JP2020004782A5 - - Google Patents
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- Publication number
- JP2020004782A5 JP2020004782A5 JP2018120444A JP2018120444A JP2020004782A5 JP 2020004782 A5 JP2020004782 A5 JP 2020004782A5 JP 2018120444 A JP2018120444 A JP 2018120444A JP 2018120444 A JP2018120444 A JP 2018120444A JP 2020004782 A5 JP2020004782 A5 JP 2020004782A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma processing
- processing apparatus
- tubular member
- vacuum vessel
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000926 separation method Methods 0.000 claims description 5
- 239000011148 porous material Substances 0.000 claims description 4
- 230000005684 electric field Effects 0.000 claims description 3
- 210000002381 plasma Anatomy 0.000 claims 22
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims 5
- 239000003989 dielectric material Substances 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000009832 plasma treatment Methods 0.000 claims 1
- 239000000463 material Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018120444A JP7102252B2 (ja) | 2018-06-26 | 2018-06-26 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018120444A JP7102252B2 (ja) | 2018-06-26 | 2018-06-26 | プラズマ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2020004782A JP2020004782A (ja) | 2020-01-09 |
| JP2020004782A5 true JP2020004782A5 (cg-RX-API-DMAC10.html) | 2021-07-26 |
| JP7102252B2 JP7102252B2 (ja) | 2022-07-19 |
Family
ID=69100446
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018120444A Active JP7102252B2 (ja) | 2018-06-26 | 2018-06-26 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP7102252B2 (cg-RX-API-DMAC10.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12444582B2 (en) * | 2020-04-21 | 2025-10-14 | Hitachi High-Tech Corporation | Plasma processing apparatus |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06101072A (ja) * | 1992-09-22 | 1994-04-12 | Sumitomo Metal Ind Ltd | プラズマ装置 |
| JP5074741B2 (ja) * | 2006-11-10 | 2012-11-14 | 株式会社日立ハイテクノロジーズ | 真空処理装置 |
| JP2008187062A (ja) * | 2007-01-31 | 2008-08-14 | Hitachi High-Technologies Corp | プラズマ処理装置 |
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2018
- 2018-06-26 JP JP2018120444A patent/JP7102252B2/ja active Active