JP2020017565A5 - - Google Patents
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- JP2020017565A5 JP2020017565A5 JP2018137722A JP2018137722A JP2020017565A5 JP 2020017565 A5 JP2020017565 A5 JP 2020017565A5 JP 2018137722 A JP2018137722 A JP 2018137722A JP 2018137722 A JP2018137722 A JP 2018137722A JP 2020017565 A5 JP2020017565 A5 JP 2020017565A5
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- JP
- Japan
- Prior art keywords
- period
- amplitude
- pulse
- processing apparatus
- plasma processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000000051 modifying Effects 0.000 claims 3
- 210000002381 Plasma Anatomy 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018137722A JP6976228B2 (ja) | 2018-07-23 | 2018-07-23 | プラズマ処理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018137722A JP6976228B2 (ja) | 2018-07-23 | 2018-07-23 | プラズマ処理装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2020017565A JP2020017565A (ja) | 2020-01-30 |
JP2020017565A5 true JP2020017565A5 (zh) | 2020-08-06 |
JP6976228B2 JP6976228B2 (ja) | 2021-12-08 |
Family
ID=69580797
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018137722A Active JP6976228B2 (ja) | 2018-07-23 | 2018-07-23 | プラズマ処理装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6976228B2 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022044216A1 (ja) | 2020-08-27 | 2022-03-03 | 株式会社日立ハイテク | プラズマ処理装置 |
JPWO2022259868A1 (zh) * | 2021-06-08 | 2022-12-15 | ||
KR20230169925A (ko) | 2022-06-07 | 2023-12-18 | 주식회사 히타치하이테크 | 플라스마 처리 장치 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100549901B1 (ko) * | 1997-08-22 | 2006-02-06 | 동경 엘렉트론 주식회사 | 플라즈마 처리 장치의 제어 방법 |
US9123509B2 (en) * | 2007-06-29 | 2015-09-01 | Varian Semiconductor Equipment Associates, Inc. | Techniques for plasma processing a substrate |
WO2015056509A1 (ja) * | 2013-10-17 | 2015-04-23 | 株式会社日立国際電気 | プラズマ生成用電源装置の制御方法 |
-
2018
- 2018-07-23 JP JP2018137722A patent/JP6976228B2/ja active Active
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