JP2019174754A - Exposure apparatus - Google Patents

Abstract

To provide an exposure apparatus having an RtoR transfer system reducing an installation space.SOLUTION: In an exposure apparatus 10' having an RtoR transfer system, there are arranged support rollers 24, 34 and tension measuring rollers 37, 39 that constitute the RtoR transfer system, as well as supply reels 22A, 22B, take-up reels 32A, 32B, a substrate supply device 20, a substrate take-up device 30, and a roller support device 55 in a space below an exposure surface EH of an exposure stage 15.SELECTED DRAWING: Figure 6

Description

  The present invention relates to an exposure apparatus that transports a long substrate (workpiece) such as a flexible printed circuit board by a roll-to-roll carrier system (hereinafter referred to as an RtoR transport system).

  In an exposure apparatus equipped with an RtoR transport system, a supply reel (winding roll) is disposed on the upstream side of the exposure stage, and a winding reel (winding roll) is disposed on the downstream side to supply a long substrate such as a printed wiring board. After winding around the reel and the take-up reel, exposure is performed while transporting from the upstream side to the downstream side.

  Specifically, while moving the exposure stage that adsorbs and supports the back surface of the long substrate along the long substrate conveyance direction, the exposure head placed above the long substrate is moved to the position of the projection area (exposure target area). The corresponding pattern light is projected. When the exposure stage moves to the exposure completion position, the exposure stage descends and returns to the initial exposure position. By repeating the same exposure operation, a pattern is formed on the entire long substrate (see, for example, Patent Documents 1 and 2).

JP2015-222370A JP 2009-276522 A

  An exposure apparatus provided with an RtoR transport system requires a space in the substrate feed direction due to the structure of the transport system. This is because a large number of rollers, such as a guide roller, a dancer roller, and a nip roller, need to be arranged for tension maintenance and substrate support. However, it is extremely difficult to secure a large space for the exposure apparatus installed in the printed wiring board production line, and it is extremely difficult for the space of the entire production line that is physically limited, and the production efficiency of the whole line. Reduce.

  Therefore, it is required to construct an exposure apparatus of an RtoR transport system that reduces installation space.

  The exposure apparatus of the present invention supports at least one long substrate and is positioned opposite to the exposure stage that can reciprocate along the substrate transfer line and the exposure stage, and transfers at least one long substrate. A reel pair and a plurality of rollers in contact with the long substrate are provided.

  A plurality of rollers are arranged in a space below the exposure surface of the exposure stage. Here, “below the exposure surface” represents the opposite side of the exposure surface from the side where the exposure optical system and the exposure part are located. The height of the plurality of rollers is the height within the space below the exposure surface.

  The plurality of rollers include, for example, a tension measurement roller that measures the tension of the long substrate, a support roller that is disposed near both ends of the exposure stage, and a tension measurement roller that measures the tension of the long substrate.

  The reel pair can reciprocate along the substrate transfer line together with the exposure stage. Further, the reel pair can be arranged in a space below the exposure surface of the exposure stage. Further, the substrate supply / winding device for driving the reel pair can also be arranged in a space below the exposure surface of the exposure stage.

  The long substrate can be composed of a plurality of parallel long substrates, and the reel pair can be composed of a plurality of reel pairs carrying a plurality of long substrates. The plurality of reel pairs can be arranged at different positions with respect to the substrate transport line.

  A plurality of substrate supply / winding devices that drive each of the plurality of reel pairs can be provided, and a reel pair having a relatively long distance between reels supplies a plurality of substrates than a reel pair having a relatively short distance between reels. -It can be placed near the winding part. The plurality of reel pairs can be arranged so that the heights in the vertical direction are the same.

  According to the present invention, it is possible to configure an exposure apparatus of an RtoR transport system with reduced installation space.

It is a schematic block diagram of the exposure apparatus which is this embodiment. It is the perspective view which showed a part of exposure apparatus typically. It is a schematic block diagram of an exposure apparatus. It is the figure which showed the position of the exposure stage and conveyance system at the time of the exposure start and completion of exposure. It is a schematic perspective view of the exposure apparatus which is 2nd Embodiment. It is a schematic plan view of the exposure apparatus which is 2nd Embodiment. It is a schematic perspective view of the exposure apparatus which is 3rd Embodiment.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  FIG. 1 is a schematic block diagram of an exposure apparatus according to this embodiment. FIG. 2 is a perspective view schematically showing a part of the exposure apparatus. FIG. 3 is a schematic block diagram of the exposure apparatus.

  The exposure apparatus 10 is an exposure apparatus that includes an RtoR transport system that performs an exposure operation while transporting a long substrate W wound in a roll shape, and includes a substrate supply device 20, a substrate winding device 30, and an exposure unit 40. . Here, the long substrate W is formed in a roll shape by winding a long sheet-like substrate on which a copper thin film layer is formed on a long film and a photosensitive material such as a photoresist is applied (or pasted). Has been. As shown in FIG. 2, the long substrate W is composed of two (a pair of) substrates W1 and W2 having the same width.

  The exposure stage (table) 15 sucks and holds the back surface of the long substrate W flat, and can move up and down in the Z direction between the back surface suction position and a predetermined separation position away from the back surface. It is moved up and down by the lifting mechanism. The exposure stage 15 is supported by a stage moving mechanism 50 as described later, and is movable along the X direction. In the following, the direction along the transport direction (transport line) M of the long substrate W is “X”, the direction perpendicular to the transport direction M (substrate width direction) is “Y”, and is perpendicular to X and Y. The direction (vertical direction) is represented by “Z”.

  The exposure unit 40 is disposed at a predetermined distance from the long substrates W1 and W2 in the Z direction, and is fixed to a base (base) 10B via a frame (not shown). As shown in FIG. 3, the exposure unit 40 includes a light source 41 such as a semiconductor laser, an illumination optical system 42, a DMD (Digital Micro-mirror Device) 43 in which a plurality of micromirrors are arranged in a matrix, and an imaging optical system. Each of the exposure heads is defined with an exposure area along the transport direction M. The light source 41 is driven by the light source control unit 110.

  The DMD of each exposure head positions the micromirror based on the drawing data (raster data) corresponding to the exposure area position sent from the exposure control unit 120, whereby the pattern light is sent to the long substrates W1 and W2. Projected on. By switching the orientation of the micromirrors according to the relative movement of the long substrates W1 and W2 with respect to the exposure unit 40, the photosensitive materials of the long substrates W1 and W2 are exposed (multiple exposure, etc.), thereby forming a pattern. Is done. The controller 100 (see FIG. 3) controls the entire exposure operation of the exposure apparatus 10. It is also possible to configure the exposure unit using a mask.

  The substrate supply apparatus 20 includes supply reels 22A and 22B disposed on the upstream side of the exposure stage 15, a support roller 24, and a drive mechanism (not shown) that rotates the supply reels 22A and 22B. The drive mechanism is composed of, for example, a stepping motor. The supply reels 22A and 22B that are cantilevered by the substrate supply device 20 hold and fix the unexposed portions of the long substrates W1 and W2 in a roll shape, respectively, and rotate the shaft downstream. The long substrate W can be sent out toward the head. The supply reels 22A and 22B when viewed from the exposure stage 15 are “upstream” and the take-up reels 32A and 32B are “downstream”.

  The substrate take-up device 30 includes take-up reels 32A and 32B and a support roller 34 disposed on the downstream side of the exposure stage 15, and a drive mechanism (not shown) that rotates the take-up reels 32A and 32B. Yes. The take-up reels 32A and 32B hold and fix the exposed portions of the long substrates W1 and W2 in a rolled state, and can wind the long substrates W1 and W2 by rotating the shaft. it can. The winding processing of the long substrates W1 and W2 by the substrate supply device 20 and the substrate winding device 30 is controlled by the transport control unit 130 (see FIG. 3).

  Support rollers 24 and 34 disposed between the supply reels 22A and 22B, the take-up reels 32A and 32B and the exposure stage 15 support the long substrates W1 and W2, respectively, and the long substrates W1 and W2 are conveyed. It is configured as a free roller that rotates around its axis. The support rollers 24 and 34 are adjusted in height so that the long substrates W1 and W2 move downstream at a position slightly lower than the exposure surface height or the exposure surface height, respectively. Cantilevered by the substrate winding device 30. The long substrates W1 and W2 are moderately tensioned in the span of the section T (see FIG. 1) of the support rollers 24 and 34, and the long substrates W1 and W2 are transported without any wrinkles or elongation. It will be done.

  The supply reels 22A and 22B and the take-up reels 32A and 32B include known drive mechanisms 26A and 26B, and 36A and 36B that fix the roll-shaped winding portions of the long substrates W1 and W2 when the substrates are mounted. Further, the drive mechanisms of the substrate supply device 20 and the substrate take-up device 30 respectively rotate the supply reel 22A and the take-up reel 32A, the supply reel 22B and the take-up reel 32B in synchronization with each other, so that the long substrates W1 and W2 are predetermined. The length is intermittently conveyed.

  The stage moving mechanism 50 includes a moving member 52 equipped with an elevating mechanism (not shown) that cantilever-supports the exposure stage 15, a pair of guide rails 54 </ b> A, 54 </ b> B, and an actuator 55 installed on the base 10 </ b> B. The pair of guide rails 54A and 54B extend along the X direction, and the moving member 52 is movable along the guide rails 54A and 54B in the X direction and vice versa. The actuator 55 is configured by a ball screw, for example.

  The transport unit moving mechanism 60 includes a plate-shaped moving member 62, a pair of guide rails 64A and 64B, and an actuator 65 installed on the base 10B. The substrate supply device 20 and the substrate winding device 30 are mounted on the moving member 62 and move together (interlock). The pair of guide rails 64A and 64B extend along the X direction, and the moving member 62 is movable along the guide rails 64A and 64B in the X direction and vice versa.

  The movement control unit 70 provided in the base 10B controls the driving of the actuators 55 and 65, and maintains the relative positional relationship between the transport system (the substrate supply device 20 and the substrate winding device 30) and the exposure stage 15. In other words, the movement of the exposure stage 15, the substrate supply device 20, and the substrate winding device 30 is feedback controlled so that the relative distance interval is constant.

  The relative distance between the exposure stage 15 and the substrate supply device 20 (substrate winding device 30) in the transport direction M is maintained by synchronous control of servo motors built in the actuators 55 and 65. Further, in order to monitor the relative distance interval, a position detection photo sensor 90 is disposed on the side surface of the substrate supply apparatus 20 facing the exposure stage 15 (see FIG. 2). The position detection photosensor 90 incorporates a light source such as an LED and irradiates the side surface of the exposure stage 15. The side surface of the exposure stage 15 is formed such that a light amount difference occurs between the light irradiation position between the reference position and the other position. The movement control unit 70 monitors whether an appropriate relative distance interval is maintained depending on the detected light amount during the movement of the exposure stage 15 and the substrate supply apparatus 20.

  On the support roller 24 side of the exposure stage 15, a position sensor 80 for detecting the end face positions of the long substrates W1 and W2 is provided. The position sensor 80 can be configured by a transmissive photosensor such as a line sensor, for example. The substrate supply unit 20 and the substrate take-up device 30 include a mechanism (not shown) for controlling the axial positions of the supply reels 22A and 22B and the take-up reels 32A and 32B, respectively, and according to the detected end face position. Thus, it is possible to correct the meandering traveling by adjusting the reel axial direction position.

  FIG. 4 is a diagram showing the positions of the exposure stage and the transport system at the start of exposure and at the completion of exposure.

  Before the start of exposure, the exposure stage 15 sucks and holds the long substrates W1 and W2, and the supply reels 22A and 22B and the take-up reels 32A and 32B are in a stationary state because they are not driven. As the exposure starts, the exposure stage 15 moves at a predetermined speed along the X direction. At this time, the substrate supply device 20 and the substrate take-up device 30 move in accordance with the movement of the exposure stage 15.

  That is, the movement starts in synchronization with the exposure stage 15 and moves in the X direction at the same speed as the exposure stage 15 so as to maintain the relative positional relationship between the substrate supply apparatus 20 and the substrate winding apparatus 30 and the exposure stage 15. Go (run in parallel). Accordingly, the long substrates W1 and W2 are not sent to the downstream side before the exposure stage 15 is moved and during the movement of the exposure stage 15, but are stationary with respect to the exposure stage 15. During the movement of the exposure stage 15, pattern light corresponding to the exposure area position of each exposure head is projected from the exposure unit 40.

  When the exposure stage 15, the substrate supply device 20, and the substrate take-up device 30 reach the exposure completion position, the exposure stage 15 releases the suction support of the long substrates W1 and W2 and descends. Then, the supply reels 22A and 22B and the take-up reels 32A and 32B rotate synchronously, and the long substrates W1 and W2 are taken up by the take-up reels 32A and 32B by a predetermined length.

  When the winding to the take-up reels 32A and 32B is completed, the exposure stage 15, the substrate supply device 20, and the substrate take-up device 30 move synchronously and return to the exposure start position. During this time, the supply reels 22A and 22B and the take-up reels 32A and 32B are in a stationary state because they are not driven. By repeating the exposure operation described above, a pattern is formed on the entire long substrates W1 and W2.

  As described above, according to the present embodiment, the substrate supply for holding the supply reels 22A and 22B provided on the upstream side of the exposure stage 15 in the exposure apparatus 10 including the RtoR transport system for transporting the long substrates W1 and W2. An apparatus 20 and a substrate winding apparatus 30 that holds the winding reels 32A and 32B provided on the downstream side are provided. During the exposure operation, the exposure stage 15 is moved in the X direction by the stage moving mechanism 50, and at the same time, the substrate supply device 20 and the substrate winding device 30 are moved together in the X direction by the transport unit moving mechanism 60.

  Since the substrate transport system (the substrate supply device 20 and the substrate take-up device 30) moves together with the exposure stage 15, the long substrates W1 and W2 are not sent downstream before the exposure stage 15 starts moving and during the movement. . Therefore, the meandering traveling during exposure as in the conventional transport system is suppressed, and the exposure position shift due to the meandering traveling or the warp of the substrate does not occur. Further, by configuring such a substrate transport system, it is not necessary to provide a mechanism such as a dancer roller, and the substrate transport system can be constructed with a simple configuration.

  The substrate supply device 20 and the substrate take-up device 30 only have to send out the long substrate W only in one downstream direction during exposure, and there is no need to perform rewinding. Therefore, it is possible to realize pattern exposure while suppressing the meandering of the long substrate W. In particular, it is suitable for an exposure apparatus that transports two long substrates W1 and W2 that are difficult to meander.

  Since the substrate transport system moves, the substrate transport length (the substrate length between the supply reels 22A and 22B and the take-up reels 32A and 32B) can be shortened. By shortening the substrate transport length, wrinkles and elongation of the long substrates W1 and W2 hardly occur, and a pattern can be formed with high accuracy. In particular, a transport system that feeds out the long substrates W1 and W2 can be configured only by providing one support roller 24 and.

  Further, after the exposure operation is completed, since the long substrates W1 and W2 are sent out and wound downstream while the exposure stage 15 does not suck and support the long substrates W1 and W2, the winding can be performed smoothly. . At this time, since the substrate conveyance length is short, winding in a short time is possible.

  In the present embodiment, the exposure stage 15 and the substrate transport system (the substrate supply device 20 and the substrate winding device 30) are driven separately by the stage moving mechanism 50 and the transport unit moving mechanism 60, respectively. Regarding the long substrates W1 and W2, the winding diameters of the roll-shaped portions of the supply reels 22A and 22B and the roll-shaped portions of the take-up reels 32A and 32B are the same as those of the long substrates W1 and W2. The weight balance does not become constant because it changes gradually in the process of being done.

  However, by providing the transfer unit moving mechanism 60 different from the stage moving mechanism 50, the movement control of the exposure stage 15 is not affected even if the weight balance of the long substrates W1 and W2 changes. In addition, it is possible to construct a transfer system while using a conventional stage moving mechanism.

  On the other hand, the substrate supply device 20 and the substrate winding device 30 are fixedly supported by the same moving member 62 and move together. Since the substrate supply device 20 and the substrate take-up device 30 are interlocked, the relative positional relationship does not change between the substrate supply device 20 and the substrate take-up device 30, and the relative maintenance relationship with the exposure stage 15 is maintained. It becomes easy to make. In addition, the transport unit moving mechanism 60 can be combined with one drive system.

  On the other hand, the movement control unit 70 drives and controls the actuators 55 and 65 so as to maintain the relative positional relationship between the exposure stage 15 and the substrate supply device 20 and the substrate winding device 30 while the exposure stage 15 is moving. Yes. As a result, the supply reels 22A and 22B and the take-up reels 32A and 32B approach the exposure stage 15 to prevent the long substrates W1 and W2 from being stretched and warped, and to prevent the exposure position from shifting.

  Note that the movement control unit 70 may control the movement speed and acceleration when the distance interval is equal to or greater than the threshold value. Alternatively, the supply reels 22A and 22B and / or the take-up reels 32A and 32B may be controlled to be rotated so that appropriate tension is applied to the long substrates W1 and W2.

  Not only the two long substrates W1 and W2, but also a larger number of a plurality of long substrates can be transferred in parallel and can be constituted by a single long substrate. The substrate supply device 20 and the substrate winding device 30 may be moved by separate moving mechanisms without being mechanically connected. Further, the exposure stage 15, the substrate supply device 20, and the substrate winding device 30 may be moved by the same moving mechanism.

  In the above embodiment, the substrate supply device 20 is provided on the upstream side of the exposure stage 15 and the substrate take-up device 30 is provided on the downstream side, and the supply reels 22A and 22B are moved so as to move the long substrates W1 and W2 in the same direction. Although the take-up reels 32A and 32B are driven, the long substrates W1 and W2 may be moved in opposite directions.

  That is, two pairs of reels are provided on both sides of the exposure stage 15, and a supply reel and a take-up reel are installed so that one reel pair is wound in the X direction, while the other reel pair is directed in the -X direction. It is possible to provide a supply reel and a take-up reel so as to be wound. In this case, a pair of transfer devices that combine the functions of the substrate supply device and the substrate take-up device are moved with respect to the exposure stage. If the long substrates W1 and W2 are moved in the opposite directions as described above, it is possible to reduce the change in the weight balance of the long substrates on the upstream side and the downstream side of the exposure stage.

  In the above embodiment, the exposure stage 15 is moved to realize the relative movement between the long substrates W1 and W2 and the exposure unit 40, and the exposure is performed. However, the exposure stage 15 is fixed to the base 10B, and the exposure is performed. The unit 40 may be moved relative to the substrate by moving it in the substrate transfer direction by a moving device (not shown). In that case, the substrate supply device 20 and the substrate winding device 30 are fixed to the base 10 </ b> B so as to maintain a relative positional relationship with the exposure stage 15.

  Next, a second embodiment will be described with reference to FIGS. In the second embodiment, the RtoR transport system is arranged below the exposure surface of the exposure stage. In addition, a tension roller is provided to apply tension to the long substrate when the exposure stage, the substrate supply device, and the substrate take-up device are moving. Also in the first embodiment, the RtoR transport system is arranged below the exposure surface of the exposure stage.

  FIG. 5 is a schematic perspective view of an exposure apparatus according to the second embodiment. FIG. 6 is a schematic plan view of the exposure apparatus. In addition, the board | substrate conveyance direction of 2nd Embodiment is the reverse direction of the conveyance direction of 1st Embodiment, and the arrangement | positioning location of a board | substrate supply apparatus and a board | substrate winding apparatus is also reverse to 1st Embodiment. Yes. The same reference numerals as those in the first embodiment are used for the same components.

  As in the first embodiment, the exposure apparatus 10 ′ includes a substrate supply device 20 and a substrate take-up device 30, and supply reels 22 A and 22 B and take-up reels 32 A and 32 B, respectively. On the other hand, support rollers 24 and 34 that are configured as free rollers and are arranged near both ends of the exposure stage 15 are supported by a roller support device 55 provided between the substrate supply device 20 and the substrate winding device 30. Yes.

  The substrate supply device 20 (20A, 20B), the substrate winding device 30 (30A, 30B), and the roller support device 55 can be moved in the transport direction M (X direction) and vice versa by the transport unit moving mechanism 60. The exposure stage 15 can be moved in the transport direction M and the opposite direction by the stage moving mechanism 50. The substrate supply device 20, the substrate take-up device 30, and the roller support device 55 are exposed in the same manner as in the first embodiment. It can move in synchronization with the stage 15.

  In the second embodiment, a tension roller 36, a tension measurement roller 37, and a tension measurement roller 39 are provided in addition to the support rollers 24 and 34 as rollers in contact with the long substrates W1 and W2. The tension roller 36 is a free roller and is supported by the roller support device 55.

  The tension measuring roller 39 is supported by a roller support device 30C, and includes two free rollers 39A and 39B. The long substrate W2 is wound in a state of being sandwiched between two free rollers 39A and 39B. The tension measuring roller 37 is a free roller and is supported by a roller support device 55. The tension measuring rollers 37 and 39 measure the tension of the long substrates W1 and W2 by a known tension measuring method such as a load cell.

  As shown in FIG. 6, the exposure unit 40 is set on a gantry 45 having four legs 46A to 46D. However, the gantry 45 is not shown in FIG. The distance between the legs 46A, 46C (legs 46B, 46D) of the gantry 45 is determined so that the long substrates W1, W2 and the RtoR transport system can pass through the internal space SJ of the gantry 45.

  On the other hand, since the work distance (WD) of the exposure optical system is set to a very short distance interval (for example, about several tens of millimeters), the height of the gantry 45 is set to greatly exceed the height of the exposure stage 15. I can't. Therefore, the exposure stage 15 passes immediately next to the inner surface of the gantry 45.

  In the present embodiment, the support rollers 24 and 34 and the tension measuring rollers 37 and 39, and the supply reels 22A and 22B and the take-up reels 32A and 32B constituting the RtoR transport system are all below the exposure surface EH of the exposure stage 15 ( That is, it is arranged in a space on the opposite side of the exposure unit 40 with respect to the exposure surface EH. In other words, the members constituting the RtoR transport system do not substantially exceed (even partly) the exposure surface EH.

  This indicates that the upper surface of the RoR transport system involved in transport of the long substrates W1 and W2 is flat. Therefore, the support rollers 24 and 34 and the tension measurement rollers 37 and 39 can move to the internal space SJ without hitting the gantry 45. The same applies to the substrate supply device 20, the substrate winding device 30, and the roller support device 55.

  Since the RtoR transport system is disposed below the exposure surface EH, the supply reels 22A and 22B are disposed near the gantry 45 so that appropriate tension is applied to the long substrates W1 and W2. The take-up reels 32A and 32B are also arranged as close to the gantry 45 as possible, including the tension roller 36 and the tension measuring rollers 37 and 39.

  On the other hand, in order to apply appropriate tension to the long substrates W1 and W2, the supply reels 22A and 22B and the take-up reels 32A and 32B are driven independently. On the other hand, the transport unit moving mechanism 60 is disposed only on one side surface of the long substrates W1 and W2, and the supply reels 22A and 22B and the take-up reels 32A and 32B are cantilevered.

  Therefore, the supply reels 22A and 22B and the take-up reels 32A and 32B are arranged at different positions with respect to the substrate transport direction M, respectively. On the other hand, the vertical heights of the supply reel 22A and the take-up reel 32A and the supply reel 22B are easily applied to the long substrates W1 and W2 and the vertical width of the RtoR transport system is suppressed. The arrangement is set so that the vertical heights of the take-up reels 32B are equal.

  The long substrate W2 is further away from the substrate supply device 20 and the substrate winding device 30 than the long substrate W1, and the length of the supply reel 22B and the take-up reel 32B is longer than the length of the supply reel 22A and the take-up reel 32A. The roll-shaped long substrate W2 is supported at a position away from the substrate supply device 20 and the substrate winding device 30. Therefore, the long substrate W2 is likely to meander between the supply reel 22B and the take-up reel 32B.

  In order to prevent this, the RtoR transport system is configured such that the distance between the supply reel 22B and the take-up reel 32B is shorter than the distance between the supply reel 22A and the take-up reel 32A. That is, the supply reel 22A and the take-up reel 32A that support the roll-shaped long substrate W1 at a place closer to the substrate supply device 20 and the substrate take-up device 30 are more exposed from the exposure unit 40 than the supply reel 22B and the take-up reel 32B. Located on the outside.

  As described above, according to the second embodiment, in the exposure apparatus 10 ′ equipped with the RtoR transport system, the support rollers 24 and 34 and the tension measuring rollers 37 and 39 that constitute the RtoR transport system, and the supply reels 22A and 22B, The take-up reels 32A and 32B, the substrate supply device 20, the substrate take-up device 30, and the roller support device 55 are arranged in a space below the exposure surface EH of the exposure stage 15.

  Thereby, the apparatus size along the board | substrate conveyance direction M of a RtoR conveyance system can be made small. That is, the RtoR transport system in which the installation space is disposed below the exposure surface inevitably omits the nip roller and the dancer roller, and the apparatus size along the substrate transport direction can be made compact. Note that this embodiment is also effective for a conventional RtoR transport system in which the RtoR transport system does not move with the exposure stage 15.

  In the RtoR transport system, the number of rollers in contact with the surfaces of the long substrates W1 and W2 in the roller group is smaller than that in the conventional transport system. Thereby, it can suppress that the substrate surface in which a pattern is formed is damaged. In particular, it is effective for solder resist exposure.

  Furthermore, in the second embodiment, the configuration in which the tension roller 36 is provided makes it possible to continue to apply an appropriate tension to the long substrates W1 and W2 even during the movement period. Hereinafter, the operation of the tension roller 36 and the driving of the supply reels 22A and 22B and the take-up reels 32A and 32B will be described.

  The tension roller 36 is a roller that applies tension to the long substrates W1 and W2. The tension roller 36 is in contact with the surface of the long substrates W1 and W2 and is supported by the roller support device 55 in a state in which the position of the other substrates can be changed. Yes. The tension roller 36 is an eccentric roller and is supported so as to be able to swing.

  Drive mechanisms 21A and 21B for driving the supply reels 22A and 22B are provided in the substrate supply apparatuses 20A and 20B, respectively. The drive mechanisms 21A and 21B include a one-way clutch mechanism and operate so as to continuously apply the torque T only in the direction opposite to the substrate transport direction M. The torque T is weaker than the suction force of the exposure stage 15 on the long substrates W1 and W2. For example, the drive mechanisms 21A and 21B include a powder clutch, and control the powder clutch according to the tension measured by the tension measuring rollers 37 and 39.

  On the other hand, the drive mechanisms 31A and 31B of the take-up reels 32A and 32B provided in the substrate take-up devices 30A and 30B are constituted by servo motor mechanisms. The drive mechanisms 31A and 31B may adjust the amount of torque at the time of winding in accordance with the tension measured by the tension measuring rollers 37 and 39.

  As described above, the transport unit moving mechanism 60 and the stage moving mechanism 50 are configured separately, and the RtoR transport system moves in synchronization with the exposure stage 15. For this reason, a synchronization error occurs due to a control problem during movement. That is, the exposure stage 15 moves faster than the RtoR transport system or is delayed. When the synchronization shift occurs, the long substrates W1 and W2 are bent or stretched. In order to prevent this, the position of the tension roller 36 is changed so that tension is applied to the long substrates W1 and W2.

  The tension roller 36 is restricted from moving vertically upward by contacting a regulating member (not shown). In a state where the exposure stage 15 is not attracting the long substrates W1 and W2, torque is applied to the supply reels 22A and 22B in the direction opposite to the supply side, so that the surface contacts the long substrates W1 and W2. The tension roller 36 is urged in the vertical direction and maintains a state in contact with the regulating member. The long substrates W1 and W2 are in a state where an appropriate tension is applied between the support rollers 24 and. While the exposure stage 15 sucks and moves the long substrates W1 and W2, a state in which a tension is applied is similarly maintained.

  On the other hand, when the RtoR transport system is delayed from the exposure stage 15 due to synchronization shift, that is, when the exposure stage 15 approaches the RtoR transport system, the exposure stage 15 moves while adsorbing the long substrates W1 and W2. The long substrates W1 and W2 are about to bend. At this time, the tension roller 36 swings and fluctuates from the upper limit position. As a result, the long substrates W1 and W2 are moderately tensioned without being bent.

  On the other hand, when the RtoR transport system advances from the exposure stage 15 due to the synchronization shift, that is, when the exposure stage 15 moves away from the RtoR transport system, the drive mechanisms 21A and 21B are connected to the supply reels 22A and 22B. Since the torque T is applied in the direction opposite to the delivery direction, the long substrates W1 and W2 do not bend between the support roller 24 and the supply reels 22A and 22B, and an appropriate tension is maintained.

  On the other hand, by providing the tension roller 36, the inclination of the long substrates W1 and W2 between the tension roller 36 and the tension measuring roller 39 is loosened. For this reason, the long substrates W1 and W2 are sandwiched between the rollers 39A and 39B so as to form an angle so that accurate tension can be measured.

  As described above, according to the second embodiment, in the exposure apparatus 10 ′ in which the RtoR transport system is movable along the substrate transport direction M together with the exposure stage 15, the tension roller 36 is provided on the downstream side of the exposure stage 15. Yes. During the movement of the RtoR transport system, the tension roller 36 changes its position with respect to the other rollers, and applies tension so as to suppress the bending of the long substrates W1 and W2.

  In many cases, moving the RtoR transport system requires a driving force rather than moving the exposure stage 15. Therefore, a synchronization shift is likely to occur when the exposure stage 15 approaches the RtoR transport system. Therefore, by placing the tension roller 36 on the downstream side of the exposure stage 15, it is possible to effectively apply tension.

  In addition, the drive mechanisms 21A and 21B continue to apply torque to the supply reels 22A and 22B only in the direction opposite to the substrate transport direction, so that the tension roller can be synchronized without being provided upstream of the exposure stage 15. Tension can be applied when slipping.

  Further, the tension roller 36 swings due to the configuration of the eccentric roller, and moves with isochronism. This makes it easy to keep the tension moderately applied. The tension roller 36 is disposed so as to straddle the long substrates W1 and W2, so that the same tension can be applied to the long substrates W1 and W2.

  Note that the tension roller 36 does not have to be an eccentric roller, and the position may vary along the vertical direction. Further, a tension roller may be provided on the upstream side, and the present invention can also be applied to a moving mechanism in which the stage moving mechanism 50 and the transport unit moving mechanism 60 are integrated.

  Next, a third embodiment will be described with reference to FIG. In the third embodiment, the transport unit moving mechanism is provided outside the gantry that supports the exposure unit.

  FIG. 7 is a schematic perspective view of an exposure apparatus according to the third embodiment.

  The exposure apparatus 10 ″ drives the supply reels 22A and 22B, drives a pair of substrate supply devices 120X and 120Y opposed to each other, drives the take-up reels 32A and 32B, and forms a pair of substrate winding devices 130X that are arranged opposite to each other. The transfer unit moving mechanism 60 includes a pair of transfer unit moving mechanisms 60X and 60Y arranged in parallel with the substrate transfer direction M outside the gantry 45 of the exposure unit 40.

  Substrate supply devices 120A1 and 120A2 respectively disposed on the pair of transport unit moving mechanisms 60X and 60Y support the supply reel 22A from both sides. The shaft portion of the supply reel 22A has a length corresponding to the distance between the substrate supply devices 120A1 and 120A2. The supply reel 22B is also supported from both sides by the substrate supply devices 120B1 and 120B2.

  Similarly, the substrate winding devices 130B1 and 130B2 disposed in the pair of transport unit moving mechanisms 60X and 60Y support the take-up reel 32B from both sides, and the substrate winding devices disposed in the transport unit moving mechanisms 60X and 60Y, respectively. The take-up devices 130A1 and 130A2 support the take-up reel 32A from both sides. The transport unit moving mechanism 60X is movable along the guide rail 61X in the substrate transport direction M and its reverse direction, and the transport unit moving mechanism 60Y is moved along the guide rail 61Y in the substrate transport direction M and its reverse direction. Is possible.

  The transport unit moving mechanisms 60X and 60Y move in synchronization with each other. As a result, as in the first and second embodiments, the RtoR transport system can move in the substrate transport direction M together with the exposure stage 15. However, since the guide rails 61X and 61Y are arranged around the gantry 45, the movement range is limited so that the supply reel 22B and the take-up reel 32B do not contact the gantry 45. The support rollers 24 and 34 are attached to the exposure stage 15 here.

  By adopting a configuration in which the transport unit moving mechanisms 60X and 60Y do not pass under the gantry 45, vibrations are transmitted to the exposure unit 40 when the transport unit moving mechanisms 60X and 60Y operate, thereby suppressing the pattern exposure from being affected. can do. Further, the space of the internal space SJ of the gantry 45 is secured, and a large number of long substrates such as three or four can be transported.

  On the other hand, the substrate supply devices 120A1 and 120A2 can be moved by actuators 140A1 and 140A2, respectively, and the substrate supply devices 120B1 and 120B2 can be moved along the actuators 140B1 and 140B2, respectively. Similarly, the substrate winding devices 130A1 and 130A2 can move along the actuators 150A1 and 150A2, respectively, and the substrate supply devices 130B1 and 130B2 can move along the actuators 150B1 and 150B2, respectively.

  The supply-side actuators 140A1, 140A2, 140B1, 140B2, and the winding-side actuators 150A1, 150A2, 150B1, and 150B2 all move the substrate supply devices 120X and 120Y and the substrate winding devices 130X and 130Y in the substrate transport direction M. It is possible to move along a direction N (hereinafter referred to as a substrate conveyance orthogonal direction) N orthogonal. Also, any actuator can be constituted by a ball screw or the like.

  The substrate supply devices 120X and 120Y and the substrate winding devices 130X and 130Y move along the substrate conveyance orthogonal direction N in the same movement. In other words, the starting timing, moving speed, and stopping timing are the same. As a result, the RtoR transport system can be moved along the substrate transport orthogonal direction N as a whole.

  The exposure stage 15 can be moved by the stage moving mechanism 50 along the substrate transfer vertical direction N and its reverse direction. The substrate supply apparatuses 120X and 120Y and the substrate winding apparatuses 130X and 130Y can be moved in synchronization with the exposure stage 15 by the movement control unit 70.

  Since the RtoR transfer system can move together with the exposure stage 15 in the substrate transfer direction M and the substrate transfer orthogonal direction N, it is possible to perform multi-pass exposure on the long substrates W1 and W2. That is, similarly to exposure on a rectangular substrate, after exposing a scanning band along the substrate transport direction M, the exposure stage 15 can be moved in the substrate transport orthogonal direction N to expose the next scan band. Become.

  The size of the irradiation area (exposure area) at the time of exposure depends on the optical system of the exposure unit 40 and the exposure characteristics (light intensity, photosensitive amount, etc.), and it may not be possible to secure a size that matches the width of the long substrate used. is there. When the exposure area cannot cover the entire width of the long substrate, it is possible to form a pattern over the entire width of the long substrates W1 and W2 by performing multipass exposure.

  As described above, according to the third embodiment, in the exposure apparatus 10 ″ equipped with the RtoR transfer system, the transfer unit moving mechanisms 60X and 60Y are arranged outside the mount 45 of the exposure unit 40, and a pair of substrate supply apparatuses. 120X and 120Y and the pair of substrate winding apparatuses 130X and 130Y do not pass under the gantry 45. The substrate supply apparatuses 120X and 120Y and the substrate winding apparatuses 130X and 130Y move in the substrate transport orthogonal direction N in synchronization. Then, the RtoR transport system is moved along the substrate transport orthogonal direction N together with the exposure stage 15.

  Also in the second embodiment, it is possible to adopt a configuration in which the transport unit moving mechanism 60 is provided outside the gantry 45 and moved.

DESCRIPTION OF SYMBOLS 10 Exposure apparatus 15 Exposure stage 20 Substrate supply apparatus (substrate supply part)
22A, 22B Supply reel 26A, 26B Drive mechanism (supply side drive mechanism)
30 Substrate winding device (substrate winding unit)
32A, 32B Take-up reel 36 Tension roller 36A, 36B Drive mechanism (take-up side drive mechanism)
37 Tension Measuring Roller 39 Tension Measuring Roller 40 Exposure Unit 45 Base 50 Stage Moving Mechanism 60 Transporting Unit Moving Mechanism 70 Movement Control Unit 120X, 120Y Substrate Feeder 130X, 130Y Substrate Winder 140A1, 140A2 Actuator 140B1, 140B2 Actuator 150A1, 150A2 Actuator 150B1, 150B2 Actuator W1, W2 Long substrate

Claims (8)

An exposure stage that supports at least one long substrate and is capable of reciprocating along a substrate transfer line;
At least one pair of reels arranged opposite to each other with the exposure stage in between and carrying the long substrate;
A plurality of rollers in contact with the long substrate;
The exposure apparatus, wherein the plurality of rollers are arranged in a space below the exposure surface of the exposure stage.   The exposure apparatus according to claim 1, wherein the reel pair is capable of reciprocating along the substrate transfer line together with the exposure stage.   The exposure apparatus according to claim 2, wherein the reel pair is disposed in a space below the exposure surface of the exposure stage. A substrate supply / winding device for driving the reel pair;
4. The exposure apparatus according to claim 2, wherein the substrate supply / winding device is disposed in a space below the exposure surface of the exposure stage. The long substrate is composed of a plurality of parallel long substrates,
The reel pair is composed of a plurality of reel pairs that convey the plurality of long substrates,
5. The exposure apparatus according to claim 1, wherein the plurality of reel pairs are arranged at different positions with respect to the substrate transport line. A plurality of substrate supply / winding devices for driving each of the plurality of reel pairs;
4. The reel pair having a relatively long distance between reels is disposed closer to the plurality of substrate supply / winding units than a reel pair having a relatively short distance between reels. Exposure equipment.   The exposure apparatus according to claim 1, wherein the plurality of reel pairs are arranged so that the heights in the vertical direction are the same.   The plurality of rollers include a tension measuring roller that measures the tension of the long substrate, a support roller disposed near both ends of the exposure stage, and a tension measuring roller that measures the tension of the long substrate. An exposure apparatus according to claim 1, wherein:

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