphoric acid solution. However, the timing at which the third storage unit 130 replenishes the third phosphoric acid solution is different from the timing at which the second storage unit 120 replenishes the second phosphoric acid solution.

The new liquid supply unit 140 supplies the phosphoric acid solution to the second storage unit 120 and the third storage unit 130. While the second storage unit 120 does not replenish the first storage unit 110 with the second phosphoric acid solution, the new liquid supply unit 140 supplies the phosphoric acid solution to the second storage unit 120. Further, during the period in which the third storage unit 130 does not replenish the first storage unit 110 with the third phosphoric acid solution, the new liquid supply unit 140 supplies the phosphoric acid solution to the third storage unit 130. Here, in the new liquid supply unit 140, the phosphoric acid liquid is not prepared at a predetermined temperature and specific gravity.

The third storage unit 130 has a configuration corresponding to the first storage unit 110 and / or the second storage unit 120. The third storage unit 130 includes a third storage tank 132, a third pipe 133, a third measurement unit 134, a pump 135a, a heater 135b, a filter 135c, a valve 135d, a valve 135e, and a third water. It includes a supply unit 136a, a third phosphoric acid supply unit 136b, and a third gas supply unit 136c. Duplicate description of the third storage unit 130 is omitted in order to avoid redundant explanation.

The third pipe 133 of the third storage unit 130 connects the third storage tank 132 and the first storage tank 112. Further, the valve 135d controls the flow of the phosphoric acid solution from the third storage tank 132 to the first storage tank 112. When the valve 135d is opened, the phosphoric acid solution flows toward the first storage tank 112. When the valve 135d is closed, the phosphoric acid solution does not flow from the third storage unit 130 toward the first storage unit 110.

Further, when the valve 135e is opened, the phosphoric acid solution flows toward the third storage tank 132, so that the phosphoric acid solution can be circulated. When the valve 135e is closed, the circulation of the phosphoric acid solution is stopped.

For example, when the valve 135e is opened with the valve 135d closed, the phosphoric acid solution in the third storage unit 130 circulates through the circulation pipe 133a. At this time, the phosphoric acid solution in the third storage unit 130 can be set to a predetermined temperature by heating the phosphoric acid solution in which the heater 135b circulates.

Further, when the valve 135d and the valve 135e are open, the phosphoric acid solution in the third storage unit 130 circulates through the circulation pipe 133a and is supplied to the first storage unit 110 via the third storage unit 133. Therefore, the third storage unit 130 can replenish the phosphoric acid solution of the first storage unit 110.

Further, the third storage unit 130 has a return pipe 133b that connects the substrate processing unit 210 and the third storage tank 132. The processing liquid collected by the cup 136 in the substrate processing unit 210 flows through the return pipe 133b. The processing liquid passing through the return pipe 133b returns to the main body tank 132a of the third storage tank 132.

Further, the pipe 215 of the substrate processing unit 210 is provided with a valve 215b together with the valve 215a. The pipe 215 connects the chamber 212, the return pipe 123b of the second storage unit 120, and the return pipe 133b of the third storage unit 130. The valve 215b controls the flow of the phosphoric acid solution in the pipe 215. When the valve 215b is opened, the phosphoric acid solution flows from the chamber 212 toward the third storage portion 130. When the valve 215a is closed, the phosphoric acid solution does not flow toward the third reservoir 130.

The new liquid supply unit 140 includes a storage tank 142, a pipe 143, and a phosphoric acid supply unit 146. The phosphoric acid supply unit 146 supplies a phosphoric acid solution. Phosphoric acid is stored in the storage tank 142.

The pipe 143 connects the storage tank 142 with the second storage tank 122 and the third storage tank 132. The pipe 143 is provided with a valve 143a and a valve 143b. The valve 143a controls the flow of the phosphoric acid solution in the pipe 143. When the valve 143a is opened, the phosphoric acid solution flows from the storage tank 142 toward the second storage tank 122. When the valve 143a is closed, the phosphoric acid solution does not flow toward the second storage tank 122.

The valve 143b controls the flow of the phosphoric acid solution in the pipe 143. When the valve 143b is opened, the phosphoric acid solution flows from the storage tank 142 toward the third storage tank 132. When the valve 143b is closed, the phosphoric acid solution does not flow toward the third storage tank 132.

According to the substrate processing apparatus 200 of the present embodiment, the second storage unit 120 and the third storage unit 130 alternately supply the phosphoric acid solution to the first storage unit 110. Therefore, the first storage unit 110 can continuously supply the phosphoric acid solution to the substrate processing unit 210. Further, the second storage unit 120 and the third storage unit 130 alternately collect the processing liquid from the substrate processing unit 210. Therefore, the second storage unit 120 and the third storage unit 130 can effectively utilize the treatment liquid from the substrate processing unit 210 by preparing it at a predetermined temperature and specific gravity. Further, the second storage unit 120 and the third storage unit 130 can be efficiently adjusted to a predetermined temperature and specific gravity by alternately supplying the phosphoric acid liquid from the new liquid supply unit 140.

Hereinafter, changes in the flow of the phosphoric acid solution in the substrate processing apparatus 200 shown in FIG. 12 will be described with reference to FIG. 13 (a) to 13 (f) are schematic views for explaining changes in the flow of the phosphoric acid solution in the substrate processing apparatus 200 shown in FIG. In addition, in FIGS. 13A to 13F, in order to avoid the drawing from becoming excessively complicated, the first storage part 110, the second storage part 120, and the third storage part of the treatment liquid preparation apparatus 100 are taken. It should be noted that 130, the new liquid supply unit 140 and the substrate processing unit 210 are schematically shown, and only the piping through which the phosphoric acid liquid flows is shown.

Further, in FIGS. 13 (a) to 13 (f), changes in the amount of phosphoric acid solution in the first storage unit 110, the second storage unit 120, and the third storage unit 130 are indicated by arrows. An upward arrow indicates an increase in the amount of phosphate solution, and a downward arrow indicates a decrease in the amount of phosphate solution.

As shown in FIG. 13A, the first storage unit 110 starts supplying the phosphoric acid solution to the substrate processing unit 210. The first storage unit 110 supplies the phosphoric acid solution to the substrate processing unit 210 and circulates the phosphoric acid solution, so that the temperature of the phosphoric acid solution in the first storage unit 110 is maintained constant.

The temperature of the phosphoric acid solution in the second storage section 120 is maintained constant by circulating the phosphoric acid solution in the second storage section 120.

By circulating the phosphoric acid solution in the third storage unit 130, the temperature of the phosphoric acid solution in the third storage unit 130 is maintained constant. In addition, the third storage unit 130 collects the processing liquid used in the substrate processing unit 210. The processing liquid used in the substrate processing unit 210 reaches the third storage unit 130 through the pipe. The treatment liquid is circulated in the third storage unit 130 and maintained at a predetermined temperature.

The phosphoric acid solutions of the first storage unit 110, the second storage unit 120, and the third storage unit 130 are set to the same temperature. The phosphoric acid solution of the first storage unit 110, the second storage unit 120, and the third storage unit 130 is a boundary made before the first storage unit 110 starts supplying the phosphoric acid solution to the substrate processing unit 210. It is prepared based on the reference value of the state. As described above, the measurement results of the first measurement unit 114 of the first storage unit 110, the second measurement unit 124 of the second storage unit 120, and the third measurement unit 134 of the third storage unit 130 may be different. From FIGS. 13 (a) to 13 (f), the phosphoric acid solution of the first storage unit 110, the second storage unit 120, and the third storage unit 130 is the phosphoric acid liquid of the first storage unit 110 to the substrate processing unit 210. It is prepared based on the measurement result of the boundary state performed before starting to supply.

As shown in FIG. 13B, the first storage unit 110 continues to supply the phosphoric acid solution to the substrate processing unit 210. The first storage unit 110 supplies the phosphoric acid solution to the substrate processing unit 210 and circulates the phosphoric acid solution, so that the temperature of the phosphoric acid solution in the first storage unit 110 is maintained constant.

The second storage unit 120 supplies the phosphoric acid solution to the first storage unit 110. Further, the second storage unit 120 supplies the phosphoric acid solution to the first storage unit 110 and circulates the phosphoric acid solution, so that the temperature of the phosphoric acid solution in the second storage unit 120 is maintained constant.

The third storage unit 130 continues to collect the processing liquid used in the substrate processing unit 210. Further, the temperature of the phosphoric acid solution in the third storage unit 130 is maintained constant by circulating the phosphoric acid solution in the third storage unit 130.

As shown in FIG. 13C, the first storage unit 110 continues to supply the phosphoric acid solution to the substrate processing unit 210. The first storage unit 110 supplies the phosphoric acid solution to the substrate processing unit 210 and circulates the phosphoric acid solution, so that the temperature of the phosphoric acid solution in the first storage unit 110 is maintained constant.

The temperature of the phosphoric acid solution in the second storage section 120 is maintained constant by circulating the phosphoric acid solution in the second storage section 120. In addition, the second storage unit 120 collects the processing liquid used in the substrate processing unit 210. The processing liquid used in the substrate processing unit 210 reaches the second storage unit 120 through the pipe. The treatment liquid is circulated in the second storage unit 120 and maintained at a predetermined temperature.

By circulating the phosphoric acid solution in the third storage unit 130, the temperature of the phosphoric acid solution in the third storage unit 130 is maintained constant. Further, a new phosphoric acid liquid is supplied to the third storage unit 130 from the new liquid supply unit 140.

As shown in FIG. 13D, the first storage unit 110 continues to supply the phosphoric acid solution to the substrate processing unit 210. The first storage unit 110 supplies the phosphoric acid solution to the substrate processing unit 210 and circulates the phosphoric acid solution, so that the temperature of the phosphoric acid solution in the first storage unit 110 is maintained constant.

The second storage unit 120 continues to collect the processing liquid used in the substrate processing unit 210. Further, the second storage unit 120 circulates the phosphoric acid solution, so that the temperature of the phosphoric acid solution in the second storage unit 120 is maintained constant.

The third storage unit 130 supplies the phosphoric acid solution to the first storage unit 110. Further, the third storage unit 130 supplies the phosphoric acid solution to the first storage unit 110 and circulates the phosphoric acid solution, so that the temperature of the phosphoric acid solution in the third storage unit 130 is maintained constant.

As shown in FIG. 13 (e), the first storage unit 110 continues to supply the phosphoric acid solution to the substrate processing unit 210. The first storage unit 110 supplies the phosphoric acid solution to the substrate processing unit 210 and circulates the phosphoric acid solution, so that the temperature of the phosphoric acid solution in the first storage unit 110 is maintained constant.

The temperature of the phosphoric acid solution in the second storage section 120 is maintained constant by circulating the phosphoric acid solution in the second storage section 120. Further, a new phosphoric acid liquid is supplied to the second storage unit 120 from the new liquid supply unit 140.

By circulating the phosphoric acid solution in the third storage unit 130, the temperature of the phosphoric acid solution in the third storage unit 130 is maintained constant. In addition, the third storage unit 130 collects the processing liquid used in the substrate processing unit 210. The processing liquid used in the substrate processing unit 210 reaches the third storage unit 130 through the pipe. The treatment liquid is circulated in the third storage unit 130 and maintained at a predetermined temperature.

As shown in FIG. 13 (f), the first storage unit 110 continues to supply the phosphoric acid solution to the substrate processing unit 210. The first storage unit 110 supplies the phosphoric acid solution to the substrate processing unit 210 and circulates the phosphoric acid solution, so that the temperature of the phosphoric acid solution in the first storage unit 110 is maintained constant.

The second storage unit 120 supplies the phosphoric acid solution to the first storage unit 110. Further, the second storage unit 120 supplies the phosphoric acid solution to the first storage unit 110 and circulates the phosphoric acid solution, so that the temperature of the phosphoric acid solution in the second storage unit 120 is maintained constant.

The third storage unit 130 continues to collect the processing liquid used in the substrate processing unit 210. Further, the temperature of the phosphoric acid solution in the third storage unit 130 is maintained constant by circulating the phosphoric acid solution in the third storage unit 130.

After that, by further switching the flow of the phosphoric acid solution as shown in FIGS. 13 (c) to 13 (f), the phosphoric acid solution having a predetermined specific gravity can be continuously supplied to the substrate processing unit 210. As described above, according to the present embodiment, the second storage unit 120 and the third storage unit 130 alternately collect the treatment liquid used in the substrate processing unit 210, and the phosphoric acid liquid is stored in the first storage unit 110. To supply.

The embodiments of the present invention have been described above with reference to the drawings. However, the present invention is not limited to the above-described embodiment, and can be implemented in various aspects without departing from the gist thereof. In addition, various inventions can be formed by appropriately combining the plurality of components disclosed in the above embodiments. For example, some components may be removed from all the components shown in the embodiments. In addition, components across different embodiments may be combined as appropriate. In order to make the drawings easier to understand, each component is schematically shown, and the thickness, length, number, spacing, etc. of each component shown are actual for the convenience of drawing creation. May be different. Further, the material, shape, dimensions, etc. of each component shown in the above-described embodiment are merely examples, and are not particularly limited, and various changes can be made without substantially deviating from the effects of the present invention. is there.

The present invention is suitably used for a treatment liquid preparation apparatus and a treatment liquid preparation method.

100 Processing liquid preparation device 102 Storage unit 104 Control unit 106 Storage unit 110 1st storage unit 120 2nd storage unit 200 Board processing device 210 Board processing unit W Substrate

Claims (22)

A storage unit that stores phosphoric acid solution,
A measuring unit that measures a value indicating the specific gravity of the phosphoric acid solution in the storage unit,
It is provided with a storage unit that stores the value measured by the measurement unit.
The storage unit is a reference indicating the specific gravity of the phosphoric acid solution measured by the measuring unit when it is in a boundary state between a sudden boiling state in which the phosphoric acid solution suddenly boils and a non-sudden state in which the phosphoric acid solution does not suddenly boil. A treatment liquid preparation device that stores values. The treatment liquid preparation apparatus according to claim 1, wherein the storage unit prepares the phosphoric acid solution so that the value indicating the specific gravity of the phosphoric acid solution becomes larger than the reference value. The processing liquid preparation apparatus according to claim 1 or 2, further comprising an imaging unit that images the phosphoric acid solution in the storage unit. The storage unit includes a first storage unit for storing the first phosphoric acid solution and a second storage unit for storing the second phosphoric acid solution.
The storage unit has a specific gravity of the first phosphoric acid solution measured by the first measuring unit when it is in a boundary state between a sudden boiling state in which the first phosphoric acid solution suddenly boils and a non-sudden state in which the first phosphoric acid solution does not suddenly boil. Memorize the first reference value indicating
The storage unit has a specific gravity of the second phosphoric acid solution measured by the second measuring unit when it is in a boundary state between a sudden boiling state in which the second phosphoric acid solution suddenly boils and a non-sudden state in which the second phosphoric acid solution does not suddenly boil. The treatment liquid preparation apparatus according to any one of claims 1 to 3, which stores a second reference value indicating. The first phosphoric acid solution was prepared based on the first reference value.
The treatment liquid preparation apparatus according to claim 4, wherein the second phosphoric acid solution is prepared based on the second reference value. The treatment liquid preparation apparatus according to claim 5, wherein the second storage unit supplies the phosphoric acid solution prepared in the second storage unit to the first storage unit. The treatment liquid preparation device according to any one of claims 1 to 6.
A substrate processing apparatus including a substrate processing unit that processes a substrate using a phosphoric acid solution prepared in the processing liquid preparing apparatus. The substrate processing unit
A substrate holding portion that holds and rotates the substrate,
The substrate processing apparatus according to claim 7, further comprising a nozzle for supplying the phosphoric acid solution to the substrate held by the substrate holding portion. The substrate processing apparatus according to claim 8, wherein the value indicating the specific gravity of the phosphoric acid solution in the storage portion is set based on the state of the phosphoric acid solution supplied to the nozzle. The substrate processing unit
A board loading unit capable of loading a plurality of the boards and
The substrate processing apparatus according to claim 7, further comprising a processing tank for storing the phosphoric acid solution prepared in the processing liquid preparing apparatus. The substrate processing unit has a substrate loading unit capable of loading a plurality of the substrates.
The substrate processing apparatus according to claim 7, wherein the substrate loading portion is immersed in the phosphoric acid solution in the storage portion of the processing liquid preparing apparatus. A step of setting the phosphoric acid solution at a boundary state between a sudden boiling state in which the stored phosphoric acid solution suddenly boils and a non-sudden boiling state in which the phosphoric acid solution does not suddenly boil.
A step of measuring a reference value indicating the specific gravity of the phosphoric acid solution set in the boundary state, and
A method for preparing a treatment liquid, which comprises a step of storing the reference value. The treatment liquid preparation method according to claim 12, further comprising the step of preparing the phosphoric acid solution so that the value indicating the specific gravity of the phosphoric acid solution becomes larger than the reference value. The treatment liquid preparation method according to claim 12 or 13, wherein the step of setting the phosphoric acid solution in the boundary state includes a step of imaging the phosphoric acid solution. The steps of setting the phosphoric acid solution in the boundary state include a step of setting the first phosphoric acid solution in a boundary state with a non-burst state in which the first phosphoric acid solution does not suddenly boil, and a non-burst state in which the second phosphoric acid solution does not suddenly boil. Including the step of setting the second phosphoric acid solution in the boundary state of
The step of measuring the reference value is a step of measuring a first reference value indicating the specific gravity of the first phosphoric acid solution set in the boundary state and a step of measuring the specific gravity of the second phosphoric acid solution set in the boundary state. Including the process of measuring the second reference value shown
The treatment liquid preparation method according to any one of claims 12 to 14, wherein the step of storing the reference value includes a step of storing the first reference value and a step of storing the second reference value. The step of preparing the first phosphoric acid solution based on the first reference value, and
The treatment liquid preparation method according to claim 15, further comprising the step of preparing the second phosphoric acid solution based on the second reference value. The treatment liquid preparation method according to claim 16, further comprising the step of mixing the second phosphoric acid solution with the first phosphoric acid solution. A step of preparing a phosphoric acid solution according to the treatment solution preparation method according to claim 13 or 16.
A substrate processing method including a step of processing a substrate using a phosphoric acid solution prepared in the treatment liquid preparation method. The step of processing the substrate is
The process of holding and rotating the substrate and
The substrate processing method according to claim 18, further comprising a step of supplying the phosphoric acid solution to the rotating substrate. The substrate processing method according to claim 19, wherein in the step of supplying the phosphoric acid solution, a value indicating the specific gravity of the stored phosphoric acid solution is set based on the state of the phosphoric acid solution supplied to the nozzle. The substrate processing method according to claim 18, wherein the step of processing the substrate includes a step of supplying the phosphoric acid solution to the processing tank and immersing the substrate in the phosphoric acid solution of the processing tank. The substrate processing method according to claim 18, wherein the step of processing the substrate is a step of immersing the substrate in a storage tank in which the phosphoric acid solution is prepared.

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