JP2019521948A5 - - Google Patents
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- JP2019521948A5 JP2019521948A5 JP2019505137A JP2019505137A JP2019521948A5 JP 2019521948 A5 JP2019521948 A5 JP 2019521948A5 JP 2019505137 A JP2019505137 A JP 2019505137A JP 2019505137 A JP2019505137 A JP 2019505137A JP 2019521948 A5 JP2019521948 A5 JP 2019521948A5
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- Prior art keywords
- aqueous solution
- vapor phase
- carrier gas
- hydrazine
- concentration
- Prior art date
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- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 36
- 239000007864 aqueous solution Substances 0.000 claims description 34
- 239000000126 substance Substances 0.000 claims description 24
- 239000012159 carrier gas Substances 0.000 claims description 20
- 239000007789 gas Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 239000012528 membrane Substances 0.000 claims description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N glycol Chemical group OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 8
- MHAJPDPJQMAIIY-UHFFFAOYSA-N hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 239000000243 solution Substances 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 8
- GUVUOGQBMYCBQP-UHFFFAOYSA-N DMPU Chemical compound CN1CCCN(C)C1=O GUVUOGQBMYCBQP-UHFFFAOYSA-N 0.000 claims description 6
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 claims description 4
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinone Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 claims description 4
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-Propanediol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 claims description 4
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N Triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 claims description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 239000001307 helium Substances 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium(0) Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 125000004435 hydrogen atoms Chemical class [H]* 0.000 claims description 4
- 239000003014 ion exchange membrane Substances 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- DNIAPMSPPWPWGF-UHFFFAOYSA-N propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 4
- 235000013772 propylene glycol Nutrition 0.000 claims description 4
- 239000000356 contaminant Substances 0.000 claims description 2
- 239000012530 fluid Substances 0.000 claims description 2
- 239000012466 permeate Substances 0.000 claims description 2
- VTGOHKSTWXHQJK-UHFFFAOYSA-N pyrimidin-2-ol Chemical compound OC1=NC=CC=N1 VTGOHKSTWXHQJK-UHFFFAOYSA-N 0.000 claims description 2
Description
[本発明1001]
（a）液体および蒸気相を収容するように構成された装置内に、プロセス化学物質と溶媒とを含む非水性溶液を提供する工程であって、該非水性溶液が、該プロセス化学物質のある量の無水蒸気を含む蒸気相を有する、工程と、
（b）キャリアガスまたは真空を該蒸気相と接触させてガスストリームを形成する工程と、
（c）該無水蒸気を含む該ガスストリームを重要なプロセスまたは用途に送達する工程と
を含む方法であって、
該プロセス化学物質がヒドラジンまたは過酸化水素であり、該溶媒が、エチレングリコール、トリエチレングリコール、α-プロピレングリコール、β-プロピレングリコール、1,3-ジメチル-3,4,5,6-テトラヒドロ-2(1H)-ピリミジノン（DMPU）、1,3-ジメチル-2-イミダゾリジノン（DMEU）、およびテトラメチル尿素からなる群より選択される、方法。
[本発明1002]
以下のパラメータ:
（a）前記非水性溶液の温度、
（b）該非水性溶液の圧力、
（c）該非水性溶液の濃度、
（d）前記キャリアガスの温度、
（e）該キャリアガスまたは真空の圧力、および
（f）該キャリアガスの流量
のうちの少なくとも1つを変更することによって前記蒸気相の少なくとも1つの成分の濃度を変更する工程をさらに含む、本発明1001の方法。
[本発明1003]
少なくとも1つの膜が前記装置内に配設され、該膜が前記非水性溶液から前記蒸気相を少なくとも部分的に分離するように構成されている、本発明1001の方法。
[本発明1004]
前記無水蒸気が、前記非水性溶液の他の任意の成分よりも速い速度で前記膜を透過する、本発明1003の方法。
[本発明1005]
前記膜がイオン交換膜である、本発明1003の方法。
[本発明1006]
前記ガスストリームから汚染物質を除去する工程をさらに含む、本発明1001の方法。
[本発明1007]
前記キャリアガスが、窒素、アルゴン、水素、清浄な乾燥空気、ヘリウム、アンモニア、ならびに室温および大気圧で安定な他のガスからなる群より選択される、本発明1001の方法。
[本発明1008]
前記非水性溶液にエネルギーを加えることによって、前記蒸気相の少なくとも1つの成分の濃度を変更する工程をさらに含む、本発明1001の方法。
[本発明1009]
前記非水性溶液が、約25重量％〜約69重量％のヒドラジンを含む非水性ヒドラジン溶液である、本発明1001の方法。
[本発明1010]
前記非水性ヒドラジン溶液が、約65重量％〜約69重量％のヒドラジンを含む、本発明1009の方法。
[本発明1011]
前記非水性溶液が、0.1％未満、0.01％未満、または0.001％未満の水を含有する、本発明1001の方法。
[本発明1012]
前記ガスストリーム中の送達される無水蒸気の濃度が、送達平均濃度の約5％以内または送達平均濃度の約3％以内で安定している、本発明1001の方法。
[本発明1013]
（a）液体および蒸気相を収容するように構成された装置と、
（b）該装置中に提供される、プロセス化学物質と溶媒とを含む非水性溶液であって、該プロセス化学物質のある量の無水蒸気を含む蒸気相を有する、非水性溶液と、
（c）該蒸気相と流体接触しており、該無水蒸気を含むガスストリームを形成するように構成されたキャリアガスまたは真空と
を含む化学物質送達システムであって、
該プロセス化学物質がヒドラジンまたは過酸化水素であり、該装置が、該ガスストリームを重要なプロセスまたは用途に送達するように構成された出口を有し、該溶媒が、エチレングリコール、トリエチレングリコール、α-プロピレングリコール、β-プロピレングリコール、1,3-ジメチル-3,4,5,6-テトラヒドロ-2(1H)-ピリミジノン（DMPU）、1,3-ジメチル-2-イミダゾリジノン（DMEU）、およびテトラメチル尿素からなる群より選択される、化学物質送達システム。
[本発明1014]
以下のパラメータ:
（a）前記非水性溶液の温度、
（b）該非水性溶液の圧力、
（c）該非水性溶液の濃度、
（d）前記キャリアガスの温度、
（e）該キャリアガスまたは真空の圧力、および
（f）該キャリアガスの流量
のうちの少なくとも1つを変更することによって前記蒸気相の少なくとも1つの成分の濃度を変更するように構成された1つまたは複数の構成要素をさらに含む、本発明1013の化学物質送達システム。
[本発明1015]
前記装置が、前記蒸気相を前記非水性溶液から少なくとも部分的に分離するように構成された少なくとも1つの膜を含む、本発明1013の化学物質送達システム。
[本発明1016]
前記膜がイオン交換膜である、本発明1015の化学物質送達システム。
[本発明1017]
前記キャリアガスが、窒素、アルゴン、水素、清浄な乾燥空気、ヘリウム、アンモニア、ならびに室温および大気圧で安定な他のガスからなる群より選択される、本発明1013の化学物質送達システム。
[本発明1018]
前記装置が、非水性ヒドラジン溶液にエネルギーを加えるように構成された構成要素をさらに含む、本発明1013の化学物質送達システム。
[本発明1019]
前記非水性溶液が、約25重量％〜約69重量％のヒドラジンを含む非水性ヒドラジン溶液である、本発明1013の化学物質送達システム。
前述の一般的な説明および以下の詳細な説明はいずれも、例示および説明のためのものに過ぎず、本発明を限定するものではないことが理解されるべきである。
[Invention 1001]
(A) providing a non-aqueous solution comprising a process chemical and a solvent in an apparatus configured to contain a liquid and a vapor phase, the non-aqueous solution comprising an amount of the process chemical. Having a vapor phase containing no water vapor of
(B) contacting a carrier gas or vacuum with the vapor phase to form a gas stream;
(C) delivering the gas stream containing the water vapor to a critical process or application;
A method including
The process chemical is hydrazine or hydrogen peroxide and the solvent is ethylene glycol, triethylene glycol, α-propylene glycol, β-propylene glycol, 1,3-dimethyl-3,4,5,6-tetrahydro- A method selected from the group consisting of 2 (1H) -pyrimidinone (DMPU), 1,3-dimethyl-2-imidazolidinone (DMEU), and tetramethylurea.
[Invention 1002]
The following parameters:
(A) the temperature of the non-aqueous solution,
(B) the pressure of the non-aqueous solution,
(C) the concentration of the non-aqueous solution,
(D) the temperature of the carrier gas,
(E) the pressure of the carrier gas or vacuum, and
(F) Flow rate of the carrier gas
The method of invention 1001, further comprising altering the concentration of at least one component of the vapor phase by altering at least one of the.
[Invention 1003]
The method of invention 1001, wherein at least one membrane is disposed within said device, said membrane being configured to at least partially separate said vapor phase from said non-aqueous solution.
[Invention 1004]
The method of invention 1003, wherein the water vapor-free permeates the membrane at a faster rate than any other component of the non-aqueous solution.
[Invention 1005]
The method of invention 1003, wherein said membrane is an ion exchange membrane.
[Invention 1006]
The method of invention 1001, further comprising the step of removing contaminants from the gas stream.
[Invention 1007]
The method of invention 1001, wherein the carrier gas is selected from the group consisting of nitrogen, argon, hydrogen, clean dry air, helium, ammonia, and other gases stable at room temperature and atmospheric pressure.
[Invention 1008]
The method of invention 1001, further comprising altering the concentration of at least one component of the vapor phase by applying energy to the non-aqueous solution.
[Invention 1009]
The method of invention 1001, wherein said non-aqueous solution is a non-aqueous hydrazine solution containing from about 25% to about 69% by weight hydrazine.
[Invention 1010]
The method of invention 1009, wherein said non-aqueous hydrazine solution comprises from about 65% to about 69% by weight hydrazine.
[Invention 1011]
The method of invention 1001, wherein said non-aqueous solution contains less than 0.1%, less than 0.01%, or less than 0.001% water.
[Invention 1012]
The method of invention 1001, wherein the concentration of water vapor delivered in the gas stream is stable within about 5% of the delivered average concentration or within about 3% of the delivered average concentration.
[Invention 1013]
(A) a device configured to contain a liquid and a vapor phase,
(B) a non-aqueous solution, provided in the apparatus, comprising a process chemical and a solvent, the non-aqueous solution having a vapor phase comprising an amount of water vapor of the process chemical;
(C) a carrier gas or vacuum that is in fluid contact with the vapor phase and is configured to form a gas stream containing the water vapor-free
A chemical delivery system comprising:
The process chemistry is hydrazine or hydrogen peroxide, the device has an outlet configured to deliver the gas stream to a critical process or application, and the solvent is ethylene glycol, triethylene glycol, α-propylene glycol, β-propylene glycol, 1,3-dimethyl-3,4,5,6-tetrahydro-2 (1H) -pyrimidinone (DMPU), 1,3-dimethyl-2-imidazolidinone (DMEU) , And a chemical delivery system selected from the group consisting of tetramethylurea.
[Invention 1014]
The following parameters:
(A) the temperature of the non-aqueous solution,
(B) the pressure of the non-aqueous solution,
(C) the concentration of the non-aqueous solution,
(D) the temperature of the carrier gas,
(E) the pressure of the carrier gas or vacuum, and
(F) Flow rate of the carrier gas
The chemical delivery system of invention 1013, further comprising one or more components configured to alter the concentration of at least one component of said vapor phase by altering at least one of said.
[Invention 1015]
The chemical delivery system of invention 1013, wherein the device comprises at least one membrane configured to at least partially separate the vapor phase from the non-aqueous solution.
[Invention 1016]
The chemical delivery system of invention 1015, wherein said membrane is an ion exchange membrane.
[Invention 1017]
The chemical delivery system of the invention 1013, wherein said carrier gas is selected from the group consisting of nitrogen, argon, hydrogen, clean dry air, helium, ammonia, and other gases stable at room temperature and atmospheric pressure.
[Invention 1018]
The chemical delivery system of claim 1013, wherein the device further comprises a component configured to apply energy to the non-aqueous hydrazine solution.
[Invention 1019]
The chemical delivery system of invention 1013, wherein said non-aqueous solution is a non-aqueous hydrazine solution comprising about 25 wt% to about 69 wt% hydrazine.
It is to be understood that both the foregoing general description and the following detailed description are for illustration and description only, and not for limiting the present invention.
Claims (15)
（b）キャリアガスまたは真空を該蒸気相と接触させてガスストリームを形成する工程と、
（c）該無水蒸気を含む該ガスストリームを重要なプロセスまたは用途に送達する工程と
を含む方法であって、
該プロセス化学物質がヒドラジンまたは過酸化水素であり、該溶媒が、エチレングリコール、トリエチレングリコール、α-プロピレングリコール、β-プロピレングリコール、1,3-ジメチル-3,4,5,6-テトラヒドロ-2(1H)-ピリミジノン（DMPU）、1,3-ジメチル-2-イミダゾリジノン（DMEU）、およびテトラメチル尿素からなる群より選択される、方法。 (A) providing a non-aqueous solution comprising a process chemical and a solvent in an apparatus configured to contain a liquid and a vapor phase, the non-aqueous solution comprising an amount of the process chemical. Having a vapor phase containing no water vapor of
(B) contacting a carrier gas or vacuum with the vapor phase to form a gas stream;
(C) delivering the gas stream containing the water vapor-free to a critical process or application.
The process chemical is hydrazine or hydrogen peroxide and the solvent is ethylene glycol, triethylene glycol, α-propylene glycol, β-propylene glycol, 1,3-dimethyl-3,4,5,6-tetrahydro- A method selected from the group consisting of 2 (1H) -pyrimidinone (DMPU), 1,3-dimethyl-2-imidazolidinone (DMEU), and tetramethylurea.
（a）前記非水性溶液の温度、
（b）該非水性溶液の圧力、
（c）該非水性溶液の濃度、
（d）前記キャリアガスの温度、
（e）該キャリアガスまたは真空の圧力、および
（f）該キャリアガスの流量
のうちの少なくとも1つを変更することによって前記蒸気相の少なくとも1つの成分の濃度を変更する工程をさらに含む、請求項1記載の方法。 The following parameters:
(A) the temperature of the non-aqueous solution,
(B) the pressure of the non-aqueous solution,
(C) the concentration of the non-aqueous solution,
(D) the temperature of the carrier gas,
Further comprising the step of (e) changing the concentration of at least one component of the vapor phase by changing at least one of the pressure of the carrier gas or vacuum and (f) the flow rate of the carrier gas. The method according to item 1.
（b）該装置中に提供される、プロセス化学物質と溶媒とを含む非水性溶液であって、該プロセス化学物質のある量の無水蒸気を含む蒸気相を有する、非水性溶液と、
（c）該蒸気相と流体接触しており、該無水蒸気を含むガスストリームを形成するように構成されたキャリアガスまたは真空と
を含む化学物質送達システムであって、
該プロセス化学物質がヒドラジンまたは過酸化水素であり、該装置が、該ガスストリームを重要なプロセスまたは用途に送達するように構成された出口を有し、該溶媒が、エチレングリコール、トリエチレングリコール、α-プロピレングリコール、β-プロピレングリコール、1,3-ジメチル-3,4,5,6-テトラヒドロ-2(1H)-ピリミジノン（DMPU）、1,3-ジメチル-2-イミダゾリジノン（DMEU）、およびテトラメチル尿素からなる群より選択される、化学物質送達システム。 (A) a device configured to contain a liquid and a vapor phase,
(B) a non-aqueous solution, provided in the apparatus, comprising a process chemical and a solvent, the non-aqueous solution having a vapor phase comprising an amount of water vapor of the process chemical;
(C) a chemical delivery system in fluid contact with the vapor phase and comprising a carrier gas or a vacuum configured to form a gas stream containing the water vapor-free,
The process chemistry is hydrazine or hydrogen peroxide, the device has an outlet configured to deliver the gas stream to a critical process or application, and the solvent is ethylene glycol, triethylene glycol, α-propylene glycol, β-propylene glycol, 1,3-dimethyl-3,4,5,6-tetrahydro-2 (1H) -pyrimidinone (DMPU), 1,3-dimethyl-2-imidazolidinone (DMEU) , And a chemical delivery system selected from the group consisting of tetramethylurea.
（a）前記非水性溶液の温度、
（b）該非水性溶液の圧力、
（c）該非水性溶液の濃度、
（d）前記キャリアガスの温度、
（e）該キャリアガスまたは真空の圧力、および
（f）該キャリアガスの流量
のうちの少なくとも1つを変更することによって前記蒸気相の少なくとも1つの成分の濃度を変更するように構成された1つまたは複数の構成要素をさらに含む、請求項11記載の化学物質送達システム。 The following parameters:
(A) the temperature of the non-aqueous solution,
(B) the pressure of the non-aqueous solution,
(C) the concentration of the non-aqueous solution,
(D) the temperature of the carrier gas,
1 configured to modify the concentration of at least one component of the vapor phase by modifying at least one of (e) the pressure of the carrier gas or vacuum, and (f) the flow rate of the carrier gas 12. The chemical delivery system of claim 11 , further comprising one or more components.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662323697P | 2016-04-16 | 2016-04-16 | |
| US62/323,697 | 2016-04-16 | ||
| PCT/US2017/027634 WO2017181013A1 (en) | 2016-04-16 | 2017-04-14 | Method, system, and device for delivery of process gas |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019521948A JP2019521948A (en) | 2019-08-08 |
| JP2019521948A5 true JP2019521948A5 (en) | 2020-05-14 |
| JP6918921B2 JP6918921B2 (en) | 2021-08-11 |
Family
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| JP2019505137A Active JP6918921B2 (en) | 2016-04-16 | 2017-04-14 | Methods, systems, and equipment for the delivery of process gas |
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| Country | Link |
|---|---|
| EP (1) | EP3442691A4 (en) |
| JP (1) | JP6918921B2 (en) |
| KR (1) | KR102483803B1 (en) |
| CN (1) | CN109152990B (en) |
| DE (1) | DE17783234T1 (en) |
| WO (1) | WO2017181013A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10150048B2 (en) | 2014-10-23 | 2018-12-11 | Rasirc, Inc. | Method, system, and device for delivery of process gas |
| JP7141395B2 (en) * | 2016-12-01 | 2022-09-22 | ラシルク，インコーポレイテッド | Method, system, and apparatus for inhibiting decomposition of hydrogen peroxide in gas supply system |
| US11471816B2 (en) * | 2019-03-11 | 2022-10-18 | Karim Salehpoor | Pollutant capturer and mobilizer |
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| US2865714A (en) * | 1954-08-02 | 1958-12-23 | Guggenheim Brothers | Production of anhydrous hydrazine |
| US3557009A (en) * | 1967-05-15 | 1971-01-19 | Norac Co | Nonhazardous polymerization initiators |
| LU85789A1 (en) * | 1985-02-26 | 1986-09-02 | Oreal | USE IN THE THERAPEUTIC AND COSMETIC FIELDS OF AN ANHYDROUS SOLUTION OF HYDROGEN PEROXIDE |
| JPH04154193A (en) * | 1990-10-18 | 1992-05-27 | Mitsubishi Gas Chem Co Inc | Manufacture of multilayer printed board |
| JPH07230953A (en) * | 1994-02-15 | 1995-08-29 | Sumitomo Chem Co Ltd | Vapor growth method for 3b-5b group compound semiconductor |
| JP4232264B2 (en) * | 1999-03-26 | 2009-03-04 | 株式会社Ｉｈｉ | Nitride semiconductor manufacturing method and manufacturing apparatus |
| FR2802829B1 (en) * | 1999-12-24 | 2002-05-17 | Atofina | PROCESS FOR CONCENTRATION OF AQUEOUS HYDRAZINE SOLUTION AND DEVICE FOR IMPLEMENTING SAME |
| FR2815956B1 (en) * | 2000-10-26 | 2003-05-23 | Atofina | PROCESS FOR OBTAINING ANHYDROUS HYDRAZINE AND DEVICE FOR IMPLEMENTING SAME |
| MX2014011521A (en) * | 2012-03-28 | 2015-01-16 | Rasirc Inc | Method of delivering a process gas from a multi-component solution. |
| WO2014014511A1 (en) * | 2012-07-16 | 2014-01-23 | Rasirc | Method, system, and device for delivery of high purity hydrogen peroxide |
| US20160051928A1 (en) * | 2013-04-05 | 2016-02-25 | Rasirc, Inc. | Delivery of a High Concentration Hydrogen Peroxide Gas Stream |
| WO2016065132A1 (en) * | 2014-10-23 | 2016-04-28 | Rasirc, Inc. | Method, system, and device for delivery of process gas |
| WO2018089502A1 (en) * | 2016-11-08 | 2018-05-17 | Rasirc, Inc. | Method, system and device for delivery of process gas |
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2017
- 2017-04-14 WO PCT/US2017/027634 patent/WO2017181013A1/en active Application Filing
- 2017-04-14 DE DE17783234.2T patent/DE17783234T1/en active Pending
- 2017-04-14 JP JP2019505137A patent/JP6918921B2/en active Active
- 2017-04-14 KR KR1020187031690A patent/KR102483803B1/en active IP Right Grant
- 2017-04-14 CN CN201780029147.5A patent/CN109152990B/en active Active
- 2017-04-14 EP EP17783234.2A patent/EP3442691A4/en active Pending
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