JP2019217427A - Cleaning device and operation method of the cleaning device - Google Patents

Cleaning device and operation method of the cleaning device Download PDF

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JP2019217427A
JP2019217427A JP2018114581A JP2018114581A JP2019217427A JP 2019217427 A JP2019217427 A JP 2019217427A JP 2018114581 A JP2018114581 A JP 2018114581A JP 2018114581 A JP2018114581 A JP 2018114581A JP 2019217427 A JP2019217427 A JP 2019217427A
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cleaning
cleaning liquid
tank
liquid
pipe
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JP6993932B2 (en
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元宏 渥美
Motohiro Atsumi
元宏 渥美
坂本 憲一
Kenichi Sakamoto
憲一 坂本
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Olympus Corp
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Abstract

To reduce a waste amount of a solvent while preventing reattachment of stain on a cleaning object.SOLUTION: A cleaning device 1 includes: two or more cleaning tanks which includes a first cleaning tank 11 and a second cleaning tank 12 positioned on an upstream side than the first cleaning tank; a cleaning liquid reproduction part 20 which reproduces a cleaning liquid supplied from the cleaning tanks and supplies to the cleaning tanks; piping 52 which connects the cleaning liquid reproduction part, and the first cleaning tank and the second cleaning tank; and a controller 30 which controls a flow of the cleaning liquid in the cleaning liquid reproduction part and the piping. The cleaning liquid reproduction part has two operation modes of a concentrating mode in which stain contained in the cleaning liquid is concentrated, and a normal mode without concentration. The controller controls the flow of the cleaning liquid in the piping so that the reproduced cleaning liquid is delivered to the second cleaning tank in the normal mode, and controls the flow of the cleaning liquid in the piping so that the reproduced cleaning liquid is delivered to the first cleaning tank in the concentrating mode.SELECTED DRAWING: Figure 1

Description

本発明は、複数の洗浄槽を用いる洗浄装置および洗浄装置の作動方法に関する。   The present invention relates to a cleaning device using a plurality of cleaning tanks and a method of operating the cleaning device.

従来、有機溶剤を用いて光学素子等の精密部品を洗浄することが知られている。
特許文献1には、有機溶剤を再利用しながら使用する洗浄装置が記載されている。この装置は一定時間毎に、蒸留再生装置内に溜まった汚れを含む有機溶剤を加熱して体積を減らし、汚れが濃縮された有機溶剤を廃棄している。これにより、廃棄する溶剤の量を減らし、溶剤に関するコストを低減することができる。
2. Description of the Related Art Conventionally, it has been known to clean a precision component such as an optical element using an organic solvent.
Patent Literature 1 describes a cleaning apparatus that uses an organic solvent while reusing the same. In this apparatus, the organic solvent containing dirt accumulated in the distillation regeneration apparatus is heated at regular intervals to reduce the volume, and the organic solvent in which dirt is concentrated is discarded. Thereby, the amount of the solvent to be discarded can be reduced, and the cost for the solvent can be reduced.

特開2002−18370号公報JP-A-2002-18370

特許文献1に記載の技術では、汚れを濃縮している間も蒸留された有機溶剤が洗浄槽に戻される。しかし、汚れの種類によっては有機溶剤と一緒に蒸発してしまうものがある。このような汚れは、汚れを濃縮している間に蒸留された有機溶剤に多く含まれる。その結果、汚れが洗浄対象に再付着する可能性がある。
濃縮しない場合、有機溶剤の廃棄量が多くなり、コスト増につながる。また、汚れを考慮して濃縮している間に蒸留された有機溶剤を再利用しないと、そもそも濃縮する意味がなくなる。
In the technique described in Patent Literature 1, the distilled organic solvent is returned to the cleaning tank even while the dirt is being concentrated. However, some types of dirt evaporate together with the organic solvent. Such soils are rich in the organic solvent distilled during the concentration of the soils. As a result, there is a possibility that the dirt may adhere to the object to be cleaned.
If not concentrated, the amount of waste of the organic solvent increases, which leads to an increase in cost. Further, unless the organic solvent distilled during the concentration in consideration of the contamination is reused, there is no point in concentration in the first place.

上記事情を踏まえ、本発明は、洗浄対象への汚れの再付着を防ぎつつ、溶剤の廃棄量を低減することができる洗浄装置および洗浄装置の作動方法を提供することを目的とする。   In view of the above circumstances, an object of the present invention is to provide a cleaning device and a method of operating the cleaning device that can reduce the amount of solvent waste while preventing reattachment of dirt to a cleaning target.

本発明の第一の態様は、第一洗浄槽と、第一洗浄槽よりも上流側に位置する第二洗浄槽とを含む、カスケード式の2以上の洗浄槽と、2以上の洗浄槽の少なくとも一つから供給された洗浄液を再生し、2以上の洗浄槽の少なくとも一つに供給する洗浄液再生部と、洗浄液再生部と、第一洗浄槽および第二洗浄槽とを接続し、洗浄液再生部で再生された洗浄液が流れる配管と、洗浄液再生部および前記配管内の洗浄液の流れを制御するコントローラとを備える洗浄装置である。
洗浄液再生部は、内部に残留する洗浄液に含まれる汚れを濃縮する濃縮モードと、濃縮を伴わない通常モードとの二つの運転モードを有し、コントローラは、通常モードにおいて、再生された洗浄液が第二洗浄槽に送られるように配管内の洗浄液の流れを制御し、濃縮モードにおいて、再生された洗浄液が第一洗浄槽に送られるように配管内の洗浄液の流れを制御する。
本願発明における「上流」、「下流」とは、カスケード方式における上流あるいは下流を意味している。すなわち、通常被洗浄物は、最も下流側の洗浄槽に投入されてから、より上流側の洗浄槽に順次投入される。
A first aspect of the present invention includes a cascade-type two or more cleaning tanks, including a first cleaning tank and a second cleaning tank located upstream of the first cleaning tank, and two or more cleaning tanks. A cleaning liquid regeneration unit that regenerates the cleaning liquid supplied from at least one and supplies the cleaning liquid to at least one of the two or more cleaning tanks, the cleaning liquid regeneration unit, the first cleaning tank and the second cleaning tank, and connects the cleaning liquid. A cleaning apparatus comprising: a pipe through which a cleaning liquid regenerated in a section flows; and a controller that controls a flow of the cleaning liquid in the cleaning liquid regenerating section and the pipe.
The cleaning liquid regeneration unit has two operation modes, a concentration mode for concentrating dirt contained in the cleaning liquid remaining inside, and a normal mode without concentration, and the controller determines that the regenerated cleaning liquid is in the normal mode in the second mode. The flow of the cleaning liquid in the pipe is controlled so as to be sent to the second cleaning tank, and in the concentration mode, the flow of the cleaning liquid in the pipe is controlled so that the regenerated cleaning liquid is sent to the first cleaning tank.
“Upstream” and “downstream” in the present invention mean upstream or downstream in a cascade system. That is, the object to be cleaned is usually charged into the most downstream cleaning tank and then sequentially charged into the more upstream cleaning tank.

本発明の第二の態様は、第一洗浄槽と、第一洗浄槽よりも上流側に位置する第二洗浄槽とを含む、カスケード式の2以上の洗浄槽と、2以上の洗浄槽の少なくとも一つから供給された洗浄液を再生する洗浄液再生部と、を備えた洗浄装置の作動方法である。
この方法において、洗浄液再生部が内部に残留する洗浄液に含まれる汚れを濃縮しているときは、再生された洗浄液を第一洗浄槽に戻し、洗浄液再生部が内部に残留する洗浄液に含まれる汚れを濃縮していないときは、再生された洗浄液が第二洗浄槽に戻される。
The second aspect of the present invention includes a first cleaning tank, a second cleaning tank located upstream of the first cleaning tank, two or more cleaning tanks of a cascade type, and two or more cleaning tanks. A cleaning liquid regenerating unit that regenerates a cleaning liquid supplied from at least one of the cleaning liquids.
In this method, when the cleaning liquid regenerating unit is concentrating the dirt contained in the cleaning liquid remaining inside, the regenerated cleaning liquid is returned to the first cleaning tank, and the cleaning liquid regenerating unit returns the dirt contained in the cleaning liquid remaining inside. When is not concentrated, the regenerated washing liquid is returned to the second washing tank.

本発明の洗浄装置および洗浄装置の作動方法によれば、洗浄対象への汚れの再付着を防ぎつつ、溶剤の廃棄量を低減することができる。   ADVANTAGE OF THE INVENTION According to the washing | cleaning apparatus of this invention, and the operating method of a washing | cleaning apparatus, the amount of waste of a solvent can be reduced, preventing reattachment of the dirt to a washing | cleaning object.

本発明の一実施形態に係る洗浄装置を示す模式図である。It is a schematic diagram showing a cleaning device according to an embodiment of the present invention. 通常モードにおける洗浄液の流れを示す図である。FIG. 4 is a diagram illustrating a flow of a cleaning liquid in a normal mode. 濃縮廃棄モードにおける洗浄液の流れを示す図である。FIG. 4 is a diagram illustrating a flow of a cleaning liquid in a concentration and disposal mode. 本実施形態の変形例に係る洗浄装置を示す模式図である。It is a schematic diagram which shows the washing | cleaning apparatus which concerns on the modification of this embodiment. 本発明の変形例に係る洗浄装置を示す模式図である。It is a schematic diagram which shows the washing | cleaning apparatus which concerns on the modification of this invention. 予備槽を備えた洗浄槽の一例を示す図である。It is a figure which shows an example of the washing tank provided with the reserve tank.

本発明の一実施形態について、図1から図4を参照して説明する。
図1は、本実施形態の洗浄装置1を示す模式図である。洗浄装置1は、二つの洗浄槽と、洗浄槽と接続された洗浄液再生部20と、洗浄装置1の各部を制御するコントローラ30とを備えている。
One embodiment of the present invention will be described with reference to FIGS.
FIG. 1 is a schematic diagram showing a cleaning device 1 of the present embodiment. The cleaning apparatus 1 includes two cleaning tanks, a cleaning liquid regeneration unit 20 connected to the cleaning tank, and a controller 30 that controls each unit of the cleaning apparatus 1.

洗浄槽は、未洗浄の被洗浄物が入れられる第一洗浄槽11と、第一洗浄槽11で一次洗浄された被洗浄物が入れられる第二洗浄槽12とを含む。二つの洗浄槽11、12は、いわゆるカスケード式の洗浄槽であり、それぞれ余剰槽11a、12aを備える。上流側の第二洗浄槽12でオーバーフローした洗浄液は、余剰槽12aに流入し、配管13を通って下流側の第一洗浄槽11に流入する。第二洗浄槽12には、必要に応じて、図示しない供給源から未使用の新しい洗浄液が供給される。   The cleaning tank includes a first cleaning tank 11 in which an uncleaned object is stored, and a second cleaning tank 12 in which the object to be cleaned primarily cleaned in the first cleaning tank 11 is stored. The two cleaning tanks 11 and 12 are so-called cascade-type cleaning tanks, and include surplus tanks 11a and 12a, respectively. The cleaning liquid overflowing in the upstream second cleaning tank 12 flows into the surplus tank 12a, and flows into the downstream first cleaning tank 11 through the pipe 13. Unused fresh cleaning liquid is supplied to the second cleaning tank 12 from a supply source (not shown) as needed.

被洗浄物は、例えばレンズ等の光学素子であり、複数の被洗浄物が金属等で形成された籠101に収容された状態で各洗浄槽内の洗浄液Dに浸される。各洗浄槽11、12には、それぞれ超音波源15が取り付けられており、洗浄液に浸かった被洗浄物に超音波源15で発生した超音波を当てることにより、被洗浄物を洗浄する。
洗浄液Dとしては、有機溶剤を使用できる。有機溶剤としては、例えば、炭化水素系溶剤またはグリコール類系溶剤、臭素系溶剤、塩素系溶剤、フッ素系溶剤等が好適である。
The object to be cleaned is, for example, an optical element such as a lens, and is immersed in the cleaning liquid D in each cleaning tank while a plurality of objects to be cleaned are accommodated in a basket 101 formed of metal or the like. An ultrasonic source 15 is attached to each of the cleaning tanks 11 and 12, and the object to be cleaned is cleaned by applying ultrasonic waves generated by the ultrasonic source 15 to the object to be cleaned immersed in the cleaning liquid.
As the cleaning liquid D, an organic solvent can be used. As the organic solvent, for example, a hydrocarbon solvent or a glycol solvent, a bromine solvent, a chlorine solvent, a fluorine solvent, or the like is preferable.

本実施形態の洗浄液再生部20は、蒸留により洗浄液内の汚れを除去する洗浄液再生装置であり、その基本構造および動作原理は公知である。
洗浄液再生部20と第一洗浄槽11の余剰槽11aとは配管51で接続されており、第一洗浄槽11でオーバーフローした洗浄液Dが洗浄液再生部20に供給される。配管51には電磁弁61が取り付けられている。
洗浄液再生部20で蒸留された洗浄液は、配管52を通り、第二洗浄槽12に送られる。配管52は、分岐管52aを有し、分岐管52aは第一洗浄槽11と接続されている。分岐管52aには電磁弁62が取り付けられている。配管52の分岐管52aより下流側には、電磁弁63が取り付けられている。
The cleaning liquid regenerating unit 20 of the present embodiment is a cleaning liquid regenerating device for removing dirt in the cleaning liquid by distillation, and its basic structure and operation principle are known.
The cleaning liquid regenerating unit 20 and the surplus tank 11a of the first cleaning tank 11 are connected by a pipe 51, and the cleaning liquid D overflowing in the first cleaning tank 11 is supplied to the cleaning liquid regenerating unit 20. A solenoid valve 61 is attached to the pipe 51.
The cleaning liquid distilled in the cleaning liquid regeneration section 20 is sent to the second cleaning tank 12 through the pipe 52. The pipe 52 has a branch pipe 52a, and the branch pipe 52a is connected to the first cleaning tank 11. An electromagnetic valve 62 is attached to the branch pipe 52a. An electromagnetic valve 63 is attached to the pipe 52 downstream of the branch pipe 52a.

コントローラ30は、コンピュータやロジック回路、ソフトウェアなどを、単体または組み合わせて構成できる。コントローラ30は、タッチパネルや、キーボード、ボタンなどのユーザインターフェースを備え、使用者の指示を入力できる。コントローラ30は、洗浄液再生部20および電磁弁61、62、63に接続されており、入力された指示に基づいて洗浄液再生部20の動作および各電磁弁61、62、63の開閉状態を制御する。
コントローラ30は、上述した各部に制御信号を送信できれば、その接続態様に特に制限はない。したがって、各部と有線接続されてもよいし、無線接続されてもよい。コントローラ30が独立したユニットでなく、洗浄液再生部20など他ユニットの一部であってもよい。
さらに、コントローラ30から受け取った信号により洗浄液再生部20が電磁弁の開閉状態を切り替え、コントローラ30に電磁弁の状態が表示されてもよい。この場合は洗浄液再生部20が電磁弁を開閉するので、洗浄液再生部20がコントローラの一部機能を分担していると言える。
The controller 30 can be configured by a single computer or a combination of a computer, a logic circuit, and software. The controller 30 includes a user interface such as a touch panel, a keyboard, and buttons, and can input a user's instruction. The controller 30 is connected to the cleaning liquid regeneration unit 20 and the electromagnetic valves 61, 62, 63, and controls the operation of the cleaning liquid regeneration unit 20 and the open / close state of each of the electromagnetic valves 61, 62, 63 based on the input instruction. .
The connection mode of the controller 30 is not particularly limited as long as the control signal can be transmitted to the above-described units. Therefore, each of the units may be connected by wire or wirelessly. The controller 30 may not be an independent unit but may be a part of another unit such as the cleaning liquid regeneration unit 20.
Further, the cleaning liquid regenerating unit 20 may switch the open / close state of the electromagnetic valve according to a signal received from the controller 30, and the state of the electromagnetic valve may be displayed on the controller 30. In this case, since the cleaning liquid regeneration unit 20 opens and closes the electromagnetic valve, it can be said that the cleaning liquid regeneration unit 20 shares some functions of the controller.

上記のように構成された本実施形態の洗浄装置1の使用時の動作について説明する。この動作には、本実施形態の洗浄方法が含まれている。
使用者は、籠101に入れた被洗浄物を洗浄液Dの入った第一洗浄槽11に入れ、被洗浄物を超音波洗浄する。第一洗浄槽11における一次洗浄が終わった後、籠101を第二洗浄槽12に移動し、同様に被洗浄物の二次洗浄を行う。二次洗浄後の被洗浄物は、リンスや乾燥等の後工程のために洗浄装置1外に移動される。
The operation at the time of using the cleaning apparatus 1 of the present embodiment configured as described above will be described. This operation includes the cleaning method of the present embodiment.
The user puts the object to be cleaned put in the basket 101 into the first cleaning tank 11 containing the cleaning liquid D, and ultrasonically cleans the object to be cleaned. After the primary cleaning in the first cleaning tank 11, the basket 101 is moved to the second cleaning tank 12, and the object to be cleaned is similarly subjected to the secondary cleaning. The object to be cleaned after the secondary cleaning is moved out of the cleaning device 1 for a post-process such as rinsing or drying.

新たな被洗浄物の洗浄を継続すると、各洗浄槽内の洗浄液Dに含まれる汚れが増加する。汚れは第一洗浄槽11内の洗浄液Dにより多く含まれている。   When the cleaning of the new object to be cleaned is continued, dirt contained in the cleaning liquid D in each cleaning tank increases. The dirt is more contained in the cleaning liquid D in the first cleaning tank 11.

洗浄液再生部20は、通常時の運転(通常モード)において、第一洗浄槽11内の洗浄液Dを取り込み、これを洗浄液の沸点以上かつ想定される汚れの沸点以下の温度で加熱し、洗浄液を蒸留する。
図2に、通常モードにおける洗浄液の流れを示す。コントローラ30が電磁弁61を開くと余剰槽11a内の洗浄液が、配管51を通って洗浄液再生部20に流入する。流入した洗浄液は、洗浄液再生部20で蒸留される。蒸留された洗浄液は、配管52から第二洗浄槽12に戻される。
コントローラ30は、通常モードにおいて、電磁弁63を開き、電磁弁62を閉じる。したがって、通常モードにおいて蒸留された洗浄液は、第二洗浄槽12に選択的に送られる。
通常モードにおける洗浄液の供給は、連続的に行われてもよいし、間欠的に行われてもよい。連続的に行う場合、電磁弁61は、常時開放される。間欠的に行われる場合は、第一洗浄槽11内の洗浄液を取り込むときだけ電磁弁61が開かれる。
In a normal operation (normal mode), the cleaning liquid regenerating unit 20 takes in the cleaning liquid D in the first cleaning tank 11 and heats it at a temperature higher than the boiling point of the cleaning liquid and lower than the expected boiling point of the dirt. Distill.
FIG. 2 shows the flow of the cleaning liquid in the normal mode. When the controller 30 opens the electromagnetic valve 61, the cleaning liquid in the surplus tank 11 a flows into the cleaning liquid regenerating section 20 through the pipe 51. The flowing washing liquid is distilled in the washing liquid regeneration unit 20. The distilled cleaning liquid is returned from the pipe 52 to the second cleaning tank 12.
The controller 30 opens the solenoid valve 63 and closes the solenoid valve 62 in the normal mode. Therefore, the cleaning liquid distilled in the normal mode is selectively sent to the second cleaning tank 12.
The supply of the cleaning liquid in the normal mode may be performed continuously or intermittently. When the operation is performed continuously, the solenoid valve 61 is always opened. When the cleaning is performed intermittently, the electromagnetic valve 61 is opened only when the cleaning liquid in the first cleaning tank 11 is taken in.

さらに被洗浄物の洗浄を継続すると、洗浄液D内の汚れがさらに増える。その結果、通常モードでは洗浄液中の汚れを十分に除去することが困難になる。洗浄液再生部20は、蒸留により汚れを除去するが、汚れの濃度が一定レベルを超えると、洗浄液が汚れの一部を含んで気化してしまうためである。   When the cleaning of the object to be cleaned is further continued, the contamination in the cleaning liquid D further increases. As a result, in the normal mode, it becomes difficult to sufficiently remove dirt from the cleaning liquid. The cleaning liquid regenerating section 20 removes dirt by distillation, but when the concentration of dirt exceeds a certain level, the cleaning liquid vaporizes including a part of the dirt.

使用者は、洗浄結果等から洗浄液再生部20の再生が十分でないと判断した等の場合、ユーザインターフェースを使ってコントローラ30に、モード切替を指示する。指示を受け取ったコントローラ30は、洗浄液再生部20の運転モードを、通常モードから濃縮廃棄モード(濃縮モード)に変更する。   When the user determines from the cleaning result or the like that the regeneration of the cleaning liquid regeneration unit 20 is not sufficient, the user instructs the controller 30 to switch the mode using the user interface. The controller 30 that has received the instruction changes the operation mode of the cleaning liquid regeneration unit 20 from the normal mode to the concentration disposal mode (concentration mode).

濃縮廃棄モードは、洗浄液の液体成分を蒸発させて洗浄液の量を減らし、廃棄するためのモードである。
図3に、濃縮廃棄モードにおける洗浄液の流れを示す。コントローラ30は、洗浄液再生部20の運転モードを切り替えるとともに、電磁弁61を閉じて、第一洗浄槽11からの洗浄液取り込みを停止する。さらに、配管52の電磁弁63を閉じ、電磁弁62を開く。その結果、濃縮廃棄モード中に気化および冷却された洗浄液は、分岐管52aを通って第一洗浄槽11に戻される。
濃縮廃棄モード中は洗浄液取り込みが停止されるため、時間経過とともに洗浄液再生部20内の洗浄液の量が減少するとともに、汚れの濃度は上昇する。すなわち、洗浄液再生部20内の洗浄液の汚れは濃縮される。
The concentration and disposal mode is a mode for evaporating the liquid component of the cleaning liquid to reduce the amount of the cleaning liquid and discarding the same.
FIG. 3 shows the flow of the cleaning liquid in the concentration and disposal mode. The controller 30 switches the operation mode of the cleaning liquid regeneration unit 20, closes the electromagnetic valve 61, and stops taking the cleaning liquid from the first cleaning tank 11. Further, the solenoid valve 63 of the pipe 52 is closed, and the solenoid valve 62 is opened. As a result, the cleaning liquid vaporized and cooled during the concentration disposal mode is returned to the first cleaning tank 11 through the branch pipe 52a.
During the concentration and disposal mode, the intake of the cleaning liquid is stopped, so that the amount of the cleaning liquid in the cleaning liquid regenerating unit 20 decreases with time and the concentration of the dirt increases. That is, the stain of the cleaning liquid in the cleaning liquid regeneration unit 20 is concentrated.

洗浄液再生部20内の洗浄液が濃縮されて所定の量以下まで減少したら、コントローラ30は、洗浄液再生部20に濃縮された洗浄液を廃棄させ、濃縮廃棄モードを終了する。洗浄液再生部20の運転モードは、通常モードに切り替わる。
濃縮廃棄モードの終了時点において、洗浄液再生部20から電磁弁62までの配管52および分岐管52a内には、まだ濃縮廃棄モード中に気化および冷却された洗浄液が残留している。コントローラ30は、電磁弁の開閉状態を変更せずに、一定時間通常モードで洗浄液再生部20を動作させ、通常モードで生じた蒸留済み洗浄液で、配管52および分岐管52a内に残留した洗浄液を押し出す。通常モードで生じた蒸留済み洗浄液を十分分岐管52aに送り込んだら、コントローラ30は、電磁弁62を閉じ、電磁弁63を開く。
When the cleaning liquid in the cleaning liquid regenerating unit 20 is concentrated and reduced to a predetermined amount or less, the controller 30 causes the cleaning liquid regenerating unit 20 to discard the concentrated cleaning liquid, and ends the concentration and disposal mode. The operation mode of the cleaning liquid regeneration unit 20 switches to the normal mode.
At the end of the concentration and disposal mode, the cleaning liquid vaporized and cooled during the concentration and disposal mode still remains in the pipe 52 and the branch pipe 52a from the cleaning liquid regeneration unit 20 to the electromagnetic valve 62. The controller 30 operates the cleaning liquid regenerating unit 20 in the normal mode for a certain period of time without changing the open / close state of the solenoid valve, and removes the cleaning liquid remaining in the pipe 52 and the branch pipe 52a with the distilled cleaning liquid generated in the normal mode. Extrude. When the distilled washing liquid generated in the normal mode is sufficiently sent to the branch pipe 52a, the controller 30 closes the solenoid valve 62 and opens the solenoid valve 63.

図4に、再生された洗浄液が流れる配管の他の例を示す。図4においては、通常モードおよび濃縮廃棄モードのいずれにおいても洗浄液が流れる配管52eを短く構成している。これにより、上述した「一定時間」を短縮できる。
例えば、図1に示す配管52の容量が3Lあり、洗浄液再生部20が通常モードで再生した洗浄液を1L/分のペースで送り出す場合は、上述の「一定時間」は概ね3分となる。図4に示すような配管52eが短い構成にすることで「一定時間」を大幅に短縮することができ、通常モードで再生された汚れの少ない洗浄液を第二洗浄槽12に迅速に供給できる。配管52eを洗浄液再生部20内に組み込めば、「一定時間」をゼロにする、すなわち、濃縮廃棄モード終了後直ちに電磁弁62および63の切り替えを行う構成にすることもできる。
FIG. 4 shows another example of a pipe through which the regenerated cleaning liquid flows. In FIG. 4, the pipe 52e through which the cleaning liquid flows is configured to be short in both the normal mode and the concentration and disposal mode. Thereby, the above-mentioned "certain time" can be shortened.
For example, when the capacity of the pipe 52 shown in FIG. 1 is 3 L and the cleaning liquid regenerating unit 20 sends out the cleaning liquid regenerated in the normal mode at a pace of 1 L / min, the above-mentioned “certain time” is approximately 3 minutes. By making the piping 52 e short as shown in FIG. 4, the “certain time” can be greatly reduced, and the less-dirty cleaning liquid regenerated in the normal mode can be quickly supplied to the second cleaning tank 12. If the pipe 52e is incorporated in the cleaning liquid regenerating unit 20, the "constant time" may be set to zero, that is, the electromagnetic valves 62 and 63 may be switched immediately after the concentration and disposal mode ends.

濃縮廃棄モード中に気化および冷却された洗浄液は、通常モードで蒸留した洗浄液よりも多量の汚れを含んでいる。従来は、濃縮廃棄モード中に気化および冷却された洗浄液を、通常モードと同様に、第二洗浄槽に戻していた。第二洗浄槽は、二次洗浄を行う槽であるため、汚れの再付着を防止する観点からは、許容できる汚れの量に限りがある。そのため、廃棄する洗浄液の濃縮を十分に行えない結果、多量の洗浄液を廃棄して、装置のランニングコストを増大させていた。   The cleaning liquid vaporized and cooled during the concentrated waste mode contains a larger amount of dirt than the cleaning liquid distilled in the normal mode. Conventionally, the cleaning liquid vaporized and cooled during the concentration disposal mode is returned to the second cleaning tank as in the normal mode. Since the second cleaning tank is a tank for performing the secondary cleaning, an allowable amount of dirt is limited from the viewpoint of preventing reattachment of dirt. As a result, the concentration of the cleaning liquid to be discarded cannot be sufficiently increased. As a result, a large amount of the cleaning liquid is discarded, thereby increasing the running cost of the apparatus.

ここで発明者は、第一洗浄槽11に着目した。第一洗浄槽11は、未洗浄の被洗浄物が投入されること、および、第一洗浄槽11で洗浄された被洗浄物が、上流側の第二洗浄槽12でさらに洗浄されることから、許容される洗浄液内の汚れの量の上限値を、第二洗浄槽12よりもはるかに高く設定できる。したがって、濃縮廃棄モード中の洗浄液を第一洗浄槽11に戻すことで、戻す洗浄液中における汚れの上限値を大きく引き上げることができ、第二洗浄槽12で洗浄された被洗浄物の洗浄品質に与える影響も最小限にできる。
発明者の検討では、濃縮廃棄モードにおける洗浄液の廃棄量を、本発明を適用することにより、洗浄品質に影響を与えずに従来の5分の1まで減少させることに成功している。洗浄液として用いる有機溶剤は決して安価ではないため、これによるランニングコストの低減効果は極めて大きい。
Here, the inventor focused on the first cleaning tank 11. In the first cleaning tank 11, an uncleaned object to be cleaned is supplied, and the object to be cleaned cleaned in the first cleaning tank 11 is further cleaned in the second cleaning tank 12 on the upstream side. The upper limit of the allowable amount of dirt in the cleaning liquid can be set much higher than that of the second cleaning tank 12. Therefore, by returning the cleaning liquid in the concentrated waste mode to the first cleaning tank 11, the upper limit value of dirt in the returned cleaning liquid can be greatly increased, and the cleaning quality of the object to be cleaned cleaned in the second cleaning tank 12 can be improved. The effect can be minimized.
According to the study by the inventor, the present invention has succeeded in reducing the waste amount of the cleaning liquid in the concentrated waste mode to one fifth of the conventional amount without affecting the cleaning quality. Since the organic solvent used as the cleaning liquid is not inexpensive, the effect of reducing the running cost by this is extremely large.

本実施形態の洗浄装置および洗浄方法では、洗浄液再生部20が濃縮廃棄モードから通常モードに切り替わった後、一定時間は、第一洗浄槽11に蒸留した洗浄液を戻し続ける。その結果、配管52内に残留した濃縮廃棄モードで発生した洗浄液が第二洗浄槽12に流入することを確実に防ぎ、洗浄品質の低下を防止できる。   In the cleaning apparatus and the cleaning method of the present embodiment, after the cleaning liquid regenerating unit 20 switches from the concentration and disposal mode to the normal mode, the distilled cleaning liquid is continuously returned to the first cleaning tank 11 for a certain period of time. As a result, it is possible to reliably prevent the cleaning liquid generated in the concentration and disposal mode remaining in the pipe 52 from flowing into the second cleaning tank 12, and to prevent a reduction in cleaning quality.

本実施形態の洗浄装置および洗浄方法は、洗浄液再生部とカスケード式の複数の洗浄槽とを備える一般的な洗浄装置に対して、配管及び弁を適宜増設し、洗浄液再生部の動作プログラムを変更するだけで実施できるため、大掛かりな投資が必要なく、極めて簡便に行える。   The cleaning apparatus and the cleaning method according to the present embodiment change the operation program of the cleaning liquid regeneration unit by appropriately adding pipes and valves to a general cleaning apparatus including a cleaning liquid regeneration unit and a plurality of cascade-type cleaning tanks. It can be performed very simply without any major investment.

以上、本発明の各実施形態について説明したが、本発明の技術範囲は上記実施形態に限定されるものではなく、本発明の趣旨を逸脱しない範囲において構成要素の組み合わせを変えたり、各構成要素に種々の変更を加えたり、削除したりすることが可能である。   As described above, each embodiment of the present invention has been described. However, the technical scope of the present invention is not limited to the above-described embodiment. It is possible to make various changes or to delete.

本発明の変形例の一部について、以下に示す。
図5に示す変形例の洗浄装置1Aは、第一洗浄槽11と第二洗浄槽12との間に第三洗浄槽113および第四洗浄槽114を備え、計4つのカスケード式洗浄槽を有する。このような構成の洗浄装置にも本発明を好適に適用できる。
洗浄装置1Aにおいて、通常モードで蒸留再生された洗浄液を送る洗浄槽は、濃縮廃棄モードで蒸留された洗浄液を戻す洗浄槽より上流側であればよく、第三洗浄槽113や第四洗浄槽114であってもよい。同様に、濃縮廃棄モードで蒸留された洗浄液を戻す洗浄槽は、通常モードで蒸留再生された洗浄液を送る洗浄槽よりも下流側であればよく、第三洗浄槽113や第四洗浄槽114であってもよい。ただし、濃縮廃棄モードにおいて再生される洗浄液の汚れ濃度は比較的高いため、洗浄液が最も汚れやすい第一洗浄槽11に戻すのが最も好ましい。上述のルールを守る範囲内において、通常モードで蒸留再生された洗浄液および濃縮廃棄モードで蒸留された洗浄液のいずれも、複数の洗浄槽に送られてよい。
洗浄装置1Aの配管52には、第三洗浄槽113と接続された分岐管52bおよび電磁弁64の組と、第四洗浄槽114と接続された分岐管52cおよび電磁弁65の組とが接続されているため、電磁弁64および65をコントローラ30で開閉可能に構成すれば、洗浄液再生部20から洗浄液を送り込む洗浄槽を自由に設定することができる。
洗浄装置1Aの洗浄槽の数は4つであるが、洗浄槽の数は3つでもよいし、5つ以上でもよい。
Some of the modifications of the present invention will be described below.
The cleaning apparatus 1A of the modification shown in FIG. 5 includes a third cleaning tank 113 and a fourth cleaning tank 114 between the first cleaning tank 11 and the second cleaning tank 12, and has a total of four cascade cleaning tanks. . The present invention can be suitably applied to the cleaning apparatus having such a configuration.
In the cleaning apparatus 1A, the cleaning tank for sending the cleaning liquid distilled and regenerated in the normal mode may be located upstream of the cleaning tank for returning the cleaning liquid distilled in the concentrated waste mode, and the third cleaning tank 113 and the fourth cleaning tank 114 may be used. It may be. Similarly, the washing tank that returns the washing liquid distilled in the concentration and waste mode may be any downstream side of the washing tank that sends the washing liquid distilled and regenerated in the normal mode, and the third washing tank 113 and the fourth washing tank 114 There may be. However, since the dirt concentration of the cleaning liquid regenerated in the concentration and disposal mode is relatively high, it is most preferable to return the cleaning liquid to the first cleaning tank 11 where the cleaning liquid is most likely to be contaminated. As long as the above-mentioned rules are maintained, both the cleaning liquid distilled and regenerated in the normal mode and the cleaning liquid distilled in the concentrated waste mode may be sent to a plurality of cleaning tanks.
A set of a branch pipe 52b and a solenoid valve 64 connected to the third cleaning tank 113 and a set of a branch pipe 52c and a solenoid valve 65 connected to the fourth cleaning tank 114 are connected to the pipe 52 of the cleaning device 1A. Therefore, if the electromagnetic valves 64 and 65 are configured to be openable and closable by the controller 30, the cleaning tank into which the cleaning liquid is sent from the cleaning liquid regeneration unit 20 can be set freely.
Although the number of cleaning tanks of the cleaning apparatus 1A is four, the number of cleaning tanks may be three or five or more.

洗浄装置における各洗浄槽は、洗浄液の状態を好適に調整するための予備槽を備えてもよい。
図6に、予備槽151を備えた第一洗浄槽11Aの例を示す。余剰槽11aには配管152が設けられている。配管152の先端開口は予備槽151内に位置している。予備槽151と洗浄液再生部20とをつなぐ配管51には、電磁弁61が取り付けられている。第一洗浄槽11Aと予備槽151とは、ポンプ172およびフィルタ173を備えた循環用の配管171により接続されている。予備槽151には、冷媒が通る冷却管181と、熱媒が通る加温管182とが配置されている。この構成により、予備槽に貯留された洗浄液を所望の温度に調整することができる。
冷却管181および加温管182は一例であり、他の冷却装置や加温装置が予備槽に取り付けられてもよい。
Each cleaning tank in the cleaning apparatus may include a spare tank for suitably adjusting the state of the cleaning liquid.
FIG. 6 shows an example of the first cleaning tank 11A including the preliminary tank 151. A pipe 152 is provided in the surplus tank 11a. The opening at the tip of the pipe 152 is located in the preliminary tank 151. An electromagnetic valve 61 is attached to a pipe 51 connecting the preliminary tank 151 and the cleaning liquid regenerating unit 20. The first cleaning tank 11A and the preliminary tank 151 are connected by a circulation pipe 171 provided with a pump 172 and a filter 173. In the preliminary tank 151, a cooling pipe 181 through which a refrigerant passes and a heating pipe 182 through which a heating medium passes are arranged. With this configuration, the temperature of the cleaning liquid stored in the preliminary tank can be adjusted to a desired temperature.
The cooling pipe 181 and the heating pipe 182 are examples, and another cooling device or a heating device may be attached to the spare tank.

予備槽151内で所望の温度に調整された洗浄液は、ポンプ172によって汲み上げられ、フィルタ173で濾過された後、配管171を通って第一洗浄槽11Aに供給される。再生される洗浄液は、予備槽151から洗浄液再生部20に供給される。以上により、洗浄液の温度を好適に保持しつつ、第一洗浄槽11Aと予備槽151との間で洗浄液を循環させることができる。   The cleaning liquid adjusted to a desired temperature in the preliminary tank 151 is pumped up by the pump 172, filtered by the filter 173, and supplied to the first cleaning tank 11A through the pipe 171. The cleaning liquid to be regenerated is supplied from the preliminary tank 151 to the cleaning liquid regenerating section 20. As described above, the cleaning liquid can be circulated between the first cleaning tank 11A and the preliminary tank 151 while suitably maintaining the temperature of the cleaning liquid.

図6には、図1と同様の分岐管52aおよび電磁弁62を示しているが、洗浄槽が予備槽を有する場合、洗浄液再生部から供給される洗浄液が送り込まれる場所は適宜変更できる。例えば、再生された洗浄液は、予備槽151に送られてもよいし、配管152や配管171に送られてもよい。   FIG. 6 shows the branch pipe 52a and the electromagnetic valve 62 similar to those in FIG. 1, but when the cleaning tank has a spare tank, the location where the cleaning liquid supplied from the cleaning liquid regeneration unit is sent can be changed as appropriate. For example, the regenerated cleaning liquid may be sent to the preliminary tank 151, or may be sent to the pipe 152 or the pipe 171.

図6に示した予備槽は、温度調節を行う予備槽の例である。他には、真空ポンプやエダクターを備えた密閉構造の予備槽を例示できる。この予備槽では、洗浄液の脱気を行うことができるため、超音波洗浄を行う場合に好適である。脱気と温度調整の両方ができる構成としてもよいことは当然である。予備槽に特段の洗浄液調整機能がなく、洗浄槽との間で洗浄液の循環のみを行う構成であってもよい。   The preliminary tank shown in FIG. 6 is an example of a preliminary tank for performing temperature control. Other examples include a closed tank having a vacuum pump and an eductor and having a closed structure. Since this cleaning tank can deaerate the cleaning liquid, it is suitable for performing ultrasonic cleaning. Naturally, a configuration capable of performing both deaeration and temperature adjustment may be employed. A configuration in which the spare tank does not have a special cleaning liquid adjusting function and only circulates the cleaning liquid with the cleaning tank may be employed.

第二洗浄槽12、第三洗浄槽113、第四洗浄槽114に予備槽が設けられてもよいことは当然である。複数の洗浄槽において、予備槽を有する洗浄槽と有さない洗浄槽とが混在していても構わない。   Of course, spare tanks may be provided in the second washing tank 12, the third washing tank 113, and the fourth washing tank 114. In a plurality of washing tanks, a washing tank having a spare tank and a washing tank not having a spare tank may be mixed.

上述の実施形態では、通常モードと濃縮廃棄モードとが切り替わるタイミングを使用者がコントローラに入力する例を説明した。これに代えて、通常モードと濃縮廃棄モードとが自動的に切り替わる構成が採用されてもよい。
コントローラが切り替え判定において参照する制御パラメータとしては、被洗浄物の洗浄時間や、洗浄した被洗浄物の量などを例示できる。前者の具体例としては、第一洗浄槽内に籠が位置していた時間(籠を沈めてから引き上げるまでの時間)を、後者の具体例としては、洗浄が行われた籠の数を、それぞれ例示できる。コントローラがこれらの情報を取得および記憶できるように洗浄装置の各部を構成することにより、使用者がユーザインターフェースから指示を入力しなくても、洗浄液再生部に所定の周期で通常モードと濃縮廃棄モードとを繰り返させることができる。
In the above-described embodiment, an example has been described in which the user inputs the timing at which the mode is switched between the normal mode and the concentration disposal mode to the controller. Instead, a configuration in which the normal mode and the concentration and disposal mode are automatically switched may be adopted.
Examples of the control parameter that the controller refers to in the switching determination include a cleaning time of the object to be cleaned and an amount of the object to be cleaned. As the specific example of the former, the time during which the basket was located in the first cleaning tank (the time from sinking the basket to lifting it), as the specific example of the latter, the number of baskets that were washed, Each can be exemplified. By configuring each part of the cleaning device so that the controller can acquire and store the information, the cleaning liquid regenerating part can be set to the normal mode and the concentrated waste mode at a predetermined cycle without a user inputting an instruction from a user interface. Can be repeated.

1、1A 洗浄装置
11、11A 第一洗浄槽
12 第二洗浄槽
20 洗浄液再生部
30 コントローラ
52 配管
62、63、64、65 電磁弁
D 洗浄液
1, 1A Cleaning apparatus 11, 11A First cleaning tank 12 Second cleaning tank 20 Cleaning liquid regeneration unit 30 Controller 52 Piping 62, 63, 64, 65 Solenoid valve D Cleaning liquid

Claims (10)

第一洗浄槽と、前記第一洗浄槽よりも上流側に位置する第二洗浄槽とを含む、カスケード式の2以上の洗浄槽と、
前記2以上の洗浄槽の少なくとも一つから供給された洗浄液を再生し、前記2以上の洗浄槽の少なくとも一つに供給する洗浄液再生部と、
前記洗浄液再生部と、前記第一洗浄槽および前記第二洗浄槽とを接続し、前記洗浄液再生部で再生された洗浄液が流れる配管と、
前記洗浄液再生部および前記配管内の洗浄液の流れを制御するコントローラと、
を備え、
前記洗浄液再生部は、内部に残留する洗浄液に含まれる汚れを濃縮する濃縮モードと、濃縮を伴わない通常モードとの二つの運転モードを有し、
前記コントローラは、
前記通常モードにおいて、再生された洗浄液が前記第二洗浄槽に送られるように前記配管内の洗浄液の流れを制御し、
前記濃縮モードにおいて、再生された洗浄液が前記第一洗浄槽に送られるように前記配管内の洗浄液の流れを制御する、
洗浄装置。
A first cleaning tank, including a second cleaning tank located upstream of the first cleaning tank, two or more cascading cleaning tanks,
A cleaning liquid regeneration unit that regenerates the cleaning liquid supplied from at least one of the two or more cleaning tanks and supplies the cleaning liquid to at least one of the two or more cleaning tanks;
The cleaning liquid regenerating unit, a pipe that connects the first cleaning tank and the second cleaning tank, and through which the cleaning liquid regenerated in the cleaning liquid regenerating unit flows.
A controller for controlling the flow of the cleaning liquid in the cleaning liquid regeneration unit and the pipe,
With
The cleaning liquid regeneration unit has two operation modes, a concentration mode for concentrating dirt contained in the cleaning liquid remaining inside, and a normal mode without concentration.
The controller is
In the normal mode, the flow of the cleaning liquid in the pipe is controlled so that the regenerated cleaning liquid is sent to the second cleaning tank,
In the concentration mode, control the flow of the cleaning liquid in the pipe so that the regenerated cleaning liquid is sent to the first cleaning tank,
Cleaning equipment.
前記第一洗浄槽は、前記2以上の洗浄槽のうち、最も下流側に位置する、
請求項1に記載の洗浄装置。
The first cleaning tank is located on the most downstream side of the two or more cleaning tanks,
The cleaning device according to claim 1.
前記第二洗浄槽は、前記2以上の洗浄槽のうち、最も上流側に位置する、
請求項1に記載の洗浄装置。
The second cleaning tank is located on the most upstream side of the two or more cleaning tanks,
The cleaning device according to claim 1.
前記第一洗浄槽からのみ前記洗浄液が前記洗浄液再生部に供給される、
請求項2に記載の洗浄装置。
The cleaning liquid is supplied to the cleaning liquid regeneration unit only from the first cleaning tank,
The cleaning device according to claim 2.
前記配管は、複数の弁を有し、
前記コントローラは、前記複数の弁の開閉を制御することにより前記配管内の洗浄液の流れを制御する、
請求項1に記載の洗浄装置。
The pipe has a plurality of valves,
The controller controls the flow of the cleaning liquid in the pipe by controlling the opening and closing of the plurality of valves,
The cleaning device according to claim 1.
前記コントローラは、前記濃縮モードにおいて、前記洗浄液再生部への洗浄液の供給を停止する、
請求項1に記載の洗浄装置。
The controller, in the concentration mode, stops supplying the cleaning liquid to the cleaning liquid regeneration unit,
The cleaning device according to claim 1.
前記コントローラは、前記濃縮モード終了後、一定時間前記配管内の洗浄液の流れを変更せずに保持する、
請求項1に記載の洗浄装置。
The controller, after the end of the concentration mode, holds the flow of the cleaning solution in the pipe for a fixed time without changing,
The cleaning device according to claim 1.
前記洗浄液再生部は、前記洗浄液を蒸留することにより再生する、
請求項1に記載の洗浄装置。
The cleaning liquid regeneration unit regenerates by distilling the cleaning liquid.
The cleaning device according to claim 1.
前記洗浄液は、炭化水素系溶剤、グリコール類系溶剤、臭素系溶剤、塩素系溶剤、フッ素系溶剤のいずれかを含有する、
請求項1に記載の洗浄装置。
The cleaning liquid contains any of a hydrocarbon solvent, a glycol solvent, a bromine solvent, a chlorine solvent, and a fluorine solvent.
The cleaning device according to claim 1.
第一洗浄槽と、前記第一洗浄槽よりも上流側に位置する第二洗浄槽とを含む、カスケード式の2以上の洗浄槽と、前記2以上の洗浄槽の少なくとも一つから供給された洗浄液を再生する洗浄液再生部と、を備えた洗浄装置の作動方法であって、
前記洗浄液再生部が内部に残留する洗浄液に含まれる汚れを濃縮しているときは、再生された洗浄液を前記第一洗浄槽に戻し、
前記洗浄液再生部が内部に残留する洗浄液に含まれる汚れを濃縮していないときは、再生された洗浄液を前記第二洗浄槽に戻す、
洗浄装置の作動方法。
A first cleaning tank and a second cleaning tank positioned upstream of the first cleaning tank, two or more cleaning tanks of a cascade type, and supplied from at least one of the two or more cleaning tanks. A cleaning liquid regenerating unit that regenerates the cleaning liquid, and a method of operating a cleaning device including:
When the cleaning liquid regenerating section is concentrating the dirt contained in the cleaning liquid remaining inside, return the regenerated cleaning liquid to the first cleaning tank,
When the cleaning liquid regenerating section has not concentrated the dirt contained in the cleaning liquid remaining inside, the regenerated cleaning liquid is returned to the second cleaning tank,
How to operate the cleaning device.
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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03249983A (en) * 1990-02-28 1991-11-07 Nippon Petrochem Co Ltd Method and device for washing article
JPH04225875A (en) * 1990-04-13 1992-08-14 Duerr Gmbh Method and device for washing object with water washing fluid containing washing agent
JPH05161882A (en) * 1991-12-16 1993-06-29 Fujitsu Ten Ltd Apparatus for controlling quality of washing liquid in washing apparatus
JPH06134444A (en) * 1992-10-27 1994-05-17 Toshiba Corp Method and apparatus for regenerating cleaning drainage and method and apparatus for cleaning
JPH06306664A (en) * 1993-04-26 1994-11-01 Kimura Chem Plants Co Ltd Washing equipment
JP2001314828A (en) * 2001-03-19 2001-11-13 Seiko Epson Corp Method for removing precipitate
JP2002018370A (en) * 2000-07-06 2002-01-22 Seiko Epson Corp Cleaning method, method for manufacturing liquid crystal device and cleaning device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03249983A (en) * 1990-02-28 1991-11-07 Nippon Petrochem Co Ltd Method and device for washing article
JPH04225875A (en) * 1990-04-13 1992-08-14 Duerr Gmbh Method and device for washing object with water washing fluid containing washing agent
JPH05161882A (en) * 1991-12-16 1993-06-29 Fujitsu Ten Ltd Apparatus for controlling quality of washing liquid in washing apparatus
JPH06134444A (en) * 1992-10-27 1994-05-17 Toshiba Corp Method and apparatus for regenerating cleaning drainage and method and apparatus for cleaning
JPH06306664A (en) * 1993-04-26 1994-11-01 Kimura Chem Plants Co Ltd Washing equipment
JP2002018370A (en) * 2000-07-06 2002-01-22 Seiko Epson Corp Cleaning method, method for manufacturing liquid crystal device and cleaning device
JP2001314828A (en) * 2001-03-19 2001-11-13 Seiko Epson Corp Method for removing precipitate

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