JP2020011329A - Processing liquid switching device - Google Patents

Abstract

To provide a processing liquid switching device that can prevent rotation movement of a sluice pipe from being inhibited and prevent processing liquid from soiling a periphery of the device.SOLUTION: The processing liquid switching device comprises: a discharge pipe 2 through which a polishing agent K is discharged from a discharge port 23 at a tip 22; a sluice pipe 10, one end 31 of which the tip 22 of the discharge pipe 2 is inserted into through a first clearance S1 in a circumferential direction and the other end 42 of which a discharge port 46 is formed at, which can rotate with a shaft direction O of the discharge pipe 2 as a rotation center; and a liquid receiving pipe 5 which has at one end 51 a receiving port 55, into which the other end 42 of the sluice pipe 10 is inserted through a second clearance S2 in the circumferential direction, which is held coaxially with respect to the discharge pipe 2, and has at the other end 52 a first separation port 56a and a second separation port 56b. A discharge port 46 is arranged at a position where an opening center O1 is offset with respect to a shaft direction O of a guide pipe 4, and a holding mechanism 30 that rotatably holds the guide pipe 4 is arranged at an outer periphery side of the sluice pipe 10.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a processing liquid switching device that switches a flow direction of a processing liquid.

  Conventionally, a discharge pipe for discharging a polishing liquid used in a polishing apparatus from a discharge port, a gutter pipe one end of which is rotatably fitted to an outer peripheral side of a peripheral wall of the discharge port, and a gutter pipe are installed below the gutter pipe. There has been known a polishing liquid switching device having a liquid receiving body which is open upward and is internally divided into a plurality of liquid receiving areas (for example, see Patent Document 1). In this polishing liquid switching device, the gutter pipe is swiveled around the discharge port above the liquid receiver to switch the liquid receiving area into which the polishing liquid discharged from the discharge port formed at the tip of the gutter pipe flows. .

JP-A-57-66860

By the way, in the conventional polishing liquid switching device, one end of the gutter pipe is rotatably fitted to the outer peripheral side of the peripheral wall of the discharge port for discharging the polishing liquid, and the discharge pipe and the gutter pipe are in contact with each other. Therefore, when the polishing liquid flowing out from the discharge port enters between the peripheral wall of the discharge pipe and the gutter pipe, the polishing liquid that has entered is dried, and the gutter pipe is fixed to the discharge pipe, and the gutter pipe turns. The problem that operation | movement is inhibited arises.
In addition, since the discharge port of the gutter tube moves above the liquid receiver, the polishing liquid flowing out of the discharge port may be scattered, which may cause contamination around the polishing liquid switching device and failure of equipment.

  SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has a processing liquid switching apparatus capable of preventing rotation of a gutter tube from being hindered and preventing contamination of the periphery of the apparatus by a processing liquid such as a polishing liquid. The challenge is to provide

In order to achieve the above object, the processing liquid switching device of the present invention has a discharge pipe for discharging a processing liquid from a discharge port formed at a tip, and an end of the discharge pipe inserted into one end through a first circumferential gap. A discharge port for discharging the processing liquid is formed at the other end, and a gutter pipe rotatably held about the axial direction of the discharge pipe as a rotation center, and the other end of the gutter pipe forms a second circumferential gap. A liquid receiving tube having a receiving port inserted at one end and held coaxially with the discharge pipe at one end, and having a plurality of separation ports at the other end.
The discharge port is set at a position where the center of the opening is offset with respect to the rotation center of the gutter tube, and the holding mechanism that rotatably holds the gutter tube is arranged on the outer peripheral side of the gutter tube.

  As a result, it is possible to prevent the rotation operation of the gutter tube from being hindered, and to prevent contamination around the apparatus by the processing liquid.

FIG. 2 is an explanatory diagram illustrating a polishing apparatus provided with a processing liquid switching device according to the first embodiment. FIG. 2 is a longitudinal sectional view illustrating the processing liquid switching device according to the first embodiment. 3A and 3B are cross-sectional views of the processing liquid switching device according to the first embodiment. FIG. 2A is a cross-sectional view taken along line AA in FIG. 2, FIG. 2B is a cross-sectional view taken along line BB in FIG. 2 shows a C-section. FIG. 5 is an explanatory diagram illustrating a processing liquid switching operation by the processing liquid switching device according to the first embodiment.

  Hereinafter, an embodiment for implementing a processing liquid switching device of the present invention will be described based on a first embodiment shown in the drawings.

(Example 1)
Hereinafter, the configuration of the processing liquid switching device 1 according to the first embodiment will be described by dividing into “the configuration of the polishing apparatus having the processing liquid switching device” and “the detailed configuration of the processing liquid switching device”.

[Configuration of polishing apparatus provided with processing liquid switching device]
The processing liquid switching apparatus 1 of the first embodiment is used for separating an abrasive K (processing liquid) used for polishing a thin wafer W in the polishing apparatus 101 for circulation and discharge. The treatment liquid switching device 1 is used for purposes other than the purpose of separating the abrasive K shown in the first embodiment, for example, for separating the abrasive K according to the type.

  Here, as shown in FIG. 1, the polishing apparatus 101 includes a surface plate 102 on which a polishing pad 102a is adhered, and a carrier 103 for holding a wafer W. Then, in the polishing apparatus 101, the platen 102 and the carrier 103 are rotated while the wafer W is pressed against the polishing pad 102a by the carrier 103, and the wafer W is polished.

  When polishing the wafer W in the polishing apparatus 101, the polishing agent K is supplied from the polishing agent supply device 104 onto the polishing pad 102a, thereby improving the polishing accuracy and the polishing rate of the wafer W.

  Here, the used abrasive K used in the polishing apparatus 101 may be circulated or may not be circulated. Therefore, as shown in FIG. 1, the processing liquid switching device 1 of the first embodiment is provided in the waste liquid receiver 101 a provided in the polishing device 101. Then, the processing liquid switching device 1 switches the direction in which the abrasive K discharged from the polishing apparatus 101 flows, thereby separating the abrasive K for circulation and discharge.

[Detailed configuration of treatment liquid switching device]
As shown in FIG. 2, the processing liquid switching device 1 according to the first embodiment includes a discharge pipe 2, a gutter pipe 10, a liquid receiving pipe 5, and a rotation control unit 6.

  The discharge pipe 2 is a pipe in which one end 21 communicates with the waste liquid receiver 101a (see FIG. 1), and a discharge port 23 for discharging the abrasive K is formed at a tip end 22. The discharge pipe 2 has a discharge port 23 directed downward from the polishing apparatus 101, and the axial direction O of the distal end portion of the discharge pipe 2 is along the vertical direction. Hereinafter, the “axial direction of the discharge pipe 2” means the axial direction O of the distal end portion of the discharge pipe 2, and is the opening direction of the discharge port 23.

  As shown in FIG. 2, the gutter pipe 10 is formed from the rotating pipe 3 and the guide pipe 4 connected to the rotating pipe 3.

  The rotating tube 3 is a straight tube whose both ends are open. On the other hand, the guide tube 4 is a straight tube whose one end 41 is open and the other end 42 is closed by a shielding plate 45. Then, with the tip 32 of the rotating tube 3 inserted into one end 41 of the guide tube 4, the tip 32 of the rotating tube 3 and one end 41 of the guide tube 4 are connected. Form 10. Here, the connection of the guide tube 4 to the rotary tube 3 may be performed using, for example, bolts or welding, or thread grooves may be formed on the outer peripheral surface 33 of the rotary tube 3 and the inner peripheral surface 44 of the guide tube 4 respectively. They may be formed and connected by screwing each other.

  In this gutter tube 10, the tip 22 of the discharge tube 2 is inserted into one end 31 of the rotating tube 3. In the first embodiment, the tip 22 of the discharge pipe 2 inserted into the rotary pipe 3 penetrates the rotary pipe 3, and the discharge port 23 is inserted into the guide pipe 4.

  And, between the outer peripheral surface 24 of the discharge pipe 2 and the inner peripheral surface 34 of the rotary pipe 3, and between the outer peripheral face 24 of the discharge pipe 2 and the inner peripheral surface 44 of the guide pipe 4, respectively. A first gap S1 is provided. That is, the tip 22 of the discharge pipe 2 is inserted into the gutter pipe 10 through the first gap S1.

  The width of the first gap S1 is set uniformly over the entire circumference of the rotary tube 3 and the guide tube 4. The “width of the first gap S1” refers to the distance from the outer peripheral surface 24 of the discharge pipe 2 to the inner peripheral surface 34 of the rotary pipe 3 and the inner peripheral surface of the guide pipe 4 from the outer peripheral face 24 of the discharge pipe 2. The distance to 44.

  Further, a bearing 110 is fitted on the outer peripheral surface 33 of one end 31 of the rotary pipe 3 forming the gutter pipe 10. The bearing 110 is supported by the polishing apparatus 101 via a bracket 111.

  Thus, the gutter tube 10 is held rotatably around the axial direction O in a coaxial state where its own axial direction coincides with the axial direction O of the discharge pipe 2. The holding mechanism 30 for rotatably holding the gutter tube 10 is constituted by a bearing 110 and a bracket 111. The holding mechanism 30 is disposed on the outer peripheral side of the gutter tube 10 and outside the liquid receiving tube 5. Have been.

  A discharge port 46 for discharging the abrasive K flowing from the discharge pipe 2 is formed in a shielding plate 45 that closes the other end 42 of the guide pipe 4. The discharge port 46 is set at a position where the opening center O1 is offset in the horizontal direction with respect to the axial direction O, which is the rotation center of the gutter tube 10, and has a bow shape in plan view along the edge of the guide tube 4. (See FIG. 3C). The discharge port 46 is open in a direction parallel to the axial direction O of the gutter tube 10, that is, downward in the vertical direction.

  On the other hand, the normal direction of the shielding plate 45 is inclined with respect to the axial direction O of the gutter tube 10. Here, the inclination of the shielding plate 45 is formed in a downward gradient toward the discharge port 46. That is, the gutter tube 10 has a so-called oblique column shape in which the other end 42 is inclined, and the discharge port 46 is formed at the tip of the tube. Further, in the first embodiment, a peripheral wall 46a that stands up along the axial direction O of the gutter tube 10 is formed on the peripheral edge of the discharge port 46.

  Further, on the outer peripheral surface 43 of the guide tube 4, there is provided an indicator 7 indicating the position of the gutter tube 10 in the rotation direction. The indicating section 7 includes an indicating rod 71, a first sensor 72, and a second sensor 73.

  The indicator rod 71 is a rod member extending in the radial direction from the outer peripheral surface 43 of the guide tube 4, and is on a straight line X connecting the axial direction O and the opening center O 1 of the discharge port 46 in the horizontal direction, It is provided above the discharge port 46 (see FIG. 3A). The pointing rod 71 reflects the sensor light emitted from the first sensor 72 or the second sensor 73.

  The first sensor 72 is attached to a surface of the bracket 111 facing the indicator rod 71, and is held at a position above the first separation port 56a of the liquid receiving pipe 5. The first sensor 72 emits the sensor light downward. Then, the first sensor 72 reflects the sensor light when the pointing rod 71 is positioned below, and when detecting the reflected light, notifies the control operation unit 61 of the rotation control unit 6 that the reflected light has been detected. input.

  The second sensor 73 is attached to the surface of the bracket 111 facing the indicator rod 71, and is held at a position above the second separation port 56b of the liquid receiving pipe 5. The second sensor 73 emits the sensor light downward. The second sensor 73 reflects the sensor light when the pointing rod 71 is positioned below. When the reflected light is detected, the control arithmetic unit 61 of the rotation control unit 6 reports that the reflected light has been detected. input.

  The liquid receiving pipe 5 is a straight pipe having a receiving port 55 formed at one end 51 and a pair of separating ports (a first separating port 56a and a second separating port 56b) formed at the other end 52. It is supported by the polishing apparatus 101, the floor surface, etc. Here, the receiving port 55 is opened along the axial direction O of the liquid receiving pipe 5, and the other end 42 of the guide pipe 4 forming the gutter pipe 10 is inserted through the second circumferential gap S2. The width of the second gap S2 is set uniformly over the entire circumference of the guide tube 4. The “width of the second gap S2” is a distance from the outer peripheral surface 43 of the guide tube 4 to the inner peripheral surface 5a of the liquid receiving tube 5.

  As a result, the liquid receiving pipe 5 is held in a coaxial state in which its own axial direction O coincides with the axial direction O of the gutter pipe 10. Further, in the first embodiment, an annular lid member 58 is provided in the receiving port 55 of the liquid receiving pipe 5. The lid member 58 covers the second gap S2 by the inner peripheral edge contacting the outer peripheral surface 43 of the guide tube 4 and the outer peripheral edge protruding outward from the receptacle 55.

  The first separation port 56a and the second separation port 56b are respectively formed on the peripheral surface of the liquid receiving tube 5 and open radially. Here, they are formed at positions facing each other across the axial direction O. Further, a first outflow pipe 57a is connected to the first separation port 56a. A second outlet pipe 57b is connected to the second separation port 56b.

  Then, inside the liquid receiving pipe 5, it rises along the axial direction O from the bottom surface 53 that closes the other end 52 of the liquid receiving pipe 5, and the internal space H of the liquid receiving pipe 5 is connected to the first separation port 56 a and the first separation port 56 a. A partition wall 54 that partitions the two separation ports 56b is formed. Here, the partition wall 54 is formed at a position that passes in the axial direction O and has a uniform distance from the first separation port 56a and the second separation port 56b. The first separation port 56a and the second separation port 56b face the partition wall 54, respectively. The height of the partition wall 54 from the bottom surface 53 is set to the maximum height so as not to contact the other end 42 of the guide tube 4 inserted into the liquid receiving tube 5. Further, in the first embodiment, the bottom surface 53 is inclined so as to have a downward gradient from the position where the partition wall 54 is formed to each of the separation ports 56a and 56b.

  The rotation control unit 6 includes a control calculation unit 61 including a CPU (Central Processing Unit), a memory, and the like, and a rotation drive unit 62 that rotates the gutter tube 10.

  The control calculation unit 61 determines the direction of the gutter tube 10 and the necessity of rotation based on the program stored in the memory and the input necessary information. When it is determined that the gutter tube 10 needs to be rotated, a control command is output to the rotation drive unit 62 to control the operation of the rotation drive unit 62. The necessary information input to the control calculation unit 61 is, for example, detection information of the reflected light from the first sensor 72 or the second sensor 73, the pH state of the abrasive K, the abrasive grain concentration state, and the foreign substance mixing state. Is detection information from a sensor that detects the

  The rotation drive unit 62 is attached to the polishing apparatus 101, and is mechanically connected to the rotating tube 3 by a belt, a gear, or the like (not shown). Then, it is driven by input of a control command from the control calculation unit 61, and rotates the rotary pipe 3 forming the gutter pipe 10.

  Hereinafter, the “problem at the time of polishing agent separation” will be described, and subsequently, the operation of the processing liquid switching device 1 of the first embodiment will be described as “abrasive switching operation”, “gap interposition operation to a pipe insertion portion”, The operation will be described separately with respect to "insertion operation of a plurality of tubes", "operation of coaxial arrangement of a plurality of tubes", and "other characteristic operations".

[Issues when separating abrasives]
In the processing liquid switching device for collecting and separating the polishing agent K used during polishing by the polishing device 101 and separating it for circulation, discharge, etc., one end of a gutter pipe is turned on the outer peripheral side of the peripheral wall of the discharge port for discharging the polishing agent K. Consider the case where fitting is possible. In this case, since the discharge pipe and the gutter pipe are in contact with each other, when the abrasive K flowing out of the discharge port enters between the peripheral wall of the discharge pipe and the gutter pipe, the discharge pipe is dried when the abrasive K is dried. The gutter tube is fixed to the. As a result, the turning operation of the gutter pipe is hindered.

  In addition, even if the gutter pipe is stuck to the discharge pipe due to the abrasive K penetrated between the peripheral wall of the discharge pipe and the gutter pipe, the fixed state is eliminated by increasing the driving force of the turning drive unit, and the gutter is removed. It is possible to swivel the tube. However, in this case, it is necessary to increase the driving force of the turning drive unit more than necessary in order to eliminate the sticking state. In other words, the turning drive must be made larger than necessary. For this reason, it is conceivable that the processing liquid switching device becomes large in size and causes an increase in cost.

  In addition, when the gutter pipe turns while the abrasive K that has entered between the peripheral wall of the discharge pipe and the gutter pipe is dry, the dried abrasive K is crushed between the discharge pipe and the gutter pipe, causing abrasion dust. Become. When the wear dust is mixed with the circulating abrasive K, it causes the wafer W to be damaged or crashed.

  Further, when a liquid receiver whose inside is divided into a plurality of liquid receiving areas is installed below the gutter pipe, and the gutter pipe is turned above the liquid receiver, a discharge port formed at the tip of the gutter pipe is used. The flowing out abrasive K falls while being exposed to the outside of the processing liquid switching device. Therefore, there is a problem that the abrasive K is easily scattered. In particular, if the abrasive K flows out when the discharge port moves in the air, the splashes scatter over a wide area, which may contaminate the periphery of the polishing apparatus or cause failure of equipment.

  In addition, when the position of the discharge port is changed by sliding the gutter tube, it is necessary to secure a movable range of the gutter tube and a driving device for moving the gutter tube. Therefore, the size of the processing liquid switching device is increased, so that the area occupied by the polishing device is increased, which is a factor that limits the number of polishing devices installed on a predetermined site.

[Abrasive switching action]
When the wafer W is polished by the polishing apparatus 101 and the used polishing agent K is discharged, the polishing agent K flows from the waste liquid receiver 101a into the discharge pipe 2 of the processing liquid switching device 1 of the first embodiment. Then, the abrasive K flows out from a discharge port 23 formed at the distal end 22 of the discharge pipe 2. Here, the tip 22 of the discharge pipe 2 is inserted into one end 31 of the rotating pipe 3, and the discharge port 23 is inserted inside the guide pipe 4. That is, the abrasive K flowing out of the outlet 23 flows into the gutter tube 10.

  Here, the other end 42 of the guide tube 4 is closed by a shielding plate 45 in which a discharge port 46 is formed. Therefore, the abrasive K flowing into the gutter tube 10 flows out from the discharge port 46 and further flows to the liquid receiving tube 5 into which the guide tube 4 forming the gutter tube 10 is inserted.

  At this time, the opening center O1 of the discharge port 46 is set at a position offset in the horizontal direction with respect to the axial direction O which is the rotation center of the gutter tube 10. On the other hand, the liquid receiving pipe 5 is held in a coaxial state in which its own axial direction O coincides with the axial direction O of the gutter pipe 10. Therefore, the abrasive K flows out at a position offset in the horizontal direction with respect to the axial direction O of the liquid receiving tube 5.

  On the other hand, on the peripheral surface of the other end 52 of the liquid receiving pipe 5, a pair of separation ports (first separation port 56a and second separation port 56b) which are opened in the radial direction and formed at positions facing each other are provided. Is formed. Therefore, as shown in FIG. 2, when the discharge port 46 is opposed to the first separation port 56a, the abrasive K flowing out of the discharge port 46 is circulated from the first separation port 56a to the first outflow pipe 57a. Flows into Further, as shown in FIG. 4, when the discharge port 46 faces the second separation port 56b, the abrasive K flowing out of the discharge port 46 is discharged from the second separation port 56b into the second outflow pipe 57b. Flows into

  As described above, in the processing liquid switching device 1 according to the first embodiment, the direction in which the discharge port 46 is directed, that is, the direction in which the abrasive K flows is controlled by controlling the direction of the gutter tube 10, and the first outflow pipe is switched. The abrasive K flowing to the 57a and the abrasive K flowing to the second outflow pipe 57b can be separated according to the purpose and use.

  In addition, the direction of the gutter 10 is controlled by the control calculation unit 61 of the rotation control unit 6. That is, the control calculation unit 61 includes detection information from a sensor that detects the pH state, the abrasive particle concentration state, and the foreign substance mixing state of the abrasive K used in the polishing apparatus 101, the first sensor 72 and the second sensor Detection information of the reflected light from the sensor 73 is input.

  Then, the control calculation unit 61 determines the actual direction of the gutter tube 10 and the direction to which the gutter tube 10 should face, based on the necessary information input from each sensor. Then, when the actual direction of the gutter tube 10 matches the direction in which the gutter tube 10 should face, the control calculation unit 61 maintains the current state because it is not necessary to rotate the gutter tube 10.

  On the other hand, when the actual direction of the gutter tube 10 does not match the direction in which the gutter tube 10 should face, the control calculation unit 61 inputs a control command to the rotation drive unit 62 to operate the rotation drive unit 62, The gutter tube 10 is rotated by 180 ° about the axial direction O.

  Here, the opening center O1 of the discharge port 46 is set at a position offset in the horizontal direction with respect to the axial direction O which is the rotation center of the gutter tube 10. Accordingly, when the gutter tube 10 rotates, the discharge port 46 turns around the axial direction O, and the discharge port 46 is changed to a desired one of the first separation port 56a and the second separation port 56b. Can be opposed. Then, the abrasive K can be discharged in a desired direction.

[Gap intervening action on pipe insertion part]
In the processing liquid switching apparatus 1 according to the first embodiment, the tip 22 of the discharge pipe 2 having the discharge port 23 through which the abrasive K flows out is inserted into the gutter pipe 10 via the first gap S1 in the circumferential direction. I have. That is, spaces (first gaps S1) are formed between the outer peripheral surface 24 of the discharge pipe 2 and the inner peripheral surface 34 of the rotary pipe 3 and the inner peripheral surface 44 of the guide pipe 4, respectively. There is no contact with the tube 10. Therefore, the abrasive K flowing out from the discharge port 23 is located between the outer peripheral surface 24 of the discharge pipe 2 and the inner peripheral surface of the gutter tube 10 (the inner peripheral surface 34 of the rotary tube 3 and the inner peripheral surface 44 of the guide tube 4). Even if it enters, the gutter pipe 10 is not fixed to the discharge pipe 2.

  Further, the other end 42 of the guide pipe 4 forming the gutter pipe 10 is inserted into the liquid receiving pipe 5 via a second circumferential gap S2. Therefore, a space (second gap S2) is formed between the outer peripheral surface 43 of the guide tube 4 and the inner peripheral surface 5a of the liquid receiving tube 5, and the gutter tube 10 and the liquid receiving tube 5 may come into contact with each other. Absent. Thereby, even if the abrasive K flowing out from the discharge port 46 enters between the outer peripheral surface of the gutter tube 10 (the outer peripheral surface 43 of the guide tube 4) and the inner peripheral surface 5 a of the liquid receiving tube 5, the gutter tube 10 is kept in a liquid state. It is not fixed to the receiving tube 5.

  Moreover, in the processing liquid switching device 1, the holding mechanism 30 including the bracket 111 attached to the polishing device 101 and the bearing 110 supported by the bracket 111 can rotate the outer peripheral surface 33 of the one end 31 of the rotary tube 3. Holding. That is, the holding mechanism 30 is arranged on the outer peripheral side of the gutter tube 10 and provided outside the liquid receiving tube 5.

  Therefore, the bearing 110 of the holding mechanism 30 is disposed at a position where the abrasive K does not easily penetrate, and it is possible to prevent the abrasive K from coming into contact with and sticking to the bearing 110. As a result, the rotation of the gutter tube 10 is not hindered by the abrasive K, and the rotation operation of the gutter tube 10 can be prevented from being hindered.

  Since the rotation operation of the gutter tube 10 is not hindered, it is not necessary to increase the driving force of the rotation drive unit 62 of the rotation control unit 6 more than necessary. Can be a device. Further, since the abrasive K does not come into contact with the bearing 110, wear dust generated by crushing the dried abrasive K does not occur. Therefore, it is possible to prevent the wafer W from being damaged or crashed due to the abrasion dust.

[Insertion of multiple tubes]
In the treatment liquid switching apparatus 1 of the first embodiment, the tip 22 of the discharge pipe 2 is inserted into the rotary pipe 3, and the discharge port 23 from which the abrasive K flows out is provided inside the guide pipe 4 connected to the rotary pipe 3. Discharge K. Further, the other end 42 of the guide tube 4 is inserted into the liquid receiving tube 5, and the discharge port 46 from which the abrasive K flowing into the guide tube 4 flows out discharges the abrasive K inside the liquid receiving tube 5. That is, the discharge pipe 2, the gutter pipe 10, and the liquid receiving pipe 5 are in a so-called nested state.

  Therefore, the polishing agent K can flow from the discharge pipe 2 to the first outflow pipe 57a or the second outflow pipe 57b without being exposed to the outside of the processing liquid switching device 1. Accordingly, the polishing agent K is not scattered around the processing liquid switching device 1, so that contamination of the polishing device 101 and the surroundings of the processing liquid switching device 1 due to the scattering of the polishing agent K can be prevented.

  Since contamination around the polishing apparatus 101 and the processing liquid switching apparatus 1 can be prevented, it is possible to reduce the time required for the user to clean around the polishing apparatus 101 and the processing liquid switching apparatus 1. Further, since the scattered abrasive K can be prevented from entering the inside of the polishing apparatus 101, the inside of the polishing apparatus 101 can be cleaned and the risk of failure due to the dried abrasive K can be reduced. Moreover, since the abrasive K is not scattered, the loss of the abrasive K caused by the scatter can be eliminated.

[Coaxial arrangement of multiple tubes]
In the processing liquid switching device 1 of the first embodiment, the gutter pipe 10 and the liquid receiving pipe 5 are coaxial with respect to the axial direction O of the discharge pipe 2. Further, the gutter tube 10 rotates about the axial direction O as a center of rotation so that the discharge port 46 faces a desired separation port.

  Therefore, the area occupied by the processing liquid switching device 1 can be reduced as compared with a device in which the position of the discharge port is changed by sliding the gutter pipe, and the size of the processing liquid switching device 1 can be suppressed. In addition, since the processing liquid switching device 1 does not increase in size, it is possible to improve the number of polishing devices installed in a predetermined site and to contribute to an improvement in productivity.

  Further, unlike a device for slidingly moving the guide tube 4, it is not necessary to secure a movable range of the gutter tube or a driving device for moving the gutter tube. The workability of attaching and detaching the wafer W can be improved.

[Other characteristic actions]
In the processing liquid switching device 1 according to the first embodiment, a partition wall 54 that stands up along the axial direction O is formed on a bottom surface 53 that closes the other end 52 of the liquid receiving tube 5. Is partitioned for each of the first separation port 56a and the second separation port 56b. Therefore, the abrasive K that has flowed into the liquid receiving pipe 5 is separated from the separation port opposite the discharge port 46 (for example, when the discharge port 46 faces the first separation port 56a). , Can be prevented from flowing toward the second separation port 56b), and the abrasive K can be guided toward a desired separation port.

  Moreover, in the first embodiment, the bottom surface 53 of the liquid receiving pipe 5 is inclined so as to have a downward gradient from the position where the partition wall 54 is formed to each of the separation ports 56a and 56b. Therefore, the abrasive K is prevented from climbing over the partition wall 54, and the abrasive K is more strongly guided toward a desired separation port.

  Further, in the processing liquid switching device 1 of the first embodiment, the indicator 7 indicating the rotational position of the gutter tube 10 is provided on the outer peripheral surface 43 of the guide tube 4. Therefore, the direction of the gutter tube 10 can be easily grasped, and the rotational position of the gutter tube 10 can be appropriately controlled, so that the abrasive K can be appropriately guided toward a desired separation port.

  In the first embodiment, the indicating unit 7 includes the indicating rod 71 provided on the guide tube 4 and the first and second sensors 72 and 73 that emit sensor light to the indicating rod 71. ing. Therefore, the rotation position of the gutter tube 10 can be automatically detected, and the direction of the gutter tube 10 can be more easily grasped.

  In the first embodiment, the discharge port 46 is opened in a direction parallel to the axial direction O of the gutter tube 10 and is directed downward in the vertical direction. Therefore, the abrasive K flowing out from the discharge port 46 flows downward from the discharge port 46 in the vertical direction, so that the abrasive K can hardly flow to the outer peripheral surface 43 side of the guide tube 4. Thereby, it is possible to suppress the abrasive K from entering between the outer peripheral surface 43 of the guide tube 4 and the inner peripheral surface 5a of the liquid receiving tube 5.

  In addition, a peripheral wall 46 a that stands up along the axial direction O of the gutter tube 10 is formed on the periphery of the discharge port 46. Therefore, the flow direction of the abrasive K is regulated by the peripheral wall 46a, and the wraparound of the abrasive K flowing out from the discharge port 46 can be further suppressed.

  Further, in the treatment liquid switching device 1 of the first embodiment, the normal direction of the shielding plate 45 provided at the other end 42 of the guide tube 4 is inclined with respect to the axial direction O of the gutter tube 10, The other end 42 has a so-called oblique column shape. Then, the inclination of the shielding plate 45 is formed to be a downward slope toward the discharge port 46, and the discharge port 46 is formed at the tip of the other end 42 of the guide tube 4 having the oblique column shape.

  Thereby, even if the abrasive K flowing out from the discharge port 46 adheres to the outside of the shielding plate 45, it can be suppressed from flowing to the outer peripheral surface 43 side of the guide tube 4. As a result, it is possible to further suppress the abrasive K from entering between the outer peripheral surface 43 of the guide tube 4 and the inner peripheral surface 5 a of the liquid receiving tube 5.

  In the first embodiment, an annular lid member 58 is provided at the receiving port 55 of the liquid receiving pipe 5, and the lid member 58 covers the second gap S <b> 2. Therefore, even if the abrasive K flowing out from the discharge port 46 scatters inside the liquid receiving pipe 5 and the abrasive K enters the second gap S2, the abrasive K flows out of the receiving port 55 to the outside of the processing liquid switching device 1. The splash of K can be prevented from scattering. Thereby, contamination around the polishing apparatus 101 and the processing liquid switching apparatus 1 can be further suppressed.

  As described above, the processing liquid switching device of the present invention has been described based on the first embodiment. However, the specific configuration is not limited to this embodiment, and the invention is not limited to this embodiment. Changes and additions to the design are allowed as long as the summary is not deviated.

  The polishing apparatus 101 according to the first embodiment is a single-side polishing apparatus for polishing only one side of the wafer W, but is not limited thereto. Any polishing apparatus or grinding apparatus for polishing or grinding the surface of the wafer W, such as a double-side polishing apparatus, an end-face polishing apparatus, a single-side grinding apparatus, a double-side grinding apparatus, and an end-face grinding apparatus may be used.

  In the first embodiment, the example in which the processing liquid switching device 1 is applied to the polishing device 101 has been described. However, the present invention is not limited to this. For example, the processing liquid switching device 1 may be applied to a device for etching or cleaning a workpiece.

  Further, in the first embodiment, the example in which the processing liquid switching apparatus 1 is applied to the polishing apparatus 101 to separate the polishing agent K has been described, but the present invention is not limited to this. Since the processing liquid to be separated may be a liquid for processing a work, for example, when the processing liquid switching device 1 is applied to a device for etching or cleaning a work, the processing liquid used in these devices is separated. You may.

  In addition, in the processing liquid switching device 1 according to the first embodiment, the example in which the gutter tube 10 is formed by the rotating tube 3 and the guide tube 4 has been described, but the invention is not limited thereto. The rotary pipe 3 and the guide pipe 4 may be integrally molded, and the gutter pipe 10 may be formed by one pipe member. Further, the gutter pipe 10 may be formed by connecting a large number (three or more) of pipe members.

  In the processing liquid switching device 1 of the first embodiment, the liquid receiving pipe 5 has a pair of separation ports (a first separation port 56a and a second separation port 56b), and the polishing agent K flowing to the first outflow pipe 57a and An example in which the abrasive K flowing to the second outflow pipe 57b is separated from the abrasive K is shown. However, the number of separation ports formed in the liquid receiving tube 5 can be arbitrarily set, and may be three or more.

  Further, in the processing liquid switching device 1 according to the first embodiment, the example in which the shape of the discharge port 46 has an arc shape in a plan view along the edge of the guide tube 4 is shown, but the shape is not limited thereto, and the shape may be a round shape or a round shape. Any shape that can discharge the processing liquid, such as a square shape, may be used.

  Further, in the processing liquid switching device 1 of the first embodiment, an example is described in which the discharge port 46 is opened in a direction parallel to the axial direction O (vertically downward). However, the invention is not limited thereto, and the discharge port 46 may be opened, for example, in a direction (for example, obliquely downward) inclined with respect to the axial direction O. The peripheral wall 46a may not be formed.

  In the processing liquid switching apparatus 1 according to the first embodiment, a pair of separation ports (a first separation port 56a and a second separation port 56b) are respectively formed on the peripheral surface of the liquid receiving pipe 5 and face each other. Although shown, it is not limited to this. For example, the first separation port 56a may be formed in the bottom surface 53 and opened in the axial direction O, and the second separation port 56b may be formed in the peripheral surface and opened in the radial direction.

  Further, the partition wall 54 may not be formed inside the liquid receiving pipe 5. Further, the bottom surface 53 of the liquid receiving pipe 5 may be formed as a flat surface.

  The processing liquid switching apparatus 1 according to the first embodiment includes the rotation control unit 6, and inputs a control command from the control calculation unit 61 to the rotation driving unit 62 to automatically rotate the rotary pipe 3, thereby performing gutter control. An example in which the tube 10 is rotated has been described. However, the rotation drive unit 62 of the rotation control unit 6 may be mechanically connected to the guide tube 4, and the gutter tube 10 may be rotated by rotating the guide tube 4. The rotation drive unit 62 may be any actuator that can obtain power, such as a motor or a cylinder, and the rotation of the gutter tube 10 may be manually performed by a user. When the gutter tube 10 is manually rotated, the gutter tube 10 may be rotated by using the indicator rod 71 or the like.

  In the processing liquid switching apparatus 1 according to the first embodiment, the indicating unit 7 projects the sensor light emitted from the first sensor 72 or the second sensor 73 by projecting from the outer peripheral surface of the gutter tube 10 like the indicating rod 71. An example of reflection is shown. However, the indicator 7 does not need to protrude like the indicator rod 71, and may be provided by coloring or marking the outer peripheral surface of the gutter tube 10, for example. Further, the sensor may be any sensor that can detect, such as a magnetic sensor or a limit switch other than the optical sensor. Further, a sensor may not be provided, and the position in the rotation direction may be determined by an identification unit such as a camera or visual observation. Further, the position in the rotation direction may be determined using the positioning control of the driving source. In any case, it is sufficient that the position of the gutter tube 10 in the rotation direction can be grasped from the outside.

1: processing liquid switching device 2: discharge pipe 3: rotating pipe 4: guide pipe 5: liquid receiving pipe 5a: inner peripheral surface 7: indicating section 10: gutter pipe 21: one end 22: tip 23: discharge port 30: holding mechanism 31: one end 32: tip 41: one end 42: other end 45: shielding plate 46: discharge port 51: one end 52: other end 54: partition wall 55: receiving port 56a: first separation port 56b: second separation port 58: lid Member 101: Polishing device H: Internal space O: Axial direction O1: Opening center S1: First gap S2: Second gap

Claims (6)

A discharge pipe for discharging the processing liquid from a discharge port formed at the tip,
At one end, the tip of the discharge pipe is inserted via a first circumferential gap, and at the other end, a discharge port for discharging the processing liquid is formed, and the discharge pipe is rotatable about the axial direction of the discharge pipe. A retained gutter tube,
A liquid receiving pipe having the other end of the gutter pipe inserted through a second circumferential gap and having at one end a receiving port held coaxially with the discharge pipe, and having a plurality of separation ports at the other end; And
The discharge port is set at a position where the center of the opening is offset with respect to the rotation center of the gutter tube,
A processing liquid switching device, wherein a holding mechanism for rotatably holding the gutter tube is disposed on an outer peripheral side of the gutter tube. The processing liquid switching device according to claim 1,
A processing liquid switching device, wherein a partition wall for partitioning the internal space of the liquid receiving pipe into the plurality of separation ports is formed inside the liquid receiving pipe. In the processing liquid switching device according to claim 1 or 2,
A processing liquid switching device, wherein the gutter pipe is provided with an indicator for indicating a position of the gutter pipe in the rotation direction. In the processing liquid switching device according to any one of claims 1 to 3,
The processing liquid switching device, wherein the discharge port is opened in a direction parallel to an axial direction of the gutter tube. In the processing liquid switching device according to any one of claims 1 to 4,
At the other end of the gutter pipe, a shielding plate provided with the discharge port is provided,
The shielding plate has a normal direction inclined with respect to an axial direction of the gutter pipe,
The treatment liquid switching device, wherein the inclination of the shielding plate is formed in a downward gradient toward the discharge port. In the processing liquid switching device according to any one of claims 1 to 5,
The processing liquid switching device, wherein an annular lid member that covers the second gap is provided at the receiving port.