JP2020167260A - Substrate processing apparatus - Google Patents

Abstract

To provide a substrate processing apparatus capable of detecting a substrate without damaging the substrate.SOLUTION: A substrate processing apparatus 10 according to an embodiment includes a transport unit 30 that transports a substrate W along a transport path A1, a processing unit 40 that processes the substrate W transported by the transport unit 30 with a processing liquid, a nozzle 53a that discharges fluid from the lower surface side of the substrate W to be conveyed, a substrate detection unit 50 having a sensor 52 for detecting that the processing liquid from the nozzle 53a has reached a rocking unit 51, and a control unit 60 that detects the arrival of the substrate W on the basis of a detection signal output from the substrate detection unit 50.SELECTED DRAWING: Figure 1

Description

An embodiment of the present invention relates to a substrate processing apparatus.

In the manufacturing process of liquid crystal display devices and semiconductor devices, substrate processing that transports substrates such as liquid crystal panel glass and photomask glass and discharges a processing liquid (for example, a chemical solution) to the moving substrate to process the substrate. The device is used.

Such a substrate processing apparatus has a substrate detecting apparatus for detecting the presence or absence of a substrate in the process of transporting the substrate. The substrate detection device includes a contact type and a non-contact type. The contact-type substrate detection device includes, for example, a pendulum-type sensor (Patent Document 1). This is a type in which the pendulum swings when the conveyed substrate comes into contact with the pendulum, and the sensor senses this swing. The non-contact type substrate detection device is, for example, a type in which a sensor detects the presence or absence of a substrate by transmitting and receiving light.

By the way, in the contact type substrate detection device, since a part of the detection device comes into contact with the substrate, the substrate may be damaged such as cracks at the tip portion of the substrate. Further, in the non-contact type substrate detection device, light may be diffusely reflected due to the adhesion of the processing liquid used in the substrate processing device, resulting in erroneous detection.

Japanese Unexamined Patent Publication No. 2014-225711

The present invention is to provide a substrate processing apparatus capable of detecting a substrate without damaging the substrate.

The substrate processing apparatus according to the embodiment of the present invention is
A transport unit that transports the board along the transport path,
A processing unit that processes the substrate conveyed by the transfer unit with a processing liquid, and a processing unit.
A discharge unit that discharges a fluid from the lower surface side of the substrate conveyed by the transport unit, and a detection unit that detects the arrival of the fluid from the discharge unit at a position facing the discharge unit across the transport path. Substrate detector with
A control unit that detects the arrival of the board based on a detection signal output from the board detection unit,
It is characterized by having.

According to the embodiment of the present invention, the substrate can be detected without damaging the substrate.

It is a figure which shows the 1st Embodiment of the substrate processing apparatus of this invention. It is a figure which shows the structural example and the operation example of the substrate detection part provided in the substrate processing apparatus shown in FIG. It is a side view of the substrate detection part seen from the CR direction shown in FIG. 2A.

<First Embodiment>
The first embodiment of the present invention will be described with reference to FIGS. 1 to 3.

(Basic configuration)
As shown in FIG. 1, the substrate processing apparatus 10 according to the first embodiment includes a processing chamber 20, a transport unit 30, a processing unit 40, a substrate detection unit 50, and a control unit 60.

The processing chamber 20 is a processing tank for processing the substrate W, and is a housing in which a transport path A1 to which the substrate W moves is formed. A carry-in inlet 21 and a carry-out outlet 22 are formed in the processing chamber 20. The transport path A1 extends horizontally from the carry-in inlet 21 to the carry-out outlet 22, and is located substantially at the center of the processing chamber 20 in the vertical direction. As the substrate W to be processed, for example, a rectangular glass substrate is used.

The transport unit 30 has a plurality of rollers 31 and a plurality of (11 in FIG. 1) rotating shafts 32, and the rollers 31 and the rotating shafts 32 transfer the substrate W on the transport path A1 in the transport direction A2. Transport along. Each roller 31 is fixed to each of the rotating shafts 32 at predetermined intervals, and rotates together with the rotating shaft 32 rotating. Each of the rotation axes 32 is formed to be longer than the length (length in the width direction) in the direction orthogonal to the transport direction A2 in the substrate W, and is arranged in parallel along the transport direction A2 of the substrate W. It is rotatably provided. These rotating shafts 32 are configured to rotate in synchronization with each other by a common drive mechanism (not shown), and together with the rollers 31, form a transport path A1 for the substrate W. The transport unit 30 supports the substrate W by each roller 31, and transports the supported substrate W in a predetermined transport direction A2 by the rotation of each roller 31.

The processing unit 40 has a plurality of showers 41, and the processing liquid (for example, a developing solution) is supplied to the substrate W moving in the transport path A1 by the showers 41 to process the substrate W (for example, developing processing). To do. A plurality of showers 41 (7 in FIG. 1) are provided above and below the transport path A1 so as to sandwich the transport path A1. Of these showers 41, each shower 41a located above the transport path A1 discharges the treatment liquid from above with respect to the transport path A1. Further, each shower 41b located below the transport path A1 discharges the treatment liquid from below with respect to the transport path A1. Each of the showers 41a and 41b has a plurality of nozzles (not shown) arranged in a direction orthogonal to the transport direction A2 of the substrate W in a horizontal plane, and from each nozzle toward the substrate W moving in the transport path A1. The treatment liquid is discharged at high pressure to supply the treatment liquid to the substrate W.

Each shower 41a is connected to the tank 43 via a liquid supply pipe 42a, and each shower 41b is connected to the tank 43 via a liquid supply pipe 42b. These showers 41a and 41b discharge the processing liquid supplied from the tank 43 via the liquid supply pipes 42a and 42b by pumping (not shown). The treatment liquids discharged from the showers 41a and 41b are collected and stored in the tank 43 via the collection pipe 44 connected to the bottom of the treatment chamber 20. The treatment liquid collected in the tank 43 is again supplied to the showers 41a and 41b via the liquid supply pipes 42a and 42b by pumping.

The substrate detection unit 50 detects the substrate W moving on the transport path A1. In the present embodiment, the processing chamber 20 has two substrate detection units 50a and 50b. The substrate detection unit 50a is provided in the vicinity of the carry-in port 21 of the processing chamber 20. The substrate detection unit 50b is positioned near the carry-out port 22 of the processing chamber 20. Then, the end portion of the substrate W transported along the transport path A1 in the width direction orthogonal to the transport direction is detected.

Here, the substrate detection unit 50 (50a, 50b) will be described with reference to FIGS. 2 and 3. The substrate detection units 50a and 50b have the same configuration.

FIG. 2A shows a state in which the substrate detection unit 50 does not detect the substrate W, FIG. 2B shows a state in which the substrate detection unit 50 detects the substrate W, and FIG. 3 is a diagram. It is a side view seen from the CR direction of 2 (a).

The substrate detection unit 50 includes a swing unit 51, a sensor unit 52, and a fluid discharge unit 53.

The rocking portion 51 has a rotating shaft 1 (see FIG. 3) rotatably supported by a frame 20a or the like of the processing chamber 20, and a rocking plate 2 fixedly supported by the rotating shaft 1. The rocking plate 2 is, for example, a metal plate, and has a main body 2a supported by the rotating shaft 1 and a receiving plate 2b supported at one end of the main body 2a at an obtuse angle with respect to the main body 2a. The receiving plate 2b is, for example, a resin plate, and is a member having liquid resistance to the treatment liquid described above. A weight 2c is attached to the receiving plate 2b. The weight 2c imparts a clockwise rotational moment about the rotating shaft 1 to the rocking plate 2 itself in FIG. 2. Note that 2d and 2e are stoppers. The rocking plate 2 receives the clockwise rotational moment described above, but as shown in FIG. 2B, when the rocking plate 2 comes into contact with the stopper 2d, its rotation (swing) occurs. Be restricted. On the other hand, as shown in FIG. 2A, the liquid discharged from the fluid discharge unit 53, which will be described later, comes into contact with the receiving plate 2b, so that the rocking plate 2 is counterclockwise around the rotation shaft 1. However, when the stopper 2e comes into contact with the swing plate 2, its rotation (swing) is restricted.

The sensor unit 52 detects the presence or absence of swinging of the rocking plate 2. As shown in FIG. 3, a detection plate 2g containing a magnet 2f is fixedly supported at the other end of the rocking plate 2. The presence or absence of the swing of the detection plate 2g is detected by the magnetic sensor 52a fixed to the frame 20a. That is, the magnetic sensor 52a outputs an OFF signal to the control unit 60 in the state of FIG. 2A and an ON signal in the state of FIG. 2B.

The fluid discharge unit 53 has a nozzle 53a. The nozzle 53a and the receiving plate 2b of the rocking plate 2 are arranged so as to face each other with the transport path A1 interposed therebetween. In the present embodiment, the nozzle 53a is arranged below the transport path A1 of the substrate W and facing the lower surface of one end of the substrate W transported along the transport path A1 in the width direction. On the other hand, the receiving plate 2b described above is provided above the transport path A1 so as to face the nozzle 53a. As shown in FIGS. 2A and 2B, the fluid m is discharged from the nozzle 53a from below the transport path A1 toward the transport path A1, that is, upward in FIG. For example, the discharge of the fluid m from the nozzle 53a is continued not only during the processing of the substrate W by the substrate processing apparatus 10 but also during the processing standby. In the present embodiment, the nozzle 53a is connected to the liquid supply pipe 42b, and the fluid m discharged from the nozzle 53a is the same as the processing liquid (for example, developing liquid) used for processing the substrate. The discharge diameter of the nozzle 53a is, for example, 1-5 mm. When the fluid m discharged from the nozzle 53a comes into contact with the receiving plate 2b of the rocking plate 2, as shown in FIG. 2A, the rocking plate 2 is counterclockwise around the rotation shaft 1. Rotational moment is generated. Then, the hydraulic pressure of the liquid m discharged from the nozzle 53a is set so that the counterclockwise rotational moment is equal to or greater than the clockwise rotational moment generated in the rocking plate 2 itself having the weight 2c. This hydraulic pressure can be set based on the hydraulic pressure obtained by experiments or the like. As already described, the swing plate 2 that receives the counterclockwise rotation moment is restricted in its rotation when the stopper 2e comes into contact with the swing plate 2.

As described above, FIG. 2A shows a state in which the substrate detection unit 50 does not detect the substrate W, and FIG. 2B shows a state in which the substrate detection unit 50 detects the substrate W. There is. In FIG. 2, the transport direction of the substrate is the direction orthogonal to the paper surface.

In FIG. 2A, the fluid m discharged from the nozzle 53a reaches the receiving plate 2b without being blocked by the substrate W. As a result, the rocking plate 2 rotates counterclockwise around the rotating shaft 1, and the rotation stops when the rocking plate 2 comes into contact with the stopper 2e, and this state is maintained. At this time, since the magnetic sensor 52a does not detect the magnet 2f, it outputs an OFF signal to the control unit 60. On the other hand, in FIG. 2B, the fluid m discharged from the nozzle 53a does not reach the receiving plate 2b because it is blocked by the substrate W. As a result, the rocking plate 2 rotates clockwise around the rotating shaft 1, and the rotation stops when the rocking plate 2 comes into contact with the stopper 2d, and this state is maintained. At this time, the magnetic sensor 52a detects the magnet 2f and outputs an ON signal to the control unit 60.

The substrate detection units 50a and 50b are arranged so as to avoid the rotating shaft 32 constituting the transport unit 30.

Returning to FIG. 1, the control unit 60 includes a microcomputer that centrally controls each unit and a storage unit (neither of which is shown) that stores processing information, various programs, and the like. The control unit 60 controls the transport unit 30, the processing unit 40, and the substrate detection unit 50 based on various information and various programs.

(Board processing)
Next, the substrate processing (board processing step) performed by the above-mentioned substrate processing apparatus 10 will be described.

In the substrate processing, each roller 31 of the transport unit 30 rotates, and the substrate W on the rollers 31 is transported in a predetermined transport direction A2 and moves along the transport path A1. In the liquid supply range in the transport path A1, the treatment liquid is discharged from each shower 41a located above the transport path A1 in advance before the substrate W is transported, and further, each located below the transport path A1. The treatment liquid is discharged from the shower 41b. Further, the same treatment liquid as the treatment liquid supplied from the showers 41a and 41b is also discharged from the nozzle 53a. When the substrate W passes through the liquid supply range while the treatment liquid is discharged into the liquid supply range in the transport path A1, the treatment liquid is supplied to the upper and lower surfaces (front and back surfaces) of the substrate W, and the upper and lower surfaces of the substrate W are supplied. Is treated with the treatment liquid.

During this substrate processing, the substrate W moving on the transport path A1 is detected by the substrate detection unit 50a on the carry-in inlet 21 side, and the detection signal is input to the control unit 60. That is, when the substrate W into which the substrate W is carried in from the carry-in inlet 21 reaches above the nozzle 53a constituting the substrate detection unit 50a, the fluid m discharged from the nozzle 53a does not reach the receiving plate 2b, and FIG. The state changes from the state shown in (a) to the state shown in FIG. 2 (b). As a result, the ON signal is input to the control unit 60 from the magnetic sensor 52a. After that, the substrate W moves and is treated with the treatment liquid supplied by each of the showers 41a and 41b as described above. Then, when the substrate W reaches the substrate detection unit 50b on the carry-out port 22 side, the substrate W is detected in the same manner, and the detection signal is input to the control unit 60. After that, when the substrate W to be processed next moves along the transport path A1, it is detected by the substrate detection unit 50a on the carry-in inlet 21 side, and then by the board detection unit 50b on the carry-out port 22 side, as described above. Detected. These detection signals are also input to the control unit 60. The same applies to the substrate W to be processed thereafter.

The control unit 60 receives the detection signals from the substrate detection units 50a and 50b, and detects the presence or absence of the substrate W on the transport path A1 based on the detection signals.

Further, the control unit 60 determines whether or not the substrate W is stably conveyed depending on the presence or absence of the substrate W. For example, the control unit 60 grasps that the substrate W is present based on the detection signal of the substrate detection unit 50a on the carry-in entrance 21 side, and then grasps that the substrate W is not present based on the detection signal of the substrate detection unit 50a. The transfer speed of the substrate W is confirmed by determining whether or not the time is within a predetermined allowable range. Further, the control unit 60 takes time from grasping that there is no substrate W based on the detection signal of the substrate detection unit 50a to grasping that there is the next substrate W based on the detection signal of the substrate detection unit 50a. The transfer interval of the substrate W is confirmed by determining whether or not it is within a predetermined allowable range. Such confirmation is similarly executed based on the detection signal of the board detection unit 50b on the carry-out port 22 side. When the control unit 60 determines that these times are not within a predetermined allowable range, the control unit 60 determines that the transfer speed and transfer interval of the substrate W during transfer are not normal, and that a transfer abnormality has occurred. The transfer abnormality is notified by a display or the like, and the transfer of the substrate W is stopped. On the other hand, when it is determined that each of the above-mentioned times is within a predetermined allowable range, it is determined that the transportation is normal, and the transportation is continued. Each of the above-mentioned predetermined allowable ranges is preset in the storage unit of the control unit 60.

As described above, according to the first embodiment, the substrate detection unit 50 detects whether or not the fluid m discharged from the nozzle 53a has reached the receiving plate 2, and therefore the substrate detection unit 50. The arrival of the substrate W can be detected without the rocking plate 2 or the like constituting the 50 directly contacting the substrate W. Therefore, the arrival of the substrate W can be detected without damaging the substrate W.

Further, since the substrate detection unit 50 detects the arrival of the substrate W depending on whether or not the fluid m discharged from the nozzle 53a has reached the receiving plate 2b, for example, the substrate detection unit 50 may be used with a floodlight across a transport path. Compared with the case where the light receiver is arranged, erroneous detection caused by the treatment liquid adhering to the light receiver or the like can be suppressed, and the detection accuracy of the substrate can be improved.

Further, the fluid m discharged from the nozzle 53a of the substrate detection unit 50 is the same as the processing liquid used by the processing unit 40. As a result, even if the treatment liquid discharged from the showers 41a and 41b and the fluid m discharged from the nozzle 53a are collected in the same tank 43, the concentration of the treatment liquid changes or different treatment liquids are mixed. There is no such thing as a shower. As a result, the treatment liquid collected in the tank 43 can be used again for treatment in the treatment unit 40.

Further, it suffices to discharge the fluid m having a flow velocity and an amount sufficient to swing the rocking plate 2 from the nozzle 53a, and the fluid m discharged from the nozzle 53a does not have to hit the entire receiving plate 2b. It suffices to hit only a part of the receiving plate 2b. Therefore, the amount of fluid m used can be reduced.

Further, in a state where the fluid m from the nozzle 53a does not reach the receiving plate 2b as shown in FIG. 2B, the receiving plate 2b is in a state of being inclined toward the transport path A1 with respect to the connection portion with the main body 2a. Nozzle. Therefore, at least at the beginning when the substrate W passes through the substrate detection unit 50 and the fluid m discharged from the nozzle 53a reaches the receiving plate 2b, the fluid m is mainly connected to the main body 2a and the receiving plate 2b. It flows to the part side. Therefore, the fluid m that has reached the receiving plate 2b can be effectively used to generate a counterclockwise moment with respect to the rocking body 2.

By the way, in general, in a substrate processing apparatus, the central portion on the upper surface side of the substrate is often the surface used as the final product. That is, the lower surface (back surface) of the substrate, particularly the lower surface at the end portion in the width direction of the substrate, often does not require more precise processing than the central portion of the upper surface of the substrate. In the present embodiment, the fluid m discharged from the nozzle 53a abuts on the lower surface of the substrate W instead of the upper surface of the substrate W, so that the fluid m supplied from the nozzle 53a is supplied to the upper surface side of the substrate W. It is possible to prevent fluctuations in the supply amount of the processing fluid. From this, the processing on the upper surface side of the substrate W can be uniformly performed.

Further, it is preferable that the swinging portion 51 and the fluid discharging portion 53 constituting the substrate detection unit 50 are as close as possible to the transport path A1. For example, the nozzle 53a is provided directly below the transport path A1 (for example, at the same height as the roller 31), and the receiving plate 2b in the state shown in FIG. 2 (b) is directly above the transport path A1 (for example, the transport roller 31). It is provided at a position slightly higher than the thickness of the substrate W). As a result, the amount of the fluid m discharged from the nozzle 53a can be suppressed.

Suppressing the amount of the fluid m discharged from the nozzle 53a is also advantageous in the following points. In the substrate processing apparatus 10 exemplified in the above-described embodiment, usually, a tool for discharging the processing liquid, such as a shower 41, is often not provided in the vicinity of the carry-in inlet 21 and the carry-out outlet 22 of the processing chamber 20. This is to prevent the treatment liquid discharged from the shower 41 from entering the other treatment chamber adjacent to the treatment chamber 20. If the amount of the fluid m discharged from the nozzle 53a can be suppressed, it is possible to prevent the fluid m discharged from the nozzle 53a from entering another processing chamber.

<Other embodiments>
The following modifications may be made to the above-described embodiment.

The nozzle 53a is configured to be connected to the liquid supply pipe 42b, but the present invention is not limited to this, and a liquid supply pipe dedicated to the nozzle 53a may be provided.

Further, instead of specifically providing the nozzle 53a for the substrate detection unit 50, the nozzle included in the shower 41b used for processing the lower surface (back surface) of the substrate W may be used instead of the nozzle 53a.

Further, the fluid m discharged from the nozzle 53a does not necessarily have to be the same as the treatment liquid, and a liquid of a different type from the treatment liquid may be used.

Further, although the fluid m (for example, a developing solution) is discharged from the nozzle 53a constituting the fluid discharge unit 53, the present invention is not limited to this, and a gas may be discharged.

Further, the rotational moment is obtained by attaching the weight 2c to the rocking plate 2, but the present invention is not limited to this, and a torsion spring may be interposed between the rotating shaft 1 and the frame 20a. ..

Further, although it has been illustrated that a plurality of rollers 31 are provided on the rotating shaft 32 to form one transport roller, the present invention is not limited to this, and for example, one cylindrical shape is provided for one rotating shaft 32. It is also possible to use the transport roller of.

Further, the shower 41 is provided above and below the transport path A1, but the present invention is not limited to this. For example, when processing only the upper surface of the substrate W, it is possible to provide the shower 41 only above the transport path A1. Is.

Further, each board detection unit 50 is provided with a swing unit 51, and the sensor unit 52 is configured to detect the vibration of the rocking unit 51, but the present invention is not limited to this, and for example, the rocking unit Instead of 51, a rotating body that rotates with the fluid supplied from the fluid discharge unit 53 is provided, and the substrate W is detected by detecting the presence or absence of rotation of the rotating body or the difference in the rotation speed of the rotating body. You can do it.

Although some embodiments of the present invention have been described above, these embodiments are presented as examples and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other embodiments, and various omissions, replacements, and changes can be made without departing from the gist of the invention. These embodiments and modifications thereof are included in the scope and gist of the invention, and are also included in the scope of the invention described in the claims and the equivalent scope thereof.

1 Rotating shaft 2 Swing plate 2a Main body 2b Receiving plate 2d, 2e Stopper 2e Magnet 2f Detection plate 10 Substrate processing device 20 Processing chamber (processing unit)
30 Transport unit 40 Processing unit 41 (41a, 41b) Shower 43 Tank 44 Recovery pipe 50 (50a, 50b) Board detection unit 51 Swing unit 52 Sensor unit 52a Magnetic sensor 53 Fluid discharge unit 53a Nozzle 60 Control unit W Substrate m Fluid

The substrate processing apparatus according to the embodiment of the present invention is
A transport unit that transports the board along the transport path,
A processing unit that processes the substrate conveyed by the transfer unit with a processing liquid, and a processing unit.
A substrate detection unit that detects the substrate conveyed by the transfer unit ,
Have,
The substrate detection unit includes a discharge portion for discharging the fluid from the lower surface side of the substrate transported by the transport unit, at a position opposed to the discharge portion across the conveying path, the fluid from the discharge portion A detector that detects arrival and
It is characterized by having.

The substrate processing apparatus according to the embodiment of the present invention is
A transport unit that transports the board along the transport path,
A processing unit that processes the substrate conveyed by the transfer unit with a processing liquid, and a processing unit.
A substrate detection unit that detects the substrate conveyed by the transfer unit,
Have,
The substrate detection unit includes a discharge portion for discharging the fluid from the lower surface side of the substrate transported by the transport unit, at a position facing the front Symbol discharge portion across the conveying path, the fluid from the discharge portion A detector that detects the arrival of
It is characterized by having.

The fluid discharge unit 53 has a nozzle 53a. The nozzle 53a and the receiving plate 2b of the rocking plate 2 are arranged to face each other with the transport path A1 interposed therebetween. In the present embodiment, the nozzle 53a is arranged below the transport path A1 of the substrate W and facing the lower surface of one end of the substrate W transported along the transport path A1 in the width direction. On the other hand, the receiving plate 2b described above is provided above the transport path A1 so as to face the nozzle 53a. As shown in FIGS. 2A and 2B, the fluid m is discharged from the nozzle 53a from below the transport path A1 toward the transport path A1, that is, upward in FIG. For example, the discharge of the fluid m from the nozzle 53a is continued not only during the processing of the substrate W by the substrate processing apparatus 10 but also during the processing standby. In the present embodiment, the nozzle 53a is connected to the liquid supply pipe 42b, and the fluid m discharged from the nozzle 53a is the same as the processing liquid (for example, developing liquid) used for processing the substrate. The discharge diameter of the nozzle 53a is, for example, 1-5 mm. When the fluid m discharged from the nozzle 53a comes into contact with the receiving plate 2b of the rocking plate 2, as shown in FIG. 2A, the rocking plate 2 is counterclockwise around the rotation shaft 1. Rotational moment is generated. And this counterclockwise rotation moment, so that the above rotation moment in the clockwise direction generated in the wobble plate 2 itself having a weight 2c, the hydraulic pressure in the flow body m discharged from the nozzle 53a is set. This hydraulic pressure can be set based on the hydraulic pressure obtained by experiments or the like. As already described, the rotation of the rocking plate 2 that receives the counterclockwise rotation moment is restricted when the stopper 2e comes into contact with the rocking plate 2.

As described above, according to the first embodiment, the substrate detection unit 50, since the fluid m to be ejected from the nozzle 53a is detecting whether the host vehicle has reached the receiving plate 2 b, the substrate detection The arrival of the substrate W can be detected without the rocking plate 2 or the like constituting the portion 50 coming into direct contact with the substrate W. Therefore, the arrival of the substrate W can be detected without damaging the substrate W.

Further, in a state where the fluid m from the nozzle 53a does not reach the receiving plate 2b as shown in FIG. 2B, the receiving plate 2b is in a state of being inclined toward the transport path A1 with respect to the connection portion with the main body 2a. Nozzle. Therefore, at least at the beginning when the substrate W passes through the substrate detection unit 50 and the fluid m discharged from the nozzle 53a reaches the receiving plate 2b, the fluid m is mainly connected to the main body 2a and the receiving plate 2b. It flows to the part side. Therefore, the fluid m that reaches the receiving plate 2b can be effectively used to generate the counter-clockwise moments on the swing plate 2.

1 Rotating shaft 2 Swing plate 2a Main body 2b Receiving plate
2c Weight 2d, 2e Stopper 2e Magnet 2f Detection plate 10 Substrate processing device 20 Processing chamber 30 Conveyor unit 40 Processing unit 41 (41a, 41b) Shower 43 Tank 44 Recovery pipe 50 (50a, 50b) Substrate detection unit 51 Swinging unit 52 Sensor unit 52a Magnetic sensor 53 Fluid discharge unit 53a Nozzle 60 Control unit W board m Fluid

Claims (4)

A transport unit that transports the board along the transport path,
A processing unit that processes the substrate conveyed by the transfer unit with a processing liquid, and a processing unit.
A discharge unit that discharges a fluid from the lower surface side of the substrate conveyed by the transfer unit, and a detection unit that detects the arrival of the fluid from the discharge unit at a position facing the discharge unit across the transfer path. With the substrate detector
A control unit that detects the arrival of the board based on a detection signal output from the board detection unit,
A substrate processing apparatus characterized by having. The substrate processing apparatus according to claim 1, wherein the fluid is the same treatment liquid as the treatment liquid. A recovery tube for collecting the treatment liquid used in the treatment unit, and
A tank for storing the treatment liquid recovered by the recovery pipe and
With
The substrate processing apparatus according to claim 1 or 2, wherein the processing unit uses the processing liquid collected and stored in the tank for processing again. The detection unit has a swing unit and a sensor unit.
The swinging portion swings due to the fluid discharged from the discharging portion.
The substrate processing apparatus according to any one of claims 1 to 3, wherein the sensor unit detects the vibration of the rocking unit.

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