JP2019200444A5

JP2019200444A5 -

Info

Publication number: JP2019200444A5
Application number: JP2019158671A
Authority: JP
Filing date: 2019-08-30
Publication date: 2020-08-20
Anticipated expiration: 2038-03-30

Description

上記課題を解決する本発明の一側面としてのリソグラフィ装置は、基材に第１材料と感光剤を配置した基板にパターンを形成するリソグラフィ装置であって、前記基板に位置合せ用マークを形成する形成部と、前記感光剤に露光光を照明して前記基板にパターンを転写する転写部と、を有し、前記形成部は、前記感光剤を介して前記露光光とは異なる波長の照射光を前記第１材料に照射し、前記照射光のエネルギーにより発生した前記第１材料の熱により前記感光剤を変質させて前記感光剤に位置合せ用マークを形成する、ことを特徴とする。 The lithographic apparatus according to one aspect of the present invention for solving the above-mentioned problems, there is provided a lithographic apparatus that forms a pattern on a substrate with a first material and the photosensitive material disposed on the substrate, forming a mark for position fit to the substrate a forming section that, before Symbol illuminates the exposure light on the photosensitive agent has a transfer unit for transferring a pattern to the substrate, wherein the forming unit is configured of a wavelength different from that of the via photosensitizer the exposure light Irradiation light is irradiated to the first material , and the heat of the first material generated by the energy of the irradiation light deteriorates the photosensitive agent to form an alignment mark on the photosensitive agent . It

Claims

A lithographic apparatus for forming a pattern on a substrate in which a first material and a photosensitizer are arranged on a substrate,
A forming unit configured to form a mark for position fit to the substrate,
Illuminating the exposure light before Symbol photosensitive agent has a transfer unit for transferring a pattern on the substrate,
The forming unit irradiates the first material with irradiation light having a wavelength different from that of the exposure light through the photosensitizer, and modifies the photosensitizer by heat of the first material generated by energy of the irradiation light. A lithographic apparatus, characterized in that an alignment mark is formed on the photosensitive material .

A lithographic apparatus for forming a pattern on a substrate in which a first material and a photosensitizer are arranged on a base material,
A forming portion for forming an alignment mark on the substrate,
A transfer unit that illuminates the photosensitive agent with exposure light to transfer a pattern onto the substrate,
The forming unit irradiates the first material with irradiation light having a wavelength different from that of the exposure light through the photosensitizer, processes the first material with energy of the irradiation light, and positions the first material. A lithographic apparatus, wherein the alignment mark is formed.

The alignment mark is a mark for determining a relative positional relationship between a first exposure area exposed by the lithographic apparatus and a second exposure area exposed by a lithographic apparatus different from the lithographic apparatus. A lithographic apparatus according to claim 1 or 2, wherein the lithographic apparatus is present.

Further comprising a control unit for controlling the forming unit,
The said control part controls at least one of the intensity|strength of the said irradiation light and irradiation time based on the information regarding the said 1st material and the said photosensitive agent, The any one of Claim 1 thru|or 3 characterized by the above-mentioned. Lithographic apparatus.

The forming unit forms a plurality of alignment marks while changing at least one of the intensity of the irradiation light and the irradiation time,
The lithographic apparatus according to claim 4, wherein the control unit sets at least one of the intensity of the irradiation light and the irradiation time based on a result of measuring the formed alignment marks.

Prior Symbol irradiation light, lithographic apparatus according to any one of claims 1 to 5, characterized in that the the light of the wavelength transmitted through the photosensitive agent.

The lithographic apparatus according to any one of claims 1 to 6, characterized in that said first material is a metal film.

The lithographic apparatus according to claim 1, wherein the substrate is glass.

A lithographic apparatus for forming a pattern on a substrate, comprising:
A forming unit that irradiates a substrate including a first material and a photosensitizer applied on the first material with light to form an alignment mark on the substrate.
A transfer unit that performs alignment of the substrate based on the position of the alignment mark formed by the formation unit, illuminates the exposure light to the photosensitive agent, and transfers a pattern to the substrate,
A control unit that acquires at least one of the information of the photosensitizer and the information of the first material, and based on the acquired information, sets at least one of the intensity of light and the irradiation time of the forming unit. Have
The forming unit irradiates the first material with irradiation light having a wavelength different from that of the exposure light, and modifies the photosensitizer by heat of the first material generated by energy of the irradiation light to form the photosensitizer. A lithographic apparatus, characterized in that it forms alignment marks.

A lithographic apparatus for forming a pattern on a substrate, comprising:
A forming unit that irradiates a substrate including a first material and a photosensitizer applied on the first material with light to form an alignment mark on the substrate.
A transfer unit that performs alignment of the substrate based on the position of the alignment mark formed by the formation unit, illuminates the exposure light to the photosensitive agent, and transfers a pattern to the substrate,
A control unit that acquires at least one of the information of the photosensitizer and the information of the first material, and based on the acquired information, sets at least one of the intensity of light and the irradiation time of the forming unit. Have
The forming unit irradiates the first material with irradiation light having a wavelength different from that of the exposure light, processes the first material with the energy of the irradiation light, and forms an alignment mark on the first material. A lithographic apparatus characterized by the above.

A mark forming method for forming an alignment mark on a substrate in which a first material and a photosensitive agent are arranged on a base material ,
Has a higher formation Engineering forming the alignment mark before Symbol substrate,
In the forming step, the irradiation with the irradiation light having different wavelengths before Symbol first material and said through photosensitive agent exposure light, the photosensitive material by the heat of the first material generated by the energy of the irradiation light A mark forming method, characterized in that the mark for alignment is formed on the photosensitizer by changing the quality of the mark .

A mark forming method for forming an alignment mark on a substrate in which a first material and a photosensitive agent are arranged on a base material,
A step of forming an alignment mark on the substrate,
In the forming step, the first material is irradiated with irradiation light having a wavelength different from that of the exposure light through the photosensitizer, and the first material is processed by the energy of the irradiation light to be positioned on the first material. A mark forming method, which comprises forming an alignment mark.

The alignment mark has a relative positional relationship between a first exposure area exposed by a lithographic apparatus used in the mark forming method and a second exposure area exposed by a lithographic apparatus different from the lithographic apparatus. The mark forming method according to claim 11 or 12, which is a mark for determining.

The said formation process sets at least one of the intensity|strength of the said irradiation light and irradiation time based on the information regarding the said 1st material and the said photosensitive agent, The any one of Claim 11 thru|or 13 characterized by the above-mentioned. Mark forming method.

The forming step forms a plurality of alignment marks while changing at least one of the intensity of the irradiation light and the irradiation time,
15. The mark forming method according to claim 14, wherein at least one of the intensity of the irradiation light and the irradiation time is set based on a result of measuring the formed alignment marks.

The mark forming method according to any one of claims 11 to 15, wherein the irradiation light is light having a wavelength that passes through the photosensitive agent.

The mark forming method according to any one of claims 11 to 16, wherein the first material is a metal film.

18. The mark forming method according to claim 11, wherein the base material is glass.

A pattern forming method for forming a pattern on a substrate in which a first material and a photosensitizer are arranged on a base material,
A step of forming an alignment mark on the substrate,
Illuminating the photosensitive agent with exposure light to transfer a pattern onto the substrate,
In the forming step, the first material is irradiated with irradiation light having a wavelength different from that of the exposure light through the photosensitive agent, and the heat of the first material generated by the energy of the irradiation light deteriorates the photosensitive agent. And forming a positioning mark on the photosensitizer.

A pattern forming method for forming a pattern on a substrate in which a first material and a photosensitizer are arranged on a base material,
A step of forming an alignment mark on the substrate,
Illuminating the photosensitive agent with exposure light to transfer a pattern onto the substrate,
In the forming step, the first material is irradiated with irradiation light having a wavelength different from that of the exposure light through the photosensitizer, and the first material is processed by the energy of the irradiation light to be positioned on the first material. A pattern forming method, comprising forming an alignment mark.

And a step of forming a pattern before Symbol substrate using lithography equipment according to any one of claims 1 to 10, a step of manufacturing an article by processing the substrate on which a pattern is formed, a A method for manufacturing an article, comprising: