JP2019104988A - 改善された分割されたovjpプリントバー - Google Patents
改善された分割されたovjpプリントバー Download PDFInfo
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- JP2019104988A JP2019104988A JP2018227748A JP2018227748A JP2019104988A JP 2019104988 A JP2019104988 A JP 2019104988A JP 2018227748 A JP2018227748 A JP 2018227748A JP 2018227748 A JP2018227748 A JP 2018227748A JP 2019104988 A JP2019104988 A JP 2019104988A
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- DIVZFUBWFAOMCW-UHFFFAOYSA-N 4-n-(3-methylphenyl)-1-n,1-n-bis[4-(n-(3-methylphenyl)anilino)phenyl]-4-n-phenylbenzene-1,4-diamine Chemical compound CC1=CC=CC(N(C=2C=CC=CC=2)C=2C=CC(=CC=2)N(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C=C(C)C=CC=2)=C1 DIVZFUBWFAOMCW-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
- B41J2/04—Ink jet characterised by the jet generation process generating single droplets or particles on demand
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/145—Arrangement thereof
- B41J2/155—Arrangement thereof for line printing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J25/00—Actions or mechanisms not otherwise provided for
- B41J25/304—Bodily-movable mechanisms for print heads or carriages movable towards or from paper surface
- B41J25/308—Bodily-movable mechanisms for print heads or carriages movable towards or from paper surface with print gap adjustment mechanisms
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J25/00—Actions or mechanisms not otherwise provided for
- B41J25/304—Bodily-movable mechanisms for print heads or carriages movable towards or from paper surface
- B41J25/308—Bodily-movable mechanisms for print heads or carriages movable towards or from paper surface with print gap adjustment mechanisms
- B41J25/3086—Bodily-movable mechanisms for print heads or carriages movable towards or from paper surface with print gap adjustment mechanisms with print gap adjustment means between the print head and its carriage
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J25/00—Actions or mechanisms not otherwise provided for
- B41J25/304—Bodily-movable mechanisms for print heads or carriages movable towards or from paper surface
- B41J25/316—Bodily-movable mechanisms for print heads or carriages movable towards or from paper surface with tilting motion mechanisms relative to paper surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
- B41J3/54—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed with two or more sets of type or printing elements
- B41J3/543—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed with two or more sets of type or printing elements with multiple inkjet print heads
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/20—Modules
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/321—Inverted OLED, i.e. having cathode between substrate and anode
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
本願は、その開示内容の全体を参照によって援用する、2017年12月12日出願の米国特許仮出願第62/597,605号の非仮出願であって、それらに対する優先権の利益を主張し、2018年5月1日出願の米国特許出願第15/968,009号に関する。
他の材料との組合せ
電荷輸送層は、伝導性ドーパントでドープされ、電荷キャリアの密度を大きく変え、それによりその伝導性を変えることとなる。伝導性は、マトリックス材料中の電荷キャリアを生成することで、又はドーパントのタイプに応じて増加され、半導体のフェルミ準位における変化も達成することができる。正孔輸送層は、p型伝導性ドーパントでドープされることができ、n型伝導性ドーパントは、電子輸送層中に用いられる。
HIL/HTL:
EBL:
ホスト:
HBL:
ETL:
電荷発生層(CGL)
Claims (10)
- 有機蒸気ジェット(OVJP)堆積のためのプリントバーであって、前記プリントバーが、
複数のn個のプリントヘッドセグメントであって、前記複数のプリントヘッドセグメントのそれぞれが、OVJPプリントヘッドを含む前記複数のn個のプリントヘッドセグメントと;
複数の距離センサであって、前記複数の距離センサのそれぞれが、前記プリントバーの下に配置されている基板と前記複数のプリントヘッドセグメントの少なくとも1つの部分との間の距離を測定するように構成される前記複数の距離センサと;
前記複数の距離センサの1つ以上によって測定された前記基板と前記プリントバーとの間の1つ以上の距離に基づいて、前記複数のプリントヘッドセグメントの1つ以上の位置及び向きの少なくとも1つを調節するように構成される複数のn+1個以下のアクチュエータと、
を含むことを特徴とするプリントバー。 - 前記プリントバーが、n個のプリントヘッドセグメントのためのn+1個以下の距離センサを含む請求項1に記載のプリントバー。
- 前記プリントバーが、n個のプリントヘッドセグメントのための2n+2個以下の距離センサを含む請求項1に記載のプリントバー。
- 前記複数のアクチュエータの各アクチュエータが、前記複数のプリントヘッドセグメントの少なくとも2つの前記位置及び向きの少なくとも1つを制御するように接続及び構成される請求項1に記載のプリントバー。
- 前記複数のプリントヘッドセグメントの各プリントヘッドセグメントの前記位置及び向きの両方が、各プリントヘッドセグメントに隣接する前記複数のアクチュエータの2つのアクチュエータによって、それぞれの動作範囲内で決定される請求項1に記載のプリントバー。
- 前記プリントバーが操作されて、前記基板上に材料を堆積するときに、前記複数のプリントヘッドセグメントが、前記基板に対する前記プリントバーの動作方向に垂直な方向に、2列で配列されている請求項1に記載のプリントバー。
- 前記2列の前記複数のプリントヘッドセグメントが互いにずれ、第1の列における第1の複数のプリントヘッドが、第2の列における第2の複数のプリントヘッドから水平にずれている請求項6に記載のプリントバー。
- 前記複数のアクチュエータの少なくとも1つが、前記第1の列における前記第1の複数のプリントヘッドの1つのプリントヘッドの後部コーナー及び前記第2の列における前記第2の複数のプリントヘッドの他のプリントヘッドの前部コーナーに動作を伝達する請求項7に記載のプリントバー。
- 前記第1の列の前記第1の複数のプリントヘッドと関連されている前記複数のセンサのそれぞれが、前記複数のアクチュエータの別の1つと関連される請求項7に記載のプリントバー。
- 前記複数のプリントヘッドセグメントが交互に設けられた配置を有し、第1のプリントヘッドセグメントが第2のプリントヘッドセグメントの先を行き、前記第2のプリントヘッドセグメントが前記第1のプリントヘッドセグメントの後に続く請求項1に記載のプリントバー。
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US16/184,105 US10998531B2 (en) | 2017-12-12 | 2018-11-08 | Segmented OVJP print bar |
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US10818840B2 (en) * | 2017-05-05 | 2020-10-27 | Universal Display Corporation | Segmented print bar for large-area OVJP deposition |
AU2020345729B2 (en) * | 2019-09-13 | 2023-06-15 | Memjet Technology Limited | Printhead module having through-slots for supplying power and data |
US11903302B2 (en) | 2020-12-16 | 2024-02-13 | Universal Display Corporation | Organic vapor jet printing system |
JP2023005558A (ja) * | 2021-06-29 | 2023-01-18 | セイコーエプソン株式会社 | 記録装置 |
JP2023013473A (ja) * | 2021-07-16 | 2023-01-26 | セイコーエプソン株式会社 | 記録装置 |
US20230357918A1 (en) * | 2022-05-09 | 2023-11-09 | Universal Display Corporation | Organic vapor jet printing system |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003308024A (ja) * | 2002-04-08 | 2003-10-31 | Lg Electronics Inc | インクジェット方式のディスプレイパネル製造装置及び製造方法 |
JP2005307353A (ja) * | 2005-04-07 | 2005-11-04 | Seiko Epson Corp | 膜形成装置、電子装置、電気光学装置、及び電子機器 |
JP2007256312A (ja) * | 2006-03-20 | 2007-10-04 | Toppan Printing Co Ltd | カラーフィルタの製造方法、有機エレクトロルミネッセンス素子の製造方法及びこれに用いるインクジェット塗工装置 |
JP2010217391A (ja) * | 2009-03-16 | 2010-09-30 | Toppan Printing Co Ltd | インクジェットパターン形成装置及びカラーフィルタの製造方法及び有機機能性素子の製造方法 |
JP2011126082A (ja) * | 2009-12-16 | 2011-06-30 | Seiko Epson Corp | 描画装置および描画装置の駆動制御方法 |
WO2012124629A1 (ja) * | 2011-03-15 | 2012-09-20 | シャープ株式会社 | 蒸着装置、蒸着方法、及び有機el表示装置の製造方法 |
JP2014140810A (ja) * | 2013-01-23 | 2014-08-07 | Ulvac Japan Ltd | インクジェット装置および液滴測定方法 |
US8915575B1 (en) * | 2013-06-21 | 2014-12-23 | Eastman Kodak Company | Staggered printhead printer with contoured media guide |
US20150140832A1 (en) * | 2013-11-15 | 2015-05-21 | Universal Display Corporation | High vacuum oled deposition source and system |
JP2015110277A (ja) * | 2013-12-06 | 2015-06-18 | ブラザー工業株式会社 | インクジェットヘッド及びインクジェットプリンタ |
JP2017103213A (ja) * | 2015-10-12 | 2017-06-08 | ユニバーサル ディスプレイ コーポレイション | 超純粋ガス環境において気相から多層有機薄膜をプリンティングするための装置及び方法 |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4769292A (en) | 1987-03-02 | 1988-09-06 | Eastman Kodak Company | Electroluminescent device with modified thin film luminescent zone |
GB8909011D0 (en) | 1989-04-20 | 1989-06-07 | Friend Richard H | Electroluminescent devices |
US5703436A (en) | 1994-12-13 | 1997-12-30 | The Trustees Of Princeton University | Transparent contacts for organic devices |
US5707745A (en) | 1994-12-13 | 1998-01-13 | The Trustees Of Princeton University | Multicolor organic light emitting devices |
US5844363A (en) | 1997-01-23 | 1998-12-01 | The Trustees Of Princeton Univ. | Vacuum deposited, non-polymeric flexible organic light emitting devices |
US5834893A (en) | 1996-12-23 | 1998-11-10 | The Trustees Of Princeton University | High efficiency organic light emitting devices with light directing structures |
US6091195A (en) | 1997-02-03 | 2000-07-18 | The Trustees Of Princeton University | Displays having mesa pixel configuration |
US6013982A (en) | 1996-12-23 | 2000-01-11 | The Trustees Of Princeton University | Multicolor display devices |
US6303238B1 (en) | 1997-12-01 | 2001-10-16 | The Trustees Of Princeton University | OLEDs doped with phosphorescent compounds |
US6337102B1 (en) | 1997-11-17 | 2002-01-08 | The Trustees Of Princeton University | Low pressure vapor phase deposition of organic thin films |
US6087196A (en) | 1998-01-30 | 2000-07-11 | The Trustees Of Princeton University | Fabrication of organic semiconductor devices using ink jet printing |
US6097147A (en) | 1998-09-14 | 2000-08-01 | The Trustees Of Princeton University | Structure for high efficiency electroluminescent device |
US6294398B1 (en) | 1999-11-23 | 2001-09-25 | The Trustees Of Princeton University | Method for patterning devices |
US6755518B2 (en) * | 2001-08-30 | 2004-06-29 | L&P Property Management Company | Method and apparatus for ink jet printing on rigid panels |
US7071615B2 (en) | 2001-08-20 | 2006-07-04 | Universal Display Corporation | Transparent electrodes |
US7431968B1 (en) | 2001-09-04 | 2008-10-07 | The Trustees Of Princeton University | Process and apparatus for organic vapor jet deposition |
US20030230980A1 (en) | 2002-06-18 | 2003-12-18 | Forrest Stephen R | Very low voltage, high efficiency phosphorescent oled in a p-i-n structure |
US7279704B2 (en) | 2004-05-18 | 2007-10-09 | The University Of Southern California | Complexes with tridentate ligands |
US20070076040A1 (en) * | 2005-09-29 | 2007-04-05 | Applied Materials, Inc. | Methods and apparatus for inkjet nozzle calibration |
US7968146B2 (en) | 2006-11-01 | 2011-06-28 | The Trustees Of Princeton University | Hybrid layers for use in coatings on electronic devices or other articles |
US20080102223A1 (en) | 2006-11-01 | 2008-05-01 | Sigurd Wagner | Hybrid layers for use in coatings on electronic devices or other articles |
KR101833658B1 (ko) | 2008-05-07 | 2018-02-28 | 더 트러스티즈 오브 프린스턴 유니버시티 | 전자 장치들 또는 다른 물품들 위의 코팅들에 사용하기 위한 혼성 층들 |
WO2010127328A2 (en) * | 2009-05-01 | 2010-11-04 | Kateeva, Inc. | Method and apparatus for organic vapor printing |
US20110149000A1 (en) * | 2009-12-23 | 2011-06-23 | Ulvac, Inc. | Inkjet printhead module with adjustable alignment |
KR101879805B1 (ko) * | 2012-01-20 | 2018-08-17 | 삼성디스플레이 주식회사 | 박막 증착 장치 및 방법 |
KR102052069B1 (ko) | 2012-11-09 | 2019-12-05 | 삼성디스플레이 주식회사 | 유기층 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
US11220737B2 (en) * | 2014-06-25 | 2022-01-11 | Universal Display Corporation | Systems and methods of modulating flow during vapor jet deposition of organic materials |
US20170229663A1 (en) | 2016-02-09 | 2017-08-10 | Universal Display Corporation | Organic electroluminescent materials and devices |
US9643405B1 (en) * | 2016-08-01 | 2017-05-09 | Xerox Corporation | System and method for aligning images on media or platens |
-
2018
- 2018-11-08 US US16/184,105 patent/US10998531B2/en active Active
- 2018-12-05 JP JP2018227748A patent/JP7152944B2/ja active Active
- 2018-12-06 EP EP18210722.7A patent/EP3498882B1/en active Active
- 2018-12-06 EP EP20155632.1A patent/EP3666923A1/en active Pending
- 2018-12-12 CN CN201811520612.8A patent/CN110010798B/zh active Active
- 2018-12-12 KR KR1020180160159A patent/KR102658289B1/ko active IP Right Grant
- 2018-12-12 CN CN202211687524.3A patent/CN115835746A/zh active Pending
-
2021
- 2021-04-13 US US17/228,745 patent/US20210234139A1/en active Pending
-
2022
- 2022-09-30 JP JP2022157557A patent/JP2023011564A/ja active Pending
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003308024A (ja) * | 2002-04-08 | 2003-10-31 | Lg Electronics Inc | インクジェット方式のディスプレイパネル製造装置及び製造方法 |
JP2005307353A (ja) * | 2005-04-07 | 2005-11-04 | Seiko Epson Corp | 膜形成装置、電子装置、電気光学装置、及び電子機器 |
JP2007256312A (ja) * | 2006-03-20 | 2007-10-04 | Toppan Printing Co Ltd | カラーフィルタの製造方法、有機エレクトロルミネッセンス素子の製造方法及びこれに用いるインクジェット塗工装置 |
JP2010217391A (ja) * | 2009-03-16 | 2010-09-30 | Toppan Printing Co Ltd | インクジェットパターン形成装置及びカラーフィルタの製造方法及び有機機能性素子の製造方法 |
JP2011126082A (ja) * | 2009-12-16 | 2011-06-30 | Seiko Epson Corp | 描画装置および描画装置の駆動制御方法 |
WO2012124629A1 (ja) * | 2011-03-15 | 2012-09-20 | シャープ株式会社 | 蒸着装置、蒸着方法、及び有機el表示装置の製造方法 |
JP2014140810A (ja) * | 2013-01-23 | 2014-08-07 | Ulvac Japan Ltd | インクジェット装置および液滴測定方法 |
US8915575B1 (en) * | 2013-06-21 | 2014-12-23 | Eastman Kodak Company | Staggered printhead printer with contoured media guide |
US20150140832A1 (en) * | 2013-11-15 | 2015-05-21 | Universal Display Corporation | High vacuum oled deposition source and system |
JP2015110277A (ja) * | 2013-12-06 | 2015-06-18 | ブラザー工業株式会社 | インクジェットヘッド及びインクジェットプリンタ |
JP2017103213A (ja) * | 2015-10-12 | 2017-06-08 | ユニバーサル ディスプレイ コーポレイション | 超純粋ガス環境において気相から多層有機薄膜をプリンティングするための装置及び方法 |
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US10998531B2 (en) | 2021-05-04 |
EP3666923A1 (en) | 2020-06-17 |
JP7152944B2 (ja) | 2022-10-13 |
EP3498882A1 (en) | 2019-06-19 |
US20190181390A1 (en) | 2019-06-13 |
CN115835746A (zh) | 2023-03-21 |
KR20190070302A (ko) | 2019-06-20 |
EP3498882B1 (en) | 2020-06-10 |
CN110010798B (zh) | 2023-02-07 |
JP2023011564A (ja) | 2023-01-24 |
US20210234139A1 (en) | 2021-07-29 |
CN110010798A (zh) | 2019-07-12 |
KR102658289B1 (ko) | 2024-04-16 |
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