JP2019099864A - Etching agent for roughening surface of base material, at least all or part of the surface composed of aluminum or aluminum alloy, method for producing roughened base material, roughened base material, method for producing joint of base material-resin cured product, and joint of base material-resin cured product - Google Patents

Etching agent for roughening surface of base material, at least all or part of the surface composed of aluminum or aluminum alloy, method for producing roughened base material, roughened base material, method for producing joint of base material-resin cured product, and joint of base material-resin cured product Download PDF

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JP2019099864A
JP2019099864A JP2017231283A JP2017231283A JP2019099864A JP 2019099864 A JP2019099864 A JP 2019099864A JP 2017231283 A JP2017231283 A JP 2017231283A JP 2017231283 A JP2017231283 A JP 2017231283A JP 2019099864 A JP2019099864 A JP 2019099864A
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base material
resin
substrate
cured product
bonded
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JP6967953B2 (en
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遼 平野
Ryo Hirano
遼 平野
太一 永井
Taichi Nagai
太一 永井
益代 西村
Masuyo Nishimura
益代 西村
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Nihon Parkerizing Co Ltd
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Nihon Parkerizing Co Ltd
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Priority to CN201880074136.3A priority patent/CN111386361B/en
Priority to KR1020207014238A priority patent/KR102447059B1/en
Priority to PCT/JP2018/044116 priority patent/WO2019107529A1/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/14Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/17Component parts, details or accessories; Auxiliary operations
    • B29C45/26Moulds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/56Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using mechanical means or mechanical connections, e.g. form-fits
    • B29C65/64Joining a non-plastics element to a plastics element, e.g. by force
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/54Contact plating, i.e. electroless electrochemical plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/10Etching compositions
    • C23F1/14Aqueous compositions
    • C23F1/16Acidic compositions
    • C23F1/20Acidic compositions for etching aluminium or alloys thereof

Abstract

To provide an etching agent that allows a rough surface having excellent joint strength with a resin to be formed on an aluminum-containing base material.SOLUTION: The present invention provides an etching agent for roughening a surface of a base material, at least all or part of the surface composed of aluminum or aluminum alloy, comprising at least peroxodisulfate ions and chloride ions.SELECTED DRAWING: None

Description

本発明は、少なくとも表面の全部又は一部がアルミニウム又はアルミニウム合金からなる基材(以下、「アルミニウム含有基材」と称することもある)の表面を粗面化するためのエッチング剤、粗面化基材の製造方法、粗面化基材、基材−樹脂硬化物の接合体の製造方法、及び基材−樹脂硬化物の接合体に関する。   The present invention is an etching agent for roughening the surface of a substrate (hereinafter sometimes referred to as "aluminum-containing substrate") in which at least all or part of the surface is aluminum or an aluminum alloy The present invention relates to a method for producing a substrate, a roughened substrate, a method for producing a bonded substrate-resin cured product, and a bonded substrate-resin cured product.

金属と樹脂との接合技術について、射出成形接合、接着剤接合等が検討されている。   Injection molding bonding, adhesive bonding, and the like have been studied as a bonding technology between metal and resin.

例えば、特許文献1では、両性金属イオン、酸化剤、及びアルカリ源を含むアルカリ系エッチング剤又は第二鉄イオン及び第二銅イオンの少なくとも一方、及び酸を含む酸系エッチング剤によって、アルミニウム製部品の表面を粗化処理する工程を含むアルミニウム−樹脂複合体の製造方法が開示されている。   For example, in Patent Document 1, the aluminum component is made of an alkaline etching agent containing an amphoteric metal ion, an oxidizing agent, and an alkali source, or an acid etching agent containing at least one of a ferric ion and a cupric ion, and an acid. A process for producing an aluminum-resin composite is disclosed which comprises the step of roughening the surface of

また、特許文献2では、アルミニウム合金製のアルミ形状体に対し、ハロゲンイオン濃度を特定範囲で含む塩酸水溶液又はリン酸水溶液からなるエッチング液でエッチング処理を行う工程を含む、アルミ・樹脂射出一体成形品の製造方法が開示されている。   Moreover, in patent document 2, aluminum / resin injection integral molding including the process of performing an etching process with the etching solution which consists of hydrochloric acid aqueous solution or phosphoric acid aqueous solution containing halogen ion concentration in a specific range with respect to the aluminum shaped object made of aluminum alloy A method of manufacturing an article is disclosed.

特開2013−52671号公報JP, 2013-52671, A 特開2013−177004号公報JP, 2013-177004, A

上記特許文献1及び2に記載の基材−樹脂硬化物の接合体は、基材と樹脂との接合強度が不十分の場合がある。それゆえ、基材と樹脂が強固に接合した基材−樹脂硬化物の接合体が求められている。そこで、本発明は、アルミニウム含有基材に対して、樹脂との接合強度に優れた粗面を形成させることができるエッチング剤等を提供することを目的とする。   There are cases where the bonding strength between the base and the resin of the base-resin cured product described in Patent Documents 1 and 2 is insufficient. Therefore, there is a demand for a base-resin cured product in which the base and the resin are strongly bonded. Then, an object of this invention is to provide the etching agent etc. which can form the rough surface excellent in the joint strength with resin with respect to the aluminum containing base material.

本発明者らは、上記課題を解決するために鋭意検討した結果、アルミニウム含有基材を、ペルオキソ二硫酸イオンと塩化物イオンを含むエッチング剤と接触させることにより、樹脂との接合強度に優れる粗面を形成できることを見出し、本発明を完成するに至った。   As a result of intensive studies to solve the above problems, the present inventors roughly contact the aluminum-containing substrate with an etching agent containing a peroxodisulfate ion and a chloride ion to obtain a rough bonding strength with the resin. It has been found that a surface can be formed, and the present invention has been completed.

すなわち、本発明は、
(1)少なくとも表面の全部又は一部がアルミニウム又はアルミニウム合金からなる基材の表面を粗面化するためのエッチング剤であって、少なくともペルオキソ二硫酸イオンと塩化物イオンを含む、エッチング剤。
(2)少なくとも表面の全部又は一部がアルミニウム又はアルミニウム合金からなる基材の表面又は表面上に、(1)に記載のエッチング剤を接触させるエッチング工程を含む、粗面化基材の製造方法。
(3)前記エッチング工程の前に、前記基材の表面にジンケート皮膜を形成させるジンケート工程を含む、(2)に記載の粗面化基材の製造方法。
(4)(2)又は(3)に記載の粗面化基材の製造方法によって得られる粗面化基材。
(5)少なくとも表面の全部又は一部がアルミニウム又はアルミニウム合金からなる基材の表面又は表面上に、(1)に記載のエッチング剤を接触させるエッチング工程と、前記エッチング剤を接触させ、前記基材を粗面化することにより形成された凹みに樹脂組成物を入れる工程と、を含む、基材−樹脂硬化物の接合体の製造方法。
(6)前記エッチング工程の前に、前記基材の表面にジンケート皮膜を形成させるジンケート工程を含む、(5)に記載の基材−樹脂硬化物の接合体の製造方法。
(7)(5)又は(6)に記載の製造方法によって得られる基材−樹脂硬化物の接合体。からなる。
That is, the present invention
(1) An etching agent for roughening the surface of a substrate at least the whole surface of which is partially or entirely made of aluminum or an aluminum alloy, the etching agent containing at least peroxodisulfate ion and chloride ion.
(2) A method for producing a roughened substrate, comprising an etching step in which the etching agent according to (1) is brought into contact with the surface or the surface of a substrate at least the whole surface of which is partially or partially aluminum or aluminum alloy. .
(3) The method for producing a roughened substrate according to (2), including a zincate step of forming a zincate film on the surface of the substrate before the etching step.
(4) A roughened substrate obtained by the method for producing a roughened substrate according to (2) or (3).
(5) an etching step in which the etching agent according to (1) is brought into contact with the surface or the surface of a substrate at least the whole surface of which is partially or entirely made of aluminum or an aluminum alloy; And D. placing the resin composition in the depression formed by roughening the material.
(6) The manufacturing method of the conjugate | zygote of the base-resin cured | curing material as described in (5) including the zincate process which forms a zincate film | membrane in the surface of the said base material before the said etching process.
(7) A bonded substrate-resin cured product obtained by the method according to (5) or (6). It consists of

本発明により、アルミニウム含有基材に対して、樹脂との接合強度に優れる粗面を形成させることができるエッチング剤等を提供することができる。   ADVANTAGE OF THE INVENTION By this invention, the etching agent etc. which can form the rough surface which is excellent in the joint strength with resin with respect to an aluminum containing base material can be provided.

以下、本発明の実施形態について詳細に説明する。   Hereinafter, embodiments of the present invention will be described in detail.

≪エッチング剤≫
本発明の実施形態に係るエッチング剤は、ペルオキソ二硫酸イオンと塩化物イオンを少なくとも含む水溶液である。前記エッチング剤をアルミニウム含有基材の表面又は表面上に接触させることで、前記基材を粗面化することができる。前記エッチング剤は、ペルオキソ二硫酸化合物と塩素化合物を水に溶解させて調製する。前記エッチング剤中には、前記基材由来のアルミニウム、マグネシウム、ケイ素、チタン、クロム、マンガン、鉄、ニッケル、銅、亜鉛等の元素が存在していてもよい。また、後述するジンケート工程で形成した皮膜が溶解することによって、亜鉛等の元素が混入していてもよい。
«Etchant»
The etching agent according to the embodiment of the present invention is an aqueous solution containing at least peroxodisulfate ion and chloride ion. The substrate can be roughened by bringing the etching agent into contact with the surface or surface of the aluminum-containing substrate. The etchant is prepared by dissolving a peroxodisulfuric acid compound and a chlorine compound in water. In the etching agent, an element such as aluminum, magnesium, silicon, titanium, chromium, manganese, iron, nickel, copper, zinc or the like derived from the base material may be present. Moreover, elements, such as zinc, may be mixed by melt | dissolving the film | membrane formed at the zincate process mentioned later.

本発明の実施形態に係るエッチング剤は、ペルオキソ二硫酸イオン(S 2−)を含む。ペルオキソ二硫酸イオン源としては、例えば、ペルオキソ二硫酸ナトリウム、ペルオキソ二硫酸カリウム、ペルオキソ二硫酸アンモニウム等のペルオキソ二硫酸化合物から適当なものを1種又は2種以上選択することができるが、これらに限定されるものではない。本発明の実施形態に係るエッチング剤は、ペルオキソ二硫酸イオンを好ましくは0.02mol/L以上0.90mol/L以下、より好ましくは0.10mol/L以上0.50mol/L以下、さらに好ましくは0.15mol/L以上0.40mol/L以下を含む。 An etchant according to an embodiment of the present invention comprises peroxodisulfate ion (S 2 O 8 2− ). As a source of peroxodisulfate ion, for example, one or more suitable ones can be selected from peroxodisulfate compounds such as sodium peroxodisulfate, potassium peroxodisulfate, ammonium peroxodisulfate, etc. It is not something to be done. The etching agent according to the embodiment of the present invention is preferably 0.02 mol / L or more and 0.90 mol / L or less, more preferably 0.10 mol / L or more and 0.50 mol / L or less, more preferably peroxodisulfate ion. Including 0.15 mol / L or more and 0.40 mol / L or less.

本発明の実施形態に係るエッチング剤は、塩化物イオン(Cl)を含む。塩化物イオン源としては、例えば、塩化リチウム、塩化ナトリウム、塩化カリウム、塩化カルシウム、塩化アンモニウム等の塩素化合物から適当なものを1種又は2種以上選択することができるが、これらに限定されるものではない。ただし、塩化鉄等の遷移金属の塩化物は用いないことが好ましい。また、塩酸を用いるとミストが発生し、作業者への健康被害や、周辺の金属性部品や装置を腐食させる可能性があるため、用いないことが好ましい。本発明の実施形態に係るエッチング剤は、塩化物イオンを好ましくは0.40mol/L以上2.50mol/L以下、より好ましくは0.80mol/L以上2.00mol/L以下、さらに好ましくは1.20mol/L以上1.70mol/L以下を含む。
本発明の実施形態に係るエッチング剤は、リン酸を実質的に含まなくてもよい。実質的に含まないとは、検出限界以下であることをいう。
本発明の実施形態にかかるエッチング剤のpHは、6.0以下の範囲内であることが好ましく、2.0から4.0の範囲内であることがより好ましい。
エッチング剤のpHは、市販のpH計測機器及び電極に制限はなく、これらを用いて測定することができる。また、pH計測機器及び電極が温度補償機能を有する機器を用い、
pH電極の内部液と市販のpH標準液とを、エッチング剤等と同一のそれぞれの温度に調整してpH計測機器を校正すれば、前記エッチング剤等の使用する温度におけるpHを計測することもできる。
An etchant according to an embodiment of the present invention comprises chloride ion (Cl ). As a chloride ion source, for example, one or more suitable ones can be selected from chlorine compounds such as lithium chloride, sodium chloride, potassium chloride, calcium chloride, ammonium chloride and the like, but are limited thereto It is not a thing. However, it is preferable not to use a chloride of a transition metal such as iron chloride. In addition, it is preferable not to use hydrochloric acid because it may generate mist, which may cause health damage to workers and may corrode surrounding metal parts and devices. The etching agent according to the embodiment of the present invention preferably has a chloride ion of 0.40 mol / L or more and 2.50 mol / L or less, more preferably 0.80 mol / L or more and 2.00 mol / L or less, still more preferably 1 20 mol / L or more and 1.70 mol / L or less are included.
The etching agent according to the embodiment of the present invention may be substantially free of phosphoric acid. Substantially not included means below the detection limit.
The pH of the etching agent according to the embodiment of the present invention is preferably in the range of 6.0 or less, more preferably in the range of 2.0 to 4.0.
The pH of the etching agent is not limited to commercially available pH measuring devices and electrodes, and can be measured using these. In addition, pH measuring equipment and equipment using temperature compensating function,
If the pH measuring equipment is calibrated by adjusting the internal solution of the pH electrode and the commercially available pH standard solution to the same temperature as the etching agent etc., the pH at the temperature used for the etching agent etc. can also be measured. it can.

≪粗面化基材の製造方法及び基材−樹脂硬化物の接合体の製造方法≫
本発明の実施形態に係る粗面化基材の製造方法は、前記基材の表面又は表面上に、少なくともペルオキソ二硫酸イオンと塩化物イオンを含むエッチング剤と接触させるエッチング工程を含む。また、本発明の実施形態に係る基材−樹脂硬化物の接合体の製造方法は、前記エッチング工程と、前記エッチング剤を接触させて前記基材を粗面化することにより形成された凹みに樹脂組成物を入れる工程と、を含む。本発明の実施形態に係る粗面化基材の製造方法により得られる粗面化基材の表面又は表面上に、射出成形接合や接着剤接合のような、粗面化することにより形成された凹みに樹脂組成物を入れる工程(単に樹脂組成物を凹みに入れる工程ともいう)を行うことによって、基材と、樹脂組成物を強固に接合することができる。また、本発明の実施形態に係る粗面化基材の製造方法及び基材−樹脂硬化物の接合体の製造方法のいずれにおいても、エッチング工程を行う前に、前記基材の表面にジンケート皮膜を形成させるジンケート工程を行うことが好ましい。なお、本発明の実施形態に係る粗面化基材の製造方法及び基材−樹脂硬化物の接合体の製造方法においては、他の工程が存在していてもよい。当該他の工程の例としては、各工程を行う前に、前記基材の表面を清浄化させる表面清浄工程を挙げることができる。また、エッチング工程を行った後、樹脂組成物を凹みに入れる工程を行う前に、皮膜を形成する後処理工程を行ってもよい。各工程は、必要であれば繰り返し行ってもよい。
<< Method of Producing Roughened Substrate and Method of Producing Bond of Base Material-Resin Cured Product >>
The method for producing a roughened substrate according to an embodiment of the present invention includes an etching step of contacting the surface or surface of the substrate with an etchant containing at least peroxodisulfate ion and chloride ion. Further, in the method of manufacturing a bonded base material-cured resin product according to an embodiment of the present invention, the etching step and the recess formed by bringing the etching agent into contact to roughen the base material are used. And D. placing the resin composition. The surface or surface of the roughened substrate obtained by the method for producing a roughened substrate according to an embodiment of the present invention is formed by roughening such as injection molding bonding and adhesive bonding. By performing the step of placing the resin composition in the recess (also referred to as simply the step of placing the resin composition in the recess), the base material and the resin composition can be firmly bonded. Further, in any of the method for producing a roughened substrate and the method for producing a bonded base-resin cured product according to an embodiment of the present invention, a zincate film is provided on the surface of the substrate before the etching step is performed. Preferably, a zincate step is carried out to form In addition, another process may exist in the manufacturing method of the roughening base material which concerns on embodiment of this invention, and the manufacturing method of the conjugate | zygote of a base material-resin cured material. As an example of the said other process, the surface cleaning process of which the surface of the said base material is cleaned before performing each process can be mentioned. Moreover, after performing an etching process, before performing the process of putting a resin composition into a dent, you may perform the post-processing process which forms a film. Each step may be repeated if necessary.

本発明の実施形態に係る粗面化基材の製造方法は、エッチング工程とそれ以外の後述する任意の工程を以下に例示するように含んでもよい。基材を脱脂処理する工程(任意)→基材をアルカリ洗処理する工程(任意)→基材を酸洗処理する工程(任意)→ジンケート工程(任意)→エッチング工程。なお、基材をアルカリ洗処理する工程と基材を酸洗処理する工程の順番は逆であってもよく、どちらか一方のみを含んでいてもよく、どちらも含んでいなくてもよい。
本発明の実施形態に係る基材−樹脂硬化物の接合体の製造方法は、エッチング工程及び樹脂組成物を凹みに入れる工程と、それら以外の後述する任意の工程を以下に例示するように含んでもよい。基材を脱脂処理する工程(任意)→基材をアルカリ洗処理する工程(任意)→基材を酸洗処理する工程(任意)→ジンケート工程(任意)→エッチング工程→後処理工程(任意)→樹脂組成物を凹みに入れる工程。なお、基材をアルカリ洗処理する工程と基材を酸洗処理する工程の順番は逆であってもよく、どちらか一方のみを含んでいてもよく、どちらも含んでいなくてもよい。
以下、基材及び各工程を詳述する。
The method for producing a roughened substrate according to the embodiment of the present invention may include the etching step and other optional steps described below as exemplified below. Step of degreasing the substrate (optional) → step of alkaline cleaning the substrate (optional) → step of pickling the substrate (optional) → zincate step (optional) → etching step In addition, the order of the process of carrying out the alkali washing process of a base material, and the process of carrying out an acid washing process of a base material may be reverse, may contain only any one, and does not need to contain both.
The method for producing a bonded base material-cured resin product according to an embodiment of the present invention includes an etching step and a step of putting a resin composition in a recess, and other optional steps described below as exemplified below. May be. Step of degreasing the substrate (optional) → step of alkaline cleaning the substrate (optional) → step of pickling the substrate (optional) → zincate step (optional) → etching step → post treatment step (optional) → A step of putting the resin composition into a recess. In addition, the order of the process of carrying out the alkali washing process of a base material, and the process of carrying out an acid washing process of a base material may be reverse, may contain only any one, and does not need to contain both.
Hereinafter, a base material and each process are explained in full detail.

<基材>
本発明の実施形態に適用される基材は、少なくとも表面の全部又は一部がアルミニウム又はアルミニウム合金からなる基材であれば特に限定されない。前記基材は鋳物材、ダイカスト材を含み、熱処理を施していてもよい。また、前記基材は他の加工及び/又は他の処理がなされていてもよく、例えば、切削加工、研削加工、ブラスト加工、磨き(ラッピング)、穴あけ等の加工がなされていてもよい。また、板材のほか、棒、帯、管、線、箔、鋳鍛造品、軸受等、前記基材の形状は特に限定されない。なお、前記基材は成形品であってもよいし、成形前の材料であってもよい。さらに、前記基材の表面の全部又は一部がアルミニウム又はアルミニウム合金の皮膜であってもよく、その皮膜の形成方法は、例えば、めっき法、溶射法等が挙げられるが、これらに限定されない。前記基材の表面の全部又は一部がアルミニウム又はアルミニウム合金であれば、前記基材の表面以外の部分はアルミニウム又はアルミニウム合金でない材料であってもよく、例えば、アルミニウム又はアルミニウム合金を除く金属、樹脂、ゴム、木材、セラミック、複合材料等が挙げられる
が、これらに限定されない。なお、アルミニウム合金におけるアルミニウム以外の合金成分としては、例えば、マグネシウム、ケイ素、チタン、クロム、マンガン、鉄、ニッケル、銅、亜鉛を挙げることができる。
<Base material>
The base material applied to the embodiment of the present invention is not particularly limited as long as at least all or part of the surface is a base material composed of aluminum or an aluminum alloy. The base material may include a cast material and a die cast material, and may be heat-treated. In addition, the base material may be subjected to other processing and / or other processing, for example, processing such as cutting, grinding, blasting, polishing (lapping), and the like may be performed. Moreover, the shape of the said base materials, such as a rod, a band, a pipe | tube, a wire, a foil, a cast forging, a bearing other than a board | plate material, is not specifically limited. The base material may be a molded product or a material before molding. Furthermore, all or part of the surface of the substrate may be a film of aluminum or an aluminum alloy, and the method of forming the film may be, for example, a plating method or a thermal spraying method, but is not limited thereto. If all or part of the surface of the substrate is aluminum or an aluminum alloy, parts other than the surface of the substrate may be materials other than aluminum or aluminum alloy, for example, metals other than aluminum or aluminum alloy, Examples include, but are not limited to, resins, rubbers, woods, ceramics, and composite materials. In addition, as alloy components other than aluminum in aluminum alloy, magnesium, silicon, titanium, chromium, manganese, iron, nickel, copper, zinc can be mentioned, for example.

<ジンケート工程>
エッチング工程の前処理として前記基材の表面にジンケート皮膜を形成させるジンケート工程を行ってもよい。ジンケート工程は、アルミニウムに対するジンケート工程であれば公知の工程を用いることができる。ジンケート工程は、例えば、酸化亜鉛を溶解させた水酸化ナトリウム水溶液を用い、40.0℃以下に浴温を保ち、前記基材を1.0秒から5.0分程度浸漬して、自然酸化膜を除去すると同時にジンケート皮膜を形成させることができる。また、形成された皮膜を前記エッチング剤や硝酸で溶解し、再度皮膜を形成させる操作を1回以上行ってもよい。これらのジンケート工程に用いる処理液には、必須の成分以外に前記基材由来のアルミニウム、マグネシウム、ケイ素、チタン、クロム、マンガン、鉄、ニッケル、銅、亜鉛等の金属が存在していてもよい。
ジンケート工程に用いる処理液のpHは、公知の範囲であれば、制限されるものではなく、例えばアルカリ側のpHを示す処理液の場合は10.0以上でもよく、13.0以上であってもよい。好ましくは、11.0から13.0の範囲内である。ジンケート液のpHを調整するために、水酸化ナトリウム又は水酸化カリウムを用いてpHを上昇させることができる。
<Zincate process>
A zincate step may be performed to form a zincate film on the surface of the substrate as a pretreatment of the etching step. As the zincate process, any known process can be used as long as it is a zincate process for aluminum. In the zincate step, for example, using a sodium hydroxide aqueous solution in which zinc oxide is dissolved, the bath temperature is maintained at 40.0 ° C. or less, and the substrate is immersed for about 1.0 seconds to 5.0 minutes to allow natural oxidation. The zincate film can be formed at the same time as removing the film. In addition, the formed film may be dissolved with the etching agent or nitric acid, and the operation of forming the film again may be performed once or more. In the processing solution used in these zincate steps, metals such as aluminum, magnesium, silicon, titanium, chromium, manganese, iron, nickel, copper, zinc and the like derived from the base may be present in addition to the essential components. .
The pH of the treatment liquid used in the zincate step is not limited as long as it is within a known range, and may be, for example, 10.0 or more and 13.0 or more in the case of a treatment liquid exhibiting a pH on the alkaline side. It is also good. Preferably, it is in the range of 11.0 to 13.0. Sodium hydroxide or potassium hydroxide can be used to raise the pH to adjust the pH of the zincate solution.

<エッチング工程>
本発明の実施形態に係る粗面化基材の製造方法及び基材−樹脂硬化物の接合体の製造方法では、前記基材の表面又は表面上に前記エッチング剤を接触させるエッチング工程が必須である。前記エッチング剤は液温10.0から70.0℃とすることが好ましい。このエッチング剤に前記基材を、例えば浸漬することで接触させる。本発明の実施形態に係る粗面化基材の製造方法及び基材−樹脂硬化物の接合体の製造方法がジンケート工程を含む場合、前記エッチング剤にジンケート工程後の前記基材を接触させる。接触時間は液温及びpHによって異なるが、例えば、1.0秒間から3600.0秒間の範囲内である。エッチング工程の温度については、5.0から70.0℃であることが好ましく、20.0から40.0℃であることがより好ましい。
<Etching process>
In the method for producing a roughened substrate and the method for producing a bonded base-resin cured product according to an embodiment of the present invention, it is essential to use an etching step to bring the etching agent into contact with the surface or the surface of the substrate. is there. The etchant preferably has a solution temperature of 10.0 to 70.0 ° C. The substrate is brought into contact with the etchant, for example, by immersion. When the method for producing a roughened substrate and the method for producing a bonded base-resin cured product according to an embodiment of the present invention include a zincate step, the etching agent is brought into contact with the substrate after the zincate step. The contact time varies depending on the liquid temperature and pH but is, for example, in the range of 1.0 second to 3600.0 seconds. The temperature of the etching step is preferably 5.0 to 70.0 ° C., and more preferably 20.0 to 40.0 ° C.

<他の工程>
(表面清浄工程)
本発明の実施形態に係る製造方法は、全ての工程を行う前に、予め、前記基材の表面を清浄化させる表面清浄工程を含んでいてもよい。例えば、表面清浄工程の一例として、前記基材の表面を脱脂処理する工程を挙げることができる。脱脂処理の方法は、特に限定されず、例えば、溶剤系、水系又はエマルジョン系の脱脂剤を用いる手法を挙げることができる。ここで、当該脱脂剤は、アルカリ塩、界面活性剤等を含んでいてもよい。上記脱脂処理する工程の時間は0.5から30.0分であることが好ましい。上記脱脂処理する工程の温度は30.0から70.0℃であることが好ましい。また、表面清浄工程の一例として、前記基材の表面をアルカリ洗処理する工程を挙げることができる。アルカリ洗処理で用いられる薬剤としては、公知のものを適用することができる。上記脱脂処理する工程の後に、アルカリ洗処理する工程を行ってもよい。
上記アルカリ洗処理する工程の時間は0.5から30.0分であることが好ましい。上記アルカリ洗処理する工程の温度は30.0から70.0℃であることが好ましい。また、表面清浄工程の一例として、前記基材の表面を酸洗処理する工程を挙げることができる。酸洗処理で用いられる薬剤としては、公知のものを適用することができる。なお、上記脱脂処理する工程の後に、酸洗処理する工程を行ってもよい。上記酸洗処理する工程の時間は0.5から30.0分であることが好ましい。上記酸洗処理する工程の温度は30.0から70.0℃であることが好ましい。
<Other process>
(Surface cleaning process)
The manufacturing method according to the embodiment of the present invention may include a surface cleaning step of cleaning the surface of the substrate in advance before performing all the steps. For example, the process of degreasing the surface of the said base material can be mentioned as an example of a surface cleaning process. The method of the degreasing treatment is not particularly limited, and examples thereof include a method using a solvent-based, water-based or emulsion-based degreasing agent. Here, the degreasing agent may contain an alkali salt, a surfactant and the like. The time of the above-mentioned degreasing process is preferably 0.5 to 30.0 minutes. The temperature of the degreasing step is preferably 30.0 to 70.0 ° C. Moreover, the process of carrying out the alkali cleaning process of the surface of the said base material can be mentioned as an example of a surface cleaning process. A publicly known thing can be applied as an agent used by alkaline washing treatment. After the degreasing step, an alkaline washing step may be performed.
It is preferable that the time of the process of the said alkali cleaning treatment is 0.5 to 30.0 minutes. It is preferable that the temperature of the said process of carrying out the said alkali cleaning is 30.0 to 70.0 degreeC. Moreover, the process of pickling the surface of the said base material can be mentioned as an example of a surface cleaning process. A publicly known thing can be applied as a medicine used by acid wash processing. A step of pickling may be performed after the step of degreasing. It is preferable that the time of the process of the said acid wash process is 0.5 to 30.0 minutes. It is preferable that the temperature of the process of the said acid wash process is 30.0 to 70.0 degreeC.

(後処理工程)
本発明の実施形態に係る製造方法によるエッチング工程の後、前記基材の表面に皮膜を形成させてもよい。皮膜の形成方法は塗布型であっても反応型であってもよく、形成させる皮膜として例えば、アルマイト皮膜、化成皮膜(リン酸塩皮膜、クロメート皮膜、ケイ酸塩皮膜、リチウム化成皮膜、カルシウム化成皮膜、酸化ジルコニウム皮膜等)、シランカップリング剤硬化皮膜、及びめっき皮膜等が挙げられるが、これらに限定されない。
(Post-processing process)
After the etching process by the manufacturing method according to the embodiment of the present invention, a film may be formed on the surface of the substrate. The film may be formed by a coating method or a reaction method. Examples of the film to be formed include an alumite film, a chemical conversion film (phosphate film, chromate film, silicate film, lithium conversion film, calcium conversion Although a film, a zirconium oxide film, etc., a silane coupling agent hardened film, a plating film, etc. are mentioned, it is not limited to these.

(その他の処理工程)
前述の工程のほか、必要に応じてその他の工程を適宜行ってもよい。例えば、水洗工程はすべての工程{エッチング工程の前に行う各種処理(例えば、表面清浄工程やジンケート工程)、エッチング工程、後処理工程等の、すべての工程}後に行ってもよい。また、各工程後に適宜乾燥工程を行ってもよい。
(Other processing steps)
Other than the above-described steps, other steps may be performed as appropriate. For example, the water washing step may be performed after all steps {all kinds of processing (for example, surface cleaning step and zincate step) performed before etching step, etching step, post treatment step, etc.}. Moreover, you may perform a drying process suitably after each process.

<基材を粗面化することにより形成された凹みに樹脂組成物を入れる工程>
前記基材の表面又は表面上に前記エッチング剤を接触させるエッチング工程を経て粗面化基材を得た後、粗面化することにより形成された該粗面化基材の凹みに樹脂組成物を入れる工程である。前記樹脂組成物として、後述する熱可塑性樹脂及び接着剤を挙げることができる。前記樹脂組成物を前記粗面化基材の凹みに入れる工程の例として、射出成形又は接着剤接合を挙げることができる。
射出成形として、インサート成形やアウトサート成形を挙げることができる。インサート成形を行う場合、金型を用意してアルミニウム合金を射出成形金型にインサートして、樹脂組成物を射出し、そのまま離型したら既に接合して一体化しているのが好ましい。前記基材を粗面化することにより形成された凹みに、射出成形により樹脂組成物を入れることで、前記基材と樹脂を強固に接合することが可能である。以後、この方法を射出成形接合と呼称することもある。なお、粗面の表面又は表面上にはジンケート工程で形成した皮膜や、後処理工程で形成した皮膜があってもよい。主に射出成形に用いる樹脂組成物を構成する樹脂は熱可塑性樹脂であっても、熱硬化性樹脂であってもよく、例えば、ポリビニル樹脂、ポリアルキレン樹脂、ポリスチレン樹脂、アクリロニトリル・ブタジエン・スチレン共重合樹脂、アクリロニトリル・スチレン共重合樹脂、ポリアクリル樹脂、ポリアルキレンテレフタレート樹脂、ポリアルキレンナフタレート樹脂、ポリオキシアルキレン樹脂、ポリアミド樹脂、ポリイミド樹脂、ポリアセタール樹脂、ポリカーボネート樹脂、ポリフェニレンエーテル樹脂、ポリスルホン樹脂、ポリフェニレンスルフィド樹脂、ポリアリレート樹脂、液晶ポリマー、シンジオタクチックポリスチレン樹脂、フェノール樹脂、エポキシ樹脂、ユリア樹脂、メラミン樹脂、アルキド樹脂、ポリウレタン樹脂、シリコン樹脂、フッ素樹脂等から適当なものを1種又は2種以上選択することができるが、これらに限定されるものではない。また、樹脂には充填材が含まれていてもよく、例えば、ガラス繊維、カーボン繊維、金属繊維、セラミック繊維、ガラスビーズ、カーボン粉末、金属粉末、セラミック粉末、酸化アルミニウム粉末、顔料等から適当なものを1種又は2種以上選択することができるが、これらに限定されるものではない。
<Step of placing the resin composition in the recess formed by roughening the substrate>
A resin composition is provided in the depression of the roughened substrate formed by roughening after obtaining the roughened substrate through an etching step of bringing the etching agent into contact with the surface or the surface of the substrate. Is the process of putting As said resin composition, the thermoplastic resin and adhesive agent which are mentioned later can be mentioned. Injection molding or adhesive bonding can be mentioned as an example of the process of putting the said resin composition in the dent of the said roughening base material.
Injection molding may include insert molding and outsert molding. In the case of insert molding, it is preferable to prepare a mold, insert an aluminum alloy into an injection mold, inject a resin composition, and once bonded and integrated as it is after mold release. It is possible to firmly bond the base and the resin by placing the resin composition by injection molding in a recess formed by roughening the base. Hereinafter, this method may be referred to as injection molding bonding. In addition, the film | membrane formed at the zincate process and the film | membrane formed at the post-process process may exist on the surface or surface of a rough surface. The resin constituting the resin composition mainly used for injection molding may be a thermoplastic resin or a thermosetting resin. For example, polyvinyl resin, polyalkylene resin, polystyrene resin, acrylonitrile / butadiene / styrene copolymer Polymer resin, acrylonitrile / styrene copolymer resin, polyacrylic resin, polyalkylene terephthalate resin, polyalkylene naphthalate resin, polyoxyalkylene resin, polyamide resin, polyamide resin, polyacetal resin, polycarbonate resin, polyphenylene ether resin, polysulfone resin, polyphenylene Sulfide resin, polyarylate resin, liquid crystal polymer, syndiotactic polystyrene resin, phenol resin, epoxy resin, urea resin, melamine resin, alkyd resin, polyurethane resin, Recon resins, those suitable of fluororesin or the like can be selected one or more, but is not limited thereto. Further, the resin may contain a filler, for example, suitable from glass fiber, carbon fiber, metal fiber, ceramic fiber, glass bead, carbon powder, metal powder, ceramic powder, aluminum oxide powder, pigment and the like. Although 1 type, or 2 or more types of things can be selected, it is not limited to these.

前記接着剤接合の方法として、例えば、前記粗面に対し樹脂組成物としての接着剤を塗布して、粗面化基材の凹みに接着剤を入れた後に相手材を貼り合わせ、接着剤を硬化させて接合を行う態様を挙げることができる。このとき、前記基材を粗面化することにより形成された凹みに接着剤を入れることで、前記基材と接着剤を強固に接着することが可能である。前記相手材は、樹脂材料だけでなく、金属、ゴム、木材、セラミック、複合材料を含むあらゆる材料であってよい。また、前記相手材の形状は特に限定されず、板、棒、帯、管、線、フィルム等であってもよい。接着剤は、例えば、塩化ビニル樹脂系接着剤、酢酸ビニル樹脂系接着剤、ポリビニルアルコール系接着剤、ポリアクリル系接着剤、ポリアミド系接着剤、セルロース系接着剤、α−オレフィン系接着剤、水性高分子−イソシアネ
ート系接着剤、シアノアクリレート系接着剤、ユリア樹脂系接着剤、メラミン樹脂系接着剤、フェノール樹脂系接着剤、レゾルシノール樹脂系接着剤、エポキシ樹脂系接着剤、シリコン樹脂系接着剤、ポリエステル系接着剤、ポリウレタン系接着剤、ポリアロマティック系接着剤、クロロプレンゴム系接着剤、ニトリルゴム系接着剤、スチレン・ブタジエンゴム系接着剤、ポリサルファイド系接着剤、ブチルゴム系接着剤、シリコンゴム系接着剤、アクリルゴム系接着剤、ウレタンゴム系接着剤、等から適当なものを1種又は2種以上選択することができるが、これらに限定されるものではない。
As a method for bonding the adhesive, for example, an adhesive as a resin composition is applied to the rough surface, an adhesive is put in a recess of the roughened substrate, and then a mating material is pasted, and the adhesive is The aspect which hardens | cures and joins can be mentioned. At this time, it is possible to firmly bond the adhesive to the base by putting the adhesive in the recess formed by roughening the base. The mating material may be any material including metal, rubber, wood, ceramic and composite material as well as resin material. Further, the shape of the mating material is not particularly limited, and may be a plate, a bar, a band, a tube, a line, a film, or the like. The adhesive includes, for example, vinyl chloride resin adhesive, vinyl acetate resin adhesive, polyvinyl alcohol adhesive, polyacrylic adhesive, polyamide adhesive, cellulose adhesive, α-olefin adhesive, aqueous Polymer-isocyanate adhesive, cyanoacrylate adhesive, urea resin adhesive, melamine resin adhesive, phenol resin adhesive, resorcinol resin adhesive, epoxy resin adhesive, silicone resin adhesive, Polyester adhesive, polyurethane adhesive, polyaromatic adhesive, chloroprene rubber adhesive, nitrile rubber adhesive, styrene butadiene rubber adhesive, polysulfide adhesive, butyl rubber adhesive, silicone rubber Suitable from adhesives, acrylic rubber adhesives, urethane rubber adhesives, etc. It can be selected one or more, but is not limited thereto.

本発明の実施形態に係る基材−樹脂硬化物の接合体は、前記粗面化基材と前記樹脂組成物の硬化物のみから構成されるものであってもよいし、前記粗面化基材と前記樹脂組成物の硬化物に加え、その硬化物に接触する相手材を含むものであってもよい。前記樹脂組成物は、粗面化することにより形成された該粗面化基材の凹みに該樹脂組成物を入れる工程の後に、該樹脂組成物が熱可塑性樹脂組成物であれば冷却により、該樹脂組成物が接着剤であれば放置又は加熱することにより硬化して、基材−樹脂硬化物の接合体を形成できる。   The bonded base-resin cured product according to the embodiment of the present invention may be composed only of the roughened base and the cured product of the resin composition, or the roughened group In addition to the cured product of the material and the resin composition, it may include a counterpart material in contact with the cured product. The resin composition is cooled by cooling if the resin composition is a thermoplastic resin composition after the step of placing the resin composition in the depression of the roughened base material formed by roughening. When the resin composition is an adhesive, it is cured by being left or heated to form a bonded substrate-resin cured product.

≪本発明の実施形態に係る粗面化基材及び基材−樹脂硬化物の接合体の用途≫
本発明の実施形態に係る粗面化基材の製造方法で得られる粗面化基材の表面又は表面上に、1層又は2層以上のラミネート層を形成させるラミネート加工を施してもよい。前記粗面化基材は放熱用部材、摺動用部材の材料として有用である。本発明の実施形態に係る基材−樹脂硬化物の接合体の製造方法で得られる基材−樹脂硬化物の接合体は、自動車用部材、航空機用部材、電子機器用部材、モバイル機器用部材、OA機器用部材、家電機器用部材、医療機器用部材として有用である。なお、本発明の実施形態の製造方法により得られる、前記粗面化基材及び前記基材−樹脂硬化物の接合体は上記の用途に限定されるものではない。
<< Application of Roughened Substrate and Substrate-Resin Cured Product Bonding Body According to Embodiment of the Present Invention >>
The surface or surface of the roughened substrate obtained by the method for producing a roughened substrate according to the embodiment of the present invention may be subjected to lamination to form one or more laminate layers. The roughened substrate is useful as a material for a heat dissipating member and a sliding member. The bonded base-resin cured product obtained by the method for producing a bonded base-resin cured product according to the embodiment of the present invention is a member for automobiles, a member for aircraft, a member for electronic devices, a member for mobile devices It is useful as a member for office automation equipment, a member for home appliances, and a member for medical equipment. In addition, the conjugate | zygote of the said roughened base material and the said base-resin cured material obtained by the manufacturing method of embodiment of this invention is not limited to said use.

以下に、実施例を比較例とともに挙げ、本発明及びその効果を具体的に説明する。なお、実施例で使用した基材、すべての処理に用いた薬剤は、市販されている材料や試薬の中から任意に選定したものであり、本発明の実際の用途を限定するものではない。   Hereinafter, the present invention and its effects will be specifically described by citing examples together with comparative examples. In addition, the base material used in the Example and the chemical | medical agent used for all the processes are arbitrarily selected from commercially available materials and reagents, and do not limit the actual use of this invention.

≪基材−樹脂硬化物の接合体の製造≫
<基材>
実施例1から13及び比較例1から12に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体の製造においては、特に断りのない限り、基材として20mm×45mm×t1.5mmのアルミニウム材又はアルミニウム合金材を用いた。
«Production of bonded base-resin cured product»
<Base material>
In the production of a bonded base material-cured resin product by injection molding bonding and a bonded base material-cured resin product by adhesive bonding according to Examples 1 to 13 and Comparative Examples 1 to 12, no particular mention is made. As long as a 20 mm x 45 mm x t1.5 mm aluminum material or aluminum alloy material was used as a base material.

<基材−樹脂硬化物の接合体の製造方法>
実施例1から13及び比較例1から4に係る基材−樹脂硬化物の接合体は、特に断りのない限り、[表面清浄工程→ジンケート工程→エッチング工程→射出成形接合工程及び接着剤接合工程のいずれかの工程]の処理工程を経て製造した。
比較例5〜12に係る基材−樹脂硬化物の接合体は、ジンケート工程を含まないこと以外は上記と同じ処理工程を経て製造した。
以下、当該処理工程の各処理を説明する。
<Manufacturing method of base material-bonded resin cured product>
The bonded base material-cured resin product according to Examples 1 to 13 and Comparative Examples 1 to 4 is [surface cleaning step → zincate step → etching step → injection molding bonding step and adhesive bonding step, unless otherwise specified. It manufactured through the process process of any process of].
The joined product of the base material-cured resin according to Comparative Examples 5 to 12 was manufactured through the same treatment process as described above except that it did not include the zincate process.
Hereinafter, each process of the said process process is demonstrated.

(表面清浄工程)
表面清浄工程では、アルカリ脱脂{ファインクリーナー315E 日本パーカライジング株式会社製、30g/L(固形分濃度)、70℃、浸漬時間1分}の後、アルカリ洗(水酸化ナトリウム100g/L、50℃、浸漬時間1分)を実施し、各工程後に水洗を実
施した。なお、実施例11、12、13においては、アルカリ洗(水酸化ナトリウム2.5mol/L、50℃、浸漬時間1分)の後、さらに酸洗(55重量%フッ化水素酸:60重量%硝酸=1:9(質量比)、25℃、浸漬時間30秒)を実施した。
(Surface cleaning process)
In the surface cleaning step, after alkaline degreasing {Fine Cleaner 315E (manufactured by Nippon Parkerizing Co., Ltd., 30 g / L (solid content concentration), 70 ° C., immersion time 1 min), alkaline cleaning (sodium hydroxide 100 g / L, 50 ° C., An immersion time of 1 minute was carried out, and water washing was carried out after each step. In Examples 11, 12 and 13, after alkaline washing (sodium hydroxide 2.5 mol / L, 50 ° C., immersion time 1 minute), further pickling (55 wt% hydrofluoric acid: 60 wt%) Nitric acid = 1: 9 (mass ratio), 25 ° C., immersion time 30 seconds) was carried out.

(ジンケート工程)
ジンケート工程では、ジンケート液に基材を浸漬させた。
(Zincate process)
In the zincate step, the substrate was dipped in zincate solution.

(エッチング工程)
エッチング工程では、エッチング剤に基材を浸漬させた。なお、エッチング剤のpH調整に関しては、塩酸水溶液を用いてpHを下降させ、水酸化ナトリウム水溶液を用いてpHを上昇させた。
(Etching process)
In the etching step, the substrate was immersed in the etching agent. In addition, regarding pH adjustment of an etching agent, pH was dropped using hydrochloric acid aqueous solution, and pH was raised using sodium hydroxide aqueous solution.

(射出成形接合工程)
射出成形接合工程では、前記エッチング工程までの工程を経た上記基材に対し、樹脂組成物としてガラスファイバーを30%含むポリフェニレンサルファイド(PPS樹脂)を射出成形し、接合させた。射出成形には東洋機械金属株式会社製電動サーボ射出成形機(Si−50III)を用いた。射出成形条件は、プレヒート125℃、成形温度320℃、金型温度135℃、射出速度30mm/秒、射出圧力1000kgf、保圧1200kgf、冷却時間15秒とした。成形された基材−樹脂硬化物の接合体は10mm×45mm×t3mmである。また、基材との接合面積は10mm×5mmである。
(Injection molding joining process)
In the injection molding and bonding step, polyphenylene sulfide (PPS resin) containing 30% of glass fibers as a resin composition was injection molded and bonded to the base material having undergone the steps up to the etching step. For injection molding, an electric servo injection molding machine (Si-50III) manufactured by Toyo Machine Metals Co., Ltd. was used. The injection molding conditions were: preheat 125 ° C., molding temperature 320 ° C., mold temperature 135 ° C., injection speed 30 mm / sec, injection pressure 1000 kgf, holding pressure 1200 kgf, and cooling time 15 seconds. The bonded base material-cured resin product is 10 mm × 45 mm × t3 mm. Moreover, the bonding area with a base material is 10 mm x 5 mm.

(接着剤接合工程)
接着剤接合工程では、前記エッチング工程までの工程を経た上記基材2枚に対し、アズワン株式会社製ガラスビーズBZ−02を10%含む、ニチバン株式会社製エポキシ系接着剤AR−S30を塗布し、接合させた。上記基材2枚の接合面積は10mm×20mmである。
(Adhesive bonding process)
In the adhesive bonding step, an epoxy-based adhesive AR-S30 manufactured by Nichiban Co., Ltd. containing 10% of glass beads BZ-02 manufactured by As One Co., Ltd. is applied to two substrates obtained through the steps up to the etching step. , Joined. The bonding area of the two base materials is 10 mm × 20 mm.

以下、上述した基材及びプロセスに基づき、実施例1から13及び比較例1から12に係る基材−樹脂硬化物の接合体を製造した。以下に、実施例及び比較例での手順等を述べる。   Hereinafter, based on the base material and process which were mentioned above, the conjugate | zygote of the base material-resin cured material which concerns on Example 1 to 13 and Comparative Example 1 to 12 was manufactured. Below, the procedure in an Example and a comparative example, etc. are described.

[実施例1]
(A5052からなる基材を用いた実施例及び比較例)
前記基材として、JIS H4000で規格されたA5052を用いた。ジンケート工程は実施しなかった。前記エッチング工程として、以下のエッチング剤(1)を用いて、基材を480秒間浸漬した。このようにして、[実施例1]に係る射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(1)
<成分>
・水
・ペルオキソ二硫酸ナトリウム:0.35mol/L
・塩化ナトリウム: 1.70mol/L
<pH>
3.0
Example 1
(Examples and Comparative Examples Using a Substrate Consisting of A5052)
As said base material, A5052 standardized by JIS H4000 was used. The zincate step was not performed. As the etching step, the substrate was immersed for 480 seconds using the following etchant (1). In this manner, a bonded base-resin cured product by injection molding bonding according to [Example 1] and a bonded base-resin cured product by adhesive bonding were obtained.
Etchant (1)
<Component>
-Water-Sodium peroxodisulfate: 0.35 mol / L
Sodium chloride: 1.70 mol / L
<PH>
3.0

[実施例2]
ジンケート工程を実施した点以外は[実施例1]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、前記ジンケート工程として、以下のジンケート液を用いて、基材を30秒間浸漬した。このようにして、[実施例2]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。な
お、前記ジンケート液のpHは塩酸水溶液を用いて、pHを12.5に調整した。
ジンケート液
<成分>
・水
・酸化亜鉛:0.25mol/L
・水酸化ナトリウム:3.80mol/L
・酒石酸:0.07mol/L
<pH>
12.5
<ジンケート工程の温度>
40.0℃
Example 2
A bonded substrate-resin cured product was produced in the same manner as in [Example 1] except that the zincate step was performed. Specifically, the substrate was immersed for 30 seconds using the following zincate solution as the zincate step. In this manner, a bonded base-resin cured product by injection molding bonding and a bonded base-resin cured product by adhesive bonding according to Example 2 were obtained. The pH of the zincate solution was adjusted to 12.5 using a hydrochloric acid aqueous solution.
Zincate liquid <component>
・ Water ・ Zinc oxide: 0.25 mol / L
Sodium hydroxide: 3.80 mol / L
-Tartaric acid: 0.07 mol / L
<PH>
12.5
<Temperature of zincate process>
40.0 ° C

[実施例3]
エッチング工程を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、エッチング工程として、以下のエッチング剤(2)を用いて、基材を480秒間浸漬した。このようにして、[実施例3]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(2)
<成分>
・水
・ペルオキソ二硫酸カリウム:0.30mol/L
・塩化カリウム:1.40mol/L
<pH>
3.0
[Example 3]
A bonded substrate-resin cured product was produced in the same manner as in [Example 2] except that the etching step was changed. Specifically, the substrate was immersed for 480 seconds using the following etchant (2) as an etching step. In this manner, a bonded base-resin cured product by injection molding bonding and a bonded base-resin cured product by adhesive bonding according to [Example 3] were obtained.
Etchant (2)
<Component>
-Water-Potassium peroxodisulfate: 0.30 mol / L
-Potassium chloride: 1.40 mol / L
<PH>
3.0

[実施例4]
エッチング工程を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、エッチング工程として、以下のエッチング剤(3)を用いて、基材を480秒間浸漬した。このようにして、[実施例4]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(3)
<成分>
・水
・ペルオキソ二硫酸アンモニウム:0.36mol/L
・塩化ナトリウム:1.70mol/L
<pH>
3.0
Example 4
A bonded substrate-resin cured product was produced in the same manner as in [Example 2] except that the etching step was changed. Specifically, the substrate was immersed for 480 seconds using the following etchant (3) as an etching step. In this manner, a bonded base-resin cured product by injection molding bonding and a bonded base-resin cured product by adhesive bonding according to [Example 4] were obtained.
Etchant (3)
<Component>
· Water · Ammonium peroxodisulfate: 0.36 mol / L
-Sodium chloride: 1.70 mol / L
<PH>
3.0

[実施例5]
エッチング工程を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、エッチング工程として、表1のエッチング剤(4)を用いて、基材を480秒間浸漬した。このようにして、[実施例5]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−基材接合体を得た。
エッチング剤(4)
<成分>
・水
・ペルオキソ二硫酸ナトリウム:0.35mol/L
・塩化カルシウム:0.90mol/L
<pH>
3.0
[Example 5]
A bonded substrate-resin cured product was produced in the same manner as in [Example 2] except that the etching step was changed. Specifically, the substrate was immersed for 480 seconds using the etching agent (4) in Table 1 as an etching step. In this manner, a bonded base-resin cured product by injection molding bonding and a base-base bonded product by adhesive bonding according to [Example 5] were obtained.
Etchant (4)
<Component>
-Water-Sodium peroxodisulfate: 0.35 mol / L
-Calcium chloride: 0.90 mol / L
<PH>
3.0

[比較例1]
エッチング工程を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を得た。具体的には、エッチング工程として、以下のエッチング剤(5)を用いて、基材を480秒間浸漬した。このようにして、[比較例1]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(5)
<成分>
・水
・ペルオキソ二硫酸ナトリウム:0.35mol/L
<pH>
3.0
Comparative Example 1
A bonded substrate-resin cured product was obtained by the same method as in [Example 2] except that the etching step was changed. Specifically, the substrate was immersed for 480 seconds using the following etchant (5) as an etching step. In this manner, a bonded base-resin cured product by injection molding bonding and a bonded base-resin cured product by adhesive bonding according to Comparative Example 1 were obtained.
Etchant (5)
<Component>
-Water-Sodium peroxodisulfate: 0.35 mol / L
<PH>
3.0

[比較例2]
エッチング工程を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を得た。具体的には、エッチング工程として、以下のエッチング剤(6)を用いて、基材を480秒間浸漬した。このようにして、[比較例2]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(6)
<成分>
・水
・塩化ナトリウム:1.70mol/L
<pH>
3.0
Comparative Example 2
A bonded substrate-resin cured product was obtained by the same method as in [Example 2] except that the etching step was changed. Specifically, as the etching step, the substrate was immersed for 480 seconds using the following etchant (6). Thus, a bonded body of the base material-cured resin by injection molding bonding and a bonded body of the cured base material-resin by adhesive bonding according to [Comparative Example 2] were obtained.
Etchant (6)
<Component>
-Water-Sodium chloride: 1.70 mol / L
<PH>
3.0

[比較例3]
エッチング工程を変更した点以外は[実施例1]と同様の方法で、基材−樹脂硬化物の接合体を得た。具体的には、エッチング工程として、以下のエッチング剤(7)を用いて、基材を300秒間浸漬した。このようにして、[比較例3]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(7)
<成分>
・水
・リン酸:5.10mol/L
・塩化ナトリウム:0.85mol/L
<pH>
1.0
Comparative Example 3
A bonded substrate-resin cured product was obtained by the same method as in [Example 1] except that the etching step was changed. Specifically, the substrate was immersed for 300 seconds using the following etchant (7) as an etching step. Thus, a bonded body of the base material-cured resin by injection molding bonding and a bonded body of the cured base material-resin by adhesive bonding according to [Comparative Example 3] were obtained.
Etchant (7)
<Component>
Water and phosphoric acid: 5.10 mol / L
Sodium chloride: 0.85 mol / L
<PH>
1.0

[比較例4]
エッチング工程を変更した点以外は[実施例1]と同様の方法で、基材−樹脂硬化物の接合体を得た。具体的には、エッチング工程として、以下のエッチング剤(8)を用いて、基材を300秒間浸漬した。このようにして、[比較例4]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(8)
<成分>
・水
・硫酸:0.50mol/L
・塩化ナトリウム:1.70mol/L
<pH>
1.0
Comparative Example 4
A bonded substrate-resin cured product was obtained by the same method as in [Example 1] except that the etching step was changed. Specifically, as the etching step, the substrate was immersed for 300 seconds using the following etchant (8). Thus, a bonded body of the base material-cured resin by injection molding bonding and a bonded body of the cured base material-resin by adhesive bonding according to [Comparative Example 4] were obtained.
Etchant (8)
<Component>
Water and sulfuric acid: 0.50 mol / L
-Sodium chloride: 1.70 mol / L
<PH>
1.0

[引張せん断試験]
実施例1から5及び比較例1から4の、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体について、引張せん断強度を測定した。引張せん断試験は、株式会社島津製作所製オートグラフ精密万能試験機(AG−100kNX)を用いて行った。引張速度は10mm/分とし、引張せん断強度(MPa)は破壊荷重(N)/接合部面積(50mm)として算出した。結果を表1に示す。
[Tensile shear test]
The tensile shear strength was measured for each of the bonded base material-cured resin products by injection molding bonding and the bonded base material-cured resin product by adhesive bonding in Examples 1 to 5 and Comparative Examples 1 to 4. The tensile shear test was performed using an automatic graph precision universal tester (AG-100 kNX) manufactured by Shimadzu Corporation. The tensile speed was 10 mm / min, and the tensile shear strength (MPa) was calculated as the breaking load (N) / the area of the joint (50 mm 2 ). The results are shown in Table 1.

Figure 2019099864
Figure 2019099864

(その他のアルミニウム又はアルミニウム合金からなる基材を用いた実施例及び比較例)[実施例6]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA1050を用いた。このようにして、[実施例6]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
(Examples and Comparative Examples Using Other Aluminum or Aluminum Alloy Base Material) [Example 6]
A base-resin cured product was produced by the same method as in [Example 2] except that the base was changed. Specifically, A1050 standardized by JIS H4000 was used as a base material. In this manner, a bonded base-resin cured product by injection molding bonding and a bonded base-resin cured product by adhesive bonding according to [Example 6] were obtained.

[実施例7]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA2017を用いた。このようにして、[実施例7]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 7]
A base-resin cured product was produced by the same method as in [Example 2] except that the base was changed. Specifically, A2017 standardized by JIS H4000 was used as a base material. In this manner, a bonded base-resin cured product by injection molding bonding and a bonded base-resin cured product by adhesive bonding according to Example 7 were obtained.

[実施例8]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA3003を用いた。このようにして、[実施例8]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 8]
A base-resin cured product was produced by the same method as in [Example 2] except that the base was changed. Specifically, A3003 standardized by JIS H4000 was used as a substrate. In this manner, a bonded base-resin cured product by injection molding bonding and a bonded base-resin cured product by adhesive bonding according to [Example 8] were obtained.

[実施例9]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4140で規格されたA4032を用いた。このようにして、[実施例9]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 9]
A base-resin cured product was produced by the same method as in [Example 2] except that the base was changed. Specifically, A4032 standardized by JIS H4140 was used as a base material. In this way, a bonded base-resin cured product by injection molding bonding and a bonded base-resin cured product by adhesive bonding according to [Example 9] were obtained.

[実施例10]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4040で規格されたA6063を用いた。このようにして、[実施例10]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 10]
A base-resin cured product was produced by the same method as in [Example 2] except that the base was changed. Specifically, A6063 standardized by JIS H4040 was used as a base material. In this manner, a bonded base-resin cured product by injection molding bonding and a bonded base-resin cured product by adhesive bonding according to [Example 10] were obtained.

[実施例11]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA7075を用いた。このようにして、[実施例11]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 11]
A base-resin cured product was produced by the same method as in [Example 2] except that the base was changed. Specifically, A7075 standardized by JIS H4000 was used as a base material. In this manner, a bonded base-resin cured product by injection molding bonding and a bonded base-resin cured product by adhesive bonding according to [Example 11] were obtained.

[実施例12]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H5202で規格されたAC8Aを用いた。このようにして、[実施例12]
に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 12]
A base-resin cured product was produced by the same method as in [Example 2] except that the base was changed. Specifically, AC 8A standardized by JIS H5202 was used as a substrate. Thus, [Example 12]
According to the present invention, there is obtained a bonded body of a base material-cured resin product by injection molding bonding and a bonded body of a base material-cured resin product by adhesive bonding.

[実施例13]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H5302で規格されたADC12を用いた。このようにして、[実施例13]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 13]
A base-resin cured product was produced by the same method as in [Example 2] except that the base was changed. Specifically, ADC 12 standardized by JIS H5302 was used as a substrate. In this manner, a bonded base-resin cured product by injection molding bonding and a bonded base-resin cured product by adhesive bonding according to [Example 13] were obtained.

[比較例5]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA1050を用いた。このようにして、[比較例5]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
Comparative Example 5
A bonded substrate-resin cured product was produced in the same manner as in [Comparative Example 4] except that the substrate was changed. Specifically, A1050 standardized by JIS H4000 was used as a base material. Thus, a bonded body of a cured substrate and a cured resin by injection molding bonding and a bonded body of a cured substrate and a cured resin by adhesive bonding according to [Comparative Example 5] were obtained.

[比較例6]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA2017を用いた。このようにして、[比較例6]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
Comparative Example 6
A bonded substrate-resin cured product was produced in the same manner as in [Comparative Example 4] except that the substrate was changed. Specifically, A2017 standardized by JIS H4000 was used as a base material. Thus, a bonded body of the base material-cured resin by injection molding bonding and a bonded body of the cured base material-resin by adhesive bonding according to [Comparative Example 6] were obtained.

[比較例7]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA3003を用いた。このようにして、[比較例7]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
Comparative Example 7
A bonded substrate-resin cured product was produced in the same manner as in [Comparative Example 4] except that the substrate was changed. Specifically, A3003 standardized by JIS H4000 was used as a substrate. Thus, a bonded body of a cured substrate and a cured resin by injection molding bonding and a bonded body of a cured substrate and a cured resin by adhesive bonding according to [Comparative Example 7] were obtained.

[比較例8]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4140で規格されたA4032を用いた。このようにして、[比較例8]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
Comparative Example 8
A bonded substrate-resin cured product was produced in the same manner as in [Comparative Example 4] except that the substrate was changed. Specifically, A4032 standardized by JIS H4140 was used as a base material. Thus, a bonded body of the base material-cured resin by injection molding bonding and a bonded body of the cured base material-resin by adhesive bonding according to [Comparative Example 8] were obtained.

[比較例9]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製
造した。具体的には、基材としてJIS H4040で規格されたA6063を用いた。このようにして、[比較例9]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
Comparative Example 9
A bonded substrate-resin cured product was produced in the same manner as in [Comparative Example 4] except that the substrate was changed. Specifically, A6063 standardized by JIS H4040 was used as a base material. Thus, a bonded body of a cured substrate and a cured resin by injection molding bonding and a bonded body of a cured substrate and a cured resin by adhesive bonding according to [Comparative Example 9] were obtained.

[比較例10]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA7075を用いた。このようにして、[比較例10]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
Comparative Example 10
A bonded substrate-resin cured product was produced in the same manner as in [Comparative Example 4] except that the substrate was changed. Specifically, A7075 standardized by JIS H4000 was used as a base material. Thus, a bonded body of a cured substrate and a cured resin by injection molding bonding and a bonded body of a cured substrate and a cured resin by adhesive bonding according to [Comparative Example 10] were obtained.

[比較例11]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H5202で規格されたAC8Aを用いた。このようにして、[比較例11]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
Comparative Example 11
A bonded substrate-resin cured product was produced in the same manner as in [Comparative Example 4] except that the substrate was changed. Specifically, AC 8A standardized by JIS H5202 was used as a substrate. In this manner, a bonded base-resin cured product by injection molding bonding and a bonded base-resin cured product by adhesive bonding according to [Comparative Example 11] were obtained.

[比較例12]
基材を変更した点以外は[比較例4]と同様の方法で、[比較例12]の基材−樹脂硬化物の接合体を製造した。具体的には、基材としてADC12を用いた。このようにして、[比較例12]に係る基材−樹脂硬化物の接合体及び基材−基材接合体を得た。
Comparative Example 12
A bonded substrate-resin cured product of [Comparative Example 12] was produced in the same manner as in [Comparative Example 4] except that the substrate was changed. Specifically, ADC 12 was used as a substrate. In this manner, a bonded base-resin cured product and a base-base bonded body according to [Comparative Example 12] were obtained.

実施例6から13及び比較例5から12の、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体について、引張せん断強度を測定した。結果を表3に示す。   The tensile shear strength was measured for each of the bonded base material-cured resin products by injection molding bonding and the bonded base material-cured resin product by adhesive bonding in Examples 6 to 13 and Comparative Examples 5 to 12. The results are shown in Table 3.

Figure 2019099864
Figure 2019099864

Claims (7)

少なくとも表面の全部又は一部がアルミニウム又はアルミニウム合金からなる基材の表面を粗面化するためのエッチング剤であって、
少なくともペルオキソ二硫酸イオンと塩化物イオンを含む、エッチング剤。
An etching agent for roughening the surface of a substrate at least the whole of which surface or part is made of aluminum or aluminum alloy,
An etchant comprising at least peroxodisulfate ion and chloride ion.
少なくとも表面の全部又は一部がアルミニウム又はアルミニウム合金からなる基材の表面又は表面上に、請求項1に記載のエッチング剤を接触させるエッチング工程を含む、粗面化基材の製造方法。   A method for producing a roughened substrate, comprising an etching step of bringing the etching agent according to claim 1 into contact on the surface or the surface of a substrate at least the whole surface of which or part of the surface is made of aluminum or aluminum alloy. 前記エッチング工程の前に、前記基材の表面にジンケート皮膜を形成させるジンケート工程を含む、請求項2に記載の粗面化基材の製造方法。   The method for producing a roughened substrate according to claim 2, further comprising a zincate step of forming a zincate film on the surface of the substrate before the etching step. 請求項2又は3に記載の粗面化基材の製造方法によって得られる粗面化基材。   The roughened base material obtained by the manufacturing method of the roughened base material of Claim 2 or 3. 少なくとも表面の全部又は一部がアルミニウム又はアルミニウム合金からなる基材の表面又は表面上に、
請求項1に記載のエッチング剤を接触させるエッチング工程と、
前記エッチング剤を接触させ、前記基材を粗面化することにより形成された凹みに樹脂組成物を入れる工程と、
を含む、基材−樹脂硬化物の接合体の製造方法。
On the surface or the surface of a substrate at least all or part of the surface of which is made of aluminum or an aluminum alloy
An etching step of contacting the etching agent according to claim 1;
Placing the resin composition in the depression formed by contacting the etching agent and roughening the substrate;
The manufacturing method of the conjugate | zygote of a base material-resin cured material containing C.
前記エッチング工程の前に、前記基材の表面にジンケート皮膜を形成させるジンケート工程を含む、請求項5に記載の基材−樹脂硬化物の接合体の製造方法。   The manufacturing method of the conjugate | zygote of the base-resin hardened | cured material of Claim 5 including the zincate process which forms a zincate film | membrane in the surface of the said base material before the said etching process. 請求項5又は6に記載の製造方法によって得られる基材−樹脂硬化物の接合体。   A bonded substrate-resin cured product obtained by the manufacturing method according to claim 5.
JP2017231283A 2017-11-30 2017-11-30 Etching agent for roughening the surface of a base material whose surface is at least all or part of aluminum or an aluminum alloy, a method for producing a roughened base material, a roughened base material, a base material-a cured resin product. Manufacturing method of the bonded body and the bonded body of the base material-resin cured product Active JP6967953B2 (en)

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