JP2020173091A - Substrate processing apparatus - Google Patents

Abstract

To provide a substrate processing apparatus capable of successfully dehydrating a substrate.SOLUTION: A substrate processing apparatus according to an embodiment comprises: a first gas blowout part 30a provided above a substrate transfer path, for blowing out gas toward the substrate transfer path; a second gas blowout part 30b provided below the substrate transfer path, for blowing out gas toward the substrate transfer path; a transfer part 40 which has transfer shafts 42 each divided so as not to block the gas blown out by the second gas blowout part 30b and transfers a substrate W along the substrate transfer path; auxiliary rollers 50 which are provided correspondingly to positions where the transfer shafts 42 are divided and which are rotated by the substrate W transferred by the transfer part 40 to move on the substrate transfer path, for supporting the substrate W moving on the substrate transfer path; and an anti-scattering mechanism 60 for preventing scattering of a liquid adhering to the auxiliary roller 50.SELECTED DRAWING: Figure 3

Description

An embodiment of the present invention relates to a substrate processing apparatus.

In the manufacturing process of liquid crystal display devices and semiconductor devices, a substrate processing device is used in which a substrate such as glass for a liquid crystal panel or glass for a photomask is conveyed and a processing liquid is supplied to the surface of the substrate for processing. In this substrate processing apparatus, as a means for supplying the processing liquid to the substrate, a means for discharging the processing liquid in a film form from a nozzle having a slit opening and supplying the processing liquid to the entire surface of the substrate conveyed in a horizontal or inclined state. There is. Further, as a means for drying the substrate to be conveyed, air knives having slit openings are provided above and below the transfer path of the substrate, and dry air is sprayed from the upper and lower air knives onto the upper and lower surfaces (front and back surfaces) of the substrate to be conveyed. There is a means for drying the substrate by blowing off the treatment liquid (for example, pure water) adhering to the substrate.

In such a substrate processing apparatus, the substrate to be processed is conveyed by a transfer roller fixed to a rotating shaft, but the shaft at a position corresponding to the lower air knife is formed by the air blown from the lower air knife. It is divided so that it is not blocked by the transport rollers. Then, an auxiliary roller is installed so as to correspond to the portion where the shaft is divided. This auxiliary roller has a function of supporting the lower surface of the substrate to be conveyed, and prevents the transferred state of the substrate from becoming unstable even at a portion where the shaft is divided.

However, in a substrate processing apparatus having an auxiliary roller, the substrate may not be sufficiently dried, which may adversely affect the subsequent process. For example, when a film is formed on a substrate in a subsequent process, the droplets remain on the substrate after drying, so that the film is not sufficiently formed and the film is easily peeled off, or the droplets are liquid. Processing defects such as remaining as stains may occur.

Japanese Patent No. 3880386

An object to be solved by the present invention is to provide a substrate processing apparatus capable of satisfactorily drying a substrate.

The substrate processing apparatus according to the embodiment of the present invention is provided above the substrate transport path and is provided with a first gas blowing portion that blows gas toward the substrate transport path and below the substrate transport path. It has a second gas blowing section that blows gas toward the substrate transport path and a transport shaft that is divided so as not to interfere with the gas blown out by the second gas blowing section, and is along the substrate transport path. The transfer unit that conveys the substrate and the transfer shaft are provided corresponding to the divided positions, do not have a drive source, and are rotated by the substrate that is conveyed by the transfer unit and moves in the substrate transfer path. An auxiliary roller that supports the substrate that moves on the substrate transport path, and a liquid scattering prevention mechanism that prevents the liquid adhering to the auxiliary roller from scattering.

According to the embodiment of the present invention, the substrate can be dried well.

It is a figure which shows the schematic structure of the substrate processing apparatus which concerns on one Embodiment. It is a 2-2 line sectional view of the substrate processing apparatus shown in FIG. It is a figure for demonstrating the liquid splash prevention by the liquid splash prevention mechanism which concerns on one Embodiment. It is a figure for demonstrating the liquid splash when there is no liquid splash prevention mechanism which concerns on one Embodiment. It is a figure which shows the modification 1 of the liquid splash prevention mechanism which concerns on one Embodiment. It is a figure which shows the modification 2 of the liquid splash prevention mechanism which concerns on one Embodiment.

An embodiment of the present invention will be described with reference to the drawings.

(Basic configuration)
As shown in FIGS. 1 and 2, the substrate processing apparatus 10 according to the embodiment includes a processing chamber 20, a plurality of gas blowing portions 30a and 30b, a conveying portion 40, a plurality of auxiliary rollers 50, and a plurality of the substrate processing apparatus 10. The liquid splash prevention mechanism 60 (see FIG. 2) is provided. The substrate W in a wet state, which has been treated with a liquid in the previous step, is carried into the substrate processing apparatus 10. Then, the substrate processing device 10 functions as a drying processing device that dries the carried-in substrate W and carries it out.

The processing chamber 20 is a room for drying the substrate W, and as shown in FIG. 2, is a housing including a transport path (board transport path) A1 to which the substrate W moves. A carry-in inlet 21 and a carry-out outlet 22 are formed in the processing chamber 20. The transport path A1 extends horizontally from the carry-in inlet 21 to the carry-out outlet 22, and is located substantially at the center of the processing chamber 20 in the vertical direction.

Here, the front and back surfaces (upper and lower surfaces in FIG. 2) of the substrate W are wetted with a liquid such as pure water in the process before the substrate W is carried into the processing chamber 20, and the front and back surfaces of the substrate W are covered. Liquid is attached. As the substrate W, for example, a rectangular glass substrate is used. Further, a downflow (vertical laminar flow) is generated in the processing chamber 20, and a discharge port (not shown) for discharging the liquid removed from the substrate W is formed on the bottom surface of the processing chamber 20. ..

As shown in FIG. 2, each of the gas blowing portions 30a and 30b is provided above and below the transport path A1 so as to sandwich the transport path A1. The gas blowing portion 30a located above the transport path A1 functions as a first gas blowing section that blows gas (for example, air or nitrogen gas) from above with respect to the transport path A1. The gas blowing portion 30b located below the transport path A1 functions as a second gas blowing section that blows gas (for example, air or nitrogen gas) from below with respect to the transport path A1. The first gas blowing portion 30a and the second gas blowing portion 30b blow gas at a high pressure toward the substrate W passing through the transport path A1 to blow off the liquid adhering to the substrate W on both sides of the substrate W. To dry.

The first gas outlet portion 30a has a slit-shaped outlet (long outlet) 31a that is longer than the width of the substrate W (the length in the direction orthogonal to the transport direction A2 in the substrate W). The first gas blowing portion 30a is provided above the transport path A1 so as to blow gas from the outlet 31a toward the upstream side in the transport direction A2 of the substrate W. More specifically, as shown in FIG. 1, the first gas blowing portion 30a crosses the transport path A1 and is at one end of the first gas blowing portion 30a (in FIG. 1, the upper end). ) Is tilted at an angle θ1 (for example, 45 degrees) in a plan view so that it is located upstream of the transport direction A2 with respect to the other end (lower end in FIG. 1). Further, as shown in FIG. 2, in the first gas blowing portion 30a, the end of the first gas blowing portion 30a on the transport path A1 side is on the upstream side of the transport direction A2 with respect to the opposite end. It is tilted at an angle θ2 (for example, within the range of 50 degrees or more and 70 degrees or less) so as to be positioned. The vertical separation distance (gap) between the outlet 31a of the first gas outlet 30a and the surface of the substrate W being conveyed is about several mm (for example, 3 mm).

Like the first gas outlet 30a, the second gas outlet 30b also has a slit-shaped outlet (long outlet) 31b longer than the width of the substrate W, and the substrate is formed from the outlet 31b. It is provided below the transport path A1 so as to blow out gas on the upstream side of the transport direction A2 of W. Further, the second gas blowing portion 30b is tilted at angles θ1 and θ2 like the first gas blowing portion 30a, and the gap is about the same as described above.

The transport unit 40 has a plurality of transport rollers 41 that form the transport path A1 of the substrate W. These transport rollers 41 are fixed to a plurality of shafts (convey shafts) 42. Each of the shafts 42 is formed longer than the width of the substrate W, is arranged in parallel along the transport direction of the substrate W, and is rotatably provided. These shafts 42 are configured to rotate in synchronization with each other by a common drive mechanism (not shown), and form a transport path A1 of the substrate W together with the transport rollers 41. Each transport roller 41 is fixed to each shaft 42 at predetermined intervals, and rotates together with the rotation of the shaft 42. The transport unit 40 supports the substrate W by each transport roller 41, and transports the supported substrate W by the rotation of each transport roller 41.

Here, among the above-mentioned shafts 42, the plurality of shafts 42 existing at positions intersecting the gas blowing portion 30a in the plan view shown in FIG. 1 are the second gas blowing portions 30b located below the transport path A1. Each is divided so as not to interfere with the gas blown out by. That is, as shown in FIG. 1, the shaft 42a does not exist above the second gas blowing portion 30b, that is, on the flow path of the gas blown from the second gas blowing portion 30b. And it is divided into a second shaft 42b. One end of the first shaft 42a is rotatably supported by the support member 44, and one end of the second shaft 42b is also rotatably supported by the support member 44. Each support member 44 is provided on the bottom surface of the processing chamber 20. In addition, in FIG. 2, the illustration of each support member 44 is omitted.

As described above, the shaft 42 is divided so as not to interfere with the gas blown out by the second gas blowing portion 30b located below the transport path A1, and between the first shaft 42a and the second shaft 42b. A space is formed in. As a result, the gas blown out by the second gas blowing portion 30b reaches the lower surface of the substrate W without being disturbed by the transport roller 41 and the shaft 42, so that the lower surface of the substrate W is surely dried. Can be made to.

Each auxiliary roller 50 is rotatably formed and is provided corresponding to a position where the shaft 42 is divided. That is, one auxiliary roller 50 is provided on the upstream side and one downstream side of the substrate W in the transport direction A2 with respect to the outlets 31a and 31b of the gas outlets 30a and 30b at the portion where the shaft 42 is divided. ing. The rotation shaft 51 of each auxiliary roller 50 is parallel to the shaft 42 of the transport roller 41, and the height of the upper end thereof is the height of the upper end of the transport roller 41 supported by the shaft 42 (see FIG. 2). It is provided to be the same. The diameter of each auxiliary roller 50 is smaller than the diameter of the transport roller 41. These auxiliary rollers 50 are rollers for supplementing the support of the substrate W by each of the transport rollers 41, and support the substrate W transported by the transport unit 40. Each auxiliary roller 50 is individually fixed to each rotating shaft 51, and the rotating shaft 51 is rotatably supported by a support member 52 as shown in FIG. These support members 52 are provided on the bottom surface of the processing chamber 20. In addition, in FIG. 2, the illustration of each support member 52 is omitted.

As described above, the auxiliary roller 50 is provided corresponding to the portion where the shaft 42 is divided. As a result, the substrate W is supported by the auxiliary roller 50 at the portion where the shaft 42 is divided, so that the swell of the substrate W is prevented even at the portion where the shaft 42 is divided, so that the substrate W can be stabilized. It can be transported and reliably dried.

Each auxiliary roller 50 is separated from the drive source of the transfer roller 41 and does not have a special drive source. Then, as described above, since the height of the upper end of the auxiliary roller 50 is provided to be the same as the height of the upper end of the transport roller 41, the height of the upper end of the auxiliary roller 50 comes into contact with the substrate W transported by the transport unit 40. It rotates as the substrate W progresses. Therefore, each auxiliary roller 50 stops after passing through the substrate W, but the auxiliary roller 50, which is directly hit by the gas blown out from the first gas blowing portion 30a, blows out the first gas even after passing through the substrate W. It may rotate (idle) due to the gas blown out from the portion 30a. This is because the auxiliary roller 50 is provided in the vicinity of the first gas blowing portion 30a as described above. Further, since the substrate W is dried, the amount of gas blown out from the first gas blowing portion 30a tends to increase, so that the auxiliary roller directly hits the gas blown out from the first gas blowing portion 30a. 50 is in a situation where it is easy to rotate due to the gas (air flow).

Here, the inventor has described that the auxiliary roller 50 idles due to the gas from the first gas blowing portion 30a, so that the liquid such as the treatment liquid adhering to the auxiliary roller 50 is rotated by the centrifugal force of the auxiliary roller 50. It has been found that by scattering and adhering to the dried substrate W, the substrate W may be insufficiently dried or the post-process may be adversely affected. In particular, in the positional relationship between the auxiliary roller 50 and the first gas blowing portion 30a, the gas blown from the first gas blowing portion 30a causes the auxiliary roller 50 to rotate in the direction opposite to the direction in which the substrate W is conveyed. It was found that the liquid adhering to the auxiliary roller 50 was likely to scatter when it was provided at the position. Moreover, it was also found that the auxiliary roller 50 from which the gas is blown from the first gas blowing portion 30a is much faster than the rotation speed when the auxiliary roller 50 is co-rotated by the transportation of the substrate W. Therefore, each auxiliary roller 50 is rotated at a higher speed than when it is in contact with the substrate W by the gas blown out from the first gas blowing portion 30a.

As shown in FIG. 3, the liquid splash prevention mechanism 60 is provided on the auxiliary roller 50 located on the upstream side of the transfer direction A2 of the substrate W with respect to the individual outlets 31a and 31b of the gas outlets 30a and 30b. Has been done. That is, the liquid scattering prevention mechanism 60 is provided for all the auxiliary rollers 50 located on the upstream side of the transfer direction A2 of the substrate W with respect to the individual outlets 31a and 31b of the gas outlets 30a and 30b, respectively. There is. Each liquid scattering prevention mechanism 60 has a removing member 61, respectively. The removing member 61 is provided so as not to interfere with the transport of the substrate W by the transport unit 40 and is provided so as to come into contact with the lower end of the auxiliary roller 50, and removes the liquid adhering to the auxiliary roller 50. As the removing member 61, for example, a brush, a cloth, a sponge, or the like can be used. The brush wipes off the liquid adhering to the auxiliary roller 50 to remove it, and the cloth or sponge wipes off the liquid adhering to the auxiliary roller 50 to remove it.

If particles are generated due to friction between the auxiliary roller 50 and the removing member 61 and the particles adhere to the substrate W, they may have an adverse effect in the subsequent process. In order to prevent this, it is most preferable to use a resin brush as the removing member 61. Further, when a cloth is used as the removing member 61, it is preferable to use a non-woven fabric.

(Substrate drying process)
Next, the substrate drying process (substrate drying step) performed by the substrate processing apparatus 10 described above will be described.

In the substrate drying process, each of the transport rollers 41 of the transport unit 40 rotates, and the substrate W on the transport rollers 41 is transported in the predetermined transport direction A2 and moves along the transport path A1. At the gas supply position in the transport path A1, a gas for drying is blown out in advance by the first gas blowing portion 30a located above the transport path A1 before the substrate W is transported, and further, the transport path A1 The gas for drying is blown out by the second gas blowing portion 30b located below the above. When the substrate W passes through the gas supply position in the state where the gas is blown to the gas supply position in the transport path A1 in this way, the liquid adhering to the upper and lower surfaces (front and back surfaces) of the substrate W is sprayed with the gas. Is blown off from the upper and lower surfaces of the substrate W, and the upper and lower surfaces of the substrate W are dried. At this time, the liquid adhering to the upper and lower surfaces of the substrate W moves from the upper right corner to the lower left corner (see FIG. 1) of the upper and lower surfaces of the substrate W by spraying gas, so that the upper and lower surfaces of the substrate W are moved. Will dry sequentially from the upper right corner to the lower left corner.

During this substrate drying process, the liquid removed from the upper and lower surfaces of the substrate W may adhere to the auxiliary roller 50. As shown in FIG. 3, after the substrate W passes through the gas supply position in the transport path A1, that is, between the individual gas outlets 31a and 31b of the gas outlets 30a and 30b, the auxiliary roller 50 to which the liquid adheres It is rotated by the gas blown out by the first gas blowing portion 30a. The liquid scattering prevention mechanism 60 removes the liquid adhering to the auxiliary roller 50 by the removing member 61 in accordance with the rotation of the auxiliary roller 50. This makes it possible to prevent the liquid adhering to the auxiliary roller 50 from scattering.

Here, as shown in FIG. 4, when the liquid scattering prevention mechanism 60 does not exist, when the auxiliary roller 50 to which the liquid adheres is rotated by the gas blown out by the first gas blowing portion 30a, the auxiliary roller 50 is rotated. The liquid adhering to the 50 will be scattered by the centrifugal force of the rotating auxiliary roller 50. The scattered liquid may adhere to the substrate W after drying, and the adhesion of this liquid causes problems such as film peeling when a film is formed on the substrate W in a subsequent process, for example. .. If the liquid adhering to the substrate W is naturally dried, poor drying such as liquid stains will occur. As described above, it is difficult to satisfactorily dry the substrate W without the liquid scattering prevention mechanism 60.

Depending on the installation position of the auxiliary roller 50 (for example, a position shifted to the upstream side of the transfer direction A2 of the substrate W from the installation position shown in FIGS. 3 and 4), the auxiliary roller 50 may be shown in FIGS. 3 and 4. It may rotate in the direction opposite to the indicated rotation direction (arrow direction). Even at this time, if the liquid scattering prevention mechanism 60 does not exist, the liquid adhering to the auxiliary roller 50 scatters. The scattered liquid may adhere to the first gas blowing portion 30a and contaminate the first gas blowing portion 30a. Further, the liquid adhering to the first gas blowing portion 30a may fall on the dried substrate W (the substrate W that has passed the gas supply position in the transport path A1). Further, the liquid scattered from the auxiliary roller 50 may jump over the first gas blowing portion 30a and adhere to the dried substrate W. As described above, it is difficult to satisfactorily dry the substrate W without the liquid scattering prevention mechanism 60.

As described above, according to the embodiment, it is assumed that the auxiliary roller 50 is rotated by the gas blown out from the first gas blowing portion 30a by providing the liquid scattering prevention mechanism 60 with respect to the auxiliary roller 50. However, the liquid adhering to the auxiliary roller 50 is prevented from scattering. As a result, the liquid scattered from the auxiliary roller 50 is suppressed from adhering to the dried substrate W, so that the substrate W can be dried satisfactorily.

Further, by providing the removing member 61 in the liquid scattering prevention mechanism 60, the liquid adhering to the auxiliary roller 50 is removed from the auxiliary roller 50 by the removing member 61. As a result, even if the auxiliary roller 50 is rotated by the gas blown out from the first gas blowing portion 30a, it is possible to reliably prevent the liquid adhering to the auxiliary roller 50 from scattering.

Note that preventing the liquid from scattering here is not limited to the fact that the liquid does not scatter from the auxiliary roller 50 at all, and even if the liquid adhering to the auxiliary roller 50 scatters, it adheres to the substrate W. This includes preventing the post-process from being adversely affected.

(Modification example 1 of the liquid splash prevention mechanism)
As shown in FIG. 5, the liquid scattering prevention mechanism 60 according to the first modification has a limiting portion 62. The limiting unit 62 limits the rotation of the auxiliary roller 50 by the gas blown from the first gas blowing unit 30a. The limiting portion 62 is provided on the rotating shaft 51 of the auxiliary roller 50. For example, when the first gas blowing portion 30a and the auxiliary roller 50 have the positional relationship shown in FIG. 3, the substrate in the auxiliary roller 50 Rotation in the direction of transporting W (direction of rotation by the substrate W in the auxiliary roller 50) is permitted, and rotation in the opposite direction (direction of rotation by the gas blown out from the first gas blowing portion 30a) is prohibited. As the limiting unit 62, for example, a one-way clutch mechanism (one-way clutch mechanism) or the like can be used.

According to this modification 1, by providing the limiting portion 62 with respect to the auxiliary roller 50, it is possible to prevent the auxiliary roller 50 from rotating due to the gas blown from the first gas blowing portion 30a. As a result, it is possible to reliably prevent the auxiliary roller 50 from rotating due to the gas blown out from the first gas blowing portion 30a and the liquid adhering to the auxiliary roller 50 from scattering.

Further, in the first embodiment described above, the removing member 61 is brought into direct contact with the auxiliary roller 50 in contact with the substrate W, but in this modification, the rotation shaft 51 which does not come into contact with the substrate W is restricted. 62 is allowed to act. As a result, particles are less likely to adhere to the substrate W via the auxiliary roller 50, and the processing can be performed while keeping the substrate W more clean.

(Modification example 2 of the liquid splash prevention mechanism)
As shown in FIG. 6, the liquid scattering prevention mechanism 60 according to the second modification has a speed reduction member 63. The speed reduction member 63 sets the rotation speed of the auxiliary roller 50 (rotation speed in the direction opposite to the direction of rotation by the substrate W in the auxiliary roller 50) due to the gas blown out from the first gas blowing portion 30a to the auxiliary roller 50. The rotation speed is lower than the rotation speed when the liquid adhering to is scattered by the rotation of the auxiliary roller 50. The speed reduction member 63 is provided so as not to interfere with the transfer of the substrate W by the transfer unit 40, for example, so as to come into contact with the rotating shaft 51 of the auxiliary roller 50. As the speed reduction member 63, for example, a frictional resistance member such as rubber can be used.

The auxiliary roller 50 comes into contact with the substrate W transported by the transport unit 40, and rotates as the substrate W advances. At this time, the speed reduction member 63 reduces the rotation speed when the auxiliary roller 50 rotates as the substrate W advances, but in this speed reduction member 63, the auxiliary roller 50 uses the transport unit 40 to reduce the rotation speed of the substrate W. It is formed so that it can rotate to the extent that it does not interfere with the transportation of the. Alternatively, the sensor is arranged in the transport path A1 of the substrate W, and when the substrate W passes over the auxiliary roller 50, the speed reduction member 63 comes into contact with the rotating shaft 51, and the substrate W passes over the auxiliary roller 50. At that time, the speed reduction member 63 may be configured to operate with respect to the rotation shaft 51 so that the speed reduction member 63 retracts so as not to come into contact with the rotation shaft 51.

According to this modification 2, by providing the speed reducing member 63 with respect to the auxiliary roller 50, the rotation speed of the auxiliary roller 50 due to the gas blown out from the first gas blowing portion 30a adheres to the auxiliary roller 50. The rotation speed is lower than the rotation speed when the liquid is scattered by the rotation of the auxiliary roller 50. As a result, even if the auxiliary roller 50 is rotated by the gas blown out from the first gas blowing portion 30a, it is possible to reliably prevent the liquid adhering to the auxiliary roller 50 from scattering.

Further, in this modification as well, as in the case of modification 1 described above, the speed reduction member 63 is brought into contact with the rotating shaft 51 which does not come into contact with the substrate W. As a result, as in the case of the first modification, the particles are less likely to adhere to the substrate W via the auxiliary roller 50, and the processing can be performed while keeping the substrate W more clean.

(Other embodiments)
In the above-described embodiment, it has been exemplified that the first gas blowing portion 30a is provided above the transport path A1 and the second gas blowing portion 30b is provided below the transport path A1, but the present invention is not limited to this. For example, when only the upper surface of the substrate W is dried, it can be provided only above the transport path A1.

Further, in the above-described embodiment, it is exemplified that the auxiliary rollers 50 are provided one by one on the upstream side and the downstream side of the transfer direction A2 of the substrate W with respect to the outlets 31a and 31b of the gas outlets 30a and 30b. However, the present invention is not limited to this, and for example, it is possible to provide the auxiliary roller 50 only on the upstream side of the substrate W in the transport direction A2.

Further, in the above-described embodiment, the transport roller 41 supported by the shaft 42 (convey shaft) is one of the constituent requirements as the transport unit 40, but the present invention is not limited to this, and for example, the transport roller 41 is a cylinder. It is also possible to use a single roller in the shape. In this case, the transport roller 41 itself functions as a transport shaft.

Further, in the above-described embodiment, the case where the auxiliary roller 50 idles mainly due to the gas from the first gas blowing portion 30a has been described (see FIGS. 3 and 4). However, even when the auxiliary roller 50 is arranged so as not to receive the gas from the first gas blowing portion 30a, the auxiliary roller 50 may continue to rotate by inertia after the substrate W passes over the auxiliary roller 50. .. This rotation speed may be higher as the substrate W is transported at a higher speed and as the length of the substrate W in the transport direction A2 is longer. Even in such a case, the present invention can be applied.

Further, in the above-described embodiment, it has been exemplified that the removing member 61, the limiting portion 62, the speed reducing member 63, and the like are used as the liquid scattering prevention mechanism 60, but the present invention is not limited to this, and for example, any one of them is used. It is possible to use two or three in combination, and it is also possible to use other mechanisms and members.

Although some embodiments of the present invention have been described above, these embodiments are presented as examples and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other embodiments, and various omissions, replacements, and changes can be made without departing from the gist of the invention. These embodiments and modifications thereof are included in the scope and gist of the invention, and are also included in the scope of the invention described in the claims and the equivalent scope thereof.

10 Substrate processing device 30a First gas blowing part 30b Second gas blowing part 40 Conveying part 41 Conveying roller 42 Shaft (conveying shaft)
50 Auxiliary roller 60 Liquid splash prevention mechanism 61 Removal member 62 Restriction part 63 Speed reduction member A1 Transport path W Substrate

Claims (4)

A first gas blowing portion provided above the substrate transport path and blowing gas toward the substrate transport path,
A second gas blowing portion provided below the substrate transport path and blowing gas toward the substrate transport path,
A transport unit having a transport shaft divided so as not to interfere with the gas blown out by the second gas blowout portion and transporting the substrate along the substrate transport path, and a transport unit.
The substrate which is provided corresponding to the divided position of the transfer shaft, has no drive source, is rotated by the substrate which is conveyed by the transfer unit and moves on the substrate transfer path, and moves on the substrate transfer path. With auxiliary rollers to support
A liquid scattering prevention mechanism that prevents the liquid adhering to the auxiliary roller from scattering,
A substrate processing apparatus comprising. The substrate processing apparatus according to claim 1, wherein the liquid scattering prevention mechanism includes a removing member for removing the liquid adhering to the auxiliary roller from the auxiliary roller. The substrate processing apparatus according to claim 2, wherein the removing member is any one of a brush, a cloth, and a sponge provided so as to come into contact with the auxiliary roller. The auxiliary roller is characterized in that it is provided at a position where the auxiliary roller is rotated in a direction opposite to the direction of rotation by the substrate by the gas blown out by the first gas blowing portion or the second gas blowing portion. The substrate processing apparatus according to any one of claims 1 to 3.

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