JP2020144287A - Information processing apparatus, control method, lithography apparatus, article manufacturing method, and program - Google Patents

Abstract

To provide an information processing apparatus advantageous for improving the productivity of a lithography apparatus.SOLUTION: The information processing apparatus includes: a first management part 102 that manages, for each of a plurality of units of a lithography apparatus, state information indicating whether the state of the unit is normal or abnormal; a second management part 103 that manages, for each of a plurality of maintenance tasks to be executed, maintenance information including first information indicating the unit required for the maintenance task among the plurality of units; an identification part 104, when an abnormality occurs in the lithography apparatus and a process of forming a pattern on a substrate is stopped, identifies an executable maintenance task from among the plurality of maintenance tasks on the basis of the state information and the maintenance information; and an execution part 105 that causes the lithography apparatus to execute the executable maintenance task identified by the identification part while the process is stopped.SELECTED DRAWING: Figure 2

Description

The present invention relates to information processing devices, control methods, lithographic devices, article manufacturing methods and programs.

Exposure equipment used in the manufacturing (photolithography) process of devices such as semiconductor devices, liquid crystal display elements, image sensors, and magnetic heads is required to operate with high performance (high precision), and in order to maintain that performance. In addition, maintenance of the equipment is carried out regularly.

The operation of such an exposure apparatus is roughly classified into production time and non-production time. The production time corresponds to the time for producing the device, specifically, the time for exposing the substrate. Non-production time is maintenance time to maintain performance (scheduled downtime), time when an abnormality occurs and device cannot be produced (unscheduled downtime), and time when device is not produced (idle). Time). Therefore, in the exposure apparatus, it is necessary to reduce the non-production time in order to improve the productivity of the device.

Techniques related to maintenance of exposure apparatus have been conventionally proposed (see Patent Document 1). Patent Document 1 discloses a technique for controlling the operation of an exposure apparatus by using the first information regarding the execution of product lot processing and the second information regarding the exposure processing of a substrate for maintenance or research and development. ing. In such a technique, the process corresponding to the first information is preferentially executed, and when the unprocessed process corresponding to the first information disappears, the process corresponding to the second information is executed.

Japanese Patent No. 4522158

The technique disclosed in Patent Document 1 is a technique for automatically maintaining an apparatus during idle time. However, in general, a device maker continues to produce a device in order to increase the production amount unless an abnormality occurs in the device, so that an idle time does not occur unless a production adjustment or the like occurs. On the other hand, the exposure apparatus is required to operate with high performance as described above. Therefore, in the technique disclosed in Patent Document 1, a part of the production time must be allocated to the maintenance time for maintaining the performance, which lowers the productivity.

The present invention has been made in view of such problems of the prior art, and an exemplary object is to provide an information processing apparatus which is advantageous for improving the productivity of a lithography apparatus.

In order to achieve the above object, the information processing apparatus as one aspect of the present invention is an information processing apparatus that controls a lithography apparatus that forms a pattern on a substrate, and for each of a plurality of units of the lithography apparatus. Of the plurality of units, the first management unit that manages the status information indicating whether the status of the unit is normal or abnormal and the plurality of maintenance to be performed by the lithography apparatus are required for the maintenance. The second management unit that manages maintenance information including the first information indicating the unit to be the unit, and the state information and the state information when the process of forming the pattern on the substrate is stopped due to an abnormality in the lithography apparatus. Based on the maintenance information, the specific unit that identifies the maintenance that can be performed from the plurality of maintenance and the feasible maintenance that is specified by the specific unit while the processing is stopped are sent to the lithography apparatus. It is characterized by having an execution unit to be executed.

Further objections or other aspects of the invention will be manifested in embodiments described below with reference to the accompanying drawings.

According to the present invention, for example, it is possible to provide an information processing apparatus that is advantageous for improving the productivity of a lithography apparatus.

It is the schematic which shows the structure of the exposure apparatus as one aspect of this invention. It is a block diagram which shows the system configuration of the control part concerning execution of maintenance. It is a figure which shows an example of maintenance information. It is a figure which shows an example of the management of the state (state information) of each unit which an exposure apparatus has. It is a figure which shows an example of the state information. It is a figure which shows the flow of the specific process of the maintenance which can be executed. It is a figure which shows the flow of the execution process of maintenance. It is a block diagram which shows the system configuration of the control part concerning execution of maintenance. It is a figure which shows the flow of maintenance interruption processing. It is a figure which shows an example of a user interface.

Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. The following embodiments do not limit the invention according to the claims. Although a plurality of features are described in the embodiment, not all of the plurality of features are essential to the invention, and the plurality of features may be arbitrarily combined. Further, in the attached drawings, the same or similar configurations are designated by the same reference numbers, and duplicate description is omitted.

FIG. 1 is a schematic view showing a configuration of an exposure apparatus 100 as one aspect of the present invention. The exposure apparatus 100 is a lithography apparatus used in a photolithography process, which is a device manufacturing process, to form a pattern on a substrate 5. The exposure apparatus 100 exposes the substrate 5 via the reticle 1 by a step-and-scan method or a step-and-repeat method, and transfers the pattern of the reticle 1 to the substrate 5.

The present invention is not limited to the exposure apparatus, but can also be applied to an imprint apparatus and a drawing apparatus. Here, the imprinting apparatus contacts the imprint material supplied on the substrate with the mold and applies energy for curing to the imprint material to form a pattern of the cured product to which the pattern of the mold is transferred. To do. Further, the drawing apparatus forms a pattern (latent image pattern) on the substrate by drawing on the substrate with a charged particle beam (electron beam) or a laser beam.

The exposure apparatus 100 has a plurality of units for forming a pattern on the substrate 5. Specifically, as shown in FIG. 1, the exposure apparatus 100 includes an illumination optical system 2, a reticle stage 3, a projection optical system 4, a substrate chuck 6, a substrate stage 7, and a control unit 10. ..

The illumination optical system 2 illuminates the reticle 1 held by the reticle stage 3 by using light emitted from a light source (not shown) such as a mercury lamp or an excimer laser. The reticle stage 3 is a stage for holding and moving the reticle 1. The projection optical system 4 projects the pattern (image) of the reticle 1 onto the substrate 5 (resist on the substrate) held on the substrate stage 7 via the substrate chuck 6. The substrate stage 7 is a stage that supports and moves the substrate chuck 6 that attracts the substrate 5.

The control unit 10 is composed of, for example, an information processing device (computer) including a CPU, a memory, and the like, and controls each part (unit) of the exposure device 100 in an integrated manner according to a program stored in the storage unit. The control unit 10 controls the exposure process of transferring the pattern of the reticle 1 to the substrate 5, that is, exposing the substrate 5 through the reticle 1 to form a pattern on the substrate 5. Further, the control unit 10 controls the maintenance to be performed by the exposure apparatus 100 in the present embodiment. For example, the control unit 10 causes the exposure apparatus 100 to perform maintenance when an abnormality occurs in the exposure apparatus 100 and the exposure process for forming a pattern on the substrate 5 is stopped.

With reference to FIG. 2, an example of maintenance execution processing when an abnormality occurs in the exposure apparatus 100 and the exposure processing is stopped will be described. FIG. 2 is a block diagram showing a system configuration of the control unit 10 regarding execution of maintenance. The control unit 10 includes a state detection unit 101, a state management unit (first management unit) 102, a maintenance management unit (second management unit) 103, a scheduler (specific unit) 104, and an execution unit 105.

The state detection unit 101 is a detection unit that detects whether the state of each of the plurality of units of the exposure apparatus 100 is normal or abnormal. The state detection unit 101 constantly monitors changes in the states of the plurality of units of the exposure apparatus 100, and notifies the state management unit 102 and the scheduler 104 when there is a change in the state of the units.

The state management unit 102 manages state information indicating whether the state of the units is normal or abnormal for each of the plurality of units included in the exposure apparatus 100. The state management unit 102 manages the state of the unit notified from the state detection unit 101, and when there is a change in the state of the unit, updates the state information based on the detection result of the state detection unit 101 (state). Keep the information up to date). Further, the state management unit 102 notifies the scheduler 104 of the latest state information of each unit managed by the state management unit 102, if necessary.

The maintenance management unit 103 manages maintenance information including first information indicating a unit required for maintenance for each of a plurality of maintenances to be performed by the exposure apparatus 100. In other words, the first information is information indicating the relationship between the maintenance name and the unit required to perform the maintenance. Further, as maintenance information, the maintenance management unit 103 provides second information indicating a cycle to be executed by the exposure apparatus 100 and third information indicating an execution date executed by the exposure apparatus 100 for each of the plurality of maintenances. to manage.

FIG. 3 is a diagram showing an example of maintenance information managed by the maintenance management unit 103. With reference to FIG. 3, maintenance information is managed for each maintenance and includes "maintenance name", "cycle", "execution date" and "required unit" as its items. The “maintenance name” indicates the name of each of the plurality of maintenances to be performed by the exposure apparatus 100. The “cycle” indicates a cycle in which maintenance should be performed on the exposure apparatus 100. The “execution date” indicates the last date on which maintenance was performed on the exposure apparatus 100. “Necessary unit” indicates a unit required to perform maintenance on the exposure apparatus 100. The "execution date" is updated when maintenance is executed (maintenance is completed) in the exposure apparatus 100.

The scheduler 104 identifies maintenance that can be performed in the current state of each unit of the exposure apparatus 100 when an abnormality occurs in the exposure apparatus 100 and the exposure process is stopped. Specifically, the scheduler 104 acquires state information and maintenance information from each of the state management unit 102 and the maintenance management unit 103, and specifies maintenance that can be performed from a plurality of maintenances based on the state information and maintenance information. .. At this time, the scheduler 104 identifies a plurality of maintainable maintenance, and sets a priority indicating the order in which the exposure apparatus 100 should perform each of the plurality of performable maintenance based on the maintenance information. Specifically, the scheduler 104 obtains a scheduled date for performing each of the plurality of performable maintenance on the exposure apparatus 100 based on the second information and the third information among the maintenance information, and the maintenance with an earlier scheduled date. Set the priority so that it will be executed with priority. As a result, maintenance is executed in order from the maintenance date having the earliest (for example, oldest) date on the next scheduled date. However, maintenance may not be performed in which the next scheduled date is a date later than the current date.

The execution unit 105 causes the exposure device 100 to perform the executable maintenance specified by the scheduler 104 while the exposure process is stopped due to an abnormality in the exposure device 100. When the scheduler 104 specifies a plurality of executable maintenances, the execution unit 105 exposes the plurality of executable maintenances based on the priority set for each executable maintenance. Let 100 execute sequentially. Further, the execution unit 105 notifies the maintenance management unit 103 of the execution result indicating that the maintenance has been executed (maintenance is completed) in the exposure apparatus 100.

With reference to FIGS. 4 to 7, a flow of maintenance execution processing when an abnormality occurs in the exposure apparatus 100 and the exposure processing is stopped will be described. FIG. 4 is a diagram showing an example of management of the state (state information) of each unit of the exposure apparatus 100 between the state detection unit 101 and the state management unit 102. As shown in FIG. 4, when an abnormality occurs in the exposure apparatus 100 and the state detection unit 101 detects a change in the state of the unit (change from normal to abnormal) (S1), the detection result is determined by the state management unit. Notify 102 (S2). The state management unit 102 updates the state information as shown in FIG. 5 based on the detection result notified from the state detection unit 101. FIG. 5 is a diagram showing an example of state information managed by the state management unit 102. With reference to FIG. 5, the state information is managed for each unit of the exposure apparatus 100, and includes "unit name" and "state" as its items. The “unit name” indicates the name of each of the plurality of units included in the exposure apparatus 100. The “state” indicates the state of each unit of the exposure apparatus 100, that is, whether each unit is normal or abnormal.

FIG. 6 is a diagram showing a flow of specific processing for executable maintenance between the state detection unit 101, the state management unit 102, the maintenance management unit 103, and the scheduler 104. When the scheduler 104 receives a notification from the state detection unit 101 that an abnormality has occurred in the exposure device 100 and the exposure process has stopped (S3), the scheduler 104 acquires state information from the state management unit 102 (S4) and maintains the maintenance management unit. The maintenance information is acquired from 103 (S5). Then, the scheduler 104 identifies the maintenance that can be performed in the current state of each unit of the exposure apparatus 100 based on the state information and the maintenance information.

FIG. 7 is a diagram showing a flow of maintenance execution processing between the maintenance management unit 103, the scheduler 104, and the execution unit 105. The scheduler 104 notifies the execution unit 105 of the maintenance that can be performed in the current state of each unit of the exposure apparatus 100, which is specified based on the state information and the maintenance information (S6). When the scheduler 104 notifies the execution unit 105 of the maintenance that can be performed, the execution unit 105 causes the exposure apparatus 100 to perform such maintenance while the exposure process is stopped. Then, the execution unit 105 notifies the maintenance management unit 103 of the maintenance execution result after the maintenance execution is completed (S7). When the maintenance execution unit 105 notifies the maintenance execution result, the maintenance management unit 103 updates the maintenance information (the "execution date" is set to the latest date when the maintenance is executed).

The maintenance execution process when the exposure process is stopped due to an abnormality in the exposure apparatus 100 will be specifically described. Here, a case where an abnormality occurs in the reticle stage 3 and the exposure process is stopped will be described as an example. In the state information shown in FIG. 3 and the maintenance information shown in FIG. 5, the reticle stage 3 is referred to as “RS”. Similarly, the substrate chuck 6 is referred to as "CM", the substrate stage 7 is referred to as "WS", the lens group of the illumination optical system 2 and the projection optical system 4 is referred to as "Lens", the light source is referred to as "Laser", and the substrate transport mechanism is referred to as "WF". write.

First, when an abnormality occurs in the reticle stage 3 and the exposure process is stopped, the state detection unit 101 detects a change in the state of the reticle stage 3 (change from normal to abnormal), and reports the detection result to the state management unit 102. Notify to. Based on the detection result of the state detection unit 101, the state management unit 102 updates the state information of the reticle stage 3 so that the current state of the reticle stage 3 becomes abnormal, as shown in FIG.

Next, when the scheduler 104 receives a notification from the state detection unit 101 that an abnormality has occurred in the reticle stage 3 and the exposure process has stopped, the scheduler 104 acquires the state information shown in FIG. 5 from the state management unit 102, and the maintenance management unit The maintenance information shown in FIG. 3 is acquired from 103. Then, the scheduler 104 refers to the state information indicating the state of each unit of the exposure apparatus 100 and the maintenance information indicating the units required for each maintenance, and specifies the maintenance that can be performed in the current state of each unit. .. Here, as shown in FIG. 5, the normal unit includes the substrate stage 7 (“WS”), the light source “Laser”, the substrate chuck 6 (“CM”), and the substrate transfer mechanism (“WF”). , The lens group (“Lens”) of the illumination optical system 2 and the projection optical system 4. Therefore, the scheduler 104 identifies "chuck cleaning" and "WS bar mirror measurement" as maintenance that can be performed in the current state of each unit with reference to FIG. At this time, assuming that the current date is July 29, 2018, the scheduler 104 sets the priority of "chuck cleaning" to the priority of "WS bar mirror measurement" from the "cycle" and "execution date" of the maintenance information. Set the priority so that the value is also high. Further, the scheduler 104 notifies the execution unit 105 of "chuck cleaning" and "WS bar mirror measurement" together with their priorities as maintenance that can be performed in the current state of each unit.

Next, the execution unit 105 causes the exposure apparatus 100 to execute the "chuck cleaning" and the "WS bar mirror measurement" notified from the scheduler 104 in that order (according to the priority) while the exposure process is stopped. .. Further, the execution unit 105 notifies the maintenance management unit 103 of the execution result indicating that the “chuck cleaning” and the “WS bar mirror measurement” have been executed by the exposure apparatus 100. The maintenance management unit 103 updates the respective "execution dates" of the "chuck cleaning" and the "WS bar mirror measurement" in response to the execution result from the execution unit 105.

As described above, according to the present embodiment, while the exposure apparatus 100 has an abnormality and the exposure process is stopped, that is, during the time when the abnormality occurs and the device cannot be produced (unscheduled downtime). Maintenance can be performed. Therefore, the exposure apparatus 100 does not need to devote a part of the production time for producing the device to maintenance, which is advantageous for improving the productivity of the device.

As shown in FIG. 8, the system configuration of the control unit 10 may be made capable of interrupting the maintenance being executed while the exposure process is stopped. FIG. 8 is a block diagram showing a system configuration of the control unit 10 regarding execution of maintenance. The control unit 10 includes an operation unit 106 and a determination unit 107 in addition to the state detection unit 101, the state management unit 102, the maintenance management unit 103, the scheduler 104, and the execution unit 105.

The operation unit 106 receives the user's instruction (input) and notifies the determination unit 107 of the user's instruction.

The determination unit 107 determines whether the user's instruction received by the operation unit 106 is an instruction for which maintenance needs to be interrupted, that is, whether the maintenance instruction is included. For example, when the determination unit 107 includes an instruction for re-executing the process executed immediately before the stop of the exposure apparatus 100 or an instruction for resetting the exposure apparatus 100, the user's instruction includes. It is determined that the interruption instruction is included. Further, when the instruction for executing the process using the unit performing the maintenance is included in the instruction of the user, the determination unit 107 determines that the instruction for interruption is included. Then, the determination unit 107 notifies the execution unit 105 via the scheduler 104 in the present embodiment so that the maintenance is interrupted when the user's instruction includes the interruption instruction. However, the determination unit 107 may directly notify the execution unit 105 to interrupt the maintenance without going through the scheduler 104.

FIG. 9 is a diagram showing a flow of maintenance interruption processing between the operation unit 106, the determination unit 107, the scheduler 104, and the execution unit 105. While the exposure process is stopped due to an abnormality in the exposure apparatus 100, specifically, while the maintenance is being performed, the operation unit 106 receives the user's instruction (S10), and the user's instruction. Is notified to the determination unit 107 (S11).

The determination unit 107 determines whether or not the user's instruction notified from the operation unit 106 includes an interruption instruction for instructing the interruption of maintenance, and if the user's instruction includes the interruption instruction, the determination unit 107 indicates to that effect. Notify the scheduler 104 (S12). If the user's instruction does not include the interruption instruction, the process corresponding to the user's instruction received by the operation unit 106 is executed without notifying the scheduler 104 to that effect.

The scheduler 104 notifies the execution unit 105 to interrupt the maintenance based on the notification from the determination unit 107 (S13). Then, the execution unit 105 interrupts the maintenance being executed by the exposure apparatus 100 according to the notification from the scheduler 104.

In this way, by adding the operation unit 106 and the determination unit 107 as the system configuration of the control unit 10, the user's instruction (for example, restoration work) is prioritized (that is, the maintenance is performed) while the maintenance is being executed. It is possible to execute (interrupted).

Further, the exposure apparatus 100 may have a user interface for displaying the executable maintenance specified by the scheduler 104 as a part of the operation unit 106 or separately from the operation unit 106.

FIG. 10 is a diagram showing an example of a user interface (Maintenance scheduler window) that displays the feasible maintenance specified by the scheduler 104. Such a user interface is provided via a touch panel (display device) connected to the exposure device 100.

Referring to FIG. 10, the user interface includes a list display area (Maintenance List 151) that displays a list of a plurality of available maintenance identified by the scheduler 104. The plurality of maintenance displayed in the list display area 151 is displayed in the order in which the exposure apparatus 100 should be executed, that is, in order from the one having the highest priority. In addition, the user interface is a status display area that displays status information indicating whether maintenance is being performed, maintenance is waiting, maintenance is completed, or maintenance is stopped for each maintenance. Includes 152.

It is also possible to configure the user interface so that the user can instruct the user to change or delete the maintenance order displayed in the list display area 151, add maintenance not displayed in the list display area 151, and the like. For example, the Stop button 153 and the Run button 154 are buttons for changing the status information of arbitrary maintenance displayed in the list display area 151. The Stop button 153 is a button for changing the maintenance status information from "running" or "waiting" to "cancelled". The Run button 154 is a button for changing the maintenance status information from "waiting" to "running" or from "cancelled" to "waiting".

Further, the Delete button 155 is a button for deleting the maintenance displayed in the list display area 151, and the Add button 156 is a button for adding the maintenance not displayed in the list display area 151. When adding new maintenance to the list display area 151, for example, any maintenance can be performed from the list that displays the maintenance that can be performed from the current state of each unit and the maintenance whose scheduled date is close to the current date. select. As a result, the user can change or delete the order of maintenance displayed in the list display area 151, and add maintenance not displayed in the list display area 151.

The method for manufacturing an article according to the embodiment of the present invention is suitable for producing an article such as a device (semiconductor element, magnetic storage medium, liquid crystal display element, etc.). Such a manufacturing method includes a step of forming a pattern on a substrate using an exposure apparatus 100, a step of processing a substrate on which the pattern is formed, and a step of manufacturing an article from the processed substrate. In addition, such a manufacturing method may include other well-known steps (oxidation, film formation, vapor deposition, doping, flattening, etching, resist peeling, dicing, bonding, packaging, etc.). The method for producing an article in the present embodiment is advantageous in at least one of the performance, quality, productivity and production cost of the article as compared with the conventional method.

The present invention supplies a program that realizes one or more functions of the above-described embodiment to a system or device via a network or storage medium, and one or more processors in the computer of the system or device reads the program. It can also be realized by the processing to be executed. It can also be realized by a circuit (for example, an ASIC) that realizes one or more functions.

The invention is not limited to the above embodiments, and various modifications and modifications can be made without departing from the spirit and scope of the invention. Therefore, a claim is attached to make the scope of the invention public.

100: Exposure device 10: Control unit 101: State detection unit 102: State management unit 103: Maintenance management unit 104: Scheduler 105: Execution unit

Claims (14)

An information processing device that controls a lithography device that forms a pattern on a substrate.
For each of the plurality of units of the lithography apparatus, a first management unit that manages state information indicating whether the state of the unit is normal or abnormal, and
For each of the plurality of maintenances to be performed by the lithography apparatus, a second management unit that manages maintenance information including the first information indicating the unit required for the maintenance among the plurality of units, and a second management unit.
When an abnormality occurs in the lithography apparatus and the process of forming the pattern on the substrate is stopped, the specific maintenance that can be performed from the plurality of maintenances is specified based on the state information and the maintenance information. Department and
An execution unit that causes the lithography apparatus to perform the performable maintenance specified by the specific unit while the processing is stopped.
An information processing device characterized by having. It further has a detection unit that detects whether the state of each of the plurality of units is normal or abnormal.
The information processing device according to claim 1, wherein the first management unit updates the state information based on the detection result of the detection unit. The specific unit identifies a plurality of maintenance that can be performed from the plurality of maintenance, and sets a priority indicating the order in which the lithography apparatus should perform each of the plurality of performable maintenance.
The information processing apparatus according to claim 1 or 2, wherein the execution unit sequentially causes the lithography apparatus to sequentially perform a plurality of executable maintenance specified by the specific unit based on the priority. The maintenance information includes, for each of the plurality of maintenances, a second information indicating a cycle to be executed by the lithography apparatus, and a third information indicating an execution date executed by the lithography apparatus.
The information according to claim 3, wherein the specific unit sets the priority for each of the plurality of feasible maintenances based on the second information and the third information. Processing equipment. From the second information and the third information, the specific unit obtains a scheduled date for performing the maintenance on the lithography apparatus for each of the plurality of maintenances, and preferentially executes the maintenance as the scheduled date is earlier. The information processing apparatus according to claim 4, wherein the priority is set so as to be performed. The information processing apparatus according to claim 5, wherein the second management unit updates the second information with respect to the maintenance performed by the lithography apparatus. An operation unit that accepts user instructions and
A determination unit for determining whether the user's instruction received by the operation unit includes an interruption instruction for interrupting maintenance being executed by the lithography apparatus.
With more
Of claims 1 to 6, wherein when the determination unit determines that the user's instruction includes the interruption instruction, the execution unit interrupts the maintenance being executed by the lithography apparatus. The information processing device according to any one item. The information processing apparatus according to any one of claims 1 to 7, further comprising a user interface for displaying the feasible maintenance specified by the specific unit. The information processing device according to claim 8, wherein the user interface displays a list of a plurality of executable maintenance specified by the specific unit. For each of the plurality of maintenances, the user interface indicates whether the maintenance is being performed, the maintenance is waiting, the maintenance is completed, or the maintenance is stopped. The information processing apparatus according to claim 9, further comprising displaying information. A control method that controls a lithography device that forms a pattern on a substrate.
For each of the plurality of units included in the lithography apparatus, a first step of managing state information indicating whether the state of the unit is normal or abnormal, and
For each of the plurality of maintenances to be performed by the lithography apparatus, a second step of managing maintenance information including first information indicating a unit required for the maintenance among the plurality of units, and a second step of managing the maintenance information.
When an abnormality occurs in the lithography apparatus and the process of forming the pattern on the substrate is stopped, the maintenance that can be performed from the plurality of maintenances is specified based on the state information and the maintenance information. 3 steps and
A fourth step of causing the lithographic apparatus to perform the feasible maintenance identified in the third step while the process is stopped.
A control method characterized by having. A lithography device that forms a pattern on a substrate.
A plurality of units for forming a pattern on the substrate, and
For each of the plurality of units, a first management unit that manages state information indicating whether the state of the unit is normal or abnormal, and
For each of the plurality of maintenances to be performed by the lithography apparatus, a second management unit that manages maintenance information including the first information indicating the unit required for the maintenance among the plurality of units, and a second management unit.
When an abnormality occurs in the lithography apparatus and the process of forming the pattern on the substrate is stopped, the specific maintenance that can be performed from the plurality of maintenances is specified based on the state information and the maintenance information. Department and
An execution unit that executes the feasible maintenance specified by the specific unit while the processing is stopped.
A lithographic apparatus characterized by having. A step of forming a pattern on a substrate using the lithography apparatus according to claim 12.
A step of processing the substrate on which the pattern is formed in the step and a step of processing the substrate.
The process of manufacturing an article from the processed substrate and
A method of manufacturing an article, which comprises having. A program that causes a computer to execute a control method that controls a lithography device that forms a pattern on a substrate.
On the computer
For each of the plurality of units included in the lithography apparatus, a first step of managing state information indicating whether the state of the unit is normal or abnormal, and
For each of the plurality of maintenances to be performed by the lithography apparatus, a second step of managing maintenance information including first information indicating a unit required for the maintenance among the plurality of units, and a second step of managing the maintenance information.
When an abnormality occurs in the lithography apparatus and the process of forming the pattern on the substrate is stopped, the maintenance that can be performed from the plurality of maintenances is specified based on the state information and the maintenance information. 3 steps and
A fourth step of causing the lithographic apparatus to perform the feasible maintenance identified in the third step while the process is stopped.
A program characterized by executing.

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