JP2019188529A - Method for production of polishing carrier plate and polishing carrier plate - Google Patents

Method for production of polishing carrier plate and polishing carrier plate Download PDF

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JP2019188529A
JP2019188529A JP2018084103A JP2018084103A JP2019188529A JP 2019188529 A JP2019188529 A JP 2019188529A JP 2018084103 A JP2018084103 A JP 2018084103A JP 2018084103 A JP2018084103 A JP 2018084103A JP 2019188529 A JP2019188529 A JP 2019188529A
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resin
metal plate
annular
holding hole
carrier plate
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宇野 達夫
Tatsuo Uno
達夫 宇野
卓久真 太皷
Takuma Taiko
卓久真 太皷
初 田中
Hajime Tanaka
初 田中
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Risho Kogyo Co Ltd
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Risho Kogyo Co Ltd
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Abstract

To provide a production method for a polishing carrier plate capable of strongly fixing a cushion member comprising a resin laminate to the inner periphery of a holding hole and further capable of producing without generating warping or undulation at molding, and to provide the polishing carrier plate.SOLUTION: An objective polishing carrier plate having a holding hole provided for holding a material to be polished comprises a metal plate and the substrates with resin pressure-bonded on both surfaces of the metal plate, and has a circular form, on the circumference of which a gear is formed. At least one holding hole is formed on the metal plate, and an annular cushion member comprising a resin laminate is fitted on the inner periphery of the holding hole. A through-hole having the same diameter as the inner diameter of the annular cushion member is provided on the substrate with resin. The annular cushion member is pressure-bonded and fixed to two substrates with resin, and thus is fixed in the holding hole.SELECTED DRAWING: Figure 7

Description

本発明は、半導体ウエハ、ガラス、アルミディスク、液晶表示用ガラス基板、ディスク状セラミックス基板等の表面を研磨する時に、研磨対象となる被研磨物を保持するための研磨用キャリアプレートの製造方法および研磨用キャリアプレートに関する。   The present invention relates to a method for producing a polishing carrier plate for holding an object to be polished when polishing the surface of a semiconductor wafer, glass, aluminum disk, glass substrate for liquid crystal display, disk-shaped ceramic substrate, etc. The present invention relates to a polishing carrier plate.

半導体ウエハ、ガラス、アルミディスク、液晶表示用ガラス基板、ディスク状セラミックス基板等の製造過程において、これらの表面を研磨する際に、研磨対象となる被研磨物を、研磨用キャリアプレートを用いて保持した状態で研磨作業を行う。研磨用キャリアプレートは、被研磨物を保持するための保持穴が設けられており、複数の研磨用キャリアプレートを、研磨装置の中心に配置された太陽ギヤと外周に配置されたインターナルギヤとの間にそれぞれのギヤと噛み合うように配置し、太陽ギヤとインターナルギヤの回転によって、各研磨用キャリアプレートが回転することで、研摩用キャリアプレートの保持穴に配置された被研磨物の研磨が行われる。   When polishing these surfaces in the manufacturing process of semiconductor wafers, glass, aluminum disks, liquid crystal display glass substrates, disk-shaped ceramic substrates, etc., hold the object to be polished using a polishing carrier plate Polishing is performed in the condition. The carrier plate for polishing is provided with a holding hole for holding an object to be polished, and a plurality of carrier plates for polishing are provided with a sun gear arranged at the center of the polishing apparatus and an internal gear arranged on the outer periphery. The polishing carrier plate is rotated by the rotation of the sun gear and the internal gear, so that the polishing object placed in the holding hole of the polishing carrier plate is polished. Is done.

近年、半導体ウエハ、ガラス、アルミディスク、液晶表示用ガラス基板、ディスク状セラミックス基板等の薄板化が進み、それに伴い、研磨作業に用いる研磨用キャリアプレートの厚みを薄くすることが求められている。さらに、厚みを薄くするだけでなく、剛性および耐久性が求められている。   In recent years, semiconductor wafers, glass, aluminum disks, liquid crystal display glass substrates, disk-shaped ceramic substrates and the like have been made thinner, and accordingly, it is required to reduce the thickness of a polishing carrier plate used for polishing work. Furthermore, not only the thickness is reduced, but also rigidity and durability are required.

従来の研磨用キャリアプレートは、SK鋼、ステンレス鋼等の金属製のキャリアプレート(特許文献1参照)、あるいは、エポキシガラス積層板等の樹脂板からなるキャリアプレート(特許文献2参照)が用いられている。金属製の研磨用キャリアプレートは、金属板に被研磨物を保持するための保持穴を形成し、研磨加工、ラップ、ポリッシングを行うことによって得られるが、このような金属製の研磨用キャリアプレートは、保持穴に保持された被研磨物が金属部分と直に接触することから、金属汚染、スクラッチ、チッピング、クラック等が発生するという問題があった。   As a conventional carrier plate for polishing, a carrier plate made of a metal such as SK steel or stainless steel (see Patent Document 1) or a carrier plate made of a resin plate such as an epoxy glass laminate (see Patent Document 2) is used. ing. A metal polishing carrier plate is obtained by forming a holding hole for holding an object to be polished in a metal plate, and performing polishing, lapping, and polishing. Such a metal polishing carrier plate However, since the object to be polished held in the holding hole is in direct contact with the metal portion, there is a problem that metal contamination, scratching, chipping, cracking, etc. occur.

樹脂板からなる研磨用キャリアプレートは、金属製の研磨用キャリアプレートに比べると、耐久性が低く、外周に設けられたギヤ、および、保持穴の強度が低いという問題がある。   The polishing carrier plate made of a resin plate has a problem that the durability is low and the strength of the gear provided on the outer periphery and the holding hole is low compared to a metal polishing carrier plate.

被研磨物の割れや欠けを防止し、さらに、耐久性を高めるために、研磨用キャリアプレートとして、金属板を用いて、保持穴の内周に被研磨物の緩衝部材として、樹脂部を接着剤で固定する方法、保持穴の内周に樹脂をコーティングし、金属板をエポキシガラスクロスで挟み込む方法等が用いられている。   In order to prevent cracking and chipping of the object to be polished and to improve durability, a metal plate is used as a carrier plate for polishing, and the resin part is bonded to the inner periphery of the holding hole as a buffer member for the object to be polished. A method of fixing with an agent, a method of coating a resin on the inner periphery of a holding hole, and sandwiching a metal plate with an epoxy glass cloth are used.

このような緩衝部材を設けることは、被研磨物の割れや欠けを防止するのに効果はあり、研磨用キャリアプレートの耐久性は向上するが、一方で、緩衝部材については、保持穴の内周への固定強度が十分ではなく、緩衝部材が保持穴の内周から容易に脱落するという問題がある。このような緩衝部材の固定強度を向上させるために、特許文献3では、保持穴の内面に面取り部が形成された突出部を複数設け、緩衝部材となる樹脂を固定する方法が用いられているが、保持穴の内周面を加工するために製造工程が増加し、煩雑であり、生産性が低く、製造コストが増加するという問題がある。   Providing such a buffer member is effective in preventing cracking and chipping of the object to be polished, and the durability of the polishing carrier plate is improved. There is a problem in that the fixing strength to the periphery is not sufficient, and the buffer member easily falls off from the inner periphery of the holding hole. In order to improve the fixing strength of such a buffer member, Patent Document 3 uses a method in which a plurality of protruding portions each having a chamfered portion are formed on the inner surface of the holding hole and the resin serving as the buffer member is fixed. However, there is a problem that the manufacturing process increases because the inner peripheral surface of the holding hole is processed, is complicated, the productivity is low, and the manufacturing cost increases.

また、射出成形されたポリプロピレン等の緩衝部材を保持穴の内周に接着する方法では、研磨用キャリアプレートの厚みが0.3mm以下の場合には対応が難しいという問題がある。そして、金属板の保持穴に樹脂からなる緩衝部材を設けるための従来の方法では、金属部分と樹脂部分との成形時の膨張係数の違いから反りあるいはうねりが発生し、その後の研磨用キャリアプレートの外周の歯部の加工が難しくなるという問題もある。   Further, the method of adhering a buffer member such as injection-molded polypropylene to the inner periphery of the holding hole has a problem that it is difficult to handle when the thickness of the polishing carrier plate is 0.3 mm or less. Then, in the conventional method for providing the buffer member made of resin in the holding hole of the metal plate, warpage or undulation occurs due to the difference in expansion coefficient between the metal part and the resin part, and the subsequent polishing carrier plate There is also a problem that it becomes difficult to process the teeth on the outer periphery of the metal.

特開2001−358095号公報JP 2001-358095 A 特開2004−114208号公報JP 2004-114208 A 特開2002− 18708号公報Japanese Patent Laid-Open No. 2002-18708

本発明は、金属板からなる研磨用キャリアプレートにおいて、保持穴に樹脂積層体からなる環状の緩衝部材を強固に固定することができ、さらに、反りやうねりを発生させることなく製造することができる研磨用キャリアプレートの製造方法および研磨用キャリアプレートを提供することを目的とする。   In the polishing carrier plate made of a metal plate, the present invention can firmly fix an annular buffer member made of a resin laminate in a holding hole, and can be manufactured without causing warpage or undulation. An object of the present invention is to provide a method for producing a polishing carrier plate and a polishing carrier plate.

本発明の研磨用キャリアプレートの製造方法は、両面が樹脂付基材によって被覆された金属板からなり、被研磨物を保持するための保持穴が形成された研磨用キャリアプレートの製造方法であって、金属板に、被研磨物を保持するための少なくとも1つの前記保持穴を形成する工程、前記金属板と同じ厚みを有する樹脂積層体からなる環状の部材を、前記保持穴内に嵌合させる工程、2枚の樹脂付基材を用意し、前記樹脂付基材のそれぞれに、前記金属板の保持穴に対応する位置に前記環状の部材の内径と同じ内径を有する貫通穴を形成する工程、前記樹脂付基材を前記金属板の両面にそれぞれ圧着させる工程であって、2枚の前記樹脂付基材を、前記貫通穴と前記保持穴とが重なるように前記金属板の両面に配置し、前記環状の部材が2枚の前記樹脂付基材によって挟まれた状態で、前記金属板と2枚の前記樹脂付基材とを加熱加圧プレスを行い、前記樹脂付基材を前記金属板の両面にそれぞれ圧着させる工程、前記保持穴内に嵌合されている前記環状の部材を切削加工する工程であって、2枚の前記樹脂付基材と共に前記環状の部材を切削加工し、前記環状の部材の内径を広げて環状の緩衝部材を形成する工程、および、2枚の前記樹脂付基材が圧着された状態の前記金属板の外周を円形に加工し、前記外周にギヤ加工を施す工程、を含み、前記研摩用キャリアプレートは、前記保持穴内に嵌合された前記環状の緩衝部材が2枚の前記樹脂付基材によって挟まれた状態で固定されていることを特徴とする。   The method for producing a polishing carrier plate according to the present invention is a method for producing a polishing carrier plate comprising a metal plate coated on both sides with a resin-coated substrate and having holding holes for holding an object to be polished. Forming at least one holding hole for holding an object to be polished in the metal plate, and fitting an annular member made of a resin laminate having the same thickness as the metal plate into the holding hole. Step: preparing two base materials with resin, and forming a through hole having the same inner diameter as the inner diameter of the annular member at a position corresponding to the holding hole of the metal plate in each of the base materials with resin And a step of pressure-bonding the base material with resin to both surfaces of the metal plate, respectively, and arranging the two base materials with resin on both surfaces of the metal plate so that the through hole and the holding hole overlap each other. And two annular members In a state of being sandwiched between the resin-attached base materials, a step of heating and pressurizing the metal plate and the two resin-attached base materials, and press-bonding the resin-attached base material to both surfaces of the metal plate, A step of cutting the annular member fitted in the holding hole, wherein the annular member is cut together with the two substrates with resin, and the inner diameter of the annular member is widened to form an annular shape. Forming the shock-absorbing member, and processing the outer periphery of the metal plate in a state where the two substrates with resin are pressed into a circular shape, and applying gear processing to the outer periphery. The carrier plate is fixed in a state where the annular buffer member fitted in the holding hole is sandwiched between the two substrates with resin.

基材に樹脂ワニスを塗布し、乾燥させることにより、2枚の前記樹脂付基材を形成する。   The resin varnish is applied to the substrate and dried to form two substrates with resin.

基材に樹脂ワニスを塗布し、乾燥させて2枚の樹脂付基材を形成し、その後、前記2枚の樹脂付基材を重ねて加熱加圧プレスすることにより、樹脂積層体を形成し、前記樹脂積層体を加工して、前記環状の部材を形成する。   A resin varnish is applied to the substrate and dried to form two substrates with resin, and then the two substrates with resin are stacked and heated and pressed to form a resin laminate. The resin laminate is processed to form the annular member.

本発明の研磨用キャリアプレートは、被研磨物を保持するための保持穴が設けられた研磨用キャリアプレートであって、金属板、および、前記金属板の両面に圧着された樹脂付基材からなり、外周にギヤが形成された円形を有し、前記金属板には少なくとも1つの保持穴が形成され、前記保持穴の内周に樹脂積層体からなる環状の部材から形成された環状の緩衝部材が取り付けられており、前記樹脂付基材には、前記環状の緩衝部材の内径と同径の貫通穴が設けられており、前記環状の緩衝部材は2枚の前記樹脂付基材と圧着固定されていることにより、前記保持穴内に固定されていることを特徴とする。   The polishing carrier plate of the present invention is a polishing carrier plate provided with a holding hole for holding an object to be polished. The polishing carrier plate includes a metal plate and a resin-attached substrate that is pressure-bonded to both surfaces of the metal plate. An annular buffer having a circular shape with a gear formed on the outer periphery, at least one holding hole formed in the metal plate, and an annular member formed of a resin laminate on the inner periphery of the holding hole. A member is attached, and the resin-coated base material is provided with a through hole having the same diameter as the inner diameter of the annular buffer member, and the annular buffer member is crimped to the two resin-coated base materials. By being fixed, it is fixed in the holding hole.

前記環状の緩衝部材は、樹脂付基材からなる樹脂積層体で形成されている。     The annular buffer member is formed of a resin laminate made of a resin-attached base material.

本発明の研磨用キャリアプレートの製造方法は、両面が樹脂付基材によって被覆された金属板からなり、被研磨物を保持するための保持穴が形成された研磨用キャリアプレートの製造方法であって、金属板に、被研磨物を保持するための少なくとも1つの前記保持穴を形成する工程、前記金属板と同じ厚みを有する樹脂積層体からなる環状の部材を、前記保持穴内に嵌合させる工程、2枚の樹脂付基材を用意し、前記樹脂付基材のそれぞれに、前記金属板の保持穴に対応する位置に前記環状の部材の内径と同じ内径を有する貫通穴を形成する工程、前記樹脂付基材を前記金属板の両面にそれぞれ圧着させる工程であって、2枚の前記樹脂付基材を、前記貫通穴と前記保持穴とが重なるように前記金属板の両面に配置し、前記環状の部材が2枚の前記樹脂付基材によって挟まれた状態で、前記金属板と2枚の前記樹脂付基材とを加熱加圧プレスを行い、前記樹脂付基材を前記金属板の両面にそれぞれ圧着させる工程、前記保持穴内に嵌合されている前記環状の部材を切削加工する工程であって、2枚の前記樹脂付基材と共に前記環状の部材を切削加工し、前記環状の部材の内径を広げて環状の緩衝部材を形成する工程、および、2枚の前記樹脂付基材が圧着された状態の前記金属板の外周を円形に加工し、前記外周にギヤ加工を施す工程、を含み、前記研摩用キャリアプレートは、前記保持穴内に嵌合された前記環状の緩衝部材が2枚の前記樹脂付基材によって挟まれた状態で固定されていることにより、保持穴の内周に環状の緩衝部材を強固に固定することが可能となり、反り、うねりを抑制しながら厚さ0.3mm以下の研磨用キャリアプレートを製造することが可能となる。     The method for producing a polishing carrier plate according to the present invention is a method for producing a polishing carrier plate comprising a metal plate coated on both sides with a resin-coated substrate and having holding holes for holding an object to be polished. Forming at least one holding hole for holding an object to be polished in the metal plate, and fitting an annular member made of a resin laminate having the same thickness as the metal plate into the holding hole. Step: preparing two base materials with resin, and forming a through hole having the same inner diameter as the inner diameter of the annular member at a position corresponding to the holding hole of the metal plate in each of the base materials with resin And a step of pressure-bonding the base material with resin to both surfaces of the metal plate, respectively, and arranging the two base materials with resin on both surfaces of the metal plate so that the through hole and the holding hole overlap each other. And two annular members In a state of being sandwiched between the resin-attached base materials, a step of heating and pressurizing the metal plate and the two resin-attached base materials, and press-bonding the resin-attached base material to both surfaces of the metal plate, A step of cutting the annular member fitted in the holding hole, wherein the annular member is cut together with the two substrates with resin, and the inner diameter of the annular member is widened to form an annular shape. Forming the shock-absorbing member, and processing the outer periphery of the metal plate in a state where the two substrates with resin are pressed into a circular shape, and applying gear processing to the outer periphery. The carrier plate is fixed in a state where the annular buffer member fitted in the holding hole is sandwiched between the two substrates with resin, so that the annular buffer member is attached to the inner periphery of the holding hole. It becomes possible to fix firmly, warp Ri becomes possible to manufacture the following polishing carrier plate with a thickness of 0.3mm while suppressing.

基材に樹脂ワニスを塗布し、乾燥させることにより、2枚の前記樹脂付基材を形成し、さらに、基材に樹脂ワニスを塗布し、乾燥させて2枚の樹脂付基材を形成し、その後、前記2枚の樹脂付基材を重ねて加熱加圧プレスすることにより、樹脂積層体を形成し、前記樹脂積層体を加工して、前記環状の部材を形成することにより、金属板の両面に圧着する前記樹脂付基材と、環状の緩衝部材とを形成する工程を共通化することができることから、製造コストを低減することができる。   By applying a resin varnish to the substrate and drying it, the two substrates with resin are formed, and further, applying the resin varnish to the substrate and drying to form two substrates with resin Thereafter, the two resin-coated substrates are stacked and heated and pressed to form a resin laminate, and the resin laminate is processed to form the annular member, thereby forming a metal plate. Since the process of forming the said base material with a resin crimped | bonded to both surfaces and the cyclic | annular buffer member can be made common, manufacturing cost can be reduced.

本発明の研磨用キャリアプレートは、被研磨物を保持するための保持穴が設けられた研磨用キャリアプレートであって、金属板、および、前記金属板の両面に圧着された樹脂付基材からなり、外周にギヤが形成された円形を有し、前記金属板には少なくとも1つの保持穴が形成され、前記保持穴の内周に樹脂積層体からなる環状の部材から形成された環状の緩衝部材が取り付けられており、前記樹脂付基材には、前記環状の緩衝部材の内径と同径の貫通穴が設けられており、前記環状の緩衝部材は2枚の前記樹脂付基材と圧着固定されていることにより、前記保持穴内に固定されていることにより、保持穴内に前記環状の緩衝部材が強固に固定され、強度、耐久性に優れており、反りやうねりを生じることなく従来よりも厚みを薄くすることが可能となる。   The polishing carrier plate of the present invention is a polishing carrier plate provided with a holding hole for holding an object to be polished. The polishing carrier plate includes a metal plate and a resin-attached substrate that is pressure-bonded to both surfaces of the metal plate. An annular buffer having a circular shape with a gear formed on the outer periphery, at least one holding hole formed in the metal plate, and an annular member formed of a resin laminate on the inner periphery of the holding hole. A member is attached, and the resin-coated base material is provided with a through hole having the same diameter as the inner diameter of the annular buffer member, and the annular buffer member is crimped to the two resin-coated base materials. By being fixed, by being fixed in the holding hole, the annular buffer member is firmly fixed in the holding hole, and is excellent in strength and durability, and does not cause warping or undulation from the past. Also reduce the thickness It can become.

本発明の研磨用キャリアプレートの金属板の(a)平面図、および(b)断面図である。It is (a) top view and (b) sectional drawing of the metal plate of the carrier plate for grinding | polishing of this invention. 金属板の保持穴に嵌合させる環状の樹脂積層体の(a)平面図、および(b)断面図である。It is the (a) top view of the cyclic | annular resin laminated body fitted to the holding hole of a metal plate, and (b) sectional drawing. 金属板の保持穴に環状の樹脂積層体を嵌合させた状態の(a)平面図、および(b)断面図である。It is the (a) top view of the state which made the cyclic | annular resin laminated body fitted to the holding hole of the metal plate, and (b) sectional drawing. 金属板に圧着させる樹脂付基材の(a)平面図、および(b)断面図である。It is (a) top view and (b) sectional drawing of the base material with resin made to press-fit to a metal plate. 金属板の両面に樹脂付基材を圧着させた状態の(a)平面図、および(b)断面図である。It is the (a) top view of the state where the substrate with resin was pressed on both sides of the metal plate, and (b) sectional view. 環状の樹脂積層体を加工し、環状の緩衝部材を形成した状態の金属板の(a)平面図、および(b)断面図である。It is the (a) top view of the metal plate of the state which processed the cyclic | annular resin laminated body, and formed the cyclic | annular buffer member, and (b) sectional drawing. 本発明の研磨用キャリアプレートの(a)平面図、および(b)断面図である。It is (a) top view of the carrier plate for grinding | polishing of this invention, and (b) sectional drawing. 太陽ギヤとインターナルギヤとの間に研磨用キャリアプレートを配置した状態の平面図である。It is a top view of the state which has arrange | positioned the grinding | polishing carrier plate between the sun gear and the internal gear. 比較例の研磨用キャリアプレートの金属板の(a)平面図、および(b)断面図である。It is (a) top view and (b) sectional drawing of the metal plate of the grinding | polishing carrier plate of a comparative example. 比較例の金属板の保持穴に嵌合させる円板状の樹脂積層体の(a)平面図、および(b)断面図である。It is the (a) top view of the disk-shaped resin laminated body fitted to the holding hole of the metal plate of a comparative example, and (b) sectional drawing. 比較例の金属板の保持穴に円板状の樹脂積層体を嵌合させた状態の(a)平面図、および(b)断面図である。It is (a) top view of the state which made the disk-shaped resin laminated body fit to the holding hole of the metal plate of a comparative example, and (b) sectional drawing. 比較例の金属板に圧着させる樹脂付基材の(a)平面図、および(b)断面図である。It is the (a) top view of the base material with a resin made to press-fit to the metal plate of a comparative example, and (b) sectional drawing. 比較例の金属板の両面に樹脂付基材を圧着させた状態の(a)平面図、および(b)断面図である。It is (a) top view and (b) sectional view in the state where a substrate with resin was pressed on both sides of a metal plate of a comparative example. 円板状の樹脂積層体を加工し、環状の緩衝部材を形成した状態の金属板の(a)平面図、および(b)断面図である。It is the (a) top view and (b) sectional view of the metal plate of the state which processed the disk-shaped resin laminated body and formed the cyclic | annular buffer member. 比較例の研磨用キャリアプレートの(a)平面図、および(b)断面図である。It is (a) top view of the carrier plate for grinding | polishing of a comparative example, and (b) sectional drawing.

本発明の研磨用キャリアプレート1の製造方法および研磨用キャリアプレート1について、図を用いて以下に詳しく説明する。図1〜6に示すのは、本発明の研磨用キャリアプレートの製造方法の手順を示す平面図および断面図であり、図7に示すのが本発明の研磨用キャリアプレート1の平面図および断面図である。断面図を見易くするために、断面図の縦横比を変更している。本発明の研磨用キャリアプレート1は、研磨装置において、図8に示すように、太陽ギヤ11とインターナルギヤ12とによって回転し、保持穴3内に配置された被研磨物を研磨するために用いられるものである。まず初めに、本発明の研磨用キャリアプレート1の製造方法について説明する。   The manufacturing method of the polishing carrier plate 1 and the polishing carrier plate 1 of the present invention will be described below in detail with reference to the drawings. 1 to 6 are a plan view and a cross-sectional view showing the procedure of the method for producing a polishing carrier plate of the present invention, and FIG. 7 shows a plan view and a cross-section of the polishing carrier plate 1 of the present invention. FIG. In order to make the sectional view easier to see, the aspect ratio of the sectional view is changed. As shown in FIG. 8, the polishing carrier plate 1 of the present invention is rotated by a sun gear 11 and an internal gear 12 to polish an object to be polished disposed in the holding hole 3 as shown in FIG. It is used. First, a method for producing the polishing carrier plate 1 of the present invention will be described.

最初に、所定の厚みおよび大きさを有する金属板2を用意し、図1に示すように、被研磨物を保持するための保持穴3をレーザー加工等で形成する。前記金属板2としては、ステンレス板等を用い、前記保持穴3の大きさは、被研磨物の大きさに合わせて設定するが、前記保持穴3内に環状の緩衝部材4を取り付けることを想定した大きさとする。また、前記保持穴3の数についても、図1(a)に示すような4つに限定するものではなく、研磨装置、被研磨物等の条件に合わせて適宜変更することができる。   First, a metal plate 2 having a predetermined thickness and size is prepared, and as shown in FIG. 1, a holding hole 3 for holding an object to be polished is formed by laser processing or the like. As the metal plate 2, a stainless steel plate or the like is used, and the size of the holding hole 3 is set according to the size of the object to be polished, and an annular buffer member 4 is attached in the holding hole 3. The assumed size. Further, the number of the holding holes 3 is not limited to four as shown in FIG. 1A, and can be appropriately changed according to conditions of a polishing apparatus, an object to be polished, and the like.

次に、前記保持穴3内に嵌合させる樹脂積層体からなる環状の部材である環状の樹脂積層体4’の形成方法について説明する。まず、ガラスクロス等の2枚の基材を用意し、前記基材にエポキシ樹脂、ビスマレイド樹脂等の樹脂ワニスを塗布し乾燥させて、同じ大きさの2枚の樹脂付基材を形成する。2枚の前記樹脂付基材を互いに重ね合わせて加熱加圧プレスすることにより、樹脂積層体を形成する。この時、前記樹脂積層体の厚みは前記金属板2と同じ厚みとなるように形成する。前記基材としては、アラミド繊維他の高弾性有機繊維、炭素繊維等を用いることも可能であり、これらの基材と樹脂ワニスを適宜選択して組み合わせることができる。   Next, a method for forming an annular resin laminate 4 ′ that is an annular member made of a resin laminate fitted into the holding hole 3 will be described. First, two base materials such as glass cloth are prepared, and a resin varnish such as an epoxy resin or a bismaleide resin is applied to the base material and dried to form two base materials with resin of the same size. The two resin-coated base materials are stacked on each other and heated and pressed to form a resin laminate. At this time, the resin laminate is formed to have the same thickness as the metal plate 2. As the substrate, aramid fibers or other highly elastic organic fibers, carbon fibers, or the like can be used. These substrates and a resin varnish can be appropriately selected and combined.

前記樹脂積層体をレーザー加工、ルーター加工、打ち抜き加工等を基いて、図2に示すような環状の樹脂積層体4’を形成する。前記環状の樹脂積層体4’の外径は、前記保持穴3内に嵌合できる大きさとし、内径については、後の工程で切削加工することを踏まえて、最終形態の環状の緩衝部材4よりも小さい内径とする。前記環状の樹脂積層体4’は、本実施形態のように2枚の樹脂付基材を用いて形成したものに限定するものではなく、1枚の樹脂付基材を用いて形成することも可能であり、また、樹脂だけを用いて形成することも可能である。樹脂の材質についても特に限定するものではない。このようにして4つの環状の樹脂積層体4’を形成し、図3に示すように、4つの前記保持穴3内に挿入する。   An annular resin laminate 4 ′ as shown in FIG. 2 is formed on the resin laminate by laser processing, router processing, punching processing, or the like. The outer diameter of the annular resin laminate 4 ′ is set to a size that can be fitted into the holding hole 3, and the inner diameter is cut from the annular buffer member 4 in the final form in consideration of cutting in a later step. The inner diameter is also small. The annular resin laminate 4 ′ is not limited to the one formed using two substrates with resin as in the present embodiment, and may be formed using one substrate with resin. It is also possible to use only resin. The material of the resin is not particularly limited. In this way, four annular resin laminates 4 ′ are formed and inserted into the four holding holes 3 as shown in FIG. 3.

次に、前記金属板2の両面に圧着する樹脂付基材5について説明する。前記環状の樹脂積層体4’の形成に用いた前記樹脂付基材と同様に、ガラスクロス等の2枚の基材を用意し、前記基材にエポキシ等の樹脂ワニスを塗布し乾燥させて、2枚の樹脂付基材5を形成する。2枚の前記樹脂付基材5は、前記環状の樹脂積層体4’の形成に用いた樹脂付基材と同じ材質、同じ厚みとすることが好ましいが、異なる材質、異なる厚みとすることも可能である。   Next, the resin-attached base material 5 that is pressure-bonded to both surfaces of the metal plate 2 will be described. As with the base material with resin used for forming the annular resin laminate 4 ′, two base materials such as glass cloth are prepared, and a resin varnish such as epoxy is applied to the base material and dried. Two base materials 5 with resin are formed. The two base materials with resin 5 are preferably the same material and the same thickness as the base material with resin used to form the annular resin laminate 4 ′, but may have different materials and different thicknesses. Is possible.

このようにして形成した2枚の前記樹脂付基材5を、図4に示すように、前記金属板2と同じ大きさに切断加工し、4つの貫通穴6を形成する。前記貫通穴6は、前記金属板2の保持穴3に合わせた位置に同じ数を形成する。この時、前記貫通穴6の径は、前記環状の樹脂積層体4’の内径と同じとする。   As shown in FIG. 4, the two substrates 5 with resin thus formed are cut into the same size as the metal plate 2 to form four through holes 6. The same number of the through holes 6 are formed at positions corresponding to the holding holes 3 of the metal plate 2. At this time, the diameter of the through hole 6 is the same as the inner diameter of the annular resin laminate 4 ′.

前記貫通穴6が形成された2枚の前記樹脂付基材5を、図6(b)に示すように、前記金属板2の両面に配置する。この時、図6(a)に示すように、前記樹脂付基材5の貫通穴6を前記金属板2の保持穴3と重なるように位置合わせし、さらに、前記貫通穴6の内周が前記環状の樹脂積層体4’の内周と一致するように位置合わせする。これにより、前記環状の樹脂積層体4’は、図6(b)に示すように、前記保持穴3内において、2枚の樹脂付基材5によって上下に挟まれた状態となっている。   As shown in FIG. 6B, the two substrates with resin 5 in which the through holes 6 are formed are arranged on both surfaces of the metal plate 2. At this time, as shown in FIG. 6 (a), the through hole 6 of the substrate 5 with resin is aligned with the holding hole 3 of the metal plate 2, and the inner periphery of the through hole 6 is further aligned. Alignment is performed so as to coincide with the inner periphery of the annular resin laminate 4 ′. Thereby, as shown in FIG. 6B, the annular resin laminate 4 ′ is sandwiched between the two resin-attached base materials 5 in the holding hole 3.

このようにして、前記金属板2を2枚の前記樹脂付基材5で上下に挟んだ状態で、加熱加圧プレスを行い圧着成形する。これにより、前記樹脂付基材5は前記金属板2の両面に圧着固定され、さらに、前記環状の樹脂積層体4’の両面も前記樹脂付基材5と圧着固定された状態となる。   In this way, with the metal plate 2 being sandwiched between the two substrates 5 with resin, the heat and pressure press is performed to perform pressure forming. Thereby, the base material 5 with resin is pressure-bonded and fixed to both surfaces of the metal plate 2, and the both surfaces of the annular resin laminate 4 ′ are also pressure-fixed to the base material 5 with resin.

前記環状の樹脂積層体4’の内周をレーザー加工によって除去しその幅を狭くして、最終形態の環状の緩衝部材4の形状に加工する。この時、前記環状の樹脂積層体4’の両面に固定されている前記樹脂付基材5も同時に環状に除去する。これにより、前記保持穴3内に環状の緩衝部材4が固定された状態で形成され、研摩作業時に被研磨物は前記環状の緩衝部材4の中に配置されることになる。   The inner periphery of the annular resin laminate 4 ′ is removed by laser processing to narrow its width, and processed into the shape of the final annular buffer member 4. At this time, the substrate 5 with resin fixed to both surfaces of the annular resin laminate 4 ′ is also removed annularly at the same time. As a result, the annular buffer member 4 is fixed in the holding hole 3, and the object to be polished is disposed in the annular buffer member 4 during the polishing operation.

その後、両面に前記樹脂付基材5が固定された金属板2をレーザー加工によって所定の外径を円板状に形成し、外周にギヤ加工を施すと、図7に示すような本発明の研磨用キャリアプレート1が完成する。   After that, when the metal plate 2 with the resin-attached base material 5 fixed on both sides is formed into a disk shape with a predetermined outer diameter by laser processing and gear processing is performed on the outer periphery, the metal plate 2 of the present invention as shown in FIG. The polishing carrier plate 1 is completed.

以上のような製造方法によって得られた本発明の研摩用キャリアプレート1について説明する。本発明の研磨用キャリアプレート1は、金属板2および前記金属板2の両面に圧着された樹脂付基材5からなり、外周にギヤ7が形成された円形を有しており、被研磨物を保持するための保持穴3が設けられている。前記保持穴3の内周には、樹脂積層体からなる、前記被研磨物を保護するための環状の緩衝部材4が固定されている。   The polishing carrier plate 1 of the present invention obtained by the above manufacturing method will be described. The polishing carrier plate 1 of the present invention comprises a metal plate 2 and a resin-coated base material 5 bonded to both surfaces of the metal plate 2 and has a circular shape with a gear 7 formed on the outer periphery. Is provided with a holding hole 3. An annular buffer member 4 made of a resin laminate for protecting the object to be polished is fixed to the inner periphery of the holding hole 3.

前記環状の緩衝部材4の上下面は、前記金属板2の両面に圧着固定されている樹脂付基材5によって挟まれた状態で固定されており、前記環状の緩衝部材4の両面は2枚の前記樹脂付基材5と強固に固定されている。前記環状の緩衝部材4の外周面と、前記保持穴3の内周面との間には接着剤等の固定手段を用いていないが、図7(b)に示すように、前記環状の緩衝部材4が2枚の樹脂付基材5によって上下に挟まれて圧着固定されていることにより、前記保持穴3内に強固に固定されており、従来よりも固定強度は増加している。   The upper and lower surfaces of the annular buffer member 4 are fixed in a state of being sandwiched by the resin-attached base material 5 fixed to both surfaces of the metal plate 2, and two surfaces of the annular buffer member 4 are provided. The resin-attached base material 5 is firmly fixed. A fixing means such as an adhesive is not used between the outer peripheral surface of the annular buffer member 4 and the inner peripheral surface of the holding hole 3, but as shown in FIG. The member 4 is firmly fixed in the holding hole 3 by being clamped and fixed between the two resin-attached base materials 5 up and down, and the fixing strength is increased as compared with the related art.

このように、樹脂積層体からなる環状の部材を用いて、前記環状の緩衝部材4を形成し、樹脂付基材5の圧着固定によって前記環状の緩衝部材4を前記保持穴3内に固定することにより、本発明の研磨用キャリアプレート1は、保持穴3内に強固に環状の緩衝部材4を固定することができ、研磨用キャリアプレート1自体の強度および耐久性を向上することが可能となり、また、反り、うねりを抑制しながら厚さ0.3mm以下の薄型の研磨用キャリアプレートを実現することができる。   In this manner, the annular buffer member 4 is formed using an annular member made of a resin laminate, and the annular buffer member 4 is fixed in the holding hole 3 by crimping and fixing the substrate 5 with resin. Thus, the polishing carrier plate 1 of the present invention can firmly fix the annular buffer member 4 in the holding hole 3 and can improve the strength and durability of the polishing carrier plate 1 itself. In addition, a thin polishing carrier plate having a thickness of 0.3 mm or less can be realized while suppressing warpage and undulation.

そして、本発明の研磨用キャリアプレートの製造方法は、従来よりも製造コストを大幅に増加させることなく、上述のような優れた効果を奏する研磨用キャリアプレートを製造することが可能となる。   And the manufacturing method of the carrier plate for grinding | polishing of this invention can manufacture the carrier plate for grinding | polishing which has the above outstanding effects, without increasing manufacturing cost significantly compared with the past.

本発明の研磨用キャリアプレート1は、図8に示すように、太陽ギヤ11とインターナルギヤ12の間に配置され、前記太陽ギヤ11と前記インターナルギヤ12が矢印の方向に回転することによって、前記研磨用キャリアプレート1が矢印の方向に回転し、保持穴3内に配置された被研磨物が研磨される。このような研磨作業時に、前記保持穴3に保持されている被研磨物は、環状の緩衝部材4によって保護され、破損等の問題を解消することができる。   As shown in FIG. 8, the polishing carrier plate 1 of the present invention is disposed between a sun gear 11 and an internal gear 12, and the sun gear 11 and the internal gear 12 rotate in the direction of the arrow. The polishing carrier plate 1 rotates in the direction of the arrow, and the object to be polished disposed in the holding hole 3 is polished. During such a polishing operation, the object to be polished held in the holding hole 3 is protected by the annular buffer member 4, and problems such as breakage can be solved.

次に、実施例と比較例を用いて本発明の研磨用キャリアプレート1について詳細に説明する。まず初めに、実施例の研磨用キャリアプレート1について説明する。   Next, the polishing carrier plate 1 of the present invention will be described in detail using Examples and Comparative Examples. First, the polishing carrier plate 1 of the embodiment will be described.

実施例は、金属板2として、厚みが0.1mm、大きさが350mm×350mmのステンレスの板を用いる。このような金属板2にレーザー加工によって、φ110mmの保持穴3を4つ形成し、図1に示すような金属板2を作成する。   In this embodiment, a stainless steel plate having a thickness of 0.1 mm and a size of 350 mm × 350 mm is used as the metal plate 2. Four holding holes 3 having a diameter of 110 mm are formed in such a metal plate 2 by laser processing, and the metal plate 2 as shown in FIG. 1 is created.

次に、ガラスクロスにエポキシ樹脂ワニスを塗布し、乾燥させて厚み0.05mmの樹脂付基材を2枚形成する。2枚の前記樹脂付基材を重ね合わせて加熱加圧プレス成形し、金属板2と同じ厚み(0.1mm)の樹脂積層体を形成する。   Next, an epoxy resin varnish is applied to the glass cloth and dried to form two substrates with resin having a thickness of 0.05 mm. The two substrates with resin are overlapped and heated and pressed to form a resin laminate having the same thickness (0.1 mm) as the metal plate 2.

前記樹脂積層体をレーザー加工、ルーター加工、打ち抜き加工等を用いて、外径99.5〜99.0mm、内径89.5〜89.0mmの環状の樹脂積層体4’を4つ形成する。前記環状の樹脂積層体4’を、図3に示すように、前記金属板2の保持穴3内に嵌合する。   Four annular resin laminates 4 ′ having an outer diameter of 99.5 to 99.0 mm and an inner diameter of 89.5 to 89.0 mm are formed on the resin laminate using laser processing, router processing, punching processing, or the like. The annular resin laminate 4 ′ is fitted into the holding hole 3 of the metal plate 2 as shown in FIG. 3.

前記環状の樹脂積層体4’を製作した際に使用した樹脂付基材と同様の手順で、同じ材質および厚みの2枚の樹脂付基材5(厚み0.05mm)を製作する。そして、2枚の樹脂付基材5を前記金属板2と同じサイズ(350mm×350mm)に切断加工し、前記金属板2の保持穴3と同じ位置に、図4に示すように、前記環状の樹脂積層体4’の内径と同じ径(89.5〜89.0mm)の貫通穴6を4つ形成する。   Two resin-coated substrates 5 (thickness 0.05 mm) having the same material and thickness are fabricated in the same procedure as the resin-coated substrate used when the annular resin laminate 4 'is fabricated. Then, the two resin-attached base materials 5 are cut into the same size (350 mm × 350 mm) as the metal plate 2, and at the same position as the holding hole 3 of the metal plate 2, as shown in FIG. Four through holes 6 having the same diameter (89.5 to 89.0 mm) as the inner diameter of the resin laminate 4 ′ are formed.

前記保持穴3内に前記環状の樹脂積層体4’が嵌合された金属板2の両面に前記樹脂付基材5を配置し、その後、加熱加圧プレスを行い、圧着成形する。その後、前記環状の樹脂積層体4’の幅が1.5mmとなるように、レーザー加工によって前記環状の樹脂積層体4’の内周およびその両面に圧着されている前記樹脂付基材5を削除する。これにより、前記環状の樹脂積層体4’から環状の緩衝部材4が形成され、前記環状の緩衝部材4が前記保持穴3内に固定された状態となる。   The base material 5 with resin is disposed on both surfaces of the metal plate 2 in which the annular resin laminate 4 ′ is fitted in the holding hole 3, and then heat-pressed to perform pressure forming. Thereafter, the resin-attached base material 5 that is pressure-bonded to the inner periphery and both surfaces of the annular resin laminate 4 ′ by laser processing so that the width of the annular resin laminate 4 ′ is 1.5 mm. delete. Thereby, the annular buffer member 4 is formed from the annular resin laminate 4 ′, and the annular buffer member 4 is fixed in the holding hole 3.

そして、レーザー加工によって前記樹脂付基材5が圧着された金属板2を外径315mmの円形に加工し、穴8等の加工を行い、最後に、外周にギヤ加工を施してギヤ7を形成すると、図7に示すような、厚さ0.2mmである実施例の研磨用キャリアプレート1が完成する。   Then, the metal plate 2 to which the substrate 5 with resin is pressure-bonded by laser processing is processed into a circle having an outer diameter of 315 mm, holes 8 and the like are processed, and finally, gear processing is performed on the outer periphery to form the gear 7. Then, the polishing carrier plate 1 of the embodiment having a thickness of 0.2 mm as shown in FIG. 7 is completed.

次に、比較例の研磨用キャリアプレート21について説明する。比較例に使用する金属板22は、実施例と同様に、厚みが0.1mm、大きさが350mm×350mmのステンレスの板を用いる。このような金属板22にレーザー加工によって、図9に示すように、φ110mmの保持穴23を4つ形成する。   Next, the polishing carrier plate 21 of the comparative example will be described. The metal plate 22 used in the comparative example is a stainless steel plate having a thickness of 0.1 mm and a size of 350 mm × 350 mm, as in the example. As shown in FIG. 9, four holding holes 23 having a diameter of 110 mm are formed in the metal plate 22 by laser processing.

比較例では、前記保持穴23内に環状の樹脂積層体の代わりに、図10に示すような円板状の樹脂積層体24’を嵌合させる。そのために、前記円板状の樹脂積層体24’を、前記環状の樹脂積層体4’と同じ樹脂付基材を用いて同じ外径、同じ厚みで形成する。このようにして形成した前記円板状の樹脂積層体24’を、図11に示すように、前記金属板22の保持穴23内に嵌合させる。   In the comparative example, a disc-shaped resin laminate 24 ′ as shown in FIG. 10 is fitted in the holding hole 23 instead of the annular resin laminate. For this purpose, the disk-shaped resin laminate 24 ′ is formed with the same outer diameter and the same thickness using the same substrate with resin as the annular resin laminate 4 ′. The disk-shaped resin laminate 24 ′ thus formed is fitted into the holding hole 23 of the metal plate 22 as shown in FIG. 11.

そして、前記金属板22の両面に圧着する2枚の樹脂付基材25を用意する。比較例に用いる樹脂付基材25は、実施例と同様に、ガラスクロスにエポキシ樹脂ワニスを塗布し、乾燥させて厚み0.05mmの樹脂付基材25を2枚形成し、前記金属板22と同じサイズ(350mm×350mm)に切断加工するが、この際に、図12に示すように、実施例のような貫通穴は形成しない。   And the two base material 25 with a resin crimped | bonded to both surfaces of the said metal plate 22 is prepared. As in the example, the base material with resin 25 used in the comparative example was formed by applying epoxy resin varnish to glass cloth and drying to form two base materials with resin 25 having a thickness of 0.05 mm. Are cut into the same size (350 mm × 350 mm), but at this time, as shown in FIG. 12, a through hole as in the example is not formed.

このようにして形成した貫通穴の無い2枚の前記樹脂付基材25を前記金属板22の両面に配置し、その後、加熱加圧プレスを行い、圧着成形する。これにより、前記金属板22の両面は全面が前記樹脂付基材25によって覆われた状態となっている。そして、前記円板状の樹脂積層体24’および2枚の前記樹脂付基材25にレーザー加工を施し、前記円板状の樹脂積層体24’の中央に前記円板状の樹脂積層体24’および2枚の前記樹脂付基材25を貫通する貫通穴26を形成する。これにより、前記円板状の樹脂積層体24’から環状の緩衝部材24が形成される。   The two resin-coated base materials 25 having no through holes formed in this way are arranged on both surfaces of the metal plate 22, and then a heat-pressing press is performed to perform pressure forming. As a result, both surfaces of the metal plate 22 are covered with the substrate 25 with resin. Then, the disk-shaped resin laminate 24 ′ and the two substrates with resin 25 are subjected to laser processing, and the disk-shaped resin laminate 24 is formed at the center of the disk-shaped resin laminate 24 ′. A through-hole 26 that penetrates through the two substrates with resin 25 is formed. Thereby, an annular buffer member 24 is formed from the disk-shaped resin laminate 24 ′.

そして、レーザー加工によって前記樹脂付基材25が圧着された金属板22を外径315mmの円形に加工し、穴28等の加工を行い、最後に、外周にギヤ加工を施してギヤ27を形成し、厚さ0.2mmである比較例の研磨用キャリアプレート21が完成する。   Then, the metal plate 22 to which the resin-coated base material 25 is pressure-bonded by laser processing is processed into a circular shape having an outer diameter of 315 mm, the holes 28 and the like are processed, and finally, gear processing is performed on the outer periphery to form the gear 27. Then, the polishing carrier plate 21 of the comparative example having a thickness of 0.2 mm is completed.

このようにして用意した実施例の研磨用キャリアプレート1と、比較例の研磨用キャリアプレート21を、以下の試験1〜4を行って評価する。試験の結果を以下の表1に記載する。各試験の内容は次の通りである。   The polishing carrier plate 1 of the example prepared in this way and the polishing carrier plate 21 of the comparative example are evaluated by performing the following tests 1 to 4. The test results are listed in Table 1 below. The contents of each test are as follows.

試験1:加熱加圧プレス成形性(保持穴内に固定された樹脂積層体からなる環状の緩衝部材が金属板の表面に乗り上げの有無、板の表面の平滑性(凹凸、シワ、ヨレが規格内であること)を目視で確認)
試験2:研磨用キャリアプレートの厚み偏差(保持穴内の樹脂積層体からなる環状の緩衝部材および樹脂付基材からなる部分の厚みと、保持穴周辺の金属板と樹脂付基材からなる部分の厚みをマイクロメータにより測定)
試験3:アルミディスクのポリッシングを5000バッチ繰り返し実施し、保持穴内の環状の緩衝部材の接合状態と被研磨物の表面状態を顕微鏡で観察
試験4:研磨用キャリアプレートの反り・うねり(定盤上に試料を平置きして浮き上がり部分の高さを測定)
Test 1: Heat and pressure press formability (the presence or absence of an annular buffer member made of a resin laminate fixed in the holding hole on the surface of the metal plate, the smoothness of the surface of the plate (irregularities, wrinkles, twists are within specifications) Confirm visually)
Test 2: Thickness deviation of the carrier plate for polishing (the thickness of the portion made of the annular buffer member made of the resin laminate in the holding hole and the base with resin, and the portion made of the metal plate around the holding hole and the base with resin (Measure the thickness with a micrometer)
Test 3: Aluminum disc polishing was repeated 5000 batches, and the bonding state of the annular cushioning member in the holding hole and the surface state of the object to be polished were observed with a microscope. Test 4: Warping and waviness of the polishing carrier plate (on the surface plate) Measure the height of the floating part by placing the sample flat on

以上の試験結果から、実施例の研磨用キャリアプレート1は、全ての項目において比較例より優れた結果を奏しており、環状の緩衝部材4については、環状の樹脂積層体4’を用いて形成することによって、前記環状の緩衝部材4の樹脂が金属板2へ乗り上げることが無くなり、その結果、平滑性に優れており、厚み偏差を規格内に収めることができ、さらに、接合強度も向上させている。そして、実施例の研磨用キャリアプレート1は、0.2mmの厚さであっても、反り、うねりを実用性に問題無い範囲に収めることができることから、本発明は、従来よりも薄板の研磨用キャリアプレートを実現することができることが明らかである。   From the above test results, the polishing carrier plate 1 of the example shows results superior to the comparative example in all items, and the annular buffer member 4 is formed using the annular resin laminate 4 ′. By doing so, the resin of the annular buffer member 4 does not run on the metal plate 2, and as a result, the smoothness is excellent, the thickness deviation can be kept within the standard, and the bonding strength is also improved. ing. And even if the carrier plate 1 for polishing of the embodiment has a thickness of 0.2 mm, warping and undulation can be accommodated in a practically acceptable range. It is clear that a carrier plate can be realized.

以上のように、本発明の研磨用キャリアプレートの製造方法は、金属板2に特別な加工等を施すことなく、金属板2の保持穴3に樹脂積層体からなる環状の緩衝部材4を強固に固定することが可能となり、その結果、厚み偏差が少なく、反り、うねりを発生させることなく、0.3mm以下の厚みの薄物にも対応可能な研磨用キャリアプレートを実現することができる。   As described above, the manufacturing method of the polishing carrier plate according to the present invention firmly attaches the annular buffer member 4 made of the resin laminate to the holding hole 3 of the metal plate 2 without performing special processing or the like on the metal plate 2. As a result, it is possible to realize a polishing carrier plate that has a small thickness deviation and can cope with a thin object having a thickness of 0.3 mm or less without causing warpage or waviness.

1 研磨用キャリアプレート
2 金属板
3 保持穴
4 環状の緩衝部材
4’ 環状の樹脂積層体
5 樹脂付基材
6 貫通穴
7 ギヤ
8 穴
11 太陽ギヤ
12 インターナルギヤ
21 比較例の研磨用キャリアプレート
22 金属板
23 保持穴
24 環状の緩衝部材
24’円板状の樹脂積層体
25 樹脂付基材
26 貫通穴
27 ギヤ
28 穴
DESCRIPTION OF SYMBOLS 1 Polishing carrier plate 2 Metal plate 3 Holding hole 4 Annular buffer member 4 'Annular resin laminated body 5 Substrate with resin 6 Through hole 7 Gear 8 Hole 11 Sun gear 12 Internal gear 21 Polishing carrier plate of comparative example 22 metal plate 23 holding hole 24 annular buffer member 24 'disk-shaped resin laminate 25 resin base material 26 through hole 27 gear 28 hole

Claims (5)

両面が樹脂付基材によって被覆された金属板からなり、被研磨物を保持するための保持穴が形成された研磨用キャリアプレートの製造方法であって、
金属板に、被研磨物を保持するための少なくとも1つの前記保持穴を形成する工程、
前記金属板と同じ厚みを有する樹脂積層体からなる環状の部材を、前記保持穴内に嵌合させる工程、
2枚の樹脂付基材を用意し、前記樹脂付基材のそれぞれに、前記金属板の保持穴に対応する位置に前記環状の部材の内径と同じ内径を有する貫通穴を形成する工程、
前記樹脂付基材を前記金属板の両面にそれぞれ圧着させる工程であって、2枚の前記樹脂付基材を、前記貫通穴と前記保持穴とが重なるように前記金属板の両面に配置し、前記環状の部材が2枚の前記樹脂付基材によって挟まれた状態で、前記金属板と2枚の前記樹脂付基材とを加熱加圧プレスを行い、前記樹脂付基材を前記金属板の両面にそれぞれ圧着させる工程、
前記保持穴内に嵌合されている前記環状の部材を切削加工する工程であって、2枚の前記樹脂付基材と共に前記環状の部材を切削加工し、前記環状の部材の内径を広げて環状の緩衝部材を形成する工程、および、
2枚の前記樹脂付基材が圧着された状態の前記金属板の外周を円形に加工し、前記外周にギヤ加工を施す工程、を含み、
前記研摩用キャリアプレートは、前記保持穴内に嵌合された前記環状の緩衝部材が2枚の前記樹脂付基材によって挟まれた状態で固定されていることを特徴とする、研摩用キャリアプレートの製造方法。
A method of manufacturing a carrier plate for polishing, comprising a metal plate coated on both sides with a resin-coated base material, and holding holes for holding an object to be polished,
Forming at least one holding hole for holding an object to be polished in a metal plate;
A step of fitting an annular member made of a resin laminate having the same thickness as the metal plate into the holding hole;
Preparing two bases with resin and forming through holes having the same inner diameter as the inner diameter of the annular member at positions corresponding to the holding holes of the metal plate in each of the bases with resin;
The step of pressure-bonding the resin-attached base material to both surfaces of the metal plate, wherein the two resin-attached base materials are arranged on both surfaces of the metal plate so that the through hole and the holding hole overlap. In the state where the annular member is sandwiched between the two substrates with resin, the metal plate and the two substrates with resin are heated and pressed, and the substrate with resin is converted into the metal. The step of crimping each side of the plate,
A step of cutting the annular member fitted in the holding hole, wherein the annular member is cut together with the two substrates with resin, and the inner diameter of the annular member is widened to form an annular shape. Forming a cushioning member, and
Processing the outer periphery of the metal plate in a state in which the two substrates with resin are pressure-bonded into a circular shape, and performing gear processing on the outer periphery,
The polishing carrier plate is characterized in that the annular cushioning member fitted in the holding hole is fixed in a state of being sandwiched between two substrates with resin. Production method.
基材に樹脂ワニスを塗布し、乾燥させることにより、2枚の前記樹脂付基材を形成することを特徴とする請求項1に記載の研磨用キャリアプレートの製造方法。   2. The method for producing a polishing carrier plate according to claim 1, wherein two substrates with resin are formed by applying a resin varnish to a substrate and drying the substrate. 基材に樹脂ワニスを塗布し、乾燥させて2枚の樹脂付基材を形成し、その後、前記2枚の樹脂付基材を重ねて加熱加圧プレスすることにより、樹脂積層体を形成し、前記樹脂積層体を加工して、前記環状の部材を形成することを特徴とする請求項1又は2に記載の研磨用キャリアプレートの製造方法。   A resin varnish is applied to the substrate and dried to form two substrates with resin, and then the two substrates with resin are stacked and heated and pressed to form a resin laminate. The method for producing a polishing carrier plate according to claim 1, wherein the annular member is formed by processing the resin laminate. 被研磨物を保持するための保持穴が設けられた研磨用キャリアプレートであって、
金属板、および、前記金属板の両面に圧着された樹脂付基材からなり、外周にギヤが形成された円形を有し、
前記金属板には少なくとも1つの保持穴が形成され、
前記保持穴の内周に樹脂積層体からなる環状の部材から形成された環状の緩衝部材が取り付けられており、
前記樹脂付基材には、前記環状の緩衝部材の内径と同径の貫通穴が設けられており、前記環状の緩衝部材は2枚の前記樹脂付基材と圧着固定されていることにより、前記保持穴内に固定されていることを特徴とする研磨用キャリアプレート。
A polishing carrier plate provided with a holding hole for holding an object to be polished,
A metal plate, and a base with a resin that is pressure-bonded to both surfaces of the metal plate, and having a circular shape with gears formed on the outer periphery;
At least one holding hole is formed in the metal plate,
An annular buffer member formed from an annular member made of a resin laminate is attached to the inner periphery of the holding hole,
The resin-coated base material is provided with a through hole having the same diameter as the inner diameter of the annular buffer member, and the annular buffer member is fixed by pressure bonding to the two resin-coated base materials. A polishing carrier plate fixed in the holding hole.
前記環状の緩衝部材は、樹脂付基材からなる樹脂積層体で形成されていることを特徴とする請求項4に記載の研磨用キャリアプレート。   The polishing carrier plate according to claim 4, wherein the annular buffer member is formed of a resin laminate made of a base material with resin.
JP2018084103A 2018-04-25 2018-04-25 Method for production of polishing carrier plate and polishing carrier plate Pending JP2019188529A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7506394B2 (en) 2020-04-13 2024-06-26 相模ピーシーアイ株式会社 Manufacturing method of laminate temporary carrier

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7506394B2 (en) 2020-04-13 2024-06-26 相模ピーシーアイ株式会社 Manufacturing method of laminate temporary carrier

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