JP2020097793A5 - - Google Patents

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JP2020097793A5
JP2020097793A5 JP2020019213A JP2020019213A JP2020097793A5 JP 2020097793 A5 JP2020097793 A5 JP 2020097793A5 JP 2020019213 A JP2020019213 A JP 2020019213A JP 2020019213 A JP2020019213 A JP 2020019213A JP 2020097793 A5 JP2020097793 A5 JP 2020097793A5
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copper alloy
alloy plate
rolling
plate material
following equation
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NiおよびCoの1種以上を合計で1.0〜5.0質量%、ならびにSiを0.1〜1.5質量%含有し、残部がCuおよび不可避不純物である組成を有し、
導電率が38%IACS以上であり、
圧延平行方向、圧延方向に対し45°の方向、および圧延垂直方向の各方向にそれぞれ切り出した3種類の試験片について、引張試験を行なうことによって得られた公称応力−公称歪曲線から求められる値と、電子後方散乱回折(EBSD)法によって得られたCube方位面積率の値を、下記(1)式に代入して、パラメータAx(x:0°、45°、90°)の各方向の値A0°、A45°およびA90°を求め、求めた前記各方向の値A0°、A45°およびA90°を、下記(2)式に代入して算出される算術平均値Aave.が、4.0〜13.0GPa・%の範囲であり、かつ、前記算術平均値Aave.および前記パラメータAxの値を下記(3)式に代入して算出されるパラメータBx(x:0°、45°、90°)の前記各方向の値B 0° 、B 45° およびB 90° が、いずれも10%以下となることを特徴とする銅合金板材。
Figure 2020097793

但し、S:Cube方位面積率(%)、σは公称応力(GPa)、εは公称歪(%)、そして、ELは破断伸び(%)を表す。
Figure 2020097793
Figure 2020097793
It has a composition in which one or more of Ni and Co are contained in a total amount of 1.0 to 5.0% by mass, and Si is contained in an amount of 0.1 to 1.5% by mass, and the balance is Cu and unavoidable impurities.
Conductivity is 38% IACS or higher,
A value obtained from the nominal stress-nominal strain curve obtained by performing a tensile test on three types of test pieces cut out in each of the rolling parallel direction, the direction of 45 ° with respect to the rolling direction, and the rolling vertical direction. And, by substituting the value of the Cube azimuth area ratio obtained by the electron rear scattering diffraction (EBSD) method into the following equation (1), in each direction of the parameter Ax (x: 0 °, 45 °, 90 °). The arithmetic average value calculated by obtaining the values A 0 ° , A 45 ° and A 90 ° and substituting the obtained values A 0 ° , A 45 ° and A 90 ° in each direction into the following equation (2). Aave. is Ri range der of 4.0~13.0GPa ·%, and the arithmetic average value Aave. and the parameters Bx (x where the value of the parameter Ax is calculated by substituting the following equation (3) : 0 °, 45 °, the copper alloy sheet wherein the respective directions of the value B 0 °, B 45 ° and B 90 ° are both characterized by Rukoto Do and 10% or less of 90 °).
Figure 2020097793

However, Sc : Cube azimuth area ratio (%), σ n represents the nominal stress (GPa), ε n represents the nominal strain (%), and EL represents the elongation at break (%).
Figure 2020097793
Figure 2020097793
前記組成は、さらに、Sn、Mg、Mn、Cr、Zr、Ti、FeおよびZnからなる群から選ばれる少なくとも1種の成分を、合計で0.2〜1.2質量%以下含有する請求項1記載の銅合金板材。 Claimed that the composition further contains at least one component selected from the group consisting of Sn, Mg, Mn, Cr, Zr, Ti, Fe and Zn in an amount of 0.2 to 1.2% by mass or less in total. copper alloy sheet according to 1. 請求項1または2に記載の銅合金板材を絞り加工して得られた絞り加工品。 A drawn product obtained by drawing the copper alloy plate material according to claim 1 or 2. 請求項1または2に記載の銅合金板材または請求項に記載の絞り加工品を用いて作製された電気・電子部品用部材。 A member for electrical / electronic parts manufactured by using the copper alloy plate material according to claim 1 or 2 or the drawn product according to claim 3. 請求項1または2に記載の銅合金板材または請求項に記載の絞り加工品を用いて作製された電磁波シールド材。 An electromagnetic wave shielding material produced by using the copper alloy plate material according to claim 1 or 2 or the drawn product according to claim 3. 請求項1または2に記載の銅合金板材または請求項に記載の絞り加工品を用いて作製された放熱部品。 A heat-dissipating component manufactured by using the copper alloy plate material according to claim 1 or 2 or the drawn product according to claim 3. 請求項1または2に記載の銅合金板材の製造方法であって、
銅合金素材に、鋳造[工程1]、均質化処理[工程2]、熱間圧延[工程3]、面削[工程4]、冷間圧延[工程5]、溶体化熱処理[工程6]、中間熱処理[工程7]、仕上げ冷間圧延[工程8]、矯正[工程9]、および調質焼鈍[工程10]を順次施し、
前記仕上げ冷間圧延[工程8]における圧延時の材料の最大温度Tを、75℃以上100℃以下に制御し、
前記矯正[工程9]における材料の伸び率δを、0.1〜1.0%とし、そして、
前記調質焼鈍[工程10]の材料温度T(℃)を、前記伸び率δとの関係で下記(5)式に示す不等式の関係を満たすように制御することを特徴とする銅合金板材の製造方法。
55×δ+450≧T≧55×δ+350 ・・・(5)
The method for producing a copper alloy plate according to claim 1 or 2.
Casting [process 1], homogenization treatment [process 2], hot rolling [process 3], face milling [process 4], cold rolling [process 5], solution heat treatment [process 6], Intermediate heat treatment [step 7], finish cold rolling [step 8], straightening [step 9], and temper tempering [step 10] are performed in sequence.
Wherein the maximum temperature T R of the rolled upon material in the finish cold rolling [step 8], and controls the 75 ° C. or higher 100 ° C. or less,
The elongation rate δ of the material in the straightening [step 9] is set to 0.1 to 1.0%, and
A copper alloy plate material characterized in that the material temperature TA (° C.) of the temper annealing [step 10] is controlled so as to satisfy the relationship of the inequality shown in the following equation (5) in relation to the elongation rate δ. Manufacturing method.
55 × δ + 450 ≧ T A ≧ 55 × δ + 350 ··· (5)
JP2020019213A 2020-02-06 2020-02-06 Copper alloy sheet material, its manufacturing method, drawn products, electrical and electronic component members, electromagnetic wave shielding materials, and heat dissipation components Active JP7113039B2 (en)

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JP4642701B2 (en) * 2006-05-26 2011-03-02 Jx日鉱日石金属株式会社 Cu-Ni-Si alloy strips with excellent plating adhesion
JP5170864B2 (en) * 2006-09-13 2013-03-27 古河電気工業株式会社 Copper-based precipitation type alloy sheet for contact material and method for producing the same
CN102105610B (en) * 2008-06-03 2013-05-29 古河电气工业株式会社 Copper alloy sheet material and manufacturing method thereof
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CN106661673A (en) * 2014-07-09 2017-05-10 古河电气工业株式会社 Copper alloy sheet material, connector, and method for producing copper alloy sheet material
JP2017089003A (en) * 2015-11-03 2017-05-25 株式会社神戸製鋼所 Copper alloy sheet for heat radiation component
JP6542817B2 (en) * 2016-10-12 2019-07-10 Jx金属株式会社 Copper alloy for electronic materials

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