DE17783234T1 - METHOD, SYSTEM AND DEVICE FOR DISPENSING PROCESS GAS - Google Patents

METHOD, SYSTEM AND DEVICE FOR DISPENSING PROCESS GAS Download PDF

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Publication number
DE17783234T1
DE17783234T1 DE17783234.2T DE17783234T DE17783234T1 DE 17783234 T1 DE17783234 T1 DE 17783234T1 DE 17783234 T DE17783234 T DE 17783234T DE 17783234 T1 DE17783234 T1 DE 17783234T1
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Prior art keywords
vapor phase
solution
carrier gas
vapor
hydrazine
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DE17783234.2T
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German (de)
Inventor
Jr. Daniel Alvarez
Russell J. Holmes
Jeffrey J. Spiegelman
Edward HEINLEIN
Christopher RAMOS
Jeremiah Trammel
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RASIRC Inc
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RASIRC Inc
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Publication of DE17783234T1 publication Critical patent/DE17783234T1/en
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/38—Removing components of undefined structure
    • B01D53/44—Organic components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
    • B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
    • B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/36—Pervaporation; Membrane distillation; Liquid permeation
    • B01D61/363—Vapour permeation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/02—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor characterised by their properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/06—Organic material
    • B01D71/30—Polyalkenyl halides
    • B01D71/32—Polyalkenyl halides containing fluorine atoms
    • B01D71/36—Polytetrafluoroethene
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/10—Mixing gases with gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C11/00—Use of gas-solvents or gas-sorbents in vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/002—Details
    • H01G4/018—Dielectrics
    • H01G4/06—Solid dielectrics
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
    • B01D2053/221—Devices
    • B01D2053/223—Devices with hollow tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2325/00—Details relating to properties of membranes
    • B01D2325/42—Ion-exchange membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
    • B01D63/02—Hollow fibre modules
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/08—Hollow fibre membranes

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Power Engineering (AREA)
  • Biomedical Technology (AREA)
  • Water Supply & Treatment (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Verfahren, aufweisend:
(a) Bereitstellen einer nichtwässrigen Lösung, die eine Prozesschemikalie und ein Lösungsmittel umfasst, in einer Vorrichtung, die konfiguriert ist, um eine flüssige und eine Dampfphase zu enthalten, wobei die nichtwässrige Lösung eine Dampfphase aufweist, die eine Menge an wasserfreiem Dampf der Prozesschemikalie umfasst;
(b) Kontaktieren eines Trägergases oder Vakuums mit der Dampfphase, um einen Gasstrom zu bilden; und
(c) Zuführen des den wasserfreien Dampf umfassenden Gasstroms zu einem kritischen Prozess oder einer kritischen Anwendung, wobei die Prozesschemikalie Hydrazin oder Wasserstoffperoxid ist, und wobei das Lösungsmittel ausgewählt ist aus der Gruppe bestehend aus Ethylenglycol, Triethylenglycol, α-Propylenglycol, β-Propylenglycol, 1,3-Dimethyl-3,4,5,6-Tetrahydro-2(1H)-Pyrimidinon (DMPU), 1,3-Dimethyl-2-Imidazolidinon (DMEU) und Tetramethylhamstoff.Method, comprising
(a) providing a nonaqueous solution comprising a process chemical and a solvent in a device configured to contain a liquid and a vapor phase, the nonaqueous solution having a vapor phase comprising an amount of anhydrous vapor of the process chemical ;
(b) contacting a carrier gas or vacuum with the vapor phase to form a gas stream; and
(c) supplying the gas stream comprising the anhydrous vapor to a critical process or application, wherein the process chemical is hydrazine or hydrogen peroxide, and wherein the solvent is selected from the group consisting of ethylene glycol, triethylene glycol, α-propylene glycol, β-propylene glycol, 1,3-dimethyl-3,4,5,6-tetrahydro-2 (1H) -pyrimidinone (DMPU), 1,3-dimethyl-2-imidazolidinone (DMEU) and tetramethylurea.

Claims (19)

Verfahren, aufweisend: (a) Bereitstellen einer nichtwässrigen Lösung, die eine Prozesschemikalie und ein Lösungsmittel umfasst, in einer Vorrichtung, die konfiguriert ist, um eine flüssige und eine Dampfphase zu enthalten, wobei die nichtwässrige Lösung eine Dampfphase aufweist, die eine Menge an wasserfreiem Dampf der Prozesschemikalie umfasst; (b) Kontaktieren eines Trägergases oder Vakuums mit der Dampfphase, um einen Gasstrom zu bilden; und (c) Zuführen des den wasserfreien Dampf umfassenden Gasstroms zu einem kritischen Prozess oder einer kritischen Anwendung, wobei die Prozesschemikalie Hydrazin oder Wasserstoffperoxid ist, und wobei das Lösungsmittel ausgewählt ist aus der Gruppe bestehend aus Ethylenglycol, Triethylenglycol, α-Propylenglycol, β-Propylenglycol, 1,3-Dimethyl-3,4,5,6-Tetrahydro-2(1H)-Pyrimidinon (DMPU), 1,3-Dimethyl-2-Imidazolidinon (DMEU) und Tetramethylhamstoff.Method, comprising (a) providing a nonaqueous solution comprising a process chemical and a solvent in a device configured to contain a liquid and a vapor phase, the nonaqueous solution having a vapor phase comprising an amount of anhydrous vapor of the process chemical ; (b) contacting a carrier gas or vacuum with the vapor phase to form a gas stream; and (c) supplying the gas stream comprising the anhydrous vapor to a critical process or application, wherein the process chemical is hydrazine or hydrogen peroxide, and wherein the solvent is selected from the group consisting of ethylene glycol, triethylene glycol, α-propylene glycol, β-propylene glycol, 1,3-dimethyl-3,4,5,6-tetrahydro-2 (1H) -pyrimidinone (DMPU), 1,3-dimethyl-2-imidazolidinone (DMEU) and tetramethylurea. Verfahren nach Anspruch 1, ferner umfassend das Ändern der Konzentration mindestens einer Komponente der Dampfphase durch Ändern mindestens eines der folgenden Parameter: (a) die Temperatur der nichtwässrigen Lösung, (b) der Druck der nichtwässrigen Lösung, (c) die Konzentration der nichtwässrigen Lösung, (d) die Temperatur des Trägergases, (e) der Druck des Trägergases oder Vakuums, und (f) der Durchfluss des Trägergases.Method according to Claim 1 further comprising changing the concentration of at least one component of the vapor phase by changing at least one of the following parameters: (a) the temperature of the nonaqueous solution, (b) the pressure of the nonaqueous solution, (c) the concentration of the nonaqueous solution, (d) the temperature of the carrier gas, (e) the pressure of the carrier gas or vacuum, and (f) the flow of the carrier gas. Verfahren nach Anspruch 1, wobei mindestens eine Membran in der Vorrichtung angeordnet ist, wobei die Membran konfiguriert ist, um die Dampfphase zumindest teilweise von der nichtwässrigen Lösung zu trennen.Method according to Claim 1 wherein at least one membrane is disposed in the device, wherein the membrane is configured to at least partially separate the vapor phase from the nonaqueous solution. Verfahren nach Anspruch 3, wobei der wasserfreie Dampf die Membran mit einer schnelleren Rate als jede andere Komponente der nichtwässrigen Lösung durchdringt.Method according to Claim 3 wherein the anhydrous vapor permeates the membrane at a faster rate than any other component of the non-aqueous solution. Verfahren nach Anspruch 3, wobei die Membran eine lonenaustauschmembran ist.Method according to Claim 3 wherein the membrane is an ion exchange membrane. Verfahren nach Anspruch 1, ferner umfassend das Entfernen von Verunreinigungen aus dem Gasstrom.Method according to Claim 1 further comprising removing impurities from the gas stream. Verfahren nach Anspruch 1, wobei das Trägergas ausgewählt ist aus der Gruppe bestehend aus Stickstoff, Argon, Wasserstoff, sauberer Trockenluft, Helium, Ammoniak und anderen Gasen, die bei Raumtemperatur und Atmosphärendruck stabil sind.Method according to Claim 1 wherein the carrier gas is selected from the group consisting of nitrogen, argon, hydrogen, clean dry air, helium, ammonia, and other gases that are stable at room temperature and atmospheric pressure. Verfahren nach Anspruch 1, ferner aufweisend das Ändern der Konzentration von mindestens einer Komponente der Dampfphase durch Hinzufügen von Energie zu der nichtwässrigen Lösung.Method according to Claim 1 further comprising changing the concentration of at least one component of the vapor phase by adding energy to the non-aqueous solution. Verfahren nach Anspruch 1, wobei die nichtwässrige Lösung eine nichtwässrige Hydrazinlösung ist, die von etwa 25 Gew.-% bis etwa 69 Gew.-% Hydrazin umfasst.Method according to Claim 1 wherein the non-aqueous solution is a non-aqueous hydrazine solution comprising from about 25% to about 69% by weight hydrazine. Verfahren nach Anspruch 9, wobei die nichtwässrige Hydrazinlösung etwa 65 Gew.-% bis etwa 69 Gew.-% Hydrazin umfasst.Method according to Claim 9 wherein the non-aqueous hydrazine solution comprises about 65% to about 69% by weight hydrazine. Verfahren nach Anspruch 1, wobei die nichtwässrige Lösung weniger als 0,1 %, 0,01 % oder 0,001 % Wasser enthält.Method according to Claim 1 wherein the non-aqueous solution contains less than 0.1%, 0.01% or 0.001% water. Verfahren nach Anspruch 1, wobei die Konzentration des im Gasstrom abgegebenen wasserfreien Dampfes bis zu etwa 5% der abgegebenen durchschnittlichen Konzentration oder bis zu etwa 3% der abgegebenen durchschnittlichen Konzentration stabil ist.Method according to Claim 1 wherein the concentration of anhydrous vapor delivered in the gas stream is stable up to about 5% of the delivered average concentration or up to about 3% of the delivered average concentration. Chemikalienabgabesystem, aufweisend: (a) eine Vorrichtung, die konfiguriert ist, um eine flüssige und eine Dampfphase zu enthalten; (b) eine nichtwässrige Lösung, die eine Prozesschemikalie und ein in der Vorrichtung bereitgestelltes Lösungsmittel umfasst, wobei die nichtwässrige Lösung eine Dampfphase aufweist, die eine Menge an wasserfreiem Dampf der Prozesschemikalie umfasst; (c) ein Trägergas oder Vakuum in Fluidkontakt mit der Dampfphase und konfiguriert, um einen Gasstrom zu bilden, der den wasserfreien Dampf enthält, wobei die Prozesschemikalie Hydrazin oder Wasserstoffperoxid ist, wobei die Vorrichtung einen Auslass aufweist, der konfiguriert ist, um den Gasstrom zu einem kritischen Prozess oder einer kritischen Anwendung zu liefern, und wobei das Lösungsmittel ausgewählt ist aus der Gruppe bestehend aus Ethylenglycol, Triethylenglycol, α-Propylenglycol, β-Propylenglycol, 1,3-Dimethyl-3,4,5,6-Tetrahydro-2(1H)-Pyrimidinon (DMPU), 1,3-Dimethyl-2-Imidazolidinon (DMEU) und Tetramethylharnstoff.Chemical delivery system, comprising: (a) a device configured to contain a liquid and a vapor phase; (b) a nonaqueous solution comprising a process chemical and a solvent provided in the device, the nonaqueous solution having a vapor phase comprising an amount of anhydrous vapor of the process chemical; (c) a carrier gas or vacuum in fluid contact with the vapor phase and configured to form a gas stream containing the anhydrous vapor, the process chemical being hydrazine or hydrogen peroxide, the apparatus having an outlet configured to direct the gas flow critical process or critical application, and wherein the solvent is selected from the group consisting of ethylene glycol, triethylene glycol, α-propylene glycol, β-propylene glycol, 1,3-dimethyl-3,4,5,6-tetrahydro-2 (1H) -pyrimidinone (DMPU), 1,3-dimethyl-2-imidazolidinone (DMEU) and tetramethylurea. Chemikalienabgabesystem nach Anspruch 13, ferner aufweisend ein oder mehrere Komponenten, die konfiguriert sind, um die Konzentration mindestens einer Komponente der Dampfphase durch Ändern mindestens eines der folgenden Parameter zu ändern: (a) die Temperatur der nichtwässrigen Lösung, (b) der Druck der nichtwässrigen Lösung, (c) die Konzentration der nichtwässrigen Lösung, (d) die Temperatur des Trägergases, (e) der Druck des Trägergases oder Vakuums und (f) der Durchfluss des Trägergases.Chemical delivery system according to Claim 13 , further comprising one or more components configured to change the concentration of at least one component of the vapor phase by changing at least one of the following parameters: (a) the temperature of the nonaqueous solution, (b) the pressure of the nonaqueous solution, (c ) the concentration of the non-aqueous solution, (d) the temperature of the carrier gas, (e) the pressure of the carrier gas or vacuum and (f) the flow of the carrier gas. Chemikalienabgabesystem nach Anspruch 13, wobei die Vorrichtung mindestens eine Membran beinhaltet, die konfiguriert ist, um die Dampfphase mindestens teilweise von der nichtwässrigen Lösung zu trennen. Chemical delivery system according to Claim 13 wherein the device includes at least one membrane configured to at least partially separate the vapor phase from the nonaqueous solution. Chemikalienabgabesystem nach Anspruch 15, wobei die Membran eine lonenaustauschmembran ist.Chemical delivery system according to Claim 15 wherein the membrane is an ion exchange membrane. Chemikalienabgabesystem nach Anspruch 13, wobei das Trägergas ausgewählt ist aus der Gruppe bestehend aus Stickstoff, Argon, Wasserstoff, sauberer Trockenluft, Helium, Ammoniak und anderen Gasen, die bei Raumtemperatur und Atmosphärendruck stabil sind.Chemical delivery system according to Claim 13 wherein the carrier gas is selected from the group consisting of nitrogen, argon, hydrogen, clean dry air, helium, ammonia, and other gases that are stable at room temperature and atmospheric pressure. Chemikalienabgabesystem nach Anspruch 13, wobei die Vorrichtung ferner eine Komponente umfasst, die konfiguriert ist, um der nichtwässrigen Hydrazinlösung Energie zuzuführen.Chemical delivery system according to Claim 13 wherein the apparatus further comprises a component configured to supply energy to the non-aqueous hydrazine solution. Chemikalienabgabesystem nach Anspruch 13, wobei die nichtwässrige Lösung eine nichtwässrige Hydrazinlösung ist, die von etwa 25 Gew.-% bis etwa 69 Gew.-% Hydrazin umfasst.Chemical delivery system according to Claim 13 wherein the non-aqueous solution is a non-aqueous hydrazine solution comprising from about 25% to about 69% by weight hydrazine.
DE17783234.2T 2016-04-16 2017-04-14 METHOD, SYSTEM AND DEVICE FOR DISPENSING PROCESS GAS Pending DE17783234T1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201662323697P 2016-04-16 2016-04-16
US201662323697P 2016-04-16
PCT/US2017/027634 WO2017181013A1 (en) 2016-04-16 2017-04-14 Method, system, and device for delivery of process gas
EP17783234.2A EP3442691A4 (en) 2016-04-16 2017-04-14 Method, system, and device for delivery of process gas

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DE17783234T1 true DE17783234T1 (en) 2019-06-27

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JP (1) JP6918921B2 (en)
KR (1) KR102483803B1 (en)
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US10150048B2 (en) 2014-10-23 2018-12-11 Rasirc, Inc. Method, system, and device for delivery of process gas
JP7141395B2 (en) * 2016-12-01 2022-09-22 ラシルク，インコーポレイテッド Method, system, and apparatus for inhibiting decomposition of hydrogen peroxide in gas supply system
US11471816B2 (en) * 2019-03-11 2022-10-18 Karim Salehpoor Pollutant capturer and mobilizer

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Publication number Priority date Publication date Assignee Title
US2785052A (en) * 1951-06-22 1957-03-12 Metalectro Corp Production of hydrazine
US2865714A (en) * 1954-08-02 1958-12-23 Guggenheim Brothers Production of anhydrous hydrazine
US3557009A (en) * 1967-05-15 1971-01-19 Norac Co Nonhazardous polymerization initiators
LU85789A1 (en) * 1985-02-26 1986-09-02 Oreal USE IN THE THERAPEUTIC AND COSMETIC FIELDS OF AN ANHYDROUS SOLUTION OF HYDROGEN PEROXIDE
JPH04154193A (en) * 1990-10-18 1992-05-27 Mitsubishi Gas Chem Co Inc Manufacture of multilayer printed board
JPH07230953A (en) * 1994-02-15 1995-08-29 Sumitomo Chem Co Ltd Vapor growth method for 3b-5b group compound semiconductor
JP4232264B2 (en) * 1999-03-26 2009-03-04 株式会社Ｉｈｉ Nitride semiconductor manufacturing method and manufacturing apparatus
FR2802829B1 (en) * 1999-12-24 2002-05-17 Atofina PROCESS FOR CONCENTRATION OF AQUEOUS HYDRAZINE SOLUTION AND DEVICE FOR IMPLEMENTING SAME
FR2815956B1 (en) * 2000-10-26 2003-05-23 Atofina PROCESS FOR OBTAINING ANHYDROUS HYDRAZINE AND DEVICE FOR IMPLEMENTING SAME
CA2867883C (en) * 2012-03-28 2020-06-02 Rasirc, Inc. Method of delivering a process gas from a multi-component solution
WO2014014511A1 (en) * 2012-07-16 2014-01-23 Rasirc Method, system, and device for delivery of high purity hydrogen peroxide
KR102192990B1 (en) * 2013-04-05 2020-12-18 라시크 아이엔씨. Delivery of a high concentration hydrogen peroxide gas stream
US10214420B2 (en) * 2014-10-23 2019-02-26 Rasirc, Inc. Method, system, and device for delivery of process gas

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KR20180135915A (en) 2018-12-21
JP2019521948A (en) 2019-08-08
CN109152990B (en) 2021-11-09
JP6918921B2 (en) 2021-08-11
CN109152990A (en) 2019-01-04
WO2017181013A1 (en) 2017-10-19
EP3442691A4 (en) 2019-12-18
EP3442691A1 (en) 2019-02-20

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