JP2020146964A - Method for producing gravure plate making roll - Google Patents
Method for producing gravure plate making roll Download PDFInfo
- Publication number
- JP2020146964A JP2020146964A JP2019047837A JP2019047837A JP2020146964A JP 2020146964 A JP2020146964 A JP 2020146964A JP 2019047837 A JP2019047837 A JP 2019047837A JP 2019047837 A JP2019047837 A JP 2019047837A JP 2020146964 A JP2020146964 A JP 2020146964A
- Authority
- JP
- Japan
- Prior art keywords
- making roll
- resist
- resist layer
- gravure plate
- gravure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 238000000576 coating method Methods 0.000 claims abstract description 46
- 239000011248 coating agent Substances 0.000 claims abstract description 41
- 239000007788 liquid Substances 0.000 claims abstract description 22
- 239000000463 material Substances 0.000 claims abstract description 18
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000000608 laser ablation Methods 0.000 claims abstract description 10
- -1 alkylene glycol monoalkyl ether Chemical class 0.000 claims abstract description 9
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims abstract description 9
- 238000005530 etching Methods 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 7
- 239000010408 film Substances 0.000 description 19
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- 239000000243 solution Substances 0.000 description 13
- 239000002904 solvent Substances 0.000 description 13
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 10
- 239000002966 varnish Substances 0.000 description 10
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 7
- 239000000020 Nitrocellulose Substances 0.000 description 6
- 229920001220 nitrocellulos Polymers 0.000 description 6
- 239000006096 absorbing agent Substances 0.000 description 5
- 238000007865 diluting Methods 0.000 description 5
- 239000004645 polyester resin Substances 0.000 description 5
- 229920001225 polyester resin Polymers 0.000 description 5
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 239000006229 carbon black Substances 0.000 description 4
- 239000004359 castor oil Substances 0.000 description 4
- 235000019438 castor oil Nutrition 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000025 natural resin Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 150000003505 terpenes Chemical class 0.000 description 4
- 235000007586 terpenes Nutrition 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000004014 plasticizer Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000002679 ablation Methods 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000003925 fat Substances 0.000 description 2
- 235000019197 fats Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 235000019198 oils Nutrition 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 1
- KOVAQMSVARJMPH-UHFFFAOYSA-N 4-methoxybutan-1-ol Chemical compound COCCCCO KOVAQMSVARJMPH-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 241000557626 Corvus corax Species 0.000 description 1
- 241000408655 Dispar Species 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 235000019484 Rapeseed oil Nutrition 0.000 description 1
- 244000062793 Sorghum vulgare Species 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 235000015278 beef Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003240 coconut oil Substances 0.000 description 1
- 235000019864 coconut oil Nutrition 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 235000012343 cottonseed oil Nutrition 0.000 description 1
- 239000002385 cottonseed oil Substances 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 235000010985 glycerol esters of wood rosin Nutrition 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000000944 linseed oil Substances 0.000 description 1
- 235000021388 linseed oil Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 235000019713 millet Nutrition 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 239000003549 soybean oil Substances 0.000 description 1
- 235000012424 soybean oil Nutrition 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Abstract
Description
本発明は、グラビア製版ロールを、レーザアブレーション法でパターン形成のためのレジスト塗工液をより均一に塗工可能とするグラビア製版ロールの製造方法に関する。 The present invention relates to a method for producing a gravure plate-making roll, which enables the gravure plate-making roll to be coated with a resist coating liquid for pattern formation more uniformly by a laser ablation method.
グラビア製版ロールは、グラビア製版ロール版材（シリンダー）の表面に製版情報に応じた微小な凹部（セル）を形成したものである。当該セルにグラビアインキを充填して被印刷物に転写するグラビア印刷だけでなく、インキ以外の材料を当該セルに充填して被印刷物に転写する凹版印刷することも可能である。 The gravure plate-making roll is formed by forming minute recesses (cells) on the surface of the gravure plate-making roll plate material (cylinder) according to the plate-making information. Not only gravure printing in which the cell is filled with gravure ink and transferred to the printed matter, but also intaglio printing in which a material other than ink is filled in the cell and transferred to the printed matter is possible.
セルは、エッチング法または電子彫刻法で形成される。
エッチング法は、感光液であるレジスト塗工液と塗工してなるレジスト層をグラビア製版ロール版材の表面に、塗工し光で非画線パターンを形成し、アルカリ現像し、未露光部分である画線部のみをエッチングし、その後、残っているレジスト層を剥離する方法である。
近年、アルカリ現像する工程を省略すべく、レーザアブレーション法で、画像部を焼き飛ばして、非画線パターンを形成する方法が提案されている。（特許文献１）
高精細で微小な凹部（セル）を形成するには、レジスト層の膜厚を薄くし、且つ均一性を良くする必要がある。前記レジスト層は、円筒状のシリンダーにレジスト塗工液をスプレーコート法で塗布する方法が知られているが、前記高精細な回路パターや偽造防止用パターンを形成する用途には不十分だった。（特許文献２〜４）
The cells are formed by etching or electronic engraving.
In the etching method, a resist coating solution, which is a photosensitive liquid, and a resist layer coated on the surface of a gravure plate-making roll plate material are coated to form a non-image pattern with light, and alkali-developed to an unexposed portion. This is a method in which only the image area is etched and then the remaining resist layer is peeled off.
In recent years, in order to omit the step of alkaline development, a method of forming a non-image pattern by burning off an image portion by a laser ablation method has been proposed. (Patent Document 1)
In order to form high-definition and minute recesses (cells), it is necessary to reduce the film thickness of the resist layer and improve the uniformity. A method of applying a resist coating solution to a cylindrical cylinder by a spray coating method is known as the resist layer, but it is insufficient for the purpose of forming the high-definition circuit putter or anti-counterfeit pattern. .. (Patent Documents 2 to 4)
特許文献２には、当該レーザアブレーション法に適用できる感光性材料であるレジスト組成物として、レーザ光の光吸収材であるカーボンブラックと可燃性物質としてニトロセルロースを主体とした樹脂組成物が記載されている。しかし、開示された方法によるレジスト層の膜厚均一性は±１０％程度であった。近年、グラビア製版ロールを用いて、従来より精細なパターンの印刷物が要求され、いかに薄膜を均一に塗工できるかが課題となっている。
本発明は、薄膜で膜厚均一性の良いレーザアブレーション法によるレジスト層を形成し、エッチングとレジスト層剥離の工程を経て、微小で高精細な凹部（セル）を形成したグラビア製版ロールの製造方法を提供することを目的とする。
Patent Document 2 describes a resin composition mainly composed of carbon black, which is a light absorbing material for laser light, and nitrocellulose, which is a flammable substance, as a resist composition which is a photosensitive material applicable to the laser ablation method. ing. However, the film thickness uniformity of the resist layer by the disclosed method was about ± 10%. In recent years, there has been a demand for printed matter having a finer pattern than before using a gravure plate making roll, and how a thin film can be uniformly coated has become an issue.
The present invention is a method for producing a gravure plate-making roll in which a resist layer is formed of a thin film by a laser ablation method having good film thickness uniformity, and minute and high-definition recesses (cells) are formed through the steps of etching and resist layer peeling. The purpose is to provide.
本発明の上記目的は、下記構成により達成される。 The above object of the present invention is achieved by the following configuration.
（１）下記工程（ａ）〜工程（ｃ）を含むグラビア製版ロールの製造方法。
工程（ａ）：感光性材料と、アルキレングリコールモノアルキルエーテルとを含むレジスト塗工液を用意する工程。
工程（ｂ）：前記レジスト塗工液をリングコート法で円筒状グラビアシリンダーに塗工し、円筒状グラビアシリンダー上に、レジスト層を形成する工程。
工程（ｃ）：前記レジスト層が形成されたグラビアシリンダーにレーザアブレーション法でセルを形成する工程。
(1) A method for producing a gravure plate-making roll, which comprises the following steps (a) to (c).
Step (a): A step of preparing a resist coating solution containing a photosensitive material and an alkylene glycol monoalkyl ether.
Step (b): A step of applying the resist coating liquid to a cylindrical gravure cylinder by a ring coating method to form a resist layer on the cylindrical gravure cylinder.
Step (c): A step of forming a cell in a gravure cylinder on which the resist layer is formed by a laser ablation method.
（２）レジスト塗工液が、アルキレングリコールモノアルキルエーテルをレジスト塗工液全体の２０重量％〜６０重量％含有することを特徴とする上記グラビア製版ロールの製造方法。 (2) The method for producing a gravure plate-making roll, wherein the resist coating solution contains alkylene glycol monoalkyl ether in an amount of 20% by weight to 60% by weight of the entire resist coating solution.
本発明により、薄膜で膜厚均一性の良いレーザアブレーション法によるレジスト層を形成でき、微小で高精細な凹部（セル）を形成したグラビア製版ロールを提供できた。 INDUSTRIAL APPLICABILITY According to the present invention, it is possible to provide a gravure plate-making roll in which a resist layer is formed by a laser ablation method with a thin film and a good film thickness uniformity, and minute and high-definition recesses (cells) are formed.
グラビア製版ロールの製造に用いる、レジスト塗工液は、主に、感光性材料と溶剤とを含み、前記感光性材料は、光吸収剤と樹脂、添加剤、溶剤から構成される。 The resist coating liquid used for producing the gravure plate-making roll mainly contains a photosensitive material and a solvent, and the photosensitive material is composed of a light absorber, a resin, an additive, and a solvent.
本発明で用いられる光吸収剤は、レーザ光を吸収して、発熱をするものであれば、特に、限定されない。カーボンブラックが好ましく用いられる。カーボンブラック以外の黒鉛、カーボンナノチュープなどの光吸収剤を用いることができる。これらは、1種または2種以上を用いることができる。 The light absorber used in the present invention is not particularly limited as long as it absorbs laser light and generates heat. Carbon black is preferably used. A light absorber such as graphite or carbon nanotube other than carbon black can be used. These can be used alone or in combination of two or more.
樹脂としては、光吸収剤の分散性が良く、燃焼残渣が少なく、銅との密着性が良く、エッチング液への耐薬品性があれば良く、以下の材料を用いることができる。ニトロセルロース樹脂、多塩基酸と多価アルコールの縮合反応により得られるポリエステル樹脂、さらに、大豆油、アマニ油、綿実油、ナタネ油、キリ油、ヒマシ油、ヤシ油、牛脂などの油脂を反応させた樹脂、天然樹脂由来のテルペン系樹脂、も使用することができる。これらを混合して用いることもできる。 As the resin, the following materials can be used as long as they have good dispersibility of the light absorber, little combustion residue, good adhesion to copper, and chemical resistance to the etching solution. Nitrocellulose resin, polyester resin obtained by condensation reaction of polybasic acid and polyhydric alcohol, and fats and oils such as soybean oil, linseed oil, cottonseed oil, rapeseed oil, millet oil, castor oil, coconut oil, and beef fat were reacted. Resins and terpene resins derived from natural resins can also be used. These can also be mixed and used.
また、可塑剤などの添加剤、粘度や乾燥性、塗工性を調整するための溶剤を用いることができる。例えば、前記光吸収剤を樹脂で分散した後、必要に応じて別の樹脂や添加剤、溶剤を混合し、レジスト組成物を作成する。 Further, an additive such as a plasticizer and a solvent for adjusting the viscosity, drying property, and coatability can be used. For example, after dispersing the light absorber with a resin, another resin, an additive, and a solvent are mixed as needed to prepare a resist composition.
本発明で用いられる溶剤は、酢酸エチルなどのエステル類、トルエンなどの炭化水素類、イソプロピルアルコール、アルキレングリコールモノアルキルエーテルなどのアルコール、シクロヘキサノンなどのケトン類が用いられる。
本発明において、溶剤として、アルキレングリコールモノアルキルエーテルを選定し、リングコート法で前記レジスト塗工液を塗布することで、数μmの薄膜で膜厚均一性の良いレジスト塗膜を形成できることを見出した。アルキレングリコールモノアルキルエーテルとしては、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノプロピルエーテル、ブチレングリコールモノメチルエーテルなどが挙げられる。
アルキレングリコールモノアルキルエーテルは、前記レジスト塗工液中に２０重量％〜６０重量％を含有することが好ましく、２０重量％より少ないと膜厚均一性が低下、６０重量％より多いと塗工液の安定性が悪くなることがある。
As the solvent used in the present invention, esters such as ethyl acetate, hydrocarbons such as toluene, alcohols such as isopropyl alcohol and alkylene glycol monoalkyl ether, and ketones such as cyclohexanone are used.
In the present invention, it has been found that by selecting an alkylene glycol monoalkyl ether as a solvent and applying the resist coating liquid by a ring coating method, a resist coating film having a good film thickness uniformity can be formed with a thin film of several μm. It was. Examples of the alkylene glycol monoalkyl ether include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, butylene glycol monomethyl ether and the like.
The alkylene glycol monoalkyl ether preferably contains 20% by weight to 60% by weight in the resist coating liquid, and if it is less than 20% by weight, the film thickness uniformity is lowered, and if it is more than 60% by weight, the coating liquid is used. May become less stable.
リングコート法で使用する塗工装置としては、特に制約はなく、円筒状のシリンダーにレジスト塗工液が接触するような構造で、移動部分がシリンダーあるいは塗工液のどちらでも良く、移動速度を制御して膜厚を設定することができる。 The coating device used in the ring coating method is not particularly limited, and has a structure in which the resist coating liquid comes into contact with the cylindrical cylinder, and the moving part may be either the cylinder or the coating liquid, and the moving speed can be adjusted. The film thickness can be set by controlling it.
前記方法により、グラビア製版ロール版材の表面上に形成されたレジスト層は、公知のレーザ照射装置により、画線部をアブレーションすることができる。レーザアブレーションにより、グラビア製版ロール版材の表面の画線部のレジスト層は焼失し、非画線部のレジスト層は、そのまま残る。結果的に、グラビア製版ロール版材上に非画線部パターンが形成されることになる。
非画線部パターンが形成されたグラビア製版ロール版材は、公知のエッチング液によりエッチングされる。画線部は、エッチングされ凹部(セル)となり、非画線部は、レジスト層が存在するためエッチングされずに残る。
エッチング後に、非画線部に残留した、レジスト層を、公知のレジスト剥離液で剥離することで、グラビア製版ロールが製造される。なお、前記製版ロールの印刷耐性を維持させるために、セルを形成したグラビア製版ロールの表面にクロムメッキを施しても良い。
By the above method, the resist layer formed on the surface of the gravure plate-making roll plate material can ablate the image portion by a known laser irradiation device. By laser ablation, the resist layer in the image area on the surface of the gravure plate-making roll plate is burnt out, and the resist layer in the non-image area remains as it is. As a result, a non-image pattern is formed on the gravure plate-making roll plate material.
The gravure plate-making roll plate material on which the non-image pattern is formed is etched with a known etching solution. The image area is etched to become a recess (cell), and the non-image area remains unetched due to the presence of the resist layer.
After etching, the resist layer remaining in the non-image area is peeled off with a known resist stripping solution to produce a gravure plate making roll. In addition, in order to maintain the print resistance of the plate-making roll, the surface of the gravure plate-making roll on which the cells are formed may be chrome-plated.
以下に、実施例および比較例により、一層具体的に説明するが、本発明はこれらの実施例によりなんら限定されるものではない。「部」「％」とあるものは特に断りのない限り、すべて「重量部」「重量％」を意味するものとする。 Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples, but the present invention is not limited to these Examples. Unless otherwise specified, the terms "part" and "%" shall mean "parts by weight" and "% by weight".
＜ニトロセルロースワニスａの調整例＞
ニトロセルロース（稲畑産業社製 ＪＩＳ規格Ｈ１／４同等品）４３部（固形分７０％）と酢酸エチル５７部を混合し、加熱溶解させて固形分３０％のニトロセルロースワニスａを得た。
<Example of adjusting nitrocellulose varnish a>
43 parts (70% solid content) of nitrocellulose (JIS standard H1 / 4 equivalent manufactured by Inabata & Co., Ltd.) and 57 parts of ethyl acetate were mixed and dissolved by heating to obtain nitrocellulose varnish a having a solid content of 30%.
＜ポリエステル樹脂bの合成とワニスの調整例＞
攪拌機、温度計、脱水トラップ付還流冷却器および窒素ガス導入装置の付いた四ツ口フラスコに無水フタル酸２５０部、エチレングリコール１００部、ペンタエリスリトール５０部、ひまし油６００部、トルエン５０ｇを仕込み、窒素雰囲気下で１８０℃に加熱し、酸価が１５ｍｇＫＯＨ／ｇ以下になるまで反応させた。反応終了後、４０℃まで冷却し、酢酸エチル１０００部を加えて、固形分５０％のポリエステル樹脂ワニスbを得た。
<Example of synthesis of polyester resin b and adjustment of varnish>
A four-necked flask equipped with a stirrer, a thermometer, a reflux condenser with a dehydration trap, and a nitrogen gas introduction device is charged with 250 parts of phthalic anhydride, 100 parts of ethylene glycol, 50 parts of pentaerythritol, 600 parts of castor oil, and 50 g of nitrogen. The mixture was heated to 180 ° C. in an atmosphere and reacted until the acid value became 15 mgKOH / g or less. After completion of the reaction, the mixture was cooled to 40 ° C. and 1000 parts of ethyl acetate was added to obtain a polyester resin varnish b having a solid content of 50%.
＜テルペン系天然樹脂ワニスcの調整例＞
エステルガム（軟化点：８０℃以上、酸価：７ｍｇＫＯＨ／ｇ以下）６０部およびトルエン４０部を混合し、４０℃で１時間加熱溶解して固形分６０％のテルペン系天然樹脂ワニスcを得た。
<Example of adjusting terpene-based natural resin varnish c>
60 parts of ester gum (softening point: 80 ° C. or higher, acid value: 7 mgKOH / g or lower) and 40 parts of toluene are mixed and dissolved by heating at 40 ° C. for 1 hour to obtain a terpene-based natural resin varnish c having a solid content of 60%. It was.
＜グラビア製版ロールの製造用レジスト塗工液の調製例＞
ニトロセルロースワニスａ：４０部、カーボンブラック（コロンビアンケミカル社製ラーベン７８０ウルトラパウダー）：１０部、溶剤として酢酸エチル：５部をディスパーで混合した後、アイガーミルで混練しミルベースを作成した。これに、ポリエステル樹脂ワニスb：６部、テルペン系天然樹脂ワニスc：５部、可塑剤としてヒマシ油：４部、希釈溶剤として酢酸エチル／トルエン／イソプロピルアルコール（混合割合（重量比）：４０／４０／２０）：３０部を加えレジスト塗工液１を得た。
さらに、塗工適性を付与するために、前記レジスト塗工液１：１００部にプロピレングリコールモノエチルエーテル：７０部を加え、離合社製のザーンカップＮｏ．３で１７秒のレジスト塗工液１を得た。
<Preparation example of resist coating liquid for manufacturing gravure plate making roll>
Nitrocellulose varnish a: 40 parts, carbon black (Raven 780 ultra powder manufactured by Colombian Chemical Co., Ltd.): 10 parts, ethyl acetate: 5 parts as a solvent were mixed with a dispar and then kneaded with an Eiger mill to prepare a mill base. To this, polyester resin varnish b: 6 parts, terpene-based natural resin varnish c: 5 parts, castor oil as a plasticizer: 4 parts, ethyl acetate / toluene / isopropyl alcohol as a diluting solvent (mixing ratio (weight ratio): 40 / 40/20): 30 parts were added to obtain a resin coating liquid 1.
Further, in order to impart coating suitability, 70 parts of propylene glycol monoethyl ether was added to 1: 100 parts of the resist coating liquid, and Zahn Cup No. In 3, a resist coating solution 1 for 17 seconds was obtained.
前記レジスト塗工液１で作成したミルベース：５５部に、ポリエステル樹脂ワニスb：６部、可塑剤としてヒマシ油：４部とマレイン酸ジニエチルヘキシル：５部、希釈溶剤として酢酸エチル／トルエン／イソプロピルアルコール（混合割合（重量比）：４０／４０／２０）：３０部を加えレジスト塗工液２を得た。さらに、塗工適性を付与するために、前記レジスト塗工液１：１００部にプロピレングリコールモノエチルエーテル：７０部を加え、離合社製のザーンカップＮｏ．３で１７秒のレジスト塗工液２を得た。 Mill base prepared with the resist coating solution 1: 55 parts, polyester resin varnish b: 6 parts, castor oil as a plasticizer: 4 parts and dinicylhexyl maleate: 5 parts, ethyl acetate / toluene / isopropyl alcohol as a diluting solvent (Mixing ratio (weight ratio): 40/40/20): 30 parts were added to obtain a resin coating liquid 2. Further, in order to impart coating suitability, 70 parts of propylene glycol monoethyl ether was added to 1: 100 parts of the resist coating liquid, and Zahn Cup No. In 3, a resist coating solution 2 for 17 seconds was obtained.
前記レジスト塗工液１：１００部に前記希釈溶剤：７０部を加えて、レジスト塗工液３を得た。また、前記レジスト塗工液１にプロピレングリコールモノエチルエーテル：２０部と前記希釈溶剤：５０部を加えて、レジスト塗工液４を得た。 The diluting solvent: 70 parts was added to 1: 100 parts of the resist coating liquid to obtain a resist coating liquid 3. Further, 20 parts of propylene glycol monoethyl ether and 50 parts of the diluting solvent were added to the resist coating liquid 1 to obtain a resist coating liquid 4.
前記調整したレジスト塗工液１〜４を表１に示すとともに、グラビア製版ロールを製造し、評価した結果を表２に記す。 Table 1 shows the prepared resist coating solutions 1 to 4, and Table 2 shows the results of manufacturing and evaluating gravure plate-making rolls.
（実施例１）
銅メッキを付けたグラビア製版ロール版材を準備し、酸および水、溶剤で表面洗浄した後、リングコーターで１．３ｍｍ／秒の移動速度でレジスト塗工液１を前記ロールに塗布し、常温乾燥後の膜厚が２．５μｍとなるようレジスト層を全面に形成した。
前記レジスト層を形成したグラビア製版ロール版材にレーザ光（波長５３５ｎｍ）を照射してレジスト層のアブレーションを行ない、線数５００線／ｉｎｃｈの格子パターンを形成した。
形成したレジスト層の膜厚を非接触式のレーザ顕微鏡で測定し、膜厚の均一性を評価した。結果を表２に示す。
(Example 1)
A copper-plated gravure plate-making roll plate material is prepared, the surface is washed with acid, water, and a solvent, and then the resist coating liquid 1 is applied to the roll at a moving speed of 1.3 mm / sec with a ring coater, and the roll is at room temperature. A resist layer was formed on the entire surface so that the film thickness after drying was 2.5 μm.
The gravure plate-making roll plate material on which the resist layer was formed was irradiated with a laser beam (wavelength 535 nm) to ablate the resist layer, and a lattice pattern having 500 lines / inch was formed.
The film thickness of the formed resist layer was measured with a non-contact laser microscope to evaluate the uniformity of the film thickness. The results are shown in Table 2.
膜厚均一性は、製版ロール表面に形成したレジスト塗膜の膜厚およびアブレーションで形成したパターンの線幅を、レーザ顕微鏡で測定し、以下の判定基準で評価した。
◎：端部と中央のバラツキが、±５％未満
○：端部と中央のバラツキが、±５〜８％
×：端部と中央のバラツキが、±８％以上
The film thickness uniformity was evaluated by measuring the film thickness of the resist coating film formed on the surface of the plate-making roll and the line width of the pattern formed by ablation with a laser microscope and using the following criteria.
⊚: The variation between the edge and the center is less than ± 5% ○: The variation between the edge and the center is ± 5-8%
×: The variation between the edge and the center is ± 8% or more.
次に、前記製版ロール版材に、スプレー式エッチング装置で塩化第二銅水溶液を噴霧して、版深が１０μｍとなる条件で前記アブレーション部の銅をエッチングし、水洗・乾燥後にセル（凹部）を形成した製版ロール版材を得た。
前記製版ロール版材に残った非アブレーション部のレジスト層を、前記レジスト塗工液の作成で使用した希釈溶剤を使用して剥離し、全表面が銅となったグラビア製版ロールを得た。
さらに、銅表面の耐薬品性や耐摩耗性を付与する目的で、前記製版ロールにクロムメッキを施して、グラビア製版ロールを製造した。
Next, a cupric chloride aqueous solution is sprayed onto the plate-making roll plate material with a spray-type etching apparatus, the copper in the ablation portion is etched under the condition that the plate depth is 10 μm, and after washing and drying with water, cells (recesses) are formed. A plate-making roll plate material was obtained.
The resist layer in the non-ablated portion remaining on the plate-making roll plate material was peeled off using the diluting solvent used in the preparation of the resist coating liquid to obtain a gravure plate-making roll having copper on the entire surface.
Further, for the purpose of imparting chemical resistance and abrasion resistance to the copper surface, the plate-making roll was chrome-plated to produce a gravure plate-making roll.
（実施例２〜３、比較例１〜２）
表２に示すレジスト塗工液２〜４を使用し、実施例１と同様な製造方法でグラビア製版ロールを製造し、評価した結果を表２に示す。
ただし、比較例２のスプレーコート法では、２．５μmの膜厚は形成できず、５．０μｍで評価した。
(Examples 2 and 3, Comparative Examples 1 and 2)
Table 2 shows the results of manufacturing and evaluating gravure plate-making rolls using the resist coating solutions 2 to 4 shown in Table 2 by the same manufacturing method as in Example 1.
However, in the spray coating method of Comparative Example 2, a film thickness of 2.5 μm could not be formed, and the film thickness was evaluated at 5.0 μm.
表２の結果より、実施例１〜３はレジスト塗膜の膜厚均一性に優れ、エッチング、レジスト剥離、クロムメッキの工程を経て、膜厚均一性の良いグラビア製版ロールを得ることができた。 From the results in Table 2, Examples 1 to 3 had excellent film thickness uniformity of the resist coating film, and a gravure plate making roll having good film thickness uniformity could be obtained through the steps of etching, resist peeling, and chrome plating. ..
Claims (2)
工程（ａ）：感光性材料と、アルキレングリコールモノアルキルエーテルとを含むレジスト塗工液を用意する工程。
工程（ｂ）：前記レジスト塗工液をリングコート法で円筒状グラビアシリンダーに塗工し、円筒状グラビアシリンダー上に、レジスト層を形成する工程。
工程（ｃ）：前記レジスト層が形成されたグラビアシリンダーにレーザアブレーション法でセルを形成する工程。 A method for producing a gravure plate making roll, which comprises the following steps (a) to (c).
Step (a): A step of preparing a resist coating solution containing a photosensitive material and an alkylene glycol monoalkyl ether.
Step (b): A step of applying the resist coating liquid to a cylindrical gravure cylinder by a ring coating method to form a resist layer on the cylindrical gravure cylinder.
Step (c): A step of forming a cell in a gravure cylinder on which the resist layer is formed by a laser ablation method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019047837A JP7210111B2 (en) | 2019-03-15 | 2019-03-15 | Manufacturing method of gravure plate-making roll |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019047837A JP7210111B2 (en) | 2019-03-15 | 2019-03-15 | Manufacturing method of gravure plate-making roll |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2020146964A true JP2020146964A (en) | 2020-09-17 |
| JP7210111B2 JP7210111B2 (en) | 2023-01-23 |
Family
ID=72431537
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019047837A Active JP7210111B2 (en) | 2019-03-15 | 2019-03-15 | Manufacturing method of gravure plate-making roll |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP7210111B2 (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001191475A (en) * | 2000-03-21 | 2001-07-17 | Think Laboratory Co Ltd | Gravure printing plate making method |
| US20050217521A1 (en) * | 2004-03-31 | 2005-10-06 | Matsushita Electric Industrial Co., Ltd. | System for and method of manufacturing gravure printing plates |
| JP2009090661A (en) * | 2007-09-20 | 2009-04-30 | Think Laboratory Co Ltd | Gravure platemaking roll and its manufacturing method |
| JP2009096189A (en) * | 2007-09-26 | 2009-05-07 | Think Laboratory Co Ltd | Center drum type gravure printing apparatus |
| JP2014076410A (en) * | 2012-10-09 | 2014-05-01 | Asahi Kasei Corp | Coating apparatus and coating method |
| JP2017061092A (en) * | 2015-09-25 | 2017-03-30 | 東洋インキＳｃホールディングス株式会社 | Gravure printing cylinder, and resin composition for gravure version formation |
| JP2017113883A (en) * | 2015-12-21 | 2017-06-29 | 東洋インキＳｃホールディングス株式会社 | Resist composition for manufacturing gravure platemaking roll and method for manufacturing gravure platemaking roll using the composition |
-
2019
- 2019-03-15 JP JP2019047837A patent/JP7210111B2/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001191475A (en) * | 2000-03-21 | 2001-07-17 | Think Laboratory Co Ltd | Gravure printing plate making method |
| US20050217521A1 (en) * | 2004-03-31 | 2005-10-06 | Matsushita Electric Industrial Co., Ltd. | System for and method of manufacturing gravure printing plates |
| JP2009090661A (en) * | 2007-09-20 | 2009-04-30 | Think Laboratory Co Ltd | Gravure platemaking roll and its manufacturing method |
| JP2009096189A (en) * | 2007-09-26 | 2009-05-07 | Think Laboratory Co Ltd | Center drum type gravure printing apparatus |
| JP2014076410A (en) * | 2012-10-09 | 2014-05-01 | Asahi Kasei Corp | Coating apparatus and coating method |
| JP2017061092A (en) * | 2015-09-25 | 2017-03-30 | 東洋インキＳｃホールディングス株式会社 | Gravure printing cylinder, and resin composition for gravure version formation |
| JP2017113883A (en) * | 2015-12-21 | 2017-06-29 | 東洋インキＳｃホールディングス株式会社 | Resist composition for manufacturing gravure platemaking roll and method for manufacturing gravure platemaking roll using the composition |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7210111B2 (en) | 2023-01-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI437052B (en) | Conductive metal ink composition and preparation method for conductive pattern | |
| WO1997017208A1 (en) | Direct drawing type waterless planographic original form plate | |
| JP7210111B2 (en) | Manufacturing method of gravure plate-making roll | |
| JP7141823B2 (en) | Plasma-curable offset printing ink composition, and method for producing printed matter and printing method using the same | |
| JP2008037100A (en) | Manufacturing process of printed matter and printed matter obtained by its method | |
| JP2008050378A (en) | Printing ink and method for manufacturing coated film using the ink | |
| CA2901003C (en) | Solder mask ink composition | |
| CN106873309A (en) | A kind of Positive photosensitive water solubility dry film solder mask and purposes | |
| JP5996081B1 (en) | Resist composition for production of gravure printing roll, and method for producing gravure printing roll using the same | |
| CN101086617B (en) | Light solidifying composition and burned object pattern obtained using the same | |
| JP2006111725A (en) | Ink | |
| JP2020119737A (en) | Conductive paste, base material with conductive film, production method of base material with conductive film | |
| JP2009114358A (en) | Ink composition for offset printing for computer-to-plate (ctp) plate | |
| JP2010235780A (en) | Printing ink and method of forming coating film using ink | |
| EP3912439B1 (en) | A method and apparatus for preparing a pcb product having highly dense conductors | |
| JPH0579978B2 (en) | ||
| JP5636661B2 (en) | Black ink composition | |
| FR2475753A1 (en) | LITHOGRAPHIC PLATE BASED ON PARADIAZODIPHENYLAMINE FLUOBORATE AND LIQUID EPOXY RESIN | |
| JPS61239982A (en) | Method for forming resist pattern | |
| JP6549417B2 (en) | Imaging on a substrate using an alkaline water soluble UV blocking composition and a water soluble UV transparent film | |
| JP2008230243A (en) | Forming method of coating film using intaglio offset printing method | |
| JP2003034068A (en) | Highly glossy printed matter of environment-friendly type and method for manufacturing the printed matter | |
| JP2021014547A (en) | Green pigment and use thereof | |
| JP2003003105A (en) | Ink composition for forming plasma display panel electrode and method for forming plasma display panel by using the same | |
| JPH0199283A (en) | Manufacture of metallized layer |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20190315 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20190315 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220107 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20221124 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230110 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230110 |
|
| R151 | Written notification of patent or utility model registration |
Ref document number: 7210111 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |