JP2019517623A5 - - Google Patents

Download PDF

Info

Publication number
JP2019517623A5
JP2019517623A5 JP2018561973A JP2018561973A JP2019517623A5 JP 2019517623 A5 JP2019517623 A5 JP 2019517623A5 JP 2018561973 A JP2018561973 A JP 2018561973A JP 2018561973 A JP2018561973 A JP 2018561973A JP 2019517623 A5 JP2019517623 A5 JP 2019517623A5
Authority
JP
Japan
Prior art keywords
shadow mask
main surface
substrate
chuck
plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2018561973A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019517623A (ja
JP7134095B2 (ja
Filing date
Publication date
Priority claimed from US15/597,635 external-priority patent/US10072328B2/en
Priority claimed from US15/602,939 external-priority patent/US10386731B2/en
Application filed filed Critical
Priority claimed from PCT/IB2017/054481 external-priority patent/WO2017203502A2/en
Publication of JP2019517623A publication Critical patent/JP2019517623A/ja
Publication of JP2019517623A5 publication Critical patent/JP2019517623A5/ja
Application granted granted Critical
Publication of JP7134095B2 publication Critical patent/JP7134095B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2018561973A 2017-05-17 2017-07-24 高精度シャドーマスク堆積システム及びその方法 Active JP7134095B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US15/597,635 US10072328B2 (en) 2016-05-24 2017-05-17 High-precision shadow-mask-deposition system and method therefor
US15/597,635 2017-05-17
US15/602,939 2017-05-23
US15/602,939 US10386731B2 (en) 2016-05-24 2017-05-23 Shadow-mask-deposition system and method therefor
PCT/IB2017/054481 WO2017203502A2 (en) 2016-05-24 2017-07-24 High-precision shadow-mask-deposition system and method therefor

Publications (3)

Publication Number Publication Date
JP2019517623A JP2019517623A (ja) 2019-06-24
JP2019517623A5 true JP2019517623A5 (cg-RX-API-DMAC7.html) 2020-09-10
JP7134095B2 JP7134095B2 (ja) 2022-09-09

Family

ID=65803040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018561973A Active JP7134095B2 (ja) 2017-05-17 2017-07-24 高精度シャドーマスク堆積システム及びその方法

Country Status (4)

Country Link
JP (1) JP7134095B2 (cg-RX-API-DMAC7.html)
KR (1) KR102378672B1 (cg-RX-API-DMAC7.html)
CN (1) CN109642309B (cg-RX-API-DMAC7.html)
TW (1) TWI737795B (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111272089B (zh) * 2020-03-03 2022-06-28 中国科学院光电技术研究所 一种原位间隙检测装置与检测方法
US11851751B2 (en) 2021-07-23 2023-12-26 Taiwan Semiconductor Manufacturing Co., Ltd. Deposition system and method
CN114524406B (zh) * 2021-12-23 2024-10-29 浙江大学 一种通过操纵衬底宏观移动轨迹实现纳米结构书写的方法
KR102787147B1 (ko) * 2023-05-23 2025-03-25 가천대학교 산학협력단 섀도우 마스크를 이용한 인-시튜 금속 메쉬 그리드를 형성하는 반도체 제조방법 및 그 방법에 의하여 형성되는 반도체 소자

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4676193A (en) * 1984-02-27 1987-06-30 Applied Magnetics Corporation Stabilized mask assembly for direct deposition of a thin film pattern onto a substrate
US5300813A (en) * 1992-02-26 1994-04-05 International Business Machines Corporation Refractory metal capped low resistivity metal conductor lines and vias
JPH1050584A (ja) * 1996-08-07 1998-02-20 Nikon Corp マスク保持装置
US6287436B1 (en) * 1998-02-27 2001-09-11 Innovent, Inc. Brazed honeycomb collimator
US6592728B1 (en) * 1998-08-04 2003-07-15 Veeco-Cvc, Inc. Dual collimated deposition apparatus and method of use
RU2155204C2 (ru) * 1998-09-23 2000-08-27 Институт проблем химической физики РАН Органический электролюминесцентный материал, излучающий в красной области спектра
AU2001266929A1 (en) * 2000-09-22 2002-04-02 General Electric Company Combinatorial coating systems and methods
JP2004119064A (ja) * 2002-09-24 2004-04-15 Fujitsu Ltd 薄膜形成装置および薄膜形成方法
JP2004183044A (ja) * 2002-12-03 2004-07-02 Seiko Epson Corp マスク蒸着方法及び装置、マスク及びマスクの製造方法、表示パネル製造装置、表示パネル並びに電子機器
US20050006223A1 (en) * 2003-05-07 2005-01-13 Robert Nichols Sputter deposition masking and methods
JP4860909B2 (ja) * 2004-05-25 2012-01-25 キヤノン株式会社 マスク構造体
JP4609756B2 (ja) * 2005-02-23 2011-01-12 三井造船株式会社 成膜装置のマスク位置合わせ機構および成膜装置
US7239376B2 (en) * 2005-07-27 2007-07-03 International Business Machines Corporation Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices
US7615161B2 (en) * 2005-08-19 2009-11-10 General Electric Company Simplified way to manufacture a low cost cast type collimator assembly
EP2168644B1 (en) * 2008-09-29 2014-11-05 Applied Materials, Inc. Evaporator for organic materials and method for evaporating organic materials
WO2010113102A1 (en) * 2009-04-03 2010-10-07 Koninklijke Philips Electronics N. V. An arrangement for holding a substrate in a material deposition apparatus
TWI472639B (zh) 2009-05-22 2015-02-11 Samsung Display Co Ltd 薄膜沉積設備
JP5639431B2 (ja) * 2010-09-30 2014-12-10 キヤノントッキ株式会社 成膜装置
WO2012121139A1 (ja) * 2011-03-10 2012-09-13 シャープ株式会社 蒸着装置、蒸着方法、及び有機ｅｌ表示装置
US8728563B2 (en) * 2011-05-03 2014-05-20 Palmaz Scientific, Inc. Endoluminal implantable surfaces, stents, and grafts and method of making same
US20130168231A1 (en) * 2011-12-31 2013-07-04 Intermolecular Inc. Method For Sputter Deposition And RF Plasma Sputter Etch Combinatorial Processing
WO2014002841A1 (ja) * 2012-06-26 2014-01-03 シャープ株式会社 マスクフレーム
KR102100446B1 (ko) * 2012-12-10 2020-04-14 삼성디스플레이 주식회사 박막 증착용 마스크 조립체 및 이의 제조 방법
KR102103247B1 (ko) * 2012-12-21 2020-04-23 삼성디스플레이 주식회사 증착 장치
US20170104158A1 (en) 2014-06-05 2017-04-13 Sharp Kabushiki Kaisha Vapor deposition method and vapor deposition apparatus
RU2588921C2 (ru) * 2014-09-25 2016-07-10 Общество С Ограниченной Ответственностью "Ласком" Способ формирования токоведущей шины на низкоэмиссионной поверхности стекла
US10115573B2 (en) * 2014-10-14 2018-10-30 Applied Materials, Inc. Apparatus for high compressive stress film deposition to improve kit life
CN107002233A (zh) * 2014-11-17 2017-08-01 应用材料公司 具有用于涂布工艺的分离掩模的掩蔽布置以及卷材涂布设施
DE102015119327A1 (de) * 2015-11-10 2017-05-11 Von Ardenne Gmbh Verfahren, Beschichtungsanordnung und Beschichtungsmaterial-Transfer-Maske
WO2019177861A1 (en) * 2018-03-10 2019-09-19 Applied Materials, Inc. Method and apparatus for asymmetric selective physical vapor deposition

Similar Documents

Publication Publication Date Title
US8308921B1 (en) Mask for increased uniformity in ion beam deposition
US11275315B2 (en) High-precision shadow-mask-deposition system and method therefor
JP2019517623A5 (cg-RX-API-DMAC7.html)
US10072328B2 (en) High-precision shadow-mask-deposition system and method therefor
US20240349583A1 (en) Mechanically Pre-biased Shadow Mask and Method of Formation
US8568963B2 (en) Method of manufacturing mask for depositing thin film
US10386731B2 (en) Shadow-mask-deposition system and method therefor
JP2019516866A5 (cg-RX-API-DMAC7.html)
US20170067144A1 (en) Vacuum evaporation source apparatus and vacuum evaporation equipment
KR102378672B1 (ko) 고정밀 섀도 마스크 증착 시스템 및 그 방법
US11152573B2 (en) Shadow mask comprising a gravity-compensation layer and method of fabrication
JP2019531590A (ja) キャリアを搬送するための装置、基板を真空処理するためのシステム、及び真空チャンバ内でキャリアを搬送するための方法
JP4426196B2 (ja) コーティング装置及び蒸着装置
JP2018003144A (ja) マスク支持体、成膜装置及び成膜方法
SG148958A1 (en) Systems and methods for curing a deposited layer on a substrate
KR20220014353A (ko) 마스크 척 및 이를 포함하는 마스크 제조 장치
US9724725B2 (en) Deposition apparatus and deposition method using the same
KR20170052753A (ko) 레이저 결정화 장치
JPWO2020115962A1 (ja) 成膜装置及び成膜方法
TW202236548A (zh) 對背側晶圓支撐件使用控制的氣體壓力
CN109642313B (zh) 高精准度蔽荫掩模沉积系统及其方法