JP2020166159A - 光導波路素子、及び光導波路デバイス - Google Patents
光導波路素子、及び光導波路デバイス Download PDFInfo
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Abstract
Description
本発明の他の態様によると、前記光学基板は、前記光導波路を伝搬する光の、前記光学基板の厚さ方向の縦方向モードフィールド径の2倍以下の厚さを有する。
本発明の他の態様によると、前記凹部は、前記光導波路の延在方向に対し直交する方向に測った溝幅が、前記光導波路を伝搬する光の、前記光学基板の面方向に測った横方向モードフィールド径以上となるように形成されている。
本発明の他の態様によると、前記光学基板と前記支持基板とは、接着層を挟んで接合されており、前記接着層は、前記光導波路を伝搬する光の、前記光学基板の厚さ方向の縦方向モードフィールド径の1/50以下の厚さで形成されている。
本発明の他の態様によると、前記凹部は、前記光導波路を伝搬する光の、前記光学基板の厚さ方向の縦方向モードフィールド径の1/40以上の深さで形成されている。
本発明の他の態様によると、前記光学基板には、前記光導波路に沿って配された当該光導波路を伝搬する光波を制御する信号線路が設けられており、前記凹部は、前記光導波路の延在方向に対し直交する方向に測った溝幅が、前記信号線路を構成する電極間のギャップの少なくとも一部を含むよう構成され、前記物質は、前記光学基板よりも低い誘電率を有する。
本発明の他の態様によると、前記支持基板は、互いに異なる材料で構成された複数の層を含む多層基板である。
本発明の他の態様によると、前記支持基板は、厚さ方向に屈折率が分布するよう構成されている。
本発明の他の態様によると、前記物質は、空気、窒素、樹脂、SiOX、Al203、MgF2、CaF2の少なくとも一つを含む。
本発明の他の態様は、上記いずれかの光導波路素子と、当該光導波路素子を収容する筺体と、を有する光導波路デバイスである。
図1は、本発明の第1の実施形態に係る光導波路素子および光導波路デバイスの構成を示す図である。本実施形態では、光導波路素子はマッハツェンダ光導波路を用いて光変調を行う光変調素子102であり、光導波路デバイスは、当該光変調素子102を用いた光変調デバイス100である。
次に、本発明の第2の実施形態について説明する。図9、図10、図11は、本発明の第2の実施形態に係る光導波路素子である光変調素子802、およびこれを用いた光導波路デバイスである光変調デバイス800の構成を示す図である。
Claims (10)
- 光導波路が形成された光学基板と、
前記光学基板に接合された支持基板と、
を備える光導波路素子であって、
前記支持基板のうち、前記光学基板との接合面には、前記光学基板上の前記光導波路に沿って、当該光導波路の直下に凹部が形成され、
前記支持基板の前記接合面を含む部分の屈折率は前記光学基板の基板屈折率よりも大きく、
前記凹部には、前記基板屈折率より小さな屈折率を持つ物質が充填されている、
光導波路素子。 - 前記光学基板は、前記光導波路を伝搬する光の、前記光学基板の厚さ方向の縦方向モードフィールド径の2倍以下の厚さを有する、
請求項1に記載の光導波路素子。 - 前記凹部は、前記光導波路の延在方向に対し直交する方向に測った溝幅が、前記光導波路を伝搬する光の、前記光学基板の面方向に測った横方向モードフィールド径以上となるように形成されている、
請求項1または2に記載の光導波路素子。 - 前記光学基板と前記支持基板とは、接着層を挟んで接合されており、
前記接着層は、前記光導波路を伝搬する光の、前記光学基板の厚さ方向の縦方向モードフィールド径の1/50以下の厚さで形成されている、
請求項1ないし3のいずれか一項に記載の光導波路素子。 - 前記凹部は、前記光導波路を伝搬する光の、前記光学基板の厚さ方向の縦方向モードフィールド径の1/40以上の深さで形成されている、
請求項1ないし4のいずれか一項に記載の光導波路素子。 - 前記光学基板には、前記光導波路に沿って配された当該光導波路を伝搬する光波を制御する信号線路が設けられており、
前記凹部は、前記光導波路の延在方向に対し直交する方向に測った溝幅が、前記信号線路を構成する電極間のギャップの少なくとも一部を含むよう構成され、
前記物質は、前記光学基板よりも低い誘電率を有する、
請求項1ないし4のいずれか一項に記載の光導波路素子。 - 前記支持基板は、互いに異なる材料で構成された複数の層を含む多層基板である、
請求項1ないし6のいずれか一項に記載の光導波路素子。 - 前記支持基板は、厚さ方向に屈折率が分布するよう構成されている、
請求項1ないし6のいずれか一項に記載の光導波路素子。 - 前記物質は、空気、窒素、樹脂、SiOX、Al203、MgF2、CaF2の少なくとも一つを含む、
請求項1ないし8のいずれか一項に記載の光導波路素子。 - 請求項1ないし9のいずれか一項に記載の光導波路素子と、
当該光導波路素子を収容する筺体と、
を有する光導波路デバイス。
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CN201980094936.6A CN113646679A (zh) | 2019-03-29 | 2019-09-26 | 光波导元件以及光波导设备 |
US17/599,721 US20220163720A1 (en) | 2019-03-29 | 2019-09-26 | Optical waveguide element and optical waveguide device |
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JP2004341147A (ja) * | 2003-05-15 | 2004-12-02 | Ngk Insulators Ltd | 光導波路デバイスおよび進行波形光変調器 |
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JP2009258687A (ja) * | 2008-03-28 | 2009-11-05 | Ngk Insulators Ltd | 光変調器 |
JP2012027499A (ja) * | 2005-03-25 | 2012-02-09 | Sumitomo Osaka Cement Co Ltd | 光変調器 |
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US20020048433A1 (en) * | 2000-10-10 | 2002-04-25 | Chi Wu | Optical component having a protected ridge |
JP2008089778A (ja) * | 2006-09-29 | 2008-04-17 | Sumitomo Osaka Cement Co Ltd | 光デバイスおよび光デバイスの製造方法 |
JP2010230741A (ja) * | 2009-03-26 | 2010-10-14 | Ngk Insulators Ltd | 光変調器 |
US9709740B2 (en) * | 2012-06-04 | 2017-07-18 | Micron Technology, Inc. | Method and structure providing optical isolation of a waveguide on a silicon-on-insulator substrate |
JP6021118B2 (ja) * | 2014-03-27 | 2016-11-02 | インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Machines Corporation | 光デバイスおよびその製造方法 |
JP6477016B2 (ja) * | 2015-02-27 | 2019-03-06 | 住友大阪セメント株式会社 | 導波路型光素子 |
JP6432574B2 (ja) * | 2016-08-24 | 2018-12-05 | 住友大阪セメント株式会社 | 光変調器、及び光送信装置 |
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CN113646679A (zh) | 2021-11-12 |
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