JP2019127619A - Production method of wiring board - Google Patents

Production method of wiring board Download PDF

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JP2019127619A
JP2019127619A JP2018010116A JP2018010116A JP2019127619A JP 2019127619 A JP2019127619 A JP 2019127619A JP 2018010116 A JP2018010116 A JP 2018010116A JP 2018010116 A JP2018010116 A JP 2018010116A JP 2019127619 A JP2019127619 A JP 2019127619A
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metal layer
layer
conductive
resist layer
plating
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秀哉 水野
Hideya Mizuno
秀哉 水野
敏徳 肥田
Toshinori Hida
敏徳 肥田
一範 福永
Kazunori Fukunaga
一範 福永
憲 溝口
Ken Mizoguchi
憲 溝口
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Niterra Co Ltd
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NGK Spark Plug Co Ltd
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Abstract

To provide a production method of a wiring board in which a desired metal layer can be formed on the surface of a to-be-plated insulation board so that a plating jig is not shifted or fallen off from the insulation board even when the contact area of a conducting contact is small.SOLUTION: A production method of a wiring board 1 includes a plating process in which: a groundwork metal layer 7 is formed on the entire surface 3 of an insulation board 2; a pattern resist is added on the layer; an annular resist 10 is arranged so that a needle-like part 25 of a plating conduction jig 23 is not shifted; and a metal layer 19 is deposited by an electrolytic metal plating.SELECTED DRAWING: Figure 3

Description

本発明は、絶縁材からなり、対向する一対の表面を有する絶縁基板の少なくとも一方の前記表面に所望パターンの金属層を形成するための配線基板の製造方法に関する。   The present invention relates to a method of manufacturing a wiring board for forming a metal layer having a desired pattern on at least one surface of an insulating substrate made of an insulating material and having a pair of opposing surfaces.

例えば、上端に逆U字形状のフックを有する左右一対の縦桟材ごとに、複数個ずつの保持部材が取付られ、該保持部材ごとに設けられた絶縁部を兼ねるバネ弾性部によって、上記一対の縦桟材同士の間に垂直姿勢にして保持したプリント回路板の表面に対し、所望の金属膜を被覆可能とするプリント回路板の電解メッキ用治具が提案されている(例えば、特許文献1参照)。
上記電解メッキ用治具を用いた場合、電解メッキ時において、プリント回路板におけるメッキ用電流分布の均一化が向上し、繰り返しメッキ作業を行っても前記保持部材のバネ弾性が失われないため、前記プリント回路板の係脱作業を容易に行うことが可能となる。
For example, a plurality of holding members are attached to each of a pair of left and right vertical beam members having an inverted U-shaped hook at the upper end, and the pair of spring elastic portions also serving as insulating portions provided for each holding member A jig for electrolytic plating of a printed circuit board has been proposed which can coat a desired metal film on the surface of the printed circuit board held in a vertical posture between vertical beams of the above (for example, patent documents 1).
When using the above electroplating jig, during electroplating, the uniformity of the plating current distribution on the printed circuit board is improved, and the spring elasticity of the holding member is not lost even after repeated plating operations. The printed circuit board can be easily engaged and disengaged.

しかし、前記電解メッキ用治具を用いて保持された配線基板の表面に対して電解メッキを行う際に、前記保持治具との導通用接点(接触面積)を小さくすると、上記電解メッキ用治具の導通用接点がずれたり、甚だしくは、該導通用接点が配線基板の表面から外れてメッキ用電流の給電ができなくなる場合があった。一方、前記保持部材との導通用接点を大きくすると、電解メッキ後に配線基板が取り外せなくなる、という問題があった。   However, when the electrolytic plating is performed on the surface of the wiring substrate held using the electrolytic plating jig, if the conductive contact (contact area) with the holding jig is reduced, the electrolytic plating maintenance may be performed. In some cases, the conductive contact of the tool may be displaced, or the conductive contact may be detached from the surface of the wiring board, making it impossible to supply the plating current. On the other hand, if the contact point for conduction with the holding member is increased, there is a problem that the wiring board cannot be removed after electrolytic plating.

特開平5−320994号公報(第1〜5頁、図1〜4)JP-A-5-320994 (pages 1-5, FIGS. 1-4)

本発明は、背景技術で説明した問題点を解決し、導通用接点の接触面積を小さくしても、被メッキ用の絶縁基板からメッキ用治具がずれたり脱落したりせず、該絶縁基板の表面に所望の金属層を形成できる配線基板の製造方法を提供する、ことを課題とする。   The present invention solves the problems described in the background art, and even if the contact area of the conductive contact is reduced, the plating jig does not shift or fall off from the insulating substrate for plating, and the insulating substrate It is an object of the present invention to provide a method of manufacturing a wiring substrate capable of forming a desired metal layer on the surface of

課題を解決するための手段および発明の効果Means for Solving the Problems and Effects of the Invention

本発明は、前記課題を解決するため、導通用接点を包囲するように環状などのレジスト層を配線基板の表面に形成する、ことに着想して成されたものである。
即ち、本発明による配線基板の製造方法(請求項1)は、絶縁材からなり、対向する一対の表面を有する絶縁基板の少なくとも一方の前記表面に所望パターンの金属層を形成する配線基板の製造方法であって、上記絶縁基板の表面全体に下地金属層を形成する下地金属層形成工程と、前記下地金属層の上面のうち、上記金属層を形成すべき位置を除いた下地金属層の上面に、前記金属層を形成するための金属層用レジスト層と、平面視が環状、U字形状、あるいは、C字形状を呈する導通部用レジスト層と、を形成するレジスト層形成工程と、前記導通部用レジスト層に囲まれた上記下地金属層の上面に、導通治具を接触させ、該導通治具を通じて電流を上記下地金属層に給電し、且つ所定の電解メッキ液中に上記絶縁基板を浸漬することにより、上記金属層用レジスト層および上記導通部用レジスト層に覆われていない下地金属層の上面に、電解金属メッキによる金属層を析出させるメッキ工程と、を含む、ことを特徴とする。
In order to solve the above-mentioned problems, the present invention was conceived in consideration of forming a resist layer such as an annular shape on the surface of the wiring substrate so as to surround the conductive contact.
That is, the method for manufacturing a wiring board according to the present invention (claim 1) is a method for manufacturing a wiring board having a desired pattern on at least one surface of an insulating substrate made of an insulating material and having a pair of opposing surfaces. A method of forming a base metal layer over the entire surface of the insulating substrate, and a top surface of the base metal layer excluding the position where the metal layer is to be formed among the top surfaces of the base metal layer And a resist layer forming step of forming a metal layer resist layer for forming the metal layer, and a conductive layer resist layer exhibiting an annular, U-shaped, or C-shaped planar view. A conductive jig is brought into contact with the upper surface of the base metal layer surrounded by the conductive portion resist layer, current is supplied to the base metal layer through the conductive jig, and the insulating substrate is immersed in a predetermined electrolytic plating solution. To immerse Ri, the upper surface of the metal layer resist layer and the underlying metal layer not covered with the resist layer for the conductive portion, comprising a plating step of depositing a metal layer by electroless metal plating, and characterized in that.

前記配線基板の製造方法によれば、以下の効果(1),(2)が得られる。
(1)前記メッキ工程は、前記導通部用レジスト層に囲まれた下地金属層の上面に、前記導通治具を接触させた状態で行われるので、該メッキ工程中において、メッキ液の流動などによる圧力などを受けても、前記絶縁基板から導通治具が過度にずれ動いたり、上記導通治具が脱落する恐れがなく、所要の電解メッキを確実に行うことができる。
(2)前記メッキ工程では、前記導通治具が比較的少ない接触面積で前記絶縁基板の下地金属層に対し給電でき、且つ該メッキ工程後における配線基板と導通治具とが一体になる事態を防止できると共に、該配線基板から導通治具の取り外しも容易に行えるので、上記メッキ工程の処理効率を高めることが可能となる。
According to the method of manufacturing the wiring board, the following effects (1) and (2) can be obtained.
(1) The plating step is performed in a state in which the conductive jig is in contact with the upper surface of the base metal layer surrounded by the conductive portion resist layer. There is no risk of the conductive jig shifting excessively from the insulating substrate or the conductive jig coming off even when receiving pressure or the like, and the required electrolytic plating can be reliably performed.
(2) In the plating step, the conduction jig can supply power to the base metal layer of the insulating substrate with a relatively small contact area, and the wiring board and the conduction jig after the plating step are integrated. In addition to the prevention of the problem, since the conductive jig can be easily removed from the wiring board, the processing efficiency of the plating process can be enhanced.

尚、前記絶縁基板は、セラミック(例えば、アルミナや窒化アルミニウムなど)、あるいは樹脂(例えば、ポリイミドやエポキシ系など)からなる。該絶縁基板における前記一対の表面とは、相対的な呼称であって、例えば、一方を表面と称し、且つ他方を裏面と称することもできる。
また、前記金属層は、例えば、銅、銀、ニッケル、または金などからなる。
更に、前記下地メッキ層は、前記金属層を電解メッキによって析出するための電極であり、例えば、無電解メッキやスパッタリングなどによって形成される。
また、前記金属層用レジスト層および導通部用レジスト層は、例えば、樹脂フィルムの被覆(ラミネート)、あるいは、フォトリソグラフィー技術による樹脂層のパターニングによって形成される。
The insulating substrate is made of ceramic (for example, alumina or aluminum nitride) or resin (for example, polyimide or epoxy). The pair of surfaces in the insulating substrate is a relative name, and for example, one may be referred to as a surface and the other may be referred to as a back surface.
The metal layer is made of, for example, copper, silver, nickel, or gold.
Furthermore, the base plating layer is an electrode for depositing the metal layer by electrolytic plating, and is formed by, for example, electroless plating, sputtering or the like.
The metal layer resist layer and the conductive portion resist layer are formed, for example, by coating (laminating) a resin film or patterning of the resin layer by photolithography.

更に、前記導通部用レジスト層は、前記導通治具の不用意なずれを防ぐため、該導通治具と下地金属層との接触部を囲うものであり、平面視のパターンが環状(島状:円形(リング形)、長円形、楕円形、角形など)、U字形状、またはC字形状などを呈する。該導通部用レジスト層の内側には、前記導通部用レジスト層に囲まれた直径、長径、または幅が約3mm以下である前記下地金属層が位置している。
また、前記導通部用レジスト層は、主に、前記絶縁基板における製品領域を除いた耳部に形成される。
加えて、前記単一の針状部を有する導通治具は、例えば、前記絶縁基板を電解メッキ液中に浸漬して保持する金属製の枠材(電極治具)に、バネ部分の基端側を介して突設されている。一方、前記一対の対称な針状部を有する導通治具は、基部側と、バネ部および2つの針状部を有する独立したピンチ状あるいはトング状の金具とからなる。
Furthermore, the conductive layer resist layer encloses the contact portion between the conductive jig and the underlying metal layer in order to prevent the inadvertent displacement of the conductive jig, and the pattern in plan view is annular (island shape) : Presents a circular shape (ring shape), an oval shape, an oval shape, a square shape, etc., a U shape, a C shape, or the like. The underlying metal layer having a diameter, a major diameter, or a width of about 3 mm or less surrounded by the conductive layer resist layer is located inside the conductive layer resist layer.
Further, the conductive layer resist layer is mainly formed on an ear portion excluding a product region in the insulating substrate.
In addition, the conduction jig having the single needle-like portion is, for example, a base end of a spring portion in a metal frame member (electrode jig) for immersing and holding the insulating substrate in an electrolytic plating solution. It projects from the side. On the other hand, the conduction jig having the pair of symmetrical needle-like parts is composed of the base side and an independent pinch-like or tongue-like metal fitting having a spring part and two needle-like parts.

また、本発明には、前記メッキ工程の後に、前記金属層用レジスト層および前記導通部用レジスト層を剥離して除去するレジスト層剥離工程と、前記金属層に覆われていない前記下地金属層を除去するエッチング工程と、を有している、配線基板の製造方法(請求項2)も含まれる。
これによれば、前記メッキ工程の後において、製品として不要な前記各レジスト層と、前記金属層に覆われていない前記下地金属層とが除去されるので、前記絶縁基板の表面に所望の金属層を精度良く確実に形成することができる。従って、前記効果(1)、(2)を確実に奏することが可能となる。
The present invention also includes a resist layer peeling step for peeling off and removing the metal layer resist layer and the conductive portion resist layer after the plating step, and the base metal layer not covered with the metal layer. And the etching step of removing the wiring substrate.
According to this, after the plating step, the resist layers unnecessary as a product and the underlying metal layer not covered by the metal layer are removed, so that the metal desired on the surface of the insulating substrate is removed. The layer can be formed accurately and reliably. Therefore, it is possible to reliably achieve the effects (1) and (2).

更に、本発明には、前記導通部用レジスト層の厚みは、少なくとも50μm以上である、配線基板の製造方法(請求項3)も含まれる。
これによれば、前記導通部用レジスト層に囲まれた前記下地金属層の上面に接触している導通治具が、絶縁基板に対し不用意にずれたり、該絶縁基板を脱落させることがないので、前記効果(1)を確実に得ることが可能となる。
尚、前記導通部用レジスト層の厚みが50μm未満になると、後述する導通治具の針状部が、該導通部用レジスト層を不用意に乗り越え得るので、前記範囲としたものである。上記厚みの上限値は、前記メッキ工程により形成する金属層の厚みよりも大きい厚みを有するように設定される。
Furthermore, the present invention also includes a method of manufacturing a wiring board (Claim 3), wherein the thickness of the conductive layer resist layer is at least 50 μm or more.
According to this, the conduction jig in contact with the upper surface of the base metal layer surrounded by the conductive layer resist layer does not inadvertently shift with respect to the insulating substrate or drop off the insulating substrate. Therefore, the effect (1) can be obtained with certainty.
When the thickness of the conductive portion resist layer is less than 50 μm, the needle-like portion of the conductive jig to be described later can inadvertently ride over the conductive portion resist layer. The upper limit of the thickness is set to have a thickness greater than the thickness of the metal layer formed in the plating step.

加えて、本発明には、前記メッキ工程は、前記絶縁基板における一方の表面に形成された下地金属層の上面に基端側の弾性により押し付けられる単一の針状部を有するか、あるいは、上記絶縁基板の両表面に形成された下地金属層ごとの上面に個別に接触する一対の対称な針状部を有する前記導通治具を用いて行われる、配線基板の製造方法(請求項4)も含まれる。
これによれば、前記導通治具は、単一または一対の対称な前記針状部を介して、前記導通部用レジスト層に囲まれた下地金属層の上面に最小限の接触面積により、メッキ用電流を給電できるので、前記効果(2)を確実に得ることができる。
In addition, in the present invention, the plating step may have a single needle-like portion pressed by the elasticity of the proximal end on the upper surface of the base metal layer formed on one surface of the insulating substrate, or A method of manufacturing a wiring board, which is performed using the conduction jig having a pair of symmetrical needle-like portions individually contacting the upper surface of each of the base metal layers formed on both surfaces of the insulating substrate. Also included.
According to this, the conduction jig is plated with a minimum contact area on the upper surface of the base metal layer surrounded by the resist layer for the conduction part through the single or pair of symmetrical needle-like parts. Since the working current can be supplied, the effect (2) can be obtained reliably.

(A)〜(C)は絶縁基板に給電する導通治具の形態を示す概略図。(A)-(C) are schematic which shows the form of the conduction | electrical_connection jig which electrically feeds to an insulated substrate. (A)〜(D)は本発明における各製造工程を示す概略図。(A)-(D) are schematic which shows each manufacturing process in this invention. (a)は図1(D)の製造工程を示す斜視図、(A)〜(D)は図1(D)に続く各製造工程を示す概略図。(A) is a perspective view which shows the manufacturing process of FIG.1 (D), (A)-(D) is the schematic which shows each manufacturing process following FIG.1 (D). (A)〜(C)は異なる形態の導通部用レジスト層を設けた図3(a)と同様な斜視図。(A)-(C) are the perspective views similar to Fig.3 (a) which provided the resist layer for conduction | electrical_connection parts of a different form.

以下において、本発明を実施するための形態について説明する。
図1(A)〜(C)は、絶縁基板2に給電する導通治具23,30,33を示す概略図である。
図1(A)に示すように、絶縁基板2は、例えば、アルミナ(セラミック)からなる板状体である。該絶縁基板2は、平面視で対向する矩形状の表面3および裏面(表面)4と、これらの周辺間に位置する四辺の側面5とを有し、平面視で中央側となる製品領域と、該製品領域の周囲(同図中の破線の外側)に、平面視が矩形枠状の耳部6を有している。
図示のように、前記絶縁基板2は、その四辺あるいは三辺を金属製の保持部材27における一対の縦片28間の凹溝29内に挿入して垂直姿勢に保持されており、予め、後述する下地金属層(7)が形成された耳部6の表面3に対し、複数の導通治具23が接触している。該導通治具23は、側面視が逆V字形状のバネ部24と、該バネ部24の先端側から水平状に延びた針状部25とを備えている。該針状部25を絶縁基板2に接触させた状態で、後述するメッキ工程が行われる。
Hereinafter, modes for carrying out the present invention will be described.
FIGS. 1A to 1C are schematic views showing the conductive jigs 23, 30, 33 for supplying power to the insulating substrate 2. FIG.
As shown in FIG. 1A, the insulating substrate 2 is, for example, a plate made of alumina (ceramic). The insulating substrate 2 has a rectangular front surface 3 and a back surface (front surface) 4 facing each other in plan view, and side surfaces 5 of four sides located between the peripheries thereof, and a product region that is on the center side in plan view The ear 6 having a rectangular frame shape in plan view is provided around the product area (outside the broken line in the same figure).
As illustrated, the insulating substrate 2 is held in a vertical posture by inserting its four sides or three sides into the recessed groove 29 between the pair of vertical pieces 28 of the holding member 27 made of metal. A plurality of conductive jigs 23 are in contact with the surface 3 of the ear 6 on which the underlying metal layer (7) is formed. The conduction jig 23 includes a spring portion 24 having an inverted V-shape in a side view, and a needle portion 25 horizontally extending from the tip end of the spring portion 24. In a state in which the needle-like portion 25 is in contact with the insulating substrate 2, a plating process described later is performed.

一方、図1(B)に示すように、前記と同じ絶縁基板2の四辺あるいは三辺を、複数の導通治具30により保持するようにしても良い。該導通治具30は、基部31と、該基部31から左右対称に延びた弾性を有する一対のバネ部32とを有し、該バネ部32の先端ごとから左右一対の針状部25が互いに接近するように延びている。該針状部25が絶縁基板2の表面3および裏面4の両面に接触し、且つ該絶縁基板2を保持した状態で、後述するメッキ工程を行っても良い。上記導通治具30は、絶縁基板2の保持手段と、当該絶縁基板2への給電手段とを兼ねている。
更に、前記絶縁基板2の上辺側のみを複数の前記保持治具30により垂直姿勢で保持し、該絶縁基板2における左右の側辺側ごとに、図1(C)に示すように、予め、表面3および裏面4に形成された下地金属層(7)同士の間を電気的に接続する複数の導通治具33を挟んだ状態で、後述するメッキ工程を行っても良い。
On the other hand, as shown in FIG. 1 (B), the four sides or three sides of the same insulating substrate 2 as described above may be held by a plurality of conductive jigs 30. The conduction jig 30 includes a base portion 31 and a pair of elastic spring portions 32 that extend symmetrically from the base portion 31, and the pair of left and right needle-like portions 25 are connected to each other from the tip of the spring portion 32. It extends to approach. In a state where the needle-like portion 25 is in contact with both the front surface 3 and the back surface 4 of the insulating substrate 2 and the insulating substrate 2 is held, a plating process described later may be performed. The conduction jig 30 serves both as a holding means for the insulating substrate 2 and a feeding means for the insulating substrate 2.
Further, only the upper side of the insulating substrate 2 is held in a vertical posture by the plurality of holding jigs 30, and for each of the left and right side sides of the insulating substrate 2, as shown in FIG. The plating step described later may be performed in a state in which a plurality of conductive jigs 33 electrically connecting between the underlying metal layers (7) formed on the front surface 3 and the back surface 4 are sandwiched.

前記導通治具33は、C字形状の基部34と、該基部34から対称に延びた弾性を有する一対のバネ部35とを有し、該バネ部35の先端側ごとに、前記絶縁基板2の表面3および裏面4に接触する一対の針状部25を個別に有している。
尚、上記導通治具33は、前記保持部材27により保持され、且つ上辺側の表面3側に前記導通治具23の針状部25が接触している前記絶縁基板2に対し、該絶縁基板2における左右の側辺側や下辺側をクリップ状に挟み込んでも良い。
The conductive jig 33 has a C-shaped base 34 and a pair of elastic spring portions 35 extending symmetrically from the base 34, and the insulating substrate 2 is provided on each of the tip sides of the spring portions 35. A pair of needle-like parts 25 in contact with the front surface 3 and the back surface 4 are separately provided.
The conductive jig 33 is held by the holding member 27 and the insulating substrate 2 is in contact with the needle-like portion 25 of the conductive jig 23 on the surface 3 side on the upper side. The left and right side sides and the lower side in 2 may be clipped.

以下において、本発明による配線基板1の製造方法を、前記導通治具23を用いた場合について説明する。
予め、図2(A)に示すように、アルミナからなり、対向する表面3および裏面4と、これらの四辺に位置する側面5と、該側面5側ごとに位置する耳部6とを有する絶縁基板2を用意した。尚、図示の側面5は、絶縁基板2の上辺である。
上記絶縁基板2は、単層のグリーンシート(図示せず)を焼成した形態、あるいは、複数のグリーンシートに未焼成のビア導体や内層配線(何れも図示せず)を形成し、前記グリーンシートを積層し且つ圧着した後、焼成したものである。
Hereinafter, a method of manufacturing the wiring board 1 according to the present invention will be described in the case of using the conduction jig 23.
As shown in FIG. 2 (A) in advance, it is insulating and is made of alumina and has insulating surfaces 3 and back surfaces 4, side surfaces 5 located on these four sides, and ears 6 located on each side surface 5 side. Substrate 2 was prepared. Note that the illustrated side surface 5 is the upper side of the insulating substrate 2.
The insulating substrate 2 has a form obtained by firing a single layer green sheet (not shown), or an unfired via conductor and an inner layer wiring (neither is shown) formed on a plurality of green sheets. Are laminated and pressure-bonded, and then fired.

先ず、図2(B)に示すように、絶縁基板2の表面3の全面に厚みが約5000Å〜1μmの下地金属層7を形成する下地金属層形成工程を行った。かかる工程は、前記表面3全体に対し、無電解銅メッキを施すことにより行われた。尚、前記工程は、蒸着材料として銅を用いたスパッタリングによって行っても良い。
次いで、図2(C)に示すように、上記の下地金属層7の上面全体に対し、厚みが約140〜160μmの感光性樹脂(例えば、日立化成工業(株)の感光性フィルム:Photocastなど)8を塗布して形成した。更に、該感光性樹脂8に対し、例えば、紫外線の照射(露光)と現像(エッチング)とを順次施すレジスト層形成工程を行った。
First, as shown in FIG. 2B, the base metal layer forming step of forming the base metal layer 7 having a thickness of about 5000 Å to 1 μm on the entire surface 3 of the insulating substrate 2 was performed. This process was performed by applying electroless copper plating to the whole of the surface 3. The above process may be performed by sputtering using copper as a deposition material.
Next, as shown in FIG. 2C, a photosensitive resin having a thickness of about 140 to 160 μm (for example, a photosensitive film of Hitachi Chemical Co., Ltd .: Photocast, etc.) with respect to the entire upper surface of the above-mentioned base metal layer 7 ) 8 to form. Furthermore, a resist layer forming step was performed, in which, for example, irradiation (exposure) of ultraviolet light and development (etching) were sequentially performed on the photosensitive resin 8.

その結果、図2(D)、図3(a)に示すように、前記下地金属層7の上面には、追って形成すべき金属層(22)を形成すべき位置を除いた位置に所望パターンを有する複数の金属層用レジスト層9が形成されていた。同時に、前記耳部6の表面3側に位置する下地絶縁層7の上面に平面視が環状(リング状)である複数の導通部用レジスト層10が形成されていた。該導通部用レジスト層10の厚みtは、50μm以上であり、且つ当該導通部用レジスト層10の内側11には、平面視の内径(直径)が3mm以下である平面視が円形の前記下地金属層7が露出していた。   As a result, as shown in FIG. 2 (D) and FIG. 3 (a), a desired pattern is formed on the upper surface of the base metal layer 7 except the position where the metal layer 22 to be formed later is to be formed. A plurality of metal layer resist layers 9 having the above were formed. At the same time, on the upper surface of the base insulating layer 7 located on the surface 3 side of the ear portion 6, a plurality of conductive portion resist layers 10 having a ring shape in plan view are formed. The thickness t of the conductive portion resist layer 10 is 50 μm or more, and the inner side 11 of the conductive portion resist layer 10 is the base having a circular plan view whose inner diameter (diameter) in plan view is 3 mm or less. The metal layer 7 was exposed.

次に、図3(A)中の矢印で示すように、上記導通部用レジスト層10ごとの内側11に位置する下地金属層7に対し、前記導通治具23の針状部25を接触(接触面積;1mm2以下、例えば、約0.9mm2)させた。
かかる状態で、絶縁基板2を上記導通部用レジスト層10と共に、図示しない電解メッキ液中に浸漬し、且つ導通治具23の針状部25から前記下地金属層7の上面に対し、メッキ用電流を給電する電解銅メッキを施すメッキ工程を行った。
その結果、図3(B)に示すように、前記金属層用レジスト層9と導通部用レジスト層10とを除いた前記下地金属層7の上面全体に、銅からなる金属層19がほぼ均一な厚みで形成されていた。この間において、前記導通治具23の針状部25の先端は、1mm2以下小さい接触面積で、前記導通部用レジスト層10に囲まれた下地金属層7の上面に接触していると共に、径方向のずれが最大でも3mm未満の範囲内に抑制されていた。
Next, as shown by the arrow in FIG. 3A, the needle-like portion 25 of the conduction jig 23 is brought into contact with the underlying metal layer 7 located on the inner side 11 of each of the conductive portion resist layers 10 ( Contact area: 1 mm 2 or less, for example, about 0.9 mm 2 ).
In this state, the insulating substrate 2 is immersed in the electrolytic plating solution (not shown) together with the conductive portion resist layer 10, and the needle portion 25 of the conductive jig 23 is used to plate the upper surface of the base metal layer 7. A plating process was performed to apply electrolytic copper plating to supply current.
As a result, as shown in FIG. 3B, the metal layer 19 made of copper is substantially uniform over the entire top surface of the base metal layer 7 excluding the metal layer resist layer 9 and the conductive portion resist layer 10. It was formed with a certain thickness. During this time, the tip of the needle-like portion 25 of the conduction jig 23 is in contact with the upper surface of the base metal layer 7 surrounded by the conductive portion resist layer 10 with a small contact area of 1 mm 2 or less. The deviation of the direction was suppressed within the range of less than 3 mm at the maximum.

更に、前記導通治具23を取り外した前記絶縁基板2の表面3に対し、エッチング液(例えば、炭酸ナトリウム水溶液)を接触させるレジスト層剥離工程を行った。その結果、図3(C)に示すように、前記金属層用レジスト層9および導通部用レジスト層10が、上記表面3の下地金属層7および金属層19から剥離された。同時に、これらの跡には、底面に前記下地層7が露出する所定形状の凹部20,21が形成されていた。尚、耳部6の金属層19には、前記導通治具23の針状部25を抜き出した跡の細長い逆円錐形状の凹み26が残されていた。
そして、前記金属層19の表層側と、上記凹部20,21の底面に位置する下地金属層7とに対し、エッチング液(例えば、 メルテックス(株)製:エンストリップSなど)を接触(噴射または浸漬)させるエッチング工程を行った。
Furthermore, on the surface 3 of the insulating substrate 2 from which the conduction jig 23 was removed, a resist layer peeling step was performed in which an etching solution (for example, an aqueous solution of sodium carbonate) was brought into contact. As a result, as shown in FIG. 3C, the metal layer resist layer 9 and the conductive portion resist layer 10 were peeled off from the base metal layer 7 and the metal layer 19 of the surface 3. At the same time, concave portions 20 and 21 having a predetermined shape in which the base layer 7 is exposed are formed on the bottom surface of these marks. In the metal layer 19 of the ear portion 6, there is left an elongated reverse conical recess 26 of a trace of the needle-like portion 25 of the conduction jig 23.
Then, an etching solution (for example, Meltex Co., Ltd. product: Enstrip S, etc.) is brought into contact with the surface metal of the metal layer 19 and the underlying metal layer 7 located on the bottoms of the recesses 20 and 21 Alternatively, an etching process is performed.

その結果、図3(D)に示すように、前記金属層19の表層側と、凹部20,21の底面に位置していた下地金属層7とがほぼ均一な厚みで除去された。同時に、前記絶縁基板2の表面3側における製品領域には、銅からなる所望パターンの金属層22が形成され、且つ前記耳部6の表面3側の金属層22内には、平面視が前記導通部用レジスト層10に倣った円環状の表面3が露出していた。
以上のような製造方法によって、図3(D)に示す配線基板1が得られた。
尚、前記金属層22の表面に対し、電解メッキや無電解メッキによって、ニッケル膜および防錆用の金膜を被覆した後、前記耳部6を前記破線に沿って除去しても良い。
As a result, as shown in FIG. 3D, the surface metal of the metal layer 19 and the base metal layer 7 located on the bottoms of the recesses 20 and 21 were removed with a substantially uniform thickness. At the same time, a metal layer 22 of a desired pattern made of copper is formed in the product region on the surface 3 side of the insulating substrate 2, and in the metal layer 22 on the surface 3 side of the ear portion 6, the plan view is The annular surface 3 following the conductive layer resist layer 10 was exposed.
The wiring board 1 shown in FIG. 3D was obtained by the above manufacturing method.
In addition, after covering the surface of the metal layer 22 with a nickel film and a gold film for rust prevention by electrolytic plating or electroless plating, the ear portion 6 may be removed along the broken line.

以上において説明した配線基板1の製造方法では、前記メッキ工程が、前記導通部用レジスト層10に囲まれた下地金属層7の上面に、前記導通治具23の針状部25を接触させた状態で行われるので、該メッキ工程中においてメッキ液の流動などによる圧力などを受けても、前記絶縁基板2から導通治具23が過度にずれ動いたり、上記導通治具23が脱落することなく、所要の電解銅メッキを確実に行えた。
更に、前記メッキ工程では、前記導通治具23の針状部25が比較的少ない接触面積で前記絶縁基板2の下地金属層7に対して給電でき、且つ該メッキ工程後における配線基板1と導通治具23とが一体になる事態を防止できると共に、該配線基板1から上記導通治具23の取り外しも容易に行えたので、上記メッキ工程の処理効率を高めることもできた。
従って、前記配線基板1の製造方法によれば、前記効果(1)、(2)を得られることが確認された。
In the method of manufacturing the wiring board 1 described above, in the plating step, the needle-like portion 25 of the conduction jig 23 is in contact with the upper surface of the base metal layer 7 surrounded by the conduction portion resist layer 10. Therefore, the conduction jig 23 does not move excessively from the insulating substrate 2 and the conduction jig 23 does not fall off even when subjected to pressure or the like due to the flow of a plating solution during the plating process. The required electrolytic copper plating could be performed reliably.
Further, in the plating step, the needle-like portion 25 of the conduction jig 23 can supply power to the base metal layer 7 of the insulating substrate 2 with a relatively small contact area, and is electrically connected to the wiring substrate 1 after the plating step. Since the situation where the jig 23 was integrated with the jig 23 can be prevented, and the conduction jig 23 can be easily removed from the wiring board 1, the processing efficiency of the plating step can be enhanced.
Therefore, according to the method of manufacturing the wiring board 1, it was confirmed that the effects (1) and (2) can be obtained.

尚、前記レジスト層形成工程において、前記導通部用レジスト層10に替え、図4(A)に示すように、平面視が長円形(環状)を呈し、且つ厚みが50μm以上の導通部用レジスト層12を形成しても良い。該導通用レジスト層12は、その外形と相似形である長円形の内側13を有している。該内側13の長径は、3mm以下であり、その導通用レジスト層12で囲まれた絶縁基板2の上面には、前記導通治具23の針状部25が接触する下地金属層7が露出している。かかる下地金属層7上では、前記針状部25の先端が最大でも3mm未満の範囲でのみ径方向のずれが許容されているに過ぎない。
また、上記導通部用レジスト層12は、平面視が楕円形状を呈し、且つ長径が3mm以下である前記楕円形と相似形の内側を有する形態としても良い。
In the resist layer forming step, instead of the conductive portion resist layer 10, as shown in FIG. 4A, the conductive portion resist exhibits an oval (annular) shape in plan view and has a thickness of 50 μm or more. The layer 12 may be formed. The conductive resist layer 12 has an oblong inner side 13 which is similar to the outer shape thereof. The major diameter of the inner side 13 is 3 mm or less, and on the upper surface of the insulating substrate 2 surrounded by the conductive resist layer 12, the underlying metal layer 7 with which the needle portion 25 of the conductive jig 23 contacts is exposed. ing. On the base metal layer 7, the deviation in the radial direction is only permitted in the range of less than 3 mm at most at the tip of the needle-like portion 25.
The conductive layer resist layer 12 may have an elliptical shape in plan view and an inner side similar to the elliptical shape having a major axis of 3 mm or less.

更に、前記導通部用レジスト層10,12に替え、図4(B)に示すように、平面視がU字形状を呈し、且つ厚みが50μm以上の導通部用レジスト層14を形成しても良い。該導通用レジスト層14は、平面視の外形がU字形状で、且つ図示の左右(長手)方向が3mm以下の内側15を有している。該内側15の開口部は、前記絶縁基板2における表面3の中央側(側面5と反対側)に開口している。これにより、当該内側15の開口部から、前記針状部25の先端が抜け出して、前記絶縁基板2から導通治具23が過度にずれ動いたり、不用意に脱落する事態を予防することができる。
尚、上記導通部用レジスト層14は、平面視がコ形状(チャンネル形状、U字形状)を呈する形態としても良い。
Furthermore, in place of the conductive layer resist layers 10 and 12, as shown in FIG. 4B, a conductive portion resist layer 14 having a U shape in plan view and a thickness of 50 μm or more may be formed. good. The conductive resist layer 14 has an inner side 15 whose outer shape in plan view is U-shaped and whose left and right (longitudinal) directions are 3 mm or less. The opening portion of the inner side 15 is opened at the center side (opposite to the side surface 5) of the surface 3 of the insulating substrate 2. Thus, it is possible to prevent the conductive jig 23 from being shifted excessively from the insulating substrate 2 or inadvertently falling off when the tip of the needle-like portion 25 comes out from the opening of the inner side 15. .
The conductive layer resist layer 14 may have a U-shape (channel shape or U-shape) in a plan view.

加えて、前記各形態に替え、図4(C)に示すように、平面視がC字形状を呈し、且つ厚みが50μm以上の導通部用レジスト層16を形成しても良い。該導通部用レジスト層16は、平面視が円形(リング形、環状)の一部に、幅の狭い開口部18を介して、ほぼ円形に近似する平面視が円弧形状の内側17を有している。該内側17の直径(内径)も3mm以下とされている。
上記開口部18は、図示のように、前記絶縁基板2の側面5側に開口していなければ良く、例えば、絶縁基板2における表面3の中央側に上記開口部18が開口していても良い。また、図示の開口部18を通じて、前記導通治具23の針状部25を前記レジスト層16の内側17に容易に挿入させることも可能である。
尚、前記開口部18は、図4(C)において上下対称に一対を設けても良い。
また、平面視が長円形の前記導通部用レジスト層12、あるいは平面視が楕円形の導通部用レジスト層の一部に、前記開口部18を設けた形態としても良い。
In addition, as shown in FIG. 4C, the conductive layer resist layer 16 may have a C-shape in plan view and a thickness of 50 μm or more, as shown in FIG. 4C. The conductive layer resist layer 16 has an inner side 17 having an arc shape in plan view that approximates a substantially circular shape through a narrow opening 18 in a part of a circle (ring shape, annular shape) in plan view. ing. The diameter (inner diameter) of the inner side 17 is also 3 mm or less.
The opening 18 does not have to open on the side 5 side of the insulating substrate 2 as shown in the drawing, and for example, the opening 18 may be opened on the center side of the surface 3 of the insulating substrate 2 . It is also possible to easily insert the needle-like portion 25 of the conduction jig 23 into the inner side 17 of the resist layer 16 through the opening 18 shown.
The openings 18 may be provided in a pair symmetrically in the vertical direction in FIG. 4 (C).
Alternatively, the opening 18 may be provided in part of the conductive portion resist layer 12 having an oval shape in plan view or the conductive portion resist layer having an elliptical shape in plan view.

本発明は、以上において説明した形態に限定されるものではない。
例えば、前記絶縁基板2の表面3および裏面4の両面に対し、前記各工程を順次施し、且つ前記メッキ工程では、複数個の前記導通治具30を用いることによって、表面3および裏面4に互いに異なるパターンの前記金属層22を有する配線基板(1)を製造するようにしても良い。
また、上記導通治具30と共に、複数個の前記導通治具33を併用しても良い。
The present invention is not limited to the embodiment described above.
For example, the respective steps are sequentially performed on both the front surface 3 and the back surface 4 of the insulating substrate 2, and in the plating step, a plurality of the conduction jigs 30 are used to form the front surface 3 and the back surface 4. A wiring board (1) having the metal layers 22 of different patterns may be manufactured.
In addition to the conduction jig 30, a plurality of the conduction jigs 33 may be used in combination.

更に、環状の前記導通部用レジスト層10,12は、平面視が矩形(正方形または長方形)状や、五角形以上の正多角形あるいは変形多角形を呈し、それぞれにおいて外形や内形と相似形状の内側を有する形態としても良い。
加えて、前記メッキ工程において、電解銀メッキを施すことによって、表面3および裏面4の少なくとも一方に銀からなる所望パターンの金属層が形成された配線基板(1)を製造するようにしても良い。
Furthermore, the annular conductive resist layer 10 has a rectangular (square or rectangular) shape, a regular polygon with pentagon or more, or a deformed polygon in plan view, and each has a shape similar to the outer shape or the inner shape. It is good also as a form which has an inner side.
In addition, in the plating step, by performing electrolytic silver plating, a wiring substrate (1) in which a metal layer having a desired pattern made of silver is formed on at least one of the front surface 3 and the back surface 4 may be manufactured. .

本発明によれば、導通用接点の接触面積を小さくしても、被メッキ用の絶縁基板からメッキ用治具がずれたり脱落したりせず、該絶縁基板の表面に所望の金属層を形成できる配線基板の製造方法を確実に提供できる。   According to the present invention, even if the contact area of the conductive contact is reduced, the plating jig does not shift or fall off from the insulating substrate for plating, and a desired metal layer is formed on the surface of the insulating substrate. It is possible to reliably provide a method for manufacturing a wiring board that can be used.

1……………………………配線基板
2……………………………絶縁基板
3……………………………表面
4……………………………裏面(表面)
7……………………………下地金属層
9……………………………金属層用レジスト層
10,12,14,16…導通部用レジスト層
19,22…………………金属層
23,30,33…………導通治具
25…………………………針状部
t……………………………導通部用レジスト層の厚み
1 …………………………… Wiring board 2 …………………………… Insulating board 3 ……………………………… Surface 4 …………………… ......... Back side (front side)
7... Base metal layer 9 ........................ Resist layer for metal layer 10, 12, 14, 16... Resist layer for conductive part 19, 22. ... Metal layer 23, 30, 33 .......... Conducting jig 25 .......... Needle-like part t ........................ Resist layer for conducting part Thickness of

Claims (4)

絶縁材からなり、対向する一対の表面を有する絶縁基板の少なくとも一方の前記表面に所望パターンの金属層を形成する配線基板の製造方法であって、
上記絶縁基板の表面全体に下地金属層を形成する下地金属層形成工程と、
上記下地金属層の上面のうち、上記金属層を形成すべき位置を除いた下地金属層の上面に、前記金属層を形成するための金属層用レジスト層と、平面視が環状、U字形状、あるいは、C字形状を呈する導通部用レジスト層と、を形成するレジスト層形成工程と、
上記導通部用レジスト層に囲まれた上記下地金属層の上面に、導通治具を接触させ、該導通治具を通じて電流を上記下地金属層に給電し、且つ所定の電解メッキ液中に上記絶縁基板を浸漬することにより、上記金属層用レジスト層および上記導通部用レジスト層に覆われていない下地金属層の上面に、電解金属メッキによる金属層を析出させるメッキ工程と、を含む、
ことを特徴とする配線基板の製造方法。
A method of manufacturing a wiring substrate, comprising forming a metal layer of a desired pattern on at least one of the insulating substrates comprising an insulating material and having a pair of opposed surfaces,
A base metal layer forming step of forming a base metal layer on the entire surface of the insulating substrate;
A metal layer resist layer for forming the metal layer on the upper surface of the base metal layer except for the position where the metal layer is to be formed among the upper surface of the base metal layer, an annular U-shape in plan view Or a resist layer forming step of forming a C-shaped conductive portion resist layer;
A conductive jig is brought into contact with the upper surface of the base metal layer surrounded by the conductive portion resist layer, current is supplied to the base metal layer through the conductive jig, and the insulation is formed in a predetermined electrolytic plating solution. And D. a plating step of depositing a metal layer by electrolytic metal plating on the upper surface of the base metal layer not covered with the resist layer for metal layer and the resist layer for conductive part by immersing the substrate.
A method of manufacturing a wiring board characterized by
前記メッキ工程の後に、前記金属層用レジスト層および前記導通部用レジスト層を剥離して除去するレジスト層剥離工程と、前記金属層に覆われていない前記下地金属層を除去するエッチング工程と、を有している、
ことを特徴とする請求項1に記載の配線基板の製造方法。
After the plating step, a resist layer peeling step for peeling off and removing the metal layer resist layer and the conductive portion resist layer; an etching step for removing the base metal layer not covered with the metal layer; have,
The method for manufacturing a wiring board according to claim 1.
前記導通部用レジスト層の厚みは、少なくとも50μm以上である、
ことを特徴とする請求項1または2に記載の配線基板の製造方法。
The conductive part resist layer has a thickness of at least 50 μm or more.
The method for manufacturing a wiring board according to claim 1, wherein:
前記メッキ工程は、前記絶縁基板における一方の表面に形成された下地金属層の上面に基端側の弾性により押し付けられる単一の針状部を有するか、あるいは、上記絶縁基板の両表面に形成された下地金属層ごとの上面に個別に接触する一対の対称な針状部を有する前記導通治具を用いて行われる、
ことを特徴とする請求項1乃至3の何れか一項に記載の配線基板の製造方法。
The plating step has a single needle-like portion pressed by the elasticity of the base end on the upper surface of the base metal layer formed on one surface of the insulating substrate, or formed on both surfaces of the insulating substrate Using the conductive jig having a pair of symmetrical needle-like portions individually contacting the upper surface of each of the formed underlying metal layers,
A method of manufacturing a wiring board according to any one of claims 1 to 3, wherein the method comprises:
JP2018010116A 2018-01-25 2018-01-25 Production method of wiring board Ceased JP2019127619A (en)

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