JP2019505829A5 - - Google Patents

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Publication number
JP2019505829A5
JP2019505829A5 JP2018528789A JP2018528789A JP2019505829A5 JP 2019505829 A5 JP2019505829 A5 JP 2019505829A5 JP 2018528789 A JP2018528789 A JP 2018528789A JP 2018528789 A JP2018528789 A JP 2018528789A JP 2019505829 A5 JP2019505829 A5 JP 2019505829A5
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Prior art keywords
polishing
optical surface
area
shape
location
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JP2018528789A
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Japanese (ja)
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JP2019505829A (en
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Priority claimed from DE102015223983.7A external-priority patent/DE102015223983A1/en
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Claims (12)

研磨工具（６）により光学面（２）を研磨する方法であって、
自由曲面として具現された前記光学面（２）と、該光学面（２）の側方に隣接する区域（３）とにわたって、前記研磨工具（６）の研磨面（７）を動かすことにより、前記光学面（２）を研磨するステップを含み、前記区域（３）の各場所（Ｐ）で研磨基準（Δｚ）の閾値（ΔｚＳ）を超えないように、前記区域（３）の形状を前記研磨工具（６）に、特に該研磨工具（６）の前記研磨面（７）の形状に適合させ、前記研磨基準（Δｚ）は、前記光学面（２）に隣接する前記区域（３）にわたって前記研磨工具（６）を動かすことにより作製された前記光学面（２）における研磨誤差の尺度を表す、
方法。 A method for polishing an optical surface (2) with a polishing tool (6),
By moving the polishing surface (7) of the polishing tool (6) over the optical surface (2) embodied as a free-form surface and an area (3) adjacent to the optical surface (2), Polishing the optical surface (2), wherein the shape of the area (3) is adjusted such that the polishing reference (Δz) threshold (Δz S ) is not exceeded at each location (P) of the area (3). The polishing tool (6) is adapted in particular to the shape of the polishing surface (7) of the polishing tool (6), and the polishing reference (Δz) is set in the area (3) adjacent to the optical surface (2). Representing a measure of polishing error in the optical surface (2) produced by moving the polishing tool (6) over
Method. 請求項１に記載の方法であって、前記研磨工具（６）の前記研磨面（７）は、前記光学面（２）及び前記区域（３）にわたる運動中に回転軸（８）に関して回転運動を行う方法。 2. The method according to claim 1 , wherein the polishing surface (7) of the polishing tool (6) rotates with respect to a rotation axis (8) during a movement over the optical surface (2) and the area (3). How to do. 請求項１又は２に記載の方法であって、前記区域（３）の各場所（Ｐ）での局所非点収差（Δｚ）を研磨基準として選択する方法。 Method according to claim 1 or 2 , wherein a local astigmatism (Δz) at each location (P) of the zone (3) is selected as a polishing criterion. 請求項３に記載の方法であって、前記区域（３）の各場所（Ｐ）での前記局所非点収差Δｚを、
Δｚ＝（ｋｍａｘ−ｋｍｉｎ）／８Ｄ２
により求め、式中、Ｄは前記研磨工具（６）の前記研磨面（７）の直径を示し、ｋｍｉｎは前記区域（３）の各場所（Ｐ）での最小局所曲率を示し、ｋｍａｘは前記区域（３）の各場所（Ｐ）での最大局所曲率を示す方法。 4. The method according to claim 3 , wherein the local astigmatism Δz at each location (P) of the zone (3) is:
Δz = (k max −k min ) / 8D 2
Where D represents the diameter of the polishing surface (7) of the polishing tool (6), kmin represents the minimum local curvature at each location (P) in the section (3), and kmax Is a method of indicating the maximum local curvature at each location (P) in the area (3). 請求項１〜４のいずれか１項に記載の方法であって、前記研磨工具（６）の前記研磨面（７）は平面を形成する方法。 Method according to any of the preceding claims, wherein the polishing surface (7) of the polishing tool (6) forms a plane. 請求項１〜５のいずれか１項に記載の方法であって、前記光学面（２）の形状及び前記側方隣接区域（３）の形状を、前記光学面（２）及び前記側方隣接区域（３）の両方の面（ｚ（ｘ，ｙ））の解析的表現に基づいて求める方法。 A method according to any one of the preceding claims, wherein the shape of the optical surface (2) and the shape of the laterally adjacent area (3) are changed by changing the shape of the optical surface (2) and the laterally adjacent region. A method based on an analytical expression of both surfaces (z (x, y)) of the area (3). 請求項６に記載の方法であって、前記光学面（２）の形状を求める際に、前記側方隣接区域（３）の前記研磨基準（Δｚ）の閾値（ΔｚＳ）を考慮に入れる方法。 Method according to claim 6 , wherein in determining the shape of the optical surface (2), a threshold value (Δz S ) of the polishing criterion (Δz) of the laterally adjacent area (3) is taken into account. . 請求項１〜５のいずれか１項に記載の方法であって、前記区域（３）の形状を、該区域（３）の面の解析的表現を用いずに求める方法。 Method according to any of the preceding claims, wherein the shape of the area (3) is determined without using an analytical representation of the surface of the area (3). 請求項１〜８のいずれか１項に記載の方法であって、前記研磨するステップの前のステップにおいて、
研磨対象の前記光学面（２）及び前記側方隣接区域（３）を作製するために基板（１）を機械加工するステップ
をさらに含む方法。 The method according to any one of claims 1 to 8 , wherein in the step before the polishing step,
A method further comprising the step of machining a substrate (1) to create said optical surface (2) and said lateral adjacent area (3) to be polished. 請求項９に記載の方法であって、前記基板（１）の機械加工及び研磨中に代用形状を有する光学面（２）を作製し、前記代用形状は、前記光学面（２）の目標形状から逸脱しており、前記光学面（２）の目標形状を、前記研磨の後の補正プロセスで前記代用形状から作る方法。 10. The method according to claim 9 , wherein an optical surface (2) having a surrogate shape is produced during machining and polishing of the substrate (1), wherein the surrogate shape is a target shape of the optical surface (2). Wherein the target shape of the optical surface (2) is made from the surrogate shape in a correction process after the polishing. 請求項１〜１０のいずれか１項に記載の方法であって、前記研磨基準（Δｚ）の前記閾値（ΔｚＳ）を、前記光学面（２）での前記研磨誤差が少なくとも１つの後続の補正プロセスで補正可能であるように選択する方法。 The method according to any one of the preceding claims, wherein the threshold (Δz S ) of the polishing criterion (Δz) is adjusted by the polishing error at the optical surface (2) by at least one subsequent error. How to choose to be correctable in the correction process. 請求項１１に記載の方法であって、前記後続の補正プロセスは、イオンビーム加工及び磁気粘性研磨を含む群から選択される方法。 The method according to claim 11 , wherein the subsequent correction process is selected from the group comprising ion beam machining and magnetic viscous polishing.
JP2018528789A 2015-12-02 2016-11-16 Method for polishing optical surface and optical element Pending JP2019505829A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102015223983.7 2015-12-02
DE102015223983.7A DE102015223983A1 (en) 2015-12-02 2015-12-02 Method for polishing an optical surface and optical element
PCT/EP2016/077866 WO2017093020A1 (en) 2015-12-02 2016-11-16 Method for polishing an optical surface and optical element

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JP2019505829A5 true JP2019505829A5 (en) 2019-12-26

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CN (1) CN108369299B (en)
DE (1) DE102015223983A1 (en)
WO (1) WO2017093020A1 (en)

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