JP2020088196A - Wiring board and electronic device - Google Patents

Wiring board and electronic device Download PDF

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Publication number
JP2020088196A
JP2020088196A JP2018221355A JP2018221355A JP2020088196A JP 2020088196 A JP2020088196 A JP 2020088196A JP 2018221355 A JP2018221355 A JP 2018221355A JP 2018221355 A JP2018221355 A JP 2018221355A JP 2020088196 A JP2020088196 A JP 2020088196A
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Prior art keywords
wiring board
electronic component
insulating substrate
frame body
connection pad
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秀幸 重延
Hideyuki Shigenobe
秀幸 重延
健児 末次
Kenji Suetsugu
健児 末次
浩平 植川
Kohei Uekawa
浩平 植川
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Kyocera Corp
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Kyocera Corp
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Abstract

To provide a wiring board and the like that can increase the degree of parallelism between an electronic component to be mounted and an optical member.SOLUTION: A wiring board comprises: an insulating substrate 1 that is formed of ceramics and has a first surface 11 the center part of which is a mounting area for an electronic component; concave parts 1a that are provided in the first surface 11 of the insulating substrate 1; and connection pads 2 that are provided on bottom faces of the concave parts 1a. The first surface 11 includes a frame body that is joined to a wiring board 10 being a polished surface and an outer edge part of the first surface 11 and surrounds the mounting area and the connection pads 2.SELECTED DRAWING: Figure 1

Description

本開示は、撮像素子等の電子部品を搭載してレンズや蓋体などの光学部材が接合される配線基板および電子装置に関するものである。 The present disclosure relates to a wiring board and an electronic device to which an electronic component such as an image sensor is mounted and optical members such as a lens and a lid are joined.

撮像素子等の電子部品と、これらと重なるように配置されたレンズ、IR(Infrared Rays:赤外線)カットフィルタやAR(Anti-Reflection:反射防止)膜等を備えた光学蓋体等の光学部材とを備える電子装置がある。このような電子装置としては、例えば配線基板の中央部に設けられた凹部内に電子部品として赤外線撮像素子を収納して搭載し、凹部の開口を塞ぐように反射防止膜や赤外線吸収膜を備えたレンズ状の蓋体光学部材を接合することで電子部品を気密封止しているものがある(例えば、特許文献1を参照。)。また、平板状の配線基板に枠体を接合して凹部を有する基板とし、枠体内に電子部品として撮像素子を搭載し、枠体の開口を覆うようにIRカットフィルタが接着され、さらにその外側にレンズホルダが接合されているものがある(例えば、特許文献2を参照。)。 An electronic component such as an image pickup element, an optical member such as a lens arranged so as to overlap with these, an IR (Infrared Rays: Infrared) cut filter, an optical lid such as an AR (Anti-Reflection: antireflection) film, etc. There is an electronic device provided with. As such an electronic device, for example, an infrared imaging element is housed and mounted as an electronic component in a recess provided in the center of a wiring board, and an antireflection film or an infrared absorption film is provided so as to close the opening of the recess. There is one in which an electronic component is hermetically sealed by joining a lens-shaped lid optical member (see, for example, Patent Document 1). In addition, a frame is joined to a flat wiring substrate to form a substrate having a concave portion, an image pickup device is mounted as an electronic component in the frame, and an IR cut filter is adhered so as to cover the opening of the frame, and further outside thereof. There is one in which a lens holder is joined (see, for example, Patent Document 2).

特開2014−186006号公報JP, 2014-186006, A 特開2014−132644号公報JP, 2014-132644, A

電子装置の小型化、特に薄型化にともない、光学部材と電子部品との平行度に対してより高い精度が求められるようになってきている。そのためには、配線基板の電子部品を搭載する面と光学部材を搭載する面との平行度を高める必要がある。これら2つの面を研磨することで平行度を高めることが考えられるが、特許文献1に記載されているような凹部を有する配線基板の場合は、電子部品を他搭載する面は凹部の底面であるので研磨が困難であった。また、特許文献2に記載されているような平板状の配線基板に枠体を接合する場合でも、電子部品の搭載面を研磨すると電子部品と電気的に接続される接続パッドも研磨されてしまい、接続パッドがなくなって電子部品を接続することができなくなってしまうという課題があった。特に、配線基板がセラミックからなる絶縁基板に配線を設けたものである場合には、接続パッドは絶縁基板と同時焼成で強固に作製されるものであり、研磨後に再度接続パッドを形成すると、接続パッドの強度が低下するおそれがありまたコストが高くなるものであった。 Along with the miniaturization of electronic devices, in particular, the reduction in thickness thereof, higher precision is required for the parallelism between the optical member and the electronic component. For that purpose, it is necessary to increase the parallelism between the surface on which the electronic component of the wiring board is mounted and the surface on which the optical member is mounted. It is possible to increase parallelism by polishing these two surfaces, but in the case of a wiring board having a recess as described in Patent Document 1, the surface on which other electronic components are mounted is the bottom of the recess. Therefore, it was difficult to polish. Further, even when the frame body is bonded to the flat wiring board as described in Patent Document 2, when the mounting surface of the electronic component is polished, the connection pad electrically connected to the electronic component is also polished. However, there is a problem that the connection pad is lost and it becomes impossible to connect the electronic component. In particular, when the wiring substrate is an insulating substrate made of ceramics and wiring is provided, the connection pads are made firmly by co-firing with the insulating substrate. There is a risk that the strength of the pad will decrease and the cost will increase.

本開示の1つの態様による配線基板は、中央部が電子部品の搭載領域である第1面を有するセラミックスからなる絶縁基板と、該絶縁基板の前記第1面に設けられた凹部と、該凹部の底面に設けられた接続パッドと、を備え、前記第1面は研磨面である。 A wiring board according to an aspect of the present disclosure includes an insulating substrate made of ceramics having a first surface whose central portion is a mounting area for electronic components, a concave portion provided on the first surface of the insulating substrate, and the concave portion. And a connection pad provided on the bottom surface of the first surface, and the first surface is a polishing surface.

本開示の1つの態様による電子装置は、上記構成の配線基板と、該配線基板の前記搭載領域に搭載され、前記接続パッドと電気的に接続された電子部品と、前記配線基板の前記第1面の外縁部に接合され、前記電子部品と重なる光学部材を備えている。 An electronic device according to an aspect of the present disclosure includes a wiring board having the above configuration, an electronic component mounted in the mounting area of the wiring board and electrically connected to the connection pad, and the first wiring board. An optical member is provided which is joined to the outer edge of the surface and overlaps with the electronic component.

本開示の1つの態様の配線基板によれば、上記構成であることから、研磨によって平坦度が高められた電子部品の搭載面とその上に配置される光学部材との平行度が高められる
とともに、接続パッドが強固に接合されている配線基板となる。
According to the wiring board of one aspect of the present disclosure, because of the above-described configuration, the parallelism between the mounting surface of the electronic component whose flatness has been increased by polishing and the optical member arranged thereon can be increased. , The wiring board in which the connection pads are firmly joined.

本開示の1つの態様の電子装置によれば、上記構成の配線基板を含むことから、電子部品と光学部材との平行度が高く、光学特性に優れた電子装置となる。 According to the electronic device of one aspect of the present disclosure, since the wiring board having the above configuration is included, the electronic device has a high degree of parallelism between the electronic component and the optical member and is excellent in optical characteristics.

配線基板の一例を示す斜視図であり、(a)は第1面側からの斜視図であり、(b)は第2面側からの斜視図である。It is a perspective view which shows an example of a wiring board, (a) is a perspective view from the 1st surface side, (b) is a perspective view from the 2nd surface side. (a)は図1に示す配線基板の平面図であり、(b)は(a)のB−B線における断面図である。(A) is a plan view of the wiring board shown in FIG. 1, and (b) is a cross-sectional view taken along line BB of (a). 配線基板の他の一例を示す斜視図であり、(a)は第1面側からの斜視図であり、(b)は第2面側からの斜視図である。It is a perspective view which shows another example of a wiring board, (a) is a perspective view from the 1st surface side, (b) is a perspective view from the 2nd surface side. (a)は図3に示す配線基板の平面図であり、(b)は(a)のB−B線における断面図である。(A) is a plan view of the wiring board shown in FIG. 3, and (b) is a cross-sectional view taken along line BB of (a). 電子装置の一例を示し、(a)は斜視図であり、(b)は(a)のB−B線における断面図である。An example of an electronic device is shown, (a) is a perspective view, (b) is sectional drawing in the BB line of (a). 電子装置の他の一例を示し、(a)は斜視図であり、(b)は(a)のB−B線における断面図である。FIG. 10A is a perspective view, and FIG. 9B is a cross-sectional view taken along line BB of FIG. 電子装置の他の一例を示し、(a)は斜視図であり、(b)は(a)のB−B線における断面図である。おける断面図である。FIG. 10A is a perspective view, and FIG. 9B is a cross-sectional view taken along line BB of FIG. FIG.

本発明の実施形態の配線基板および電子装置について、添付の図面を参照して説明する。なお、以下の説明における上下の区別は便宜的なものであり、実際に配線基板等が使用されるときの上下を限定するものではない。図1は配線基板の一例を示す斜視図であり、図1(a)は第1面側からの斜視図であり、図1(b)は第2面側からの斜視図である。図2(a)は図1に示す配線基板の平面図であり、図2(b)は図2(a)のB−B線における断面図である。図3は配線基板の他の一例を示す斜視図であり、図3(a)は第1面側からの斜視図であり、図3(b)は第2面側からの斜視図である。図4(a)は図3に示す配線基板の平面図であり、図4(b)は図4(a)のB−B線における断面図である。図5〜図7はそれぞれ電子装置の一例を示し、それぞれの図において(a)は斜視図であり、(b)は(a)のB−B線における断面図である。なお、これらの斜視図および平面図において、他と区別しやすいように、接続パッド2および外部端子3にはドット状の網掛けを施している。 A wiring board and an electronic device according to embodiments of the present invention will be described with reference to the accompanying drawings. The distinction between upper and lower sides in the following description is for convenience, and does not limit the upper and lower sides when a wiring board or the like is actually used. FIG. 1 is a perspective view showing an example of a wiring board, FIG. 1(a) is a perspective view from the first surface side, and FIG. 1(b) is a perspective view from the second surface side. 2A is a plan view of the wiring board shown in FIG. 1, and FIG. 2B is a cross-sectional view taken along line BB of FIG. 2A. FIG. 3 is a perspective view showing another example of the wiring board, FIG. 3(a) is a perspective view from the first surface side, and FIG. 3(b) is a perspective view from the second surface side. 4A is a plan view of the wiring board shown in FIG. 3, and FIG. 4B is a cross-sectional view taken along the line BB of FIG. 4A. 5 to 7 each show an example of an electronic device, in each of which (a) is a perspective view and (b) is a cross-sectional view taken along line BB of (a). In these perspective views and plan views, the connection pads 2 and the external terminals 3 are shaded in a dot shape so as to be easily distinguished from others.

配線基板10は、図1および図2に示す例のように、中央部が電子部品20の搭載領域である第1面11を有するセラミックスからなる絶縁基板1と、絶縁基板1の第1面11に設けられた凹部1aと、凹部1aの底面に設けられた接続パッド2とを備えている。そして、第1面11は研磨面である。 The wiring board 10 is, as in the example shown in FIGS. 1 and 2, an insulating substrate 1 made of ceramics having a first surface 11 whose central portion is a mounting region of the electronic component 20, and a first surface 11 of the insulating substrate 1. And a connection pad 2 provided on the bottom surface of the recess 1a. The first surface 11 is a polishing surface.

このような配線基板10によれば、セラミックスからなる絶縁基板1の第1面11の中央部が電子部品20の搭載領域である。この電子部品20の搭載領域を含む面(第1面11)が研磨面であることから、第1面11の平坦度が高いものとなる。そのため、搭載面を含む第1面11に光学部材30を搭載した際に、光学部材30と搭載面との平行度を高いものとすることができる。また、搭載面に搭載される電子部品20と電気的に接続される接続パッド2は、第1面11に設けられた凹部1aの底面に設けられている。そのため、配線基板10を作製する際の絶縁基板1の研磨工程において、接続パッド2は研磨されてしまうことがない。そして、この接続パッド2はセラミックからなる絶縁基板1と同時焼成で作製することができるので、研磨後に接続パッドを形成する場合に比較して、接続パッド2の接合強度が高く、低コストの配線基板10となる。 According to such a wiring board 10, the central portion of the first surface 11 of the insulating substrate 1 made of ceramics is the mounting area of the electronic component 20. Since the surface (first surface 11) including the mounting area of the electronic component 20 is a polished surface, the flatness of the first surface 11 is high. Therefore, when the optical member 30 is mounted on the first surface 11 including the mounting surface, the parallelism between the optical member 30 and the mounting surface can be increased. Further, the connection pad 2 electrically connected to the electronic component 20 mounted on the mounting surface is provided on the bottom surface of the recess 1 a provided on the first surface 11. Therefore, the connection pad 2 is not polished in the polishing process of the insulating substrate 1 when manufacturing the wiring substrate 10. Since the connection pad 2 can be produced by co-firing with the insulating substrate 1 made of ceramic, the connection pad 2 has a higher bonding strength and a lower cost wiring than in the case where the connection pad is formed after polishing. It becomes the substrate 10.

また、図3および図4に示す例のように、絶縁基板1の第1面11の外縁部に接合され、搭載領域および接続パッド2を囲む枠体5を備えている配線基板10とすることができる。この場合には、枠体5は上面と下面との平行度が高いものを用い、研磨して平坦度の高い、枠体5の下面が絶縁基板1の第1面11に接合されている。そのため、配線基板10における電子部品20の搭載面と光学部材30の搭載面(接合面)である枠体5の上面との平行度が高いものとなる。また、電子部品20の搭載面および接続パッド2は枠体5に囲まれており、電子部品20は、配線基板10の第1面11と枠体5とで構成される凹部内に収容されるので、外部との接触が起こり難くなり、電子部品20の保護性が向上する。また、例えば、光学膜を備える蓋体等の光学部材30を枠体5の開口を塞いで枠体5の上面に接合することで、電子部品20の気密封止を容易に行なうことができる。 Further, as in the example shown in FIGS. 3 and 4, the wiring board 10 is provided with the frame body 5 that is joined to the outer edge portion of the first surface 11 of the insulating substrate 1 and surrounds the mounting region and the connection pad 2. You can In this case, the frame body 5 having a high parallelism between the upper surface and the lower surface is used, and the lower surface of the frame body 5 having high flatness by polishing is bonded to the first surface 11 of the insulating substrate 1. Therefore, the parallelism between the mounting surface of the electronic component 20 on the wiring board 10 and the upper surface of the frame body 5 which is the mounting surface (bonding surface) of the optical member 30 is high. Further, the mounting surface of the electronic component 20 and the connection pad 2 are surrounded by the frame body 5, and the electronic component 20 is housed in the recess formed by the first surface 11 of the wiring board 10 and the frame body 5. Therefore, contact with the outside is less likely to occur, and the protection of the electronic component 20 is improved. Further, for example, the optical member 30 such as a lid provided with an optical film is closed on the opening of the frame body 5 and bonded to the upper surface of the frame body 5, whereby the electronic component 20 can be easily hermetically sealed.

図1および図2に示す例の配線基板10と、図3および図4に示す例の配線基板10とでは、接続パッド2の数および大きさは同じであるが、絶縁基板1の第1面11に設けられている凹部1aの数および大きさが異なる。図1および図2に示す例の配線基板10では、凹部1aは平面視で接続パッド2より一回り大きい大きさで、20個の接続パッドのそれぞれに対応して20個の凹部1aが設けられている。言い換えれば、20個の凹部1aのそれぞれの底面に接続パッド2が1つずつ設けられている。これに対して、図3および図4に示す例の配線基板10では、凹部1aは、10個ずつ2列に配置された接続パッド2のうち、各列に対応する大きさのものが2つ設けられている。2つの凹部1aのそれぞれの底面に、10個の接続パッドが1列に配列されて設けられている。凹部1aおよび接続パッド2の形状、大きさ、配置および数についてはこれらに限られるものではなく、接続パッド2が凹部1aの底面に設けられていれば特に制限はない。 The wiring board 10 of the example shown in FIGS. 1 and 2 and the wiring board 10 of the examples shown in FIGS. 3 and 4 have the same number and size of the connection pads 2, but the first surface of the insulating substrate 1 is the same. The number and size of the recesses 1a provided in 11 are different. In the wiring board 10 of the example shown in FIGS. 1 and 2, the recess 1a is one size larger than the connection pad 2 in plan view, and 20 recesses 1a are provided corresponding to each of the 20 connection pads. ing. In other words, one connection pad 2 is provided on the bottom surface of each of the 20 recesses 1a. On the other hand, in the wiring board 10 of the example shown in FIGS. 3 and 4, of the connection pads 2 arranged in two rows of ten recesses 1a, two of the size corresponding to each row are provided. It is provided. Ten connection pads are arranged in a line on the bottom surface of each of the two recesses 1a. The shapes, sizes, arrangements and numbers of the recesses 1a and the connection pads 2 are not limited to these, and there is no particular limitation as long as the connection pads 2 are provided on the bottom surface of the recesses 1a.

絶縁基板1の第1面11以外の面には外部端子3が設けられている。図1および図2に示す例では、外部端子3は、絶縁基板1の第1面11とは反対側の第2面12に設けられている。図3および図4に示す例では、外部端子3は絶縁基板1の第2面12から絶縁基板1の側面に設けられた切欠きの内面にかけて設けられている。外部端子3は、外部回路と電気的に接続するための端子電極である。図3および図4に示す例のような外部端子3を備えていることで、配線基板10の側面から外部回路基板の電極にかけてはんだ等の接合材のフィレットが形成されるので、配線基板10(電子装置100)の外部回路基板への実装強度および実装信頼性がより高いものとなる。一方、外部端子3が第2面12だけに設けられていると、配線基板10(電子装置100)を外部回路基板へ実装した際に、はんだ等の接合材が大きく広がることがないのでより小さい実装面積となる。 External terminals 3 are provided on the surface of the insulating substrate 1 other than the first surface 11. In the example shown in FIGS. 1 and 2, the external terminal 3 is provided on the second surface 12 of the insulating substrate 1 opposite to the first surface 11. In the example shown in FIGS. 3 and 4, the external terminal 3 is provided from the second surface 12 of the insulating substrate 1 to the inner surface of the notch provided on the side surface of the insulating substrate 1. The external terminal 3 is a terminal electrode for electrically connecting to an external circuit. By providing the external terminal 3 as in the example shown in FIGS. 3 and 4, a fillet of a bonding material such as solder is formed from the side surface of the wiring board 10 to the electrodes of the external circuit board. The mounting strength and the mounting reliability of the electronic device 100) on the external circuit board become higher. On the other hand, when the external terminal 3 is provided only on the second surface 12, the bonding material such as solder does not spread greatly when the wiring board 10 (electronic device 100) is mounted on the external circuit board, which is smaller. It is the mounting area.

接続パッド2と外部端子3とは絶縁基板1の内部に設けられた内部配線4によって電気的に接続されている。すなわち、配線基板10は、絶縁基板1に接続パッド2、内部配線4および外部端子3といった配線が形成されたものである。これにより、配線基板10に搭載され接続パッド2に電気的に接続された電子部品20は、配線基板10の接続パッド2、内部配線4および外部端子3を介して外部回路と電気的に接続される。 The connection pad 2 and the external terminal 3 are electrically connected by the internal wiring 4 provided inside the insulating substrate 1. That is, the wiring board 10 is formed by forming the connection pad 2, the internal wiring 4, and the external terminal 3 on the insulating substrate 1. As a result, the electronic component 20 mounted on the wiring board 10 and electrically connected to the connection pads 2 is electrically connected to an external circuit via the connection pads 2, the internal wiring 4, and the external terminals 3 of the wiring board 10. It

図5に示す例の電子装置100は、図1および図2に示す例の配線基板10に電子部品20および光学部材30を搭載した例を示している。この例のように、上記配線基板10と、配線基板10の搭載領域に搭載され、接続パッド2と電気的に接続された電子部品20と、配線基板10の第1面11の外縁部に接合され、電子部品20と重なる光学部材30を備えている電子装置100とすることができる。 The electronic device 100 of the example illustrated in FIG. 5 is an example in which the electronic component 20 and the optical member 30 are mounted on the wiring board 10 of the example illustrated in FIGS. 1 and 2. As in this example, the wiring board 10 and the electronic component 20 mounted in the mounting area of the wiring board 10 and electrically connected to the connection pads 2 are joined to the outer edge portion of the first surface 11 of the wiring board 10. The electronic device 100 includes the optical member 30 that overlaps with the electronic component 20.

図6に示す例の電子装置100は、図3および図4に示す例のような枠体5を備える配線基板10に電子部品20および光学部材30を搭載した例を示している。この例のように、上記の配線基板10と、配線基板10の搭載領域に搭載され、接続パッド2と電気的
に接続された電子部品20と、配線基板10の枠体5上に接合され、電子部品20と重なる光学部材30とを備えている電子装置100とすることができる。
The electronic device 100 of the example illustrated in FIG. 6 is an example in which the electronic component 20 and the optical member 30 are mounted on the wiring board 10 including the frame body 5 as in the examples illustrated in FIGS. 3 and 4. As in this example, the wiring board 10 and the electronic component 20 mounted on the mounting area of the wiring board 10 and electrically connected to the connection pads 2 are bonded to the frame body 5 of the wiring board 10. The electronic device 100 may include the optical member 30 that overlaps the electronic component 20.

このような電子装置100によれば、上記構成の配線基板10を含むことから、電子部品20と光学部材30との平行度が高く、光学特性に優れた電子装置100となる。 According to such an electronic device 100, the electronic device 100 including the wiring board 10 having the above-described configuration has a high degree of parallelism between the electronic component 20 and the optical member 30 and has excellent optical characteristics.

図5に示す例の電子装置100においては、電子部品20が配線基板10の(絶縁基板1の)第1面11の中央部に搭載され、不図示の接合材で固定されている。電子部品20の電極(不図示)と配線基板10の接続パッド2とは、接続部材21としてボンディングワイヤで電気的に接続されている。また、第1面11の外縁部には光学部材30が接合部材31で接合され固定されている。この例における光学部材30は、角管状の保持部材33によって2つの透光性部材32が保持された形態である。例えば、下側(配線基板10に近い側)の透光性部材32は電子部品20を気密封止するための蓋体であり、上側(配線基板10から遠い側)の透光性部材32はレンズである。また、レンズは上下に可動するようになっていてもよい。 In the electronic device 100 of the example shown in FIG. 5, the electronic component 20 is mounted on the central portion of the first surface 11 (of the insulating substrate 1) of the wiring board 10 and fixed by a bonding material (not shown). The electrodes (not shown) of the electronic component 20 and the connection pads 2 of the wiring board 10 are electrically connected by the bonding wires as the connection members 21. The optical member 30 is joined and fixed to the outer edge of the first surface 11 by a joining member 31. The optical member 30 in this example has a shape in which two light-transmissive members 32 are held by a holding member 33 having a rectangular tubular shape. For example, the lower transparent member 32 (closer to the wiring substrate 10) is a lid for hermetically sealing the electronic component 20, and the upper transparent member 32 (farther from the wiring substrate 10) is It is a lens. Further, the lens may be movable up and down.

図6に示す例の電子装置100においても、電子部品20が配線基板10の(絶縁基板1の)第1面11の中央部に搭載され、不図示の接合材で固定されている。電子部品20の電極(不図示)と配線基板10の接続パッド2とは、接続部材21としてボンディングワイヤで電気的に接続されている。そして、枠体5の上面には光学部材30が接合部材31で接合され固定されている。この例における光学部材30は1つの透光性部材32だけである。この透光性部材32は、蓋体であり、電子部品20を気密封止している。蓋体は、一部または全体がレンズとして機能するものであってもよい。 Also in the electronic device 100 of the example shown in FIG. 6, the electronic component 20 is mounted on the central portion of the first surface 11 (of the insulating substrate 1) of the wiring board 10 and fixed by a bonding material (not shown). The electrodes (not shown) of the electronic component 20 and the connection pads 2 of the wiring board 10 are electrically connected by the bonding wires as the connection members 21. The optical member 30 is joined and fixed to the upper surface of the frame body 5 by a joining member 31. The optical member 30 in this example is only one transparent member 32. The translucent member 32 is a lid, and hermetically seals the electronic component 20. The lid may partially or entirely function as a lens.

図7に示す例の電子装置100は、図6に示す例の電子装置100の上にさらに透光性部材32を配置したような例である。図6に示す例と同様に、枠体5の上面には平板状の光学部材30が接合部材31で接合され固定されている。そして、さらにその上に保持部材33で保持された凸レンズ状の透光性部材32が配置されている。保持部材33は外形が四角形で内形が円形であり、接合部材31で下側の透光性部材32の上面(の外縁部)に接合されている。この例においても、下側の透光性部材32によって電子部品20が気密に封止されており、またレンズは上下に可動するようになっていてもよい。 The electronic device 100 of the example shown in FIG. 7 is an example in which the translucent member 32 is further arranged on the electronic device 100 of the example shown in FIG. Similar to the example shown in FIG. 6, a flat plate-shaped optical member 30 is joined and fixed to the upper surface of the frame body 5 by a joining member 31. Further, a convex lens-shaped light-transmissive member 32 held by a holding member 33 is arranged thereon. The holding member 33 has a quadrangular outer shape and a circular inner shape, and is joined to the upper surface (outer edge portion thereof) of the lower transparent member 32 by a joining member 31. Also in this example, the electronic component 20 may be hermetically sealed by the lower light-transmissive member 32, and the lens may be vertically movable.

図5および図6に示す例では、配線基板10に2列に配置された接続パッド2の間に電子部品が搭載されている。そして、電子部品20の電極(不図示)と配線基板10の接続パッド2とは接続部材21としてボンディングワイヤで電気的に接続されている。これに対して、図7に示す例では、電子部品20は接続パッド2と重なるように搭載されている。そして、電子部品20の電極(不図示)と配線基板10の接続パッド2とが重なっており、これらははんだあるいは導電性接着剤などの導電性の接続部材21で電気的に接続されている。 In the example shown in FIGS. 5 and 6, electronic components are mounted on the wiring board 10 between the connection pads 2 arranged in two rows. The electrodes (not shown) of the electronic component 20 and the connection pads 2 of the wiring board 10 are electrically connected as bonding members 21 by bonding wires. On the other hand, in the example shown in FIG. 7, the electronic component 20 is mounted so as to overlap the connection pad 2. The electrodes (not shown) of the electronic component 20 and the connection pads 2 of the wiring board 10 overlap each other, and these are electrically connected by a conductive connection member 21 such as solder or a conductive adhesive.

絶縁基板1は、配線基板10の基本的な構造部分であり、配線基板10としての機械的な強度の確保、および複数の接続パッド2等の配線導体間の絶縁性の確保等の機能を有している。絶縁基板1は、例えば上から見たときに(平面視において)正方形状等の四角形状である。四角形状とは、厳密な四角形だけではなく、例えば四角形の角部が丸められた形状等を含むことを意味するものである。 The insulating substrate 1 is a basic structural portion of the wiring substrate 10, and has functions such as ensuring mechanical strength of the wiring substrate 10 and ensuring insulation between wiring conductors such as a plurality of connection pads 2. is doing. The insulating substrate 1 has, for example, a quadrangular shape such as a square shape (in a plan view) when viewed from above. The quadrilateral shape means not only a strict quadrangle but also a shape in which the corners of the quadrangle are rounded, for example.

絶縁基板1の寸法は、例えば、四角形の一辺の長さが3mm〜25mmで、厚みが0.25mm〜2mmである。 Regarding the dimensions of the insulating substrate 1, for example, the length of one side of the quadrangle is 3 mm to 25 mm, and the thickness is 0.25 mm to 2 mm.

この絶縁基板1の第1面11(上面)に凹部1aを有しており、凹部1aの底面に接続
パッド2が設けられている。凹部1aの平面視の形状はおよび大きさは特に限定されるものではない。図1および図2に示す例では、凹部1aの底面の大きさは接続パッド2より一回り大きく、接続パッド2の全体が露出している。図3および図4に示す例では凹部1aの底面に複数の接続パッド2が設けられているが、いずれの接続パッド2も全体が露出している。これに対して、図7に示す例では、接続パッド2の端部は絶縁基板1内に位置し、中央部が凹部1a内に露出している。このように、凹部1aと接続パッド2との平面視の大きさの関係は、凹部1aの大きさが、接続部材21によって電子部品20(の電極)と接続可能な程度に、接続パッド2が露出するような大きさであればよい。また、凹部1aの深さが深いと接続部材21による接続性が低下する場合があるので、第1面11から接続パッド2の表面までの深さは、例えば0.03mm〜1mmとすることができる。この深さは第1面11の研磨加工で調節することができる。
The first surface 11 (upper surface) of the insulating substrate 1 has a recess 1a, and the connection pad 2 is provided on the bottom surface of the recess 1a. The shape and size of the recess 1a in plan view are not particularly limited. In the example shown in FIGS. 1 and 2, the size of the bottom surface of the recess 1 a is slightly larger than that of the connection pad 2, and the entire connection pad 2 is exposed. In the example shown in FIGS. 3 and 4, a plurality of connection pads 2 are provided on the bottom surface of the recess 1a, but all the connection pads 2 are entirely exposed. On the other hand, in the example shown in FIG. 7, the end portion of the connection pad 2 is located in the insulating substrate 1 and the central portion is exposed in the recess 1a. As described above, the relationship between the size of the recess 1 a and the connection pad 2 in plan view is that the size of the recess 1 a is such that the connection pad 2 can be connected to (the electrode of) the electronic component 20 by the connection member 21. The size may be such that it is exposed. Further, if the depth of the concave portion 1a is deep, the connectivity by the connecting member 21 may be deteriorated, so the depth from the first surface 11 to the surface of the connection pad 2 may be, for example, 0.03 mm to 1 mm. it can. This depth can be adjusted by polishing the first surface 11.

絶縁基板1は、例えば酸化アルミニウム質焼結体、ガラスセラミック焼結体、ムライト質焼結体または窒化アルミニウム質焼結体等のセラミックスからなるものである。セラミックスからなる複数の絶縁層が積層されて形成されている。図2および図4〜図6に示す例では絶縁層は4層であるが、絶縁層の層数はこれらに限られるものではない。 The insulating substrate 1 is made of a ceramic such as an aluminum oxide sintered body, a glass ceramic sintered body, a mullite sintered body, or an aluminum nitride sintered body. It is formed by laminating a plurality of insulating layers made of ceramics. Although the number of insulating layers is four in the examples shown in FIGS. 2 and 4 to 6, the number of insulating layers is not limited to these.

絶縁基板1は、例えば酸化アルミニウム質焼結体からなる場合であれば、次のようにして製作することができる。すなわち、まず、絶縁層となるセラミックグリーンシートを作製する。酸化アルミニウムおよび酸化ケイ素等の原料粉末を適当な有機バインダおよび有機溶剤とともにシート状に成形して四角シート状の複数のセラミックグリーンシートを作製する。次にこれらのセラミックグリーンシートを積層して積層体を作製する。凹部1aは、セラミックグリーンシートに金型等を用いて貫通孔を設けておくことで形成することができる。図2および図4〜図6に示す例では凹部1aが形成される絶縁層は1層であるが、2層以上の絶縁層にわたって形成されていてもよい。また、図3、図4および図6に示す例のように、絶縁基板1の第2面12から絶縁基板1の側面に切欠きが設けられる場合には、グリーンシートの切欠きとなる部分に貫通孔を設けておくことで切欠きを形成することができる。その後、この積層体を1300〜1600℃の温度で焼成することによってセラミック基板となる。このセラミック基板の少なくとも一方の面(第1の面11となる面)を研磨して平坦にすることで絶縁基板1を製作することができる。セラミック基板の研磨は、砥石等を用いた機械研磨、研磨剤(砥粒)と研磨液を用いた化学機械研磨等の従来周知の方法を用いて行なうことができる。研磨後の絶縁基板1の第1面11の平坦度は10μm〜20um程度である.。 If the insulating substrate 1 is made of, for example, an aluminum oxide sintered body, it can be manufactured as follows. That is, first, a ceramic green sheet to be an insulating layer is manufactured. Raw material powders such as aluminum oxide and silicon oxide are formed into a sheet shape together with an appropriate organic binder and an organic solvent to produce a plurality of square sheet-shaped ceramic green sheets. Next, these ceramic green sheets are laminated to produce a laminated body. The recess 1a can be formed by providing a through hole in the ceramic green sheet using a mold or the like. In the example shown in FIGS. 2 and 4 to 6, the recess 1a is formed in one insulating layer, but it may be formed in two or more insulating layers. When a cutout is provided on the side surface of the insulating substrate 1 from the second surface 12 of the insulating substrate 1 as in the example shown in FIGS. The notch can be formed by providing the through hole. After that, the laminated body is fired at a temperature of 1300 to 1600° C. to form a ceramic substrate. The insulating substrate 1 can be manufactured by polishing and flattening at least one surface (the surface that becomes the first surface 11) of this ceramic substrate. Polishing of the ceramic substrate can be performed by using a conventionally known method such as mechanical polishing using a grindstone or the like, chemical mechanical polishing using a polishing agent (abrasive grains) and a polishing liquid. The flatness of the first surface 11 of the insulating substrate 1 after polishing is about 10 μm to 20 μm.

絶縁基板1を含む配線基板10は、このような配線基板10となる複数の基板領域が母基板に配列された多数個取り基板として製作することもできる。複数の基板領域を含む母基板を、基板領域毎に分割して複数の配線基板10をより効率よく製作することもできる。この場合には、母基板のうち基板領域の境界に沿って分割用の溝が設けられていてもよい。また、多数個取り基板の各基板領域に電子部品20を搭載した後に、これを分割して複数の電子装置100を得るようにしてもよい。 The wiring substrate 10 including the insulating substrate 1 can also be manufactured as a multi-piece substrate in which a plurality of substrate regions to be the wiring substrate 10 are arranged on a mother substrate. A mother board including a plurality of board regions can be divided for each board region to more efficiently manufacture a plurality of wiring boards 10. In this case, a dividing groove may be provided along the boundary of the substrate region of the mother substrate. In addition, after mounting the electronic component 20 on each substrate region of the multi-cavity substrate, this may be divided to obtain a plurality of electronic devices 100.

絶縁基板1の表面および内部には接続パッド2、外部端子3および内部配線4等の配線導体が設けられている。接続パッド2は凹部1aの底面に設けられている導体層である。図2および図4〜図6に示す例では、内部配線は、絶縁層間の導体層と絶縁層を貫通する貫通導体とで構成されている。外部端子3は、図1および図2に示す例では絶縁基板1の第2面12に設けられた導体層であり、図3および図4に示す例では絶縁基板1の第2面12から絶縁基板1の側面に設けられた切欠きの内面にかけて設けられた導体層である。また、図7に示す例のように、外部端子3は、絶縁基板1の第2面12に設けられた導体層と切欠きに充填された導体とで構成されたものとすることもできる。切欠きに充填された導体は、貫通導体でもあり、貫通導体を縦に(上下方向に)割ったような形状である。 Wiring conductors such as connection pads 2, external terminals 3, and internal wirings 4 are provided on the surface and inside of the insulating substrate 1. The connection pad 2 is a conductor layer provided on the bottom surface of the recess 1a. In the example shown in FIGS. 2 and 4 to 6, the internal wiring is composed of a conductor layer between insulating layers and a through conductor penetrating the insulating layer. The external terminal 3 is a conductor layer provided on the second surface 12 of the insulating substrate 1 in the examples shown in FIGS. 1 and 2, and is insulated from the second surface 12 of the insulating substrate 1 in the examples shown in FIGS. It is a conductor layer provided over the inner surface of the notch provided in the side surface of the substrate 1. Further, as in the example shown in FIG. 7, the external terminal 3 may be configured by a conductor layer provided on the second surface 12 of the insulating substrate 1 and a conductor filled in the cutout. The conductor filled in the notch is also a through conductor, and has a shape that is obtained by vertically dividing the through conductor in the vertical direction.

配線導体は、例えば、タングステン、モリブデン、マンガン、銅、銀、パラジウム、金、白金、ニッケルまたはコバルト等の金属、またはこれらの金属を含む合金の金属材料を導体材料として主に含むものである。配線導体は、このような金属材料の粉末が絶縁層と同時焼成で焼結されたいわゆるメタライズ金属として絶縁基板1に設けられている。 The wiring conductor mainly contains, as a conductor material, a metal material such as a metal such as tungsten, molybdenum, manganese, copper, silver, palladium, gold, platinum, nickel or cobalt, or an alloy containing these metals. The wiring conductor is provided on the insulating substrate 1 as a so-called metallized metal in which powder of such a metal material is co-fired with the insulating layer.

配線導体の接続パッド2、外部端子3の導体層および内部配線4の導体層は、例えば、タングステンのメタライズ層である場合には、タングステンの粉末を有機溶剤および有機バインダと混合して作製した金属ペーストを絶縁基板1となるセラミックグリーンシートの所定位置にスクリーン印刷法等の方法で印刷して焼成する方法で形成することができる。また、内部配線4の貫通導体は、上記の金属ペーストの印刷に先駆けてセラミックグリーンシートの所定の位置に貫通孔を設け、上記と同様の金属ペーストをこの貫通孔に充填しておくことで形成することができる。外部端子3の切欠き内の部分が充填導体である場合も同様にして形成することができる。 When the connection pad 2 of the wiring conductor, the conductor layer of the external terminal 3 and the conductor layer of the internal wiring 4 are, for example, a metallization layer of tungsten, a metal prepared by mixing tungsten powder with an organic solvent and an organic binder. The paste can be formed by printing the paste on a predetermined position of the ceramic green sheet to be the insulating substrate 1 by a method such as a screen printing method and firing the paste. The through conductor of the internal wiring 4 is formed by forming a through hole at a predetermined position on the ceramic green sheet prior to printing the above metal paste and filling the same metal paste as the above into the through hole. can do. It can be formed in the same manner even when the portion inside the notch of the external terminal 3 is the filling conductor.

また、接続パッド2および外部端子3となるメタライズ層の露出表面には、電解めっき法または無電解めっき法等のめっき法でニッケルおよび金等のめっき層がさらに被着されていてもよい。この場合、前述したように多数個取り基板の形態で配線基板10または電子装置100を製作する際に、複数の基板領域の配線導体を互いに電気的に接続させておけば、複数の配線基板10の配線導体に一括してめっき層を被着させることもできる。 Further, the exposed surface of the metallized layer to be the connection pad 2 and the external terminal 3 may be further coated with a plating layer such as nickel and gold by a plating method such as an electrolytic plating method or an electroless plating method. In this case, when the wiring board 10 or the electronic device 100 is manufactured in the form of a multi-piece board as described above, if the wiring conductors in the plurality of board regions are electrically connected to each other, the plurality of wiring boards 10 may be formed. It is also possible to collectively apply the plating layer to the wiring conductors.

配線基板10が枠体5を有する場合には、枠体5を接合材51で絶縁基板1の第1面11の外縁部に接合すればよい。枠体5は、絶縁基板1と同時またはそれ以外のセラミックスまたは鉄−ニッケル(Fe−Ni)合金、鉄−ニッケル−コバルト(Fe−Ni−Co)合金、または鉄(Fe)等の金属、エポキシ、液晶ポリマー等の樹脂からなるものである。樹脂の場合は、熱膨張係数の調整のためにセラミックフィラーを含有するものであってもよい。上記のような絶縁基板1のセラミックスとの間で熱膨張係数の差が小さいものを用いるとよい。 When the wiring board 10 has the frame body 5, the frame body 5 may be bonded to the outer edge portion of the first surface 11 of the insulating substrate 1 with the bonding material 51. The frame 5 is made of ceramics at the same time as or other than the insulating substrate 1, iron-nickel (Fe-Ni) alloy, iron-nickel-cobalt (Fe-Ni-Co) alloy, metal such as iron (Fe), epoxy. , A resin such as a liquid crystal polymer. In the case of resin, it may contain a ceramic filler for adjusting the thermal expansion coefficient. It is preferable to use a material having a small difference in thermal expansion coefficient from the ceramic of the insulating substrate 1 as described above.

接合材51は、例えば、ガラス、樹脂接着剤である。気密封止性、吸湿性等の点ではガラスを用いることができる。 The bonding material 51 is, for example, glass or a resin adhesive. Glass can be used in terms of airtightness and hygroscopicity.

枠体5は、絶縁基板1の外形と同程度の大きさ、形状の枠体である。枠体5の高さは、枠体5と絶縁基板1の第1面11とで形成される凹部空間内に電子部品20およびワイヤボンディング等の接続部材21を収容できるような高さであり、例えば0.5mm〜3mmとすることができる。また、枠体5は上面と下面との間の平行度が高いものであり、例えば平行度が50μm以下のものである。 The frame body 5 is a frame body having the same size and shape as the outer shape of the insulating substrate 1. The height of the frame body 5 is such that the electronic component 20 and the connection member 21 such as wire bonding can be accommodated in the recessed space formed by the frame body 5 and the first surface 11 of the insulating substrate 1. For example, it can be 0.5 mm to 3 mm. The frame 5 has a high degree of parallelism between the upper surface and the lower surface, for example, a degree of parallelism of 50 μm or less.

枠体5がセラミックスからなる場合であれば、例えば、セラミックグリーンシートを打ち抜き加工して焼成し、研磨加工をすることで平行度の高い枠体5とすることができる。あるいは、金型プレスでセラミック粉末を枠状に成型して焼成した後に研磨加工することでも作製することができる。枠体5が金属からなる場合であれば、上下面が平行な金属板を打ち抜き加工することで所定形状にすることができ、さらに研磨加工をすることで平行度を高めることができる。枠体5が樹脂からなる場合であれば、金型により枠形状に成型することで所定形状にすることができ、さらに研磨加工をすることでより平行度を高めることができる。枠体5の腐食防止のために、あるいは枠体5光学部材30とのはんだによる接合のために、枠体5の表面には、電解めっき法または無電解めっき法等のめっき法でニッケルおよび金等のめっき層がさらに被着されていてもよい。 When the frame body 5 is made of ceramics, for example, the ceramic green sheet can be punched, fired, and polished to form the frame body 5 with high parallelism. Alternatively, it can also be produced by molding the ceramic powder into a frame shape with a die press, firing it, and then polishing it. When the frame body 5 is made of metal, a metal plate whose upper and lower surfaces are parallel can be punched to have a predetermined shape, and polishing can be performed to increase parallelism. When the frame body 5 is made of resin, it can be formed into a predetermined shape by molding it into a frame shape with a mold, and further parallelism can be increased by further polishing. In order to prevent corrosion of the frame body 5 or to join the frame body 5 to the optical member 30 by solder, the surface of the frame body 5 is plated with nickel and gold by a plating method such as an electrolytic plating method or an electroless plating method. A plating layer such as the above may be further applied.

上記のような枠体5を第1面11が平坦に研磨された絶縁基板1上に接合材51を介し
て載置して加熱するなどして接合することで、光学部材30が接合される枠体5の上面と電子部品20が搭載される第1面11との平行度が高いものとなる。枠体5を接合する際には荷重を加えるなどして、絶縁基板1の第1面11と枠体5とが平行になるよう調整しながら接合することができる。
The optical member 30 is bonded by mounting the frame body 5 on the insulating substrate 1 having the first surface 11 flatly polished via the bonding material 51 and bonding the frame body 5 by heating. The parallelism between the upper surface of the frame body 5 and the first surface 11 on which the electronic component 20 is mounted is high. When the frame body 5 is joined, it is possible to join the frame body 5 by adjusting the load so that the first surface 11 of the insulating substrate 1 and the frame body 5 are parallel to each other.

このような配線基板10の搭載領域上に電子部品20が搭載され、絶縁基板1の第1面11の外縁部あるいは枠体5の上に光学部材30が搭載される(接合される)ことで電子装置100となる。 By mounting the electronic component 20 on the mounting area of the wiring board 10 and mounting (joining) the optical member 30 on the outer edge portion of the first surface 11 of the insulating substrate 1 or on the frame body 5. It becomes the electronic device 100.

電子部品20としては、例えば、CCD(Charge-Coupled Device)やCMOS(Complementary Metal Oxide Semiconductor)等の撮像素子である。 The electronic component 20 is, for example, an image pickup device such as a CCD (Charge-Coupled Device) or a CMOS (Complementary Metal Oxide Semiconductor).

電子部品20は、例えば、電子部品20の下面が接合材(不図示)によって絶縁基板1の第1面11(上面)の搭載領域に接合されて固定されている。電子部品20を配線基板10に接合固定するための接合材は、はんだを含むろう材、ガラスまたはエポキシ樹脂等の樹脂接着剤を用いることができる。接合材がはんだを含むろう材である場合は、配線基板10の搭載領域にめっきや薄膜等で接合用金属膜を設けることができる。 The electronic component 20 is fixed, for example, by bonding the lower surface of the electronic component 20 to a mounting region of the first surface 11 (upper surface) of the insulating substrate 1 with a bonding material (not shown). As a joining material for joining and fixing the electronic component 20 to the wiring board 10, a brazing material containing solder, a resin adhesive such as glass or epoxy resin can be used. When the joining material is a brazing material containing solder, a joining metal film can be provided in the mounting region of the wiring board 10 by plating, a thin film, or the like.

電子部品20の表面に配置された電極(不図示)と接続パッド2とが接続部材21で接続されて、電子部品20と配線基板10とが電気的に接続される。図5および図6に示す例の電子装置100においては、接続部材21として、例えば金(Au)等からなるボンディングワイヤで、電子部品20の上面の電極と接続パッド2とが電気的に接続されている。図7に示す例の電子装置100においては、接続部材21として、例えばはんだや導電性接着剤などの導電性接合材で、電子部品20の下面の電極と接続パッド2とが電気的に接続されている。接続部材21がボンディングワイヤである場合には、電子部品20を絶縁基板1の第1面11に固定した後に接続する。接続部材21が導電性接合材である場合には、電子部品20を固定する接合材と同様の接合成分を含むものを用いれば、電子部品20の絶縁基板1の第1面11への固定と同時に接続も行なうことができる。 Electrodes (not shown) arranged on the surface of the electronic component 20 and the connection pads 2 are connected by the connection member 21, and the electronic component 20 and the wiring board 10 are electrically connected. In the electronic device 100 of the example shown in FIGS. 5 and 6, the electrode on the upper surface of the electronic component 20 and the connection pad 2 are electrically connected by a bonding wire made of, for example, gold (Au) as the connection member 21. ing. In the electronic device 100 of the example shown in FIG. 7, as the connection member 21, a conductive bonding material such as solder or a conductive adhesive is used to electrically connect the electrode on the lower surface of the electronic component 20 and the connection pad 2. ing. When the connecting member 21 is a bonding wire, the electronic component 20 is fixed to the first surface 11 of the insulating substrate 1 and then connected. When the connecting member 21 is a conductive bonding material, if a material containing a bonding component similar to the bonding material that fixes the electronic component 20 is used, the electronic component 20 can be fixed to the first surface 11 of the insulating substrate 1. Connection can be made at the same time.

光学部材30は、例えば図6に示す例では、電子部品20で受光する光を透過させる透光性材料であり、光が可視光である場合には、例えばガラスからなる板材である。図7に示す例では、図6に示す例に対して、透光性部材32の上にさらに別の透光性部材32を保持した保持部材33が接合部材31で接合されている。この例では、下側の透光性部材32は図6と同様の平板板状であり、上側の透光性部材32は凸レンズ状である。上側の透光性部材32は、ガラスだけでなく樹脂で形成されたものであってもよい。図5に示す例の光学部材30は、1つの保持部材33に2つの透光性部材32が保持されたものである。透光性部材32の構成としては図6に示す例と同様である。 For example, in the example shown in FIG. 6, the optical member 30 is a translucent material that transmits the light received by the electronic component 20, and when the light is visible light, it is a plate material made of glass, for example. In the example shown in FIG. 7, a holding member 33, which holds another transparent member 32, is joined to the transparent member 32 by a joining member 31, unlike the example shown in FIG. In this example, the lower transparent member 32 has a flat plate shape similar to that shown in FIG. 6, and the upper transparent member 32 has a convex lens shape. The upper transparent member 32 may be made of resin as well as glass. The optical member 30 of the example shown in FIG. 5 is one in which two holding members 33 hold two translucent members 32. The structure of the translucent member 32 is the same as the example shown in FIG.

透光性部材32(蓋体およびレンズ)は、その表面に、薄膜等で形成されたIRカットフィルタ、反射防止膜、遮光膜等の光学膜を備えるものであってもよい。 The translucent member 32 (lid and lens) may have an IR cut filter formed of a thin film or the like, an antireflection film, an optical film such as a light shielding film on the surface thereof.

光学部材30の保持部材33は、透光性部材32を保持するとともに透光性部材32を透過した光が電子部品20(の受光部)に到達するような開口を有する、筒状、管状のものである。保持部材33の下面は、配線基板10との接合面であり平坦である。透光性部材32はこの下面と平行に保持されている。これにより、電子部品20と光学部材30の透光性部材32とが平行な状態で接合される。また、保持部材33は、例えば金属あるいは樹脂からなるものである。 The holding member 33 of the optical member 30 has a tubular or tubular shape that holds the translucent member 32 and has an opening through which the light transmitted through the translucent member 32 reaches (the light receiving portion of) the electronic component 20. It is a thing. The lower surface of the holding member 33 is a joint surface with the wiring board 10 and is flat. The translucent member 32 is held parallel to this lower surface. Thereby, the electronic component 20 and the translucent member 32 of the optical member 30 are joined in parallel. The holding member 33 is made of metal or resin, for example.

光学部材30は絶縁基板1の第1面11の外縁部または枠体5の上面に接合部材31で接合されている。接合部材31は、樹脂接着剤、ガラスまたは、はんだ等の金属の接合材
を用いることができる。このとき、必要に応じて光学部材30の接合部には接合用の金属膜が設けられる。接合部材31がガラスあるいははんだである場合は、枠体5を接合する接合材51、電子部品20を接合する接合材、電子部品20と接続パッドを接合する接続部材21等の融点よりも低い融点を有するものを用いることができる。
The optical member 30 is bonded to the outer edge portion of the first surface 11 of the insulating substrate 1 or the upper surface of the frame body 5 with a bonding member 31. For the joining member 31, a resin adhesive, glass, or a metal joining material such as solder can be used. At this time, a metal film for bonding is provided at the bonding portion of the optical member 30 as needed. When the joining member 31 is glass or solder, the melting point is lower than the melting points of the joining material 51 for joining the frame body 5, the joining material for joining the electronic component 20, the connecting member 21 for joining the electronic component 20 and the connection pad, and the like. Can be used.

以上の説明では、電子部品20の撮像素子としては、デジタルカメラ等に用いられる可視光用の撮像素子の場合で説明したが、これに限られるものではなく、監視カメラ等に用いられる赤外線撮像素子も含まれる。この場合には、透光性部材32が透過させる光は赤外線であり、透光性部材32の材料としては、例えばGe、Si、ZnSe、ZnS等を用いることができる。また、電子部品20として発光素子と受光素子の2つを搭載した電子装置100とすることもできる。 In the above description, the image pickup element of the electronic component 20 has been described in the case of a visible light image pickup element used in a digital camera or the like, but the image pickup element is not limited to this, and an infrared image pickup element used in a surveillance camera or the like. Is also included. In this case, the light transmitted by the translucent member 32 is infrared light, and the material of the translucent member 32 can be, for example, Ge, Si, ZnSe, ZnS or the like. Alternatively, the electronic device 100 may be equipped with two light emitting elements and light receiving elements as the electronic component 20.

1・・・絶縁基板
1a・・・凹部
11・・・第1面
12・・・第2面
2・・・接続パッド
3・・・外部端子
4・・・内部配線
5・・・枠体
51・・・接合材
10・・・配線基板
20・・・電子部品
21・・・接続部材
30・・・光学部材
31・・・接合部材
32・・・透光性部材
33・・・保持部材
100・・・電子装置
1... Insulating substrate 1a... Recess 11... 1st surface 12... 2nd surface 2... Connection pad 3... External terminal 4... Internal wiring 5... Frame body 51 ... bonding material 10 ... wiring board 20 ... electronic component 21 ... connection member 30 ... optical member 31 ... bonding member 32 ... translucent member 33 ... holding member 100 ...Electronic devices

Claims (4)

中央部が電子部品の搭載領域である第1面を有するセラミックスからなる絶縁基板と、
該絶縁基板の前記第1面に設けられた凹部と、
該凹部の底面に設けられた接続パッドと、を備え、
前記第1面は研磨面である配線基板。
An insulating substrate made of ceramics having a first surface whose central portion is a mounting area for electronic components;
A recess provided on the first surface of the insulating substrate;
A connection pad provided on the bottom surface of the recess,
A wiring board in which the first surface is a polished surface.
前記第1面の外縁部に接合され、前記搭載領域および前記接続パッドを囲む枠体を備えている請求項1に記載の配線基板。 The wiring board according to claim 1, further comprising a frame body which is joined to an outer edge portion of the first surface and surrounds the mounting region and the connection pad. 請求項1に記載の配線基板と、
該配線基板の前記搭載領域に搭載され、前記接続パッドと電気的に接続された電子部品と、
前記配線基板の前記第1面の外縁部に接合され、前記電子部品と重なる光学部材を備えている電子装置。
The wiring board according to claim 1,
An electronic component mounted on the mounting area of the wiring board and electrically connected to the connection pad;
An electronic device comprising an optical member that is joined to an outer edge portion of the first surface of the wiring board and that overlaps with the electronic component.
請求項2に記載の配線基板と、
該配線基板の前記搭載領域に搭載され、前記接続パッドと電気的に接続された電子部品と、
前記配線基板の前記枠体上に接合され、前記電子部品と重なる光学部材とを備えている電子装置。
The wiring board according to claim 2,
An electronic component mounted on the mounting area of the wiring board and electrically connected to the connection pad;
An electronic device comprising: an optical member that is joined to the frame body of the wiring board and overlaps with the electronic component.
JP2018221355A 2018-11-27 2018-11-27 Wiring board and electronic device Pending JP2020088196A (en)

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Citations (5)

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JPH04120248U (en) * 1991-04-12 1992-10-27 京セラ株式会社 Package cage for storing solid-state image sensor
JPH0546046U (en) * 1991-11-21 1993-06-18 ソニー株式会社 Solid-state imaging device
JP2010141123A (en) * 2008-12-11 2010-06-24 Shinko Electric Ind Co Ltd Electronic component device
US20110042131A1 (en) * 2009-08-20 2011-02-24 Samsung Electro-Mechanics Co., Ltd Ceramic substrate and manufacturing method thereof
JP2012151428A (en) * 2011-01-20 2012-08-09 Samsung Electro-Mechanics Co Ltd Manufacturing method of ceramic substrate

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04120248U (en) * 1991-04-12 1992-10-27 京セラ株式会社 Package cage for storing solid-state image sensor
JPH0546046U (en) * 1991-11-21 1993-06-18 ソニー株式会社 Solid-state imaging device
JP2010141123A (en) * 2008-12-11 2010-06-24 Shinko Electric Ind Co Ltd Electronic component device
US20110042131A1 (en) * 2009-08-20 2011-02-24 Samsung Electro-Mechanics Co., Ltd Ceramic substrate and manufacturing method thereof
JP2011044681A (en) * 2009-08-20 2011-03-03 Samsung Electro-Mechanics Co Ltd Ceramic substrate, and manufacturing method therefor
JP2012151428A (en) * 2011-01-20 2012-08-09 Samsung Electro-Mechanics Co Ltd Manufacturing method of ceramic substrate

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