JP2020077796A5 - - Google Patents

Download PDF

Info

Publication number
JP2020077796A5
JP2020077796A5 JP2018210917A JP2018210917A JP2020077796A5 JP 2020077796 A5 JP2020077796 A5 JP 2020077796A5 JP 2018210917 A JP2018210917 A JP 2018210917A JP 2018210917 A JP2018210917 A JP 2018210917A JP 2020077796 A5 JP2020077796 A5 JP 2020077796A5
Authority
JP
Japan
Prior art keywords
light
substrate
imprint
modulator
modulated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2018210917A
Other languages
Japanese (ja)
Other versions
JP7289633B2 (en
JP2020077796A (en
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2018210917A external-priority patent/JP7289633B2/en
Priority to JP2018210917A priority Critical patent/JP7289633B2/en
Priority to TW108138996A priority patent/TWI771623B/en
Priority to EP19205896.4A priority patent/EP3650937B1/en
Priority to US16/673,804 priority patent/US11226554B2/en
Priority to CN201911076450.8A priority patent/CN111158212B/en
Priority to KR1020190141428A priority patent/KR102641226B1/en
Publication of JP2020077796A publication Critical patent/JP2020077796A/en
Publication of JP2020077796A5 publication Critical patent/JP2020077796A5/ja
Priority to US17/544,447 priority patent/US11921423B2/en
Priority to JP2023084773A priority patent/JP2023104989A/en
Publication of JP7289633B2 publication Critical patent/JP7289633B2/en
Application granted granted Critical
Priority to US18/390,910 priority patent/US20240126165A1/en
Priority to KR1020240025586A priority patent/KR20240031272A/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Description

本発明のインプリント装置は、基板の上に供給されたインプリント材と型とを接触させた状態で、前記インプリント材を硬化させるインプリント処理を実行するインプリント装置であって、入射光を変調する変調器と、第１光源からの第１光と、第２光源からの、前記第１光とは波長が異なる第２光とを前記変調器に導く第１光学系と、前記変調器によって変調された変調光を前記基板に導く第２光学系と、を備え、前記第１光を前記変調器で変調した第１変調光を前記基板に導くことによって、前記型と前記基板とのアライメントのために前記基板が変形され、前記第２光を前記変調器で変調した第２変調光を前記基板に導くことによって、前記基板の上に供給されたインプリント材の粘性を増加させることを特徴とする。 The imprint device of the present invention is an imprint device that executes an imprint process for curing the imprint material in a state where the imprint material supplied on the substrate is in contact with the mold, and is an incident light. The first optical system for guiding the first light from the first light source and the second light from the second light source having a wavelength different from that of the first light to the modulator, and the modulation. The mold and the substrate are provided with a second optical system that guides the modulated light modulated by the device to the substrate, and by guiding the first modulated light obtained by modulating the first light by the modulator to the substrate. The substrate is deformed due to the alignment of the substrate, and the second modulated light obtained by modulating the second light with the modulator is guided to the substrate, thereby increasing the viscosity of the imprint material supplied on the substrate. It is characterized by that.

Claims (11)

基板の上に供給されたインプリント材と型とを接触させた状態で、前記インプリント材を硬化させるインプリント処理を実行するインプリント装置であって、
入射光を変調する変調器と、
第１光源からの第１光と、第２光源からの、前記第１光とは波長が異なる第２光とを前記変調器に導く第１光学系と、
前記変調器によって変調された変調光を前記基板に導く第２光学系と、を備え、
前記第１光を前記変調器で変調した第１変調光を前記基板に導くことによって、前記型と前記基板とのアライメントのために前記基板が変形され、
前記第２光を前記変調器で変調した第２変調光を前記基板に導くことによって、前記基板の上に供給されたインプリント材の粘性を増加させることを特徴とするインプリント装置。 An imprint device that executes an imprint process to cure the imprint material in a state where the imprint material supplied on the substrate and the mold are in contact with each other.
A modulator that modulates the incident light,
A first optical system that guides the first light from the first light source and the second light from the second light source having a wavelength different from that of the first light to the modulator.
A second optical system that guides the modulated light modulated by the modulator to the substrate is provided.
By guiding the first modulated light obtained by modulating the first light with the modulator to the substrate, the substrate is deformed for alignment between the mold and the substrate.
An imprinting apparatus characterized in that the viscosity of an imprint material supplied on the substrate is increased by guiding the second modulated light obtained by modulating the second light with the modulator to the substrate. 前記変調器には、前記第１光と前記第２光のうちの一方が選択的に入射されることを特徴とする請求項１に記載のインプリント装置。 The imprint device according to claim 1, wherein one of the first light and the second light is selectively incident on the modulator. 前記アライメントが実行されている期間において、前記第２変調光を前記基板に導くことによって、前記基板の上に供給されたインプリント材の粘性を増加させることを特徴とする請求項１または２に記載のインプリント装置。 The first or second claim is characterized in that the viscosity of the imprint material supplied on the substrate is increased by guiding the second modulated light to the substrate during the period in which the alignment is executed. The imprint device described. 前記第１光源と前記変調器との間の光路に前記第２光源からの前記第２光を前記変調器へ導く光学素子を備えることを特徴とする請求項１乃至３のいずれか１項に記載のインプリント装置。 The invention according to any one of claims 1 to 3, wherein the optical path between the first light source and the modulator is provided with an optical element that guides the second light from the second light source to the modulator. The imprint device described. 前記光学素子はミラーであることを特徴とする請求項４に記載のインプリント装置。 The imprint device according to claim 4, wherein the optical element is a mirror. 前記第１光の強度と前記第２光の強度が互いに異なることを特徴とする請求項１乃至５のいずれか１項に記載のインプリント装置。 The imprint device according to any one of claims 1 to 5, wherein the intensity of the first light and the intensity of the second light are different from each other. 前記第１光学系は、前記第１光源からの前記第１光を前記変調器へ導く光ファイバを備えることを特徴とする請求項１乃至６のいずれか１項に記載のインプリント装置。 The imprint device according to any one of claims 1 to 6, wherein the first optical system includes an optical fiber that guides the first light from the first light source to the modulator. 前記変調器は、デジタルミラーデバイスを含むことを特徴とする請求項１乃至７のいずれか１項に記載のインプリント装置。 The imprint device according to any one of claims 1 to 7, wherein the modulator includes a digital mirror device. 前記インプリント材を硬化させるための光を照射する硬化光源を備え、
前記アライメントが完了した後に前記インプリント材を硬化させるための光が前記インプリント材に照射されることによって前記インプリント材が硬化されることを特徴とする請求項１乃至８のいずれか１項に記載のインプリント装置。 A curing light source for irradiating light for curing the imprint material is provided.
One of claims 1 to 8, wherein the imprint material is cured by irradiating the imprint material with light for curing the imprint material after the alignment is completed. The imprint device described in. 前記硬化光源からの光と前記変調器によって変調された光のうち一方の光を透過させ、他方の光を反射させる合成ミラーを備えることを特徴とする請求項９に記載のインプリント装置。 The imprinting apparatus according to claim 9, further comprising a synthetic mirror that transmits one of the light from the curing light source and the light modulated by the modulator and reflects the other light. 請求項１乃至１０のいずれか１項に記載のインプリント装置により基板の上にパターンを形成する工程と、
前記パターンが形成された前記基板を加工する工程と、
を含み、前記基板から物品を製造することを特徴とする物品製造方法。 A step of forming a pattern on a substrate by the imprint device according to any one of claims 1 to 10.
The process of processing the substrate on which the pattern is formed and
The article manufacturing method comprising the manufacture of an article from the substrate.
JP2018210917A 2018-11-08 2018-11-08 Imprint apparatus and article manufacturing method Active JP7289633B2 (en)

Priority Applications (10)

Application Number Priority Date Filing Date Title
JP2018210917A JP7289633B2 (en) 2018-11-08 2018-11-08 Imprint apparatus and article manufacturing method
TW108138996A TWI771623B (en) 2018-11-08 2019-10-29 Imprint apparatus and product manufacturing method
EP19205896.4A EP3650937B1 (en) 2018-11-08 2019-10-29 Imprint apparatus and product manufacturing method
US16/673,804 US11226554B2 (en) 2018-11-08 2019-11-04 Imprint apparatus and product manufacturing method
CN201911076450.8A CN111158212B (en) 2018-11-08 2019-11-06 Embossing device and method for producing a product
KR1020190141428A KR102641226B1 (en) 2018-11-08 2019-11-07 Imprint apparatus and product manufacturing method
US17/544,447 US11921423B2 (en) 2018-11-08 2021-12-07 Imprint apparatus and product manufacturing method
JP2023084773A JP2023104989A (en) 2018-11-08 2023-05-23 Imprint apparatus and article manufacturing method
US18/390,910 US20240126165A1 (en) 2018-11-08 2023-12-20 Imprint apparatus and product manufacturing method
KR1020240025586A KR20240031272A (en) 2018-11-08 2024-02-22 Imprint apparatus, product manufacturing method, and imprint method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018210917A JP7289633B2 (en) 2018-11-08 2018-11-08 Imprint apparatus and article manufacturing method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023084773A Division JP2023104989A (en) 2018-11-08 2023-05-23 Imprint apparatus and article manufacturing method

Publications (3)

Publication Number Publication Date
JP2020077796A JP2020077796A (en) 2020-05-21
JP2020077796A5 true JP2020077796A5 (en) 2021-11-18
JP7289633B2 JP7289633B2 (en) 2023-06-12

Family

ID=70724423

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2018210917A Active JP7289633B2 (en) 2018-11-08 2018-11-08 Imprint apparatus and article manufacturing method
JP2023084773A Pending JP2023104989A (en) 2018-11-08 2023-05-23 Imprint apparatus and article manufacturing method

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023084773A Pending JP2023104989A (en) 2018-11-08 2023-05-23 Imprint apparatus and article manufacturing method

Country Status (1)

Country Link
JP (2) JP7289633B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3900569B1 (en) 2020-04-24 2023-03-08 ASICS Corporation Last, method for manufacturing last

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004259985A (en) 2003-02-26 2004-09-16 Sony Corp Resist pattern forming device, method for forming resist pattern and method for manufacturing semiconductor device using the forming method
JP6480680B2 (en) 2014-08-02 2019-03-13 株式会社アドテックエンジニアリング Illuminance ratio changing method and exposure method
JP6632270B2 (en) 2014-09-08 2020-01-22 キヤノン株式会社 Imprint apparatus, imprint method, and article manufacturing method
JP6282298B2 (en) 2015-06-10 2018-02-21 キヤノン株式会社 Imprint apparatus, imprint method, and article manufacturing method
JP6230650B2 (en) 2016-05-02 2017-11-15 キヤノン株式会社 Imprint apparatus and article manufacturing method using the same
JP6827785B2 (en) 2016-11-30 2021-02-10 キヤノン株式会社 Imprinting equipment, imprinting methods, and manufacturing methods for articles

Similar Documents

Publication Publication Date Title
US9777097B2 (en) Thermal and photo-initiation curing system of photopolymer resin for 3D printing
JP7060706B2 (en) Methods and equipment for producing large area imprints without seams
TWI761597B (en) Forming device, manufacturing method of semiconductor device, and manufacturing method of article
ATE554050T1 (en) EMBOSSING METHOD AND METHOD FOR PROCESSING A SUBSTRATE
JP2018051951A5 (en) Stereolithography apparatus, stereolithography method, and stereolithography program
JP2019021911A5 (en)
JP2018092996A5 (en)
KR20150112945A (en) Light-transmitting imprinting mold and method for manufacturing large-area mold
SG10201709477TA (en) Imprint apparatus, imprinting method, and method for manufacturing article
KR101714737B1 (en) Selective transferring method and apparatus using bump type stamp
JP2019075551A5 (en)
JP2016221929A5 (en)
JP2018006553A5 (en)
JP2020077796A5 (en)
KR20100033560A (en) Manufacturing method of mold for nano imprint and pattern forming method using the mold for nano imprint
KR101816838B1 (en) Replica mold for nano imprint, manufacturing method and equipment thereof
JP2013171950A (en) Pattern forming method, pattern forming device, and method for manufacturing semiconductor device
KR20090002815A (en) Method for imprinting dual side using roll stamps
JP2023104989A (en) Imprint apparatus and article manufacturing method
CN104690955A (en) Method and device for manufacturing stereo grating
JP6281592B2 (en) Manufacturing method of replica template
US20130221581A1 (en) Pattern formation apparatus, pattern formation method and a method for producing semiconductor devices
JP2021072354A5 (en)
KR20200053428A (en) Imprint apparatus and product manufacturing method
KR101951997B1 (en) Method for manufacturing large-size micro lens array