JP2019145420A - Manufacturing method of battery electrode plate, and coating device - Google Patents
Manufacturing method of battery electrode plate, and coating device Download PDFInfo
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- JP2019145420A JP2019145420A JP2018030231A JP2018030231A JP2019145420A JP 2019145420 A JP2019145420 A JP 2019145420A JP 2018030231 A JP2018030231 A JP 2018030231A JP 2018030231 A JP2018030231 A JP 2018030231A JP 2019145420 A JP2019145420 A JP 2019145420A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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本発明は、電池極板の製造方法および塗工装置に関するものである。 The present invention relates to a battery electrode plate manufacturing method and a coating apparatus.
リチウムイオン二次電池などに用いられる電池極板は、供給ロールから巻取りロールまで搬送される板状の基材に対して、活物質、バインダー、増粘剤、溶媒を含んでなる塗工液を、ダイ先端から吐出することで、均一な厚みの塗膜を形成し、それらを乾燥させることで製造される。電池は、正極極板と負極極板の間にセパレータを挟み、巻回または積層させて缶内に電解液とともに封入させることにより、構成されている。 A battery electrode plate used for a lithium ion secondary battery or the like is a coating solution containing an active material, a binder, a thickener, and a solvent with respect to a plate-like substrate conveyed from a supply roll to a take-up roll. Is discharged from the tip of the die to form a coating film having a uniform thickness and dried. The battery is configured by sandwiching a separator between a positive electrode plate and a negative electrode plate and winding or laminating the separator together with an electrolyte in a can.
近年は車載用電池としての普及が進む中で、高容量化および安全性が課題となっており、いかに均一な厚みかつ高密度な塗膜を有する極板を製造するかが重要となっている。 In recent years, with the spread of in-vehicle batteries, high capacity and safety have become issues, and it is important how to manufacture an electrode plate having a uniform thickness and high density coating film. .
電池の高容量化を実現するためには、基材の使用量を削減しつつ活物質の量を増やす必要がある。そのためには基材の両面に塗膜を形成する必要がある。 In order to increase the capacity of the battery, it is necessary to increase the amount of active material while reducing the amount of base material used. For that purpose, it is necessary to form a coating film on both surfaces of the substrate.
また低価格化が進行する中で、いかに生産性を高めるかが各社の課題であり、様々な技術が開発されている。 In addition, as the price goes down, how to increase productivity is a problem for each company, and various technologies are being developed.
例えば、バックアップロールにより基材を支持しながら基材の上面に塗膜を形成し、乾燥装置にて乾燥させた後に、基材面を反転させ、バックアップロールにより基材を支持しながら基材の下面にも塗膜を形成する方法が提案されている。 For example, a coating film is formed on the upper surface of a base material while supporting the base material with a backup roll, and after drying with a drying apparatus, the surface of the base material is reversed, and the base material is supported while the base material is supported with a backup roll. A method of forming a coating film on the lower surface has been proposed.
この方法により、塗膜を安定的に製造できるものの、乾燥工程が2箇所必要になることや、基材の下面に塗膜を形成する際に基材をひっくり返す必要があるため、設備コストが大きくなる、工程が長くなる、スペースが必要になるなどの問題があり、生産性が限られていた。 Although this method can stably produce a coating film, it requires two drying steps, and it is necessary to turn the substrate upside down when forming a coating film on the lower surface of the substrate. There are problems such as a long process, a space required, and the productivity is limited.
この課題を解決する方法として特許文献1には、スリットダイ吐出口を対向させて配置し、塗工液を同時に吐出させながら基材の両面に塗膜を形成し、基材の上面と下面に形成した塗膜を同時に乾燥させることで、基材の両面に極板を一括で形成する方法が提案されている。 As a method for solving this problem, Patent Document 1 discloses that a slit die discharge port is disposed to face each other, and a coating film is formed on both surfaces of the substrate while simultaneously discharging the coating liquid. There has been proposed a method in which electrode plates are collectively formed on both surfaces of a substrate by simultaneously drying the formed coating film.
しかしながらこの方法では、スリットダイごとに吐出圧力が異なる場合は、基材の位置がその影響を受けて変形しやすく、上面と下面の塗工液の塗布厚みに差異が生じるという課題がある。 However, in this method, when the discharge pressure is different for each slit die, there is a problem that the position of the base material is easily deformed due to the influence, and the coating thickness of the coating liquid on the upper surface and the lower surface is different.
また、特許文献2には、バックアップロールにより基材を支持しながら基材の上面にスリットダイにより塗膜を形成し、その基材を水平方向に搬送させ、基材の鉛直下面に鉛直上方に吐出口を有したダイを設置し、基材の下面に塗膜を形成することで基材両面に極板を一括で形成する方法が提案されている。 Further, in Patent Document 2, a coating film is formed on the upper surface of the base material by a slit die while the base material is supported by a backup roll, the base material is transported in the horizontal direction, and vertically upward on the vertical lower surface of the base material. A method has been proposed in which a die having a discharge port is installed and a coating film is formed on the lower surface of the substrate to form electrode plates on both surfaces of the substrate in a lump.
特許文献2の方法では、2つのスリットダイ間の吐出圧力の差による塗工厚みへの影響を受け難く、連続的に塗膜を形成する場合には適しているものの、吐膜が形成された塗工部と吐膜を形成していない未塗工部を、基材の長手方向に交互に繰り返して形成する間欠塗工を実施した場合には、塗工部の終端の形状が悪化する問題がある。 In the method of Patent Document 2, although it is difficult to be affected by the coating thickness due to the difference in discharge pressure between the two slit dies, it is suitable for continuously forming a coating film, but a discharge film was formed. The problem is that the shape of the end of the coated part deteriorates when intermittent coating is performed in which the coated part and the uncoated part on which no discharge film is formed are alternately formed in the longitudinal direction of the substrate. There is.
これを図12〜図16に基づいて説明する。 This will be described with reference to FIGS.
両面塗工基材の搬送については、両面略同時に塗工が完了した後、塗工面の乾燥完了までは塗工面が濡れた状態であるので、長尺のロール等で基材を支持することができない。そこで、基材3の幅方向の両縁部を把持する機構を設けたり、乾燥装置内で基材の上下から気体を噴出させることによって基材を浮遊・搬送させるが、基材自身の重量や塗工された塗工液の重量の影響により、図12に示すように搬送中の基材3が幅方向に撓み易く、特に基材3の幅方向中央部が基材3の両縁部に比べて下側にH1だけ撓んで、上下方向に不安定な状態で搬送されるため、基材3の両縁部と幅方向中央部とで塗工状態が異なる。9は基材3の搬送方向を示している。 As for the conveyance of the double-sided coated base material, the coated surface is wet until the coating surface is completely dried after the coating is completed almost simultaneously, so the substrate can be supported by a long roll or the like. Can not. Therefore, a mechanism for gripping both edges in the width direction of the base material 3 is provided, or the base material is floated and conveyed by jetting gas from above and below the base material in the drying apparatus. Due to the influence of the weight of the applied coating liquid, the substrate 3 being conveyed is easily bent in the width direction as shown in FIG. 12, and in particular, the center portion in the width direction of the substrate 3 is on both edges of the substrate 3. In comparison, since it bends by H1 downward and is conveyed in an unstable state in the vertical direction, the coating state is different between both edge portions of the substrate 3 and the central portion in the width direction. Reference numeral 9 denotes the conveyance direction of the substrate 3.
図13(a)のT1〜T5は基材3の両縁部での塗工状態の経過を示している。図13(b)のT1〜T6は基材3の幅方向中央部での塗工状態の経過を示している。 T <b> 1 to T <b> 5 in FIG. 13A indicate the progress of the coating state at both edges of the substrate 3. T <b> 1 to T <b> 6 in FIG.
水平方向に搬送中の薄板状の基材3に、バックアップロールを用いずにスリットダイ1から塗工液を吐出して塗膜を形成した場合、基材3の両縁部では、スリットダイ1から吐出中の塗工液を停止した直後の図13(a)のT2〜T5のように、スリットダイ1から塗工液の吐出を停止した後も、液溜りが途切れて表面張力により縮もうとする挙動に基材3が引き込まれることなく搬送されていく。 In the case where a coating film is formed by discharging the coating liquid from the slit die 1 without using a backup roll onto the thin plate-like substrate 3 being conveyed in the horizontal direction, the slit die 1 is formed at both edges of the substrate 3. As shown in T2 to T5 in FIG. 13A immediately after stopping the coating liquid being discharged from, the liquid pool is interrupted and the surface tension is reduced even after the discharge of the coating liquid from the slit die 1 is stopped. The substrate 3 is conveyed without being drawn into the behavior.
これに対して、基材3の幅方向中央部においては、基材3が撓みやすく上下位置が不安定なことから、図13(b)のT2〜T6のように、塗工液の吐出停止後に液溜りが途切れて表面張力により縮もうとする挙動に基材3が引き込まれてしまい、基材3の両縁部付近での挙動に比べて、液溜りが途切れるタイミングが遅れると共に、その遅れの期間に基材3と塗工液が接し続けていることから、幅方向中央部の液キレが遅れる。そのため、図14に示すように、塗工部4の終端4eの塗布膜の形状が、円弧状に悪化する。Yは尾引き長さを示している。 On the other hand, in the central portion in the width direction of the base material 3, since the base material 3 is easily bent and the vertical position is unstable, the discharge of the coating liquid is stopped as indicated by T <b> 2 to T <b> 6 in FIG. The base 3 is drawn into a behavior that the liquid pool is interrupted later and tends to shrink due to surface tension, and the timing at which the liquid pool is interrupted is delayed as compared with the behavior in the vicinity of both edge portions of the base 3. Since the base material 3 and the coating liquid are kept in contact with each other during this period, the liquid sharpness in the center in the width direction is delayed. Therefore, as shown in FIG. 14, the shape of the coating film of the terminal end 4e of the coating part 4 deteriorates in circular arc shape. Y indicates the tailing length.
塗工間欠時の終端形状を改善させる方法としては、スリットダイ1からの塗工液の吐出停止だけでなく、スリットダイ1からの塗工液の吐出停止とともに、スリットダイと基材3との隙間(以下、塗工ギャップと記す)を変化させることが考えられる。 As a method of improving the terminal shape at the time of intermittent coating, not only the discharge of the coating liquid from the slit die 1 but also the discharge of the coating liquid from the slit die 1 and the slit die and the substrate 3 are stopped. It is conceivable to change the gap (hereinafter referred to as a coating gap).
バックアップロール有りで基材3の上面に塗工する場合を図15(a)〜(d)に示す。図15(a)の上段(1)は塗工中の状態のスリットダイ1の吐出口における液溜りの側面図、図15(a)の中段(2)は塗工中の状態のスリットダイ1の吐出口における液溜りを搬送方向9の上手側から見た図を示す。図15(a)の下段(3)は基材3に塗工中の上面塗工部6の形状を示す。 The case where it coats on the upper surface of the base material 3 with a backup roll is shown to Fig.15 (a)-(d). The upper stage (1) of FIG. 15 (a) is a side view of a liquid reservoir at the discharge port of the slit die 1 in the coating state, and the middle stage (2) in FIG. 15 (a) is the slit die 1 in the coating state. The figure which looked at the liquid pool in the discharge port of this from the upper side of the conveyance direction 9 is shown. The lower part (3) of FIG. 15A shows the shape of the upper surface coating part 6 being applied to the substrate 3.
この図15(a)の塗工中の状態から塗工ギャップをそのままにしてスリットダイ1からの塗工液の吐出を停止させた場合のスリットダイ1の吐出口における液溜りの側面図を、図15(b)の上段(1)に示す。図15(b)の中段(2)は搬送方向9から見たそのときの液溜りを示す。図15(b)の下段(3)は基材3の上面塗工部6の終端6eの尾引きを示す。 15A is a side view of a liquid pool at the discharge port of the slit die 1 when the discharge of the coating liquid from the slit die 1 is stopped while the coating gap is left as it is from the state of being applied in FIG. This is shown in the upper part (1) of FIG. The middle stage (2) of FIG. 15B shows the liquid pool at that time as viewed from the transport direction 9. The lower part (3) of FIG. 15 (b) shows the tailing of the terminal end 6 e of the upper surface coating part 6 of the substrate 3.
図15(a)の塗工中の状態から塗工ギャップを大きくするとともにスリットダイ1からの塗工液の吐出を停止させた場合のスリットダイ1の吐出口における液溜りの側面図を、図15(c)の上段(1)に示す。図15(c)の中段(2)は搬送方向9から見たそのときの液溜りを示す。図15(c)の下段(3)は基材3の上面塗工部6の終端6eの尾引きを示す。 FIG. 15A is a side view of a liquid pool at the discharge port of the slit die 1 when the coating gap is increased from the state of application in FIG. 15A and the discharge of the coating liquid from the slit die 1 is stopped. It is shown in the upper part (1) of 15 (c). The middle part (2) of FIG. 15C shows the liquid reservoir at that time as viewed from the transport direction 9. The lower part (3) of FIG. 15 (c) shows the tailing of the terminal end 6e of the upper surface coating part 6 of the substrate 3.
図15(a)の塗工中の状態から塗工ギャップを小さくするとともにスリットダイ1からの塗工液の吐出を停止させた場合のスリットダイ1の吐出口における液溜りの側面図を、図15(d)の上段(1)に示す。図15(d)の中段(2)は搬送方向9から見たそのときの液溜りを示す。図15(d)の下段(3)は基材3の上面塗工部6の終端6eの尾引きを示す。 FIG. 15A is a side view of a liquid pool at the discharge port of the slit die 1 when the coating gap is reduced from the state of FIG. 15A being applied and the discharge of the coating liquid from the slit die 1 is stopped. It is shown in the upper part (1) of 15 (d). The middle part (2) of FIG. 15 (d) shows the liquid reservoir at that time as viewed from the transport direction 9. The lower part (3) of FIG. 15 (d) shows the tailing of the end 6 e of the upper surface coating part 6 of the base material 3.
バックアップロールを用いずに基材3の下面に塗工する場合を図16(a)〜(d)に示す。図16(a)の上段(1)は塗工中の状態のスリットダイ1の吐出口における液溜りの側面図、図16(a)の中段(2)は塗工中の状態のスリットダイ1の吐出口における液溜りを搬送方向9の上手側から見た図を示す。図16(a)の下段(3)は基材3に塗工中の下面塗工部4の形状を示す。 The case where it coats to the lower surface of the base material 3 without using a backup roll is shown to Fig.16 (a)-(d). The upper stage (1) of FIG. 16A is a side view of a liquid pool at the discharge port of the slit die 1 in the coating state, and the middle stage (2) in FIG. 16A is the slit die 1 in the coating state. The figure which looked at the liquid pool in the discharge port of this from the upper side of the conveyance direction 9 is shown. The lower part (3) of FIG. 16 (a) shows the shape of the lower surface coating portion 4 being applied to the substrate 3.
この図16(a)の塗工中の状態から塗工ギャップをそのままにしてスリットダイ1からの塗工液の吐出を停止させた場合のスリットダイ1の吐出口における液溜りの側面図を、図16(b)の上段(1)に示す。図16(b)の中段(2)は搬送方向9から見たそのときの液溜りを示す。図16(b)の下段(3)は基材3の下面塗工部4の終端4eの尾引きを示す。 16A is a side view of a liquid reservoir at the discharge port of the slit die 1 when the discharge of the coating liquid from the slit die 1 is stopped while the coating gap is left as it is from the state of being applied in FIG. This is shown in the upper part (1) of FIG. The middle stage (2) of FIG. 16B shows the liquid pool at that time as viewed from the transport direction 9. The lower part (3) of FIG. 16 (b) shows the tailing of the end 4 e of the lower surface coating part 4 of the substrate 3.
図16(a)の塗工中の状態から塗工ギャップを大きくするとともにスリットダイ1からの塗工液の吐出を停止させた場合のスリットダイ1の吐出口における液溜りの側面図を、図16(c)の上段(1)に示す。図16(c)の中段(2)は搬送方向9から見たそのときの液溜りを示す。図16(c)の下段(3)は基材3の下面塗工部4の終端4eの尾引きを示す。 16A is a side view of a liquid pool at the discharge port of the slit die 1 when the coating gap is increased from the state of being applied in FIG. 16A and the discharge of the coating liquid from the slit die 1 is stopped. It is shown in the upper part (1) of 16 (c). The middle part (2) of FIG. 16C shows the liquid reservoir at that time as viewed from the transport direction 9. The lower part (3) of FIG. 16 (c) shows the tailing of the terminal end 4 e of the lower surface coating part 4 of the substrate 3.
図16(a)の塗工中の状態から塗工ギャップを小さくするとともにスリットダイ1からの塗工液の吐出を停止させた場合のスリットダイ1の吐出口における液溜りの側面図を、図16(d)の上段(1)に示す。図16(d)の中段(2)は搬送方向9から見たそのときの液溜りを示す。図16(d)の下段(3)は基材3の下面塗工部4の終端4eの尾引きを示す。 FIG. 16A is a side view of a liquid pool at the discharge port of the slit die 1 when the coating gap is reduced from the state of FIG. 16A being applied and the discharge of the coating liquid from the slit die 1 is stopped. The upper part (1) of 16 (d) is shown. The middle stage (2) of FIG. 16D shows the liquid pool at that time as viewed from the transport direction 9. The lower part (3) of FIG. 16 (d) shows the tailing of the terminal end 4e of the lower surface coating part 4 of the substrate 3.
図15のようにバックアップロール有りで基材3の上面に塗工する場合には、スリットダイ吐出口での基材3はバックアップロールに密着した状態で保持されるため、塗工中および間欠時に基材位置が変動することによる塗工ギャップの変化は生じない。 In the case of coating on the upper surface of the substrate 3 with a backup roll as shown in FIG. 15, the substrate 3 at the slit die discharge port is held in close contact with the backup roll. The change in the coating gap due to the change in the substrate position does not occur.
そこで、図15(a)に示す塗工中の状態から塗工液の吐出を停止させることにより間欠させると、図15(b)(2)に示すように、幅方向両縁部から幅方向中央部に向かい液溜りが途切れていくことで上面塗工部6の終端6eが形成されるため、幅方向中央部が幅方向両縁部周辺に比べて液キレが遅れ、円弧状の終端形状となる。なお、この円弧状となる程度に関しては、粘度や表面張力といった塗工液の物性や、塗工液と基材3およびスリットダイ1先端部との濡れ性の関係にも影響される。 Therefore, when the discharge is stopped by stopping the discharge of the coating liquid from the state during coating shown in FIG. 15 (a), as shown in FIGS. 15 (b) and (2), the width direction from both edges in the width direction. Since the end 6e of the upper surface coating portion 6 is formed by the liquid pool being interrupted toward the center, the liquid center is delayed in the center in the width direction compared to the periphery of both edges in the width direction, and the arc-shaped end shape It becomes. The degree of the arc shape is also affected by the physical properties of the coating liquid such as viscosity and surface tension, and the wettability relationship between the coating liquid and the base 3 and the tip of the slit die 1.
そこで図15(c)に示すように、塗工液の吐出停止に合わせてスリットダイ1を上昇して塗工ギャップを広げると、図15(c)(2)に示すように液溜りの途切れを促進でき、図15(d)に示すように終端6eが円弧状になる程度が軽減されることで、上面塗工部6の終端6eの直線性が向上する。 Therefore, as shown in FIG. 15 (c), when the slit die 1 is raised in accordance with the stop of the discharge of the coating liquid to widen the coating gap, the liquid pool is interrupted as shown in FIGS. 15 (c) and (2). As shown in FIG. 15D, the degree of the end 6e having an arc shape is reduced, so that the linearity of the end 6e of the upper surface coating portion 6 is improved.
塗工液の吐出停止に合わせた塗工ギャップの変化としては、吐出停止に合わせてスリットダイ1を下降して塗工ギャップを狭くすることも考えられるが、その場合、図15(d)(2)に示すようにダイヘッド吐出部の液溜りを基材3側へ押し潰すことになり、図15(d)(3)に示すように上面塗工部6の塗布幅が広がってしまうため、通常は、塗工液の吐出停止に合わせてスリットダイ1を上昇して塗工ギャップを広げる方法が用いられる。 As a change in the coating gap in accordance with the stop of the discharge of the coating liquid, it is conceivable to lower the slit die 1 in accordance with the stop of the discharge to narrow the coating gap. In that case, FIG. As shown in 2), since the liquid pool of the die head discharge part is crushed toward the base material 3, the application width of the upper surface coating part 6 is widened as shown in FIGS. 15 (d) and (3). Usually, a method is used in which the slit die 1 is raised to widen the coating gap in accordance with the stoppage of the coating liquid discharge.
ここで同様に、バックアップロールを用いずに基材3の下面に塗工する場合において実施した場合には、図16(a)に示す塗工中の状態から、塗工液の吐出を停止させることにより間欠させると、基材3が幅方向に撓み易く、特に基材幅方向中央部が上下方向に不安定な状態で搬送されることから、図16(b)(2)に示すように、幅方向両縁部から幅方向中央部に向かい液溜りが途切れていく挙動において、液溜りが途切れて表面張力により縮もうとする挙動に引き込まれてしまい、幅方向中央部で液溜りが途切れるタイミングが幅方向端部付近に比べて大きく遅れるため、図16(b)(3)に示すように終端4eは非常に大きな円弧となってしまう。 Similarly, when the coating is performed on the lower surface of the base material 3 without using the backup roll, the discharge of the coating liquid is stopped from the coating state shown in FIG. When intermittent, the base material 3 is easily bent in the width direction, and in particular, the center part in the base material width direction is transported in an unstable state in the vertical direction, so as shown in FIGS. In the behavior where the liquid pool is interrupted from both edges in the width direction toward the center in the width direction, the liquid pool is interrupted and drawn into the behavior of trying to shrink due to surface tension, and the liquid pool is interrupted in the center in the width direction Since the timing is greatly delayed as compared with the vicinity of the end in the width direction, the end 4e becomes a very large arc as shown in FIGS.
そこで、図16(c)に示すように、塗工液の吐出停止に合わせてスリットダイ1を下降して塗工ギャップを広げると、図16(c)(2)に示すように液溜りの途切れを促進でき、図16(c)(3)に示すように下面塗工部4の終端4eが円弧状になる程度が図16(b)(3)に比べて軽減されるものの、バックアップロール有りで基材3の上面に塗工する場合(図15(c)(3))に比べると悪化してしまうという問題がある。 Therefore, as shown in FIG. 16 (c), when the slit die 1 is lowered in accordance with the stop of the discharge of the coating liquid to widen the coating gap, as shown in FIGS. Although the interruption can be promoted and the extent that the end 4e of the lower surface coating portion 4 becomes arcuate as shown in FIGS. 16 (c) and (3) is reduced compared to FIGS. 16 (b) and (3), the backup roll There exists a problem that it will deteriorate compared with the case where it coats on the upper surface of the base material 3 (FIG.15 (c) (3)).
図16(d)に示すように塗工液の吐出停止に合わせてスリットダイ1を上昇して塗工ギャップを狭くした場合は図15(d)(3)と同様に、図16(d)(2)に示すようにダイヘッド吐出部の液溜りを基材3側へ押し潰すことになり、図16(d)(3)に示すように下面塗工部4の終端4eでの塗布幅が広がってしまうため、通常は、塗工液の吐出停止に合わせてスリットダイ1を下降して塗工ギャップを広げる方法が用いられる。 As shown in FIG. 16 (d), when the slit die 1 is raised in accordance with the stop of the discharge of the coating liquid to narrow the coating gap, as in FIGS. 15 (d) and (3), FIG. As shown in (2), the liquid pool in the die head discharge part is crushed toward the substrate 3 side, and the application width at the end 4e of the lower surface coating part 4 is as shown in FIGS. 16 (d) and (3). In order to spread, normally, the method of expanding the coating gap by lowering the slit die 1 in accordance with the stop of the discharge of the coating liquid is used.
そこで本発明は、上記課題を鑑み、基材にスリットダイを用いて塗工液を間欠的にかつ均一な厚みにて塗工しながら、下面塗工部の終端の直線性が良好な電池極板を形成できる、電池極板の製造方法を提供することを目的とする。 Accordingly, in view of the above problems, the present invention provides a battery electrode having excellent linearity at the end of the lower surface coating portion while applying a coating liquid intermittently and uniformly on a substrate using a slit die. It aims at providing the manufacturing method of a battery electrode plate which can form a board.
本発明の電池極板の製造方法は、走行する基材に対して、吐出口が前記基材の下面に対向して配置したスリットダイによって塗工液を間欠して吐出して下面塗工部と未塗工部を繰り返し形成し、前記下面塗工部が塗布された前記基材を、乾燥装置を通過させて乾燥させる電池極板の製造方法であって、前記スリットダイの吐出口からの塗工液の停止の前に、前記スリットダイの先端部の下流端の前記基材との隙間を変化させずに、前記スリットダイの先端部の上流端の前記基材との隙間を狭くする動作を開始または動作を完了し、この後に前記スリットダイへの塗工液の供給を停止する、ことを特徴とする。 The method for producing a battery electrode plate of the present invention is such that a coating liquid is intermittently discharged to a traveling substrate by a slit die arranged so that a discharge port faces the lower surface of the substrate. And a non-coated portion is repeatedly formed, and the base material coated with the lower surface coated portion is dried by passing through a drying device, the method comprising: Before stopping the coating liquid, the gap between the slit die and the upstream end of the slit die is narrowed without changing the gap between the slit die and the downstream end of the slit die. The operation is started or completed, and thereafter, the supply of the coating liquid to the slit die is stopped.
また、前記基材は、前記下面塗工部を形成するよりも前に上面に塗工液を塗布して乾燥前の上面塗工部が形成されている、ことがより好ましい。 Moreover, it is more preferable that the base material has an upper surface coating part before drying by applying a coating liquid on the upper surface before forming the lower surface coating part.
また、前記スリットダイへの塗工液の供給を停止させた後に、前記スリットダイの先端部の上流端の前記基材との隙間を変化させずに、前記スリットダイの先端部の下流端の前記基材との隙間を広くする、ことがより好ましい。 In addition, after stopping the supply of the coating liquid to the slit die, without changing the clearance between the upstream end of the slit die and the base material, the downstream end of the slit die It is more preferable to widen the gap with the substrate.
また、前記スリットダイの先端部の下流端の前記基材との隙間を変化させずに、前記スリットダイの先端部の上流端の前記基材との隙間を狭くした状態では、前記スリットダイの先端部の上流端を前記基材の下面に接触させる、ことがより好ましい。 Further, in a state where the gap between the upstream end of the slit die tip and the base material is narrowed without changing the gap between the downstream end of the slit die tip and the base material, More preferably, the upstream end of the tip is brought into contact with the lower surface of the substrate.
また、前記基材に対する前記スリットダイの角度を変更することで、前記基材との前記隙間を変更する、ことがより好ましい。 It is more preferable to change the gap with the base material by changing the angle of the slit die with respect to the base material.
本発明の電池極板の塗工装置は、走行する基材に対して、吐出口が前記基材の下面に対向して配置したスリットダイによって塗工液を間欠して吐出して下面塗工部と未塗工部を繰り返し形成し、前記下面塗工部が塗布された前記基材を、乾燥装置を通過させて乾燥させる電池極板の塗工装置において、前記スリットダイの先端部の下流端の前記基材との隙間と上流端の基材との隙間を個別に変更できる位置変更部を設け、前記位置変更部を、前記スリットダイの吐出口からの塗工液の停止の前に、前記スリットダイの先端部の下流端の前記基材との隙間を変化させずに、前記スリットダイの先端部の上流端の前記基材との隙間を狭くする動作を開始または動作を完了し、この後に前記スリットダイへの塗工液の供給を停止するよう構成した、ことを特徴とする。 The battery electrode plate coating apparatus of the present invention is a lower surface coating method in which a coating liquid is intermittently discharged to a traveling substrate by a slit die arranged so that a discharge port faces the lower surface of the substrate. In the battery electrode coating device, the substrate coated with the lower surface coating portion is dried by passing through a drying device, and is formed downstream of the tip of the slit die. Provided with a position changing unit that can individually change the gap between the base material at the end and the base material at the upstream end, and before the stop of the coating liquid from the discharge port of the slit die The operation of starting or completing the operation to narrow the gap between the upstream end of the slit die tip and the base material without changing the gap between the downstream end of the slit die tip and the base material is performed. , And then configured to stop the supply of the coating liquid to the slit die, And wherein the door.
また、前記基材は、前記下面塗工部を形成するよりも前に前記基材の上面に塗工液を塗布して乾燥前の上面塗工部を形成する第2のスリットダイを設ける、ことがより好ましい。 Further, the base material is provided with a second slit die that forms a top surface coating portion before drying by applying a coating liquid on the top surface of the base material before forming the bottom surface coating portion. It is more preferable.
また、前記位置変更部は、前記スリットダイへの塗工液の供給を停止させた後に、前記スリットダイの先端部の上流端の前記基材との隙間を変化させずに、前記スリットダイの先端部の下流端の前記基材との隙間を広くする、ことがより好ましい。 In addition, the position changing unit, after stopping the supply of the coating liquid to the slit die, without changing the gap between the upstream end of the slit die and the base material, It is more preferable to widen the gap between the downstream end of the tip and the base material.
また、前記位置変更部は、前記スリットダイの先端部の下流端の前記基材との隙間を変化させずに、前記スリットダイの先端部の上流端の前記基材との隙間を狭くした状態では、前記スリットダイの先端部の上流端を前記基材の下面に接触させる、ことがより好ましい。 In addition, the position changing unit is a state in which the gap between the base end at the upstream end of the slit die is narrowed without changing the gap between the base end at the downstream end of the slit die front end. Then, it is more preferable that the upstream end of the front end portion of the slit die is brought into contact with the lower surface of the base material.
また、前記位置変更部は、前記基材に対する前記スリットダイの角度を変更することで、前記基材との前記隙間を変更する、ことがより好ましい。 More preferably, the position changing unit changes the gap with the base material by changing an angle of the slit die with respect to the base material.
この構成によると、スリットダイの先端部の下流端の前記基材との隙間を変化させずに、前記スリットダイの先端部の上流端の前記基材との隙間を狭くする動作を開始または動作を完了し、この後に前記スリットダイへの塗工液の供給を停止するので、塗膜を均一な膜厚で間欠的に形成でき、間欠部での形状直線性も良好な電池極板を製造することができる。 According to this configuration, the operation of starting or operating to narrow the gap between the upstream end of the slit die and the upstream end of the slit die without changing the gap between the downstream end of the slit die and the base is performed. After that, the supply of the coating liquid to the slit die is stopped, so that a coating film can be formed intermittently with a uniform film thickness and a battery electrode plate with good shape linearity at the intermittent part is manufactured. can do.
以下、本発明の電池極板の製造方法を、具体的な各実施の形態に基づいて説明する。 Hereinafter, the manufacturing method of the battery electrode plate of the present invention will be described based on each specific embodiment.
(実施の形態1)
以下に、本発明における第1の実施形態について説明する。
(Embodiment 1)
The first embodiment of the present invention will be described below.
図1は、水平に走行する基材3の下面に塗膜を形成する塗工装置8を示す。 FIG. 1 shows a coating apparatus 8 that forms a coating film on the lower surface of a substrate 3 that runs horizontally.
塗工装置8は、巻出機(図示しない)より供給される基材3を、搬送ロール7を介して一定の速度で水平方向に搬送し、搬送ロール7より搬送方向9の下流側で基材3に対して鉛直下方に設置したスリットダイ1により塗工液を基材3の下面に基材3の長手方向に間欠的に塗布する。これによって基材3の下面には、塗工液が塗布された下面塗工部4と塗工液を塗布しない未塗工部5が繰り返し形成される。 The coating apparatus 8 transports the base material 3 supplied from an unwinder (not shown) in the horizontal direction at a constant speed via the transport roll 7, and is based on the downstream side of the transport direction 9 from the transport roll 7. The coating liquid is intermittently applied to the lower surface of the base material 3 in the longitudinal direction of the base material 3 by the slit die 1 installed vertically below the material 3. As a result, the lower surface coated portion 4 coated with the coating liquid and the uncoated portion 5 not coated with the coating liquid are repeatedly formed on the lower surface of the substrate 3.
下面塗工部4と未塗工部5が繰り返し形成された基材3は、乾燥装置16を通過して塗布された塗工液が乾燥されて、巻取機(図示しない)にて回収される。 In the base material 3 on which the lower surface coating portion 4 and the uncoated portion 5 are repeatedly formed, the coating liquid applied through the drying device 16 is dried and collected by a winder (not shown). The
スリットダイ1にはタンク10とポンプ11とバルブ12が、記載の順番で直列に接続されており、塗工液を定量供給することで、スリットダイ1の吐出口より定量吐出され、均一な厚みの塗膜を形成する。 A tank 10, a pump 11, and a valve 12 are connected to the slit die 1 in series in the order described, and a fixed amount of coating liquid is supplied, so that a fixed amount is discharged from the discharge port of the slit die 1 and has a uniform thickness. The coating film is formed.
スリットダイ1は基材3に対して塗工ギャップの空間を有して設置されている。用いられる塗工液の特性によっても異なるが、塗工ギャップは0.01以上1.0mm以下程度設けられる。ポンプ11は定量的かつ連続的に塗工液をスリットダイ1に供給する必要があり、例えば、スクリューポンプやダイアフラムポンプなどがあるが、脈動を考慮してスクリューポンプが選択されることが多い。 The slit die 1 is installed with a coating gap space with respect to the substrate 3. Although it varies depending on the characteristics of the coating liquid used, the coating gap is set to about 0.01 to 1.0 mm. The pump 11 needs to supply the coating liquid quantitatively and continuously to the slit die 1. For example, there are a screw pump and a diaphragm pump, and the screw pump is often selected in consideration of pulsation.
バルブ12は詳細には図示しないが、リザーバとバルブ部を備えており、ポンプ11から供給された塗工液が、流路を通ってリザーバに入った後に、流路を通ってバルブ部に向かい、その後、流路が2分岐されてバルブより排出される構造をしている。バルブ部からは、スリットダイ1に向かう流路と、タンク10に向かう流路に分岐されており、ポンプ11は連続的かつ定量的に塗工液を送りながら、バルブ12のバルブ部をエアシリンダーにより切り替えることによって、間欠時にはスリットダイ1側に向かう塗工液をタンク10側へ循環させ、間欠塗工を実現することができる。 Although not shown in detail, the valve 12 includes a reservoir and a valve unit. After the coating liquid supplied from the pump 11 enters the reservoir through the channel, the valve 12 passes through the channel to the valve unit. Thereafter, the flow path is divided into two and discharged from the valve. The valve section is branched into a flow path toward the slit die 1 and a flow path toward the tank 10, and the pump 11 feeds the coating liquid continuously and quantitatively while the valve section of the valve 12 is moved to the air cylinder. By switching between the two, the coating liquid toward the slit die 1 side is circulated to the tank 10 side at the time of intermittent operation, and intermittent coating can be realized.
タンク10内には塗工液が常温常圧化にて常時充填されており、ポンプ11に供給される。ポンプ11からの塗工液供給量にもよるが、特に沈降しやすい塗工液を使用する場合は、図示しないミキサーなどで常時撹拌しておくことが望ましい。 The tank 10 is always filled with a coating solution at normal temperature and pressure, and is supplied to the pump 11. Although depending on the amount of coating liquid supplied from the pump 11, it is desirable to always stir with a mixer (not shown) when using a coating liquid that easily settles.
塗工装置8の運転中のスリットダイ1の姿勢は、位置変更部17によって制御されている。位置変更部17は、下面塗工部4の終端4eに近づいた時に、スリットダイ1の先端部での上流端HUおよび下流端HLの基材3との隙間を制御するもので、スリットダイ先端部の下流端HLの基材3との隙間と上流端HUの基材3との隙間を個別に変更できる。 The position of the slit die 1 during operation of the coating apparatus 8 is controlled by the position changing unit 17. The position changer 17 controls the clearance between the upstream end HU and the downstream end HL of the base 3 of the slit die 1 when approaching the end 4e of the lower surface coating portion 4, and the tip of the slit die The gap between the downstream end HL of the part and the base material 3 and the gap between the upstream end HU and the base material 3 can be individually changed.
位置変更部17の構成を、図2の動作フローと図3に基づいて説明する。 The configuration of the position changing unit 17 will be described based on the operation flow of FIG. 2 and FIG.
図2(a)は位置変更部17によってスリットダイ1の姿勢がT1〜T6にわたって制御された場合の基材3の幅方向両縁部付近での液溜りの挙動を示している。T1が塗工中のスリットダイ1の姿勢を示す。このときのスリットダイ1の先端の上流端HUおよび下流端HLと基材3の下面との隙間は同じで、目的の厚さの塗膜を形成するに必要な塗工ギャップに設定されている。バルブ12からスリットダイ1への塗工液の供給停止のタイミングは、図3に示すT2とT3の間のTsに設定されている。T6が下面塗工部4の終端4eでスリットダイ1から基材3への塗工液の供給が終了したタイミングを示している。このようにスリットダイ1の姿勢が制御した場合の幅方向中央部での液溜りの挙動を図2(b)に示す。 FIG. 2A shows the behavior of the liquid pool in the vicinity of both edges in the width direction of the base material 3 when the position of the slit die 1 is controlled by the position changing unit 17 from T1 to T6. T1 indicates the posture of the slit die 1 during coating. At this time, the gaps between the upstream end HU and the downstream end HL at the front end of the slit die 1 and the lower surface of the base material 3 are the same, and are set to a coating gap necessary for forming a coating film having a target thickness. . The timing of stopping the supply of the coating liquid from the valve 12 to the slit die 1 is set to Ts between T2 and T3 shown in FIG. T6 indicates the timing at which the supply of the coating liquid from the slit die 1 to the substrate 3 is completed at the end 4e of the lower surface coating portion 4. FIG. 2B shows the behavior of the liquid pool at the center in the width direction when the attitude of the slit die 1 is controlled in this way.
図2(a)T1と図2(b)T1に示す塗工中から、バルブ12からスリットダイ1への塗工液の供給停止のタイミングTsよりも手前のT2に、スリットダイ1の姿勢が、先ず、図2(a)T2、(b)T2に示すように、スリットダイ先端部の下流端HLを支点として、基材3に対するスリットダイの角度を変更することで、スリットダイ先端部での下流端HLの基材3との隙間を変化させず、上流端HUの基材3との隙間をT1〜T2の期間で狭くする。T2〜T6の期間においてスリットダイ1の先端の上流端HUは基材3の下面には当接していない。そして、スリットダイ1から基材3への塗工液の供給が終了したT6以降のタイミングに、上流端HUの基材3との隙間を下流端HLの基材3との隙間と同じになるまで戻す。 During the coating shown in FIGS. 2 (a) T1 and 2 (b) T1, the posture of the slit die 1 is at T2 before the timing Ts of stopping the supply of the coating liquid from the valve 12 to the slit die 1. First, as shown in FIGS. 2A and 2B, by changing the angle of the slit die relative to the substrate 3 with the downstream end HL of the slit die tip as a fulcrum, The gap between the downstream end HL and the base material 3 is not changed, and the gap between the upstream end HU and the base material 3 is narrowed in the period of T1 to T2. In the period from T2 to T6, the upstream end HU at the tip of the slit die 1 is not in contact with the lower surface of the substrate 3. The gap between the upstream end HU and the base material 3 is the same as the gap between the downstream end HL and the base material 3 at a timing after T6 when the supply of the coating liquid from the slit die 1 to the base material 3 is completed. Return to
このように、上流端HUの基材3との隙間をT2〜T6で狭くすることで、スリットダイ先端部と基材3との間の液溜りの体積が小さくなるため、基材3が撓みやすく上下動が不安定な基材3の幅方向中央部においても、間欠時に液溜りの表面張力により引き込まれる挙動が制限される。そのため、幅方向端部付近での挙動に比べて幅方向中央部で液溜りが途切れるタイミングが遅れるということが抑制でき、図13と図14で説明したような終端4eでの直線性が悪化することなく、図4に示すような良好な間欠形状をもつ電池極板が形成できる。 Thus, since the volume of the liquid pool between the slit die tip and the base material 3 is reduced by narrowing the gap between the upstream end HU and the base material 3 by T2 to T6, the base material 3 bends. Even in the center portion in the width direction of the base material 3 which is easy to move up and down easily, the behavior drawn by the surface tension of the liquid pool during the intermittent operation is limited. Therefore, it is possible to suppress a delay in the timing at which the liquid pool is interrupted in the central portion in the width direction compared to the behavior in the vicinity in the width direction end portion, and the linearity at the end 4e as described in FIGS. 13 and 14 is deteriorated. Therefore, a battery electrode plate having a good intermittent shape as shown in FIG. 4 can be formed.
また、スリットダイ先端部での下流端HLの基材3との隙間を変化させず、上流端HUの基材3との隙間を狭くするため、下流端HLの基材3との隙間が確保されているため、図15(d)(3)および図16(d)(3)に示すような、終端の塗布幅が広がる問題は生じない。 Further, the gap between the downstream end HL and the base material 3 is not changed, and the gap between the upstream end HU and the base material 3 is narrowed, so that the clearance between the downstream end HL and the base material 3 is secured. Therefore, there is no problem that the coating width at the end is widened as shown in FIGS. 15 (d) (3) and 16 (d) (3).
(実施の形態2)
図5は実施の形態2の動作フローを示す。
(Embodiment 2)
FIG. 5 shows an operation flow of the second embodiment.
実施の形態1の位置変更部17では、図2(a)(b)に示したようにT2〜T6において、スリットダイ先端部での上流端HUは基材3の下面には当接していない。これに対して実施の形態2では、スリットダイ先端部での上流端HUが基材3の下面には当接している点だけが、実施の形態1とは異なる。 In the position changing unit 17 according to the first embodiment, as shown in FIGS. 2A and 2B, the upstream end HU at the tip end of the slit die is not in contact with the lower surface of the substrate 3 at T2 to T6. . On the other hand, the second embodiment is different from the first embodiment only in that the upstream end HU at the slit die tip is in contact with the lower surface of the substrate 3.
図5(a)は基材3の幅方向両縁部付近での液溜りの挙動を示し、図5(b)は幅方向中央部での液溜りの挙動を示す。 FIG. 5A shows the behavior of the liquid pool in the vicinity of both edges in the width direction of the substrate 3, and FIG. 5B shows the behavior of the liquid pool in the center portion in the width direction.
図5(a)T1と図5(b)T1に示す塗工中から、バルブ12からスリットダイ1への塗工液の供給停止のタイミングTsよりも手前のT2に、スリットダイ1の姿勢が、先ず、図5(a)T2と図5(b)T2に示すように、スリットダイ先端部の下流端HLを支点として、基材3に対するスリットダイ1の角度を変更する。このときスリットダイ先端部の上流端HUが基材3の下面に当接するまでスリットダイ1を回動させる。スリットダイ先端部の上流端HUが基材3の下面に当接したこの状態は、T6まで継続する。 During the coating shown in FIGS. 5 (a) T1 and FIG. 5 (b) T1, the posture of the slit die 1 is at T2 before the supply stop timing Ts of the coating liquid from the valve 12 to the slit die 1. First, as shown in FIGS. 5 (a) T 2 and FIG. 5 (b) T 2, the angle of the slit die 1 with respect to the substrate 3 is changed using the downstream end HL of the slit die tip as a fulcrum. At this time, the slit die 1 is rotated until the upstream end HU of the tip end portion of the slit die contacts the lower surface of the substrate 3. This state in which the upstream end HU of the slit die tip is in contact with the lower surface of the substrate 3 continues until T6.
このように、スリットダイ先端部の上流端HUと基材3とを接触させることで、スリットダイ先端部と基材3との間の液溜りの体積を実施の形態1に比べて更に小さくでき、基材3を下側から支持する効果も得られるため、基材3が撓みやすく上下動が不安定な基材3の幅方向中央部において、間欠時に液溜りの表面張力により引き込まれる挙動を実施の形態1に比べて更に制限できる。 In this way, by bringing the upstream end HU of the slit die tip portion into contact with the base material 3, the volume of the liquid pool between the slit die tip portion and the base material 3 can be further reduced as compared with the first embodiment. In addition, since the effect of supporting the base material 3 from the lower side is also obtained, the base material 3 is easily bent and has a behavior of being drawn by the surface tension of the liquid pool during the intermittent operation in the center in the width direction of the base material 3. This can be further limited as compared with the first embodiment.
この実施の形態2におけるスリットダイ先端部での上流端HUおよび下流端HLの基材3との隙間と、塗工液の供給停止タイミングを定性的に図示した場合は、実施の形態1の場合の図3と同じである。 In the case of Embodiment 1 where the gap between the upstream end HU and the downstream end HL at the slit die tip in Embodiment 2 and the supply stop timing of the coating liquid are qualitatively illustrated, This is the same as FIG.
(実施の形態3)
図6と図7は実施の形態3を示す。
(Embodiment 3)
6 and 7 show the third embodiment.
実施の形態1の位置変更部17では、図2(a)(b)に示したようにT2〜T6において、スリットダイ先端部での下流端HLは、T1における下流端HLと同じ位置であって、スリットダイ先端部と基材3の下面との隙間がT2〜T6において同じであった。これに対して実施の形態3では、T5〜T6において、スリットダイ先端部が上流端HUを支点にして下流端HLが、下流端HLと基材3との隙間を広くする方向に回動している点だけが、実施の形態1とは異なる。 In the position changing unit 17 according to the first embodiment, as shown in FIGS. 2A and 2B, in T2 to T6, the downstream end HL at the slit die tip is the same position as the downstream end HL in T1. Thus, the gap between the slit die tip and the lower surface of the substrate 3 was the same in T2 to T6. In contrast, in the third embodiment, at T5 to T6, the downstream end HL rotates in the direction of widening the gap between the downstream end HL and the substrate 3 with the upstream end HU serving as a fulcrum. Only the difference is from the first embodiment.
図6(a)は基材3の幅方向両縁部付近での液溜りの挙動を示し、図6(b)は幅方向中央部での液溜りの挙動を示す。図7は実施の形態3におけるスリットダイ先端部での上流端HUおよび下流端HLの基材3との隙間と、塗工液の供給停止タイミングを示している。 FIG. 6A shows the behavior of the liquid pool in the vicinity of both edges in the width direction of the substrate 3, and FIG. 6B shows the behavior of the liquid pool in the center portion in the width direction. FIG. 7 shows the gap between the upstream end HU and the downstream end HL at the tip end of the slit die in the third embodiment and the supply stop timing of the coating liquid.
図6および図7に示すように、図6(a)T1と図6(b)T1に示す塗工中から、図6(a)T2と図6(b)T2に示すように、スリットダイ先端部の下流端HLを支点として、基材3に対するスリットダイ1の角度を変更することで、スリットダイ先端部での下流端HLの基材3との隙間を変化させず、上流端HUの基材3との隙間を狭くし、その後、塗工液の供給を停止させる。そして更に、図6(a)T5,T6と図6(b)T5,T6に示すように、スリットダイ先端部の上流端HUを支点として、基材3に対するスリットダイの角度を変更することで、スリットダイ先端部での上流端HUの基材3との隙間を変化させずに、下流端HLと基材3との隙間を広くする。 As shown in FIGS. 6 and 7, during the coating shown in FIGS. 6 (a) T1 and 6 (b) T1, as shown in FIGS. 6 (a) T2 and 6 (b) T2, the slit die By changing the angle of the slit die 1 with respect to the substrate 3 with the downstream end HL of the tip as a fulcrum, the gap between the downstream end HL and the substrate 3 at the tip of the slit die is not changed, and the upstream end HU The gap with the base material 3 is narrowed, and then the supply of the coating liquid is stopped. Further, as shown in FIGS. 6 (a) T5 and T6 and FIGS. 6 (b) T5 and T6, the angle of the slit die with respect to the substrate 3 is changed with the upstream end HU of the slit die tip as a fulcrum. The gap between the downstream end HL and the substrate 3 is widened without changing the gap between the upstream end HU and the substrate 3 at the tip of the slit die.
このようにT5〜T6において、スリットダイ先端部での下流端HLと基材3との隙間を広くすることで、スリットダイ吐出口の液溜りが途切れることを促進できるため、幅方向端部付近に比べて幅方向中央部で液溜りが途切れるタイミングが遅れるという挙動を実施の形態1に比べて更に抑制できる。その結果、特に撓みが生じ易い、例えば電池の高容量化において要望される塗工重量の重い塗工条件や肉厚の薄い基材3の場合においても、図13、図14に示したような終端部での直線性が悪化することなく、良好な間欠形状をもつ電池極板が形成できる。 As described above, in T5 to T6, by widening the gap between the downstream end HL and the base material 3 at the slit die tip, it is possible to promote the breakage of the liquid accumulation at the slit die discharge port, so that the vicinity of the width direction end Compared to the first embodiment, it is possible to further suppress the behavior that the timing at which the liquid pool is interrupted in the central portion in the width direction is delayed. As a result, even in the case of a coating condition with a heavy coating weight or a thin base material 3 that is particularly prone to bend, for example, as required for higher battery capacity, as shown in FIGS. A battery electrode plate having a good intermittent shape can be formed without deteriorating the linearity at the end portion.
また、実施の形態3によると、図15(d)(3)および図16(d)(3)に示すような、終端で塗布幅が広がる問題は生じない。 Further, according to the third embodiment, there is no problem that the coating width is widened at the end as shown in FIGS. 15 (d) (3) and 16 (d) (3).
(実施の形態4)
図8は実施の形態4の動作フローを示す。
(Embodiment 4)
FIG. 8 shows an operation flow of the fourth embodiment.
実施の形態2の位置変更部17では、図5(a)(b)に示したようにT2〜T6において、スリットダイ先端部での上流端HUは基材3の下面に当接するとともに、スリットダイ先端部での下流端HLの位置がT1〜T6において同じであった。これに対して実施の形態4では、T5〜T6において、スリットダイ先端部での上流端HUを支点として基材3に対するスリットダイ1の角度を変更することで、下流端HLと基材3との隙間を広くしている点だけが、実施の形態2とは異なる。 In the position changing unit 17 according to the second embodiment, as shown in FIGS. 5A and 5B, at T2 to T6, the upstream end HU at the slit die tip is in contact with the lower surface of the substrate 3, and the slit The position of the downstream end HL at the tip end of the die was the same in T1 to T6. On the other hand, in Embodiment 4, in T5 to T6, the downstream end HL and the base material 3 are changed by changing the angle of the slit die 1 relative to the base material 3 with the upstream end HU at the tip end of the slit die as a fulcrum. The only difference is that the gap is widened.
図8(a)は基材3の幅方向両縁部付近での液溜りの挙動を示し、図8(b)は幅方向中央部での液溜りの挙動を示す。 FIG. 8A shows the behavior of the liquid pool in the vicinity of both edges in the width direction of the substrate 3, and FIG. 8B shows the behavior of the liquid pool in the center portion in the width direction.
このように、実施の形態2の動作フローに加えて、スリットダイ先端部での下流端HLと基材3との隙間を広くすることで、スリットダイ吐出口の液溜りが途切れることを促進できるため、幅方向端部付近に比べて幅方向中央部で液溜りが途切れるタイミングが遅れるという挙動を実施の形態2に比べて更に抑制できる。 As described above, in addition to the operation flow of the second embodiment, the gap between the downstream end HL and the base material 3 at the slit die tip can be widened to promote the interruption of the liquid accumulation at the slit die discharge port. Therefore, the behavior that the timing at which the liquid pool is interrupted at the center in the width direction is delayed as compared with the vicinity of the end in the width direction can be further suppressed as compared with the second embodiment.
この実施の形態4におけるスリットダイ先端部での上流端HUおよび下流端HLの基材3との隙間と、塗工液の供給停止タイミングを定性的に図示した場合は、実施の形態3の場合の図7と同じである。 In the case of Embodiment 3 where the gap between the upstream end HU and the downstream end HL at the slit die tip in Embodiment 4 and the supply stop timing of the coating liquid are qualitatively illustrated, This is the same as FIG.
その結果、特に撓みが生じ易い、例えば電池の高容量化において要望される塗工重量の重い塗工条件や肉厚の薄い基材3の場合においても、図13、図14に示したような終端での直線性が悪化することなく、良好な間欠形状をもつ電池極板が形成できる。また、本実施の形態によると、図15(d)(3)および図16(d)(3)に示すような、終端の塗布幅が広がる問題は生じない。 As a result, even in the case of a coating condition with a heavy coating weight or a thin base material 3 that is particularly prone to bend, for example, as required for higher battery capacity, as shown in FIGS. A battery electrode plate having a good intermittent shape can be formed without deteriorating the linearity at the end. Further, according to the present embodiment, there is no problem that the coating width at the end is widened as shown in FIGS. 15 (d) (3) and 16 (d) (3).
(実施の形態5)
図9は水平に走行する基材3の両面に塗膜を形成する実施の形態5の塗工装置8を示す。
(Embodiment 5)
FIG. 9 shows a coating apparatus 8 according to a fifth embodiment that forms a coating film on both surfaces of a substrate 3 that runs horizontally.
塗工装置8は、巻出機(図示しない)より供給される基材3をバックアップロール18から搬送ロール7の順で搬送され、搬送ロール7以降は一定の速度で水平方向に搬送される。 The coating device 8 transports the base material 3 supplied from an unwinder (not shown) in the order of the backup roll 18 to the transport roll 7, and the transport roll 7 and the subsequent transport are transported in the horizontal direction at a constant speed.
バックアップロール18に対向してスリットダイ2が空間を有して設置されている。このスリットダイ2により基材3の上面に上面塗工部6を形成する。スリットダイ2にはタンク13とポンプ14とバルブ15が、記載の順番で直列に接続されており、塗工液を定量供給することで、スリットダイ2の吐出口より定量吐出され、均一な厚みの塗膜の上面塗工部6を形成する。 The slit die 2 is installed facing the backup roll 18 with a space. The slit die 2 forms an upper surface coating portion 6 on the upper surface of the substrate 3. A tank 13, a pump 14, and a valve 15 are connected in series to the slit die 2 in the order described, and by supplying a constant amount of coating liquid, a fixed amount is discharged from the discharge port of the slit die 2 and has a uniform thickness. The upper surface coating portion 6 of the coating film is formed.
その後、上面塗工部6はバックアップロール18および搬送ロール7によって搬送方向9に向かって搬送される。その後、既に上面に乾燥前の上面塗工部6が形成されている基材3の下面に、実施の形態1と同様の構成で、スリットダイ1とタンク10とポンプ11とバルブ12によって下面塗工部4が形成される。上面塗工部6と下面塗工部4が形成された基材3は、乾燥装置16を通過して塗布された塗工液が乾燥されて、巻取機(図示しない)にて回収される。 Thereafter, the upper surface coating unit 6 is transported in the transport direction 9 by the backup roll 18 and the transport roll 7. Thereafter, the bottom surface of the base material 3 on which the top surface coating portion 6 before drying has already been formed is coated with the bottom surface by the slit die 1, the tank 10, the pump 11, and the valve 12 in the same configuration as in the first embodiment. A work part 4 is formed. In the base material 3 on which the upper surface coating part 6 and the lower surface coating part 4 are formed, the coating liquid applied through the drying device 16 is dried and collected by a winder (not shown). .
ポンプ11およびポンプ14は互いに異なる系統であることが望ましく、またバルブ12およびバルブ15も互いに異なる系統であることが望ましいが、タンク10およびタンク13は同じ系統であっても良い。 The pump 11 and the pump 14 are preferably different systems, and the valve 12 and the valve 15 are preferably different systems. However, the tank 10 and the tank 13 may be the same system.
またバルブ15はスリットダイ2に向かう配管と、タンク13に向かう配管に分岐されており、ポンプ14は連続的かつ定量的に塗工液を送りながら、バルブ15を切り替えることによってスリットダイ2側に向かう塗工液をタンク13側へ循環させ、上面塗工部6を間欠的に形成することができる。 Further, the valve 15 is branched into a pipe toward the slit die 2 and a pipe toward the tank 13, and the pump 14 is switched to the slit die 2 side by switching the valve 15 while feeding the coating liquid continuously and quantitatively. The coating liquid which heads is circulated to the tank 13 side, and the upper surface coating part 6 can be formed intermittently.
間欠塗工時におけるスリットダイ1の先端部での上流端HUおよび下流端HLの基材3との隙間の制御は、前述の実施の形態1〜4に記載と同様に、位置変更部17によって、基材3に対するスリットダイ1の角度を変更することで、スリットダイ先端部での下流端HLと基材3との隙間を変化させず上流端HUと基材3との隙間を狭く、もしくは上流端HUと基材3を接触させる。もしくは更にその後、スリットダイ先端部の上流端HUを支点として基材3に対するスリットダイの角度を変更することで、スリットダイ先端部での上流端HUの基材3との隙間を変化させず、下流端HLと基材3との隙間を広くすることで、図13、図14に示したような終端部での直線性が悪化することなく、図4に示すような良好な間欠形状をもつ電池極板が形成できる。更に、図15(d)(3)および図16(d)(3)に示すような、塗布幅の広がる問題は生じない。 Control of the gap between the upstream end HU and the downstream end HL with the base material 3 at the front end of the slit die 1 during intermittent coating is performed by the position changing unit 17 as described in the first to fourth embodiments. By changing the angle of the slit die 1 with respect to the substrate 3, the gap between the downstream end HL and the substrate 3 at the slit die tip is not changed, and the gap between the upstream end HU and the substrate 3 is narrowed, or The upstream end HU and the base material 3 are brought into contact with each other. Or after that, by changing the angle of the slit die relative to the substrate 3 with the upstream end HU of the slit die tip as a fulcrum, the gap between the slit die tip and the upstream end HU with the substrate 3 is not changed, By widening the gap between the downstream end HL and the base material 3, the linearity at the terminal end as shown in FIGS. 13 and 14 is not deteriorated, and a good intermittent shape as shown in FIG. 4 is obtained. A battery electrode plate can be formed. Furthermore, the problem that the coating width increases as shown in FIGS. 15 (d) (3) and 16 (d) (3) does not occur.
なお、上記の各実施の形態においては、位置変更部17を図3、図7に示したように、スリットダイ1先端部の上流端HUの基材3との隙間を変化させた後のタイミングTsにスリットダイ1への塗工液の供給を停止していたが、図10または図11に示すように、スリットダイ先端部の上流端HUの基材3との隙間を変化させる途中で塗工液の供給を停止させるように位置変更部17を構成した場合においても、同様に間欠部の良好な終端形状が得られている。 In each of the above-described embodiments, the timing after the position changing unit 17 changes the gap between the upstream end HU of the slit die 1 tip and the base material 3 as shown in FIGS. Although supply of the coating liquid to the slit die 1 was stopped at Ts, as shown in FIG. 10 or FIG. 11, the coating was performed in the middle of changing the gap between the upstream end HU of the slit die tip portion and the base material 3. Even in the case where the position changing unit 17 is configured to stop the supply of the working liquid, a good terminal shape of the intermittent part is obtained similarly.
(実施例1)
実施の形態1〜4において、幅1300mmの銅箔の基材3に塗工液のウェット膜厚200μmまたは300μm、塗工長さ1m、未塗工部5の長さ15cm、塗工速度35m/分にて、1000m塗工した場合での下面塗工部4における塗工液尾引き不良発生率についての結果を表1に示す。
(Example 1)
In the first to fourth embodiments, a wet film thickness of 200 μm or 300 μm, a coating length of 1 m, a length of 15 cm of the uncoated portion 5, a coating speed of 35 m / min. Table 1 shows the results regarding the occurrence rate of defective coating liquid tailing in the lower surface coating portion 4 when 1000 m is applied.
ここで、ウェット膜厚200μmの場合は、塗工中のスリットダイ先端部の上流端HUおよび下流端HLの基材3との隙間を200μm、間欠時に狭くした上流端HUの基材3との隙間を30μm、基材3と接触させる場合の隙間は0μmとし、塗工液供給停止後にスリットダイ先端部の下流端HLと基材3との隙間を広くする場合は、隙間を400μmとした。 Here, in the case of a wet film thickness of 200 μm, the gap between the upstream end HU and the downstream end HL of the slit die tip during coating is 200 μm, and the upstream end HU base 3 narrowed intermittently The gap is 30 μm, the gap when contacting the substrate 3 is 0 μm, and when the gap between the downstream end HL of the slit die tip and the substrate 3 is widened after the supply of the coating liquid is stopped, the gap is 400 μm.
ウェット膜厚300μmの場合は、塗工中のスリットダイ先端部の上流端HUおよび下流端HLの基材3との隙間を300μm、間欠時に狭くしたスリットダイ先端部の上流端HUの基材3との隙間を30μm、基材3と接触させる場合の隙間は0μmとし、塗工液供給停止後にスリットダイ先端部の下流端HLと基材3との隙間を広くする場合は、隙間を500μmとした。 In the case of a wet film thickness of 300 μm, the gap between the upstream end HU and the downstream end HL of the slit die tip during coating is 300 μm, and the base 3 of the upstream end HU of the slit die tip that is narrowed intermittently. When the contact with the base material 3 is 0 μm, and when the gap between the downstream end HL of the slit die tip and the base material 3 is widened after the supply of the coating liquid is stopped, the gap is 500 μm. did.
なお、尾引きは塗工厚みが厚くなるほど、塗工速度が速くなるほど発生し易い傾向にある。また、良否判定基準として図14の尾引き長さY=1.5mmを超えるものを不良とした。比較例として、図16(b),図16(c)に示す従来技術で同様に実施した尾引き不良率を表1に合わせて示す。 Note that tailing tends to occur more easily as the coating thickness increases and the coating speed increases. Moreover, the thing exceeding the tailing length Y = 1.5mm of FIG. As a comparative example, Table 1 shows tailing defect ratios similarly performed in the related art shown in FIGS. 16 (b) and 16 (c).
スリットダイ先端部での上流端HUの基材3との隙間を変化させず、下流端HLと基材3との隙間を広くすることで、一定の速度で水平方向搬送中にバックアップロールを用いずに基材3の下面に塗膜を形成する場合でも、基材自身の重量や塗工された塗工液の重量の影響により、搬送中での基材幅方向の撓みが生じ易くなること、および特に基材幅方向中央部が上下方向に不安定な状態で搬送されることにより終端4eにおいて液溜りが途切れて表面張力により縮もうとする挙動に基材3が引き込まれることなく、幅方向にわたり直線性の良好な終端形状を持つ電池極板を得ることができる。 By using a backup roll during horizontal transport at a constant speed by changing the gap between the downstream end HL and the base material 3 without changing the gap between the upstream end HU and the base material 3 at the slit die tip. Even when a coating film is formed on the lower surface of the base material 3 without being bent, it is likely to bend in the width direction of the base material during transportation due to the weight of the base material itself or the weight of the applied coating liquid. In particular, since the central portion in the width direction of the base material is conveyed in an unstable state in the vertical direction, the liquid pool is interrupted at the terminal end 4e and the base material 3 is not drawn into the behavior of trying to shrink due to surface tension. A battery electrode plate having a terminal shape with excellent linearity in the direction can be obtained.
(実施例2)
基材3の両面に塗膜を形成する図9に示した実施の形態5の塗工装置8において、ウェット膜厚を基材3の上面と下面に100μmまたは200μmとしたた他は全て実施例1と同じ条件とした場合の下面塗工部4における塗工液尾引き不良発生率についての結果を表2に示す。
(Example 2)
In the coating apparatus 8 of the fifth embodiment shown in FIG. 9 for forming the coating film on both surfaces of the substrate 3, all the examples except that the wet film thickness is set to 100 μm or 200 μm on the upper surface and the lower surface of the substrate 3 are all examples. Table 2 shows the results of the coating liquid tailing defect occurrence rate in the lower surface coating portion 4 when the same conditions as in Table 1 are used.
ここで、ウェット膜厚100μmの場合は、塗工中のスリットダイ先端部の上流端HUおよび下流端HLの基材3との隙間を100μm、間欠時に狭くしたスリットダイ先端部の上流端HUの基材3との隙間を20μm、基材3と接触させる場合の隙間は0μmとし、塗工液供給停止後にスリットダイ先端部の下流端HLと基材3との隙間を広くする場合は、隙間を300μmとした。また、ウェット膜厚200μmの場合は、塗工中のスリットダイ先端部の上流端HUおよび下流端HLの基材3との隙間を200μm、間欠時に狭くしたスリットダイ先端部の上流端HUの基材3との隙間を20μm、基材3と接触させる場合の隙間は0μmとし、塗工液供給停止後にスリットダイ先端部の下流端HLと基材3との隙間を広くする場合は、隙間を400μmとした。 Here, in the case of a wet film thickness of 100 μm, the gap between the upstream end HU and the downstream end HL of the slit die tip during coating is 100 μm, and the upstream end HU of the slit die tip that is narrowed intermittently When the gap between the base 3 and the base 3 is widened, the gap between the base 3 and the base 3 is 0 μm. Was set to 300 μm. When the wet film thickness is 200 μm, the gap between the upstream end HU and the downstream end HL of the slit die tip during coating is 200 μm, and the base of the upstream end HU of the slit die tip that is narrowed intermittently When the gap between the material 3 and the substrate 3 is increased to 20 μm, the gap when contacting the substrate 3 is 0 μm, and the gap between the downstream end HL of the slit die tip portion and the substrate 3 is widened after the supply of the coating liquid is stopped. The thickness was 400 μm.
(実施例3)
塗工速度を50m/分とした他は、全て実施例1と同じ条件とした場合の下面塗工部4における塗工液尾引き不良発生率についての結果を表3に示す。
(Example 3)
Table 3 shows the results of the coating liquid tailing failure occurrence rate in the lower surface coating portion 4 when all the conditions are the same as in Example 1 except that the coating speed is 50 m / min.
ここで、ウェット膜厚200μmの場合は、塗工中のスリットダイ先端部の上流端HUおよび下流端HLの基材3との隙間を200μm、間欠時に狭くしたスリットダイ先端部の上流端HUの基材3との隙間を30μm、基材3と接触させる場合の隙間は0μmとし、塗工液供給停止後にスリットダイ先端部の下流端HLと基材3との隙間を広くする場合は、隙間を400μmとした。また、ウェット膜厚300μmの場合は、塗工中のスリットダイ先端部の上流端HUおよび下流端HLの基材3との隙間を300μm、間欠時に狭くしたスリットダイ先端部の上流端HUの基材3との隙間を30μm、基材3と接触させる場合の隙間は0μmとし、塗工液供給停止後にスリットダイ先端部の下流端HLと基材3との隙間を広くする場合は、隙間を500μmとした。 Here, when the wet film thickness is 200 μm, the gap between the upstream end HU and the downstream end HL of the slit die tip during coating is 200 μm, and the upstream end HU of the slit die tip is narrowed intermittently. When the gap between the substrate 3 and the substrate 3 is 30 μm, the gap between the substrate 3 and the substrate 3 is 0 μm, and the gap between the downstream end HL of the tip end of the slit die and the substrate 3 is widened after the supply of the coating liquid is stopped. Was 400 μm. When the wet film thickness is 300 μm, the gap between the upstream end HU and the downstream end HL of the slit die tip during coating is 300 μm, and the base of the upstream end HU of the slit die tip is narrowed intermittently. When the gap between the material 3 and the substrate 3 is 30 μm, the gap when contacting the substrate 3 is 0 μm, and the gap between the downstream end HL of the tip end of the slit die and the substrate 3 is widened after the supply of the coating liquid is stopped. The thickness was 500 μm.
(実施例4)
塗工速度を50m/分とした他は、全て実施例2と同じ条件とした場合の下面塗工部4における塗工液尾引き不良発生率についての結果を表4に示す。
Example 4
Table 4 shows the results of the coating liquid tailing failure occurrence rate in the lower surface coating portion 4 when all the conditions were the same as in Example 2 except that the coating speed was 50 m / min.
ここで、ウェット膜厚100μmの場合は、塗工中のスリットダイ先端部の上流端HUおよび下流端HLの基材3との隙間を100μm、間欠時に狭くしたスリットダイ先端部の上流端HUの基材3との隙間を20μm、基材と接触させる場合の隙間は0μmとし、塗工液供給停止後にスリットダイ先端部の下流端HLと基材3との隙間を広くする場合は、隙間を300μmとした。また、ウェット膜厚200μmの場合は、塗工中のスリットダイ先端部の上流端HUおよび下流端HLの基材3との隙間を200μm、間欠時に狭くしたスリットダイ先端部の上流端HUの基材3との隙間を20μm、基材3と接触させる場合の隙間は0μmとし、塗工液供給停止後にスリットダイ先端部の下流端HLと基材3との隙間を広くする場合は、隙間を400μmとした。 Here, in the case of a wet film thickness of 100 μm, the gap between the upstream end HU and the downstream end HL of the slit die tip during coating is 100 μm, and the upstream end HU of the slit die tip that is narrowed intermittently When the gap between the substrate 3 and the substrate 3 is increased to 20 μm, the gap when contacting the substrate is 0 μm, and the gap between the downstream end HL of the slit die tip and the substrate 3 is widened after the supply of the coating liquid is stopped. The thickness was 300 μm. When the wet film thickness is 200 μm, the gap between the upstream end HU and the downstream end HL of the slit die tip during coating is 200 μm, and the base of the upstream end HU of the slit die tip that is narrowed intermittently When the gap between the material 3 and the substrate 3 is increased to 20 μm, the gap when contacting the substrate 3 is 0 μm, and the gap between the downstream end HL of the slit die tip portion and the substrate 3 is widened after the supply of the coating liquid is stopped. The thickness was 400 μm.
本発明は、基材に間欠的に塗膜を形成可能となることから、特に、リチウムイオン二次電池などの高容量化に寄与する。 Since the present invention can form a coating film intermittently on a substrate, it contributes particularly to an increase in capacity of a lithium ion secondary battery or the like.
1,2 スリットダイ
3 基材
4 下面塗工部
5 未塗工部
6 上面塗工部
7 搬送ロール
8 塗工装置
9 基材の搬送方向
10,13 タンク
11,14 ポンプ
12,15 バルブ
16 乾燥装置
17 位置変更部
18 バックアップロール
HU スリットダイ1の先端部の上流端
HL スリットダイ1の先端部の下流端
DESCRIPTION OF SYMBOLS 1, 2 Slit die 3 Base material 4 Lower surface coating part 5 Uncoated part 6 Upper surface coating part 7 Conveyance roll 8 Coating apparatus 9 Substrate conveyance direction 10, 13 Tank 11, 14 Pump 12, 15 Valve 16 Drying Device 17 Position change unit 18 Backup roll HU Upstream end HL of the tip end of the slit die 1 Downstream end of the tip end of the slit die 1
Claims (10)
前記スリットダイの吐出口からの塗工液の停止の前に、
前記スリットダイの先端部の下流端の前記基材との隙間を変化させずに、前記スリットダイの先端部の上流端の前記基材との隙間を狭くする動作を開始または動作を完了し、
この後に前記スリットダイへの塗工液の供給を停止する、
電池極板の製造方法。 With respect to the traveling substrate, the discharge port is intermittently discharged by a slit die arranged opposite to the lower surface of the substrate to repeatedly form the lower surface coated portion and the uncoated portion, A method for producing a battery electrode plate, wherein the substrate coated with the lower surface coating portion is dried by passing through a drying device,
Before stopping the coating liquid from the discharge port of the slit die,
Start or complete the operation to narrow the gap between the upstream end of the slit die tip and the base material without changing the gap with the base material of the downstream end of the slit die tip,
After this, supply of the coating liquid to the slit die is stopped,
Manufacturing method of battery electrode plate.
前記下面塗工部を形成するよりも前に上面に塗工液を塗布して乾燥前の上面塗工部が形成されている、請求項1記載の電池極板の製造方法。 The substrate is
The method for producing a battery electrode plate according to claim 1, wherein an upper surface coating portion before drying is formed by applying a coating liquid on the upper surface before forming the lower surface coating portion.
前記スリットダイの先端部の上流端の前記基材との隙間を変化させずに、前記スリットダイの先端部の下流端の前記基材との隙間を広くすることを特徴とする、
請求項1または2記載の電池極板の製造方法。 After stopping the supply of the coating liquid to the slit die,
Without changing the gap between the upstream end of the slit die and the base material, the gap between the downstream end of the slit die and the base material is widened.
The manufacturing method of the battery electrode plate of Claim 1 or 2.
請求項1〜3の何れかに記載の電池極板の製造方法。 In a state in which the gap between the upstream end of the slit die and the base at the upstream end of the slit die is narrowed without changing the gap between the downstream end of the slit die and the base of the slit die, the tip of the slit die The upstream end of the substrate is brought into contact with the lower surface of the substrate.
The manufacturing method of the battery electrode plate in any one of Claims 1-3.
請求項1〜4のいずれかに記載の電池極板の製造方法。 By changing the angle of the slit die with respect to the base material, the gap with the base material is changed,
The manufacturing method of the battery electrode plate in any one of Claims 1-4.
前記スリットダイの先端部の下流端の前記基材との隙間と上流端の基材との隙間を個別に変更できる位置変更部を設け、
前記位置変更部を、前記スリットダイの吐出口からの塗工液の停止の前に、前記スリットダイの先端部の下流端の前記基材との隙間を変化させずに、前記スリットダイの先端部の上流端の前記基材との隙間を狭くする動作を開始または動作を完了し、この後に前記スリットダイへの塗工液の供給を停止するよう構成した、
電池極板の塗工装置。 With respect to the traveling substrate, the discharge port is intermittently discharged by a slit die arranged opposite to the lower surface of the substrate to repeatedly form the lower surface coated portion and the uncoated portion, In the coating device for the battery electrode plate, the substrate coated with the lower surface coating portion is dried by passing through a drying device.
Provide a position changing unit that can individually change the gap between the base of the downstream end of the slit die and the base of the upstream end,
The front end of the slit die without changing the gap between the downstream end of the front end portion of the slit die and the base material before stopping the coating liquid from the discharge port of the slit die. The operation of narrowing the gap with the base material at the upstream end of the part is started or completed, and thereafter the supply of the coating liquid to the slit die is stopped.
Battery electrode plate coating equipment.
前記下面塗工部を形成するよりも前に前記基材の上面に塗工液を塗布して乾燥前の上面塗工部を形成する第2のスリットダイを設けた、
請求項6記載の電池極板の塗工装置。 The substrate is
Before forming the lower surface coating portion, provided a second slit die that forms the upper surface coating portion before drying by applying a coating liquid on the upper surface of the substrate,
The battery electrode plate coating apparatus according to claim 6.
前記スリットダイへの塗工液の供給を停止させた後に、
前記スリットダイの先端部の上流端の前記基材との隙間を変化させずに、前記スリットダイの先端部の下流端の前記基材との隙間を広くすることを特徴とする、
請求項6または7記載の電池極板の製造方法。 The position changing unit is
After stopping the supply of the coating liquid to the slit die,
Without changing the gap between the upstream end of the slit die and the base material, the gap between the downstream end of the slit die and the base material is widened.
The method for producing a battery electrode plate according to claim 6 or 7.
前記スリットダイの先端部の下流端の前記基材との隙間を変化させずに、前記スリットダイの先端部の上流端の前記基材との隙間を狭くした状態では、前記スリットダイの先端部の上流端を前記基材の下面に接触させることを特徴とする、
請求項6〜8の何れかに記載の電池極板の塗工装置。 The position changing unit is
In a state in which the gap between the upstream end of the slit die and the base at the upstream end of the slit die is narrowed without changing the gap between the downstream end of the slit die and the base of the slit die, the tip of the slit die The upstream end of the substrate is brought into contact with the lower surface of the substrate.
The coating apparatus of the battery electrode plate in any one of Claims 6-8.
前記基材に対する前記スリットダイの角度を変更することで、前記基材との前記隙間を変更することを特徴とする、
請求項6〜9の何れかに記載の電池極板の塗工装置。 The position changing unit is
By changing the angle of the slit die with respect to the base material, the gap with the base material is changed,
The coating apparatus of the battery electrode plate in any one of Claims 6-9.
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WO2024066081A1 (en) * | 2022-09-30 | 2024-04-04 | 广东利元亨智能装备股份有限公司 | Die head apparatus, coating device, and coating method |
CN118287345A (en) * | 2024-06-04 | 2024-07-05 | 新乡华锐锂电新能源股份有限公司 | Diaphragm coating device for sodium ion battery production and coating method thereof |
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