JP2020126898A - 成膜方法 - Google Patents
成膜方法 Download PDFInfo
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- JP2020126898A JP2020126898A JP2019017374A JP2019017374A JP2020126898A JP 2020126898 A JP2020126898 A JP 2020126898A JP 2019017374 A JP2019017374 A JP 2019017374A JP 2019017374 A JP2019017374 A JP 2019017374A JP 2020126898 A JP2020126898 A JP 2020126898A
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02211—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound being a silane, e.g. disilane, methylsilane or chlorosilane
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
- H01L21/02337—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to a gas or vapour
- H01L21/0234—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to a gas or vapour treatment by exposure to a plasma
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- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
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- C23C16/45534—Use of auxiliary reactants other than used for contributing to the composition of the main film, e.g. catalysts, activators or scavengers
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Abstract
Description
本実施の形態の成膜方法に用いられる成膜装置について説明する。本実施の形態の成膜方法に用いられる成膜装置は、図1から図3に示されるように、ほぼ円形の平面形状を有する扁平な真空容器1と、真空容器1内に設けられ、真空容器1の中心に回転中心を有する回転テーブル2と、を備えている。真空容器1は、内部に収容したウエハの表面上に成膜処理を行うための処理室である。真空容器1は、有底の円筒形状を有する容器本体12と、容器本体12の上面に対して、例えばOリングなどのシール部材13(図1)を介して気密に着脱可能に配置される天板11とを有している。
次に、上述した成膜装置を用いたSiN膜の成膜方法の一例を図11及び図12に基づき説明する。尚、図11は、このSiN膜の成膜方法の一例の工程を説明するフローチャートであり、図12は、成膜工程におけるウエハWの断面の様子を模式的に示す。このSiN膜の成膜方法の説明では、ウエハWとしてシリコンウエハを用いるものとし、シリコンウエハの表面には、図12(a)に示すように、トレンチTが形成されている。
発明者らは、上記のような成膜方法においては、経時的に成膜レートが低下することについて検討を行った。この結果、リモートプラズマ発生器90のシャワーヘッド部93等の表面に塩素が付着し、このように付着した塩素は、上記のパージ工程においては、取り除くことができないことに起因していることに想到した。
次に、本実施の形態における成膜方法について説明する。本実施の形態における成膜方法は、上述した成膜装置を用いたSiN膜の成膜方法であり、図17に基づき説明する。尚、図17は、実施の形態における成膜方法によりSiN膜を成膜する工程を説明するフローチャートである。
2 回転テーブル
4 凸状部
5 突出部
7 ヒータユニット
11 天板
12 容器本体
15 搬送口
24 凹部
31、32 反応ガスノズル
41、42 分離ガスノズル
80 プラズマ発生器
90 リモートプラズマ発生器
91 プラズマ生成部
93d ガス吐出部
130〜132 ガス供給源
P1〜P3 処理領域
W ウエハ
Claims (13)
- 基板の表面に窒化膜を成膜する成膜工程と、
前記成膜工程の後に行うプラズマパージ工程と、
を有し、
前記成膜工程は、
前記基板の表面に、プラズマにより活性化された塩素ガスを供給して吸着させ、吸着阻害基を形成する工程と、
前記基板の表面に、シリコン又は金属と塩素とを含有する原料ガスを供給し、前記吸着阻害基が形成されていない領域に前記原料ガスを吸着させる工程と、
前記基板の表面に、窒化ガスを供給し、前記原料ガスとの反応により窒化膜を堆積させる工程と、
を含み、
前記プラズマパージ工程は、プラズマにより活性化された希ガスを供給する成膜方法。 - 前記吸着阻害基を形成する工程、前記原料ガスを吸着させる工程及び前記窒化膜を堆積させる工程を1サイクルとし、前記1サイクルを所定回数繰り返して前記窒化膜を成膜する請求項1に記載の成膜方法。
- 前記金属は、チタン又はアルミニウムを含む請求項1または2に記載の成膜方法。
- 前記基板はシリコン基板である請求項1から3のいずれか一項に記載の成膜方法。
- 前記基板には窪みパターンが形成されており、
前記成膜工程において堆積される前記窒化膜により、前記窪みパターンが埋め込まれる請求項1から4のいずれか一項に記載の成膜方法。 - 前記基板の表面には、下地膜が予め形成されている請求項1から5のいずれか一項に記載の成膜方法。
- 前記下地膜は、シリコン窒化膜又はシリコン酸化膜である請求項6に記載の成膜方法。
- 前記成膜工程の前に、前記基板の表面に下地膜を成膜する下地膜成膜工程を含むものであって、
前記下地膜を成膜する工程は、
前記基板の表面にシリコン含有ガスを供給し、前記シリコン含有ガスを吸着させる工程と、
前記基板の表面に前記窒化ガスを供給し、前記シリコン含有ガスとの反応によりシリコン窒化膜を堆積させる工程と、
を含む請求項1から5のいずれか一項に記載の成膜方法。 - 前記シリコン含有ガスを吸着させる工程と、前記シリコン窒化膜を堆積させる工程とを所定回数繰り返して前記下地膜を成膜する請求項8に記載の成膜方法。
- 前記窒化ガスは、プラズマにより活性化されている請求項1から9のいずれか一項に記載の成膜方法。
- 前記基板は、回転テーブルの上に周方向に沿って配置されており、
前記回転テーブルの回転方向において、窒化ガス供給領域、塩素ガス供給領域、原料ガス供給領域が、順に互いに離間して前記回転テーブルの前記周方向に沿って配置されており、
前記回転テーブルが前記回転方向に回転することにより、前記吸着阻害基を形成する工程、前記原料ガスを吸着させる工程及び前記窒化膜を堆積させる工程を順次繰り返して前記成膜工程が行われる請求項1から10のいずれか一項に記載の成膜方法。 - 前記塩素ガス供給領域と前記原料ガス供給領域との間、及び、前記原料ガス供給領域と前記窒化ガス供給領域との間には、パージガスを前記基板の表面に供給するパージガス供給領域が設けられており、
前記吸着阻害基を形成する工程と前記原料ガスを吸着させる工程との間、及び、前記原料ガスを吸着させる工程と前記窒化膜を堆積させる工程との間には、パージガス供給工程が設けられた請求項11に記載の成膜方法。 - 前記活性化された塩素ガスは、リモートプラズマ発生器により発生させたプラズマにより活性化されるものであって、
前記プラズマパージ工程は、リモートプラズマ発生器により発生させたプラズマによりなされる請求項1から12のいずれか一項に記載の成膜方法。
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