JP2019104884A - Cured product, optical element, optical instrument, and method of producing optical element - Google Patents
Cured product, optical element, optical instrument, and method of producing optical element Download PDFInfo
- Publication number
- JP2019104884A JP2019104884A JP2017239953A JP2017239953A JP2019104884A JP 2019104884 A JP2019104884 A JP 2019104884A JP 2017239953 A JP2017239953 A JP 2017239953A JP 2017239953 A JP2017239953 A JP 2017239953A JP 2019104884 A JP2019104884 A JP 2019104884A
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- Prior art keywords
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- meth
- acryloyloxy
- cured product
- optical element
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- 230000003287 optical effect Effects 0.000 title claims abstract description 118
- 238000000034 method Methods 0.000 title description 29
- 239000000463 material Substances 0.000 claims abstract description 54
- 150000001875 compounds Chemical class 0.000 claims abstract description 51
- -1 Acryloyloxymethyl group Chemical group 0.000 claims description 90
- 239000000758 substrate Substances 0.000 claims description 41
- 239000011521 glass Substances 0.000 claims description 33
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 27
- 238000000465 moulding Methods 0.000 claims description 19
- 125000001424 substituent group Chemical group 0.000 claims description 14
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 6
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 claims description 6
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 claims description 5
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 5
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- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
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- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
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- 229910052717 sulfur Inorganic materials 0.000 claims description 4
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- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 3
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 3
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- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 3
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
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- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 2
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Abstract
Description
本発明は、屈折率の分散特性及び2次分散特性(θg,F)が高い化合物を用いた硬化物、光学素子及び光学機器に関する。 The present invention relates to a cured product, an optical element and an optical apparatus using a compound having high refractive index dispersion characteristics and secondary dispersion characteristics (θg, F).
一般に、硝材(ガラス材料)や有機樹脂等からなる光学材料は、短波長側になるにつれ徐々にその屈折率が高くなる。この屈折率の波長分散性を表す指標として、アッベ数(分散特性)(νd)や2次分散特性(θg,F)等が挙げられる。このアッベ数やθg,F値は、それぞれの光学材料固有の値であるが、多くの場合、ある一定の範囲内に収まっている。図2は、従来の光学材料(硝材及び有機材料)の2次分散特性とアッベ数との関係を示す図である。 Generally, the refractive index of an optical material made of a glass material (glass material), an organic resin or the like gradually increases as the wavelength becomes shorter. The Abbe number (dispersion characteristic) (ν d ), the second-order dispersion characteristic (θg, F), and the like can be given as an index indicating the wavelength dispersion of the refractive index. The Abbe number and the θg and F values are values unique to the respective optical materials, but in many cases, they fall within a certain range. FIG. 2 is a view showing the relationship between the secondary dispersion characteristics of the conventional optical material (glass material and organic material) and the Abbe number.
屈折光学系においては、分散特性の異なる硝材を適宜組み合わせることによって色収差を減らすことが可能である。例えば、望遠鏡等の対物レンズでは分散の小さい硝材を正レンズ、分散の大きい硝材を負レンズとして、これらを組み合わせて用いることで軸上に現れる色収差を補正している。但し、レンズの構成、枚数が制限される場合や使用される硝材が限られている場合等では、色収差を十分に補正することが困難となる場合がある。このような課題を解決する方法の一つとして、異常分散特性を有するガラス材料を活用する方法があり、この方法を利用した光学素子類の設計が行われている。 In the refractive optical system, it is possible to reduce the chromatic aberration by appropriately combining glass materials having different dispersion characteristics. For example, in an objective lens such as a telescope, a chromatic aberration appearing on the axis is corrected by using a glass material having a small dispersion as a positive lens and a glass material having a large dispersion as a negative lens in combination. However, when the lens configuration and the number of lenses are limited or when the glass material to be used is limited, it may be difficult to sufficiently correct the chromatic aberration. As one of the methods for solving such problems, there is a method of utilizing a glass material having anomalous dispersion characteristics, and design of optical elements using this method is carried out.
また、色収差補正機能に優れ、その形状が非球面形状等である光学素子を製造する場合、硝材のみを材料として用いるより、球面ガラス等の硝材の上に有機材料を成形する等の方法が知られている。この方法を用いると、量産性や成形性、形状の自由度、軽量性に優れる光学素子を製造することができるという利点がある。しかし、従来の有機材料の光学特性は、図2に示すように限られた一定の範囲内(2次分散特性[θg,F]が0.700以下)に収まっており、特異な分散特性を示す有機材料は非常に少ない。 In addition, when manufacturing an optical element that is excellent in the function of correcting chromatic aberration and whose shape is aspheric or the like, a method is known in which an organic material is formed on a glass material such as spherical glass rather than using only a glass material. It is done. When this method is used, there is an advantage that an optical element excellent in mass productivity, moldability, shape freedom, and lightness can be manufactured. However, as shown in FIG. 2, the optical characteristics of the conventional organic material fall within a limited fixed range (second-order dispersion characteristics [θg, F] of 0.700 or less), and the unique dispersion characteristics Very little organic material is shown.
特許文献1は、スルホン(メタ)アクリレートを有し2次分散特性(高θg,F特性)を有する化合物及びこの化合物を用いた光学素子を提案している。 Patent Document 1 proposes a compound having a sulfone (meth) acrylate and having a secondary dispersion property (high θg, F property) and an optical element using this compound.
特許文献2は、含ヘテロ芳香族化合物が汎用の有機材料だけでなく特許文献1よりも高い2次分散特性を有していることが提案されている。 Patent Document 2 proposes that the heteroaromatic compound has not only a general-purpose organic material but also secondary dispersion characteristics higher than Patent Document 1.
しかしながら、特許文献1に示された有機材料は、従来の汎用有機材料よりはθg,F値は高いが、ガラス基材と有機材料の密着性が低いため成形時に割れが発生していた。また、特許文献2に示された有機材料は、θg,F値は非常に高いが、その一方で透過率が非常に低い。 However, although the organic materials disclosed in Patent Document 1 have θg and F values higher than those of conventional general-purpose organic materials, the adhesion between the glass substrate and the organic material is low, and therefore cracking occurred during molding. The organic material disclosed in Patent Document 2 has very high θg and F values, but has very low transmittance.
本発明は、以上に述べた背景技術に鑑みてなされたものであり、屈折率の分散特性(アッベ数(νd))及び2次分散特性(θg,F)が高く、内部透過率が高い硬化物及びこの硬化物を用いた光学素子等を提供するものである。 The present invention has been made in view of the background art described above, and has high refractive index dispersion characteristics (Abbe number ( d d )) and second-order dispersion characteristics (θg, F) and high internal transmittance. The present invention provides a cured product, an optical element using the cured product, and the like.
本発明の硬化物は、下記の一般式(1)で表わされる化合物が重合若しくは共重合している、又は下記の一般式(1)で表される化合物が高分子材料に分散していることを特徴とする。 In the cured product of the present invention, the compound represented by the following general formula (1) is polymerized or copolymerized, or the compound represented by the following general formula (1) is dispersed in a polymer material It is characterized by
(一般式(1)中、R1及びR2は、下記の一般式(2)乃至(5)から選ばれる一つであり、それぞれ同じであっても異なっていても良い。 (In General Formula (1), R 1 and R 2 are one selected from the following General Formulas (2) to (5), and they may be the same or different from each other.
本発明の光学素子は、上記の硬化物が成形されていることを特徴とする。 The optical element of the present invention is characterized in that the above-mentioned cured product is formed.
本発明の光学機器は、上記の光学機器を有することを特徴とする。 An optical apparatus of the present invention includes the above-described optical apparatus.
本発明の化合物は、上記の一般式(1)で表されることを特徴とする。 The compound of the present invention is characterized by being represented by the above general formula (1).
本発明の光学素子の製造方法は、基材上又は基材の間に、上記の硬化物を設ける工程と、前記硬化物を成形する工程と、を有することを特徴とすることを特徴とする。 The method for producing an optical element according to the present invention is characterized by comprising the step of providing the above-mentioned cured product on a substrate or between the substrates, and the step of molding the cured product. .
本発明によれば、屈折率の分散特性(アッベ数(νd))及び2次分散特性(θg,F)が高く、透過率特性をもつ硬化物を提供することができる。 According to the present invention, it is possible to provide a cured product having high transmittance characteristics and high dispersion characteristics (Abbe number (( d )) and secondary dispersion characteristics (θg, F) of refractive index.
以下、本発明を詳細に説明する。 Hereinafter, the present invention will be described in detail.
[光学組成物、化合物]
まず本発明の光学用組成物について説明する。本明細書において、光学用組成物とは、未硬化の樹脂を硬化して硬化物にする前における、未硬化の化合物と添加物とを含む組成物を言う。本実施形態の光学用組成物は、少なくとも下記の一般式(1)で表わされる化合物を含むことを特徴とする。
[Optical composition, compound]
First, the optical composition of the present invention will be described. In the present specification, the optical composition refers to a composition including an uncured compound and an additive before the uncured resin is cured into a cured product. The optical composition of the present embodiment is characterized by containing at least a compound represented by the following general formula (1).
一般式(1)で表される化合物において、R1、R2は、下記一般式(2)乃至(5)から選ばれるいずれか一つの置換基であることが好ましく、それぞれ同じであっても異なっていても良い。芳香族置換基のオルト位に水素以外の置換基があると屈折率特性が低下し、さらに他の材料に対する相溶性が光学用組成物の状態で高くかつ硬化物の状態では密着力が向上するため、これらの置換基が好ましい。 In the compound represented by the general formula (1), R 1 and R 2 are preferably any one substituent selected from the following general formulas (2) to (5), and each of them may be the same. It may be different. The presence of a substituent other than hydrogen at the ortho position of the aromatic substituent lowers the refractive index characteristics, and further improves the compatibility with other materials in the state of the optical composition and improves the adhesion in the state of the cured product Therefore, these substituents are preferable.
一般式(2)乃至(5)中、Z1乃至Z4は水素、炭素、酸素、硫黄、窒素、又はハロゲンを結合原子とする分子量1以上200未満の置換基であって、それぞれ同じであっても異なっていても良い。aは1又は2であり、aが2の場合はZ1、Z3、Z4は同じであっても異なっていても良い。bは1乃至3から選ばれるいずれかの整数であり、bが2又は3の場合、Z2は同じであっても異なっていても良い。 In the general formulas (2) to (5), Z 1 to Z 4 each represents a substituent having a molecular weight of 1 or more and less than 200, each of which has hydrogen, carbon, oxygen, sulfur, nitrogen, or halogen as a bonding atom. Or even different. a is 1 or 2, and when a is 2, Z 1 , Z 3 and Z 4 may be the same or different. b is any integer selected from 1 to 3, and when b is 2 or 3, Z 2 may be the same or different.
Z1乃至Z4の分子量が大きくなると光学性能が低下し、また、製造時の精製工程で結晶化できなくなり、光学用材料としての純度まで向上させることが難しくなる。従って、Z1乃至Z4は分子量1以上200未満の置換基であることが好ましい。分子量1以上200未満の置換基で分子量が大きい置換基を選択する場合、硬化物の光学性能を維持するためには、前記一般式(1)の純度や残留溶剤を高度に制御することが好ましい。Z1乃至Z4は、製造上の難易性を考慮すると、水素原子、メチル基、エチル基、イソプロピル基、クロロメチル基、ジクロロメチル基、トリクロロメチル基、フルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、メトキシ基、エトキシ基、イソプロポキシ基、クロロメチルオキシ基、ジクロロメチルオキシ基、トリクロロメチルオキシ基、フルオロメチルオキシ基、ジフルオロメチルオキシ基、トリフルオロメチルオキシ基、メチルチオ基、エチルチオ基、プロピルチオ基、ジメチルアミノ基、ジエチルアミノ基、ジプロピルアミノ基、(メタ)アクリロイルオキシメチル基、2−(メタ)アクリロイルオキシエトキシメチル基、3−(メタ)アクリロイルオキシプロポキシメチル基、3−(メタ)アクリロイルオキシ−2−メチルプロポキシメチル基、3−(メタ)アクリロイルオキシ−2、2−ジメチルプロポキシメチル基、4−(メタ)アクリロイルオキシブトキシメチル基、1−(メタ)アクリロイルオキシエチル基、1−(2−(メタ)アクリロイルオキシエトキシ)エチル基、1−(3−(メタ)アクリロイルオキシプロポキシ)エチル基、1−(3−(メタ)アクリロイルオキシ−2−メチルプロポキシ)エチル基、1−(4−(メタ)アクリロイルオキシブトキシ)エチル基等であることがより好ましい。 As the molecular weight of Z 1 to Z 4 increases, the optical performance is lowered, and crystallization can not be performed in the purification step during production, and it becomes difficult to improve the purity as an optical material. Accordingly, Z 1 to Z 4 are preferably substituents having a molecular weight of 1 or more and less than 200. When a substituent having a molecular weight of 1 or more and less than 200 is selected and a substituent having a large molecular weight is selected, in order to maintain the optical performance of the cured product, it is preferable to highly control the purity of the general formula (1) and the residual solvent. . Z 1 to Z 4 may be a hydrogen atom, a methyl group, an ethyl group, an isopropyl group, a chloromethyl group, a dichloromethyl group, a trichloromethyl group, a fluoromethyl group, a difluoromethyl group, a trifluoro group in view of the difficulty in production. Methyl group, methoxy group, ethoxy group, isopropoxy group, chloromethyloxy group, dichloromethyloxy group, trichloromethyloxy group, fluoromethyloxy group, difluoromethyloxy group, trifluoromethyloxy group, methylthio group, ethylthio group, Propylthio, dimethylamino, diethylamino, dipropylamino, (meth) acryloyloxymethyl, 2- (meth) acryloyloxyethoxymethyl, 3- (meth) acryloyloxypropoxymethyl, 3- (meth) Acryloyl oxy-2 Methyl propoxy methyl group, 3- (meth) acryloyloxy-2, 2-dimethyl propoxy methyl group, 4- (meth) acryloyloxy butoxy methyl group, 1- (meth) acryloyl oxyethyl group, 1- (2- (meth) ) Acryloyloxyethoxy) ethyl, 1- (3- (meth) acryloyloxypropoxy) ethyl, 1- (3- (meth) acryloyloxy-2-methylpropoxy) ethyl, 1- (4- (meth)) An acryloyloxybutoxy) ethyl group is more preferable.
Z1乃至Z4は、製造上の難易度を考慮すると、水素原子、メチル基、メトキシ基、メチルチオ基、ジメチルアミノ基、(メタ)アクリロイルオキシメチル基、2−(メタ)アクリロイルオキシエトキシメチル基、3−(メタ)アクリロイルオキシプロポキシメチル基、3−(メタ)アクリロイルオキシ−2−メチルプロポキシメチル基、3−(メタ)アクリロイルオキシ−2、2−ジメチルプロポキシメチル基、4−(メタ)アクリロイルオキシブトキシメチル基、1−(メタ)アクリロイルオキシエチル基、1−(2−(メタ)アクリロイルオキシエトキシ)エチル基、1−(3−(メタ)アクリロイルオキシプロポキシ)エチル基、1−(3−(メタ)アクリロイルオキシ−2−メチルプロポキシ)エチル基、1−(4−(メタ)アクリロイルオキシブトキシ)エチル基であることが更に好ましい。 Z 1 to Z 4 are a hydrogen atom, a methyl group, a methoxy group, a methylthio group, a dimethylamino group, a (meth) acryloyloxymethyl group, a 2- (meth) acryloyloxyethoxymethyl group, in consideration of the degree of difficulty in production 3- (meth) acryloyloxypropoxymethyl group, 3- (meth) acryloyloxy-2-methylpropoxymethyl group, 3- (meth) acryloyloxy-2, 2-dimethylpropoxymethyl group, 4- (meth) acryloyl group Oxybutoxymethyl group, 1- (meth) acryloyloxyethyl group, 1- (2- (meth) acryloyloxyethoxy) ethyl group, 1- (3- (meth) acryloyloxypropoxy) ethyl group, 1- (3-) (Meth) acryloyloxy-2-methylpropoxy) ethyl group, 1- (4- (meth) a Further preferably Leroy oxy-butoxy) ethyl.
[硬化物]
次に本実施形態の硬化物について説明する。
[Cured product]
Next, the hardened | cured material of this embodiment is demonstrated.
本実施形態の硬化物は、少なくとも一般式(1)で表される化合物が重合若しくは共重合している、又は一般式(1)で表される化合物が高分子材料に分散していることを特徴とする。 In the cured product of this embodiment, at least the compound represented by the general formula (1) is polymerized or copolymerized, or the compound represented by the general formula (1) is dispersed in the polymer material. It features.
本発明の硬化物は、下記(A)乃至(D)の態様に大別される。
(A)一般式(1)で表わされる化合物が重合している硬化物。
(B)一般式(1)で表わされる化合物と他の共重合可能な重合性材料とが共重合している硬化物。
(C)一般式(1)で表わされる化合物を他の共重合可能重合性材料に分散させ、これらが共重合している硬化物。
(D)一般式(1)で表わされる化合物が他のマトリックスポリマーに分散している硬化物。
The cured product of the present invention is roughly classified into the following embodiments (A) to (D).
(A) A cured product in which the compound represented by the general formula (1) is polymerized.
(B) A cured product in which the compound represented by the general formula (1) and another copolymerizable polymerizable material are copolymerized.
(C) A cured product in which the compound represented by the general formula (1) is dispersed in another copolymerizable polymerizable material and these are copolymerized.
(D) A cured product in which the compound represented by the general formula (1) is dispersed in another matrix polymer.
[硬化物の製造方法]
また、本発明の硬化物の製造方法は、少なくとも一般式(1)で表わされる化合物を含有する光学用組成物を用意する工程と、前記光学用組成物を重合して硬化させる工程と、を有することを特徴とする硬化物の製造方法である。
[Method of producing a cured product]
In the method for producing a cured product of the present invention, a step of preparing an optical composition containing at least a compound represented by the general formula (1), and a step of polymerizing and curing the optical composition It is a manufacturing method of the hardened | cured material characterized by having.
本実施形態の硬化物が(A)の硬化物である場合、硬化物は、一般式(1)で表わされる化合物と、重合開始剤とを含有する光学用組成物を重合することで製造される。尚、この光学用組成物には、必要に応じて重合禁止剤、光増感剤、耐光安定剤、耐熱安定剤、酸化防止剤、離型剤、防カビ剤等をさらに含有させてもよい。 When the cured product of this embodiment is the cured product of (A), the cured product is produced by polymerizing an optical composition containing the compound represented by the general formula (1) and a polymerization initiator. Ru. The composition for optics may further contain, if necessary, a polymerization inhibitor, a photosensitizer, a light stabilizer, a heat stabilizer, an antioxidant, a mold release agent, a fungicide and the like. .
重合開始剤には、光照射によりラジカル種やカチオン種などの活性種を発生するもの、熱によりラジカル種などの活性種を発生するものを用いることができる。 As the polymerization initiator, those capable of generating active species such as radical species and cationic species by light irradiation and those capable of generating active species such as radical species by heat can be used.
光照射によりラジカル種を発生する重合開始剤としては、2−ベンジル−2−ジメチルアミノ−1−(4−モルフォリノフェニル)−1−ブタノン、1−ヒドロキシシクロヘキシルフェニルケトン、2−ヒドロキシ−2−メチル−1−フェニル−プロパン−1−オン、ビス(2,4,6−トリメチルベンゾイル)−フェニルホスフィンオキサイド、4−フェニルベンゾフェノン、4−フェノキシベンゾフェノン、4,4’−ジフェニルベンゾフェノン、4,4’−ジフェノキシベンゾフェノン等を用いることができる。 As a polymerization initiator which generates radical species by light irradiation, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -1-butanone, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2- Methyl-1-phenyl-propan-1-one, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, 4-phenylbenzophenone, 4-phenoxybenzophenone, 4,4'-diphenylbenzophenone, 4,4 ' -Diphenoxy benzophenone etc. can be used.
また、光照射によりカチオン種を発生する重合開始剤としては、ヨードニウム(4−メチルフェニル)[4−(2−メチルプロピル)フェニル]−ヘキサフルオロホスフェート用いることが好ましい。 Moreover, as a polymerization initiator which generate | occur | produces cationic seed | species by light irradiation, it is preferable to use iodonium (4-methylphenyl) [4- (2-methylpropyl) phenyl] hexafluorophosphate.
熱によりラジカル種を発生する重合開始剤としては、アゾビスイソブチルニトリル(AIBN)等のアゾ化合物、ベンゾイルパーオキサイド、tert−ブチルパーオキシピバレート、tert−ブチルパーオキシネオヘキサノエート、tert−ヘキシルパーオキシネオヘキサノエート、tert−ブチルパーオキシネオデカノエート、tert−ヘキシルパーオキシネオデカノエート、クミルパーオキシネオヘキサノエート、クミルパーオキシネオデカノエート等の過酸化物を用いることができる。 As a polymerization initiator which generates radical species by heat, an azo compound such as azobis isobutyl nitrile (AIBN), benzoyl peroxide, tert-butyl peroxypivalate, tert-butyl peroxy neohexanoate, tert-hexyl Using peroxides such as peroxy neohexanoate, tert-butyl peroxy neodecanoate, tert-hexyl peroxy neodecanoate, cumylperoxy neohexanoate, cumylperoxy neodecanoate, etc. Can.
本実施形態の硬化物を製造するための光学用組成物に含有される重合開始剤の添加量は、一般式(1)で表わされる化合物の総質量に対して0.01質量%以上10.00質量%以下の範囲が好ましい。尚、重合開始剤は1種類のみで使用することもできるし、2種類以上を併用して使用することもできる。尚、一般式(1)で表わされる化合物に対する重合開始剤の添加割合は、光照射量、さらには、付加的な加熱温度に応じて適宜選択してもよい。また、得られる重合体の目標とする平均分子量に応じて、調整してもよい。 The addition amount of the polymerization initiator contained in the composition for optics for manufacturing the hardened | cured material of this embodiment is 0.01 mass% or more with respect to the total mass of the compound represented by General formula (1). The range of 00 mass% or less is preferable. The polymerization initiator may be used alone or in combination of two or more. The addition ratio of the polymerization initiator to the compound represented by the general formula (1) may be appropriately selected according to the light irradiation amount and further the additional heating temperature. Also, it may be adjusted according to the target average molecular weight of the resulting polymer.
重合禁止剤は、ヒドロキノン、ヒドロキノンモノメチルエーテル、ヒドロキノンモノエチルエーテル、ヒドロキノンモノプロピルエーテル、ヒドロキノンモノブチルエーテル、ヒドロキノンモノペンチルエーテル、ヒドロキノンモノヘキシルエーテル、ヒドロキノンモノオクチルエーテル、ヒドロキノンモノへプチルエーテル等のヒドロキノン系の重合禁止剤、3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート等の置換基を有するフェノール系の重合禁止剤等を用いることができる。但し、ヒドロキノン等のヒドロキノン系の重合禁止剤、ベンゾキノン等のベンゾキノン系の重合禁止剤は、UV照射で黄変することがあるため好適ではない。 Polymerization inhibitors include hydroquinones such as hydroquinone, hydroquinone monomethyl ether, hydroquinone monoethyl ether, hydroquinone monopropyl ether, hydroquinone monobutyl ether, hydroquinone monopentyl ether, hydroquinone monopentyl ether, hydroquinone monooctyl ether, hydroquinone monooctyl ether, hydroquinone monoheptyl ether, etc. A phenol-based polymerization inhibitor having a substituent such as a polymerization inhibitor, 3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate, or the like can be used. However, hydroquinone-based polymerization inhibitors such as hydroquinone and benzoquinone-based polymerization inhibitors such as benzoquinone are not preferable because they may turn yellow upon UV irradiation.
重合禁止剤としては、反応時や保存時の重合抑制剤として上述したものを用いるkとができるがそれらに限定されない。添加量は、前記光学用組成物に対して、0.01質量%以上1.00質量%以下の範囲が好ましい。また、一つの重合禁止剤のみを使用しても良いし2種類以上の重合禁止剤を組み合わせて使用しても良い。着色の少なさを考慮すると具体的にはヒドロキノン系重合禁止剤を組み合わせて利用することが好ましい。 As the polymerization inhibitor, those described above as the polymerization inhibitor at the time of reaction or storage can be used, but k is not limited thereto. The addition amount is preferably in the range of 0.01% by mass to 1.00% by mass with respect to the composition for optics. Further, only one polymerization inhibitor may be used, or two or more polymerization inhibitors may be used in combination. Specifically, in consideration of the low coloring, it is preferable to use a combination of hydroquinone polymerization inhibitors.
光増感剤は、ベンゾフェノン、4,4−ジエチルアミノベンゾフェノン、1−ヒドロキシシクロヘキシルフェニルケトン、p−ジメチルアミノ安息香酸イソアミル、4−ジメチルアミノ安息香酸メチル、ベンゾイン、ベンゾインエチルエーテル、ベンゾインイソブチルエーテル、ベンゾインイソプロピルエーテル、2,2−ジエトキシアセトフェノン、o−ベンゾイル安息香酸メチル、2−ヒドロキシ−2−メチル−1−フェニルプロパン−1−オン、アシルホスフィンオキサイド等を用いることができる。添加量は、前記光学用組成物に対して、0.01質量%以上10.00質量%以下の範囲が好ましい。 Photosensitizers include benzophenone, 4,4-diethylaminobenzophenone, 1-hydroxycyclohexyl phenyl ketone, isoamyl p-dimethylaminobenzoate, methyl 4-dimethylaminobenzoate, benzoin, benzoin ethyl ether, benzoin isobutyl ether, benzoin isopropyl Ether, 2,2-diethoxyacetophenone, methyl o-benzoylbenzoate, 2-hydroxy-2-methyl-1-phenylpropan-1-one, acyl phosphine oxide and the like can be used. The addition amount is preferably in the range of 0.01% by mass to 10.00% by mass with respect to the composition for optics.
耐光安定剤は、硬化物の光学特性に大きな影響を及ぼさないものであれば特に制限は無く、2−(2H−ベンゾトリアゾール−2−イル)−p−クレゾール、2−(2H−ベンゾトリアゾール−2−イル)−4,6−ビス(1−メチル−1−フェニルエチル)フェノール、2−[5−クロロ(2H)−ベンゾトリアゾール−2−イル]−4−メチル−6−(tert−ブチル)フェノール、2−(2H−ベンゾトリアゾール−2−イル)−4,6−ジ−tert−ペンチルフェノール、2−(2H−ベンゾトリアゾール−2−イル)−4−(1,1,3,3−テトラメチルブチル)フェノール、2,2’−メチルレンビス[6−(2H−ベンゾトリアゾール−2−イル)]−4−(1,1,3,3−テトラメチルブチル)フェノール、2−(2H−ベンゾトリアゾール−2−イル)−6−ドデシル−4−メチルフェノール等のベンゾトリアゾール系の化合物、2−シアノ−3,3−ジフェニルアクリル酸エチル、2−シアノ−3,3−ジフェニルアクリル酸 2−エチルヘキシル等のシアノアクリレート系の化合物、トリアジン系の化合物、オクタベンゾン、2,2’−4,4’−テトラヒドロベンゾフェノン等のベンゾフェノン系の化合物等を用いることができる。上記耐光安定剤が光増感剤の役割を果たす場合もあり、その場合には光増感剤は添加しなくても良い。添加量は、光学用組成物に対して、0.01質量%以上10.00質量%以下の範囲が好ましい。 The light stabilizer is not particularly limited as long as it does not significantly affect the optical properties of the cured product, and 2- (2H-benzotriazol-2-yl) -p-cresol, 2- (2H-benzotriazole) 2-yl) -4,6-bis (1-methyl-1-phenylethyl) phenol, 2- [5-chloro (2H) -benzotriazol-2-yl] -4-methyl-6- (tert-butyl) ) Phenol, 2- (2H-benzotriazol-2-yl) -4,6-di-tert-pentylphenol, 2- (2H-benzotriazol-2-yl) -4- (1,1,3,3) -Tetramethylbutyl) phenol, 2,2'-Methylenebis [6- (2H-benzotriazol-2-yl)]-4- (1,1,3,3-tetramethylbutyl) phenol, 2- ( Benzotriazole compounds such as H-benzotriazol-2-yl) -6-dodecyl-4-methylphenol, ethyl 2-cyano-3,3-diphenylacrylate, 2-cyano-3,3-diphenylacrylic acid It is possible to use cyanoacrylate compounds such as 2-ethylhexyl, triazine compounds, and benzophenone compounds such as octabenzone and 2,2'-4,4'-tetrahydrobenzophenone. In some cases, the above-mentioned light stabilizer plays a role of a photosensitizer, in which case the photosensitizer may not be added. The amount of addition is preferably in the range of 0.01% by mass or more and 10.00% by mass or less with respect to the optical composition.
耐熱安定剤は、硬化物の光学特性に大きな影響を及ぼさないものであれば特に制限は無く、ペンタエリスリトールテトラキス[3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)]プロピオネート、オクタデシル−3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート、3,5−ビス(1,1−ジメチルエチル)−4−ヒドロキシベンゼンプロパン酸の側鎖を有する炭素数7〜9のアルキルエステル、4,6−ビス(オクチルチオメチル)−o−クレゾール、4,6−ビス(ドデシルチオメチル)−o−クレゾール、エチレンビス(オキシエチレン)ビス[3−(5−tert−ブチル−4−ヒドロキシ−m−トリル)]プロピオネート、ヘキサメチレンビス[3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)]プロピオネート等のヒンダードフェノール系の化合物、トリス(2,4−ジ−tert−ブチルフェニル)ホスファイト等のリン系の化合物、ジオクタデシル−3,3’−チオジプロピオネート等の硫黄系の化合物等を用いることができる。添加量は、光学用組成物に対して、0.01質量%以上10.00質量%以下の範囲が好ましい。 The heat-resistant stabilizer is not particularly limited as long as it does not greatly affect the optical properties of the cured product, and pentaerythritol tetrakis [3- (3,5-di-tert-butyl-4-hydroxyphenyl)] propionate, Octadecyl-3- (3,5-di-tert-butyl-4-hydroxyphenyl) propionate, 3,5-bis (1,1-dimethylethyl) -4-hydroxybenzenepropanoic acid having 7 carbon atoms having a side chain -9 alkyl esters, 4,6-bis (octylthiomethyl) -o-cresol, 4,6-bis (dodecylthiomethyl) -o-cresol, ethylene bis (oxyethylene) bis [3- (5-tert) -Butyl-4-hydroxy-m-tolyl)] propionate, hexamethylene bis [3- (3,5-di-tert-butyl) Hindered phenol compounds such as -4-hydroxyphenyl)] propionate, phosphorus compounds such as tris (2,4-di-tert-butylphenyl) phosphite, dioctadecyl-3,3'-thiodipropio A sulfur-based compound such as a nitrate can be used. The amount of addition is preferably in the range of 0.01% by mass or more and 10.00% by mass or less with respect to the optical composition.
酸化防止剤は、硬化物の光学特性に大きな影響を及ぼさないものであれば特に制限は無く、ビス(2,2,6,6−テトラメチル−4−ピペリジル)セバケート、ビス(1,2,2,6,6−ペンタメチル−4−ピペリジル)[[3,5−ビス(1,1−ジメチルエチル)−4−ヒドリキシフェニル]メチル]ブチルマロネート等のヒンダードアミン系の化合物等を用いることができる。添加量は、光学用組成物に対して、0.01質量%以上10.00質量%以下の範囲が好ましい。 The antioxidant is not particularly limited as long as it does not significantly affect the optical properties of the cured product, and bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis (1,2,2,7) Use of hindered amine compounds such as 2,6,6-pentamethyl-4-piperidyl) [[3,5-bis (1,1-dimethylethyl) -4-hydroxyphenyl] methyl] butyl malonate etc. it can. The amount of addition is preferably in the range of 0.01% by mass or more and 10.00% by mass or less with respect to the optical composition.
本実施形態の硬化物が(B)の態様である場合、硬化物は、一般式(1)で表わされる化合物と共重合可能な重合性材料とからなる光学用組成物を重合することで製造される。該光学用組成物中の一般式(1)で表わされる化合物物の含有量は、1.0質量%以上99.9質量%以下が好ましい。硬化物の分散特性及び2次分散特性が光学設計上有用な範囲とするために、一般式(1)で表わされる化合物は、50.0質量%以上99.9質量%以下含有することが好ましい。尚、この光学用組成物には、必要に応じて重合禁止剤、光増感剤、耐光安定剤、耐熱安定剤、酸化防止剤、離型剤、防カビ剤等をさらに含有させてもよい。 When the cured product of the present embodiment is the aspect (B), the cured product is produced by polymerizing an optical composition comprising a polymerizable material copolymerizable with the compound represented by the general formula (1). Be done. The content of the compound represented by the general formula (1) in the optical composition is preferably 1.0% by mass or more and 99.9% by mass or less. The compound represented by the general formula (1) is preferably contained in an amount of 50.0% by mass or more and 99.9% by mass or less in order to set the dispersion property and the secondary dispersion property of the cured product in a range useful for optical design . The composition for optics may further contain, if necessary, a polymerization inhibitor, a photosensitizer, a light stabilizer, a heat stabilizer, an antioxidant, a mold release agent, a fungicide and the like. .
共重合可能な重合性材料としては、例えば(メタ)アクリル系モノマーを用いることができる。例えば、1,3−アダマンタンジオールジメタクリレート、1,3−アダマンタンジメタノールジメタクリレート、トリシクロデカンジメタノールジアクリレート、ペンタエリスリトールテトラアクリレート、プロポキシ化ネオペンチルグリコールジアクリレート、ジプロピレングリコールジアクリレート、エトキシ化ビスフェノールAジメタクリレート、トリス(2−ヒドロキシエチル)イソシアヌレートトリアクリレート、2−(2−エトキシエトキシ)エチルアクリレート、ステアリルアクリレート、テトラヒドロフルフリルアクリレート、2−フェノキシエチルアクリレート、イソデシルアクリレート、イソボニルアクリレート、イソボニルメタクリレート、1,3−ブチレングリコールジアクリレート、1,4−ブタンジオールジアクリレート、ジエチレングリコールジアクリレート、1,6−ヘキサンジオールジアクリレート、トリエチレングリコールジアクリレート、トリプロピレングリコールジアクリレート、ジプロピレングリコールジアクリレート、トリエチレングリコールジメタクリレート、エチレングリコールジメタクリレート、テトラエチレングリコールジメタクリレート、1,4−ブタンジオールジメタクリレート、ジエチレングリコールジメタクリレート、1,6−ヘキサンジオールジメタクリレート、トリプロピレングリコールジメタクリレート、ジプロピレングリコールジメタクリレート、トリメチロールプロパントリメタクリレート、9,9−ビス[4−(2−アクリロイルオキシエトキシ)フェニル]フルオレン、9,9−ビス[4−(2−メタクリロイルオキシエトキシ)フェニル]フルオレン、9,9−ビス[4−(2−アクリロイルオキシ)フェニル]フルオレン、9,9−ビス[4−(2−メタクリロイルオキシ)フェニル]フルオレン、ベンジルアクリレート、ベンジルメタクリレート、ブトキシエチルアクリレート、ブトキシメチルメタクリレート、シクロヘキシルアクリレート、シクロヘキシルメタクリレート、2−ヒドロキシエチルアクリレート、2−ヒドロキシメチルメタクリレート、グリシジルアクリレート、グリシジルメタクリレート、フェノキシエチルアクリレート、フェノキシエチルメタクリレート、フェニルメタクリレート、エチレングリコールジアクリレート、エチレングリコールジメタクリレート、ジエチレングリコールジアクリレート、ジエチレングリコールジメタクリレート、トリエチレングリコールジアクリレート、トリエチレングリコールジメタクリレート、テトラエチレングリコールジアクリレート、テトラエチレングリコールジメタクリレート、ポリエチレングリコールジアクリレート、ポリエチレングリコールジメタクリレート、ネオペンチルグリコールジアクリレート、ネオペンチルグリコールジメタクリレート、エチレングリコールビスグリシジルアクリレート、エチレングリコールビスグリシジルメタクリレート、ビスフェノールAジアクリレート、ビスフェノールAジメタクリレート、2,2−ビス(4−アクリロキシエトキシフェニル)プロパン、2,2−ビス(4−メタクリロキシエトキシフェニル)プロパン、2,2−ビス(4−アクリロキシジエトキシフェニル)プロパン、2,2−ビス(4−メタクリロキシジエトキシフェニル)プロパン、ビスフェノールFジアクリレート、ビスフェノールFジメタクリレート、1,1−ビス(4−アクリロキシエトキシフェニル)メタン、1,1−ビス(4−メタクリロキシエトキシフェニル)メタン、1,1−ビス(4−アクリロキシジエトキシフェニル)メタン、1,1−ビス(4−メタクリロキシジエトキシフェニル)メタン、1,1−ビス(4−アクリロキシエトキシフェニル)スルホン、1,1−ビス(4−メタクリロキシエトキシフェニル)スルホン、1,1−ビス(4−アクリロキシジエトキシフェニル)スルホン、1,1−ビス(4−メタクリロキシジエトキシフェニル)スルホン、ジメチロールトリシクロデカンジアクリレート、トリメチロールプロパントリアクリレート、トリメチロールプロパントリメタクリレート、グリセロールジアクリレート、グリセロールジメタクリレート、ペンタエリスリトールトリアクリレート、ペンタエリスリトールテトラアクリレート、ペンタエリスリトールテトラメタクリレート、メチルチオアクリレート、メチルチオメタクリレート、フェニルチオアクリレート、ベンジルチオメタクリレート、キシリレンジチオールジアクリレート、キシリレンジチオールジメタクリレート、メルカプトエチルスルフィドジアクリレート、メルカプトエチルスルフィドジメタクリレート等の(メタ)アクリレート化合物、アリルグリシジルエーテル、ジアリルフタレート、ジアリルテレフタレート、ジアリルイソフタレート、ジアリルカーボネート、ジエチレングリコールビスアリルカーボネート等のアリル化合物、スチレン、クロロスチレン、メチルスチレン、ブロモスチレン、ジブロモスチレン、ジビニルベンゼン、3,9−ジビニルスピロビ(m−ジオキサン)等のビニル化合物、ジイソプロペニルベンゼン等を用いることができるが、これらに限定されない。 As the copolymerizable polymerizable material, for example, (meth) acrylic monomers can be used. For example, 1,3-adamantane diol dimethacrylate, 1,3-adamantane dimethanol dimethacrylate, tricyclodecane dimethanol diacrylate, pentaerythritol tetraacrylate, propoxylated neopentyl glycol diacrylate, dipropylene glycol diacrylate, ethoxylated Bisphenol A dimethacrylate, tris (2-hydroxyethyl) isocyanurate triacrylate, 2- (2-ethoxyethoxy) ethyl acrylate, stearyl acrylate, tetrahydrofurfuryl acrylate, 2-phenoxyethyl acrylate, isodecyl acrylate, isobonyl acrylate, Isobonyl methacrylate, 1,3-butylene glycol diacrylate, 1,4-butanediol di Crylates, diethylene glycol diacrylate, 1,6-hexanediol diacrylate, triethylene glycol diacrylate, tripropylene glycol diacrylate, dipropylene glycol diacrylate, triethylene glycol dimethacrylate, ethylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, 1,4-butanediol dimethacrylate, diethylene glycol dimethacrylate, 1,6-hexanediol dimethacrylate, tripropylene glycol dimethacrylate, dipropylene glycol dimethacrylate, trimethylolpropane trimethacrylate, 9,9-bis [4- (2 -Acrylyloxyethoxy) phenyl] fluorene, 9,9-bis [4- (2-) Tacryloyloxyethoxy) phenyl] fluorene, 9,9-bis [4- (2-acryloyloxy) phenyl] fluorene, 9,9-bis [4- (2-methacryloyloxy) phenyl] fluorene, benzyl acrylate, benzyl methacrylate , Butoxyethyl acrylate, butoxymethyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxymethyl methacrylate, glycidyl acrylate, glycidyl methacrylate, phenoxyethyl acrylate, phenoxyethyl methacrylate, phenyl methacrylate, ethylene glycol diacrylate, ethylene Glycol dimethacrylate, diethylene glycol diacrylate, diethylene Glycol dimethacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, tetraethylene glycol diacrylate, tetraethylene glycol dimethacrylate, polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, neopentyl glycol diacrylate, neopentyl glycol dimethacrylate Ethylene glycol bisglycidyl acrylate, ethylene glycol bisglycidyl methacrylate, bisphenol A diacrylate, bisphenol A dimethacrylate, 2,2-bis (4-acryloxyethoxyphenyl) propane, 2,2-bis (4-methacryloxyethoxyphenyl) ) Propane, 2,2-bis (4-acryloxydiethoxy group) Nyl) propane, 2,2-bis (4-methacryloxydiethoxyphenyl) propane, bisphenol F diacrylate, bisphenol F dimethacrylate, 1,1-bis (4-acryloxyethoxyphenyl) methane, 1,1-bis (4-methacryloxyethoxyphenyl) methane, 1,1-bis (4-acryloxydiethoxyphenyl) methane, 1,1-bis (4-methacryloxydiethoxyphenyl) methane, 1,1-bis (4-) Acryloxyethoxyphenyl) sulfone, 1,1-bis (4-methacryloxyethoxyphenyl) sulfone, 1,1-bis (4-acryloxydiethoxyphenyl) sulfone, 1,1-bis (4-methacryloxydiethoxy) Phenyl) sulfone, dimethylol tricyclodecane diacrylate, tri Tyrolpropane triacrylate, trimethylolpropane trimethacrylate, glycerol diacrylate, glycerol dimethacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, methylthioacrylate, methylthiomethacrylate, phenylthioacrylate, benzylthiomethacrylate, xylylene (Meth) acrylate compounds such as thiol diacrylate, xylylene dithiol dimethacrylate, mercaptoethyl sulfide diacrylate, mercaptoethyl sulfide dimethacrylate, allyl glycidyl ether, diallyl phthalate, diallyl terephthalate, diallyl isophthalate, diallyl carbonate, diaryl carbonate Use allyl compounds such as ethylene glycol bisallyl carbonate, vinyl compounds such as styrene, chlorostyrene, methylstyrene, bromostyrene, dibromostyrene, divinylbenzene, 3,9-divinyl spirobi (m-dioxane), diisopropenyl benzene and the like But not limited thereto.
共重合可能な重合性材料の添加量は、前記光学用組成物の質量に対して、0.10質量%以上80.00質量%以下の範囲が好ましい。硬化物の分散特性及び2次分散特性が光学設計上有用な範囲になることを考慮すると好ましくは0.10質量%以上30.00質量%以下である。 The addition amount of the copolymerizable polymerizable material is preferably in the range of 0.10% by mass to 80.00% by mass with respect to the mass of the composition for optics. It is preferably 0.10% by mass or more and 30.00% by mass or less, considering that the dispersion property and the secondary dispersion property of the cured product fall within a useful range in optical design.
(B)の態様の硬化物を製造するための光学用組成物に含有される重合開始剤は、(A)の態様において示した重合開始剤を(A)の態様により示した添加割合で用いることが出来る。また、(B)の態様の硬化物を製造するための光学用組成物に含有される重合禁止剤、光増感剤、耐光安定剤、耐熱安定剤、酸化防止剤を用いる場合には、(A)の態様において示したものを(A)の態様により示した添加割合で用いることが出来る。 The polymerization initiator contained in the optical composition for producing the cured product of the embodiment of (B) uses the polymerization initiator shown in the embodiment of (A) at the addition ratio shown by the embodiment of (A) I can do it. Moreover, when using the polymerization inhibitor, the photosensitizer, the light-resistant stabilizer, the heat resistant stabilizer, and antioxidant which are contained in the composition for optics for manufacturing the hardened | cured material of the aspect of (B), Those shown in the embodiment of A) can be used at the addition ratio shown by the embodiment of (A).
本発明の硬化物が、(C)の態様の硬化物である場合、硬化物は、一般式(1)で表わされる化合物が共重合可能な重合性材料に分散されている光学用組成物を重合することで製造される。光学用組成物に含有される共重合可能な重合性材料の含有量は、1.0質量%以上99.0質量%以下であることが好ましい。得られる硬化物の分散特性及び2次分散特性、また一般式(1)で表わされる化合物と重合性材料との相溶性を考慮すると、一般式(1)で表わされる化合物の含有量は、50.0質量%以上99.9質量%以下が好ましい。 When the cured product of the present invention is a cured product of the aspect of (C), the cured product is an optical composition in which the compound represented by the general formula (1) is dispersed in a copolymerizable material. It is manufactured by polymerizing. The content of the copolymerizable polymerizable material contained in the optical composition is preferably 1.0% by mass or more and 99.0% by mass or less. The content of the compound represented by the general formula (1) is 50, taking into consideration the dispersion characteristics and secondary dispersion characteristics of the obtained cured product, and the compatibility between the compound represented by the general formula (1) and the polymerizable material. The content is preferably from 0% by weight to 99.9% by weight.
尚、この光学用組成物には、必要に応じて重合禁止剤、光増感剤、耐光安定剤、耐熱安定剤、酸化防止剤、離型剤、防カビ剤等をさらに含有させてもよい。 The composition for optics may further contain, if necessary, a polymerization inhibitor, a photosensitizer, a light stabilizer, a heat stabilizer, an antioxidant, a mold release agent, a fungicide and the like. .
重合性材料としては、硬化物の分散特性及び2次分散特性が光学設計上有用な範囲になるのであれば特に制限はない。具体的には、(B)の態様において示された(メタ)アクリル系モノマー、アリル化合物、ビニル化合物、ジイソプロペニルベンゼン化合物、エポキシ化合物、チイラン化合物等を用いることが出来る。 The polymerizable material is not particularly limited as long as the dispersion property and the secondary dispersion property of the cured product fall within a useful range in optical design. Specifically, (meth) acrylic monomers, allyl compounds, vinyl compounds, diisopropenyl benzene compounds, epoxy compounds, thiirane compounds, etc. shown in the embodiment of (B) can be used.
(C)の態様の硬化物を製造するための光学用組成物に含有される重合開始剤は、(A)の態様において示した重合開始剤を(A)の態様により示した添加割合で用いることが出来る。また、(C)の態様の硬化物を製造するための光学用組成物に含有される重合禁止剤、光増感剤、耐光安定剤、耐熱安定剤、酸化防止剤を用いる場合には、(A)の態様において示したものを(A)の態様により示した添加割合で用いることが出来る。 The polymerization initiator contained in the optical composition for producing the cured product of the aspect of (C) uses the polymerization initiator shown in the aspect of (A) at the addition ratio shown by the aspect of (A) I can do it. In the case of using a polymerization inhibitor, a photosensitizer, a light resistance stabilizer, a heat resistance stabilizer, and an antioxidant contained in the optical composition for producing the cured product of the aspect of (C), Those shown in the embodiment of A) can be used at the addition ratio shown by the embodiment of (A).
本発明の硬化物が、(D)の態様の硬化物である場合、硬化物は、一般式(1)で表わされる化合物と、一般式(1)で表わされる化合物で表わされる化合物と分散可能なマトリックスポリマーとからなる光学用組成物を重合或いは成形することで製造される。光学用組成物に含有されるマトリックスポリマー化合物の含有量は、1.0質量%以上99.0質量%以下であることが好ましい。得られる硬化物の分散特性及び2次分散特性、また一般式(1)で表わされる化合物とマトリックスポリマーとの相溶性を考慮すると、マトリックスポリマーの含有量は、1.0質量%以上50.0質量%以下が好ましい。尚、この光学用組成物には、必要に応じて重合禁止剤、光増感剤、耐光安定剤、耐熱安定剤、酸化防止剤、離型剤、防カビ剤等をさらに含有させてもよい。 When the cured product of the present invention is the cured product of the embodiment (D), the cured product can be dispersed with the compound represented by the general formula (1) and the compound represented by the compound represented by the general formula (1) Manufactured by polymerizing or molding an optical composition comprising the above matrix polymer. The content of the matrix polymer compound contained in the optical composition is preferably 1.0% by mass or more and 99.0% by mass or less. Considering the dispersion characteristics and secondary dispersion characteristics of the resulting cured product, and the compatibility between the compound represented by the general formula (1) and the matrix polymer, the content of the matrix polymer is 1.0% by mass or more and 50.0 or more % Or less is preferred. The composition for optics may further contain, if necessary, a polymerization inhibitor, a photosensitizer, a light stabilizer, a heat stabilizer, an antioxidant, a mold release agent, a fungicide and the like. .
マトリックスポリマーとしては、(メタ)アクリル系ポリマー;アリル系ポリマー;エチレン単独重合体、エチレンとプロピレン、1−ブテン、1−ペンテン、1−ヘキセン、4−メチル−1−ペンテン等の1種または2種以上のα−オレフィンとのランダムまたはブロック共重合体、エチレンと酢酸ビニル、アクリル酸、メタクリル酸、アクリル酸メチル、メタクリル酸メチルとの1種または2種以上のランダムまたはブロック共重合体、プロピレン単独重合体、プロピレンとプロピレン以外の1−ブテン、1−ペンテン、1−ヘキセン、4−メチル−1−ペンテン等の1種または2種以上のα−オレフィンとのランダムまたはブロック共重合体、1−ブテン単独重合体、アイオノマー樹脂、さらにこれら重合体の混合物等のポリオレフィン系樹脂;石油樹脂、テルペン樹脂等の炭化水素系樹脂;ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート等のポリエステル系樹脂;ナイロン6、ナイロン66、ナイロン11、ナイロン12、ナイロン610、ナイロン6/66、ナイロン66/610、ナイロンMXD等ポリアミド系樹脂;ポリメチルメタクリレート等のアクリル系樹脂;ポリスチレン、スチレン−アクリロニトリル共重合体、スチレン−アクリロニトリル−ブタジエン共重合体、ポリアクリロニトリル等のスチレン、アクリロニトリル系樹脂;ポリビニルアルコール、エチレン−ビニルアルコール共重合体等のポリビニルアルコール系樹脂;ポリカーボネート樹脂;ポリケトン樹脂;ポリメチレンオキシド樹脂;ポリスルホン樹脂;ポリイミド樹脂;ポリアミドイミド樹脂等が挙げられるがこれらに限定されない。これらの樹脂は1種類を単独で使用してもよいし、2種類以上を混合して用いてもよい。またこれらマトリックスポリマーは、一般式(1)で表わされる化合物との相溶性や硬化物の分散特性及び2次分散特性を考慮した上で適宜選択される。 Examples of matrix polymers include (meth) acrylic polymers; allyl polymers; ethylene homopolymers, ethylene and propylene, 1-butene, 1-pentene, 1-hexene, 4-methyl-1-pentene, etc. Random or block copolymer with a kind or more of α-olefin, ethylene and vinyl acetate, acrylic acid, methacrylic acid, methyl acrylate, methyl acrylate, methyl methacrylate, methyl methacrylate, methyl methacrylate or random copolymer of one or more kinds, propylene Homopolymers, random or block copolymers of propylene and one or more α-olefins such as 1-butene other than propylene, 1-pentene, 1-hexene, 4-methyl-1-pentene, etc. -Polyolefins such as butene homopolymers, ionomer resins, and mixtures of these polymers Resins; hydrocarbon resins such as petroleum resins and terpene resins; polyester resins such as polyethylene terephthalate, polybutylene terephthalate and polyethylene naphthalate; nylon 6, nylon 66, nylon 11, nylon 12, nylon 610, nylon 6/66 Polyamide resins such as nylon 66/610 and nylon MXD; acrylic resins such as polymethyl methacrylate; polystyrene, styrene-acrylonitrile copolymer, styrene-acrylonitrile-butadiene copolymer, styrene such as polyacrylonitrile, acrylonitrile resin; Polyvinyl alcohol resins such as polyvinyl alcohol and ethylene-vinyl alcohol copolymer; polycarbonate resin; polyketone resin; polymethylene oxide resin; polysulfone resin Polyimide resins; but polyamideimide resins are not limited thereto. These resins may be used alone or in combination of two or more. Further, these matrix polymers are appropriately selected in consideration of the compatibility with the compound represented by the general formula (1), the dispersion characteristics of the cured product and the secondary dispersion characteristics.
(D)の態様の硬化物を製造するための光学用組成物に含有される重合開始剤は、(A)の態様において示した重合開始剤を(A)の態様により示した添加割合で用いることが出来る。また、(D)の態様の硬化物を製造するための光学用組成物に含有される重合禁止剤、光増感剤、耐光安定剤、耐熱安定剤、酸化防止剤を用いる場合には、(A)の態様において示したものを(A)の態様により示した添加割合で用いることが出来る。 The polymerization initiator contained in the optical composition for producing the cured product of the embodiment of (D) uses the polymerization initiator shown in the embodiment of (A) at the addition ratio shown by the embodiment of (A) I can do it. In the case of using a polymerization inhibitor, a photosensitizer, a light resistance stabilizer, a heat resistance stabilizer, and an antioxidant contained in the optical composition for producing the cured product of the embodiment of (D), Those shown in the embodiment of A) can be used at the addition ratio shown by the embodiment of (A).
各種添加剤や汎用モノマー及びマトリックスポリマーとの混合方法は、均一に混合できるのであれば特に制限はない。例えば、溶剤等に全ての材料を混合後、溶剤を除去する方法、材料を加熱して溶融しそのまま混合する方法等を用いることができる。(A)、(B)、(C)の態様の硬化物を得るための光学用組成物を調製する際には、溶剤中で混合する方法が均一になるので好ましい。(D)の態様の硬化物を得るための光学用組成物を調製する際には、マトリックスモノマーの溶剤への低い溶解度を考慮すると材料を加熱してそのまま混合する方法が好ましい。 The mixing method with various additives, general purpose monomers and matrix polymer is not particularly limited as long as they can be uniformly mixed. For example, after mixing all the materials in a solvent etc., the method of removing a solvent, the method of heating and melting material, and mixing as it can be used. In preparing the optical composition for obtaining the cured product of the embodiments of (A), (B) and (C), the method of mixing in a solvent is preferable because the method is uniform. When preparing the optical composition for obtaining the cured product of the embodiment of (D), a method of heating and mixing the materials as it is is preferable in consideration of the low solubility of the matrix monomer in the solvent.
溶剤を除去する方法としては、光学用組成物中の残留溶剤量が少なくなるのであれば特に制限はなく、減圧留去法や蒸留法等を用いることができる。減圧留去法では、減圧下で重合反応が促進される可能性もあるため、酸素を含んだ気体を流通させながら減圧留去することが好ましい。また蒸留法では、加熱により重合反応が促進される可能性もあるため、重合禁止剤の追加や加熱温度を適宜調整することが好ましい。 The method for removing the solvent is not particularly limited as long as the amount of residual solvent in the optical composition decreases, and a vacuum distillation method, a distillation method, or the like can be used. In the reduced pressure distillation method, since the polymerization reaction may be promoted under reduced pressure, it is preferable to carry out the reduced pressure distillation while flowing a gas containing oxygen. Further, in the distillation method, since the polymerization reaction may be promoted by heating, it is preferable to appropriately adjust the addition of the polymerization inhibitor and the heating temperature.
本実施形態の光学用組成物を重合し、(A)乃至(D)の態様の硬化物を製造する場合、重合反応は光学用組成物中の重合開始剤により開始される。重合開始剤が光照射により活性種を発生する光重合開始剤である場合、前記光重合開始剤が活性種を発生する好適な波長の光を照射することで、本発明の硬化物の製造を行う。好適な波長の光としては、例えば、紫外光または可視光が挙げられる。また、重合開始剤が加熱により活性種を発生する熱重合開始剤である場合、前記熱重合開始剤が活性種を発生する好適な温度に加熱することで、本発明の硬化物の製造を行う。好適な温度としては、例えば80℃以上180°以下である。 When the optical composition of this embodiment is polymerized to produce the cured products of the aspects (A) to (D), the polymerization reaction is initiated by the polymerization initiator in the optical composition. When the polymerization initiator is a photopolymerization initiator that generates active species by light irradiation, the cured product of the present invention is produced by irradiating light of a suitable wavelength at which the photopolymerization initiator generates active species. Do. The light of suitable wavelength includes, for example, ultraviolet light or visible light. When the polymerization initiator is a thermal polymerization initiator that generates active species by heating, the cured product of the present invention is produced by heating the thermal polymerization initiator to a suitable temperature that generates the active species. . A suitable temperature is, for example, 80 ° C. or more and 180 ° or less.
(光学素子、光学素子の製造方法)
次に、本実施形態の光学素子及びその製造方法について図を参照しながら説明する。
(Optical element, manufacturing method of optical element)
Next, the optical element of the present embodiment and the method of manufacturing the same will be described with reference to the drawings.
本実施形態の光学素子は、上記(A)乃至(D)の態様の硬化物を成形してなることを特徴とする。図2は、本発明の光学素子の例としての光学レンズを示す概略図である。図2(a)の光学素子は、本発明の硬化物を成形加工してなる薄膜(光学部材10)が基材である基材20の片方の面上に設けられている。図2(b)の光学素子は、本発明の硬化物を成形加工してなる薄膜(光学部材10)が2つの基材の間、すなわち基板30と基板40との間に設けられている。
The optical element of the present embodiment is characterized in that the cured product of the above aspects (A) to (D) is formed. FIG. 2 is a schematic view showing an optical lens as an example of the optical element of the present invention. In the optical element shown in FIG. 2A, a thin film (optical member 10) obtained by molding and processing the cured product of the present invention is provided on one surface of a
基材20,30,40としては、プラスチック基材やガラス基材や樹脂基材を用いることができる。これらの中で、耐環境性能を考慮するとガラス基材を用いるこが好ましい。ガラス基材を用いることがまたその形状は限定されることはなく、平面、曲面、凹面、凸面、フィルム状であっても良い。
As the
本実施形態の光学素子は、一般式(1)の化合物を含む硬化物を有しているので、高い2次分散性と高い透過率とを両立している。従来、2次分散特性の高い材料は電子供与性置換基や大きな共役構造を有していたが、一般式(1)の化合物は芳香族性ヘテロ環を導入することで電子供与性置換基や大きな共役構造をもたなくても高い2次分散特性を発現する。また、本実施形態の光学素子は、透過率の極端な低下を抑制するとともに、基材と硬化物との密着性が高く割れが発生しにくい。 Since the optical element of the present embodiment has a cured product containing the compound of the general formula (1), it has both high secondary dispersion and high transmittance. Conventionally, materials with high secondary dispersion properties have electron donating substituents or large conjugated structures, but compounds of general formula (1) have electron donating substituents or an aromatic donating substituent by introducing an aromatic heterocycle. It exhibits high second-order dispersion characteristics without having a large conjugated structure. In addition, the optical element of the present embodiment suppresses the extreme decrease of the transmittance, and the adhesion between the base and the cured product is high, so that cracking does not easily occur.
図1(a)の光学素子を製造する方法としては、例えば、光透過性材料からなる基材上に膜厚の薄い層構造の本発明の硬化物を形成する方法が挙げられる。具体的には、金属材料等からなる型をガラス基板から一定の距離を置いて設け、この型とガラス基板20との間にある空隙に流動性の本発明の光学用組成物を充填する。その後、前記型を軽く抑えることで、型成形を行う。そして型を抑えつけたまま、光学用組成物の重合を行う。重合反応は光照射または加熱により行われる。
As a method of manufacturing the optical element of FIG. 1 (a), the method of forming the hardened | cured material of this invention of a layer structure with a thin film thickness is mentioned, for example on the base material which consists of light transmissive materials. Specifically, a mold made of a metal material or the like is provided at a certain distance from the glass substrate, and the space between this mold and the
光重合により光学用組成物の重合を行う場合、例えば、前記基板として利用する光透過性材料、具体的にはガラス基板20を介して、成形されている光学用組成物のモノマー等の原料に対して、均一に光照射を実施する。照射される光量は、光重合開始剤を利用した反応機構に応じて、また、含有される光重合開始剤の含有比率に応じて、適宜選択される。
In the case of polymerizing an optical composition by photopolymerization, for example, as a raw material such as a light transmitting material used as the substrate, specifically, a monomer of the optical composition being molded via the
前述のように、かかる光重合反応による光学用組成物の硬化物の製造においては、照射される光が型成形されているモノマー等の原料の全体に均一に照射されることがより好ましい。従って、利用される光照射は、基板に利用する光透過性材料、例えばガラス基板を介して、均一に行うことが可能な波長の光を選択することが一層好ましい。この際、光透過性材料の基板上に形成する光学用組成物の厚さを薄くすると、製造時の光照射量が少なく軽量になり、さらに硬化物の熱膨張や吸湿による変形も低減できる光学素子になるので好ましい。 As described above, in the production of the cured product of the optical composition by the photopolymerization reaction, it is more preferable that the irradiated light be uniformly irradiated on the whole of the raw material such as the monomer being molded. Therefore, it is more preferable to select the light of the wavelength which can be uniformly performed via the light transmissive material used for a board | substrate, for example, a glass substrate, for the light irradiation utilized. Under the present circumstances, if the thickness of the composition for optics formed on the substrate of light transmission material is made thin, the amount of light irradiation at the time of manufacture will become small and lightweight, and also optical deformation which can reduce the deformation by thermal expansion and moisture absorption of hardened material It is preferable because it becomes an element.
また、熱重合により光学用組成物の重合を行う場合、前記型を加熱することにより光学用組成物の重合を行ってもよく、型成形された光学用組成物をオーブン等の加熱機器中で加熱することで光学用組成物の重合を行ってもよい。加熱温度は、熱重合開始剤を利用した反応機構に応じて、また、含有される光重合開始剤の含有比率に応じて、適宜選択される。 When the optical composition is polymerized by thermal polymerization, the optical composition may be polymerized by heating the mold, and the molded optical composition is heated in a heating apparatus such as an oven. The optical composition may be polymerized by heating. The heating temperature is appropriately selected according to the reaction mechanism using the thermal polymerization initiator and according to the content ratio of the photopolymerization initiator to be contained.
光重合反応による光学用組成物の硬化物の製造と同様に、熱が型成形されている光学用組成物の原料の全体に均一に加えられることがより好ましい。従って、利用される加熱方法は、型成形された光学用組成物を加熱機器中で均一に加熱することが一層好ましい。また、型上に形成する硬化物の厚さを薄くすることで、型を加熱することにより光学用組成物の重合する製造方法でも、光学用組成物を均一に加熱することができる。 Similar to the production of a cured product of the optical composition by the photopolymerization reaction, it is more preferable that heat be uniformly applied to the entire raw material of the optical composition being molded. Therefore, as a heating method to be used, it is more preferable that the molded optical composition be uniformly heated in a heating apparatus. Further, by thinning the thickness of the cured product formed on the mold, the optical composition can be uniformly heated even by a manufacturing method in which the optical composition is polymerized by heating the mold.
図2(b)の光学素子を製造する方法としては、例えば、基板30と基板40との間に、未硬化の本発明の光学用組成物等を流し込み、軽く抑えることで成形を行う。そしてこの状態に保ったまま未硬化の樹脂組成物の光重合を行うことで、硬化物とする。それにより本発明の硬化物が基板30及び基板40に挟まれた光学素子を得ることができる。
As a method of manufacturing the optical element of FIG. 2B, for example, an uncured composition for optics of the present invention or the like is poured between the
また、熱重合法による硬化物の形成を行うこともできる。この場合、全体の温度をより均一とすることが望ましく、光透過性材料の基板上に形成する重合性組成物の硬化物の膜厚を薄くすることが、本発明の光学素子にはより好適なものとなる。 It is also possible to form a cured product by a thermal polymerization method. In this case, it is desirable to make the overall temperature more uniform, and it is more preferable for the optical element of the present invention to reduce the film thickness of the cured product of the polymerizable composition formed on the light transmitting material substrate. It becomes a thing.
また形成する硬化物を厚くする場合には、膜厚、樹脂成分の光吸収などを考慮した光の照射量、光の照射強度、光源など、及び加熱温度、加熱時間などを適宜選択することで、硬化物を厚くすることが可能である。 When the thickness of the cured product to be formed is increased, the film thickness, the irradiation amount of light in consideration of the light absorption of the resin component, the irradiation intensity of light, the light source, etc., and the heating temperature, heating time, etc. are appropriately selected. It is possible to thicken the cured product.
一方、本発明の硬化物を上記(C)の態様で用いる場合、該硬化物の成形方法として溶融成形法を用いることができる。溶融成形法を用いることで、低複屈折性、機械強度及び寸法精度等の特性に優れた成形物を得ることができる。溶融成形法としては、プレス成形、押し出し成形、射出成形等が挙げられるが、成形性及び生産性の観点から射出成形が好ましい。 On the other hand, when using the hardened | cured material of this invention in the aspect of said (C), a melt molding method can be used as a shaping | molding method of this hardened | cured material. By using the melt molding method, it is possible to obtain a molded product excellent in properties such as low birefringence, mechanical strength and dimensional accuracy. Examples of the melt molding method include press molding, extrusion molding, injection molding and the like, but injection molding is preferable from the viewpoint of moldability and productivity.
また、成形工程における成形条件は、使用目的または成形方法により適宜選択される。射出成形における硬化物の温度は、150℃から400℃の範囲であることが好ましく、200℃から350℃の範囲であることがより好ましく、200℃から330℃の範囲であることが特に好ましい。前記温度範囲で硬化物を成形することにより、成形時に適度な流動性を樹脂に付与して成形物である本発明の光学素子のヒケやひずみの発生を防止することができる。また、前記温度範囲で硬化物を成形することにより、硬化物の熱分解によるシルバーストリークの発生を防止し、さらには、光学素子の黄変を効果的に防止することができる。 The molding conditions in the molding step are appropriately selected depending on the purpose of use or the molding method. The temperature of the cured product in injection molding is preferably in the range of 150 ° C. to 400 ° C., more preferably in the range of 200 ° C. to 350 ° C., and particularly preferably in the range of 200 ° C. to 330 ° C. By molding the cured product within the above temperature range, it is possible to impart appropriate fluidity to the resin at the time of molding, and to prevent the occurrence of sink marks and distortion of the optical element of the present invention which is a molded product. Further, by molding the cured product in the above temperature range, it is possible to prevent the generation of silver streaks due to the thermal decomposition of the cured product, and to effectively prevent the yellowing of the optical element.
(光学機器)
本実施形態の光学機器は、例えば光学レンズを有するカメラ、双眼鏡、望遠鏡などに使用できる。
(Optical equipment)
The optical apparatus of this embodiment can be used, for example, for a camera having an optical lens, binoculars, a telescope, and the like.
以下、実施例により本発明をさらに詳細に説明するが、本発明はその要旨を超えない限り、以下に説明する実施例に限定されるものではない。 Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited to the examples described below as long as the gist of the present invention is not exceeded.
(化合物A〜E)
下記化合物A乃至化合物Eは特開2014−43565号公報及び特開2012−167019号公報を参考にして合成した。
(Compounds A to E)
The following compounds A to E were synthesized with reference to JP-A-2014-43565 and JP-A-2012-167019.
一例として、化合物Dは下記の合成法で製造した。 As an example, Compound D was prepared by the following synthesis method.
ジフェニルスルホン−4,4’−ジイルビス(トリフルオロメタンスルホナート)44g、5−ホルミル−2−フランボロン酸30g、炭酸ナトリウム45g、2−ジシクロヘキシルホスフィノ−2’,4’,6’−トリイソプロピルビフェニル1.6g、1,4−ジオキサン400ml、純水200mlの溶液を脱気した後、ビス(ジベンジリデンアセトン)パラジウム1.0gを添加し80℃で5時間加熱撹拌し後処理することでカップリング体を得た。得られたカップリング体14gのテトラヒドロフラン400ml、メタノール400mlの混合溶液を0℃に冷却し、水素化ホウ素ナトリウム3.2gを少しずつ添加し、5時間かけて24℃まで昇温した。液体クロマトグラフィーで反応の終点を確認後、水を添加して反応を停止させ後処理することで還元体を得た。得られた還元体の水酸基を2−(2−ブロモエトキシ)テトラヒドロ−2H−ピランと水素化ナトリウムで反応後、酸性水溶液で後処理することで化合物Dの前駆体を得た。化合物Dの前駆体5gの酢酸エチル50ml、ピリジン10ml溶液を0℃に冷却し、メタクリル酸無水物5.6gをゆっくり滴下することで化合物Dを合成した。得られた化合物Dは1HNMRによりその構造を確認した。
1H−NMR(CDCl3;TMS):δ 1.92(s、6H)、3.21(t、4H)、4.34(t、4H)、4.58(s、4H)、5.61(s、2H)、6.11(s、2H)、6.70(d、2H)、7.07(d、2H)、7.76−7.78(m、4H)、7.91−7.98(m、4H)
44 g of diphenyl sulfone-4,4'-diylbis (trifluoromethanesulfonate), 30 g of 5-formyl-2-furanboronic acid, 45 g of sodium carbonate, 2-dicyclohexylphosphino-2 ', 4', 6'-triisopropylbiphenyl 1 After degassing a solution of 6 g, 1,4-dioxane 400 ml, and pure water 200 ml, 1.0 g of bis (dibenzylideneacetone) palladium is added, and the mixture is heated and stirred at 80 ° C. for 5 hours to perform a post treatment I got A mixed solution of 400 g of tetrahydrofuran and 400 ml of 14 g of the obtained coupling body was cooled to 0 ° C., 3.2 g of sodium borohydride was added little by little, and the temperature was raised to 24 ° C. over 5 hours. After confirming the end point of the reaction by liquid chromatography, water was added to stop the reaction and work up was carried out to obtain a reductant. After reacting the hydroxyl group of the obtained reductant with 2- (2-bromoethoxy) tetrahydro-2H-pyran and sodium hydride, the precursor of compound D was obtained by post-treatment with an acidic aqueous solution. Compound D was synthesized by cooling a solution of 5 g of a precursor of compound D in 50 ml of ethyl acetate and 10 ml of pyridine to 0 ° C. and slowly adding 5.6 g of methacrylic anhydride. The structure of the obtained compound D was confirmed by 1 H NMR.
1 H-NMR (CDCl 3; TMS): δ 1.92 (s, 6 H), 3.21 (t, 4 H), 4.34 (t, 4 H), 4.58 (s, 4 H), 5.61 (S, 2H), 6.11 (s, 2H), 6.70 (d, 2H), 7.07 (d, 2H), 7.76-7.78 (m, 4H), 7.91 7.98 (m, 4H)
また、前記一般式(1)からなる光学用組成物は、必要な材料全てが溶解する溶剤中で混合し、溶剤を減圧留去して製造した。その際、光学用組成物の重合を抑制するため5%の酸素を含んだ気体を液中に通しながら行った。 Moreover, the composition for optics which consists of said General formula (1) was mixed in the solvent in which all the required materials melt | dissolve, and the solvent was depressurizingly distilled and manufactured. At that time, in order to suppress the polymerization of the optical composition, it was carried out while passing a gas containing 5% oxygen into the liquid.
(評価サンプルの作製手順)
(1)光学用組成物の調製
一般式(1)で表わされる化合物の含有量が、各実施例または各比較例に示される含有量となるように、それぞれの材料を秤量し混合した。その混合物に対し、0.1質量%の重合禁止剤としての4−メトキシフェノール、1.0質量%の重合開始剤としての1−ヒドロキシ−シクロヘキシルフェニルケトン(IRGACURE 184/BASF社(旧チバ社)製)を秤量した。上記混合物と秤量した化合物とを、一般式(1)の3倍量のアセトンに全ての材料を溶解させて混合した後、アセトンを留去することで光学用組成物を調製した。残留溶剤量を少なくするため溶媒留去の最終工程は5%の酸素を含んだ気体を液中に通しながら80℃で15分間減圧留去した。
(Preparation procedure of evaluation sample)
(1) Preparation of composition for optics Each material was weighed and mixed so that content of the compound represented by General formula (1) might become content shown by each Example or each comparative example. 0.1 mass% of 4-methoxyphenol as a polymerization inhibitor, 1.0 mass% of 1-hydroxy-cyclohexyl phenyl ketone as a polymerization initiator (IRGACURE 184 / BASF (formerly Ciba)) relative to the mixture Product was weighed. An optical composition was prepared by dissolving and mixing all the materials in a 3-fold amount of acetone of general formula (1) and mixing the above mixture and the weighed compounds. In order to reduce the amount of residual solvent, the final step of solvent evaporation was evaporation under reduced pressure at 80 ° C. for 15 minutes while passing a gas containing 5% oxygen through the solution.
(2)評価用サンプルの作製
(2a)屈折率測定用サンプル
直径30mmの円板型のガラス基板を2枚用意して、測定対象となる重合禁止剤、重合開始剤等を含む前記光学用組成物を、厚さが500μmで均一になるように、スペーサーを設置したガラス基板で挟んだ。サンプルに紫外光を照射することで2枚のガラス基板に挟まっている前記光学用組成物を硬化させ、屈折率測定用サンプルを製造した。
(2) Preparation of Sample for Evaluation (2a) Sample for Refractive Index Measurement Two disc-shaped glass substrates each having a diameter of 30 mm are prepared, and the above optical composition containing a polymerization inhibitor to be measured, a polymerization initiator, etc. The object was sandwiched by a glass substrate provided with a spacer so as to be uniform at a thickness of 500 μm. The sample was irradiated with ultraviolet light to cure the optical composition sandwiched between the two glass substrates, and a sample for measuring the refractive index was manufactured.
(2b)透過率測定用サンプル
直径30mmの円板型のガラス基板を4枚用意して、測定対象となる重合禁止剤、重合開始剤等を含む前記光学用組成物を、厚さが500μm及び200μmで均一になるように、スペーサーを設置したガラス基板で挟んだ。それぞれのサンプルに紫外光を照射することで2枚のガラス基板に挟まっている前記光学用組成物を硬化させ、透過率測定用サンプルを製造した。
(2b) Samples for transmittance measurement Prepare four disk-shaped glass substrates with a diameter of 30 mm, and use the above-mentioned optical composition containing a polymerization inhibitor to be measured, a polymerization initiator, etc. to a thickness of 500 μm and It was sandwiched by a glass substrate provided with a spacer so as to be uniform at 200 μm. Each sample was irradiated with ultraviolet light to cure the optical composition sandwiched between the two glass substrates, and a sample for transmittance measurement was manufactured.
(2c)密着力測定用サンプル
直径30mm、厚さ1mmの円板型のガラス基板、直径15mm、厚さ5mmの円板型のガラス基板を用意して、測定対象となる重合禁止剤、重合開始剤等を含む前記光学用組成物を、厚さ50μmになるようにスペーサーを設置して前記ガラス基板で挟んだ。そこに紫外光を照射することで2枚のガラス基板に挟まっている前記光学用組成物を硬化させ、密着力測定用サンプルを製造した。
(2c) Sample for measuring adhesion force Prepare a disc-shaped glass substrate of 30 mm in diameter and 1 mm in thickness, and a disc-shaped glass substrate of 15 mm in diameter and 5 mm in thickness, A spacer was installed so as to have a thickness of 50 μm, and the above-mentioned optical composition containing an agent etc. was sandwiched by the above-mentioned glass substrate. The composition for optics pinched between two glass substrates was hardened by irradiating ultraviolet light there, and the sample for adhesion measurement was manufactured.
(作製サンプルの評価方法)
(2)測定及び評価
(2a)屈折率、分散特性(アッベ数)、2次分散特性(θg,F)
アッベ屈折計(カルニュー光学工業)を用いて測定し、表には波長587.6nmでの屈折率並びに下記式より算出した分散特性及び2次分散特性を示す。
アッベ数(分散特性) :[νd]=(nd−1)/(nF−nC)
2次分散特性 :[θg,F]=(ng−nF)/(nF−nC)
(Evaluation method of preparation sample)
(2) Measurement and evaluation (2a) Refractive index, dispersion characteristic (Abbe number), second-order dispersion characteristic (θg, F)
The refractive index at a wavelength of 587.6 nm and the dispersion characteristics and secondary dispersion characteristics calculated from the following equation are shown in the table.
Abbe number (dispersion characteristic): [ν d ] = (n d −1) / (n F −n C )
Secondary dispersion characteristic: [θg, F] = ( n g -n F) / (n F -n C)
2次分散特性(θg,F)は、下記の基準で評価した。
A:0.75以上(色収差補正効果が非常に高く、また薄膜にしてもその効果を発揮することができるため耐久性の観点においても非常に有用である。)
B:0.68以上0.75未満(色収差補正効果は高いが効果を十分に発揮させるためにはレンズの膜厚を厚くする必要があるため耐久性に注意する必要がある。)
C:0.68未満(膜厚を厚くしても色収差補正効果が低い。)
Second-order dispersion characteristics (θg, F) were evaluated according to the following criteria.
A: 0.75 or more (The effect of correcting the chromatic aberration is very high, and even if it is a thin film, the effect can be exhibited, which is also very useful in terms of durability.)
B: 0.68 or more and less than 0.75 (The chromatic aberration correction effect is high, but in order to exert the effect sufficiently, it is necessary to increase the film thickness of the lens, so it is necessary to pay attention to the durability)
C: less than 0.68 (the chromatic aberration correction effect is low even if the film thickness is increased)
(2b)透過率
日立ハイテクノロジー社製分光光度計U−4000(製品名)を用いて、500μm、200μmのサンプルをそれぞれ測定した。それぞれのデータから500μmの内部透過率を算出し、波長430nmでの透過率を計算した。透過率は、下記の基準で評価した。
A:透過率が98%以上(硝材と組み合わせて使用する光学系において、数多くの機種の光学系に組み込むことが可能である。)
B:透過率が93%以上98%未満(透過率の高い硝材を使用した特定の光学系においてのみ使用可能である。)
C:透過率が93%未満(薄膜化することで特定の光学系においてのみ使用すること可能である。)
(2b) Transmittance Samples of 500 μm and 200 μm were respectively measured using a spectrophotometer U-4000 (product name) manufactured by Hitachi High-Technologies Corporation. The internal transmittance of 500 μm was calculated from each data, and the transmittance at a wavelength of 430 nm was calculated. The transmittance was evaluated based on the following criteria.
A: Transmittance 98% or more (In an optical system used in combination with a glass material, it is possible to incorporate it into many types of optical systems.)
B: Transmittance 93% or more and less than 98% (It can be used only in a specific optical system using a glass material having a high transmittance)
C: Transmittance of less than 93% (It is possible to use only in a specific optical system by thinning)
(2c)密着力
治具を使用して直径30mmの基板、直径15mmの基板を固定し、インストロンジャパン製の引張試験機5581を用い、0.1mm/minで引張試験を行うことで樹脂層の密着力を測定し、破断時の最大荷重を求めた。密着性は下記の基準で評価した。
A:最大荷重が140N以上(離型力が高い時でもはがれることなく成形することが可能であり、さらに信頼性試験時でもはがれることがほとんどない。)
B:最大荷重が100N以上140N未満(離型力が高い時に稀にはがれることがあるが信頼性試験時でははがれることがほとんどない。)
C:最大荷重が100N未満(離型時にはがれやすく離型剤を使用することが好ましく、信頼性試験でもはがれることがある。)
(2c) Adhesive force A substrate with a diameter of 30 mm and a substrate with a diameter of 15 mm are fixed using a jig, and a tensile test is conducted at 0.1 mm / min using an Instron Japan tensile tester 5581 to obtain a resin layer. The adhesion of the sample was measured to determine the maximum load at break. The adhesion was evaluated based on the following criteria.
A: The maximum load is 140 N or more (It is possible to mold without peeling even when the mold release force is high, and it hardly peels even in the reliability test)
B: The maximum load is 100 N or more and less than 140 N (It may peel off rarely when the mold release force is high, but it hardly peels off in the reliability test)
C: Maximum load is less than 100 N (It is preferable to use a mold release agent because it is easy to peel off during mold release, and may peel off even in the reliability test)
(実施例1〜7)
表1に記載の添加割合でそれぞれの材料を秤量し、重合開始剤及び重合禁止剤を更に秤量し、上記の方法で調製及び評価を行った。評価結果を表1に示す。
(Examples 1 to 7)
Each material was weighed at the addition ratio described in Table 1, the polymerization initiator and the polymerization inhibitor were further weighed, and the preparation and evaluation were performed by the above-mentioned method. The evaluation results are shown in Table 1.
(比較例1〜3)
表1に記載の添加割合でそれぞれの材料を秤量し、重合開始剤及び重合禁止剤を更に秤量し、前記の方法で調製及び評価を行った。評価結果を表1に示す。
(Comparative Examples 1 to 3)
Each material was weighed at the addition ratio described in Table 1, the polymerization initiator and the polymerization inhibitor were further weighed, and the preparation and evaluation were performed by the method described above. The evaluation results are shown in Table 1.
本発明の光学素子は、レンズ、プリズムに用いることができる。また、本発明の光学機器は、本発明の光学素子を有する望遠鏡、双眼鏡、カメラ等に用いることができる。 The optical element of the present invention can be used for lenses and prisms. Further, the optical apparatus of the present invention can be used for a telescope, binoculars, a camera or the like having the optical element of the present invention.
10 光学部材
20、30、40 基板
10
Claims (13)
(一般式(1)中、R1及びR2は、下記の一般式(2)乃至(5)から選ばれる一つであり、それぞれ同じであっても異なっていても良い。
一般式(2)乃至(5)中、Z1乃至Z4は、水素、炭素、酸素、硫黄、窒素又はハロゲンを結合原子とする分子量1以上200未満の置換基であって、それぞれ同じであっても異なっていても良い。aは1又は2であり、aが2の場合はZ1、Z3、Z4は同じであっても異なっていても良い。bは1乃至3から選ばれるいずれかの整数であり、bが2又は3の場合、Z2は同じであっても異なっていても良い。) A cured product characterized in that a compound represented by the following general formula (1) is polymerized or copolymerized, or a compound represented by the following general formula (1) is dispersed in a polymer material.
(In General Formula (1), R 1 and R 2 are one selected from the following General Formulas (2) to (5), and they may be the same or different from each other.
In the general formulas (2) to (5), Z 1 to Z 4 each represent a substituent having a molecular weight of 1 or more and less than 200, each of which has hydrogen, carbon, oxygen, sulfur, nitrogen or halogen as a bonding atom. Or even different. a is 1 or 2, and when a is 2, Z 1 , Z 3 and Z 4 may be the same or different. b is any integer selected from 1 to 3, and when b is 2 or 3, Z 2 may be the same or different. )
(一般式(1)中、R1、R2は、下記の一般式(2)乃至(5)から選ばれるいずれか一つであり、それぞれ同じであっても異なっていても良い。
前記一般式(2)乃至(5)中、Z1乃至Z4は、水素、炭素、酸素、硫黄、窒素又はハロゲンで始まる分子量1以上200未満の置換基であって、それぞれ同じであっても異なっていても良い。aは1又は2であり、aが2の場合はZ1、Z3、Z4は同じであっても異なっていても良い。bは1乃至3から選ばれる一つであり、bが2又は3の場合、Z2は同じであっても異なっていても良い。) The compound represented by following General formula (1).
(In General Formula (1), R 1 and R 2 are any one selected from the following General Formulas (2) to (5), and they may be the same or different from each other.
In the general formulas (2) to (5), Z 1 to Z 4 each represents a substituent having a molecular weight of 1 or more and less than 200 starting with hydrogen, carbon, oxygen, sulfur, nitrogen or halogen It may be different. a is 1 or 2, and when a is 2, Z 1 , Z 3 and Z 4 may be the same or different. b is one selected from 1 to 3, and when b is 2 or 3, Z 2 may be the same or different. )
前記硬化物を成形する工程と、を有することを特徴とすることを特徴とする光学素子の製造方法。 Providing the cured product according to any one of claims 1 to 3 on or between the substrates;
And b. Molding the cured product.
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